DE1211334B - Halbleiterbauelement mit eingelassenen Zonen - Google Patents
Halbleiterbauelement mit eingelassenen ZonenInfo
- Publication number
- DE1211334B DE1211334B DEF39664A DEF0039664A DE1211334B DE 1211334 B DE1211334 B DE 1211334B DE F39664 A DEF39664 A DE F39664A DE F0039664 A DEF0039664 A DE F0039664A DE 1211334 B DE1211334 B DE 1211334B
- Authority
- DE
- Germany
- Prior art keywords
- zone
- semiconductor
- electrode
- conductivity type
- semiconductor component
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims description 111
- 239000000463 material Substances 0.000 claims description 14
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 7
- 229910052710 silicon Inorganic materials 0.000 claims description 7
- 239000010703 silicon Substances 0.000 claims description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 4
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- 230000007704 transition Effects 0.000 description 22
- 230000006798 recombination Effects 0.000 description 14
- 238000005215 recombination Methods 0.000 description 14
- 239000002184 metal Substances 0.000 description 7
- 230000008901 benefit Effects 0.000 description 6
- 230000000903 blocking effect Effects 0.000 description 5
- 230000008859 change Effects 0.000 description 4
- 239000013078 crystal Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000009471 action Effects 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 230000008030 elimination Effects 0.000 description 3
- 238000003379 elimination reaction Methods 0.000 description 3
- 239000004020 conductor Substances 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 206010012289 Dementia Diseases 0.000 description 1
- 239000002800 charge carrier Substances 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 238000005562 fading Methods 0.000 description 1
- 230000002349 favourable effect Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 239000013641 positive control Substances 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000717 retained effect Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 239000002699 waste material Substances 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
- H01L29/749—Thyristor-type devices, e.g. having four-zone regenerative action with turn-on by field effect
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/04—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body
- H01L27/06—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration
- H01L27/07—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common
- H01L27/0705—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type
- H01L27/0711—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors
- H01L27/0716—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers the substrate being a semiconductor body including a plurality of individual components in a non-repetitive configuration the components having an active region in common comprising components of the field effect type in combination with bipolar transistors and diodes, or capacitors, or resistors in combination with vertical bipolar transistors and diodes, or capacitors, or resistors
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/72—Transistor-type devices, i.e. able to continuously respond to applied control signals
- H01L29/73—Bipolar junction transistors
- H01L29/7302—Bipolar junction transistors structurally associated with other devices
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L29/00—Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
- H01L29/66—Types of semiconductor device ; Multistep manufacturing processes therefor
- H01L29/68—Types of semiconductor device ; Multistep manufacturing processes therefor controllable by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
- H01L29/70—Bipolar devices
