DD297721A5 - Verfahren und vorrichtung zur mikrolithografie im optischen nahfeld - Google Patents
Verfahren und vorrichtung zur mikrolithografie im optischen nahfeld Download PDFInfo
- Publication number
- DD297721A5 DD297721A5 DD90344142A DD34414290A DD297721A5 DD 297721 A5 DD297721 A5 DD 297721A5 DD 90344142 A DD90344142 A DD 90344142A DD 34414290 A DD34414290 A DD 34414290A DD 297721 A5 DD297721 A5 DD 297721A5
- Authority
- DD
- German Democratic Republic
- Prior art keywords
- substrate
- optical fiber
- microlithography
- resin
- optical
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70375—Multiphoton lithography or multiphoton photopolymerization; Imaging systems comprising means for converting one type of radiation into another type of radiation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Nitrogen And Oxygen Or Sulfur-Condensed Heterocyclic Ring Systems (AREA)
- Micromachines (AREA)
- Display Devices Of Pinball Game Machines (AREA)
- Holo Graphy (AREA)
- Steroid Compounds (AREA)
- Silicon Compounds (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Optical Integrated Circuits (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8912497A FR2652423B1 (fr) | 1989-09-22 | 1989-09-22 | Procede de microlithographie pour la realisation de structures superficielles submicrometriques sur un substrat du type d'une plaquette de silicium, ainsi qu'un dispositif le mettant en óoeuvre. |
Publications (1)
Publication Number | Publication Date |
---|---|
DD297721A5 true DD297721A5 (de) | 1992-01-16 |
Family
ID=9385780
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DD90344142A DD297721A5 (de) | 1989-09-22 | 1990-09-21 | Verfahren und vorrichtung zur mikrolithografie im optischen nahfeld |
Country Status (16)
Country | Link |
---|---|
US (1) | US5384464A (xx) |
EP (1) | EP0419369B1 (xx) |
JP (1) | JPH05504655A (xx) |
CN (1) | CN1052559A (xx) |
AT (1) | ATE165675T1 (xx) |
AU (1) | AU6416890A (xx) |
BR (1) | BR9007682A (xx) |
CA (1) | CA2066586A1 (xx) |
DD (1) | DD297721A5 (xx) |
DE (1) | DE69032277T2 (xx) |
FI (1) | FI921211A0 (xx) |
FR (1) | FR2652423B1 (xx) |
HU (1) | HUT62100A (xx) |
OA (1) | OA09538A (xx) |
WO (1) | WO1991004513A1 (xx) |
ZA (1) | ZA907560B (xx) |
Families Citing this family (27)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE69131528T2 (de) * | 1990-05-30 | 2000-05-04 | Hitachi, Ltd. | Verfahren und Vorrichtung zur Behandlung eines sehr kleinen Bereichs einer Probe |
US5226107A (en) * | 1992-06-22 | 1993-07-06 | General Dynamics Corporation, Space Systems Division | Apparatus and method of using fiber-optic light guide for heating enclosed test articles |
US5866911A (en) * | 1994-07-15 | 1999-02-02 | Baer; Stephen C. | Method and apparatus for improving resolution in scanned optical system |
DE19630705A1 (de) | 1995-08-30 | 1997-03-20 | Deutsche Telekom Ag | Verfahren zur Herstellung von 3-dimensional strukturierten Polymerschichten für die integrierte Optik |
WO1997010088A2 (de) | 1995-08-30 | 1997-03-20 | Deutsche Telekom Ag | Verfahren zur verbesserung des kontrastes bei der strukturierung von 3-dimensionalen oberflächen |
