CN216712287U - Interval adjustable formula panel is electroplated and is shielded system - Google Patents
Interval adjustable formula panel is electroplated and is shielded system Download PDFInfo
- Publication number
- CN216712287U CN216712287U CN202123412295.8U CN202123412295U CN216712287U CN 216712287 U CN216712287 U CN 216712287U CN 202123412295 U CN202123412295 U CN 202123412295U CN 216712287 U CN216712287 U CN 216712287U
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- electroplating
- guide rail
- fixing block
- adjusting
- shielding plate
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- 238000009713 electroplating Methods 0.000 claims abstract description 55
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 29
- 238000006243 chemical reaction Methods 0.000 claims abstract description 11
- 238000007747 plating Methods 0.000 claims description 7
- 230000000873 masking effect Effects 0.000 claims 5
- 210000005056 cell body Anatomy 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
- 230000000712 assembly Effects 0.000 abstract description 4
- 238000000429 assembly Methods 0.000 abstract description 4
- 230000000694 effects Effects 0.000 description 4
- 239000007788 liquid Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 230000007547 defect Effects 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000005868 electrolysis reaction Methods 0.000 description 1
- 238000007654 immersion Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
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- Electroplating Methods And Accessories (AREA)
Abstract
The utility model discloses an interval adjustable type plate electroplating shielding system which comprises an electroplating tank body, wherein a reaction tank is arranged in the electroplating tank body, two upper area shielding plates are arranged in the electroplating tank body, two first adjusting assemblies are arranged on one side of each upper area shielding plate, two lower area shielding plates are arranged in the electroplating tank body, and two second adjusting assemblies are arranged on one side of each lower area shielding plate. The first adjusting assembly, the second adjusting assembly and the third adjusting assembly are used in a matched mode, the upper area shielding plate and the lower area shielding plate are adjusted, and the influence of high and low current difference is reduced; the difference between the upper and lower electroplating thicknesses in the electroplating area of the plate is reduced, current lines in partial areas are shielded, the thickness of the electroplating layer in unnecessary areas is reduced, and the cost is saved; by increasing the number of the water inlet pipes and the small pipe diameter and large impact force, the exchange frequency of the electroplating solution in the reaction tank is increased, and the ion number in the tank solution required by electroplating is met.
Description
Technical Field
The utility model relates to the technical field of plate electroplating, in particular to an interval adjustable type plate electroplating shielding system.
Background
Electroplating is the process of plating a thin layer of other metals or alloys on certain metal surfaces using the principle of electrolysis.
The plate electroplating is usually performed by full immersion. Because of the position difference in the bath solution, obvious current difference exists, and the defect of large film thickness difference between the middle area and the edge area further occurs; many plates are stamped into a terminal shape according to requirements after being electroplated, and a certain area of the lower edge is only in a traction effect and is cut off during stamping, and the electroplated layer in the area basically has no effect; in addition, in the process of electroplating the plate, the thickness of the electroplated film is not easy to meet due to the large area of the plate.
SUMMERY OF THE UTILITY MODEL
The utility model aims to solve the defects in the prior art and provides a spacing-adjustable plate electroplating shielding system.
In order to achieve the purpose, the utility model adopts the following technical scheme: an interval adjustable plate electroplating shielding system comprises an electroplating tank body, wherein a reaction tank is arranged in the electroplating tank body, two upper area shielding plates are arranged in the electroplating tank body, two first adjusting components are arranged on one side of each upper area shielding plate, two lower area shielding plates are arranged in the electroplating tank body, and two second adjusting components are arranged on one side of each lower area shielding plate;
the first adjusting assembly comprises a first guide rail fixing block, first height adjusting guide rails are arranged at two ends of the top of the first guide rail fixing block, a first supporting seat is arranged at the top of each first height adjusting guide rail, a first height adjusting nut is rotatably arranged in each first supporting seat, and a first baffle plate fixing block is connected to the outer portion of each first height adjusting nut in a threaded mode;
the second adjusting part comprises a second guide rail fixing block, second height adjusting guide rails are arranged at two ends of the top of the second guide rail fixing block, a second supporting seat is arranged at the top of the second height adjusting guide rails, a second height adjusting nut is arranged inside the second supporting seat in a rotating mode, a second shielding plate fixing block is connected to the outside of the second height adjusting nut in a threaded mode, and a third adjusting part is arranged inside the first guide rail fixing block and the second guide rail fixing block.
Preferably, one end of the interior of the electroplating tank body is provided with water inlet pipes, and the number of the water inlet pipes is at least four.
