IT7828373A0 - Metodo di attacco chimico per produrre una successione di articoli da un nastro di lamiera. - Google Patents

Metodo di attacco chimico per produrre una successione di articoli da un nastro di lamiera.

Info

Publication number
IT7828373A0
IT7828373A0 IT7828373A IT2837378A IT7828373A0 IT 7828373 A0 IT7828373 A0 IT 7828373A0 IT 7828373 A IT7828373 A IT 7828373A IT 2837378 A IT2837378 A IT 2837378A IT 7828373 A0 IT7828373 A0 IT 7828373A0
Authority
IT
Italy
Prior art keywords
succession
items
producing
sheet metal
etching method
Prior art date
Application number
IT7828373A
Other languages
English (en)
Other versions
IT1098979B (it
Original Assignee
Rca Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rca Corp filed Critical Rca Corp
Publication of IT7828373A0 publication Critical patent/IT7828373A0/it
Application granted granted Critical
Publication of IT1098979B publication Critical patent/IT1098979B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F1/00—Etching metallic material by chemical means
    • C23F1/02—Local etching
    • C23F1/04—Chemical milling

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • ing And Chemical Polishing (AREA)
  • Physical Vapour Deposition (AREA)
IT28373/78A 1977-10-06 1978-10-03 Metodo di attacco chimico per produrre una successione di articoli da un nastro di lamiera IT1098979B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/840,037 US4126510A (en) 1977-10-06 1977-10-06 Etching a succession of articles from a strip of sheet metal

Publications (2)

Publication Number Publication Date
IT7828373A0 true IT7828373A0 (it) 1978-10-03
IT1098979B IT1098979B (it) 1985-09-18

Family

ID=25281300

Family Applications (1)

Application Number Title Priority Date Filing Date
IT28373/78A IT1098979B (it) 1977-10-06 1978-10-03 Metodo di attacco chimico per produrre una successione di articoli da un nastro di lamiera

Country Status (13)

Country Link
US (1) US4126510A (it)
JP (1) JPS5814878B2 (it)
AU (1) AU516585B2 (it)
CA (1) CA1092497A (it)
CS (1) CS227003B2 (it)
DD (1) DD139603A5 (it)
DE (1) DE2843777A1 (it)
FI (1) FI782970A7 (it)
FR (1) FR2405309A1 (it)
GB (1) GB2006118B (it)
IT (1) IT1098979B (it)
PL (1) PL116906B1 (it)
RO (1) RO75671A (it)

Families Citing this family (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4289406A (en) * 1979-03-09 1981-09-15 Rca Corporation Light transmission measurement method
JPS5699943A (en) * 1980-01-16 1981-08-11 Toshiba Corp Manufacture and equipment of shadow mask
JPS6058793B2 (ja) * 1980-03-24 1985-12-21 日電アネルバ株式会社 プラズマ分光監視装置
JPS56156637A (en) * 1980-05-08 1981-12-03 Toshiba Corp Manufacture of shadow mask
US4303466A (en) * 1980-06-19 1981-12-01 Buckbee-Mears Company Process of forming graded aperture masks
US4343686A (en) * 1981-02-27 1982-08-10 Sprague Electric Company Method for controlling etching of electrolytic capacitor foil
US4351263A (en) * 1981-06-29 1982-09-28 Rca Corporation Apparatus for sensing bare metal on a moving strip of insulatively coated conductive material
US4404515A (en) * 1981-06-29 1983-09-13 Rca Corporation System and method for use with apparatus for sensing bare metal on a moving strip of insulatively coated conductive material
JPS5971239A (ja) * 1982-10-15 1984-04-21 Toshiba Corp シヤドウマスクの製造方法
US4400233A (en) * 1982-11-12 1983-08-23 Rca Corporation System and method for controlling an etch line
JPS59158051A (ja) * 1983-02-28 1984-09-07 Toshiba Corp シヤドウマスクの製造方法
US4600470A (en) * 1985-04-16 1986-07-15 Rca Corporation Method for etching small-ratio apertures into a strip of carbon steel
DE3539874A1 (de) * 1985-11-11 1987-05-14 Hoellmueller Maschbau H Anlage zum aetzen von zumindest teilweise aus metall, vorzugsweise kupfer, bestehendem aetzgut
DE3711551A1 (de) * 1987-04-06 1988-10-20 Siemens Ag Verfahren und vorrichtung zum optimalen einstellen des aetzvorgangs beim abaetzen des kupfers beschichteter leiterplatten
US5228949A (en) * 1991-11-07 1993-07-20 Chemcut Corporation Method and apparatus for controlled spray etching
US5387313A (en) * 1992-11-09 1995-02-07 Bmc Industries, Inc. Etchant control system
US5688359A (en) * 1995-07-20 1997-11-18 Micron Technology, Inc. Muffle etch injector assembly
US8037613B2 (en) 2004-09-02 2011-10-18 Rovcal, Inc. Shaving head for rotary shaver and method of manufacturing the same
CA2590644A1 (en) 2004-12-21 2006-06-29 Christopher Grace Device for the removal of unsightly skin
US9687276B2 (en) * 2007-09-14 2017-06-27 International Edge Inc. Skin removing implement
WO2011003039A2 (en) 2009-07-02 2011-01-06 Dexcom, Inc. Analyte sensors and methods of manufacturing same
USD872370S1 (en) 2017-09-22 2020-01-07 Davinci Ii Csj, Llc Abrasive skin treatment device
USD886384S1 (en) 2017-09-22 2020-06-02 Davinci Ii Csj, Llc Abrasive skin treatment device
KR102549495B1 (ko) 2020-02-18 2023-06-30 주식회사 포스코 공정 제어 시스템 및 그 동작 방법
USD1017136S1 (en) 2020-12-23 2024-03-05 Telebrands Corp. Abrasive skin treatment device
USD1022327S1 (en) 2020-12-23 2024-04-09 International Edge, Inc. Foot file
USD1005504S1 (en) 2020-12-23 2023-11-21 Telebrands Corp. Abrasive skin treatment device
USD1023468S1 (en) 2021-03-29 2024-04-16 Telebrands Corp. Foot file

