DE1254466B - Kopiermaterial fuer die photomechanische Herstellung von Druckformen und Verfahren zur Herstellung von Druckformen - Google Patents
Kopiermaterial fuer die photomechanische Herstellung von Druckformen und Verfahren zur Herstellung von DruckformenInfo
- Publication number
- DE1254466B DE1254466B DEK42716A DEK0042716A DE1254466B DE 1254466 B DE1254466 B DE 1254466B DE K42716 A DEK42716 A DE K42716A DE K0042716 A DEK0042716 A DE K0042716A DE 1254466 B DE1254466 B DE 1254466B
- Authority
- DE
- Germany
- Prior art keywords
- diazonium
- weight
- printing forms
- diphenylamine
- production
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000007639 printing Methods 0.000 title claims description 27
- 239000000463 material Substances 0.000 title claims description 25
- 238000000034 method Methods 0.000 title claims description 17
- 238000004519 manufacturing process Methods 0.000 title claims description 15
- 239000012954 diazonium Substances 0.000 claims description 93
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 claims description 20
- 229920003986 novolac Polymers 0.000 claims description 19
- -1 diazonium salts Acids Chemical class 0.000 claims description 15
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 claims description 13
- 229920001568 phenolic resin Polymers 0.000 claims description 13
- 239000005011 phenolic resin Substances 0.000 claims description 13
- 239000000203 mixture Substances 0.000 claims description 10
- 150000003460 sulfonic acids Chemical class 0.000 claims description 10
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 7
- 239000003960 organic solvent Substances 0.000 claims description 7
- 239000002253 acid Substances 0.000 claims description 6
- 150000008049 diazo compounds Chemical class 0.000 claims description 5
- 239000000126 substance Substances 0.000 claims description 4
- 238000010438 heat treatment Methods 0.000 claims description 3
- 229930040373 Paraformaldehyde Natural products 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
- 229920002866 paraformaldehyde Polymers 0.000 claims 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N phenol group Chemical group C1(=CC=CC=C1)O ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims 1
- 239000011541 reaction mixture Substances 0.000 claims 1
- 150000001989 diazonium salts Chemical class 0.000 description 38
- 239000000243 solution Substances 0.000 description 27
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 15
- 150000003839 salts Chemical class 0.000 description 11
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 9
- XNWFRZJHXBZDAG-UHFFFAOYSA-N 2-METHOXYETHANOL Chemical compound COCCO XNWFRZJHXBZDAG-UHFFFAOYSA-N 0.000 description 8
- 239000007864 aqueous solution Substances 0.000 description 8
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 8
- QAOWNCQODCNURD-UHFFFAOYSA-M hydrogensulfate Chemical compound OS([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-M 0.000 description 7
- 230000001235 sensitizing effect Effects 0.000 description 7
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 6
