CS227003B2 - Method of controlling the manufacture of product sequence - Google Patents

Method of controlling the manufacture of product sequence Download PDF

Info

Publication number
CS227003B2
CS227003B2 CS786502A CS650278A CS227003B2 CS 227003 B2 CS227003 B2 CS 227003B2 CS 786502 A CS786502 A CS 786502A CS 650278 A CS650278 A CS 650278A CS 227003 B2 CS227003 B2 CS 227003B2
Authority
CS
Czechoslovakia
Prior art keywords
thickness
strip
etching
signal
sequence
Prior art date
Application number
CS786502A
Other languages
Czech (cs)
English (en)
Inventor
John J Moscony
George S Gadbois
Original Assignee
Rca Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Co filed Critical Rca Co
Publication of CS227003B2 publication Critical patent/CS227003B2/cs

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/02Local etching
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23FNON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00Etching metallic material by chemical means
    • C23F1/02Local etching
    • C23F1/04Chemical milling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)
CS786502A 1977-10-06 1978-10-06 Method of controlling the manufacture of product sequence CS227003B2 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/840,037 US4126510A (en) 1977-10-06 1977-10-06 Etching a succession of articles from a strip of sheet metal

Publications (1)

Publication Number Publication Date
CS227003B2 true CS227003B2 (en) 1984-04-16

Family

ID=25281300

Family Applications (1)

Application Number Title Priority Date Filing Date
CS786502A CS227003B2 (en) 1977-10-06 1978-10-06 Method of controlling the manufacture of product sequence

Country Status (13)

Country Link
US (1) US4126510A (fi)
JP (1) JPS5814878B2 (fi)
AU (1) AU516585B2 (fi)
CA (1) CA1092497A (fi)
CS (1) CS227003B2 (fi)
DD (1) DD139603A5 (fi)
DE (1) DE2843777A1 (fi)
FI (1) FI782970A (fi)
FR (1) FR2405309A1 (fi)
GB (1) GB2006118B (fi)
IT (1) IT1098979B (fi)
PL (1) PL116906B1 (fi)
RO (1) RO75671A (fi)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4289406A (en) * 1979-03-09 1981-09-15 Rca Corporation Light transmission measurement method
JPS5699943A (en) * 1980-01-16 1981-08-11 Toshiba Corp Manufacture and equipment of shadow mask
JPS6058793B2 (ja) * 1980-03-24 1985-12-21 日電アネルバ株式会社 プラズマ分光監視装置
JPS56156637A (en) * 1980-05-08 1981-12-03 Toshiba Corp Manufacture of shadow mask
US4303466A (en) * 1980-06-19 1981-12-01 Buckbee-Mears Company Process of forming graded aperture masks
US4343686A (en) * 1981-02-27 1982-08-10 Sprague Electric Company Method for controlling etching of electrolytic capacitor foil
US4404515A (en) * 1981-06-29 1983-09-13 Rca Corporation System and method for use with apparatus for sensing bare metal on a moving strip of insulatively coated conductive material
US4351263A (en) * 1981-06-29 1982-09-28 Rca Corporation Apparatus for sensing bare metal on a moving strip of insulatively coated conductive material
JPS5971239A (ja) * 1982-10-15 1984-04-21 Toshiba Corp シヤドウマスクの製造方法
US4400233A (en) * 1982-11-12 1983-08-23 Rca Corporation System and method for controlling an etch line
JPS59158051A (ja) * 1983-02-28 1984-09-07 Toshiba Corp シヤドウマスクの製造方法
US4600470A (en) * 1985-04-16 1986-07-15 Rca Corporation Method for etching small-ratio apertures into a strip of carbon steel
DE3539874A1 (de) * 1985-11-11 1987-05-14 Hoellmueller Maschbau H Anlage zum aetzen von zumindest teilweise aus metall, vorzugsweise kupfer, bestehendem aetzgut
DE3711551A1 (de) * 1987-04-06 1988-10-20 Siemens Ag Verfahren und vorrichtung zum optimalen einstellen des aetzvorgangs beim abaetzen des kupfers beschichteter leiterplatten
US5228949A (en) * 1991-11-07 1993-07-20 Chemcut Corporation Method and apparatus for controlled spray etching
US5387313A (en) * 1992-11-09 1995-02-07 Bmc Industries, Inc. Etchant control system
US5688359A (en) * 1995-07-20 1997-11-18 Micron Technology, Inc. Muffle etch injector assembly
US8037613B2 (en) 2004-09-02 2011-10-18 Rovcal, Inc. Shaving head for rotary shaver and method of manufacturing the same
EP1843711A1 (en) 2004-12-21 2007-10-17 Grace, Christopher Device for the removal of unsightly skin
US9687276B2 (en) * 2007-09-14 2017-06-27 International Edge Inc. Skin removing implement
US20110024307A1 (en) * 2009-07-02 2011-02-03 Dexcom, Inc. Analyte sensor
USD872370S1 (en) 2017-09-22 2020-01-07 Davinci Ii Csj, Llc Abrasive skin treatment device
USD886384S1 (en) 2017-09-22 2020-06-02 Davinci Ii Csj, Llc Abrasive skin treatment device
CN115135805A (zh) * 2020-02-18 2022-09-30 株式会社Posco 工艺控制系统及其操作方法
USD1017136S1 (en) 2020-12-23 2024-03-05 Telebrands Corp. Abrasive skin treatment device
USD1022327S1 (en) 2020-12-23 2024-04-09 International Edge, Inc. Foot file
USD1005504S1 (en) 2020-12-23 2023-11-21 Telebrands Corp. Abrasive skin treatment device
USD1023468S1 (en) 2021-03-29 2024-04-16 Telebrands Corp. Foot file

