DE135118T1 - Verfahren zur herstellung von feinen partikeln. - Google Patents

Verfahren zur herstellung von feinen partikeln.

Info

Publication number
DE135118T1
DE135118T1 DE198484109457T DE84109457T DE135118T1 DE 135118 T1 DE135118 T1 DE 135118T1 DE 198484109457 T DE198484109457 T DE 198484109457T DE 84109457 T DE84109457 T DE 84109457T DE 135118 T1 DE135118 T1 DE 135118T1
Authority
DE
Germany
Prior art keywords
substrate
gas
approaches
metallic
fine
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DE198484109457T
Other languages
English (en)
Inventor
Tsuyoshi Sendai-Shi Miyagi Masumoto
Yukio Ageo-Shi Saitama Nakanouchi
Shigehiro Ohnuma
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Japan Science and Technology Agency
Original Assignee
Research Development Corp of Japan
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Research Development Corp of Japan filed Critical Research Development Corp of Japan
Publication of DE135118T1 publication Critical patent/DE135118T1/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
    • H01F41/14—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates
    • H01F41/18—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for applying magnetic films to substrates by cathode sputtering
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/002—Making metallic powder or suspensions thereof amorphous or microcrystalline
    • B22F9/008—Rapid solidification processing
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B22—CASTING; POWDER METALLURGY
    • B22F—WORKING METALLIC POWDER; MANUFACTURE OF ARTICLES FROM METALLIC POWDER; MAKING METALLIC POWDER; APPARATUS OR DEVICES SPECIALLY ADAPTED FOR METALLIC POWDER
    • B22F9/00—Making metallic powder or suspensions thereof
    • B22F9/02—Making metallic powder or suspensions thereof using physical processes
    • B22F9/14—Making metallic powder or suspensions thereof using physical processes using electric discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0005—Separation of the coating from the substrate
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/0021—Reactive sputtering or evaporation
    • C23C14/0036—Reactive sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/02—Pretreatment of the material to be coated
    • C23C14/021—Cleaning or etching treatments
    • C23C14/022—Cleaning or etching treatments by means of bombardment with energetic particles or radiation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/62—Record carriers characterised by the selection of the material
    • G11B5/68—Record carriers characterised by the selection of the material comprising one or more layers of magnetisable material homogeneously mixed with a bonding agent
    • G11B5/70—Record carriers characterised by the selection of the material comprising one or more layers of magnetisable material homogeneously mixed with a bonding agent on a base layer
    • G11B5/714—Record carriers characterised by the selection of the material comprising one or more layers of magnetisable material homogeneously mixed with a bonding agent on a base layer characterised by the dimension of the magnetic particles
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
    • H01F1/147—Alloys characterised by their composition
    • H01F1/153—Amorphous metallic alloys, e.g. glassy metals
    • H01F1/15341—Preparation processes therefor
    • H01F1/1535—Preparation processes therefor by powder metallurgy, e.g. spark erosion
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F1/00—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties
    • H01F1/01—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials
    • H01F1/03—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity
    • H01F1/12—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials
    • H01F1/14—Magnets or magnetic bodies characterised by the magnetic materials therefor; Selection of materials for their magnetic properties of inorganic materials characterised by their coercivity of soft-magnetic materials metals or alloys
    • H01F1/147—Alloys characterised by their composition
    • H01F1/153—Amorphous metallic alloys, e.g. glassy metals
    • H01F1/15358—Making agglomerates therefrom, e.g. by pressing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Power Engineering (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Physical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Manufacture Of Metal Powder And Suspensions Thereof (AREA)
  • Manufacturing Of Magnetic Record Carriers (AREA)

Claims (5)

SCHWABE ■ SANDMAIR MARX PATENTANWÄLTE STUNTZSTRASSE 16 8000 MÜNCHEN 80 013 5118 EP 84 10 9457.6 RESEARCH DEVELOPMENT CORPORATION OF JAPAN et al. Anwaltsakte: 50 479 Patentansprüche
1. Verfahren zum Herstellen feiner Partikel, dadurch
gekennzeichnet, daß metallische oder nichtmetallische Materialien in einem inerten Gas oder in einem Gasgemisch aus einem inertem Gas und einem reaktionsfähigen Gas, wie Sauerstoffgas, auf ein Substrat mit feinen Ansätzen, welche auf dessen Oberfläche dicht ausgebildet sind, aufgedampft werden, wobei der Gasdruck des inerten Gases oder des Gasgemisches im Bereich von
-4 -1
1 χ 10 Torr bis 1 χ 10 Torr liegt, und daß metallische oder nicht-metallische feine Partikel mit einer kristallinen oder amorphen Struktur auf das Substrat aufgebracht werden.
2. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß die feinen Ansätze durch ein Sputter-A'tzverfahren mit Hilfe eines ionisierten Gases 0 gleichförmig auf der Oberfläche des Substrats aufgebildet werden.
3. Verfahren nach Anspruch 1, dadurch g;.-e kennze ichnet, daß die feinen,auf dem Substrat aus-5 gebildeten Ansätze eine Höhe von mindestens 0,05 μπι und einen Durchmesser haben, der im wesentlichen von 0,01 bis 5 μπι reicht, und daß die Anzahl der Ansätze pro Flächeneinheit im wesentlichen in dem Bereich von
1 χ 103 bis 2 χ 108/mm2 liegt.
— 2 —
* (089) 988272-74 Telekopierei. (089) 983049 Bankkonten: Bayer Vereinsbank München 453100 (BLZ 70020270)
Telex. 524 560 Swan d KaIIe Intotec 6350 Gr Il + III Hypo-Bank München 4410122850 (BLZ 70020011) Swift Code HYPODEMM
Postgiro München 65343-806 (BLZ 70010080)
4. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß die Temperatur des Substrats während des Bedampfens in einem Temperaturbereich gehalten ist, der nicht über 3000C hinausgeht.
5. Verfahren nach Anspruch 1, dadurch gekennzeichnet, daß ferromagnetische Substanz als das Material ausgewählt ist, das auf das Substrat aufzudampfen ist. 10
DE198484109457T 1983-08-10 1984-08-08 Verfahren zur herstellung von feinen partikeln. Pending DE135118T1 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58144923A JPS6039106A (ja) 1983-08-10 1983-08-10 微粒子の製造方法