- 229910052725 zinc Inorganic materials 0.000 description 6
- 239000011701 zinc Substances 0.000 description 6
- 239000011888 foil Substances 0.000 description 5
- LSNNMFCWUKXFEE-UHFFFAOYSA-M Bisulfite Chemical compound OS([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-M 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- CCIVGXIOQKPBKL-UHFFFAOYSA-M ethanesulfonate Chemical compound CCS([O-])(=O)=O CCIVGXIOQKPBKL-UHFFFAOYSA-M 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- CPELXLSAUQHCOX-UHFFFAOYSA-M Bromide Chemical compound [Br-] CPELXLSAUQHCOX-UHFFFAOYSA-M 0.000 description 3
- ICGLOTCMOYCOTB-UHFFFAOYSA-N [Cl].[Zn] Chemical compound [Cl].[Zn] ICGLOTCMOYCOTB-UHFFFAOYSA-N 0.000 description 3
- 239000000654 additive Substances 0.000 description 3
- 239000004305 biphenyl Substances 0.000 description 3
- 235000010290 biphenyl Nutrition 0.000 description 3
- 125000006267 biphenyl group Chemical group 0.000 description 3
- 239000003610 charcoal Substances 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 239000000084 colloidal system Substances 0.000 description 3
- 239000007859 condensation product Substances 0.000 description 3
- 239000000706 filtrate Substances 0.000 description 3
- ZUOUZKKEUPVFJK-UHFFFAOYSA-N phenylbenzene Natural products C1=CC=CC=C1C1=CC=CC=C1 ZUOUZKKEUPVFJK-UHFFFAOYSA-N 0.000 description 3
- 239000001488 sodium phosphate Substances 0.000 description 3
- 238000003756 stirring Methods 0.000 description 3
- 125000000020 sulfo group Chemical group O=S(=O)([*])O[H] 0.000 description 3
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 3
- 229910000406 trisodium phosphate Inorganic materials 0.000 description 3
- 235000019801 trisodium phosphate Nutrition 0.000 description 3
- FXKMTSIKHBYZSZ-UHFFFAOYSA-N 2-chloroethanesulfonic acid Chemical compound OS(=O)(=O)CCCl FXKMTSIKHBYZSZ-UHFFFAOYSA-N 0.000 description 2
- SSQGALTZSSYGSV-UHFFFAOYSA-M 9h-carbazole-3-diazonium;chloride Chemical compound [Cl-].C1=CC=C2C3=CC([N+]#N)=CC=C3NC2=C1 SSQGALTZSSYGSV-UHFFFAOYSA-M 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 2
- ZXYNGLRGFYLTQZ-UHFFFAOYSA-M [Zn]Cl Chemical compound [Zn]Cl ZXYNGLRGFYLTQZ-UHFFFAOYSA-M 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-O diazynium Chemical group [NH+]#N IJGRMHOSHXDMSA-UHFFFAOYSA-O 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000005530 etching Methods 0.000 description 2
- 150000007522 mineralic acids Chemical class 0.000 description 2
- 238000007645 offset printing Methods 0.000 description 2
- ATGUVEKSASEFFO-UHFFFAOYSA-N p-aminodiphenylamine Chemical compound C1=CC(N)=CC=C1NC1=CC=CC=C1 ATGUVEKSASEFFO-UHFFFAOYSA-N 0.000 description 2
- 235000021317 phosphate Nutrition 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 159000000000 sodium salts Chemical class 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- 125000001424 substituent group Chemical group 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- JIAARYAFYJHUJI-UHFFFAOYSA-L zinc dichloride Chemical compound [Cl-].[Cl-].[Zn+2] JIAARYAFYJHUJI-UHFFFAOYSA-L 0.000 description 2
