CN102560608B - Vertical plating tank with independent adjustable function - Google Patents
Vertical plating tank with independent adjustable function Download PDFInfo
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- CN102560608B CN102560608B CN201210033723.2A CN201210033723A CN102560608B CN 102560608 B CN102560608 B CN 102560608B CN 201210033723 A CN201210033723 A CN 201210033723A CN 102560608 B CN102560608 B CN 102560608B
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- box
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- negative electrode
- plating solution
- cathode
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Abstract
The invention discloses a vertical plating tank with an independent adjustable function. The vertical plating tank comprises a cathode box and an anode box, wherein the electrode faces of the cathode box and the anode box are oppositely arranged; two sides of the electrode faces of the cathode box and the anode box are provided with side-push plates; therefore, plating solution channels are respectively formed among the cathode box, the anode box and two side-push plates; one of the cathode box and the anode box is installed on the linear guide rail and is connected with a driving mechanism, so that a distance between a cathode face and an anode face can be regulated through the relative movement of the cathode box and the anode box; the side-push plates are of a dismountable structure; and a liquid outlet below the plating solution channels is provided with an intercepter plate which can regulate the flow of the plating solution. The vertical plating tank has a simple and compact structure and is convenient for workpiece assembly and disassembly, and an interval between the cathode plate and the anode plate as well as plating solution flow rate can be independently regulated, which is convenient for laboratory users to analyze electroplating efficiency and product performance. The accurate and varied test means are provided for developing a new coating, diagnosing product defects, optimizing the plating process and the like, and the vertical plating tank is favorable for lowering test cost and increasing research efficiency.
Description
Technical field
The present invention relates to electroplate testing apparatus, refer to particularly a kind of for the vertical plating tank with independent adjustable function with the test of steel Electroplating Production.
Background technology
Plating is exactly to utilize electrolysis principle on some metallic surface, to plate the process of other metal or alloy of skim.During plating, in filling the coating bath of electroplate liquid, the unplated piece of process cleaning and special pre-treatment, as negative electrode, is done anode with metal lining, and the two poles of the earth connect with positive pole and the negative pole of direct supply respectively.Electroplate liquid is comprised of the aqueous solution of salt, buffer reagent, pH adjusting agent and the additive etc. of the compound that contains metal lining, conduction.After energising, the metal ion in electroplate liquid is moved to and on negative electrode, forms coating in the effect of potential difference.The main size with unplated piece of the mode of electroplating and relevant in batches, conventional at present have rack plating, barrel plating, plating and brush plating etc. continuously, a continuous plating mode of the many employings of the batch production of electroplating with steel.
Closely during the last ten years, the newly-built continuous electroplating zinc unit in the world adopts vertical groove gravity method electroplating technology mostly, is not full of plating solution during plating in coating bath, and plating solution only exists and riddles between cathode-anode plate, and flowing of plating solution leans on the gravity of self to accelerate.When plating solution overflow port height one regularly, there is one-to-one relationship in the bath flow rate between cathode-anode plate and cathode-anode plate spacing, i.e. the corresponding specifically bath flow rate of specific cathode-anode plate spacing, cathode-anode plate spacing, bath flow rate all cannot independently regulate.
For the impact on electroplating efficiency and quality product in gravity method electro-galvanizing is produced of bath flow velocity, further investigation has all been launched in countries in the world, research technique and method are also not quite similar, and main method is to change plating tank plating solution to go out open height, by higher drop, obtains flow velocity faster.But this method, for laboratory equipment, because its space constraint has some limitations, and is difficult for operation and maintenance, is difficult to realize cathode-anode plate spacing, bath flow rate and independently regulates.
Summary of the invention
Object of the present invention is exactly that a kind of vertical plating tank with independent adjustable function will be provided, its cathode-anode plate spacing, bath flow rate all can independently regulate, and make laboratory user can research and analyse easily electroplating efficiency and product performance under different cathode-anode plate spacing, different bath flow rate.
