DE1230147B - Verfahren und Vorrichtung zur Herstellung eines Strahlenbuendels elektrisch leitender gasfoermiger Materie in einer Vakuumkammer - Google Patents

Verfahren und Vorrichtung zur Herstellung eines Strahlenbuendels elektrisch leitender gasfoermiger Materie in einer Vakuumkammer

Info

Publication number
DE1230147B
DE1230147B DEE25556A DEE0025556A DE1230147B DE 1230147 B DE1230147 B DE 1230147B DE E25556 A DEE25556 A DE E25556A DE E0025556 A DEE0025556 A DE E0025556A DE 1230147 B DE1230147 B DE 1230147B
Authority
DE
Germany
Prior art keywords
electrically conductive
matter
bundle
rays
particles
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
DEE25556A
Other languages
German (de)
English (en)
Inventor
Marcel Haegi
Charles Maisonnier
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
European Atomic Energy Community Euratom
Original Assignee
European Atomic Energy Community Euratom
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by European Atomic Energy Community Euratom filed Critical European Atomic Energy Community Euratom
Publication of DE1230147B publication Critical patent/DE1230147B/de
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/54—Plasma accelerators
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
    • H01F6/00—Superconducting magnets; Superconducting coils
    • H01F6/06—Coils, e.g. winding, insulating, terminating or casing arrangements therefor
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
DEE25556A 1962-10-29 1963-09-20 Verfahren und Vorrichtung zur Herstellung eines Strahlenbuendels elektrisch leitender gasfoermiger Materie in einer Vakuumkammer Pending DE1230147B (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
BE498951 1962-10-29

Publications (1)

Publication Number Publication Date
DE1230147B true DE1230147B (de) 1966-12-08

Family

ID=3844717

Family Applications (1)

Application Number Title Priority Date Filing Date
DEE25556A Pending DE1230147B (de) 1962-10-29 1963-09-20 Verfahren und Vorrichtung zur Herstellung eines Strahlenbuendels elektrisch leitender gasfoermiger Materie in einer Vakuumkammer

Country Status (6)

Country Link
US (1) US3395307A (fr)
BE (1) BE624165A (fr)
DE (1) DE1230147B (fr)
GB (1) GB1032446A (fr)
LU (1) LU44422A1 (fr)
NL (1) NL299056A (fr)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA976599A (en) * 1971-04-08 1975-10-21 Senichi Masuda Electrified particles generating apparatus
RU2566620C2 (ru) * 2013-12-24 2015-10-27 Сергей Николаевич Зубов Способ и топливо для компаунд-синтеза, воздушно-реактивный двигатель на компаунд-синтезе и турбоэлектромашинный агрегат для него (варианты)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3239717A (en) * 1962-02-26 1966-03-08 Goodrich High Voltage Astronau Method and apparatus for dispersing glomerate particles

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
None *

Also Published As

Publication number Publication date
BE624165A (fr)
GB1032446A (en) 1966-06-08
US3395307A (en) 1968-07-30
NL299056A (fr)
LU44422A1 (fr) 1963-11-13

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