CN2233931Y - Rotary magnetic cavity columnar multi-arc source-plain magnetic controlled sputtering source ion coater - Google Patents
Rotary magnetic cavity columnar multi-arc source-plain magnetic controlled sputtering source ion coater Download PDFInfo
- Publication number
- CN2233931Y CN2233931Y CN 95226243 CN95226243U CN2233931Y CN 2233931 Y CN2233931 Y CN 2233931Y CN 95226243 CN95226243 CN 95226243 CN 95226243 U CN95226243 U CN 95226243U CN 2233931 Y CN2233931 Y CN 2233931Y
- Authority
- CN
- China
- Prior art keywords
- source
- controlled sputtering
- arc
- multi sphere
- magnetically controlled
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Images
Abstract
The utility model relates to a rotary magnetic cavity columnar multi-arc source-plain magnetic controlled sputtering source ion coater, belonging to the technical field of plasma surface vapor deposition. A rotary magnetic cavity columnar multi-arc source is installed at the center of the coating chamber, and a plain magnetic controlled sputtering source is installed on the side wall of the coating chamber. The utility model is mainly composed of a coating chamber, a magnetic controlled sputtering power supply, a plain magnetic controlled sputtering source, a workpiece turning frame, a rotary magnetic cavity columnar multi-arc source, an arc source power supply, an air intake system, a baking heating source, a workpiece biasing power supply, a vacuum system, and a striking arc needle system. The utility model can be used for depositing multilayer films, and alloy films. When the utility model is used for coating a titanium nitride plus K gold composite finish layer particularly, the utility model has the advantages of simple structure, convenient operation, large loading capacity, easy adjustment of K gold lustre, low cost, etc.
Description
The utility model relates to a kind of rotary magnetron column multi sphere source and plane magnetically controlled sputtering source ion film coating machine.Belong to the plasma surface gas phase deposition technology.Be applied to fields such as machinery, aerospace, jewellery, architectural decoration spare, be particularly useful for plating the imitating gold decorating layer.
In the prior art, be the coaxial columnar controlled sputtering source to be installed, a plurality of small-sized multi sphere evaporation sources are installed on the plated film locular wall in plasma coating equipment central authorities as the characteristics of CN90226142..It is multiple sources type multi-arc ion plating film machine.Purpose is, both can only start the multi sphere source, carries out the high temperature plated film, can only start coaxial controlled sputtering source again, carries out the low temperature plated film.Perhaps start two kinds of arc sources simultaneously, the multilayer film or the alloy film of two kinds of unlike materials of plating.This ion film coating machine can be realized a tractor serves several purposes.But this coating equipment is that diameter is the little arc source about 60mm what install on the plated film locular wall, along the coating film thickness lack of homogeneity of workpiece pivoted frame height; During with two kinds of multiple sourcess plating multilayer films, with small-sized multi sphere source titanium-nitride film, again with column-shape magnetron sputtering target plating karat gold film, when adding golden compound finish layer to obtain titanium nitride, owing to adopt noble metal making column target, cost is too high as earlier.
In the prior art, as the ion film coating machine that China introduces from U.S. Vav Tec company, two the big arc of rectangle plane sources are installed in coating chamber, two rectangle arc source targets are the titanium plate, and arc source target surface is installed relatively.Two rectangle plane magnetron sputtering sources also are installed, and the target of two plane magnetically controlled sputtering sources is the karat gold plate, and the sputtering source target surface is installed relatively.Workpiece in two arc sources, two spatter and make revolution motion between the source.Open multi sphere source titanium-nitride film earlier, open controlled sputtering source plating karat gold film then.Though the equal in length of two arc sources and two sputtering sources, but because two provenances are installed in the coating chamber, and the distance between two target surfaces in multi sphere source, between two target surfaces of sputtering source is very near, and the space availability ratio in the coating equipment is low, the workpiece loading capacity is little, and production efficiency is low.
The purpose of this utility model provides a kind of rotary magnetron column multi sphere source-plane magnetically controlled sputtering source ion film coating machine, is a kind of NEW TYPE OF COMPOSITE source ion coating equipment.It can deposit multilayer film or alloy film, is particularly suited for titanium-nitride and adds karat gold finish layer.
The utility model is achieved in that in coating chamber central authorities installs rotary magnetron column multi sphere source, mounting plane controlled sputtering source on the coating chamber sidewall.Form by coating chamber (1), magnetron sputtering power supply (2), plane magnetically controlled sputtering source (3), workpiece pivoted frame (4), rotary magnetron column arc source (5), arc source current (6), inlet system (7), baking heating source (8), workpiece bias power supply (9), vacuum system (10), striking needle system (11).
Below in conjunction with drawings and Examples the utility model is further specified.