For achieving the above object, the vertical plating tank with independent adjustable function that the present invention is designed, the negative electrode box and the anode cassette that comprise electrode surface positioned opposite, the electrode surface both sides of described negative electrode box and anode cassette are provided with side guide, thereby be formed with plating solution passage between negative electrode box, anode cassette and two side guides, described negative electrode box is arranged on line slideway and with driving mechanism and is connected with in anode cassette one, thereby can make both by relatively moving to regulate the distance between negative and positive pole-face; Described side guide is Demountable; The liquid outlet place, below of described plating solution passage is provided with the intercepter plate of adjustable plating solution flow.
Further, the electrode surface of described negative electrode box consists of the conductive copper plate and the titanium plate that fit into one, is provided with for setting the guide path of workpiece to be plated on described titanium plate; The electrode surface of described anode cassette consists of the conductive copper plate and the titanium iridium plate that fit into one.
Further, be provided with for adsorbing the electro-magnet of workpiece to be plated on the electrode surface of described negative electrode box, described electro-magnet is arranged in solenoid isolation cover.
Further, the top of described plating solution passage is provided with upper press cover, on described upper press cover, offer and be convenient to the U-bolt hole that bolt moves, the both sides of described upper press cover are connected with anode cassette with negative electrode box by bolt, thereby make plating solution passage form a semiclosed pressure chamber.
Further, described side guide is down wedge structure, is inlaid between the side draw-in groove of negative electrode box and the side draw-in groove of anode cassette, thereby makes side guide 14 when pressing down, the sealing effectiveness that strengthens pressure chamber, the top of described side guide is provided with is convenient to manual groove.
Further, described driving mechanism is servomotor.
Again further, described anode cassette is arranged on line slideway, and one end of described intercepter plate is hinged on the bottom of negative electrode box, thus the flow velocity of conveniently adjusted plating solution.
Again further, the electrode surface adjustable distance scope of described negative electrode box and anode cassette is 0～20mm.
Compared with prior art, the invention has the advantages that: negative electrode box is arranged on line slideway and with driving mechanism and is connected with in anode cassette one, thereby can make both by relatively moving to regulate the distance between negative and positive pole-face; Side guide is designed to Demountable, facilitates workpiece dismounting; Below plating solution passage, liquid outlet place arranges the intercepter plate of adjustable plating solution flow, thus adjustable different bath flow rate.Therefore, the present invention can realize independent adjusting the separately of cathode-anode plate spacing, bath flow rate, facilitate laboratory user to analyze electroplating efficiency and product performance under different cathode-anode plate spacing, different bath flow rate, for it, develop new coating, diagnostic products defect, optimization electroplating technology etc. accurately various research technique is provided, this is conducive to reduce experimentation cost, improves scientific research efficiency.
Accompanying drawing explanation
Fig. 1 is a kind of structural representation with the vertical plating tank of independent adjustable function.
Fig. 2 is the A-A sectional structure schematic diagram in Fig. 1.
Fig. 3 is the structural representation of upper press cover in Fig. 1.
Fig. 4 is the left sectional view of Fig. 3.
Fig. 5 is the structural representation of side guide in Fig. 2.
Fig. 6 is the left sectional view of Fig. 5.
In figure: upper press cover 1, negative electrode box 2, electro-magnet insulation covering 3, electro-magnet 4, workpiece to be plated 5, titanium plate 6, conductive copper plate 7, intercepter plate 8, titanium iridium plate 9, reservoir 10, working barrel 11, driving mechanism 12, anode cassette 13, side guide 14, line slideway 15, flexible pipe 16, plating solution passage 17, liquid outlet 18.
Embodiment
Below in conjunction with the drawings and specific embodiments, the present invention is described in further detail.
The vertical plating tank with independent adjustable function shown in figure, the negative electrode box 2 and the anode cassette 13 that comprise electrode surface positioned opposite, the electrode surface both sides of negative electrode box 2 and anode cassette 13 are provided with side guide 14, thereby form plating solution passage 17 between negative electrode box 2, anode cassette 13 and two side guides 14, anode cassette 13 is arranged on line slideway 15 and with driving mechanism 12 and is connected, thereby can make both by relatively moving to regulate the distance between negative and positive pole-face; Side guide 14 is set to Demountable, facilitate anode and cathode identity distance from adjusting and workpiece to be plated 5 dismounting; Below liquid outlet 18 places of plating solution passage 17 are provided with the intercepter plate 8 of adjustable plating solution flow, and one end of intercepter plate 8 is hinged on the bottom of negative electrode box 2.