- AHCDXLAGLYNTIA-UHFFFAOYSA-N 1-n-ethyl-2-methylbenzene-1,4-diamine Chemical compound CCNC1=CC=C(N)C=C1C AHCDXLAGLYNTIA-UHFFFAOYSA-N 0.000 description 1
- HZGDECXEHFCYLL-UHFFFAOYSA-N 1-sulfonaphthalene-2-carboxylic acid Chemical compound C1=CC=CC2=C(S(O)(=O)=O)C(C(=O)O)=CC=C21 HZGDECXEHFCYLL-UHFFFAOYSA-N 0.000 description 1
- PBMBJSDHZUSGNO-UHFFFAOYSA-N 2,4-dimethoxybenzenediazonium Chemical class COC1=CC=C([N+]#N)C(OC)=C1 PBMBJSDHZUSGNO-UHFFFAOYSA-N 0.000 description 1
- HRWJUSVKPYSOSI-UHFFFAOYSA-N 2,5-diethoxy-4-morpholin-4-ylbenzenediazonium Chemical class C1=C([N+]#N)C(OCC)=CC(N2CCOCC2)=C1OCC HRWJUSVKPYSOSI-UHFFFAOYSA-N 0.000 description 1
- NXCOSEIUCIOFNB-UHFFFAOYSA-N 2-aminobenzenediazonium Chemical class NC1=CC=CC=C1[N+]#N NXCOSEIUCIOFNB-UHFFFAOYSA-N 0.000 description 1
- GJYYWZTYFNSZRP-UHFFFAOYSA-N 2-nitrotoluene-4-sulfonic acid Chemical compound CC1=CC=C(S(O)(=O)=O)C=C1[N+]([O-])=O GJYYWZTYFNSZRP-UHFFFAOYSA-N 0.000 description 1
- BMYNFMYTOJXKLE-UHFFFAOYSA-N 3-azaniumyl-2-hydroxypropanoate Chemical compound NCC(O)C(O)=O BMYNFMYTOJXKLE-UHFFFAOYSA-N 0.000 description 1
- IJMIXVXSQKGSPW-UHFFFAOYSA-N 3-hydroxynaphthalene-2,6-disulfonic acid Chemical compound OS(=O)(=O)C1=CC=C2C=C(S(O)(=O)=O)C(O)=CC2=C1 IJMIXVXSQKGSPW-UHFFFAOYSA-N 0.000 description 1
- XFKRPUUIHKVIDM-UHFFFAOYSA-N 4,5-dinitronaphthalene-2,7-disulfonic acid Chemical compound [O-][N+](=O)C1=CC(S(O)(=O)=O)=CC2=CC(S(=O)(=O)O)=CC([N+]([O-])=O)=C21 XFKRPUUIHKVIDM-UHFFFAOYSA-N 0.000 description 1
- VPMZFRCOUNREJJ-UHFFFAOYSA-N 4-(ethylamino)-3-methylbenzenediazonium Chemical class CCNC1=CC=C([N+]#N)C=C1C VPMZFRCOUNREJJ-UHFFFAOYSA-N 0.000 description 1
- RFVCGJSDWIYJML-UHFFFAOYSA-M 4-(ethylamino)-3-methylbenzenediazonium;chloride Chemical compound [Cl-].CCNC1=CC=C([N+]#N)C=C1C RFVCGJSDWIYJML-UHFFFAOYSA-M 0.000 description 1
- ASYHDOGSKLDKOW-UHFFFAOYSA-N 4-chloronaphthalene-1-sulfonic acid Chemical compound C1=CC=C2C(S(=O)(=O)O)=CC=C(Cl)C2=C1 ASYHDOGSKLDKOW-UHFFFAOYSA-N 0.000 description 1
- HJEHIUPJUBJFLX-UHFFFAOYSA-N 4-cyanonaphthalene-2-sulfonic acid Chemical compound C(#N)C1=CC(=CC2=CC=CC=C12)S(=O)(=O)O HJEHIUPJUBJFLX-UHFFFAOYSA-N 0.000 description 1
- XIQKALDENTUXBY-UHFFFAOYSA-N 4-hydroxynaphthalene-1,5-disulfonic acid Chemical compound C1=CC(S(O)(=O)=O)=C2C(O)=CC=C(S(O)(=O)=O)C2=C1 XIQKALDENTUXBY-UHFFFAOYSA-N 0.000 description 1
- QNGVNLMMEQUVQK-UHFFFAOYSA-N 4-n,4-n-diethylbenzene-1,4-diamine Chemical compound CCN(CC)C1=CC=C(N)C=C1 QNGVNLMMEQUVQK-UHFFFAOYSA-N 0.000 description 1
- ZDTXQHVBLWYPHS-UHFFFAOYSA-N 4-nitrotoluene-2-sulfonic acid Chemical compound CC1=CC=C([N+]([O-])=O)C=C1S(O)(=O)=O ZDTXQHVBLWYPHS-UHFFFAOYSA-N 0.000 description 1
- GDBANHJMXDZUNE-UHFFFAOYSA-N 5-hydroxynaphthalene-2-sulfonic acid Chemical compound OS(=O)(=O)C1=CC=C2C(O)=CC=CC2=C1 GDBANHJMXDZUNE-UHFFFAOYSA-N 0.000 description 1
- WETKSLNBZAJSRO-UHFFFAOYSA-N 6-bromonaphthalene-2-sulfonic acid Chemical compound C1=C(Br)C=CC2=CC(S(=O)(=O)O)=CC=C21 WETKSLNBZAJSRO-UHFFFAOYSA-N 0.000 description 1
