CN2254448Y - Multiarc-magnetic control sputter vacuum ion goldplating equipment - Google Patents
Multiarc-magnetic control sputter vacuum ion goldplating equipment Download PDFInfo
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- CN2254448Y CN2254448Y CN 96225392 CN96225392U CN2254448Y CN 2254448 Y CN2254448 Y CN 2254448Y CN 96225392 CN96225392 CN 96225392 CN 96225392 U CN96225392 U CN 96225392U CN 2254448 Y CN2254448 Y CN 2254448Y
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Abstract
The utility model relates to multiarc-magnetic control sputter vacuum ion goldplating equipment, which is provided with a film-plating chamber, wherein the film-plating chamber is connected with a vacuum-pumping system; a rotating workpiece support is arranged in the middle of the film-plating chamber; a plurality of multiple arc cathode evaporators using titanium blocks as a target material are arranged at one side of the film-plating chamber; a plurality of planar magnetic-control sputtering targets are arranged at the other side of the film-plating chamber; the planar magnetic-control sputtering targets are provided with gold sputtering material to form two mutually independent crystallizing fields; the multiple arc cathode evaporators and the planar magnetic-control sputtering targets are connected with the control cabinet of a power electric appliance. When a workpiece passes through the two crystallizing fields repeatedly, TiNT and Au coatings are orderly deposited on the workpiece.
Description
The utility model belongs to a kind of and is coated with the equipment of decoration coating, the particularly a kind of multi sphere-gold-plated equipment of magnetron sputtering vacuum ionic with physical gas-phase deposite method.
Traditional gold coating is to adopt electrochemical method to realize.Though the gold coating tone that is coated with in this way is abundant, ornamental strong, the bonding force of coating and substrate surface is relatively poor, and the hardness of coating is also relatively poor, thereby not wear-resisting, comes off easily; In addition, when being coated with, must adopt cyanogen aurification potassium etc. that the toxic agent product are arranged, environment is had pollution, can not satisfy the requirement of ever-increasing needs of people and social development.
At vacuum condition deposit gold coating is the another kind of method that obtains the gold ornament layer.According to the difference of deposition method, technology, the equipment that is coated with the gold ornament layer can be divided into several, for example, electron beam preparation of ion plated gold equipment, the gold-plated equipment of multi sphere-evaporated ions, and multi sphere-magnetic controlled sputtering ion plating gold equipment etc.
The greatest problem that electron beam preparation of ion plated gold equipment exists is, the gold consumption is big, and the work temperature rise is only applicable to base materials such as stainless steel, and therefore, its industrial application is subjected to certain restriction.
The gold-plated equipment of multi sphere-evaporated ions is a kind of filming equipment of being made up of multi sphere source and evaporation source, as Chinese patent CN1053645A disclosed " the gold-plated equipment of multi sphere-evaporated ions ", it mainly is made up of electrical control cabinet, vacuum film coating chamber, vacuum-pumping system, work rest, multi sphere cathode evaporator and thermal resistance evaporation device etc.It deposits Au (gold) with multi sphere cathode evaporator depositing TiN (titanium nitride) on workpiece with the resistance vaporizer on workpiece, with TiN coating as " lining by force layer ", as " being chromatograph ", make both complementations with Au coating, realize best decorative effect, but, because the diffracting power of evaporation is poor, so, the membrane uniformity that is coated with is relatively poor, sticking power is not strong, and the problem that the drain of gold amount is big does not still solve, therefore, this gold-plated equipment also is not suitable for industrial application
Chinese patent 90226142.8 discloses a kind of " multi sphere-magnetron sputtering multifunction ion filming equipment ".It is mainly by power supply electric apparatus control apparatus, vacuum film coating chamber, vacuum-pumping system, multi sphere cathode evaporator, rotational workpieces frame, and the concentric cylinder magnetron sputtering target is formed.The rotational workpieces frame both can revolve round the sun, but rotation again, the concentric cylinder magnetron sputtering target is contained in the centre of vacuum film coating chamber, and the multi sphere cathode evaporator is contained on the sidewall of vacuum film coating chamber, and the multi sphere source adopts the titanium piece as target, and the gold target is then adopted in the magnetic control source.Multi sphere source and magnetic control source start simultaneously, just can be on workpiece depositing TiN and Au simultaneously, it is with unordered the mixing among the TiN of Au, coating the alloy film that contains Au, is this TiN and unordered mixing of Au film hardness is not had contribution, rete control color inconvenience, and, the surface-area of cylindrical target is huge, promptly uses the very thin coating one deck of gold, also will drop into a large amount of gold, therefore, this equipment is not only invested huge, and in use the consumption of gold is also very big, be coated with furnaceman's part and will consume 20 gram gold, therefore, though this equipment can coat the alloy film that contains gold, do not have the value of industrial implementation.