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3032753A (en) * 1958-05-20 1962-05-01 Arthur D Knapp Apparatus for controlling the depth of etching
US3553052A (en) * 1965-10-24 1971-01-05 Louis A Scholz Etching control device
US3503817A (en) * 1966-01-24 1970-03-31 Fmc Corp Process for controlling metal etching operation
US3585395A (en) * 1966-09-06 1971-06-15 Gen Electric Control of hole size in filters by measuring the amount of radiation passing through holes and correspondingly controlling speed of filter moving through etching bath
DE1812893A1 (de) * 1968-12-05 1970-06-18 Knapsack Ag, 5033 Knapsack Anordnung zur Dickenmessung von Walzgut, insbesondere von Folien
US3832551A (en) * 1972-06-22 1974-08-27 Bethlehem Steel Corp Radiation gage with sample and hold feature in deviation measuring circuit
NL7500246A (nl) * 1975-01-09 1976-07-13 Philips Nv Inrichting voor het etsen van een continu bewe- gende dunne metalen band.

Also Published As

Publication number Publication date
IT1098979B (it) 1985-09-18
FR2405309B1 (it) 1984-08-31
US4126510A (en) 1978-11-21
AU4040878A (en) 1980-04-17
GB2006118B (en) 1982-01-27
DD139603A5 (de) 1980-01-09
CA1092497A (en) 1980-12-30
DE2843777C2 (it) 1988-09-08
AU516585B2 (en) 1981-06-11
JPS5814878B2 (ja) 1983-03-22
FR2405309A1 (fr) 1979-05-04
CS227003B2 (en) 1984-04-16
JPS5460853A (en) 1979-05-16
DE2843777A1 (de) 1979-04-12
RO75671A (ro) 1981-02-28
PL116906B1 (en) 1981-07-31
PL210111A1 (pl) 1979-08-27
FI782970A7 (fi) 1979-04-07
GB2006118A (en) 1979-05-02

Similar Documents

Publication Publication Date Title
IT7828373A0 (it) Metodo di attacco chimico per produrre una successione di articoli da un nastro di lamiera.
IT7824307A0 (it) Metodo per la produzione di un elemento di accoppiamento.
IT7924776A0 (it) Fabbricazione di un dispositivo mediante attacco con plasma.
IT7924773A0 (it) Procedimento di fabbricazione di dispositivi mediante incisione al plasma.
IT7822878A0 (it) Metodo per la formazione di distanziatori su di un substrato isolante.
IT7926791A0 (it) Metodo di fabbricazione di un laminato poroso di lamiere.
IT7824576A0 (it) Metodo per controllare la composizione di una soluzione per il decapaggio di acciaio inossidabile.
GB2007139B (en) Method of etching a substrate
IT1060742B (it) Procedimento per formare una puleggia di lamiera metallica
ES495152A0 (es) Un metodo de fabricar una aleacion de magnesio.
GB2007262B (en) Method for depoiting metal on a substrate
IT7824500A0 (it) Processo per praticare fori mediante attacco chimico.
IT7825233A0 (it) Procedimento di fabbricazione di tubi metallici a parete sottile.
ES494329A0 (es) Metodo para preparar quimicamene depositos metalicos de un substrato.
FI792254A7 (fi) Metalliseostuotteen muovaamismenetelmä.
IT7823315A0 (it) Procedimento per la produzione di un articolo metallico.
IT7841592A0 (it) Procedimento per la saldatura a elettroscorificazione di metalli.
JPS5455174A (en) Etching method
NL182577C (nl) Werkwijze ter vervaardiging van een bekleed metaalsubstraat.
IT7822112A0 (it) Metodo per formare un contatto per un circuito integrato.
IT7827912A0 (it) Circuito di caricamento per unarete di formazione di impulsi.
NL7707198A (nl) Werkwijze en inrichting voor de regeling van een plasma-etsproces.
IT7823314A0 (it) Procedimento per formare un articolo metallico.
IT1082958B (it) Procedimento per la produzione di nastri metallici mediante pelatura
YU221682A (en) Process for obtaining a 4a, 9b-transhexahydro-gamma-carboline compound