DE102020214800A1 - Feldfacettensystem und lithographieanlage - Google Patents

Feldfacettensystem und lithographieanlage Download PDF

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Publication number
DE102020214800A1
DE102020214800A1 DE102020214800.7A DE102020214800A DE102020214800A1 DE 102020214800 A1 DE102020214800 A1 DE 102020214800A1 DE 102020214800 A DE102020214800 A DE 102020214800A DE 102020214800 A1 DE102020214800 A1 DE 102020214800A1
Authority
DE
Germany
Prior art keywords
facet
section
elements
base body
field facet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
DE102020214800.7A
Other languages
German (de)
English (en)
Inventor
Arno Schmittner
Willi Anderl
Ralf Ameling
Stefan Lippoldt
Joram Rosseels
Rob Wilhelmus Maria Janssen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Priority to DE102020214800.7A priority Critical patent/DE102020214800A1/de
Priority to CN202180078715.7A priority patent/CN116472499A/zh
Priority to JP2023530825A priority patent/JP7796125B2/ja
Priority to PCT/EP2021/082009 priority patent/WO2022112071A1/de
Publication of DE102020214800A1 publication Critical patent/DE102020214800A1/de
Priority to US18/318,508 priority patent/US12547080B2/en
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0825—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a flexible sheet or membrane, e.g. for varying the focus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
    • G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
    • G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/0891—Ultraviolet [UV] mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/08—Mirrors
    • G02B5/09—Multifaceted or polygonal mirrors, e.g. polygonal scanning mirrors; Fresnel mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
    • G02B7/18—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors
    • G02B7/181—Mountings, adjusting means, or light-tight connections, for optical elements for prisms; for mirrors with means for compensating for changes in temperature or for controlling the temperature; thermal stabilisation
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system
    • G03F7/70891—Temperature
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G02B17/0647—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors
    • G02B17/0663—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror using more than three curved mirrors off-axis or unobscured systems in which not all of the mirrors share a common axis of rotational symmetry, e.g. at least one of the mirrors is warped, tilted or decentered with respect to the other elements

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
DE102020214800.7A 2020-11-25 2020-11-25 Feldfacettensystem und lithographieanlage Withdrawn DE102020214800A1 (de)

Priority Applications (5)

Application Number Priority Date Filing Date Title
DE102020214800.7A DE102020214800A1 (de) 2020-11-25 2020-11-25 Feldfacettensystem und lithographieanlage
CN202180078715.7A CN116472499A (zh) 2020-11-25 2021-11-17 场分面系统和光刻设备
JP2023530825A JP7796125B2 (ja) 2020-11-25 2021-11-17 視野ファセットシステム及びリソグラフィ装置
PCT/EP2021/082009 WO2022112071A1 (de) 2020-11-25 2021-11-17 Feldfacettensystem und lithographieanlage
US18/318,508 US12547080B2 (en) 2020-11-25 2023-05-16 Field facet system and lithography apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102020214800.7A DE102020214800A1 (de) 2020-11-25 2020-11-25 Feldfacettensystem und lithographieanlage

Publications (1)

Publication Number Publication Date
DE102020214800A1 true DE102020214800A1 (de) 2022-05-25

Family

ID=78820403

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102020214800.7A Withdrawn DE102020214800A1 (de) 2020-11-25 2020-11-25 Feldfacettensystem und lithographieanlage

Country Status (5)

Country Link
US (1) US12547080B2 (cg-RX-API-DMAC7.html)
JP (1) JP7796125B2 (cg-RX-API-DMAC7.html)
CN (1) CN116472499A (cg-RX-API-DMAC7.html)
DE (1) DE102020214800A1 (cg-RX-API-DMAC7.html)
WO (1) WO2022112071A1 (cg-RX-API-DMAC7.html)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022116695A1 (de) * 2022-07-05 2024-01-11 Carl Zeiss Smt Gmbh Grundkörper für ein optisches Element und Verfahren zur Herstellung eines Grundkörpers für ein optisches Element sowie Projektionsbelichtungsanlage
WO2024240628A3 (de) * 2023-05-22 2025-01-16 Carl Zeiss Smt Gmbh Verfahren zum betreiben eines festkörperaktuators in einer mikrolithographischen projektionsbelichtungsanlage

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102024204402A1 (de) * 2024-05-13 2025-11-13 Carl Zeiss Smt Gmbh Anordnung und Verfahren zur Kalibrierung eines MEMS mit Mikrospiegeln

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10151919A1 (de) 2001-10-20 2003-05-15 Zeiss Carl Optisches Element mit einer optischen Achse
DE102013206981A1 (de) 2013-04-18 2013-12-24 Carl Zeiss Smt Gmbh Facettenspiegel mit im Krümmungsradius einstellbaren Spiegel-Facetten und Verfahren hierzu
DE102017221420A1 (de) 2017-11-29 2018-11-29 Carl Zeiss Smt Gmbh Euv-beleuchtungssystem und verfahren zum erzeugen einer beleuchtungsstrahlung