- KMXMLAGYNHELHA-UHFFFAOYSA-N 8-hydroxynaphthalene-1,3,6-trisulfonic acid Chemical compound OS(=O)(=O)C1=CC(S(O)(=O)=O)=C2C(O)=CC(S(O)(=O)=O)=CC2=C1 KMXMLAGYNHELHA-UHFFFAOYSA-N 0.000 description 1
- PLAZXGNBGZYJSA-UHFFFAOYSA-N 9-ethylcarbazole Chemical compound C1=CC=C2N(CC)C3=CC=CC=C3C2=C1 PLAZXGNBGZYJSA-UHFFFAOYSA-N 0.000 description 1
- KXJXOKOJVNKCGS-UHFFFAOYSA-N 9h-carbazole-1-diazonium Chemical class C12=CC=CC=C2NC2=C1C=CC=C2[N+]#N KXJXOKOJVNKCGS-UHFFFAOYSA-N 0.000 description 1
- RGCKGOZRHPZPFP-UHFFFAOYSA-N Alizarin Natural products C1=CC=C2C(=O)C3=C(O)C(O)=CC=C3C(=O)C2=C1 RGCKGOZRHPZPFP-UHFFFAOYSA-N 0.000 description 1
- BKGXMGUYQJTWOT-UHFFFAOYSA-N ClC=1C=C(C(=C(C=1)[N+](=O)[O-])Cl)S(=O)(=O)O Chemical compound ClC=1C=C(C(=C(C=1)[N+](=O)[O-])Cl)S(=O)(=O)O BKGXMGUYQJTWOT-UHFFFAOYSA-N 0.000 description 1
- BZORFPDSXLZWJF-UHFFFAOYSA-N N,N-dimethyl-1,4-phenylenediamine Chemical compound CN(C)C1=CC=C(N)C=C1 BZORFPDSXLZWJF-UHFFFAOYSA-N 0.000 description 1
- GRYLNZFGIOXLOG-UHFFFAOYSA-N Nitric acid Chemical compound O[N+]([O-])=O GRYLNZFGIOXLOG-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- QAOWNCQODCNURD-UHFFFAOYSA-L Sulfate Chemical compound [O-]S([O-])(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-L 0.000 description 1
- XSTXAVWGXDQKEL-UHFFFAOYSA-N Trichloroethylene Chemical group ClC=C(Cl)Cl XSTXAVWGXDQKEL-UHFFFAOYSA-N 0.000 description 1
- ZEMIXUJRZZOWNR-UHFFFAOYSA-L [Cl-].[Zn+].[Cl-].O1CCN(CC1)C1=CC(=C(C=C1OCC)[N+]#N)OCC Chemical compound [Cl-].[Zn+].[Cl-].O1CCN(CC1)C1=CC(=C(C=C1OCC)[N+]#N)OCC ZEMIXUJRZZOWNR-UHFFFAOYSA-L 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- HFVAFDPGUJEFBQ-UHFFFAOYSA-M alizarin red S Chemical compound [Na+].O=C1C2=CC=CC=C2C(=O)C2=C1C=C(S([O-])(=O)=O)C(O)=C2O HFVAFDPGUJEFBQ-UHFFFAOYSA-M 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001447 alkali salts Chemical class 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 150000001408 amides Chemical class 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 150000001450 anions Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- 239000012298 atmosphere Substances 0.000 description 1
- 239000002585 base Substances 0.000 description 1
- CIZVQWNPBGYCGK-UHFFFAOYSA-N benzenediazonium Chemical class N#[N+]C1=CC=CC=C1 CIZVQWNPBGYCGK-UHFFFAOYSA-N 0.000 description 1
- 238000004061 bleaching Methods 0.000 description 1
- 230000001680 brushing effect Effects 0.000 description 1
- 229910052793 cadmium Inorganic materials 0.000 description 1
- BDOSMKKIYDKNTQ-UHFFFAOYSA-N cadmium atom Chemical compound [Cd] BDOSMKKIYDKNTQ-UHFFFAOYSA-N 0.000 description 1
- 239000007795 chemical reaction product Substances 0.000 description 1
- 150000001805 chlorine compounds Chemical class 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 239000012141 concentrate Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 1
- DMBHHRLKUKUOEG-UHFFFAOYSA-N diphenylamine Chemical class C=1C=CC=CC=1NC1=CC=CC=C1 DMBHHRLKUKUOEG-UHFFFAOYSA-N 0.000 description 1
- 239000012153 distilled water Substances 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000975 dye Substances 0.000 description 1
