DE1447928A1 - Verfahren zum Herstellen von Reliefformen fuer Druckzwecke - Google Patents

Verfahren zum Herstellen von Reliefformen fuer Druckzwecke

Info

Publication number
DE1447928A1
DE1447928A1 DE19651447928 DE1447928A DE1447928A1 DE 1447928 A1 DE1447928 A1 DE 1447928A1 DE 19651447928 DE19651447928 DE 19651447928 DE 1447928 A DE1447928 A DE 1447928A DE 1447928 A1 DE1447928 A1 DE 1447928A1
Authority
DE
Germany
Prior art keywords
plates
films
relief
production
printing purposes
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE19651447928
Other languages
German (de)
English (en)
Inventor
Floss Dr Josef Georg
Wilhelm Dr Hans
Henkler Dr Herbert
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF SE
Original Assignee
BASF SE
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by BASF SE filed Critical BASF SE
Publication of DE1447928A1 publication Critical patent/DE1447928A1/de
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/48Polymers modified by chemical after-treatment
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
DE19651447928 1965-08-04 1965-08-04 Verfahren zum Herstellen von Reliefformen fuer Druckzwecke Pending DE1447928A1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEB0083130 1965-08-04

Publications (1)

Publication Number Publication Date
DE1447928A1 true DE1447928A1 (de) 1968-12-12

Family

ID=6981819

Family Applications (1)

Application Number Title Priority Date Filing Date
DE19651447928 Pending DE1447928A1 (de) 1965-08-04 1965-08-04 Verfahren zum Herstellen von Reliefformen fuer Druckzwecke

Country Status (5)

Country Link
US (1) US3486891A (enExample)
BE (1) BE685013A (enExample)
CH (1) CH475582A (enExample)
DE (1) DE1447928A1 (enExample)
GB (1) GB1147776A (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2023083A1 (de) * 1969-05-19 1970-11-26 Keuffel & Esser Co Lichtempfindliches aetzfaehiges Kopiermaterial

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4001016A (en) * 1971-05-25 1977-01-04 Agfa-Gevaert, A.G. Polymers which can be cross-linked by photopolymerization
GB1388388A (en) * 1971-06-02 1975-03-26 Agfa Gevaert Masked isocyanates
US3884702A (en) * 1972-12-14 1975-05-20 Unitika Ltd Photosensitive polyamide composition
US4069056A (en) * 1974-05-02 1978-01-17 General Electric Company Photopolymerizable composition containing group Va aromatic onium salts
US4269930A (en) * 1979-11-13 1981-05-26 Matrix Unlimited, Inc. Photopolymeric composition containing polyamide and dicarboxylic acid diester
US4345022A (en) * 1979-11-13 1982-08-17 Matrix Unlimited, Inc. Process of recovering unpolymerized photopolymer from printing plates

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1067219B (de) * 1955-12-19 1959-10-15 Farbenfabriken Bayer Aktiengesellschaft, Leverkusen - Bayerwerk Verfahren zur Herstellung von durch Lichteinwirkung vernetzenden hochpolymeren Verbindungen
US2997391A (en) * 1957-04-22 1961-08-22 Time Inc Photosensitive polyamide resins containing stilbene units in the molecule
US3103437A (en) * 1959-04-10 1963-09-10 Hardening
US3147116A (en) * 1961-11-28 1964-09-01 Gen Aniline & Film Corp Printing plates comprising hydrophobic resisto formed by crosslinking photopolymerized hydrophilic monomers with an isocyanate
US3278305A (en) * 1963-07-12 1966-10-11 Gevaert Photo Prod Nv Photochemical cross-linking of polymers

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2023083A1 (de) * 1969-05-19 1970-11-26 Keuffel & Esser Co Lichtempfindliches aetzfaehiges Kopiermaterial

Also Published As

Publication number Publication date
CH475582A (de) 1969-07-15
US3486891A (en) 1969-12-30
GB1147776A (en) 1969-04-10
BE685013A (enExample) 1967-02-03

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