CN101403101A - Quick solid-ceramic coating ion plating apparatus - Google Patents
Quick solid-ceramic coating ion plating apparatus Download PDFInfo
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- CN101403101A CN101403101A CNA2008101976449A CN200810197644A CN101403101A CN 101403101 A CN101403101 A CN 101403101A CN A2008101976449 A CNA2008101976449 A CN A2008101976449A CN 200810197644 A CN200810197644 A CN 200810197644A CN 101403101 A CN101403101 A CN 101403101A
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Abstract
The invention discloses a rapid hard ceramic coating ion plating device which comprises a vacuum chamber formed by a furnace wall, one side of which is provided with a furnace door, and the vacuum chamber is provided with a vacuum pumping port. The interior of the vacuum chamber is provided with round electric arc targets and a high-power cylindrical rotary electric arc target, wherein, the round electric arc targets are divided into 2N rows, N is more than or equal to 1, the round electric arc targets are uniformly distributed on the furnace wall, the high-power cylindrical rotary electric arc target is arranged at the centre of the vacuum chamber, and the space between the round electric arc targets and the central high-power cylindrical electric arc target is an ion plating deposition area, and work supports are distributed in the ion plating deposition area. The device fully utilizes the high ionization rate of the electric arc ion plating technology, greatly improves the deposition efficiency of the ceramic coating and overcomes the defects in the prior art that expensive ion sources need to be added so as to improve adhesive force, etc. The device has the advantages of high film plating efficiency, low film plating cost, convenient operation, and the like. The device can meet the demand of over-thick ceramic coating in industry and has good application prospect in industrial production.
Description
Technical field
The present invention relates to a kind of quick solid-ceramic coating ion plating apparatus, belong to the coating technique field.
Background technology
Electrodeposited chromium is widely used in industry-by-industries such as aerospace, machinery, electronics, chemical industry, five metals, is the top coat that is most widely used.Yet the waste water that is discharged in the electrodeposited chromium process contains various heavy, especially carcinogenic sexavalent chrome severe contamination surrounding enviroment.Along with the pay attention to day by day to environmental issue, developed country has completely forbidden the use of electrodeposited chromium technology, all subcontracts the developing country that comprises China, and environment has been caused serious pollution.At serious environmental problem day by day, country has taked strict more Environmental policy.Stipulate that recently the domestic production that will gradually reduce the raw material-chromic anhydride of chromium plating most critical will cause numerous electroplating enterprises to be closed.
In order to seek substitute technology, international and domesticly carried out long-term a large amount of work.Mainly concentrate on chemical nickel phosphorus plating, thermospray, brush plating.There is pollution to a certain degree in the chemical nickel phosphorus plating treatment process, and hardness lower (Hv 500-600); The efficient of thermospray is higher, but body material is had certain requirement, and the material of spraying is limited, and the surface irregularity of spraying needs secondary processing; The brush plating has than electroplating better sticking power, better to the parts result of use that shape is fairly simple, in the reparation of heavy mechanical equipment macro-axis, brought into play good effect, then can't carry out effective coating, on performance, can't compare with electrodeposited chromium to complex-shaped workpiece.Replacing traditional electrodeposited chromium coating with free of contamination physical gas phase deposition technology (Physical Vapor Deposition: be called for short PVD) plating ceramic coating is the trend of development in recent years, many research institutions have carried out many good tries both at home and abroad, comprise that electron beam steams method, ion beam sputtering, cathodic arc deposition and magnetron sputtering etc.Wherein electron beam evaporation deposition efficient is higher, but its plated film directivity is strong, homogeneity is relatively poor, sticking power is low, be unfavorable for the preparation of complicated appearance workpiece; The coating of tradition magnetically controlled sputter method preparation does not have the drop problem, and preparation temperature is lower simultaneously, can be prepared on various body materials (as iron and steel, non-ferrous metal, plastics etc.), but it is less to carry the energy ion, and coating speed is lower, is difficult to carry out the thick film preparation.Aforesaid method coating growth velocity after carrying out reaching certain thickness when thick film prepares reduces, because the stress increase can cause coating shedding, can not carry out the industrial production of mass-producing simultaneously.