Publications (1)

Publication Number Publication Date
DE135118T1 true DE135118T1 (de) 1985-09-26

Family

ID=15373361

Family Applications (2)

Application Number Title Priority Date Filing Date
DE198484109457T Pending DE135118T1 (de) 1983-08-10 1984-08-08 Verfahren zur herstellung von feinen partikeln.
DE8484109457T Expired - Lifetime DE3484036D1 (de) 1983-08-10 1984-08-08 Verfahren zur herstellung von feinen partikeln.

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE8484109457T Expired - Lifetime DE3484036D1 (de) 1983-08-10 1984-08-08 Verfahren zur herstellung von feinen partikeln.

Country Status (4)

Country Link
US (1) US4584078A (de)
EP (1) EP0135118B1 (de)
JP (1) JPS6039106A (de)
DE (2) DE135118T1 (de)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6150211A (ja) * 1984-08-20 1986-03-12 Res Dev Corp Of Japan 垂直磁気記録媒体およびその製法
JPS6261601A (ja) * 1985-09-09 1987-03-18 Shigeki Yatani スパツタリングによる粒子の作成方法
US4818567A (en) * 1986-10-14 1989-04-04 Gte Products Corporation Coated metallic particles and process for producing same
US4873148A (en) * 1986-10-14 1989-10-10 Gte Products Corporation Coated metallic particles and process for producing same
EP0303324A1 (de) * 1987-08-10 1989-02-15 Koninklijke Philips Electronics N.V. Magnetisches Material, Verfahren zum Herstellen dieses Materials und mit diesem Material versehener Magnetkopf
DE3802811A1 (de) * 1988-01-30 1989-08-10 Starck Hermann C Fa Agglomerierte metall-verbund-pulver, verfahren zu ihrer herstellung sowie deren verwendung
US4872905A (en) * 1988-05-11 1989-10-10 The United States Of America As Represented By The United States Department Of Energy Method of producing non-agglomerating submicron size particles
JPH03105224U (de) * 1990-02-14 1991-10-31
DE4214723C2 (de) * 1992-05-04 1994-08-25 Starck H C Gmbh Co Kg Feinteilige Metallpulver
DE4214722C2 (de) * 1992-05-04 1994-08-25 Starck H C Gmbh Co Kg Feinteilige Metallpulver
JP2823494B2 (ja) * 1993-09-29 1998-11-11 健 増本 非晶質金属超微粒子及びその製造方法
JP4344019B2 (ja) * 1997-05-28 2009-10-14 キヤノンアネルバ株式会社 イオン化スパッタ方法
US6803235B1 (en) * 2000-06-15 2004-10-12 Honeywell International Inc. Methods of generating information about materials present in compositions and about particulates present in fluids utilizing a microscope
JP2003041305A (ja) 2001-07-27 2003-02-13 Fuji Photo Film Co Ltd 超微粒子、並びに、その製造方法及び製造装置
JP6158155B2 (ja) * 2014-09-22 2017-07-05 尾池工業株式会社 ハイドロキシアパタイト粒子の製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3303116A (en) * 1964-10-09 1967-02-07 Ibm Process for cathodically sputtering magnetic thin films
DE2702283C3 (de) * 1976-01-20 1980-12-11 Matsushita Electric Works, Ltd., Kadoma, Osaka (Japan) Übertragungsmaterial für rauhe Oberflächen und Verfahren zu dessen Herstellung
JPS57100627A (en) * 1980-12-12 1982-06-22 Teijin Ltd Manufacture of vertical magnetic recording medium
US4396643A (en) * 1981-06-29 1983-08-02 Minnesota Mining And Manufacturing Company Radiation absorbing surfaces

Also Published As

Publication number Publication date
EP0135118A2 (de) 1985-03-27
DE3484036D1 (de) 1991-03-07
EP0135118B1 (de) 1991-01-30
JPS6039106A (ja) 1985-02-28
EP0135118A3 (en) 1987-05-13
US4584078A (en) 1986-04-22
JPS634628B2 (de) 1988-01-29

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