Family Cites Families (17)

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TW575771B (en) * 2000-07-13 2004-02-11 Asml Netherlands Bv Lithographic apparatus, device manufacturing method, and device manufactured thereby
US6880942B2 (en) * 2002-06-20 2005-04-19 Nikon Corporation Adaptive optic with discrete actuators for continuous deformation of a deformable mirror system
DE102005004460A1 (de) * 2005-02-01 2006-08-10 Carl Zeiss Smt Ag Verfahren und Messmittel zur indirekten Bestimmung der örtlichen Bestrahlungsstärke in einem optischen System
DE102008049616B4 (de) 2008-09-30 2012-03-29 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Mikrolithographie zur Herstellung von Halbleiterbauelementen
DE102009054869B4 (de) 2009-04-09 2022-02-17 Carl Zeiss Smt Gmbh Spiegel zur Führung eines Strahlungsbündels, Vorrichtungen mit einem derartigen Spiegel sowie Verfahren zur Herstellung mikro- oder nanostrukturierter Bauelemente
US8320229B2 (en) * 2009-11-12 2012-11-27 Hitachi Consumer Electronics Co., Ltd. Variable mirror actuator and optical disc drive
JP5727005B2 (ja) * 2010-07-01 2015-06-03 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学系及びマルチファセットミラー
US9291814B2 (en) * 2010-09-22 2016-03-22 Nikon Corporation Spatial light modulator, exposure apparatus, and method for manufacturing device
WO2012175116A1 (en) * 2011-06-21 2012-12-27 Carl Zeiss Smt Gmbh Facet mirror device
EP2906994B1 (en) * 2012-10-15 2020-03-25 ASML Netherlands B.V. Actuation mechanism, optical apparatus, lithography apparatus and method of manufacturing devices
WO2015144370A1 (en) * 2014-03-18 2015-10-01 Asml Netherlands B.V. Housing for an array of densely spaced components and associated manufacturing method
JP6535197B2 (ja) 2014-04-28 2019-06-26 株式会社ブイ・テクノロジー 露光装置及び露光方法
TWI663481B (zh) 2014-06-03 2019-06-21 荷蘭商Ａｓｍｌ荷蘭公司 用於補償一曝光誤差的方法、元件製造方法、基板台、微影裝置、控制系統、用於量測反射率的方法、及用於量測一極紫外線輻射劑量的方法
DE102015223518A1 (de) 2015-11-27 2017-05-18 Carl Zeiss Smt Gmbh Optische Vorrichtung sowie Lithographieanlage
JP6866131B2 (ja) 2016-01-27 2021-04-28 キヤノン株式会社 光学装置、それを備えた露光装置、および物品の製造方法
DE102019200258B4 (de) * 2019-01-11 2020-08-20 Audi Ag Haltevorrichtung zum Anbringen eines mobilen Endgeräts in einem Kraftfahrzeug sowie Kraftfahrzeug mit einer solchen Haltevorrichtung
DE102019200358A1 (de) * 2019-01-14 2019-03-21 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die Halbleiterlithographie mit Mitteln zur Reduzierung des Wärmeübertrags

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10151919A1 (de) 2001-10-20 2003-05-15 Zeiss Carl Optisches Element mit einer optischen Achse
DE102013206981A1 (de) 2013-04-18 2013-12-24 Carl Zeiss Smt Gmbh Facettenspiegel mit im Krümmungsradius einstellbaren Spiegel-Facetten und Verfahren hierzu
DE102017221420A1 (de) 2017-11-29 2018-11-29 Carl Zeiss Smt Gmbh Euv-beleuchtungssystem und verfahren zum erzeugen einer beleuchtungsstrahlung

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102022116695A1 (de) * 2022-07-05 2024-01-11 Carl Zeiss Smt Gmbh Grundkörper für ein optisches Element und Verfahren zur Herstellung eines Grundkörpers für ein optisches Element sowie Projektionsbelichtungsanlage
WO2024240628A3 (de) * 2023-05-22 2025-01-16 Carl Zeiss Smt Gmbh Verfahren zum betreiben eines festkörperaktuators in einer mikrolithographischen projektionsbelichtungsanlage

Also Published As

Publication number Publication date
WO2022112071A1 (de) 2022-06-02
JP2023549968A (ja) 2023-11-29
CN116472499A (zh) 2023-07-21
JP7796125B2 (ja) 2026-01-08
US12547080B2 (en) 2026-02-10
US20230384686A1 (en) 2023-11-30

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