DE112006004261B4 - Gerät zum Verhindern der Kontamination von Siliciumschmelze - Google Patents

Gerät zum Verhindern der Kontamination von Siliciumschmelze Download PDF

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Publication number
DE112006004261B4
DE112006004261B4 DE112006004261.0T DE112006004261T DE112006004261B4 DE 112006004261 B4 DE112006004261 B4 DE 112006004261B4 DE 112006004261 T DE112006004261 T DE 112006004261T DE 112006004261 B4 DE112006004261 B4 DE 112006004261B4
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Germany
Prior art keywords
shielding body
single crystal
thermal shielding
crystal silicon
dust
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DE112006004261.0T
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German (de)
English (en)
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DE112006004261A5 (de
Inventor
Daisuke Ebi
Koichi Shimomura
Makoto Kamogawa
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Sumco Techxiv Corp
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Sumco Techxiv Corp
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    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
    • C30B29/02—Elements
    • C30B29/06—Silicon
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
    • C30B15/14—Heating of the melt or the crystallised materials
    • C—CHEMISTRY; METALLURGY
    • C30—CRYSTAL GROWTH
    • C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
    • C30B35/00—Apparatus not otherwise provided for, specially adapted for the growth, production or after-treatment of single crystals or of a homogeneous polycrystalline material with defined structure
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling
    • Y10T117/1068—Seed pulling including heating or cooling details [e.g., shield configuration]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1032—Seed pulling
    • Y10T117/1072—Seed pulling including details of means providing product movement [e.g., shaft guides, servo means]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
    • Y10T117/10—Apparatus
    • Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
    • Y10T117/1076—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone
    • Y10T117/1088—Apparatus for crystallization from liquid or supercritical state having means for producing a moving solid-liquid-solid zone including heating or cooling details

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE112006004261.0T 2005-09-27 2006-06-27 Gerät zum Verhindern der Kontamination von Siliciumschmelze Active DE112006004261B4 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005-279979 2005-09-27
JP2005279979A JP4349493B2 (ja) 2005-09-27 2005-09-27 単結晶シリコン引き上げ装置、シリコン融液の汚染防止方法及びシリコン融液の汚染防止装置

Publications (2)

Publication Number Publication Date
DE112006004261A5 DE112006004261A5 (de) 2012-09-20
DE112006004261B4 true DE112006004261B4 (de) 2017-04-13

Family

ID=37899488

Family Applications (2)

Application Number Title Priority Date Filing Date
DE112006004261.0T Active DE112006004261B4 (de) 2005-09-27 2006-06-27 Gerät zum Verhindern der Kontamination von Siliciumschmelze
DE112006002580.5T Active DE112006002580B4 (de) 2005-09-27 2006-06-27 Einkristallsiliciumziehgerät und Verfahren zum Verhindern der Kontamination von Siliciumschmelze

Family Applications After (1)

Application Number Title Priority Date Filing Date
DE112006002580.5T Active DE112006002580B4 (de) 2005-09-27 2006-06-27 Einkristallsiliciumziehgerät und Verfahren zum Verhindern der Kontamination von Siliciumschmelze

Country Status (6)

Country Link
US (2) US8404046B2 (enExample)
JP (1) JP4349493B2 (enExample)
KR (2) KR101311911B1 (enExample)
DE (2) DE112006004261B4 (enExample)
TW (1) TW200714753A (enExample)
WO (1) WO2007037052A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017220352B4 (de) 2017-11-15 2023-02-02 Siltronic Ag Verfahren zum Überprüfen einer Vorrichtung zum Ziehen eines Einkristalls und Vorrichtung zum Ziehen eines Einkristalls

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5186970B2 (ja) * 2008-03-24 2013-04-24 信越半導体株式会社 単結晶製造装置及びその方法
KR101871059B1 (ko) * 2016-11-17 2018-07-20 에스케이실트론 주식회사 단결정 잉곳 성장장치
JP6760128B2 (ja) 2017-02-24 2020-09-23 株式会社Sumco シリコン単結晶の製造方法、整流部材、および、単結晶引き上げ装置
DE102018217509A1 (de) * 2018-10-12 2020-04-16 Siltronic Ag Vorrichtung zum Ziehen eines Einkristalls aus Halbleitermaterial nach der CZ-Methode aus einer Schmelze und Verfahren unter Verwendung der Vorrichtung
CN111663178A (zh) * 2019-03-08 2020-09-15 宁夏隆基硅材料有限公司 直拉单晶用热屏装置及单晶硅生产设备
DE112021005336T5 (de) * 2020-12-10 2023-07-20 Shin-Etsu Handotai Co., Ltd. Vorrichtung zur herstellung eines einkristalls

