DE102007041455A1 - Musterbildungsverfahren, Musterbildungsvorrichtung, Verfahren zur Herstellung eines Aufzeichnungsmediums und Verfahren zur Herstellung eines gemusterten Elements - Google Patents

Musterbildungsverfahren, Musterbildungsvorrichtung, Verfahren zur Herstellung eines Aufzeichnungsmediums und Verfahren zur Herstellung eines gemusterten Elements Download PDF

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Publication number
DE102007041455A1
DE102007041455A1 DE102007041455A DE102007041455A DE102007041455A1 DE 102007041455 A1 DE102007041455 A1 DE 102007041455A1 DE 102007041455 A DE102007041455 A DE 102007041455A DE 102007041455 A DE102007041455 A DE 102007041455A DE 102007041455 A1 DE102007041455 A1 DE 102007041455A1
Authority
DE
Germany
Prior art keywords
substrate
pulse laser
laser
pattern
photosensitive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
DE102007041455A
Other languages
German (de)
English (en)
Inventor
Naohisa Kawasaki Matsushita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Publication of DE102007041455A1 publication Critical patent/DE102007041455A1/de
Ceased legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
    • G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
    • G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
    • G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0017—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor for the production of embossing, cutting or similar devices; for the production of casting means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/743—Patterned record carriers, wherein the magnetic recording layer is patterned into magnetic isolated data islands, e.g. discrete tracks
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/74—Record carriers characterised by the form, e.g. sheet shaped to wrap around a drum
    • G11B5/82—Disk carriers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/8404—Processes or apparatus specially adapted for manufacturing record carriers manufacturing base layers
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00—Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/84—Processes or apparatus specially adapted for manufacturing record carriers
    • G11B5/855—Coating only part of a support with a magnetic layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Nanotechnology (AREA)
  • Mathematical Physics (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Theoretical Computer Science (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Optical Recording Or Reproduction (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Laser Beam Processing (AREA)
  • Optics & Photonics (AREA)
DE102007041455A 2006-09-11 2007-08-31 Musterbildungsverfahren, Musterbildungsvorrichtung, Verfahren zur Herstellung eines Aufzeichnungsmediums und Verfahren zur Herstellung eines gemusterten Elements Ceased DE102007041455A1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2006245281A JP2008065223A (ja) 2006-09-11 2006-09-11 パターン形成方法、パターン形成装置、記録媒体の製造方法および部材の製造方法
JP2006-245281 2006-09-11

Publications (1)

Publication Number Publication Date
DE102007041455A1 true DE102007041455A1 (de) 2008-03-27

Family

ID=39105329

Family Applications (1)

Application Number Title Priority Date Filing Date
DE102007041455A Ceased DE102007041455A1 (de) 2006-09-11 2007-08-31 Musterbildungsverfahren, Musterbildungsvorrichtung, Verfahren zur Herstellung eines Aufzeichnungsmediums und Verfahren zur Herstellung eines gemusterten Elements

Country Status (3)

Country Link
JP (1) JP2008065223A (ja)
KR (1) KR100876945B1 (ja)
DE (1) DE102007041455A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010074659A1 (en) 2008-12-22 2010-07-01 Helios Applied Systems Pte Ltd 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3754857B2 (ja) 2000-02-03 2006-03-15 キヤノン株式会社 レーザ加工方法
KR100806810B1 (ko) * 2002-03-12 2008-02-25 엘지.필립스 엘시디 주식회사 노광기
JP4477893B2 (ja) 2004-02-13 2010-06-09 株式会社リコー レーザ加工方法及び装置、並びに、レーザ加工方法を使用した構造体の製造方法
JP2006227609A (ja) * 2005-01-24 2006-08-31 Fuji Photo Film Co Ltd 露光方法、凹凸状パターンの形成方法、及び光学素子の製造方法

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2010074659A1 (en) 2008-12-22 2010-07-01 Helios Applied Systems Pte Ltd 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
EP2361402A1 (en) * 2008-12-22 2011-08-31 Helios Applied Systems Pte Ltd 3d mold for manufacture of sub-micron 3d structures using 2-d photon lithography and nanoimprinting and process thereof
EP2361402A4 (en) * 2008-12-22 2014-07-09 Helios Applied Systems Pte Ltd 3D MOLD FOR MANUFACTURING SUBMICRONIC SIZE 3D STRUCTURES USING MULTIPHOTTON AND NANO-PRINTING LITHOGRAPHY AND METHOD THEREOF

Also Published As

Publication number Publication date
KR100876945B1 (ko) 2009-01-07
KR20080023643A (ko) 2008-03-14
JP2008065223A (ja) 2008-03-21

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8131 Rejection