Arc ion plating (aip) is owing to have characteristics such as ionization level height, sedimentation rate is fast, ion energy is big, cost is low, can at room temperature prepare the film that area is big, compactness good, crystallization is good, the preparation method is simple, processing parameter is controlled easily, being fit to suitability for industrialized production, is the main technology of preparing of present hard coat.But the comparatively small amt of conventional arc ion plating apparatus target, vacuum chamber is bigger, causes entire equipment ionic medium volume density lower, and the sedimentation rate of coating, hardness and sticking power are poor.Sedimentation rate is generally below 3 microns/hour.In the existing plating product, many product requirement coatings are at the 80-100 micron, and in order to reach the alternate requirement, the thickness of PVD ceramic coating must be more than 20 microns, existing conventional electric arc ion coating plating equipment can't satisfy the requirement of thick coating substantially because sedimentation rate is lower.
Summary of the invention
The objective of the invention is to overcome the shortcoming of the coating sedimentation rate, hardness and the poor adhesive force that have the arc ion plating apparatus existence now, and provide a kind of quick solid-ceramic coating ion plating apparatus, this device to have ion plating effect preferably and coating thick film ability.
The technical scheme that realizes the object of the invention is: a kind of fast ceramic coating ion plating apparatus, at least comprise the vacuum chamber that surrounds by the furnace wall, vacuum chamber is provided with vacuum orifice, furnace wall one side is provided with fire door, be provided with the high-power rotating arc target of circular electric arc target and magnetic field control in the vacuum chamber, circular electric arc target is divided into the 2N row, N 〉=1, be evenly distributed on the furnace wall, high-power rotating arc target is positioned at the centre of vacuum chamber, space between circular electric arc target and the high-power rotating arc target is the ion-plating deposition district, and work rest is distributed in the ion-plating deposition district, and circular electric arc target is connected with power supply respectively with high-power rotating arc target.
Above-mentioned circular electric arc target is divided into four row, is evenly distributed on the furnace wall.The back of circular electric arc target is provided with magnet, is provided with coil behind the high-power rotating arc target, and magnetic field is produced by coil electricity, and high-power rotating arc target is cylindricality, and its range of current is 150～300A.Circular electric arc target diameter is 60-100mm, is provided with 12-16 circular electric arc target, and circular electric arc target and high-power rotating arc target target are Cr, Zr or Ti.The vacuum chamber height is a 0.5-1.5 rice, and diameter is 700-900mm.All the ion-plating deposition district is an annular region.Be provided with a plurality of well heaters near the place, furnace wall in the vacuum chamber.And the work rest below is provided with driving mechanism, and by the rotation rotating disk of drive mechanism and the rotating disk that revolves round the sun, work rest is installed on the rotation rotating disk, and the rotation rotating disk then is installed on the revolution rotating disk.
Be provided with circular electric arc target, the high-power rotary target of cylindricality and independent work rest in the vacuum chamber of the present invention as shown from the above technical solution, circular electric arc target is uniform on the vacuum furnace wall, the high-power rotating arc target of cylindricality is positioned at the center of vacuum oven, the ion-plating deposition district of work rest between circular electric arc target and cylindricality electric arc target.In vacuum chamber, one total 12-16 electric arc target, by such layout type, magnetic field is plasma body constraining between circular electric arc target and the large power electric arc target tightly, and plasma density improves greatly, when various complex parts are carried out plated film, because the high ionization level of electric arc target, workpiece is immersed in the middle of the plasma body, the effect highly significant of ion bombardment, and the homogeneity of coating has obtained good assurance.
