DE1521175B2 - Vorrichtung zur verdampfung von werkstoffen im vakuum - Google Patents
Vorrichtung zur verdampfung von werkstoffen im vakuumInfo
- Publication number
- DE1521175B2 DE1521175B2 DE19661521175 DE1521175A DE1521175B2 DE 1521175 B2 DE1521175 B2 DE 1521175B2 DE 19661521175 DE19661521175 DE 19661521175 DE 1521175 A DE1521175 A DE 1521175A DE 1521175 B2 DE1521175 B2 DE 1521175B2
- Authority
- DE
- Germany
- Prior art keywords
- evaporation
- electron
- electron beam
- partition
- electrical
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000001704 evaporation Methods 0.000 title claims description 37
- 230000008020 evaporation Effects 0.000 title claims description 33
- 239000000463 material Substances 0.000 title claims description 23
- 238000005192 partition Methods 0.000 claims description 18
- 238000010438 heat treatment Methods 0.000 claims description 14
- 238000010894 electron beam technology Methods 0.000 claims description 12
- 230000005291 magnetic effect Effects 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 230000005855 radiation Effects 0.000 claims description 4
- 239000000126 substance Substances 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 230000000712 assembly Effects 0.000 claims description 2
- 238000000429 assembly Methods 0.000 claims description 2
- 239000002826 coolant Substances 0.000 claims description 2
- 238000005259 measurement Methods 0.000 claims description 2
- 238000007738 vacuum evaporation Methods 0.000 claims description 2
- 238000009833 condensation Methods 0.000 claims 2
- 230000005494 condensation Effects 0.000 claims 2
- 238000005566 electron beam evaporation Methods 0.000 claims 2
- 239000012212 insulator Substances 0.000 claims 2
- 238000007740 vapor deposition Methods 0.000 claims 2
- 239000000969 carrier Substances 0.000 claims 1
- 239000004020 conductor Substances 0.000 claims 1
- 238000001816 cooling Methods 0.000 claims 1
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000009826 distribution Methods 0.000 claims 1
- 230000005684 electric field Effects 0.000 claims 1
- 238000001493 electron microscopy Methods 0.000 claims 1
- 238000001803 electron scattering Methods 0.000 claims 1
- 239000011521 glass Substances 0.000 claims 1
- 238000011835 investigation Methods 0.000 claims 1
- 150000002500 ions Chemical class 0.000 claims 1
- 239000007769 metal material Substances 0.000 claims 1
- 230000003287 optical effect Effects 0.000 claims 1
- 230000035699 permeability Effects 0.000 claims 1
- 238000002360 preparation method Methods 0.000 claims 1
- 239000010453 quartz Substances 0.000 claims 1
- 230000001105 regulatory effect Effects 0.000 claims 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims 1
- 238000010025 steaming Methods 0.000 claims 1
- 238000003860 storage Methods 0.000 claims 1
- 238000009834 vaporization Methods 0.000 claims 1
- 230000008016 vaporization Effects 0.000 claims 1
- 239000006200 vaporizer Substances 0.000 claims 1
- 229910052751 metal Inorganic materials 0.000 description 9
- 239000002184 metal Substances 0.000 description 9
- 230000017525 heat dissipation Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 3
- 238000010992 reflux Methods 0.000 description 3
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 2
- 229910052721 tungsten Inorganic materials 0.000 description 2
- 239000010937 tungsten Substances 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 230000001133 acceleration Effects 0.000 description 1
- 239000004566 building material Substances 0.000 description 1
- 229910052799 carbon Inorganic materials 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011888 foil Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 239000000615 nonconductor Substances 0.000 description 1
- 229910052755 nonmetal Inorganic materials 0.000 description 1
- 150000002843 nonmetals Chemical class 0.000 description 1
- 229910052573 porcelain Inorganic materials 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 230000002123 temporal effect Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CH1750165A CH452313A (de) | 1965-12-18 | 1965-12-18 | Vorrichtung zur Verdampfung von Stoffen im Vakuum |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| DE1521175A1 DE1521175A1 (de) | 1969-07-31 |
| DE1521175B2 true DE1521175B2 (de) | 1973-04-26 |
Family
ID=4425902
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DE19661521175 Pending DE1521175B2 (de) | 1965-12-18 | 1966-11-16 | Vorrichtung zur verdampfung von werkstoffen im vakuum |
Country Status (6)
Families Citing this family (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4094269A (en) * | 1974-06-14 | 1978-06-13 | Zlafop Pri Ban | Vapor deposition apparatus for coating continuously moving substrates with layers of volatizable solid substances |
| BG20711A1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1974-06-14 | 1975-12-20 | ||
| US3996469A (en) * | 1975-01-06 | 1976-12-07 | Jersey Nuclear-Avco Isotopes, Inc. | Floating convection barrier for evaporation source |
| US4048462A (en) * | 1975-01-17 | 1977-09-13 | Airco, Inc. | Compact rotary evaporation source |
| DE2628765C3 (de) * | 1976-06-26 | 1979-01-11 | Leybold-Heraeus Gmbh & Co Kg, 5000 Koeln | Vorrichtung zum Aufdampfen insbesondere sublimierbarer Stoffe im Vakuum mittels einer Elektronenstrahlquelle |
| FR2623819A1 (fr) * | 1987-11-26 | 1989-06-02 | Thomson Csf | Four a bombardement electronique pour evaporation sous vide |
| DE4016225C2 (de) * | 1990-05-19 | 1997-08-14 | Leybold Ag | Reihenverdampfer für Vakuumbedampfungsanlagen |
| DE4100541C1 (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) * | 1991-01-10 | 1992-01-16 | Plasco Dr. Ehrich Plasma-Coating Gmbh, 6501 Heidesheim, De |
-
1965
- 1965-12-18 CH CH1750165A patent/CH452313A/de unknown
-
1966
- 1966-01-25 NL NL6600952A patent/NL6600952A/xx unknown
- 1966-11-16 DE DE19661521175 patent/DE1521175B2/de active Pending
- 1966-11-30 GB GB53526/66A patent/GB1105989A/en not_active Expired
- 1966-12-16 US US602399A patent/US3544763A/en not_active Expired - Lifetime
- 1966-12-19 FR FR87908A patent/FR1505169A/fr not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3544763A (en) | 1970-12-01 |
| CH452313A (de) | 1968-05-31 |
| FR1505169A (fr) | 1967-12-08 |
| DE1521175A1 (de) | 1969-07-31 |
| GB1105989A (en) | 1968-03-13 |
| NL6600952A (GUID-C5D7CC26-194C-43D0-91A1-9AE8C70A9BFF.html) | 1967-06-19 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| SH | Request for examination between 03.10.1968 and 22.04.1971 |