- H01L29/74—Thyristor-type devices, e.g. having four-zone regenerative action
- H01L29/744—Gate-turn-off devices
- H01L29/745—Gate-turn-off devices with turn-off by field effect
- H01L29/7455—Gate-turn-off devices with turn-off by field effect produced by an insulated gate structure
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K17/00—Electronic switching or gating, i.e. not by contact-making and –breaking
- H03K17/51—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used
- H03K17/56—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices
- H03K17/72—Electronic switching or gating, i.e. not by contact-making and –breaking characterised by the components used by the use, as active elements, of semiconductor devices having more than two PN junctions; having more than three electrodes; having more than one electrode connected to the same conductivity region
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03K—PULSE TECHNIQUE
- H03K3/00—Circuits for generating electric pulses; Monostable, bistable or multistable circuits
- H03K3/02—Generators characterised by the type of circuit or by the means used for producing pulses
- H03K3/35—Generators characterised by the type of circuit or by the means used for producing pulses by the use, as active elements, of bipolar semiconductor devices with more than two PN junctions, or more than three electrodes, or more than one electrode connected to the same conductivity region
Landscapes
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Ceramic Engineering (AREA)
- Thyristors (AREA)
- Light Receiving Elements (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201456A US3243669A (en) | 1962-06-11 | 1962-06-11 | Surface-potential controlled semiconductor device |
Publications (1)
Publication Number | Publication Date |
---|---|
DE1211334B true DE1211334B (de) | 1966-02-24 |
Family
ID=22745889
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DEF39664A Pending DE1211334B (de) | 1962-06-11 | 1963-05-07 | Halbleiterbauelement mit eingelassenen Zonen |
Country Status (5)
Country | Link |
---|---|
US (1) | US3243669A (no) |
DE (1) | DE1211334B (no) |
FR (1) | FR1362724A (no) |
GB (1) | GB1033537A (no) |
NL (1) | NL293292A (no) |
Cited By (19)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1803026A1 (de) * | 1967-10-13 | 1971-02-11 | Gen Electric | Halbleiterbauelement und Verfahren zu seiner Herstellung |
DE2904424A1 (de) * | 1979-02-06 | 1980-08-07 | Siemens Ag | Thyristor mit steuerung durch feldeffekttransistor |
DE2915885A1 (de) * | 1979-04-19 | 1980-10-23 | Siemens Ag | Thyristor mit steuerung durch feldeffekttransistor |
DE2945366A1 (de) * | 1979-11-09 | 1981-05-14 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit steuerbaren emitter-kurzschluessen |
DE2945391A1 (de) * | 1979-11-09 | 1981-05-21 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit einem abschaltbaren emitter-kurzschluss |
DE2945335A1 (de) * | 1979-11-09 | 1981-06-04 | Siemens AG, 1000 Berlin und 8000 München | Lichtzuendbarer thyristor |
DE3112942A1 (de) * | 1981-03-31 | 1982-10-07 | Siemens AG, 1000 Berlin und 8000 München | Thyristor und verfahren zu seinem betrieb |
DE3112940A1 (de) * | 1981-03-31 | 1982-10-07 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit anschaltbarer innerer stromverstaerkerung und verfahren zu seinem betrieb |
DE3112941A1 (de) * | 1981-03-31 | 1982-10-07 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit innerer stromverstaerkung und verfahren zu seinem betrieb |
EP0065173A2 (de) * | 1981-05-08 | 1982-11-24 | Siemens Aktiengesellschaft | Thyristor mit verbessertem Schaltverhalten |
EP0065174A2 (de) * | 1981-05-08 | 1982-11-24 | Siemens Aktiengesellschaft | Verfahren zum Betrieb eines Thyristors mit steuerbaren Emitterkurzschlüssen |
