FR1505169A - Appareil pour vaporisation de substances sous vide - Google Patents
Appareil pour vaporisation de substances sous videInfo
- Publication number
- FR1505169A FR1505169A FR87908A FR87908A FR1505169A FR 1505169 A FR1505169 A FR 1505169A FR 87908 A FR87908 A FR 87908A FR 87908 A FR87908 A FR 87908A FR 1505169 A FR1505169 A FR 1505169A
- Authority
- FR
- France
- Prior art keywords
- under vacuum
- substances under
- vaporizing substances
- vaporizing
- vacuum
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
- 239000000126 substance Substances 0.000 title 1
- 230000008016 vaporization Effects 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
- H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/28—Vacuum evaporation by wave energy or particle radiation
- C23C14/30—Vacuum evaporation by wave energy or particle radiation by electron bombardment
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Toxicology (AREA)
- Plasma & Fusion (AREA)
- Analytical Chemistry (AREA)
- Health & Medical Sciences (AREA)
- Physics & Mathematics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH1750165A CH452313A (de) | 1965-12-18 | 1965-12-18 | Vorrichtung zur Verdampfung von Stoffen im Vakuum |
Publications (1)
Publication Number | Publication Date |
---|---|
FR1505169A true FR1505169A (fr) | 1967-12-08 |
Family
ID=4425902
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
FR87908A Expired FR1505169A (fr) | 1965-12-18 | 1966-12-19 | Appareil pour vaporisation de substances sous vide |
Country Status (6)
Country | Link |
---|---|
US (1) | US3544763A (fr) |
CH (1) | CH452313A (fr) |
DE (1) | DE1521175B2 (fr) |
FR (1) | FR1505169A (fr) |
GB (1) | GB1105989A (fr) |
NL (1) | NL6600952A (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2356268A1 (fr) * | 1976-06-26 | 1978-01-20 | Leybold Heraeus Gmbh & Co Kg | Evaporateur a faisceau electronique et reservoir pour le materiau a evaporer |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4094269A (en) * | 1974-06-14 | 1978-06-13 | Zlafop Pri Ban | Vapor deposition apparatus for coating continuously moving substrates with layers of volatizable solid substances |
BG20711A1 (fr) * | 1974-06-14 | 1975-12-20 | ||
US3996469A (en) * | 1975-01-06 | 1976-12-07 | Jersey Nuclear-Avco Isotopes, Inc. | Floating convection barrier for evaporation source |
US4048462A (en) * | 1975-01-17 | 1977-09-13 | Airco, Inc. | Compact rotary evaporation source |
FR2623819A1 (fr) * | 1987-11-26 | 1989-06-02 | Thomson Csf | Four a bombardement electronique pour evaporation sous vide |
DE4016225C2 (de) * | 1990-05-19 | 1997-08-14 | Leybold Ag | Reihenverdampfer für Vakuumbedampfungsanlagen |
DE4100541C1 (fr) * | 1991-01-10 | 1992-01-16 | Plasco Dr. Ehrich Plasma-Coating Gmbh, 6501 Heidesheim, De |
-
1965
- 1965-12-18 CH CH1750165A patent/CH452313A/de unknown
-
1966
- 1966-01-25 NL NL6600952A patent/NL6600952A/xx unknown
- 1966-11-16 DE DE19661521175 patent/DE1521175B2/de active Pending
- 1966-11-30 GB GB53526/66A patent/GB1105989A/en not_active Expired
- 1966-12-16 US US602399A patent/US3544763A/en not_active Expired - Lifetime
- 1966-12-19 FR FR87908A patent/FR1505169A/fr not_active Expired
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2356268A1 (fr) * | 1976-06-26 | 1978-01-20 | Leybold Heraeus Gmbh & Co Kg | Evaporateur a faisceau electronique et reservoir pour le materiau a evaporer |
Also Published As
Publication number | Publication date |
---|---|
CH452313A (de) | 1968-05-31 |
GB1105989A (en) | 1968-03-13 |
DE1521175A1 (de) | 1969-07-31 |
NL6600952A (fr) | 1967-06-19 |
DE1521175B2 (de) | 1973-04-26 |
US3544763A (en) | 1970-12-01 |
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