Space among the present invention between electric arc target and the magnetic controlling target is annular ion-plating deposition district, because the high ionization level of electric arc target, magnetic field plasma body constraining between electric arc target and the magnetic controlling target tightly, improves the sedimentary province plasma density again greatly.In the conventional filming equipment, because the comparatively small amt of target, owing to will rotating, workpiece revolves round the sun and rotation during plated film, when facing target, workpiece then carries out the coating deposition, when turning over before the target surface away from target, instrument then can not carry out coating process, so cause plated film speed lower, can not carry out the preparation of thick coating.And in this film coating apparatus, owing to all fill target on the whole vacuum-chamber wall, in the middle of the vacuum chamber target is arranged also simultaneously, when plated film, workpiece can be faced more target, carries out plated film in the time of before workpiece forwards the furnace wall target to, and equally also carrying out plated film when it forwards in the face of vacuum chamber intermediary target, almost do not have the vacant not plated film time, so the sedimentation rate of coating is than more than the fast twice of the equipment of routine.In addition, when various complex parts were carried out plated film, workpiece was immersed in the middle of the plasma body fully, the effect highly significant of ion bombardment, and the homogeneity of coating has obtained good assurance.
Work rest is driven in district's rotation of annular ion-plating deposition and revolution by driving mechanism among the present invention, has improved the homogeneity of coating.Well heater is installed on the vacuum-chamber wall, can regulates the temperature in the vacuum chamber easily.
The present invention is different with general both at home and abroad at present filming equipment, arc ions technology, the high-power rotating arc target technology of cylindricality have fully been fully utilized, not only can prepare various single thick coatings such as TiN, CrN, ZrN etc., can also prepare polynary thick coating such as TiAlN, CrAlN etc., improved the homogeneity of coat-thickness well, improve coating quality, improved coating adhesion.Can carry out the research and the production work of various coating easily.The present invention can adopt computer to control automatically and the semiautomatic controls production process, and its over-all properties improves greatly.Therefore, the present invention not only makes Application Areas more extensive, has higher production efficiency, and equipment coating uniformity in having guaranteed on a large scale, and coating quality is higher, and sticking power is stronger.
In a word, equipment provided by the invention has demonstrated fully the advantage of various advanced coating techniques, has overcome the shortcoming of existing many preparation systems, has characteristics such as plated film efficient height, coating cost are low, easy to operate.Can carry out industrialized production very easily, have great using value.
Description of drawings
Fig. 1 is a structural representation of the present invention.
The CrN thick coating surface topography map of Fig. 2 for making with apparatus of the present invention.
Fig. 3 is coated with layer cross section scanning electron microscope shape appearance figure for the CrN that prepared under the condition at 30 minutes with apparatus of the present invention
Fig. 4 is coated with layer cross section scanning electron microscope shape appearance figure for the CrN that this usefulness contrive equipment prepared under the condition at 120 minutes.