Particularly, the electrode surface of negative electrode box 2 consists of the conductive copper plate 7 and the titanium plate 6 that fit into one, on titanium plate 6, be provided with for setting the guide path of workpiece to be plated 5, be also provided with for adsorbing the electro-magnet 4 of workpiece to be plated 5 on the electrode surface of negative electrode box 2, electro-magnet 4 is arranged in solenoid isolation cover 3.The electrode surface of anode cassette 13 consists of the conductive copper plate 7 and the titanium iridium plate 9 that fit into one.The top that forms plating solution passage 17 between negative electrode box 2, anode cassette 13 and two side guides 14 is provided with the upper press cover 1 of transparent organic glass, on upper press cover 1, offer and be convenient to the U-bolt hole 1a that bolt moves, the both sides of upper press cover 1 are connected with anode cassette 13 with negative electrode box 2 by bolt, thereby make plating solution passage 17 form a semiclosed pressure chamber.Preferably, above-mentioned side guide 14 is down wedge structure, make side guide 14 when pressing down, strengthened the sealing effectiveness of pressure chamber, this side guide 14 is inlaid between the side draw-in groove 2a of negative electrode box 2 and the side draw-in groove 13a of anode cassette 13, and the top of side guide 14 is provided with is convenient to manual groove 14a.
When the present invention works, first extract side guide 14 out, open upper press cover 1, adopt servomotor as driving mechanism 12, by servomotor, anode cassette 13 is moved on to ultimate range along line slideway 15, then workpiece to be plated 5 is inserted in negative electrode box 2 by the guide path on titanium plate 6, after electro-magnet 4 energisings, workpiece to be plated 5 is inhaled and is clipped on titanium plate 6, intercepter plate 8 openings are transferred to maximum, start servomotor, anode cassette 13 is close to negative electrode box 2 along line slideway 15, until cathode-anode plate spacing reaches user's set(ting)value, this set(ting)value can need to be set arbitrarily according to user between 0～20mm.Then, then plug side guide 14, press and fastening transparent upper press cover 1, make electroplating process completely visual.Start working barrel 11, from reservoir 10, extract plating solution, and by injecting plating solution until plating solution overflows from anode cassette overflow port in the flexible pipe 16 anode boxes 13 that connect, the opening degree of manual regulation intercepter plate 8, or intercepter plate 8 is designed to automatically to regulate to the structure of opening degree, guarantees that plating solution is just full of the plating solution passage 17 between cathode-anode plate, and locked, then increase the flow of working barrel 11, just can need the bath flow rate between dynamic adjustments cathode-anode plate according to user.
Claims (5)
1. a vertical plating tank with independent adjustable function, the negative electrode box (2) and the anode cassette (13) that comprise electrode surface positioned opposite, the electrode surface both sides of described negative electrode box (2) and anode cassette (13) are provided with side guide (14), thereby between negative electrode box (2), anode cassette (13) and two side guides (14), form plating solution passage (17), it is characterized in that:
It is upper and be connected with driving mechanism (12) that described negative electrode box (2) and in anode cassette (13) one are arranged on line slideway (15), thereby can make both by relatively moving to regulate the distance between negative and positive pole-face; Described side guide (14) is Demountable; The liquid outlet place, below of described plating solution passage (17) is provided with the intercepter plate (8) of adjustable plating solution flow;
The electrode surface of described negative electrode box (2) consists of the conductive copper plate (7) and the titanium plate (6) that fit into one, is provided with for setting the guide path of workpiece to be plated (5) on described titanium plate (6); The electrode surface of described anode cassette (13) consists of the conductive copper plate (7) and the titanium iridium plate (9) that fit into one;
On the electrode surface of described negative electrode box (2), be provided with the electro-magnet (4) for adsorbing workpiece to be plated (5), described electro-magnet (4) is arranged in solenoid isolation cover (3);
The top of described plating solution passage (17) is provided with upper press cover (1), on described upper press cover (1), offer and be convenient to the U-bolt hole (1a) that bolt moves, the both sides of described upper press cover (1) are connected with anode cassette (13) with negative electrode box (2) by bolt, thereby make plating solution passage (17) form a semiclosed pressure chamber.