Preferably, a water outlet cavity is formed in the electroplating tank body, the top of the water outlet cavity is communicated with a through hole, and the bottom of the water outlet cavity is communicated with a water outlet pipe.
Preferably, the first baffle plate fixing block is connected with the upper area baffle plate, and two ends of the first baffle plate fixing block are slidably sleeved outside the first height adjusting guide rail.
Preferably, the second baffle plate fixing block is connected with the lower area baffle plate, and the two ends of the second baffle plate fixing block are slidably sleeved outside the second height adjusting guide rail.
Preferably, the third adjusting assembly comprises two third guide rail fixing blocks, two distance adjusting guide rails are arranged on opposite sides of the two third guide rail fixing blocks, and distance adjusting nuts are rotatably arranged inside the third guide rail fixing blocks.
Compared with the prior art, the utility model has the beneficial effects that: in the utility model, the first adjusting component, the second adjusting component and the third adjusting component are used in a matched manner to adjust the upper area shielding plate and the lower area shielding plate, so that the influence of high and low current difference is reduced; the difference between the upper and lower electroplating thicknesses in the electroplating area of the plate is reduced, current lines in partial areas are shielded, the thickness of the electroplating layer in unnecessary areas is reduced, the cost is saved, and meanwhile, the production speed of the product can be further improved; by increasing the number of the water inlet pipes and the small pipe diameter and large impact force, the exchange frequency of the electroplating solution in the reaction tank is increased, and the ion number in the tank solution required by electroplating is met.
Drawings
The accompanying drawings, which are included to provide a further understanding of the utility model and are incorporated in and constitute a part of this application, illustrate embodiment(s) of the utility model and together with the description serve to explain the utility model without limiting the utility model. In the drawings:
FIG. 1 is a schematic front sectional view of the present invention;
FIG. 2 is a schematic side sectional view of a portion of the present invention;
FIG. 3 is a schematic side sectional view of a portion of the present invention;
FIG. 4 is a schematic front view of a first adjusting assembly according to the present invention;
FIG. 5 is a schematic side view of a second adjustment assembly according to the present invention;
fig. 6 is a schematic top view of a third adjusting assembly according to the present invention.
Number in the figure: 1. electroplating a tank body; 2. a water inlet pipe; 3. a reaction tank; 4. a water outlet cavity; 5. a through hole; 6. a water outlet pipe; 7. an upper region shutter; 8. a first adjustment assembly; 801. a first guide rail fixing block; 802. a first height adjustment guide rail; 803. a first support base; 804. a first height adjustment nut; 805. a first baffle plate fixing block; 9. a lower region shutter; 10. a second adjustment assembly; 1001. a second guide rail fixing block; 1002. a second height adjustment guide rail; 1003. a second support seat; 1004. a second height adjustment nut; 1005. a second shielding plate fixing block; 11. a third adjustment assembly; 1101. a third guide rail fixing block; 1102. a spacing adjustment guide rail; 1103. and a spacing adjusting nut.
Detailed Description
The technical solutions in the embodiments of the present invention will be clearly and completely described below with reference to the drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only a part of the embodiments of the present invention, and not all of the embodiments.
Example (b): referring to fig. 1-6, an interval-adjustable plate electroplating shielding system comprises an electroplating tank body 1, wherein a reaction tank 3 is arranged inside the electroplating tank body 1, two upper region shielding plates 7 are arranged inside the electroplating tank body 1, two first adjusting assemblies 8 are arranged on one side of each upper region shielding plate 7, two lower region shielding plates 9 are arranged inside the electroplating tank body 1, and two second adjusting assemblies 10 are arranged on one side of each lower region shielding plate 9; the first adjusting assembly 8 comprises a first guide rail fixing block 801, first height adjusting guide rails 802 are arranged at two ends of the top of the first guide rail fixing block 801, a first supporting seat 803 is arranged at the top of the first height adjusting guide rails 802, a first height adjusting nut 804 is rotatably arranged inside the first supporting seat 803, a first shielding plate fixing block 805 is connected to the outer portion of the first height adjusting nut 804 through threads, the first shielding plate fixing block 805 is connected with the upper area shielding plate 7, and two ends of the first shielding plate fixing block 805 are slidably sleeved outside the first height adjusting guide rails 802; the second adjusting component 10 comprises a second guide rail fixing block 1001, the two ends of the top of the second guide rail fixing block 1001 are both provided with a second height adjusting guide rail 1002, the top of the second height adjusting guide rail 1002 is provided with a second supporting seat 1003, the inside of the second supporting seat 1003 is rotatably provided with a second height adjusting nut 1004, the outside of the second height adjusting nut 1004 is in threaded connection with a second shielding plate fixing block 1005, the second shielding plate fixing block 1005 is connected with a lower region shielding plate 9, the two ends of the second shielding plate fixing block 1005 are slidably sleeved outside the second height adjusting guide rail 1002, the inside of the first guide rail fixing block 801 and the inside of the second guide rail fixing block 1001 are both provided with a third adjusting component 11, the first adjusting component 8, the second adjusting component 10 and the third adjusting component 11 are used in a matching way, the upper region shielding plate 7 and the lower region shielding plate 9 are adjusted, and the problem of large difference between the film thickness of the middle region and the film thickness of the edge region is prevented, the influence of high and low current difference is reduced; the difference between the upper and lower electroplating thicknesses in the electroplating area of the plate is reduced, current lines in partial areas are shielded, the thickness of the electroplating layer in unnecessary areas is reduced, the cost is saved, and meanwhile, the production speed of products can be further improved.
