CN102560608A - Vertical plating tank with independent adjustable function - Google Patents
Vertical plating tank with independent adjustable function Download PDFInfo
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- CN102560608A CN102560608A CN2012100337232A CN201210033723A CN102560608A CN 102560608 A CN102560608 A CN 102560608A CN 2012100337232 A CN2012100337232 A CN 2012100337232A CN 201210033723 A CN201210033723 A CN 201210033723A CN 102560608 A CN102560608 A CN 102560608A
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- box
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Abstract
The invention discloses a vertical plating tank with an independent adjustable function. The vertical plating tank comprises a cathode box and an anode box, wherein the electrode faces of the cathode box and the anode box are oppositely arranged; two sides of the electrode faces of the cathode box and the anode box are provided with side-push plates; therefore, plating solution channels are respectively formed among the cathode box, the anode box and two side-push plates; one of the cathode box and the anode box is installed on the linear guide rail and is connected with a driving mechanism, so that a distance between a cathode face and an anode face can be regulated through the relative movement of the cathode box and the anode box; the side-push plates are of a dismountable structure; and a liquid outlet below the plating solution channels is provided with an intercepter plate which can regulate the flow of the plating solution. The vertical plating tank has a simple and compact structure and is convenient for workpiece assembly and disassembly, and an interval between the cathode plate and the anode plate as well as plating solution flow rate can be independently regulated, which is convenient for laboratory users to analyze electroplating efficiency and product performance. The accurate and varied test means are provided for developing a new coating, diagnosing product defects, optimizing the plating process and the like, and the vertical plating tank is favorable for lowering test cost and increasing research efficiency.
Description
Technical field
The present invention relates to electroplate testing apparatus, refer to a kind of vertical plating tank that is used to the test of steel Electroplating Production particularly with independent adjustable function.
Background technology
Plating is exactly to utilize electrolysis principle on some metallic surface, to plate the process of other metal or alloy of skim.During plating, in filling the coating bath of electroplate liquid, the unplated piece of process cleaning and special pre-treatment is done anode as negative electrode with metal lining, and the two poles of the earth connect with the positive pole and the negative pole of direct supply respectively.Electroplate liquid is made up of the aqueous solution of salt, buffer reagent, pH regulator agent and the additive etc. of the compound that contains metal lining, conduction.After the energising, the metals ion in the electroplate liquid is moved in the effect of potential difference and forms coating on the negative electrode.The main size with unplated piece of galvanized mode is relevant with in batches, and commonly used at present have rack plating, barrel plating, plating and brush plating etc. continuously, a continuous plating mode of the many employings of the galvanized batch process of band steel.
Closely during the last ten years, the newly-built zinc-plated unit of continuous electric in the world adopts vertical groove gravity method electroplating technology mostly, is not full of plating bath during plating in the coating bath, and plating bath only exists and riddles between the cathode-anode plate, and flowing of plating bath leans on the gravity of self to quicken.When one timing of plating bath riser height, there are one-to-one relationship in bath flow rate between the cathode-anode plate and cathode-anode plate spacing, the bath flow rate that promptly specific cathode-anode plate spacing is corresponding specific, and cathode-anode plate spacing, bath flow rate all can't independent regulation.
For exploring bath flow rate influence to electroplating efficiency and quality product in the gravity method electro-galvanizing is produced; Further investigation has all been launched in countries in the world; Research technique and method also are not quite similar, and main method is to change the plating tank plating bath to go out open height, obtains flow velocity faster through higher drop.But this method because of there is certain limitation in its space constraint, and is difficult for operation and maintenance for laboratory equipment, is difficult to realize cathode-anode plate spacing, bath flow rate independent regulation.
Summary of the invention
The object of the invention is exactly that a kind of vertical plating tank with independent adjustable function will be provided; But its cathode-anode plate spacing, bath flow rate be independent regulation all, makes the laboratory user can research and analyse electroplating efficiency and product performance under different cathode-anode plate spacings, different bath flow rate easily.
For realizing above-mentioned purpose; The vertical plating tank that the present invention designed with independent adjustable function; The negative electrode box and the anode cassette that comprise the electrode surface positioned opposite, the electrode surface both sides of said negative electrode box and anode cassette are provided with side guide, thereby between negative electrode box, anode cassette and two side guides, are formed with the plating bath passage; One in said negative electrode box and the anode cassette is installed on the line slideway and with driving mechanism and links to each other, thereby can make both regulate the distance between the negative and positive pole-face through relatively moving; Said side guide is detachable structure; The liquid outlet place, below of said plating bath passage is provided with the intercepter plate of adjustable plating bath flow.
Further, the electrode surface of said negative electrode box is that the conductive copper plate and the titanium plate of one constitutes by applying, and said titanium plate is provided with the guide that is used to set workpiece to be plated; The electrode surface of said anode cassette is that the conductive copper plate and the titanium iridium plate of one constitutes by applying.
