CN218146906U - Device structure for depositing nano titanium nitride film on inner wall of titanium tube by high pulse - Google Patents
Device structure for depositing nano titanium nitride film on inner wall of titanium tube by high pulse Download PDFInfo
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- CN218146906U CN218146906U CN202222728547.6U CN202222728547U CN218146906U CN 218146906 U CN218146906 U CN 218146906U CN 202222728547 U CN202222728547 U CN 202222728547U CN 218146906 U CN218146906 U CN 218146906U
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Abstract
The utility model belongs to the technical field of the coating film, a high pulse is at titanium pipe inner wall deposit nanometer titanium nitride film device structure is disclosed, including double-deck water-cooling vacuum coating room, install high pulse power on the double-deck water-cooling vacuum coating room, install rotatory substrate platform on the high pulse power, rotatory substrate bench fixedly connected with high pulse magnetron sputtering rotating cathode, high pulse magnetron sputtering rotating cathode is in the inside of double-deck water-cooling vacuum coating room, the outside cover of high pulse magnetron sputtering rotating cathode is equipped with titanium alloy pipe, the bottom of titanium alloy pipe and the outside contact of rotatory substrate platform, install heating baking system on the double-deck water-cooling vacuum coating room. The utility model discloses an, adopt high pulse technique, make the deposited nanometer titanium nitride wear-resisting coating of titanium pipe inner wall cleaner and cleaner, more even, more wear-resisting, adhesive force better.
Description
Technical Field
The utility model relates to a coating film technical field, concretely relates to high pulse is at titanium pipe inner wall deposit nanometer titanium nitride film device structure.
Background
It is known that with the rapid development of scientific technology, the vacuum coating technology has been widely applied, when the nano titanium nitride wear-resistant coating is deposited on the inner wall of the titanium tube, the vacuum coating structure is an important problem, the unreasonable design of the coating structure can seriously affect the deposition quality of the product, the deposition of the nano titanium nitride wear-resistant coating on the inner surface of the titanium tube is to coat a layer of nano film material with vickers hardness of about 2000HV on the inner surface of the titanium alloy tube, and the nano film material is related to the heating temperature, the arrangement of a high-pulse magnetic control sputtering cathode, the power of a high-pulse sputtering power supply and the structure of a gas circuit.
The existing method for preparing the wear-resistant coating on the inner wall of the titanium tube mainly adopts a supersonic spraying technology, but the method has the following defects in the using process:
although the supersonic spraying technology can meet the production requirement, the uniformity is general, and the deposition quality of the product is easily influenced, so that the wear resistance and the adhesive force of the nano titanium nitride wear-resistant coating on the titanium tube are poor.
SUMMERY OF THE UTILITY MODEL
To the problems existing in the prior art, the utility model aims to provide a high pulse is at titanium pipe inner wall deposit nanometer titanium nitride film device structure.
For solving the above-mentioned background technical problem, the utility model adopts the following technical scheme.
The utility model provides a high pulse is at titanium pipe inner wall deposit nanometer titanium nitride film device structure, includes double-deck water-cooling vacuum coating room, install the high pulse power on the double-deck water-cooling vacuum coating room, install rotatory substrate platform on the high pulse power, rotatory substrate bench fixedly connected with high pulse magnetron sputtering rotating cathode, high pulse magnetron sputtering rotating cathode is in the inside of double-deck water-cooling vacuum coating room, the outside cover of high pulse magnetron sputtering rotating cathode is equipped with titanium alloy pipe, the bottom of titanium alloy pipe and the outside contact of rotatory substrate platform, install heating baking system on the double-deck water-cooling vacuum coating room, high vacuum pumping system is installed in the left side of double-deck water-cooling vacuum coating room.
As a further description of the above technical solution:
and the double-layer water-cooling vacuum coating chamber is provided with a mass flow meter.
Compared with the prior art, the utility model has the advantages of:
when the scheme is used, the titanium alloy pipe sleeve can be arranged on the high-pulse magnetron sputtering rotating cathode for coating processing, and the air input of the mass flow meter, the power of the high-pulse power supply, the temperature of the heating and baking system and the rotating speed of the rotating substrate table can be adjusted according to requirements in the processing process, so that a high-quality nano titanium nitride wear-resistant coating can be uniformly and compactly prepared on the inner surface of the titanium alloy pipe.
Drawings
Fig. 1 is a schematic structural diagram of the present invention.
The numbering in the figures illustrates:
1. a double-layer water-cooling vacuum coating chamber; 2. a titanium alloy tube; 3. high-pulse magnetron sputtering rotating cathode; 4. a mass flow meter; 5. a high vacuum pumping system; 6. a heating and baking system; 7. rotating the substrate table; 8. a high pulse power supply.
