DD151533A5 - Vorbeschichtete widerstandsbehaftete linsenstruktur fuer ein elektronenstrahlsystem und verfahren zu dessen herstellung - Google Patents
Vorbeschichtete widerstandsbehaftete linsenstruktur fuer ein elektronenstrahlsystem und verfahren zu dessen herstellung Download PDFInfo
- Publication number
- DD151533A5 DD151533A5 DD80222026A DD22202680A DD151533A5 DD 151533 A5 DD151533 A5 DD 151533A5 DD 80222026 A DD80222026 A DD 80222026A DD 22202680 A DD22202680 A DD 22202680A DD 151533 A5 DD151533 A5 DD 151533A5
- Authority
- DD
- German Democratic Republic
- Prior art keywords
- blocks
- electrodes
- resistance
- electron beam
- beam system
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 8
- 238000004519 manufacturing process Methods 0.000 title claims description 5
- 239000000463 material Substances 0.000 claims abstract description 22
- 238000000576 coating method Methods 0.000 claims abstract description 19
- 125000006850 spacer group Chemical group 0.000 claims abstract description 17
- 239000012212 insulator Substances 0.000 claims abstract description 11
- 239000011248 coating agent Substances 0.000 claims abstract description 7
- 238000010894 electron beam technology Methods 0.000 claims description 18
- 229910052751 metal Inorganic materials 0.000 claims description 10
- 239000002184 metal Substances 0.000 claims description 10
- 239000000919 ceramic Substances 0.000 claims description 3
- 239000011195 cermet Substances 0.000 abstract description 3
- 239000010408 film Substances 0.000 description 9
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 229910000679 solder Inorganic materials 0.000 description 6
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 4
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 4
- 238000000137 annealing Methods 0.000 description 4
- 239000011104 metalized film Substances 0.000 description 4
- 229910052750 molybdenum Inorganic materials 0.000 description 4
- 239000011733 molybdenum Substances 0.000 description 4
- 229910052721 tungsten Inorganic materials 0.000 description 4
- 239000010937 tungsten Substances 0.000 description 4
- 238000005422 blasting Methods 0.000 description 3
- 238000001465 metallisation Methods 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 239000010936 titanium Substances 0.000 description 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 238000009736 wetting Methods 0.000 description 2
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
- JOCBASBOOFNAJA-UHFFFAOYSA-N N-tris(hydroxymethyl)methyl-2-aminoethanesulfonic acid Chemical compound OCC(CO)(CO)NCCS(O)(=O)=O JOCBASBOOFNAJA-UHFFFAOYSA-N 0.000 description 1
- NEIHULKJZQTQKJ-UHFFFAOYSA-N [Cu].[Ag] Chemical compound [Cu].[Ag] NEIHULKJZQTQKJ-UHFFFAOYSA-N 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- YCKOAAUKSGOOJH-UHFFFAOYSA-N copper silver Chemical compound [Cu].[Ag].[Ag] YCKOAAUKSGOOJH-UHFFFAOYSA-N 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 238000013461 design Methods 0.000 description 1
- 229910003460 diamond Inorganic materials 0.000 description 1
- 239000010432 diamond Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000009713 electroplating Methods 0.000 description 1
- 230000005496 eutectics Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- 239000011810 insulating material Substances 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 238000002955 isolation Methods 0.000 description 1
- 239000003350 kerosene Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 238000009718 spray deposition Methods 0.000 description 1
- 229910001220 stainless steel Inorganic materials 0.000 description 1
- 239000010935 stainless steel Substances 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- MAKDTFFYCIMFQP-UHFFFAOYSA-N titanium tungsten Chemical compound [Ti].[W] MAKDTFFYCIMFQP-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/46—Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
- H01J29/58—Arrangements for focusing or reflecting ray or beam