Accompanying drawing is rotary magnetron column multi sphere source-plane magnetically controlled sputtering source ion film coating machine device structure embodiment sketch.In the drawings, coating equipment is a vertical structure.Rotary magnetron column arc source (5) is installed by central authorities at coating chamber (1) top.Post arc dia 50-100mm, length 200-2000mm.Do the installation several permanent magnets parallel with post arc target in target, the target pipe with tubular material, rotate in target pipe arc spot and post arc of permanent magnet is isometric, is bar shaped or spiral yarn shaped, and along the scanning of post arc target surface, to 360 ° of direction plated films.The coating film thickness homogeneity range is big, simple in structure, easy and simple to handle.The equal in length in plane magnetically controlled sputtering source (3) and rotary magnetron column multi sphere source (5).The target of plane magnetically controlled sputtering source (3) can be a direct water-cooling, also can be indirect water-cooling; Can be whole target, also can be the assembly unit target; Can be pure metal targets, also can be alloy target material.Adding the compound finish layer of karat gold with titanium-nitride is example, and the target titanium pipe in rotary magnetron column multi sphere source (5) is installed in the central authorities at coating chamber (1) top, and plane magnetically controlled sputtering source (3) is installed on the sidewall of coating chamber (1).Workpiece is done public spinning motion between rotary magnetron column multi sphere source and plane magnetically controlled sputtering source.Inlet system (7) is installed in the top of coating chamber (1).Near the position of coating chamber (1) sidewall baking heating source (8) is being installed.Vacuum system (10) is installed in the bottom of coating chamber (1).In coating process, at first the vacuum tightness with coating chamber is evacuated to 7 * 10Pa, and workpiece toasts heating, starts the workpiece rotating mechanism, and workpiece applies the 50-1000V negative bias, feeds argon gas, when vacuum tightness is 1Pa-3Pa, workpiece is carried out argon ion bombardment purify.Then with the striking pin rotary magnetron column multi sphere source of igniting, workpiece is carried out the ion baking hit and purify and heating, but change just depositing titanium nitride coating of logical nitrogen, restart plane magnetically controlled sputtering source deposition karat gold layer, can obtain titanium nitride and add the compound finish layer of karat gold.Compared with prior art, the utlity model has that device structure is simple, karat gold target composition is easily adjusted, color and luster is controlled well, with low cost, the coating chamber loading capacity big, the production efficiency advantages of higher.
The structure of the utility model rotary magnetron column multi sphere source-planar magnetic control sputtering ion film coating machine can be vertical bell jar type, the vertical type that opens the door, the vertical type of uncapping, also can be horizontal end type or the two ends type that opens the door that opens the door.Vacuum system can be installed in bottom, top or the sidewall of coating chamber.
Claims (6)
1. rotary magnetron column multi sphere source-plane magnetically controlled sputtering source ion film coating machine, form by coating chamber (1), magnetron sputtering power supply (2), plane magnetically controlled sputtering source (3), workpiece pivoted frame (4), rotary magnetron column multi sphere source (5), arc source current (6), inlet system (7), baking heating source (8), workpiece bias power supply (9), vacuum system (10), striking needle system (11), it is characterized in that, in coating chamber central authorities rotation magnetic post control shape multi sphere source, mounting plane controlled sputtering source on the coating chamber sidewall are installed.
2. according to the described rotary magnetron column of claim 1. multi sphere source-plane magnetically controlled sputtering source ion film coating machine, it is characterized in that the rotary magnetron column multi sphere source (5) of being adopted, post arc dia 50-100mm, length 200-2000mm, do target with tubular material, the several permanent magnets parallel with post arc target are installed in the target pipe, permanent magnet rotates in the target pipe, arc spot and post arc are isometric, be bar shaped or spiral yarn shaped, and along the scanning of post arc target surface, to 360 ° of direction plated films.
3. according to the described rotary magnetron column of claim 1. multi sphere source-plane magnetically controlled sputtering source ion film coating machine, it is characterized in that the target of the plane magnetically controlled sputtering source of installing can be a direct water-cooling on the plated film locular wall, also can be indirect water-cooling; Can be whole target, also can be the assembly unit target; Can be pure metal targets, also can be alloy target material.
4. according to the described rotary magnetron column of claim 1. multi sphere source-plane magnetically controlled sputtering source ion film coating machine, it is characterized in that, two kinds of targets that rotary magnetron column multi sphere source and plane magnetically controlled sputtering source are adopted can be commaterials, also can be different materials.
5. according to the described rotary magnetron column of claim 1. multi sphere source-plane magnetically controlled sputtering source ion film coating machine, it is characterized in that, when titanium-nitride adds the compound finish layer of karat gold, earlier with rotary magnetron column multi sphere source titanium-nitride, again with plane magnetically controlled sputtering source plating karat gold layer.