In the utility model, one end of the interior of the electroplating tank body 1 is provided with at least four water inlet pipes 2, and the exchange frequency of electroplating solution in the reaction tank 3 is increased by increasing the number of the water inlet pipes 2 and the small-pipe-diameter large-impact force, so that the ion number in the tank solution required by electroplating is satisfied.
In the utility model, a water outlet cavity 4 is arranged in an electroplating tank body 1, the top of the water outlet cavity 4 is communicated with a through hole 5, the bottom of the water outlet cavity 4 is communicated with a water outlet pipe 6, tank liquid in a reaction tank 3 flows into the water outlet cavity 4 through the through hole 5 after being electroplated, and then is discharged through the water outlet pipe 6, and the water outlet pipe 6 is independently provided with a cavity body to ensure that the tank liquid entering the reaction tank 3 flows out after being electroplated, thereby avoiding direct discharge due to ineffective inflow.
In the utility model, the third adjusting assembly 11 comprises two third rail fixing blocks 1101, the third rail fixing blocks 1101 are arranged inside the electroplating tank body 1, two distance adjusting rails 1102 are arranged on opposite sides of the two third rail fixing blocks 1101, distance adjusting nuts 1103 are rotatably arranged inside the third rail fixing blocks 1101, the distance adjusting nuts 1103 are respectively screwed inside the first rail fixing block 801 and the second rail fixing block 1001, the first rail fixing block 801 and the second rail fixing block 1001 are respectively sleeved outside the distance adjusting rails 1102 in a sliding manner, the position of the upper region shielding plate 7 can be adjusted according to the thickness distribution condition of electroplated layers by adjusting the distance adjusting nuts 1103 in the first rail fixing block 801, the amount of tank liquid entering the lower region shielding plate 9 is controlled by adjusting the distance adjusting nuts 1103 in the second rail fixing block 1001, and the electroplating thickness of the lower shielding region is controlled within a certain range, the thickness of the plating layer is reduced in the unnecessary areas.
The working principle is as follows: when the utility model is used, electroplating solution is injected into the electroplating tank body 1 through the water inlet pipe 2, before production, according to the actual electroplating required area of a plate to be processed, the height of the lower area baffle plate 9 is adjusted, the second height adjusting nut 1004 is rotated, so that the second baffle plate fixing block 1005 moves up and down along the second height adjusting guide rail 1002, the second baffle plate fixing block 1005 drives the lower area baffle plate 9 to move up and down, so that the lower area baffle plate 9 is in a proper position, the upper area baffle plate 7 can be adjusted according to the thickness distribution condition of the electroplating layer in the production process, when adjustment is performed, the first height adjusting nut 804 is rotated, so that the first baffle plate fixing block 805 moves up and down along the first height adjusting 801, the first baffle plate fixing block 805 drives the upper area baffle plate 7 to move up and down, so that the upper area baffle plate 7 is in a proper position, if no requirement exists, the position of the upper-area shielding plate 7 is adjusted to be higher than that of the plate material, so that the upper-area shielding plate 7 has no shielding effect, by adjusting the spacing adjusting nut 1103 inside the second fixed rail block 1001, the second fixed rail block 1001 slides along the spacing adjusting rail 1102, the position of the whole second adjusting assembly 10 is adjusted, the amount of the tank liquid entering the lower area shielding plate 9 is controlled, further, the electroplating thickness of the shielding area under control is within a certain range, and by adjusting the spacing adjusting nut 1103 inside the first guide rail fixing block 801, the position of the whole first adjusting assembly 8 can be adjusted, the position of the upper region baffle plate 7 can be adjusted according to the thickness distribution of the electroplated layer, if not required, the upper area baffle 7 can be adjusted to the most edge without shielding effect, and the bath solution in the reaction tank 3 flows into the water outlet cavity 4 through the through hole 5 after being electroplated and then is discharged by the water outlet pipe 6.