- H01J29/62—Electrostatic lenses
- H01J29/622—Electrostatic lenses producing fields exhibiting symmetry of revolution
- H01J29/624—Electrostatic lenses producing fields exhibiting symmetry of revolution co-operating with or closely associated to an electron gun
Landscapes
- Electron Sources, Ion Sources (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Electron Beam Exposure (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US06/051,400 US4281270A (en) | 1979-06-25 | 1979-06-25 | Precoated resistive lens structure for electron gun and method of fabrication |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| DD151533A5 true DD151533A5 (de) | 1981-10-21 |
Family
ID=21971068
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| DD80222026A DD151533A5 (de) | 1979-06-25 | 1980-06-20 | Vorbeschichtete widerstandsbehaftete linsenstruktur fuer ein elektronenstrahlsystem und verfahren zu dessen herstellung |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US4281270A (enExample) |
| JP (1) | JPS5829579B2 (enExample) |
| CA (1) | CA1142571A (enExample) |
| DD (1) | DD151533A5 (enExample) |
| DE (1) | DE3023853A1 (enExample) |
| FR (1) | FR2460035A1 (enExample) |
| GB (1) | GB2052149B (enExample) |
| IT (1) | IT1131522B (enExample) |
| PL (1) | PL132278B1 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3704244A (en) * | 1970-09-21 | 1972-11-28 | Eisai Co Ltd | N-lower alkyl-substituted n'-(beta-(2',5'-diphenylpyrolyl - 1')) ethylhomopiperazines |
| US4243912A (en) * | 1979-08-28 | 1981-01-06 | Rca Corporation | Simplified resistive lens electron gun with compound linear voltage profile |
| US4243911A (en) * | 1979-08-28 | 1981-01-06 | Rca Corporation | Resistive lens electron gun with compound linear voltage profile |
| US4323813A (en) * | 1980-01-23 | 1982-04-06 | Rca Corporation | Spring-loaded resistive lens structure for electron gun |
| EP0151120B2 (en) * | 1983-03-21 | 1995-09-06 | Union Oil Company Of California | Method for removing heavy metals from aqueous solutions by coprecipitation |
| EP1096543B1 (en) * | 1998-07-09 | 2009-03-25 | Hamamatsu Photonics K.K. | X-ray tube |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2143390A (en) * | 1933-12-30 | 1939-01-10 | Telefunken Gmbh | Electron tube |
| BE440927A (enExample) * | 1940-05-08 | |||
| US2771566A (en) * | 1953-01-09 | 1956-11-20 | Itt | Cathode ray electron discharge device |
| US3932786A (en) * | 1974-11-29 | 1976-01-13 | Rca Corporation | Electron gun with a multi-element electron lens |
| US4010312A (en) * | 1975-01-23 | 1977-03-01 | Rca Corporation | High resistance cermet film and method of making the same |
| US4091144A (en) * | 1976-05-24 | 1978-05-23 | Rca Corporation | Article with electrically-resistive glaze for use in high-electric fields and method of making same |
-
1979
- 1979-06-25 US US06/051,400 patent/US4281270A/en not_active Expired - Lifetime
-
1980
- 1980-06-06 IT IT22638/80A patent/IT1131522B/it active
- 1980-06-16 FR FR8013307A patent/FR2460035A1/fr active Granted
- 1980-06-16 CA CA000354100A patent/CA1142571A/en not_active Expired
- 1980-06-18 GB GB8019872A patent/GB2052149B/en not_active Expired
- 1980-06-19 PL PL1980225092A patent/PL132278B1/pl unknown
- 1980-06-20 DD DD80222026A patent/DD151533A5/de unknown
- 1980-06-24 JP JP55085800A patent/JPS5829579B2/ja not_active Expired
- 1980-06-25 DE DE19803023853 patent/DE3023853A1/de not_active Ceased
Also Published As
| Publication number | Publication date |
|---|---|
| CA1142571A (en) | 1983-03-08 |
| GB2052149A (en) | 1981-01-21 |
| GB2052149B (en) | 1983-03-09 |
| IT8022638A0 (it) | 1980-06-06 |
| PL225092A1 (enExample) | 1981-04-24 |
| DE3023853A1 (de) | 1981-01-15 |
| IT1131522B (it) | 1986-06-25 |
| PL132278B1 (en) | 1985-02-28 |
| FR2460035A1 (fr) | 1981-01-16 |
| US4281270A (en) | 1981-07-28 |
| FR2460035B1 (enExample) | 1985-04-19 |
| JPS566356A (en) | 1981-01-22 |
| JPS5829579B2 (ja) | 1983-06-23 |
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