6. according to the described rotary magnetron column of claim 1. multi sphere source-plane magnetically controlled sputtering source ion film coating machine, it is characterized in that the structure of coating equipment can be bell jar type, the vertical type that opens the door, the vertical type of uncapping, horizontal end type or the two ends type that opens the door that opens the door.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 95226243 CN2233931Y (en) | 1995-11-22 | 1995-11-22 | Rotary magnetic cavity columnar multi-arc source-plain magnetic controlled sputtering source ion coater |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 95226243 CN2233931Y (en) | 1995-11-22 | 1995-11-22 | Rotary magnetic cavity columnar multi-arc source-plain magnetic controlled sputtering source ion coater |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2233931Y true CN2233931Y (en) | 1996-08-28 |
Family
ID=33872444
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 95226243 Expired - Fee Related CN2233931Y (en) | 1995-11-22 | 1995-11-22 | Rotary magnetic cavity columnar multi-arc source-plain magnetic controlled sputtering source ion coater |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2233931Y (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1057347C (en) * | 1996-12-13 | 2000-10-11 | 沈阳工业高等专科学校 | Method for prepn. of multi-arc ion sputtering alloy coatings |
| CN106222610A (en) * | 2016-07-22 | 2016-12-14 | 广东工业大学 | A kind of nanometer composite hard coating and preparation method thereof |
| CN107805785A (en) * | 2017-10-18 | 2018-03-16 | 东莞产权交易中心 | A kind of aluminium sheet processing Multi-arc type ion coating machine |
| CN109112493A (en) * | 2018-08-28 | 2019-01-01 | 深圳市爱迪尔珠宝股份有限公司 | Electricity inhales gold process |
| CN112663009A (en) * | 2020-12-11 | 2021-04-16 | 江苏特丽亮镀膜科技有限公司 | Magnetron sputtering coating device and working method thereof |
-
1995
- 1995-11-22 CN CN 95226243 patent/CN2233931Y/en not_active Expired - Fee Related
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1057347C (en) * | 1996-12-13 | 2000-10-11 | 沈阳工业高等专科学校 | Method for prepn. of multi-arc ion sputtering alloy coatings |
| CN106222610A (en) * | 2016-07-22 | 2016-12-14 | 广东工业大学 | A kind of nanometer composite hard coating and preparation method thereof |
| CN106222610B (en) * | 2016-07-22 | 2019-01-22 | 广东工业大学 | A kind of nanometer composite hard coating and preparation method thereof |
| CN107805785A (en) * | 2017-10-18 | 2018-03-16 | 东莞产权交易中心 | A kind of aluminium sheet processing Multi-arc type ion coating machine |
| CN109112493A (en) * | 2018-08-28 | 2019-01-01 | 深圳市爱迪尔珠宝股份有限公司 | Electricity inhales gold process |
| CN112663009A (en) * | 2020-12-11 | 2021-04-16 | 江苏特丽亮镀膜科技有限公司 | Magnetron sputtering coating device and working method thereof |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN100392147C (en) | Pair target twin magnetic controlled sputtering ion plating deposition device | |
| CN105543792A (en) | Magnetron sputtering device and magnetron sputtering method | |
| CN100398693C (en) | Multifunction composite magnetic controlled plasma sputtering device | |
| CN104711527A (en) | Method for magnetron sputtering low-temperature preparation of TiN film | |
| JP2013506756A (en) | Method and coater for coating a substrate | |
| CN108396295A (en) | Curved surface magnetic control sputtering cathode, closed magnetic field coating magnetron sputtering apparatus and its application process | |
| CN2233931Y (en) | Rotary magnetic cavity columnar multi-arc source-plain magnetic controlled sputtering source ion coater | |
| CN105714256A (en) | Method for low-temperature preparation of DLC film through magnetron sputtering | |
| US20190177834A1 (en) | Thin film coating and method of fabrication thereof | |
| CN101634012B (en) | Ion beam assisting magnetic control sputtering deposition method for surface protection | |
| CN111519151A (en) | Multi-element hard coating and electromagnetic enhanced magnetron sputtering preparation process thereof | |
| CN201722425U (en) | Vacuum magnetron sputtering precious metal thin-film plating equipment | |
| CN1136332C (en) | Equipment and process for preparing film by pulse aided filter and arc deposition | |
| CN101805893B (en) | Drum-type sample stage and method for magnetron sputtering coating on powder particles by using same | |
| CN109825808A (en) | A kind of doped diamond film preparation device and method | |
| CN101403101A (en) | Quick solid-ceramic coating ion plating apparatus | |
| CN2290608Y (en) | Rotary magnetic-controlled column arc source multi-arc ion film caoating machine | |
| Rohde | Sputter deposition | |
| CN2279366Y (en) | Rotary magnetic control column type arc source-plate arc source multi-arc ion film plating machine | |
| CN2254448Y (en) | Multiarc-magnetic control sputter vacuum ion goldplating equipment | |
| KR100268216B1 (en) | An ion plating apparatus and method using large sized hollow cathod discharge gun | |
| CN2374553Y (en) | Mussel dual-chamber column arc source multi-arc ion film coating machine | |
| CN207608623U (en) | Transition metal boride-metal composite target and filming equipment | |
| CN2903096Y (en) | Geseous phase penetration/deposition apparatus of carbonyl metal compound | |
| CN2312945Y (en) | Multi-purpose column-like vacuum plasma film-plating source |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |