CH475582A - Verfahren zum Herstellen von Reliefformen für Druckzwecke - Google Patents

Verfahren zum Herstellen von Reliefformen für Druckzwecke

Info

Publication number
CH475582A
CH475582A CH1114966A CH1114966A CH475582A CH 475582 A CH475582 A CH 475582A CH 1114966 A CH1114966 A CH 1114966A CH 1114966 A CH1114966 A CH 1114966A CH 475582 A CH475582 A CH 475582A
Authority
CH
Switzerland
Prior art keywords
production
printing purposes
relief forms
relief
forms
Prior art date
Application number
CH1114966A
Other languages
English (en)
Inventor
Hans Dr Wilhelm
Herbert Dr Henkler
Georg Dr Floss Josef
Original Assignee
Basf Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Ag filed Critical Basf Ag
Publication of CH475582A publication Critical patent/CH475582A/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/037—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polyamides or polyimides
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G69/00—Macromolecular compounds obtained by reactions forming a carboxylic amide link in the main chain of the macromolecule
    • C08G69/48—Polymers modified by chemical after-treatment
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L77/00—Compositions of polyamides obtained by reactions forming a carboxylic amide link in the main chain; Compositions of derivatives of such polymers

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
CH1114966A 1965-08-04 1966-08-02 Verfahren zum Herstellen von Reliefformen für Druckzwecke CH475582A (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DEB0083130 1965-08-04

Publications (1)

Publication Number Publication Date
CH475582A true CH475582A (de) 1969-07-15

Family

ID=6981819

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1114966A CH475582A (de) 1965-08-04 1966-08-02 Verfahren zum Herstellen von Reliefformen für Druckzwecke

Country Status (5)

Country Link
US (1) US3486891A (de)
BE (1) BE685013A (de)
CH (1) CH475582A (de)
DE (1) DE1447928A1 (de)
GB (1) GB1147776A (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3645732A (en) * 1969-05-19 1972-02-29 Keuffel & Esser Co Etching alcohol-soluble nylon with aqueous solutions
US4001016A (en) * 1971-05-25 1977-01-04 Agfa-Gevaert, A.G. Polymers which can be cross-linked by photopolymerization
GB1388388A (en) * 1971-06-02 1975-03-26 Agfa Gevaert Masked isocyanates
US3884702A (en) * 1972-12-14 1975-05-20 Unitika Ltd Photosensitive polyamide composition
US4069056A (en) * 1974-05-02 1978-01-17 General Electric Company Photopolymerizable composition containing group Va aromatic onium salts
US4269930A (en) * 1979-11-13 1981-05-26 Matrix Unlimited, Inc. Photopolymeric composition containing polyamide and dicarboxylic acid diester
US4345022A (en) * 1979-11-13 1982-08-17 Matrix Unlimited, Inc. Process of recovering unpolymerized photopolymer from printing plates

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1067219B (de) * 1955-12-19 1959-10-15 Farbenfabriken Bayer Aktiengesellschaft, Leverkusen - Bayerwerk Verfahren zur Herstellung von durch Lichteinwirkung vernetzenden hochpolymeren Verbindungen
US2997391A (en) * 1957-04-22 1961-08-22 Time Inc Photosensitive polyamide resins containing stilbene units in the molecule
US3103437A (en) * 1959-04-10 1963-09-10 Hardening
US3147116A (en) * 1961-11-28 1964-09-01 Gen Aniline & Film Corp Printing plates comprising hydrophobic resisto formed by crosslinking photopolymerized hydrophilic monomers with an isocyanate
US3278305A (en) * 1963-07-12 1966-10-11 Gevaert Photo Prod Nv Photochemical cross-linking of polymers

Also Published As

Publication number Publication date
GB1147776A (en) 1969-04-10
DE1447928A1 (de) 1968-12-12
US3486891A (en) 1969-12-30
BE685013A (de) 1967-02-03

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Legal Events

Date Code Title Description
PL Patent ceased