DE3118318A1 (de) * | 1981-05-08 | 1982-11-25 | Siemens AG, 1000 Berlin und 8000 München | Lichtzuendbarer thyristor mit steuerbaren emitter-kurzschlusspfaden und verfahren zu seinem betrieb |
DE3118365A1 (de) * | 1981-05-08 | 1982-11-25 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit in den emitter eingefuegten steuerbaren emitter-kurzschlusspfaden |
DE3118317A1 (de) * | 1981-05-08 | 1982-11-25 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit hilfsemitterelektrode und kurzschlussgebieten sowie verfahren zu seinem betrieb |
DE3118347A1 (de) * | 1981-05-08 | 1982-11-25 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit gategesteuerten mis-fet-strukturen des verarmungstyps und verfahren zu seinem betrieb |
DE3118291A1 (de) * | 1981-05-08 | 1982-12-02 | Siemens AG, 1000 Berlin und 8000 München | Triac und verfahren zu seinem betrieb |
DE3118293A1 (de) * | 1981-05-08 | 1982-12-02 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit verbessertem schaltverhalten und verfahren zu seinem betrieb |
DE3118353A1 (de) * | 1979-11-09 | 1982-12-09 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit abschaltbarem emitter-kurzschluss |
EP0179230A2 (de) * | 1984-09-27 | 1986-04-30 | Siemens Aktiengesellschaft | Thyristor mit erhöhter dI/dt-Festigkeit |
Families Citing this family (37)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
NL274830A (no) * | 1961-04-12 | |||
US3404304A (en) * | 1964-04-30 | 1968-10-01 | Texas Instruments Inc | Semiconductor junction device for generating optical radiation |
US3408543A (en) * | 1964-06-01 | 1968-10-29 | Hitachi Ltd | Combination capacitor and fieldeffect transistor |
BE666834A (no) * | 1964-07-13 | |||
GB1095412A (no) * | 1964-08-26 | |||
GB1086128A (en) * | 1964-10-23 | 1967-10-04 | Motorola Inc | Fabrication of four-layer switch with controlled breakdown voltage |
US3484309A (en) * | 1964-11-09 | 1969-12-16 | Solitron Devices | Semiconductor device with a portion having a varying lateral resistivity |
US3372318A (en) * | 1965-01-22 | 1968-03-05 | Gen Electric | Semiconductor switches |
US3456168A (en) * | 1965-02-19 | 1969-07-15 | United Aircraft Corp | Structure and method for production of narrow doped region semiconductor devices |
US3397326A (en) * | 1965-03-30 | 1968-08-13 | Westinghouse Electric Corp | Bipolar transistor with field effect biasing means |
US3667115A (en) * | 1965-06-30 | 1972-06-06 | Ibm | Fabrication of semiconductor devices with cup-shaped regions |
US3346785A (en) * | 1965-08-19 | 1967-10-10 | Itt | Hidden emitter switching device |
US3459944A (en) * | 1966-01-04 | 1969-08-05 | Ibm | Photosensitive insulated gate field effect transistor |
GB1174899A (en) * | 1966-04-15 | 1969-12-17 | Westinghouse Brake & Signal | Improvements relating to Controllable Rectifier Devices |
US3600642A (en) * | 1968-11-15 | 1971-08-17 | David F Allison | Mos structure with precisely controlled channel length and method |
US3597640A (en) * | 1969-04-10 | 1971-08-03 | Nat Semiconductor Corp | Short circuit protection means for semiconductive circuit apparatus |
NL161923C (nl) * | 1969-04-18 | 1980-03-17 | Philips Nv | Halfgeleiderinrichting. |
BE756139A (fr) * | 1969-09-15 | 1971-02-15 | Rca Corp | Circuit intermediaire integre pour le couplage d'un circuit de commandea impedance de sortie faible a une charge a impedance d'entree elevee |
JPS5135114B1 (no) * | 1970-12-28 | 1976-09-30 | ||
US3711940A (en) * | 1971-02-08 | 1973-01-23 | Signetics Corp | Method for making mos structure with precisely controlled channel length |
US3684933A (en) * | 1971-06-21 | 1972-08-15 | Itt | Semiconductor device showing at least three successive zones of alternate opposite conductivity type |
US3740621A (en) * | 1971-08-30 | 1973-06-19 | Rca Corp | Transistor employing variable resistance ballasting means dependent on the magnitude of the emitter current |
US3858234A (en) * | 1973-01-08 | 1974-12-31 | Motorola Inc | Transistor having improved safe operating area |
DE2835089A1 (de) * | 1978-08-10 | 1980-03-20 | Siemens Ag | Thyristor |
DE2945324A1 (de) * | 1979-11-09 | 1981-05-21 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit verbessertem schaltverhalten |
DE2945380A1 (de) * | 1979-11-09 | 1981-05-21 | Siemens AG, 1000 Berlin und 8000 München | Triac mit einem mehrschichten-halbleiterkoerper |
DE2945347A1 (de) * | 1979-11-09 | 1981-05-21 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit hilfsemitterelektrode und verfahren zu seinem betrieb |
DE3018499A1 (de) * | 1980-05-14 | 1981-11-19 | Siemens AG, 1000 Berlin und 8000 München | Halbleiterbauelement |
DE3018542A1 (de) * | 1980-05-14 | 1981-11-19 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit steuerbarem emitter-kurzschluss und verfahren zu seinem betrieb |
US5111268A (en) * | 1981-12-16 | 1992-05-05 | General Electric Company | Semiconductor device with improved turn-off capability |
DE3227536A1 (de) * | 1982-01-20 | 1983-07-28 | Robert Bosch Gmbh, 7000 Stuttgart | Darlington-transistorschaltung |
DE3201545A1 (de) * | 1982-01-20 | 1983-07-28 | Robert Bosch Gmbh, 7000 Stuttgart | Planare halbleiteranordnung |
JPS6174362A (ja) * | 1984-09-19 | 1986-04-16 | Hitachi Ltd | 半導体装置 |
EP0180003A3 (de) * | 1984-09-28 | 1988-01-13 | Siemens Aktiengesellschaft | Bipolarer Leistungstransistor |
EP0176771A3 (de) * | 1984-09-28 | 1988-01-13 | Siemens Aktiengesellschaft | Bipolarer Leistungstransistor mit veränderbarer Durchbruchspannung |
US4742377A (en) * | 1985-02-21 | 1988-05-03 | General Instrument Corporation | Schottky barrier device with doped composite guard ring |
US5736863A (en) * | 1996-06-19 | 1998-04-07 | Taiwan Semiconductor Manufacturing Company, Ltd. | Abatement of electron beam charging distortion during dimensional measurements of integrated circuit patterns with scanning electron microscopy by the utilization of specially designed test structures |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2981877A (en) * | 1959-07-30 | 1961-04-25 | Fairchild Semiconductor | Semiconductor device-and-lead structure |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
BE489418A (no) * | 1948-06-26 | |||
US2900531A (en) * | 1957-02-28 | 1959-08-18 | Rca Corp | Field-effect transistor |
US3097308A (en) * | 1959-03-09 | 1963-07-09 | Rca Corp | Semiconductor device with surface electrode producing electrostatic field and circuits therefor |
NL260481A (no) * | 1960-02-08 | |||
NL265382A (no) * | 1960-03-08 | |||
US3124703A (en) * | 1960-06-13 | 1964-03-10 | Figure | |
US3090873A (en) * | 1960-06-21 | 1963-05-21 | Bell Telephone Labor Inc | Integrated semiconductor switching device |
NL267831A (no) * | 1960-08-17 |
-
0
- NL NL293292D patent/NL293292A/xx unknown
-
1962
- 1962-06-11 US US201456A patent/US3243669A/en not_active Expired - Lifetime
-
1963
- 1963-04-10 GB GB14256/63A patent/GB1033537A/en not_active Expired
- 1963-05-07 DE DEF39664A patent/DE1211334B/de active Pending
- 1963-05-09 FR FR934291A patent/FR1362724A/fr not_active Expired
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US2981877A (en) * | 1959-07-30 | 1961-04-25 | Fairchild Semiconductor | Semiconductor device-and-lead structure |
Cited By (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1803026A1 (de) * | 1967-10-13 | 1971-02-11 | Gen Electric | Halbleiterbauelement und Verfahren zu seiner Herstellung |
DE2904424A1 (de) * | 1979-02-06 | 1980-08-07 | Siemens Ag | Thyristor mit steuerung durch feldeffekttransistor |
DE2915885A1 (de) * | 1979-04-19 | 1980-10-23 | Siemens Ag | Thyristor mit steuerung durch feldeffekttransistor |
EP0017980B1 (de) * | 1979-04-19 | 1983-10-12 | Siemens Aktiengesellschaft | Thyristor mit Steuerung durch Feldeffekttransistor |
DE2945366A1 (de) * | 1979-11-09 | 1981-05-14 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit steuerbaren emitter-kurzschluessen |