DE19632563A1 (de) * | 1996-01-04 | 1997-07-10 | Deutsche Telekom Ag | Verfahren und Vorrichtung zur Herstellung strukturierter lambda/4-Plättchen, Spiegel, Gitter und Prismen auf dreidimensionalen Flächen |
JP3264824B2 (ja) * | 1996-04-11 | 2002-03-11 | セイコーインスツルメンツ株式会社 | 光伝搬体プローブと走査型近視野顕微鏡及び光伝搬体プローブの透過孔形成方法 |
JP2000512397A (ja) * | 1996-06-10 | 2000-09-19 | ホログラフィック リトグラフィー システムズ,インコーポレイティド | 生産環境のためのホログラフィのパターン化の方法及び工具 |
KR20000016497A (ko) | 1996-06-10 | 2000-03-25 | 다니엘 제이. 설리반 | 포토레지스트내에 선택된 불연속 패턴이 기록될 수 있도록 간섭리소그래피를 개조하기 위한 방법 |
US6078055A (en) * | 1997-03-19 | 2000-06-20 | California Institute Of Technology | Proximity lithography device |
US6806477B1 (en) | 1997-05-23 | 2004-10-19 | Canon Kabushiki Kaisha | Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same |
EP0880078A3 (en) * | 1997-05-23 | 2001-02-14 | Canon Kabushiki Kaisha | Position detection device, apparatus using the same, exposure apparatus, and device manufacturing method using the same |
DE19726634A1 (de) * | 1997-06-18 | 1998-12-24 | Biotools Inst Fuer Computerint | Verfahren und Vorrichtung zur Immobilisierung von Makromolekülen |
TW460758B (en) | 1998-05-14 | 2001-10-21 | Holographic Lithography System | A holographic lithography system for generating an interference pattern suitable for selectively exposing a photosensitive material |
AU749884B2 (en) | 1998-08-28 | 2002-07-04 | Febit Ferrarius Biotechnology Gmbh | Support for a method for determining an analyte and a method for producing the support |
US6312876B1 (en) | 1999-07-08 | 2001-11-06 | Taiwan Semiconductor Manufacturing Company | Method for placing identifying mark on semiconductor wafer |
JP4017795B2 (ja) * | 1999-08-27 | 2007-12-05 | 富士フイルム株式会社 | 光波長変換素子およびその作製方法 |
US7167615B1 (en) | 1999-11-05 | 2007-01-23 | Board Of Regents, The University Of Texas System | Resonant waveguide-grating filters and sensors and methods for making and using same |
TW473823B (en) * | 1999-11-18 | 2002-01-21 | Nippon Kogaku Kk | Exposure method as well as exposure apparatus, and method for manufacturing device |
DE10051396A1 (de) | 2000-10-17 | 2002-04-18 | Febit Ferrarius Biotech Gmbh | Verfahren und Vorrichtung zur integrierten Synthese und Analytbestimmung an einem Träger |
US20020145113A1 (en) * | 2001-04-09 | 2002-10-10 | Applied Materials, Inc. | Optical signal transmission for electron beam imaging apparatus |
US20020160427A1 (en) * | 2001-04-27 | 2002-10-31 | Febit Ag | Methods and apparatuses for electronic determination of analytes |
FR2827967B1 (fr) * | 2001-07-26 | 2003-10-24 | Essilor Int | Procede d'impression d'une structure stable photoinduite en champ proche,et pointe de fibre optique pour sa mise en oeuvre |
ES2572748T3 (es) * | 2005-10-12 | 2016-06-02 | Adelaide Research & Innovation Pty Ltd. | Fibra que contiene un nanohilo y su fabricación |
KR101403744B1 (ko) * | 2008-04-07 | 2014-06-03 | 엘지전자 주식회사 | 패터닝 장치 및 방법 |
CN102279556B (zh) * | 2011-06-02 | 2013-07-17 | 中山大学 | 相位全息与近场光学显微镜联用制备功能性光子晶体装置及其应用方法 |