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3032753A (en) * 1958-05-20 1962-05-01 Arthur D Knapp Apparatus for controlling the depth of etching
US3553052A (en) * 1965-10-24 1971-01-05 Louis A Scholz Etching control device
US3503817A (en) * 1966-01-24 1970-03-31 Fmc Corp Process for controlling metal etching operation
US3585395A (en) * 1966-09-06 1971-06-15 Gen Electric Control of hole size in filters by measuring the amount of radiation passing through holes and correspondingly controlling speed of filter moving through etching bath
DE1812893A1 (de) * 1968-12-05 1970-06-18 Knapsack Ag, 5033 Knapsack Anordnung zur Dickenmessung von Walzgut, insbesondere von Folien
US3832551A (en) * 1972-06-22 1974-08-27 Bethlehem Steel Corp Radiation gage with sample and hold feature in deviation measuring circuit
NL7500246A (nl) * 1975-01-09 1976-07-13 Philips Nv Inrichting voor het etsen van een continu bewe- gende dunne metalen band.

Also Published As

Publication number Publication date
US4126510A (en) 1978-11-21
IT1098979B (it) 1985-09-18
FR2405309A1 (fr) 1979-05-04
JPS5460853A (en) 1979-05-16
IT7828373A0 (it) 1978-10-03
CA1092497A (en) 1980-12-30
GB2006118A (en) 1979-05-02
PL116906B1 (en) 1981-07-31
DE2843777C2 (fi) 1988-09-08
RO75671A (ro) 1981-02-28
AU516585B2 (en) 1981-06-11
DD139603A5 (de) 1980-01-09
FI782970A (fi) 1979-04-07
GB2006118B (en) 1982-01-27
PL210111A1 (pl) 1979-08-27
JPS5814878B2 (ja) 1983-03-22
AU4040878A (en) 1980-04-17
FR2405309B1 (fi) 1984-08-31
DE2843777A1 (de) 1979-04-12

Similar Documents

Publication Publication Date Title
CS227003B2 (en) Method of controlling the manufacture of product sequence
DE69621547T2 (de) Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
US5308447A (en) Endpoint and uniformity determinations in material layer processing through monitoring multiple surface regions across the layer
DE2810025C2 (fi)
KR101121354B1 (ko) 반도체 프로세싱에서 웨이퍼 상에 형성된 구조의 임계 치수를 제어하는 방법 및 시스템
DE68929356T2 (de) Verfahren und Vorrichtung zur Belichtung
KR20130099833A (ko) 노광장치, 노광방법, 및 표시용 패널기판의 제조방법
US4179622A (en) Method and system for in situ control of material removal processes
KR100303257B1 (ko) 중착필름및그형상측정방법,제조공정제어방법,제조방법,형상측정장치및제조공정제어장치
DE19960368A1 (de) System zum mikrolithographischen Schreiben mit verbesserter Genauigkeit
US3348055A (en) Apparatus for monitoring the intensity of a beam of radiant energy
DE102004050642A1 (de) Verfahren zur Überwachung von Parametern eines Belichtungsgerätes für die Immersionslithographie und Belichtungsgerät für die Immersionslithographie
PL116931B1 (en) Process for etching series of articles made of metal stripcheskojj lenty
DE69319363T2 (de) Vorrichtung und Verfahren zur Entwicklung eines Bildes
JPH0697151A (ja) エッチングパターンの作成方法
JPH0674717A (ja) レジスト膜厚測定方法
JPS59104478A (ja) エツチングラインを制御する方法及びその方式
DD152365A5 (de) Verfahren zur praezisionsaetzung einer laufenden folge von artikeln
JPS5870530A (ja) レジストパタ−ン形成方法
JPH09302481A (ja) エッチング加工方法およびエッチング加工装置
JPH0195439A (ja) シャドウマスクの製造方法
JPH1019690A (ja) 基板温度モニタ
JPH0377235A (ja) シャドウマスクの製造装置
JPH11184104A (ja) 電子写真感光体の膜厚測定装置および膜厚測定方法、電子写真感光体の製造装置および製造方法
JPS5630723A (en) Pattern formation by electron beam exposing device