The purpose of this utility model is to overcome above-mentioned the deficiencies in the prior art, and the multi sphere that a kind of gold consumption is little, coating hardness is high-gold-plated equipment of magnetron sputtering vacuum ionic is provided.
The utility model is achieved in that
It has a coating chamber, be connected to vacuum-pumping system on the coating chamber, in the centre of coating chamber the rotational workpieces frame is housed, side at coating chamber is equipped with several multi sphere cathode evaporators, opposite side at coating chamber is equipped with several plane magnetic controlled sputtering targets, described multi sphere cathode evaporator is connected with the power supply electric control cabinet respectively with plane magnetic controlled sputtering target, the multi sphere cathode evaporator adopts different metallic substance as target with plane magnetic controlled sputtering target, the multi sphere cathode evaporator uses the titanium piece as target, the gold sputter material is housed on the plane magnetic controlled sputtering target, thereby in coating chamber, set up two separate sedimentary provinces, when the workpiece on the rotational workpieces frame in regular turn repeatedly when two sedimentary provinces, can be on workpiece orderly depositing TiN and Au coating.
Shielding unit also is housed respectively on the generating surface of multi sphere cathode evaporator and plane magnetic controlled sputtering target, described shielding unit is made up of baffle plate, connecting rod, follower gear, driving toothed gear and rotation axis, baffle plate is connected with follower gear by connecting rod, follower gear is meshed with driving toothed gear, rotation axis is contained on the driving toothed gear, the rotation main drive shaft can change the position of baffle plate, pollutes mutually to prevent multi sphere cathode evaporator and plane magnetic controlled sputtering target.
The utility model compared with prior art has following advantage:
1, in coating chamber, is provided with two separate sedimentary provinces, can be with the orderly stack deposition of TiN and Au layer upon layer, on workpiece, coat TiN/Au/TiN/Au ... composite film, and when the increase of the rete number of plies, when each layer nominal thickness reduces, the hardness of composite film will trend towards increasing, and this point is heard the paper that has immediately waited the people by Metal Inst., Chinese Academy of Sciences " Ti/TiN multilayer film hardness and microstructural relation " confirm.
2, deposit Au with plane magnetic controlled sputtering target, all have very big advantage technically and economically, at first, it can be installed on the sidewall of coating chamber very easily, sets up independently sedimentary province; In addition, can also enlarge the effective processing space of vacuum, and can be shielded very easily; Main is, the surface-area of plane magnetic controlled sputtering target is far smaller than the surface-area of cylindrical magnetron sputtering target, can significantly reduce the input of gold, reduce equipment manufacturing cost, and, the sputter rate of plane magnetic controlled sputtering target is low, like this, just make the nominal thickness of Au coating thinner, same gold amount just can deposit more multi-layered, when saving gold significantly, obtain extremely hard ornament layer.Facts have proved: diameter is 120 millimeters a plane magnetic controlled sputtering target, and its gold consumption is less than 80 grams; Sputter is 6 minutes under the 3A target current, and the drain of gold amount is no more than 3 grams, and therefore, the utility model has significantly reduced the cost of plating piece.
3, on multi sphere cathode evaporator and plane magnetic controlled sputtering target, shielding unit is housed, can when it is not worked, shields, avoid being subjected to the pollution of another kind of metallic element, be convenient to the adjustment of coating process.
The drawing explanation:
Fig. 1 is a structural representation of the present utility model;
Fig. 2 is the A-A sectional view of Fig. 1;
Fig. 3 is the B-B sectional view of Fig. 1.