DE2945391A1 (de) * | 1979-11-09 | 1981-05-21 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit einem abschaltbaren emitter-kurzschluss |
DE2945335A1 (de) * | 1979-11-09 | 1981-06-04 | Siemens AG, 1000 Berlin und 8000 München | Lichtzuendbarer thyristor |
DE3118353A1 (de) * | 1979-11-09 | 1982-12-09 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit abschaltbarem emitter-kurzschluss |
DE3112942A1 (de) * | 1981-03-31 | 1982-10-07 | Siemens AG, 1000 Berlin und 8000 München | Thyristor und verfahren zu seinem betrieb |
DE3112940A1 (de) * | 1981-03-31 | 1982-10-07 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit anschaltbarer innerer stromverstaerkerung und verfahren zu seinem betrieb |
DE3112941A1 (de) * | 1981-03-31 | 1982-10-07 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit innerer stromverstaerkung und verfahren zu seinem betrieb |
DE3118365A1 (de) * | 1981-05-08 | 1982-11-25 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit in den emitter eingefuegten steuerbaren emitter-kurzschlusspfaden |
DE3118293A1 (de) * | 1981-05-08 | 1982-12-02 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit verbessertem schaltverhalten und verfahren zu seinem betrieb |
DE3118317A1 (de) * | 1981-05-08 | 1982-11-25 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit hilfsemitterelektrode und kurzschlussgebieten sowie verfahren zu seinem betrieb |
DE3118347A1 (de) * | 1981-05-08 | 1982-11-25 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit gategesteuerten mis-fet-strukturen des verarmungstyps und verfahren zu seinem betrieb |
EP0065671A2 (de) * | 1981-05-08 | 1982-12-01 | Siemens Aktiengesellschaft | Thyristor mit Hilfsemitterelektrode und Kurzschlussgebieten sowie Verfahren zu seinem Betrieb |
DE3118291A1 (de) * | 1981-05-08 | 1982-12-02 | Siemens AG, 1000 Berlin und 8000 München | Triac und verfahren zu seinem betrieb |
DE3118305A1 (de) * | 1981-05-08 | 1982-12-02 | Siemens AG, 1000 Berlin und 8000 München | Thyristor mit verbessertem schaltverhalten sowie verfahren zu seinem betrieb |
DE3118318A1 (de) * | 1981-05-08 | 1982-11-25 | Siemens AG, 1000 Berlin und 8000 München | Lichtzuendbarer thyristor mit steuerbaren emitter-kurzschlusspfaden und verfahren zu seinem betrieb |
EP0065174A2 (de) * | 1981-05-08 | 1982-11-24 | Siemens Aktiengesellschaft | Verfahren zum Betrieb eines Thyristors mit steuerbaren Emitterkurzschlüssen |
EP0065173A3 (en) * | 1981-05-08 | 1983-09-14 | Siemens Aktiengesellschaft | Thyristor having particular switching characteristics and process for its operation |
EP0065174A3 (en) * | 1981-05-08 | 1983-09-14 | Siemens Aktiengesellschaft | Thyristor having controllable emitter shortings and shorted regions, and process for its operation |
EP0065671A3 (en) * | 1981-05-08 | 1983-09-14 | Siemens Aktiengesellschaft | Thyristor having an auxiliary emitter electrode and shorted regions, and process for its operation |
EP0065173A2 (de) * | 1981-05-08 | 1982-11-24 | Siemens Aktiengesellschaft | Thyristor mit verbessertem Schaltverhalten |
EP0179230A2 (de) * | 1984-09-27 | 1986-04-30 | Siemens Aktiengesellschaft | Thyristor mit erhöhter dI/dt-Festigkeit |
EP0179230A3 (de) * | 1984-09-27 | 1987-11-04 | Siemens Aktiengesellschaft | Thyristor mit erhöhter dI/dt-Festigkeit |
Also Published As
Publication number | Publication date |
---|---|
GB1033537A (en) | 1966-06-22 |
US3243669A (en) | 1966-03-29 |
NL293292A (no) | |
FR1362724A (fr) | 1964-06-05 |
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Publication | Publication Date | Title |
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DE1211334B (de) | Halbleiterbauelement mit eingelassenen Zonen | |
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DE2266041C2 (no) | ||
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