- 150000002148 esters Chemical class 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007646 gravure printing Methods 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- KQSBZNJFKWOQQK-UHFFFAOYSA-N hystazarin Natural products O=C1C2=CC=CC=C2C(=O)C2=C1C=C(O)C(O)=C2 KQSBZNJFKWOQQK-UHFFFAOYSA-N 0.000 description 1
- 239000004615 ingredient Substances 0.000 description 1
- 150000002576 ketones Chemical class 0.000 description 1
- 238000007644 letterpress printing Methods 0.000 description 1
- WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
- 239000012452 mother liquor Substances 0.000 description 1
- KVBGVZZKJNLNJU-UHFFFAOYSA-N naphthalene-2-sulfonic acid Chemical compound C1=CC=CC2=CC(S(=O)(=O)O)=CC=C21 KVBGVZZKJNLNJU-UHFFFAOYSA-N 0.000 description 1
- 229910017604 nitric acid Inorganic materials 0.000 description 1
- HVFSJXUIRWUHRG-UHFFFAOYSA-N oic acid Natural products C1CC2C3CC=C4CC(OC5C(C(O)C(O)C(CO)O5)O)CC(O)C4(C)C3CCC2(C)C1C(C)C(O)CC(C)=C(C)C(=O)OC1OC(COC(C)=O)C(O)C(O)C1OC(C(C1O)O)OC(COC(C)=O)C1OC1OC(CO)C(O)C(O)C1O HVFSJXUIRWUHRG-UHFFFAOYSA-N 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- SQYNKIJPMDEDEG-UHFFFAOYSA-N paraldehyde Chemical compound CC1OC(C)OC(C)O1 SQYNKIJPMDEDEG-UHFFFAOYSA-N 0.000 description 1
- 229960003868 paraldehyde Drugs 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 150000003013 phosphoric acid derivatives Chemical class 0.000 description 1
- 230000036211 photosensitivity Effects 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 125000002924 primary amino group Chemical group [H]N([H])* 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- DLOBKMWCBFOUHP-UHFFFAOYSA-N pyrene-1-sulfonic acid Chemical compound C1=C2C(S(=O)(=O)O)=CC=C(C=C3)C2=C2C3=CC=CC2=C1 DLOBKMWCBFOUHP-UHFFFAOYSA-N 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000012800 visualization Methods 0.000 description 1
- 235000005074 zinc chloride Nutrition 0.000 description 1
- 239000011592 zinc chloride Substances 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Priority Applications (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL273552D NL273552A (en, 2012) | 1961-01-25 | ||
| BE613039D BE613039A (en, 2012) | 1961-01-25 | ||
| NL132291D NL132291C (en, 2012) | 1961-01-25 | ||
| DEK42716A DE1254466B (de) | 1961-01-25 | 1961-01-25 | Kopiermaterial fuer die photomechanische Herstellung von Druckformen und Verfahren zur Herstellung von Druckformen |
| GB1838/62A GB944884A (en) | 1961-01-25 | 1962-01-18 | Photomechanical preparation of printing plates |
| US168247A US3219447A (en) | 1961-01-25 | 1962-01-23 | Material for the photo mechanical manufacture of printing plates and method for converting the same into printing plates |
| CH87362A CH417334A (de) | 1961-01-25 | 1962-01-24 | Kopiermaterial für die photomechanische Herstellung von Druckformen und seine Verwendung für Druckformen |
| FR885963A FR1322189A (fr) | 1961-01-25 | 1962-01-25 | Matériel de reproduction pour la préparation de formes d'impression et procédé pour transformer ce matériel en formes d'impression |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DEK42716A DE1254466B (de) | 1961-01-25 | 1961-01-25 | Kopiermaterial fuer die photomechanische Herstellung von Druckformen und Verfahren zur Herstellung von Druckformen |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DE1254466B true DE1254466B (de) | 1967-11-16 |