Further, the electrode surface of said negative electrode box is provided with the electro-magnet that is used to adsorb workpiece to be plated, and said electro-magnet is installed in the solenoid isolation cover.
Further; The top of said plating bath passage is provided with upper press cover; Offer on the said upper press cover and be convenient to the U-bolt hole that bolt moves, the both sides of said upper press cover link to each other with anode cassette with the negative electrode box through bolt, thereby make the plating bath passage form a semiclosed pressure chamber.
Further; Said side guide is down wedge structure, is inlaid between the side draw-in groove of side draw-in groove and anode cassette of negative electrode box, thereby makes side guide 14 when pressing down; Strengthen the sealing effectiveness of pressure chamber, the top of said side guide is provided with is convenient to manual groove.
Further, said driving mechanism is a servomotor.
Again further, said anode cassette is installed on the line slideway, and an end of said intercepter plate is hinged on the bottom of negative electrode box, thus the flow velocity of conveniently adjusted plating bath.
Again further, the electrode surface adjustable distance scope of said negative electrode box and anode cassette is 0～20mm.
Compared with prior art, the invention has the advantages that: one in negative electrode box and the anode cassette is installed on the line slideway and with driving mechanism links to each other, thereby can make both regulate the distance between the negative and positive pole-face through relatively moving; Side guide is designed to detachable structure, makes things convenient for the workpiece dismounting; The liquid outlet place is provided with the intercepter plate of adjustable plating bath flow below the plating bath passage, thus the different bath flow rate of adjustable.Therefore; The present invention can realize the independent regulation separately of cathode-anode plate spacing, bath flow rate; Make things convenient for laboratory customer analysis electroplating efficiency and product performance under different cathode-anode plate spacings, different bath flow rate; Develop new coating, diagnostic products defective, optimization electroplating technology etc. for it accurately various research technique is provided, this helps reducing experimentation cost, improves scientific research efficient.
Description of drawings
Fig. 1 is a kind of structural representation with vertical plating tank of independent adjustable function.
Fig. 2 is the A-A sectional structure synoptic diagram among Fig. 1.
Fig. 3 is the structural representation of upper press cover among Fig. 1.
Fig. 4 is the left sectional view of Fig. 3.
Fig. 5 is the structural representation of side guide among Fig. 2.
Fig. 6 is the left sectional view of Fig. 5.
Among the figure: upper press cover 1, negative electrode box 2, electro-magnet insulation covering 3, electro-magnet 4, workpiece to be plated 5, titanium plate 6; Conductive copper plate 7, intercepter plate 8, titanium iridium plate 9, reservoir 10, working barrel 11, driving mechanism 12; Anode cassette 13, side guide 14, line slideway 15, flexible pipe 16, plating bath passage 17, liquid outlet 18.
Embodiment
Below in conjunction with accompanying drawing and specific embodiment the present invention is done further detailed description.
Vertical plating tank shown in the figure with independent adjustable function; The negative electrode box 2 and anode cassette 13 that comprise the electrode surface positioned opposite; The electrode surface both sides of negative electrode box 2 and anode cassette 13 are provided with side guide 14; Thereby between negative electrode box 2, anode cassette 13 and two side guides 14, form plating bath passage 17, anode cassette 13 is installed on the line slideway 15 and with driving mechanism 12 and links to each other, thereby can make both regulate the distance between the negative and positive pole-face through relatively moving; Side guide 14 is set to detachable structure, the adjusting and workpiece to be plated 5 dismountings that make things convenient for the anode and cathode identity distance to leave; Below liquid outlet 18 places of plating bath passage 17 are provided with the intercepter plate 8 of adjustable plating bath flow, and an end of intercepter plate 8 is hinged on the bottom of negative electrode box 2.
Particularly; The electrode surface of negative electrode box 2 is that the conductive copper plate 7 of one constitutes with titanium plate 6 by applying; Titanium plate 6 is provided with the guide that is used to set workpiece to be plated 5, also is provided with the electro-magnet 4 that is used to adsorb workpiece to be plated 5 on the electrode surface of negative electrode box 2, and electro-magnet 4 is installed in the solenoid isolation cover 3.The electrode surface of anode cassette 13 is that the conductive copper plate 7 of one constitutes with titanium iridium plate 9 by applying.The top that between negative electrode box 2, anode cassette 13 and two side guides 14, forms plating bath passage 17 is provided with the upper press cover 1 of transparent organic glass; Offer on the upper press cover 1 and be convenient to the U-bolt hole 1a that bolt moves; The both sides of upper press cover 1 link to each other with anode cassette 13 with negative electrode box 2 through bolt, thereby make plating bath passage 17 form a semiclosed pressure chamber.Preferably; Above-mentioned side guide 14 is down wedge structure; Make side guide 14 when pressing down; Strengthened the sealing effectiveness of pressure chamber, this side guide 14 is inlaid between the side draw-in groove 13a of side draw-in groove 2a and anode cassette 13 of negative electrode box 2, and the top of side guide 14 is provided with is convenient to manual groove 14a.