1. fire doors among the figure, 2. vacuum pumping opening, 3. well heater, 4. high-power rotating arc target, 5. work rest, 6. circular electric arc target
Embodiment
Below in conjunction with specific embodiment technical scheme of the present invention is described further:
By shown in Figure 1, the vacuum chamber of quick solid-ceramic coating ion plating apparatus provided by the invention is surrounded by the furnace wall, and the vacuum chamber height is a 0.5-1.5 rice, and diameter is 700-900mm.The vacuum chamber side is provided with fire door 1, to make things convenient for the loading and unloading of workpiece.Vacuum chamber is provided with vacuum orifice 2, vacuumizes unit and vacuumizes by 2 pairs of vacuum chambers of vacuum orifice, and vacuumizing unit can be made up of diffusion pump and mechanical pump, also can adopt molecular pump, and highest attainable vacuum can reach 8 * 10
-4Pa.6 minutes four row of circular electric arc target are distributed on the furnace wall, circular electric arc target diameter is 60-100mm, the back of circular electric arc target is provided with magnet, is provided with 12-16 circular electric arc target, and the centre of vacuum chamber is high-power rotating arc target 4, be provided with coil behind the high-power rotating arc target, magnetic field is produced by coil electricity, and high-power rotating arc target 4 is cylindricality, is powered by the high power contravariant intermediate frequency power supply, its range of current is 150～300A, controls arc motion by the magnet of target high speed rotation.Circular electric arc target and high-power rotating arc target target are Cr, Zr or Ti.A plurality of well heaters 3 are installed on the furnace wall, can regulate the temperature in the vacuum chamber easily.Space between circular electric arc target 6 and the high-power rotating arc target 4 is the ion-plating deposition district, the ion-plating deposition district is an annular region, work rest 5 is distributed in the ion-plating deposition district, and work rest 5 belows are provided with driving mechanism, and by the rotation rotating disk of drive mechanism and the rotating disk that revolves round the sun, work rest 5 is installed on the rotation rotating disk, and the rotation rotating disk then is installed on the revolution rotating disk, and driving mechanism can be the gear drive that common direct-current machine drives.The gear drive rotating speed is regulated by frequency transformer.The revolution master wheel is driven by direct-current machine, the revolution of whole work-piece frame.Rotation pinion(gear) and the engagement of revolution master wheel make the workpiece rotation by the drive of revolution master wheel; By adjusting the structure of speed adjustment coating, improve the homogeneity of coating.Sample is contained on the work rest 5, revolves round the sun and rotation between the circular electric arc target 6 on high-power rotating arc target 4 of center cylindricality and the furnace wall.This layout increases considerably vacuum chamber ionic medium volume density, and workpiece is immersed in the plasma body fully.Coating sedimentation rate, hardness, sticking power are greatly improved.
The concrete use-case of quick solid-ceramic coating ion plating apparatus provided by the invention is as follows:
The experiment target is the high-purity Cr of 99.95at.%, Ti or Zr target; The plated film sample is respectively the stainless steel substrates that Wimet and numerically controlled wire cutting machine cut into 20mm * 50mm * 1mm, puts into depositing system and carry out the CrN coating preparation after pre-grinding, polishing and strict clean.Substrate DC bias is that 0～1200V is adjustable continuously.Working gas is N
2And Ar, control by mass flowmeter.The substrate rotating speed is adjustable.
Example 1: under the condition of 0.5Pa, negative 150V bias voltage, utilize the Metal Cr target arc-over of magnetic field control to prepare pure Cr intermediate metal; Feed nitrogen then, air pressure is raised to 2.3Pa, opens electric arc target all on the furnace wall and intermediary rotary target, utilizes nitrogen and generates CrN from the Cr reaction that target surface is evaporated.Wherein feeding the nitrogen gas flow is 200-600sccm; The electric current of single circular electric arc target electric current metallic target is 60-80A on the furnace wall.Center rotary target electric current is at 250-300A.
The magnetic field of circular control arc motion is produced by magnet by the back that is placed on electric arc target on the above-mentioned furnace wall.Producing intensity at target surface is the equally distributed magnetic fields of 50 Gausses.
Above-mentioned glow discharge is cleaned at 350-400 ℃, carries out under the ar gas environment; After aura cleaned and finishes, Metal Cr target cathode arc-over carried out under the 0.5Pa condition, and the deposit thickness of intermediate metal is the 100-200 nanometer; The CrN coat-thickness is at the 20-30 micron.Feeding the nitrogen gas flow is 200-600sccm, and argon gas is 10-50sccm.Preparation temperature 400-450 ℃, bias voltage is negative 150V.
Example 2: under the condition of 0.5Pa, negative 200V bias voltage, utilize the metal Ti target arc-over of magnetic field control to prepare pure Ti intermediate metal; Feed nitrogen then, air pressure is raised to 1Pa, opens electric arc target all on the furnace wall and intermediary rotary target, utilizes nitrogen and generates TiN from the Ti reaction that target surface is evaporated.Wherein feeding the nitrogen gas flow is 100-250sccm; The electric current of single circular electric arc target electric current metallic target is 40-60A on the furnace wall.Center rotary target electric current is at 180-250A.
The magnetic field of circular control arc motion is produced by magnet by the back that is placed on electric arc target on the above-mentioned furnace wall.Producing intensity at target surface is the equally distributed magnetic fields of 50 Gausses.
Above-mentioned glow discharge is cleaned at 350-400 ℃, carries out under the ar gas environment; After aura cleaned and finishes, metal Ti target cathode arc-over carried out the deposition of metal Ti transition layer under the 0.5Pa condition, and thickness is the 100-200 nanometer; The TiN coat-thickness is at the 15-20 micron.Feeding the nitrogen gas flow is 100-200sccm, and argon gas is 10-50sccm.Preparation temperature 400-450 ℃, bias voltage is negative 200V.
Example 3: under the condition of 0.5Pa, negative 100V bias voltage, utilize the metallic Z r target arc-over of magnetic field control to prepare pure Zr intermediate metal; Feed nitrogen then, air pressure is raised to 1.5Pa, opens electric arc target all on the furnace wall and intermediary rotary target, utilizes nitrogen and generates ZrN from the Zr reaction that target surface is evaporated.Wherein feeding the nitrogen gas flow is 150-350sccm; The electric current of single circular electric arc target electric current metallic target is 80-110A on the furnace wall.Center rotary target electric current is at 200-280A.
The magnetic field of circular control arc motion is produced by magnet by the back that is placed on electric arc target on the above-mentioned furnace wall.Producing intensity at target surface is the equally distributed magnetic fields of 50 Gausses.
Above-mentioned glow discharge is cleaned at 350-400 ℃, carries out under the ar gas environment; After aura cleaned and finishes, metallic Z r target cathode arc-over carried out the deposition of metallic Z r transition layer under the 0.5Pa condition, and thickness is the 100-200 nanometer; The ZrN coat-thickness is at the 25-30 micron.Feeding the nitrogen gas flow is 150-300sccm, and argon gas is 10-50sccm.Preparation temperature 400-450 ℃, bias voltage is negative 200V.
Fig. 2 exists certain hole and particle as can be seen for the surface topography of the CrN thick coating of this device of employing preparation from the surface, this is the defective that arc method itself is had.
Fig. 3, Fig. 4 are respectively that preparation time is 30 minutes, the scanning electron microscope picture of the cross section pattern of the coating that made in 60 minutes, as can be seen from Figure 3 can deposit the CrN coating of 5 microns left and right thicknesses in 30 minutes.As can be seen from Figure 4 then can obtain nearly 20 microns CrN coating through 120 minutes depositions.Per hour reach nearly 10 microns speed of growth, can satisfy the requirement of preparation fast of industrialization ceramic coating.
Claims (9)
1. quick solid-ceramic coating ion plating apparatus, at least comprise the vacuum chamber that surrounds by the furnace wall, vacuum chamber is provided with vacuum orifice, furnace wall one side is provided with fire door, it is characterized in that: the high-power rotating arc target that is provided with the control of circular electric arc target and magnetic field in the vacuum chamber, circular electric arc target is divided into the 2N row, N 〉=1, be evenly distributed on the furnace wall, high-power rotating arc target is positioned at the centre of vacuum chamber, space between circular electric arc target and the high-power rotating arc target is the ion-plating deposition district, and work rest is distributed in the ion-plating deposition district, and circular electric arc target is connected with power supply respectively with high-power rotating arc target.
2. quick solid-ceramic coating ion plating apparatus according to claim 1 is characterized in that: the back of circular electric arc target is provided with magnet, is provided with coil behind the high-power rotating arc target, and magnetic field is produced by coil electricity.
3. quick solid-ceramic coating ion plating apparatus according to claim 1 is characterized in that: circular electric arc target is divided into four row, is evenly distributed on the furnace wall, and the large power electric arc target is cylindricality, and its range of current is 150～300A.
4. quick ion film plating deposition apparatus according to claim 1 and 2 is characterized in that: circular electric arc target diameter is 60-100mm, is provided with 12-16 circular electric arc target, and circular electric arc target and high-power rotating arc target target are Cr, Zr or Ti.
5. quick ion film plating deposition apparatus according to claim 1 and 2 is characterized in that: the power supply of high-power rotating arc target is the high power contravariant intermediate frequency power supply.
6. quick solid-ceramic coating ion plating apparatus according to claim 1 and 2 is characterized in that: the vacuum chamber height is a 0.5-1.5 rice, and diameter is 700-900mm.
7. quick solid-ceramic coating ion plating apparatus according to claim 1 and 2 is characterized in that: all the ion-plating deposition district is an annular region.
8. quick solid-ceramic coating ion plating apparatus according to claim 1 and 2 is characterized in that: a plurality of well heaters are installed on the furnace wall.
9. quick solid-ceramic coating ion plating apparatus according to claim 1 and 2, it is characterized in that: the work rest below is provided with driving mechanism, and by the rotation rotating disk of drive mechanism and the rotating disk that revolves round the sun, work rest is installed on the rotation rotating disk, and the rotation rotating disk then is installed on the revolution rotating disk.
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| Application Number | Priority Date | Filing Date | Title |
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| CNA2008101976449A CN101403101A (en) | 2008-11-14 | 2008-11-14 | Quick solid-ceramic coating ion plating apparatus |
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| Application Number | Priority Date | Filing Date | Title |
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| CNA2008101976449A CN101403101A (en) | 2008-11-14 | 2008-11-14 | Quick solid-ceramic coating ion plating apparatus |
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| CN101403101A true CN101403101A (en) | 2009-04-08 |
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Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102345098A (en) * | 2011-08-31 | 2012-02-08 | 苏州鼎利涂层有限公司 | Vacuum coating machine |
| CN108018530A (en) * | 2017-12-29 | 2018-05-11 | 上海驰声新材料有限公司 | The filming equipment and evaporation color method of a kind of non-crystaline amorphous metal |
| CN109055901A (en) * | 2018-10-25 | 2018-12-21 | 大连维钛克科技股份有限公司 | A kind of device and technique improving hard coat and substrate binding force |
| CN109576652A (en) * | 2018-12-20 | 2019-04-05 | 江苏徐工工程机械研究院有限公司 | A kind of electric arc ion plating device |
| CN110039044A (en) * | 2019-05-29 | 2019-07-23 | 北京金航智造科技有限公司 | A kind of powder surface cladding coating apparatus and method |
| CN110387525A (en) * | 2019-08-15 | 2019-10-29 | 常州机电职业技术学院 | A kind of medical apparatus surface titanizing processing unit and processing method |
-
2008
- 2008-11-14 CN CNA2008101976449A patent/CN101403101A/en active Pending
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102345098A (en) * | 2011-08-31 | 2012-02-08 | 苏州鼎利涂层有限公司 | Vacuum coating machine |
| CN108018530A (en) * | 2017-12-29 | 2018-05-11 | 上海驰声新材料有限公司 | The filming equipment and evaporation color method of a kind of non-crystaline amorphous metal |
| CN109055901A (en) * | 2018-10-25 | 2018-12-21 | 大连维钛克科技股份有限公司 | A kind of device and technique improving hard coat and substrate binding force |
| CN109576652A (en) * | 2018-12-20 | 2019-04-05 | 江苏徐工工程机械研究院有限公司 | A kind of electric arc ion plating device |
| CN110039044A (en) * | 2019-05-29 | 2019-07-23 | 北京金航智造科技有限公司 | A kind of powder surface cladding coating apparatus and method |
| CN110387525A (en) * | 2019-08-15 | 2019-10-29 | 常州机电职业技术学院 | A kind of medical apparatus surface titanizing processing unit and processing method |
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Open date: 20090408 |