Citations (1)

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JP2001039798A (ja) * 1999-07-23 2001-02-13 Mitsubishi Materials Silicon Corp シリコン単結晶引上げ装置の熱遮蔽部材

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JPH04209789A (ja) * 1990-11-30 1992-07-31 Toshiba Ceramics Co Ltd 単結晶シリコン引上げ装置
JP2783049B2 (ja) * 1992-02-28 1998-08-06 信越半導体株式会社 単結晶シリコン棒の製造方法及び製造装置
JP2952733B2 (ja) * 1992-10-09 1999-09-27 コマツ電子金属株式会社 シリコン単結晶製造方法
JP2807609B2 (ja) * 1993-01-28 1998-10-08 三菱マテリアルシリコン株式会社 単結晶の引上装置
DE19503357A1 (de) * 1995-02-02 1996-08-08 Wacker Siltronic Halbleitermat Vorrichtung zur Herstellung eines Einkristalls
JP2937109B2 (ja) * 1996-02-29 1999-08-23 住友金属工業株式会社 単結晶の製造装置および製造方法
JP3992800B2 (ja) * 1997-09-22 2007-10-17 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 単結晶製造装置および単結晶の製造方法
JP4195738B2 (ja) * 1998-04-08 2008-12-10 Ｓｕｍｃｏ Ｔｅｃｈｘｉｖ株式会社 単結晶製造装置
TW588127B (en) * 2000-02-01 2004-05-21 Komatsu Denshi Kinzoku Kk Apparatus for pulling single crystal by CZ method
JP3573045B2 (ja) * 2000-02-08 2004-10-06 三菱住友シリコン株式会社 高品質シリコン単結晶の製造方法
US6277351B1 (en) * 2000-03-20 2001-08-21 Carl Francis Swinehart Crucible for growing macrocrystals
US6482263B1 (en) * 2000-10-06 2002-11-19 Memc Electronic Materials, Inc. Heat shield assembly for crystal pulling apparatus
EP2295619B1 (en) * 2001-01-26 2014-04-23 MEMC Electronic Materials, Inc. Process for producing Low Defect Density Silicon Having a Vacancy-Dominated Core Substantially Free of Oxidation Induced Stacking Faults
JP2002321997A (ja) 2001-04-20 2002-11-08 Shin Etsu Handotai Co Ltd シリコン単結晶の製造装置及びそれを用いたシリコン単結晶の製造方法
JP5086504B2 (ja) 2001-05-28 2012-11-28 東日本メディコム株式会社 携帯電話を用いたｉｃカード保険証システム
KR100445188B1 (ko) 2001-08-31 2004-08-18 주식회사 실트론 복사열 흡수용 코팅제 및 코팅제를이용한 실리콘 단결정 잉곳 성장장치
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JP2001039798A (ja) * 1999-07-23 2001-02-13 Mitsubishi Materials Silicon Corp シリコン単結晶引上げ装置の熱遮蔽部材

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102017220352B4 (de) 2017-11-15 2023-02-02 Siltronic Ag Verfahren zum Überprüfen einer Vorrichtung zum Ziehen eines Einkristalls und Vorrichtung zum Ziehen eines Einkristalls

Also Published As

Publication number Publication date
KR20080042146A (ko) 2008-05-14
US8404046B2 (en) 2013-03-26
TW200714753A (en) 2007-04-16
US9080251B2 (en) 2015-07-14
JP4349493B2 (ja) 2009-10-21
JP2007091493A (ja) 2007-04-12
WO2007037052A1 (ja) 2007-04-05
US20090229512A1 (en) 2009-09-17
KR101311911B1 (ko) 2013-09-27
TWI324642B (enExample) 2010-05-11
KR101327064B1 (ko) 2013-11-07
US20120222613A1 (en) 2012-09-06
KR20130045932A (ko) 2013-05-06
DE112006004261A5 (de) 2012-09-20
DE112006002580T5 (de) 2008-08-14
DE112006002580B4 (de) 2017-02-23

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