The above description is only for the preferred embodiment of the present invention, but the scope of the present invention is not limited thereto, and any person skilled in the art should be considered as the technical solutions and the utility model concepts of the present invention in the scope of the present invention.
Claims (6)
1. The utility model provides an interval adjustable formula panel is electroplated and is shielded system, includes electroplating cell body (1), its characterized in that: a reaction tank (3) is arranged in the electroplating tank body (1), two upper area shielding plates (7) are arranged in the electroplating tank body (1), two first adjusting components (8) are arranged on one side of each upper area shielding plate (7), two lower area shielding plates (9) are arranged in the electroplating tank body (1), and two second adjusting components (10) are arranged on one side of each lower area shielding plate (9);
the first adjusting assembly (8) comprises a first guide rail fixing block (801), first height adjusting guide rails (802) are arranged at two ends of the top of the first guide rail fixing block (801), a first supporting seat (803) is arranged at the top of the first height adjusting guide rails (802), a first height adjusting nut (804) is rotatably arranged inside the first supporting seat (803), and a first shielding plate fixing block (805) is connected to the outer threads of the first height adjusting nut (804);
the second adjusting assembly (10) comprises a second guide rail fixing block (1001), second height adjusting guide rails (1002) are arranged at two ends of the top of the second guide rail fixing block (1001), a second supporting seat (1003) is arranged at the top of the second height adjusting guide rails (1002), a second height adjusting nut (1004) is rotatably arranged inside the second supporting seat (1003), a second shielding plate fixing block (1005) is connected to the outer portion of the second height adjusting nut (1004) through threads, and a third adjusting assembly (11) is arranged inside each of the first guide rail fixing block (801) and the second guide rail fixing block (1001).
2. The system of claim 1, wherein the gap-adjustable plate plating masking system comprises: one end of the interior of the electroplating tank body (1) is provided with water inlet pipes (2), and the number of the water inlet pipes (2) is at least four.
3. The system of claim 1, wherein the adjustable distance plate plating masking system comprises: the electroplating tank is characterized in that a water outlet cavity (4) is formed in the electroplating tank body (1), the top of the water outlet cavity (4) is communicated with a through hole (5), and the bottom of the water outlet cavity (4) is communicated with a water outlet pipe (6).
4. The system of claim 1, wherein the adjustable distance plate plating masking system comprises: the first baffle plate fixing block (805) is connected with the upper area baffle plate (7), and two ends of the first baffle plate fixing block (805) are sleeved outside the first height adjusting guide rail (802) in a sliding mode.
5. The system of claim 1, wherein the adjustable distance plate plating masking system comprises: second shielding plate fixed block (1005) is connected with lower regional shielding plate (9), the outside at second altitude mixture control guide rail (1002) is established to the both ends slip cover of second shielding plate fixed block (1005).
6. The system of claim 1, wherein the adjustable distance plate plating masking system comprises: the third adjusting assembly (11) comprises two third guide rail fixing blocks (1101), two distance adjusting guide rails (1102) are arranged on the opposite sides of the two third guide rail fixing blocks (1101), and distance adjusting nuts (1103) are rotatably arranged inside the third guide rail fixing blocks (1101).
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202123412295.8U CN216712287U (en) | 2021-12-31 | 2021-12-31 | Interval adjustable formula panel is electroplated and is shielded system |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN202123412295.8U CN216712287U (en) | 2021-12-31 | 2021-12-31 | Interval adjustable formula panel is electroplated and is shielded system |
Publications (1)
Publication Number | Publication Date |
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CN216712287U true CN216712287U (en) | 2022-06-10 |
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN202123412295.8U Active CN216712287U (en) | 2021-12-31 | 2021-12-31 | Interval adjustable formula panel is electroplated and is shielded system |
Country Status (1)
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CN (1) | CN216712287U (en) |
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2021
- 2021-12-31 CN CN202123412295.8U patent/CN216712287U/en active Active
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Effective date of registration: 20240102 Address after: No. 174 Yangyuan Yingbin West Road, Xinzhuang Town, Changshu City, Suzhou City, Jiangsu Province, 215500 Patentee after: Suzhou Zhengwei Electromechanical Equipment Co.,Ltd. Address before: 215500 6 caiyunxiang Road, shuangbang village, Xinzhuang Town, Changshu City, Suzhou City, Jiangsu Province Patentee before: Yongxin Electronics (Changshu) Co.,Ltd. |