When the present invention works, at first extract side guide 14 out, open upper press cover 1; Adopt servomotor as driving mechanism 12, anode cassette 13 is moved on to ultimate range along line slideway 15, then workpiece to be plated 5 is inserted in the negative electrode box 2 through the guide on the titanium plate 6 through servomotor; After electro-magnet 4 energisings workpiece to be plated 5 suctions are clipped on the titanium plate 6; Intercepter plate 8 openings are transferred to maximum, start servomotor, anode cassette 13 along line slideway 15 to negative electrode box 2 near; Reach user's set(ting)value until the cathode-anode plate spacing, this set(ting)value can be set arbitrarily between 0～20mm according to user's needs.Then, plug side guide 14 again, press and fastening transparent upper press cover 1, make electroplating process visual fully.Start working barrel 11, from reservoir 10, extract plating bath, and overflow from the anode cassette riser until plating bath through injecting plating bath in the flexible pipe 16 anode boxes 13 that connect; The opening degree of manual regulation intercepter plate 8; Perhaps intercepter plate 8 is designed to regulate automatically the structure of opening degree, guarantees that plating bath just is full of the plating bath passage 17 between the cathode-anode plate, and locked; Increase the flow of working barrel 11 then, just can be according to the bath flow rate between user's needs dynamic conditioning cathode-anode plate.
Claims (10)
1. vertical plating tank with independent adjustable function; The negative electrode box (2) and the anode cassette (13) that comprise the electrode surface positioned opposite; The electrode surface both sides of said negative electrode box (2) and anode cassette (13) are provided with side guide (14); Thereby between negative electrode box (2), anode cassette (13) and two side guides (14), form plating bath passage (17); It is characterized in that: in said negative electrode box (2) and the anode cassette (13) one is installed in line slideway (15) and goes up and link to each other with driving mechanism (12), thereby can make both regulate the distance between the negative and positive pole-face through relatively moving; Said side guide (14) is detachable structure; The liquid outlet place, below of said plating bath passage (17) is provided with the intercepter plate (8) of adjustable plating bath flow.
2. the vertical plating tank with independent adjustable function according to claim 1; It is characterized in that: the electrode surface of said negative electrode box (2) is the conductive copper plate (7) and titanium plate (6) formation of one by applying, and said titanium plate (6) is provided with the guide that is used to set workpiece to be plated (5); The electrode surface of said anode cassette (13) is the conductive copper plate (7) and titanium iridium plate (9) formation of one by applying.
3. the vertical plating tank with independent adjustable function according to claim 2 is characterized in that: the electrode surface of said negative electrode box (2) is provided with the electro-magnet (4) that is used to adsorb workpiece to be plated (5), and said electro-magnet (4) is installed in the solenoid isolation cover (3).
4. according to claim 1 or 2 or 3 described vertical plating tanks with independent adjustable function; It is characterized in that: the top of said plating bath passage (17) is provided with upper press cover (1); Offer on the said upper press cover (1) and be convenient to the U-bolt hole (1a) that bolt moves; The both sides of said upper press cover (1) link to each other with anode cassette (13) with negative electrode box (2) through bolt, thereby make plating bath passage (17) form a semiclosed pressure chamber.
5. according to claim 1 or 2 or 3 described vertical plating tanks with independent adjustable function; It is characterized in that: said side guide (14) is down wedge structure; Be inlaid between the side draw-in groove (13a) of side draw-in groove (2a) and anode cassette (13) of negative electrode box (2), the top of said side guide (14) is provided with is convenient to manual groove (14a).
6. the vertical plating tank with independent adjustable function according to claim 4; It is characterized in that: said side guide (14) is down wedge structure; Be inlaid between the side draw-in groove (13a) of side draw-in groove (2a) and anode cassette (13) of negative electrode box (2), the top of said side guide (14) is provided with is convenient to manual groove (14a).
7. according to claim 1 or 2 or 3 described vertical plating tanks with independent adjustable function, it is characterized in that: said driving mechanism (12) is a servomotor.
8. the vertical plating tank with independent adjustable function according to claim 4 is characterized in that: said driving mechanism (12) is a servomotor.
9. according to claim 1 or 2 or 3 described vertical plating tanks with independent adjustable function, it is characterized in that: said anode cassette (13) is installed on the line slideway (15), and an end of said intercepter plate (8) is hinged on the bottom of negative electrode box (2).