2. the vertical plating tank with independent adjustable function according to claim 1, it is characterized in that: described side guide (14) is down wedge structure, be inlaid between the side draw-in groove (2a) of negative electrode box (2) and the side draw-in groove (13a) of anode cassette (13), the top of described side guide (14) is provided with is convenient to manual groove (14a).
3. the vertical plating tank with independent adjustable function according to claim 1 and 2, is characterized in that: described driving mechanism (12) is servomotor.
4. the vertical plating tank with independent adjustable function according to claim 1 and 2, it is characterized in that: it is upper that described anode cassette (13) is arranged on line slideway (15), and one end of described intercepter plate (8) is hinged on the bottom of negative electrode box (2).
5. the vertical plating tank with independent adjustable function according to claim 1 and 2, is characterized in that: the electrode surface adjustable distance scope of described negative electrode box (2) and anode cassette (13) is 0～20mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210033723.2A CN102560608B (en) | 2012-02-15 | 2012-02-15 | Vertical plating tank with independent adjustable function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210033723.2A CN102560608B (en) | 2012-02-15 | 2012-02-15 | Vertical plating tank with independent adjustable function |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102560608A CN102560608A (en) | 2012-07-11 |
| CN102560608B true CN102560608B (en) | 2014-11-26 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210033723.2A Expired - Fee Related CN102560608B (en) | 2012-02-15 | 2012-02-15 | Vertical plating tank with independent adjustable function |
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Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105132995B (en) * | 2015-07-31 | 2017-05-24 | 江苏泰利达实业有限公司 | Electroplating box with two adjustable ends |
| CN107190286B (en) * | 2017-05-09 | 2019-01-25 | 贵州振华群英电器有限公司（国营第八九一厂） | A kind of experimental rig and its test method of through-hole covering power |
| CN109239168B (en) * | 2018-09-12 | 2020-06-16 | 太原科技大学 | Electrochemical deposition device |
| CN113737260B (en) * | 2021-09-30 | 2023-05-09 | 京东方科技集团股份有限公司 | Anode assembly for electrochemical deposition and electrochemical deposition apparatus |
| CN113638022B (en) * | 2021-10-14 | 2022-01-04 | 常州欣盛半导体技术股份有限公司 | Device for adjusting distance between carrier tape and anode |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3687104A (en) * | 1970-11-27 | 1972-08-29 | Amp Inc | Strip processing apparatus having air locks between tanks |
| IT1214758B (en) * | 1986-12-18 | 1990-01-18 | Centro Speriment Metallurg | PROCESS FOR THE CONTINUOUS ELECTROLYTIC TREATMENT OF METALS AND DEVICE TO IMPLEMENT IT |
| CN100595348C (en) * | 2008-03-19 | 2010-03-24 | 苏州市荣丰化工环保设备有限公司 | Anode box |
| JP5027703B2 (en) * | 2008-03-19 | 2012-09-19 | 新日鉄エンジニアリング株式会社 | Vertical jet plating equipment |
| CN201217708Y (en) * | 2008-06-20 | 2009-04-08 | 中冶连铸技术工程股份有限公司 | Strip steel combination type continuous electroplating apparatus |
| CN102121113B (en) * | 2011-01-28 | 2014-09-03 | 广州赛爱环境保护技术开发有限公司 | Three-tank combined electrolytic tank |
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2012
- 2012-02-15 CN CN201210033723.2A patent/CN102560608B/en not_active Expired - Fee Related
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| CN102560608A (en) | 2012-07-11 |
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Effective date of registration: 20170714 Address after: 430083, Hubei Wuhan Qingshan District Factory No. 2 Gate joint stock company organs Patentee after: Wuhan iron and Steel Company Limited Address before: 430080 Wuchang, Hubei Friendship Road, No. A, block, floor 999, 15 Patentee before: Wuhan Iron & Steel (Group) Corp. |
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Granted publication date: 20141126 Termination date: 20190215 |
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