Family
ID=7222857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DEK42716A Pending DE1254466B (de) | 1961-01-25 | 1961-01-25 | Kopiermaterial fuer die photomechanische Herstellung von Druckformen und Verfahren zur Herstellung von Druckformen |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US3219447A (en, 2012) |
| BE (1) | BE613039A (en, 2012) |
| CH (1) | CH417334A (en, 2012) |
| DE (1) | DE1254466B (en, 2012) |
| GB (1) | GB944884A (en, 2012) |
| NL (2) | NL273552A (en, 2012) |
Families Citing this family (23)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| NL267931A (en, 2012) * | 1960-08-05 | 1900-01-01 | ||
| US3382069A (en) * | 1964-06-18 | 1968-05-07 | Azoplate Corp | Planographic printing plate |
| US3778270A (en) * | 1970-11-12 | 1973-12-11 | Du Pont | Photosensitive bis-diazonium salt compositions and elements |
| GB1347759A (en) * | 1971-06-17 | 1974-02-27 | Howson Algraphy Ltd | Light sensitive materials |
| US3847614A (en) * | 1971-09-13 | 1974-11-12 | Scott Paper Co | Diazo photopolymer composition and article comprising carboxylated resin |
| DE2641099A1 (de) * | 1976-09-13 | 1978-03-16 | Hoechst Ag | Lichtempfindliche kopierschicht |
| US4132553A (en) * | 1977-03-24 | 1979-01-02 | Polychrome Corporation | Color proofing guide |
| US4401743A (en) * | 1980-04-30 | 1983-08-30 | Minnesota Mining And Manufacturing Company | Aqueous developable photosensitive composition and printing plate |
| US4408532A (en) * | 1980-04-30 | 1983-10-11 | Minnesota Mining And Manufacturing Company | Lithographic printing plate with oleophilic area of radiation exposed adduct of diazo resin and sulfonated polymer |
| US4326020A (en) * | 1980-09-10 | 1982-04-20 | Polychrome Corporation | Method of making positive acting diazo lithographic printing plate |
| US4403028A (en) * | 1981-01-26 | 1983-09-06 | Andrews Paper & Chemical Co., Inc. | Light sensitive diazonium salts and diazotype materials |
| US4533619A (en) * | 1982-03-18 | 1985-08-06 | American Hoechst Corporation | Acid stabilizers for diazonium compound condensation products |
| DE3308395A1 (de) * | 1983-03-09 | 1984-09-13 | Hoechst Ag, 6230 Frankfurt | Zweikomponenten-diazotypiematerial |
| JPS603632A (ja) * | 1983-06-21 | 1985-01-10 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| DE3541723A1 (de) * | 1985-11-26 | 1987-05-27 | Hoechst Ag | Lichtempfindliches, diazoniumgruppen enthaltendes polykondensationsprodukt, verfahren zu seiner herstellung und lichtempfindliches aufzeichnungsmaterial, das dieses polykondensationsprodukt enthaelt |
| JPH0693116B2 (ja) * | 1986-01-21 | 1994-11-16 | 富士写真フイルム株式会社 | 感光性組成物 |
| JP2768692B2 (ja) * | 1988-08-01 | 1998-06-25 | 株式会社日立製作所 | 感放射線組成物及びパターン形成方法 |
| US5290666A (en) * | 1988-08-01 | 1994-03-01 | Hitachi, Ltd. | Method of forming a positive photoresist pattern utilizing contrast enhancement overlayer containing trifluoromethanesulfonic, methanesulfonic or trifluoromethaneacetic aromatic diazonium salt |