FR3017963B1 (fr) * | 2014-02-27 | 2016-03-25 | Essilor Int | Instrument optique pour identifier et localiser des microgravures presentes sur une lentille ophtalmique |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH461149A (de) * | 1967-05-09 | 1968-08-15 | Conradi G Ag | Einrichtung an einer Zeichenmaschine oder einem Koordinatographen zur mindestens angenähert fehlerfreien Auftragung von Punkten, Linien und Symbolen auf eine zur Führungsebene des Arbeitswagens nicht parallele und/oder nicht plane photographische Schicht |
JPS5694742A (en) * | 1979-12-28 | 1981-07-31 | Jeol Ltd | Electronic beam exposure device |
JPS5849298A (ja) * | 1981-09-18 | 1983-03-23 | 旭光学工業株式会社 | フォト自動製図機における自動合焦装置 |
DE3371946D1 (en) * | 1983-06-17 | 1987-07-09 | Lasarray Holding Ag | Reference determining process for correcting mechanical movements when writing lines in a metallized grid by means of a laser, and apparatus therefor |
EP0283256A3 (en) * | 1987-03-18 | 1990-02-07 | Tektronix Inc. | Scanning optical microscope |
DE69131528T2 (de) * | 1990-05-30 | 2000-05-04 | Hitachi, Ltd. | Verfahren und Vorrichtung zur Behandlung eines sehr kleinen Bereichs einer Probe |
-
1989
- 1989-09-22 FR FR8912497A patent/FR2652423B1/fr not_active Expired - Fee Related
-
1990
- 1990-09-21 AU AU64168/90A patent/AU6416890A/en not_active Abandoned
- 1990-09-21 US US07/842,184 patent/US5384464A/en not_active Expired - Fee Related
- 1990-09-21 EP EP90402617A patent/EP0419369B1/fr not_active Expired - Lifetime
- 1990-09-21 JP JP2513307A patent/JPH05504655A/ja active Pending
- 1990-09-21 ZA ZA907560A patent/ZA907560B/xx unknown
- 1990-09-21 CA CA002066586A patent/CA2066586A1/fr not_active Abandoned
- 1990-09-21 DD DD90344142A patent/DD297721A5/de not_active IP Right Cessation
- 1990-09-21 HU HU9200910A patent/HUT62100A/hu unknown
- 1990-09-21 AT AT90402617T patent/ATE165675T1/de active
- 1990-09-21 BR BR909007682A patent/BR9007682A/pt unknown
- 1990-09-21 DE DE69032277T patent/DE69032277T2/de not_active Expired - Fee Related
- 1990-09-21 WO PCT/FR1990/000682 patent/WO1991004513A1/fr active Application Filing
- 1990-09-22 CN CN90108839A patent/CN1052559A/zh active Pending
-
1992
- 1992-03-20 OA OA60174A patent/OA09538A/fr unknown
- 1992-03-20 FI FI921211A patent/FI921211A0/fi not_active Application Discontinuation
Also Published As
Publication number | Publication date |
---|---|
FR2652423B1 (fr) | 1992-05-22 |
EP0419369A1 (fr) | 1991-03-27 |
ATE165675T1 (de) | 1998-05-15 |
FI921211A (fi) | 1992-03-20 |
WO1991004513A1 (fr) | 1991-04-04 |
EP0419369B1 (fr) | 1998-04-29 |
HU9200910D0 (en) | 1992-08-28 |
AU6416890A (en) | 1991-04-18 |
BR9007682A (pt) | 1992-07-07 |
FR2652423A1 (fr) | 1991-03-29 |
OA09538A (fr) | 1992-11-15 |
US5384464A (en) | 1995-01-24 |
DE69032277T2 (de) | 1998-12-17 |
CN1052559A (zh) | 1991-06-26 |
FI921211A0 (fi) | 1992-03-20 |
HUT62100A (en) | 1993-03-29 |
ZA907560B (en) | 1991-07-31 |
DE69032277D1 (de) | 1998-06-04 |
JPH05504655A (ja) | 1993-07-15 |
CA2066586A1 (fr) | 1991-03-23 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
ENJ | Ceased due to non-payment of renewal fee |