Detailed Description
The technical solution in the embodiment of the present invention will be clearly and completely described below with reference to the accompanying drawings in the embodiment of the present invention;
please refer to fig. 1, in the present invention, a high pulse deposition nanometer titanium nitride film device structure on the inner wall of a titanium tube, comprising a double-layer water-cooling vacuum coating chamber 1, a high pulse power supply 8 is installed on the double-layer water-cooling vacuum coating chamber 1, a rotary substrate table 7 is installed on the high pulse power supply 8, a high pulse magnetron sputtering rotary cathode 3 is fixedly connected on the rotary substrate table 7, the high pulse magnetron sputtering rotary cathode 3 is located inside the double-layer water-cooling vacuum coating chamber 1, a titanium alloy tube 2 is sleeved on the outside of the high pulse magnetron sputtering rotary cathode 3, the bottom of the titanium alloy tube 2 contacts with the outside of the rotary substrate table 7, a heating and baking system 6 is installed on the double-layer water-cooling vacuum coating chamber 1, and a high vacuum pumping system 5 is installed on the left side of the double-layer water-cooling vacuum coating chamber 1.
The double-layer water-cooling vacuum coating chamber 1 is provided with a mass flow meter 4.
The utility model discloses in, adopt high vacuum pumping system 5 function, the double-deck water-cooling vacuum coating room 1 of collocation, provide suitable environment to titanium pipe processing, when using, can establish titanium alloy pipe 2 cover to high pulse magnetron sputtering rotating cathode 3, on, carry out coating film processing, and can adjust mass flow meter 4's air input size as required in the course of working, high pulse power 8's power size, the temperature height of heating baking system 6 and the rotational speed of rotatory substrate platform 7, can be at the even fine and close high-quality nanometer titanium nitride wear-resistant coating of preparation one deck in titanium alloy pipe 2 internal surfaces, whole device, adopt high pulse technique, make the deposited nanometer titanium nitride wear-resistant coating of 2 inner walls of titanium alloy pipe more bright and clean, more even, wear-resisting, adhesive force is better.
It should be noted that the circuit connection relationship of each device in the present application all belongs to a simple series and parallel connection circuit, and there is no innovation point in the circuit connection, and those skilled in the art can easily implement the circuit connection relationship, and belong to the prior art, and are not described again.
The above description is only the preferred embodiment of the present invention; the scope of the present invention is not limited thereto. Any person skilled in the art should also be able to cover the protection scope of the present invention by replacing or changing the technical solution and the modified concept of the present invention within the technical scope of the present invention.
Claims (2)
1. The utility model provides a high pulse is at titanium pipe inner wall deposit nanometer titanium nitride film device structure, includes double-deck water-cooling vacuum coating room (1), its characterized in that: install high pulse power supply (8) on double-deck water-cooling vacuum coating room (1), install rotatory substrate platform (7) on high pulse power supply (8), fixedly connected with high pulse magnetron sputtering rotating cathode (3) on rotatory substrate platform (7), high pulse magnetron sputtering rotating cathode (3) are in the inside of double-deck water-cooling vacuum coating room (1), the outside cover of high pulse magnetron sputtering rotating cathode (3) is equipped with titanium alloy pipe (2), the bottom of titanium alloy pipe (2) and the outside contact of rotatory substrate platform (7), install heating baking system (6) on double-deck water-cooling vacuum coating room (1), high vacuum pumping system (5) are installed in the left side of double-deck water-cooling vacuum coating room (1).
2. The structure of the device for depositing the nanometer titanium nitride film on the inner wall of the titanium tube by high pulse according to claim 1, characterized in that: and a mass flow meter (4) is arranged on the double-layer water-cooling vacuum coating chamber (1).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222728547.6U CN218146906U (en) | 2022-10-17 | 2022-10-17 | Device structure for depositing nano titanium nitride film on inner wall of titanium tube by high pulse |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN202222728547.6U CN218146906U (en) | 2022-10-17 | 2022-10-17 | Device structure for depositing nano titanium nitride film on inner wall of titanium tube by high pulse |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN218146906U true CN218146906U (en) | 2022-12-27 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202222728547.6U Active CN218146906U (en) | 2022-10-17 | 2022-10-17 | Device structure for depositing nano titanium nitride film on inner wall of titanium tube by high pulse |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN218146906U (en) |
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2022
- 2022-10-17 CN CN202222728547.6U patent/CN218146906U/en active Active
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