DE102011085599B3 - Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts - Google Patents

Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts Download PDF

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Publication number
DE102011085599B3
DE102011085599B3 DE102011085599A DE102011085599A DE102011085599B3 DE 102011085599 B3 DE102011085599 B3 DE 102011085599B3 DE 102011085599 A DE102011085599 A DE 102011085599A DE 102011085599 A DE102011085599 A DE 102011085599A DE 102011085599 B3 DE102011085599 B3 DE 102011085599B3
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DE
Germany
Prior art keywords
detector
measuring
reference beam
designed
measurement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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DE102011085599A
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German (de)
English (en)
Inventor
Matthias Schüssler
Christian Rembe
Dr. Dräbenstedt Alexander
Robert Kowarsch
Wanja Ochs
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Polytec GmbH
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Polytec GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Polytec GmbH filed Critical Polytec GmbH
Priority to DE102011085599A priority Critical patent/DE102011085599B3/de
Priority to EP12188513.1A priority patent/EP2589924B1/de
Priority to SG2012080263A priority patent/SG189672A1/en
Priority to JP2012242650A priority patent/JP2013096997A/ja
Priority to US13/667,309 priority patent/US10018460B2/en
Priority to CN201210434215.5A priority patent/CN103090786B/zh
Application granted granted Critical
Publication of DE102011085599B3 publication Critical patent/DE102011085599B3/de
Priority to JP2018090906A priority patent/JP6631978B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02022—Interferometers characterised by the beam path configuration contacting one object by grazing incidence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02001—Interferometers characterised by controlling or generating intrinsic radiation properties
    • G01B9/02002—Interferometers characterised by controlling or generating intrinsic radiation properties using two or more frequencies
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B9/00—Measuring instruments characterised by the use of optical techniques
    • G01B9/02—Interferometers
    • G01B9/02015—Interferometers characterised by the beam path configuration
    • G01B9/02027—Two or more interferometric channels or interferometers
    • G01B9/02028—Two or more reference or object arms in one interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/45—Multiple detectors for detecting interferometer signals
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
    • G01B2290/00—Aspects of interferometers not specifically covered by any group under G01B9/02
    • G01B2290/70—Using polarization in the interferometer
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01H—MEASUREMENT OF MECHANICAL VIBRATIONS OR ULTRASONIC, SONIC OR INFRASONIC WAVES
    • G01H9/00—Measuring mechanical vibrations or ultrasonic, sonic or infrasonic waves by using radiation-sensitive means, e.g. optical means

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Instruments For Measurement Of Length By Optical Means (AREA)
  • Investigating Or Analysing Materials By Optical Means (AREA)
DE102011085599A 2011-11-02 2011-11-02 Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts Expired - Fee Related DE102011085599B3 (de)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DE102011085599A DE102011085599B3 (de) 2011-11-02 2011-11-02 Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts
EP12188513.1A EP2589924B1 (de) 2011-11-02 2012-10-15 Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts
SG2012080263A SG189672A1 (en) 2011-11-02 2012-10-30 Device and method for interferometric measuring of an object
JP2012242650A JP2013096997A (ja) 2011-11-02 2012-11-02 物体の光干渉測定装置および光干渉測定方法
US13/667,309 US10018460B2 (en) 2011-11-02 2012-11-02 Interferometric measuring device with detectors set at different angular ranges
CN201210434215.5A CN103090786B (zh) 2011-11-02 2012-11-02 用于用干涉测量法测量物体的装置和方法
JP2018090906A JP6631978B2 (ja) 2011-11-02 2018-05-09 物体の光干渉測定装置および光干渉測定方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE102011085599A DE102011085599B3 (de) 2011-11-02 2011-11-02 Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts

Publications (1)

Publication Number Publication Date
DE102011085599B3 true DE102011085599B3 (de) 2012-12-13

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Family Applications (1)

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DE102011085599A Expired - Fee Related DE102011085599B3 (de) 2011-11-02 2011-11-02 Vorrichtung und Verfahren zur interferometrischen Vermessung eines Objekts

Country Status (6)

Country Link
US (1) US10018460B2 (enExample)
EP (1) EP2589924B1 (enExample)
JP (2) JP2013096997A (enExample)
CN (1) CN103090786B (enExample)
DE (1) DE102011085599B3 (enExample)
SG (1) SG189672A1 (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102024131662B3 (de) * 2024-10-30 2025-11-13 Technische Universität Clausthal, Körperschaft des öffentlichen Rechts Vorrichtung und Verfahren zum kontaktlosen Messen einer Dehnungsänderung eines Messobjekts

Families Citing this family (7)

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Publication number Priority date Publication date Assignee Title
US9829373B1 (en) * 2014-09-19 2017-11-28 The United States Of America As Represented By The Secretary Of The Army Apparatus and method for improving detection precision in laser vibrometric studies
DE102015003019A1 (de) 2015-03-06 2016-09-08 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Verfahren und Vorrichtung zur optischen Detektion einer Bewegung in einer biologischen Probe mit räumlicher Ausdehnung
DE102018111921B4 (de) 2018-05-17 2023-11-23 Technische Universität Clausthal Kontaktloser optischer Dehnungsmesssensor
CN108548489A (zh) * 2018-05-24 2018-09-18 郑州辰维科技股份有限公司 一种利用光学标志对固面天线进行精度测量的方法
CN108548506A (zh) * 2018-05-24 2018-09-18 郑州辰维科技股份有限公司 一种利用光学标志对高精度平面进行平面度测量的方法
CN111307268B (zh) * 2020-03-11 2021-01-01 北京理工大学 激光共焦/差动共焦振动参数测量方法
JP7571616B2 (ja) * 2021-02-26 2024-10-23 セイコーエプソン株式会社 レーザー干渉計

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US5080491A (en) * 1990-01-04 1992-01-14 National Research Council Canada Laser optical ultarasound detection using two interferometer systems
US5229832A (en) * 1991-07-08 1993-07-20 Industrial Quality, Inc. Optical ultrasonic material characterization apparatus and method
DE10393244T5 (de) * 2002-09-09 2005-09-01 Zygo Corp., Middlefield Interferometrisches Verfahren für ellipsometrische, reflektometrische und streulichtanalytische Messungen, einschließlich der Charakterisierung von Dünnfilmstrukturen
DE102008017119A1 (de) * 2008-04-02 2009-10-08 Polytec Gmbh Vibrometer und Verfahren zur optischen Vermessung eines Objekts

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Publication number Priority date Publication date Assignee Title
US5080491A (en) * 1990-01-04 1992-01-14 National Research Council Canada Laser optical ultarasound detection using two interferometer systems
US5229832A (en) * 1991-07-08 1993-07-20 Industrial Quality, Inc. Optical ultrasonic material characterization apparatus and method
DE10393244T5 (de) * 2002-09-09 2005-09-01 Zygo Corp., Middlefield Interferometrisches Verfahren für ellipsometrische, reflektometrische und streulichtanalytische Messungen, einschließlich der Charakterisierung von Dünnfilmstrukturen
DE102008017119A1 (de) * 2008-04-02 2009-10-08 Polytec Gmbh Vibrometer und Verfahren zur optischen Vermessung eines Objekts

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102024131662B3 (de) * 2024-10-30 2025-11-13 Technische Universität Clausthal, Körperschaft des öffentlichen Rechts Vorrichtung und Verfahren zum kontaktlosen Messen einer Dehnungsänderung eines Messobjekts

Also Published As

Publication number Publication date
SG189672A1 (en) 2013-05-31
US20130107276A1 (en) 2013-05-02
CN103090786B (zh) 2017-07-18
JP2018119991A (ja) 2018-08-02
EP2589924A1 (de) 2013-05-08
US10018460B2 (en) 2018-07-10
JP6631978B2 (ja) 2020-01-15
CN103090786A (zh) 2013-05-08
EP2589924B1 (de) 2016-04-20
JP2013096997A (ja) 2013-05-20

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R119 Application deemed withdrawn, or ip right lapsed, due to non-payment of renewal fee