| US5002856A (en) * | 1989-08-02 | 1991-03-26 | E. I. Du Pont De Nemours And Company | Thermally stable carbazole diazonium salts as sources of photo-initiated strong acid |
| US5200291A (en) * | 1989-11-13 | 1993-04-06 | Hoechst Celanese Corporation | Photosensitive diazonium resin, element made therefrom, method of preparing the resin and method for producing negative lithographic image utilizing the resin |
| US5219711A (en) * | 1990-04-10 | 1993-06-15 | E. I. Du Pont De Nemours And Company | Positive image formation utilizing resist material with carbazole diazonium salt acid generator |
| US5370965A (en) * | 1991-12-10 | 1994-12-06 | Fuji Photo Film Co., Ltd. | Positive-working light-sensitive composition containing diazonium salt and novolak resin |
| EP4321547A1 (en) * | 2022-08-12 | 2024-02-14 | Prefere Resins Holding GmbH | Crosslinkable systems |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE865109C (de) * | 1949-07-23 | 1953-01-29 | Kalle & Co Ag | Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen |
| DE879205C (de) * | 1949-09-13 | 1953-06-11 | Kalle & Co Ag | Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares licht-empfindliches Material |
| DE1053930B (de) * | 1957-08-01 | 1959-03-26 | Kalle & Co Ag | Lichtempfindliches Material fuer die Herstellung von Druckplatten auf photomechanischem Wege |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3010389A (en) * | 1953-03-09 | 1961-11-28 | Buskes Willem Marie | Photographic transfer printing plates |
| NL231268A (en, 2012) * | 1956-12-28 | |||
| NL247299A (en, 2012) * | 1959-01-14 |
-
0
- NL NL132291D patent/NL132291C/xx active
- BE BE613039D patent/BE613039A/xx unknown
- NL NL273552D patent/NL273552A/xx unknown
-
1961
- 1961-01-25 DE DEK42716A patent/DE1254466B/de active Pending
-
1962
- 1962-01-18 GB GB1838/62A patent/GB944884A/en not_active Expired
- 1962-01-23 US US168247A patent/US3219447A/en not_active Expired - Lifetime
- 1962-01-24 CH CH87362A patent/CH417334A/de unknown
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE865109C (de) * | 1949-07-23 | 1953-01-29 | Kalle & Co Ag | Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen |
| DE894959C (de) * | 1949-07-23 | 1953-10-29 | Kalle & Co Ag | Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares Material |
| DE879205C (de) * | 1949-09-13 | 1953-06-11 | Kalle & Co Ag | Verfahren zur Herstellung von Kopien, besonders Druckformen, mit Hilfe von Diazoverbindungen und dafuer verwendbares licht-empfindliches Material |
| DE1053930B (de) * | 1957-08-01 | 1959-03-26 | Kalle & Co Ag | Lichtempfindliches Material fuer die Herstellung von Druckplatten auf photomechanischem Wege |
Also Published As
| Publication number | Publication date |
|---|---|
| NL132291C (en, 2012) | |
| GB944884A (en) | 1963-12-18 |
| US3219447A (en) | 1965-11-23 |
| CH417334A (de) | 1966-07-15 |
| NL273552A (en, 2012) | |
| BE613039A (en, 2012) |
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