Provide embodiment of the present utility model below in conjunction with accompanying drawing:
As shown in the figure, the utility model has a coating chamber 11, and coating chamber 11 usefulness stainless steel plates are made, and are welded with water-cooled tube or watercooling jacket on its outer wall; Be connected to vacuum-pumping system 18 on coating chamber 11, described vacuum-pumping system 18 is made up of mechanical pump, diffusion pump, valve and connecting tube; Center top at coating chamber 11 is equipped with rotational workpieces frame 10, and rotational workpieces frame 10 both can revolve round the sun, but rotation again; Side at coating chamber 11 is equipped with two multi sphere cathode evaporators 13, and the quantity of multi sphere cathode evaporator 13 is not limited to two, can increase and decrease according to the height of coating chamber 11, and titanium piece 12 is housed on multi sphere cathode evaporator 13; Opposite side at coating chamber 11 is equipped with two plane magnetic controlled sputtering targets 3, plane magnetic controlled sputtering target 3 is circular, also can be rectangle, and the quantity of plane magnetic controlled sputtering target 3 also is not limited to two, height according to coating chamber 11 is determined, gold sputter material 4 is housed on plane magnetic controlled sputtering target 3; Described multi sphere cathode evaporator 13 is connected with power supply electric control cabinet 1 respectively with plane magnetic controlled sputtering target 3, so that control and regulate, vacuum measurement table 2 is housed on power supply electric control cabinet 1, in the bottom of coating chamber 11 vacuum measurement that is connected with vacuum measurement table 2 is housed and regulates 15, be used for the vacuum tightness of coating chamber 11 is measured; In the bottom of coating chamber 11 multichannel inflation valve 14 is housed, utilizes multichannel inflation valve 14 can charge into several gases simultaneously, and can regulate aeration quantity as required; Shielding unit also is housed respectively on the generating surface of multi sphere cathode evaporator 13 and plane magnetic controlled sputtering target 3, described shielding unit is made up of baffle plate 6, connecting rod 7, follower gear 8, driving toothed gear 9 and rotation axis 5, baffle plate 6 is contained on the connecting rod 7, connecting rod 7 is connected with follower gear 8, follower gear 8 is meshed with driving toothed gear 9, and rotation axis 5 is contained on the driving toothed gear 9, and rotation axis 5 stretches out from coating chamber 11, so that rotate rotation axis 5 from the outside, adjust the position of baffle plate 6; Be hinged with gate 16 in the front of coating chamber 11, visor 17 is housed on the gate 16, so that coating chamber 11 is observed.
Multi sphere cathode evaporator 13 of the present utility model and plane magnetic controlled sputtering target 3 can start respectively according to processing requirement, also can start simultaneously; When being coated with Au coating, can start multi sphere cathode evaporator 13 earlier, depositing Ti and TiN bottom on workpiece, start plane magnetic controlled sputtering target 3 then, multi sphere cathode evaporator 13 and plane magnetic controlled sputtering target 3 are worked simultaneously, depositing TiN and Au in regular turn on workpiece, the public affairs of corresponding control workpiece, rotational velocity, depositing time and source electric power, just can obtain the required thicknesses of layers and the number of plies, in the sedimentary later stage, can close multi sphere cathode evaporator 13, deposit the Au layer separately, to obtain better decorative effect, the film system that constitutes like this can be expressed as: Ti-TiN-(TiN/Au/TiN/Au ... )-Au.
Certainly, also other superhard materials can be installed on multi sphere cathode evaporator 13, for example zirconium also can be installed the au-alloy sputter material on plane magnetic controlled sputtering target 3, can coat superhard, wear-resisting, as to have gold color and luster composite decoration film equally.
Claims (3)
1, a kind of multi sphere-gold-plated the equipment of magnetron sputtering vacuum ionic, it has a coating chamber (11), be connected to vacuum-pumping system (18) on the coating chamber (11), in the centre of coating chamber (11) rotational workpieces frame (10) is housed, side at coating chamber (11) is equipped with the multi sphere cathode evaporator (13) of several usefulness titanium pieces (12) as target, multi sphere cathode evaporator (13) is connected with power supply electric control cabinet (1), it is characterized in that, opposite side at coating chamber (11) is equipped with several plane magnetic controlled sputtering targets (3), gold sputter material (4) is housed on plane magnetic controlled sputtering target (3), and plane magnetic controlled sputtering target (3) is connected with power supply electric control cabinet (1).
2, multi sphere according to claim 1-gold-plated equipment of magnetron sputtering vacuum ionic is characterized in that, described plane magnetic controlled sputtering target (3) is circular.