10. according to claim 1 or 2 or 3 described vertical plating tanks with independent adjustable function, it is characterized in that: the electrode surface adjustable distance scope of said negative electrode box (2) and anode cassette (13) is 0～20mm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210033723.2A CN102560608B (en) | 2012-02-15 | 2012-02-15 | Vertical plating tank with independent adjustable function |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201210033723.2A CN102560608B (en) | 2012-02-15 | 2012-02-15 | Vertical plating tank with independent adjustable function |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN102560608A true CN102560608A (en) | 2012-07-11 |
| CN102560608B CN102560608B (en) | 2014-11-26 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201210033723.2A Expired - Fee Related CN102560608B (en) | 2012-02-15 | 2012-02-15 | Vertical plating tank with independent adjustable function |
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| CN (1) | CN102560608B (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105132995A (en) * | 2015-07-31 | 2015-12-09 | 江苏泰利达实业有限公司 | Electroplating box with two adjustable ends |
| CN107190286A (en) * | 2017-05-09 | 2017-09-22 | 贵州振华群英电器有限公司（国营第八九厂） | The experimental rig and its test method of a kind of through hole covering power |
| CN109239168A (en) * | 2018-09-12 | 2019-01-18 | 太原科技大学 | A kind of electrochemical depositer |
| CN113638022A (en) * | 2021-10-14 | 2021-11-12 | 常州欣盛半导体技术股份有限公司 | Device for adjusting distance between carrier tape and anode |
| CN113737260A (en) * | 2021-09-30 | 2021-12-03 | 京东方科技集团股份有限公司 | Anode assembly for electrochemical deposition and electrochemical deposition apparatus |
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| US3687104A (en) * | 1970-11-27 | 1972-08-29 | Amp Inc | Strip processing apparatus having air locks between tanks |
| US4769114A (en) * | 1986-12-18 | 1988-09-06 | Centro Sviluppo Materiali S.P.A. | Process and device for continuous electrolytic treatment of metals |
| CN101250743A (en) * | 2008-03-19 | 2008-08-27 | 苏州市荣丰化工环保设备有限公司 | Anode box |
| CN201217708Y (en) * | 2008-06-20 | 2009-04-08 | 中冶连铸技术工程股份有限公司 | Strip steel combination type continuous electroplating apparatus |
| JP2009228023A (en) * | 2008-03-19 | 2009-10-08 | Nippon Steel Engineering Co Ltd | Vertical jet-stream plating apparatus |
| CN102121113A (en) * | 2011-01-28 | 2011-07-13 | 广州赛爱环境保护技术开发有限公司 | Electrolyte tank and three-tank combined electrolytic tank using same |
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Patent Citations (6)
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| US3687104A (en) * | 1970-11-27 | 1972-08-29 | Amp Inc | Strip processing apparatus having air locks between tanks |
| US4769114A (en) * | 1986-12-18 | 1988-09-06 | Centro Sviluppo Materiali S.P.A. | Process and device for continuous electrolytic treatment of metals |
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Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN105132995A (en) * | 2015-07-31 | 2015-12-09 | 江苏泰利达实业有限公司 | Electroplating box with two adjustable ends |
| CN107190286A (en) * | 2017-05-09 | 2017-09-22 | 贵州振华群英电器有限公司（国营第八九厂） | The experimental rig and its test method of a kind of through hole covering power |
| CN107190286B (en) * | 2017-05-09 | 2019-01-25 | 贵州振华群英电器有限公司（国营第八九一厂） | A kind of experimental rig and its test method of through-hole covering power |
| CN109239168A (en) * | 2018-09-12 | 2019-01-18 | 太原科技大学 | A kind of electrochemical depositer |
| CN109239168B (en) * | 2018-09-12 | 2020-06-16 | 太原科技大学 | Electrochemical deposition device |
| CN113737260A (en) * | 2021-09-30 | 2021-12-03 | 京东方科技集团股份有限公司 | Anode assembly for electrochemical deposition and electrochemical deposition apparatus |
| CN113638022A (en) * | 2021-10-14 | 2021-11-12 | 常州欣盛半导体技术股份有限公司 | Device for adjusting distance between carrier tape and anode |
| CN113638022B (en) * | 2021-10-14 | 2022-01-04 | 常州欣盛半导体技术股份有限公司 | Device for adjusting distance between carrier tape and anode |
Also Published As
| Publication number | Publication date |
|---|---|
| CN102560608B (en) | 2014-11-26 |
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Effective date of registration: 20170714 Address after: 430083, Hubei Wuhan Qingshan District Factory No. 2 Gate joint stock company organs Patentee after: Wuhan iron and Steel Company Limited Address before: 430080 Wuchang, Hubei Friendship Road, No. A, block, floor 999, 15 Patentee before: Wuhan Iron & Steel (Group) Corp. |
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| CF01 | Termination of patent right due to non-payment of annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |
Granted publication date: 20141126 Termination date: 20190215 |