3, multi sphere according to claim 1-gold-plated equipment of magnetron sputtering vacuum ionic, it is characterized in that, on the generating surface of multi sphere cathode evaporator (13) and plane magnetic controlled sputtering target (3), shielding unit is housed respectively also, described shielding unit is made up of baffle plate (6), connecting rod (7), follower gear (8), driving toothed gear (9) and rotation axis (5), baffle plate (6) is connected with follower gear (8) by connecting rod (7), follower gear (8) is meshed with driving toothed gear (9), and rotation axis (5) is contained on the driving toothed gear (9).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96225392 CN2254448Y (en) | 1996-02-07 | 1996-02-07 | Multiarc-magnetic control sputter vacuum ion goldplating equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN 96225392 CN2254448Y (en) | 1996-02-07 | 1996-02-07 | Multiarc-magnetic control sputter vacuum ion goldplating equipment |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN2254448Y true CN2254448Y (en) | 1997-05-21 |
Family
ID=33904087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN 96225392 Expired - Fee Related CN2254448Y (en) | 1996-02-07 | 1996-02-07 | Multiarc-magnetic control sputter vacuum ion goldplating equipment |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN2254448Y (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100340700C (en) * | 2005-03-21 | 2007-10-03 | 西安交通大学 | Hall ion source actuated magnetron sputtering enhancing type multi-arc ion plating film method |
| CN103774106A (en) * | 2014-01-23 | 2014-05-07 | 江苏奥蓝工程玻璃有限公司 | Baffle mechanism capable of being adjusted immediately according to film layer uniformity curve changes and adjustment method thereof |
| CN103839641A (en) * | 2014-03-22 | 2014-06-04 | 沈阳中北真空设备有限公司 | Mixed film coating equipment for neodymium iron boron rare-earth permanent magnet components and manufacturing method thereof |
| CN103854819A (en) * | 2014-03-22 | 2014-06-11 | 沈阳中北通磁科技股份有限公司 | Hybrid film coating method of neodymium iron boron rare earth permanent magnet device |
| CN107805785A (en) * | 2017-10-18 | 2018-03-16 | 东莞产权交易中心 | A kind of aluminium sheet processing Multi-arc type ion coating machine |
| CN109898062A (en) * | 2019-03-07 | 2019-06-18 | 厦门阿匹斯智能制造系统有限公司 | A kind of magnetic-controlled sputtering coating equipment and film plating process |
| CN113684454A (en) * | 2020-05-19 | 2021-11-23 | 宝山钢铁股份有限公司 | Method for coating substrate with metal alloy and vacuum deposition device thereof |
-
1996
- 1996-02-07 CN CN 96225392 patent/CN2254448Y/en not_active Expired - Fee Related
Cited By (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN100340700C (en) * | 2005-03-21 | 2007-10-03 | 西安交通大学 | Hall ion source actuated magnetron sputtering enhancing type multi-arc ion plating film method |
| CN103774106A (en) * | 2014-01-23 | 2014-05-07 | 江苏奥蓝工程玻璃有限公司 | Baffle mechanism capable of being adjusted immediately according to film layer uniformity curve changes and adjustment method thereof |
| CN103839641A (en) * | 2014-03-22 | 2014-06-04 | 沈阳中北真空设备有限公司 | Mixed film coating equipment for neodymium iron boron rare-earth permanent magnet components and manufacturing method thereof |
| CN103854819A (en) * | 2014-03-22 | 2014-06-11 | 沈阳中北通磁科技股份有限公司 | Hybrid film coating method of neodymium iron boron rare earth permanent magnet device |
| CN103854819B (en) * | 2014-03-22 | 2016-10-05 | 沈阳中北通磁科技股份有限公司 | A kind of the admixture plates the film method of neodymium iron boron rare earth permanent magnet device |
| CN103839641B (en) * | 2014-03-22 | 2016-10-05 | 沈阳中北真空设备有限公司 | The admixture plates the film equipment of a kind of neodymium iron boron rare earth permanent magnet device and manufacture method |
| CN107805785A (en) * | 2017-10-18 | 2018-03-16 | 东莞产权交易中心 | A kind of aluminium sheet processing Multi-arc type ion coating machine |
| CN109898062A (en) * | 2019-03-07 | 2019-06-18 | 厦门阿匹斯智能制造系统有限公司 | A kind of magnetic-controlled sputtering coating equipment and film plating process |
| CN113684454A (en) * | 2020-05-19 | 2021-11-23 | 宝山钢铁股份有限公司 | Method for coating substrate with metal alloy and vacuum deposition device thereof |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |