CN213051884U

CN213051884U - Substrate cleaning system

Info

Publication number: CN213051884U
Application number: CN202021701823.4U
Authority: CN
Inventors: 史延锋; 史延库
Original assignee: Suzhou Mengfu Electronic Technology Co ltd
Current assignee: Suzhou Mengfu Electronic Technology Co ltd
Priority date: 2020-08-17
Filing date: 2020-08-17
Publication date: 2021-04-27
Anticipated expiration: 2030-08-17

Abstract

The utility model provides a substrate cleaning system, it includes: the device comprises a lower conveying device, an upper conveying device, a lifting device, a plasma cleaning device, a first water cleaning device, an ultrahigh pressure micro-jet cleaning device and an air drying device, wherein the plasma cleaning device, the first water cleaning device, the ultrahigh pressure micro-jet cleaning device and the air drying device are sequentially arranged along the lower conveying device and used for cleaning the substrate, the lifting device is used for transferring the substrate to the upper conveying device from the lower conveying device, the upper conveying device and the lower conveying device are correspondingly arranged up and down, and the conveying directions are opposite. The utility model discloses a cleaning system is through making up plasma belt cleaning device and superhigh pressure micro-jet belt cleaning device with ordinary belt cleaning device, then combines with upper and lower conveyor, washs the base plate many times for the cleaning performance strengthens greatly, and then has improved the quality of product.

Description

Substrate cleaning system

Technical Field

The utility model relates to a show technical field, especially relate to a substrate cleaning system.

Background

With the development of Display technology, flat panel Display devices such as Liquid Crystal Displays (LCDs) have advantages of high image quality, power saving, thin body, and wide application range, and are widely used in electronic products such as mobile phones and notebook computers.

Generally, a liquid crystal display panel is composed of a color film substrate, a thin film transistor substrate, a liquid crystal layer between the color film substrate and the thin film transistor substrate, and a sealant frame. The color film substrate is a main device used by an LCD to realize color display, and generally includes: glass substrates, black matrices, color resists, and the like. Light emitted by the backlight source is modulated by liquid crystal molecules and enters the color film substrate, three light rays of red, green and blue are respectively displayed through the filtering action of the color resistance layer on the color film substrate, and color resistances of different colors respectively transmit light of corresponding color wave bands, so that the color display of the display is realized.

The cleaning of the glass substrate is the first of the liquid crystal display panel production process, and in order to achieve high cleaning quality, the substrate needs to be cleaned by various physical and chemical methods according to the cleaning purpose so as to ensure thorough cleaning of the glass substrate.

Therefore, it is necessary to design a substrate cleaning system to solve the above problems.

SUMMERY OF THE UTILITY MODEL

An object of the utility model is to provide a better base plate cleaning system of cleaning performance.

In order to achieve the above purpose, the utility model adopts the following technical scheme: a substrate cleaning system, comprising: the device comprises a lower conveying device, an upper conveying device, a lifting device, a plasma cleaning device, a first water cleaning device, an ultrahigh pressure micro-jet cleaning device and an air drying device, wherein the plasma cleaning device, the first water cleaning device, the ultrahigh pressure micro-jet cleaning device and the air drying device are sequentially arranged along the lower conveying device and used for cleaning the substrate, the lifting device is used for transferring the substrate to the upper conveying device from the lower conveying device, the upper conveying device and the lower conveying device are correspondingly arranged up and down, and the conveying directions are opposite.

As the utility model discloses further modified technical scheme, base plate cleaning system still includes feed arrangement and discharging device, feed arrangement be located down conveyor one end and with conveyor butt joint down, discharging device be located conveyor's one end and with last conveyor butt joint.

As a further improved technical solution of the present invention, the feeding device includes a feeding roller and a feeding rotating portion, the feeding rotating portion can rotate in the horizontal direction and is respectively butted with the feeding roller and the lower conveying device, and the feeding roller is arranged obliquely to the lower conveying device; the discharging device comprises a discharging roller and a discharging rotating part, the discharging rotating part can rotate in the horizontal direction and is respectively butted with the discharging roller and the upper conveying device, and the discharging roller is obliquely arranged towards the upper conveying device.

As the utility model discloses further modified technical scheme, first washing device is including locating first water supply assembly, first nozzle and the cylinder brush of both sides about conveyor, and the interval between the cylinder brush of upper and lower both sides is adjustable.

As a further improved technical scheme of the utility model, the quantity of cylinder brush is 2 groups, and the rotation opposite direction of two sets of cylinder brushes, first water supply subassembly and first nozzle quantity are 3 groups, the cylinder brush is located between adjacent two sets of first nozzles.

As the utility model discloses further modified technical scheme still includes second washing unit, second washing unit locates the superhigh pressure and sprays belt cleaning device a little and air-dries between the device, second washing unit is including locating second water supply assembly and the second nozzle of both sides about lower conveyor respectively, the second nozzle is two fluid nozzle.

As the utility model discloses further modified technical scheme still includes third washing unit, third washing unit locates before air-drying device, third washing unit is including locating the third water supply subassembly and the third nozzle of both sides about the conveyor under respectively including supplying pure water.

As the utility model discloses further modified technical scheme, air-dry the device including locating the air knife of the upper and lower side of base plate respectively, the injection direction of air knife with the translation direction of base plate becomes the obtuse angle setting.

As a further improved technical scheme of the utility model, still including being located the fan filter mechanism of conveyor top.

As the utility model discloses further modified technical scheme, it includes a plurality of last gyro wheels that set up side by side to go up conveyor, conveyor includes a plurality of lower gyro wheels that set up side by side down, and elevating gear includes the guide pillar, follows the transplantation portion that the guide pillar goes up and down, transplantation portion includes a plurality of transplantation gyro wheels that set up side by side, transplant the gyro wheel with go up gyro wheel or lower gyro wheel butt joint.

According to the technical scheme provided by the utility model, the utility model discloses a cleaning system is through making up plasma cleaning device and superhigh pressure micro-jet belt cleaning device with ordinary belt cleaning device, then combines with upper and lower conveyor, washs the base plate many times for the cleaning performance strengthens greatly, and then has improved the quality of product.

Drawings

Fig. 1 is a schematic view of the substrate cleaning system of the present invention.

Fig. 2 is a top view of the substrate cleaning system of fig. 1.

Fig. 3 is a schematic view of a second water supply assembly and a second nozzle in fig. 1.

Detailed Description

In order to make the objects, technical solutions and advantages of the present invention clearer, the present invention will be described in detail with reference to the accompanying drawings and specific embodiments.

Referring to fig. 1, the present invention provides a substrate cleaning system 100, which includes: the device comprises a feeding device 1, a discharging device 5, a lower conveying device 2 and an upper conveying device 3 for conveying a substrate 200, a lifting device 4 arranged between the upper conveying device 3 and the lower conveying device 2, a plasma cleaning device 6 for cleaning the substrate 200, a first water cleaning device 7, an ultrahigh pressure micro-jet cleaning device 8, a second water cleaning device 9, a third water cleaning device 10, an air drying device 11 for air-drying the substrate 200 and a fan filtering mechanism 12 positioned above the upper conveying device 3, wherein the plasma cleaning device 6, the ultrahigh pressure micro-jet cleaning device 8, the second water cleaning device 9 and the third water cleaning device 10 are sequentially arranged along the lower conveying device 2.

The upper and

lower conveying devices

2 and 3 are correspondingly arranged up and down and have opposite conveying directions. The upper conveying device 3 comprises a plurality of upper rollers arranged side by side, and the lower conveying device 2 comprises a plurality of lower rollers arranged side by side. The lifting device 4 is used for transferring the substrate 200 from the lower conveying device 2 to the upper conveying device 3, the lifting device 4 comprises a guide column 401 and a transplanting part 402 which lifts along the guide column 401, the transplanting part 402 comprises a plurality of transplanting rollers which are arranged side by side, and the transplanting rollers are in butt joint with the upper rollers or the lower rollers. Specifically, when the substrate 200 needs to be transferred upwards, the transplanting roller is butted with the lower roller, the substrate 200 moves onto the transplanting roller from the lower roller and is lifted upwards along with the transplanting roller, and after the transplanting roller is butted with the upper roller, the substrate 200 moves onto the upper roller from the transplanting roller to complete the up-and-down transfer of the substrate 200.

Referring to fig. 1 and 2, a feeding device 1 is located at one end of a lower conveying device 2 and is abutted to the lower conveying device 2, and a discharging device 5 is located at one end of an upper conveying device 3 and is abutted to the upper conveying device 3. The discharging device 5 is positioned above the feeding device 1. The feeding device 1 comprises a feeding roller and a feeding rotating part 101, the feeding rotating part 101 can rotate in the horizontal direction and is respectively butted with the feeding roller and the lower conveying device 2, and the feeding roller is obliquely arranged in the direction of the lower conveying device 2; similarly, the discharging device 5 includes a discharging roller and a discharging rotating portion 501, the discharging rotating portion 501 can rotate in the horizontal direction and is respectively connected with the discharging roller and the upper conveying device 3 in a butt joint manner, and the discharging roller is arranged in the direction of the upper conveying device 3 in an inclined manner.

During feeding, place base plate 200 on the feeding cylinder through the manipulator, further move to feeding rotating part 101 through the feeding cylinder on, butt joint with lower gyro wheel after feeding rotating part 101 rotates certain angle, base plate 200 moves to on the lower gyro wheel, washs. During the ejection of compact, ejection of compact rotating part 501 and last gyro wheel butt joint, base plate 200 moves to ejection of compact rotating part 501 from last gyro wheel, ejection of compact rotating part 501 rotates certain angle back and the butt joint of ejection of compact gyro wheel, and base plate 200 moves to ejection of compact gyro wheel from ejection of compact rotating part 501 on, further shifts base plate 200 to follow-up workshop section through the manipulator.

Referring to fig. 2, the substrate cleaning system 100 further includes a PLC control mechanism having a PLC panel 14 for the operation of the worker, wherein the PLC panel 14 is specifically provided on one side of the feeding device. By adopting a man-machine combined production mode and a pass-through cleaning mode, the internal operation condition of the substrate cleaning system 100 can be monitored at any time.

The plasma cleaning device 6 includes a power supply, an electrode, a gas supply mechanism, and an exhaust mechanism. The specific structure of the plasma cleaning device is the prior art, and it is only necessary to mount the power supply, the electrode, the gas supply mechanism and the gas exhaust mechanism in cooperation with the positions of the upper and

lower conveying devices

3 and 2 and other elements in this embodiment, which is not described herein again. Through plasma treatment, organic pollutants on the surface are removed, and hydrophilic groups are formed on the surface of the substrate 200, so that the degree of hydrophilization of the surface of the substrate 200 is improved, and the cleaning effect of a subsequent water washing device is enhanced.

Referring to fig. 1, the first water washing device 7 includes first water supply assemblies disposed at upper and lower sides of the lower conveying device 2, first nozzles, and roller brushes, and the distance between the roller brushes at the upper and lower sides is adjustable. The number of the roller brushes is 2 groups, and preferably, the rotation directions of the two groups of the roller brushes are opposite. The quantity of the first water supply assemblies and the first nozzles is 3 groups, and the roller brush is positioned between the two adjacent groups of the first nozzles. In other embodiments, the rotation direction, rotation speed and pressing amount of the roller brush can be set according to actual requirements, and the roller brush can effectively remove larger particles adhered or deposited on the surface of the substrate 200 by closely adhering to the surface of the substrate 200 and rotating at a high speed in cooperation with the water sprayed by the first nozzle.

In the utility model, a water-proof air knife and a spraying mechanism are sequentially arranged between the plasma cleaning device 6 and the first water cleaning device 7, and the water-proof air knife is used for preventing water generated by the first water cleaning device 7 from splashing into the plasma cleaning device 6 to influence the cleaning effect; the spray mechanism is used for wetting the substrate 200 cleaned by the plasma cleaning device 6 in advance, so that the cleaning effect of the first water cleaning device 7 is enhanced.

The ultra-high pressure microjet cleaning device (HPMJ)8 includes a high pressure water supply assembly and a microjet nozzle 81. The functional principle of the HPMJ cleaning is as follows: the cleaning liquid is compressed and pressurized to 10-13MPa, is sprayed out through the micro-jet nozzle to form a large number of micro-form liquid drops of several microns or dozens of microns, and is continuously sprayed and impacted on the surface of the substrate 200 at extremely high speed and density, so that dust particles and dirt of several microns to several hundred microns can be removed. Compared with the first water washing device 7, the particles washed by the HPMJ are smaller, and the tiny particles which cannot be removed by the first water washing device 7 can be further removed.

Referring to fig. 1 and 3, the second water washing device 9 is disposed between the ultra-high pressure micro-jet washing device 8 and the air drying device 11, the second water washing device 9 includes a second water supply assembly and a second nozzle respectively disposed at the upper and lower sides of the lower conveying device 2, the second nozzle is a two-fluid nozzle, and preferably the spraying pressure is 0.1-0.5 MPa. The second nozzle ejects pure water particles to the surface of the substrate 200, and performs the rinsing cleaning of the surface of the substrate 200. Preferably, the angle of the water mist sprayed by the second nozzle is 70-90 °. After the cleaning process of the previous plasma cleaning device 6, the first water cleaning device 7 and the ultra-high pressure micro-jet cleaning device 8, most of the particles are cleaned, and few particles are lightly attached on the surface of the substrate 200. The second washing device 9 further washes the substrate 200 by adjusting the water pressure, thereby removing the remaining particles on the surface of the substrate 200.

Referring to fig. 1, the third washing apparatus 10 is disposed in front of the air drying apparatus 11, and the third washing apparatus 10 includes a third water supply assembly and a third nozzle, which are disposed on the upper and lower sides of the lower conveying apparatus 2, respectively, for supplying pure water. After the substrate 200 is cleaned by the plasma cleaning device 6, the first water cleaning device 7, the ultra-high pressure micro-jet cleaning device 8, the second water cleaning device 9, and the like in the previous process, the surface of the substrate 200 is sufficiently cleaned, but residual water stains remain on the surface of the substrate 200. The third water washing apparatus 10 performs a final washing by washing away the residual water stain using highly filtered pure water.

Referring to fig. 1, the air drying device 11 includes air knives respectively disposed above and below the substrate 200 to fully dry the wet-washed substrate 200 in the previous process, so as to prevent the surface of the substrate 200 from being stained with residual water. The jetting direction of the air knife is disposed at an obtuse angle to the translation direction of the substrate 200. The air knife and the surface of the substrate form a slit, so that water and water mist on the surface of the substrate 200 can be removed more effectively, and the width of the slit is preferably 0.08 mm-0.15 mm.

To sum up, the utility model discloses a bilayer structure about base plate cleaning system 100 adopts, and lower floor washs, and the upper strata backward flow can realize that base plate 200 feeding and the ejection of compact are in same position. The substrate cleaning system 100 is provided with a plasma cleaning device 6, a first washing device 7, an HPMJ 8, a second washing device 9 and a third washing device 10 for multi-step washing, and has good removal effect on particles with different sizes (after cleaning, the removal rate of particles with the particle size of 1-3 microns is 92% -95%); the utility model discloses full cloth fan filtering mechanism 12 in top of base plate cleaning system 100, and inside spare part all adopts the clean type, can satisfy the high cleanliness factor requirement.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "horizontal", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed in a specific orientation, and be operated, and thus should not be construed as limiting the present invention. Furthermore, the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance.

In the description of the present invention, it is to be noted that, unless otherwise explicitly specified or limited, the terms "mounted," "connected," and "connected" are to be construed broadly, and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood in specific cases to those skilled in the art.

In addition, the above embodiments are only used for illustrating the present invention and not for limiting the technical solutions described in the present invention, and the understanding of the present specification should be based on the technical personnel in the technical field, and although the present specification has described the present invention in detail with reference to the above embodiments, the person of ordinary skill in the art should understand that the person of ordinary skill in the art can still modify the present invention or substitute the same, and all the technical solutions and modifications that do not depart from the spirit and scope of the present invention should be covered within the scope of the claims of the present invention.

Claims

1. A substrate cleaning system, comprising: the device comprises a lower conveying device, an upper conveying device, a lifting device, a plasma cleaning device, a first water cleaning device, an ultrahigh pressure micro-jet cleaning device and an air drying device, wherein the plasma cleaning device, the first water cleaning device, the ultrahigh pressure micro-jet cleaning device and the air drying device are sequentially arranged along the lower conveying device and used for cleaning the substrate, the lifting device is used for transferring the substrate to the upper conveying device from the lower conveying device, the upper conveying device and the lower conveying device are correspondingly arranged up and down, and the conveying directions are opposite.

2. The substrate cleaning system of claim 1, further comprising an infeed device positioned at one end of the lower conveyor and interfacing with the lower conveyor, and an outfeed device positioned at one end of the upper conveyor and interfacing with the upper conveyor.

3. The substrate cleaning system of claim 2, wherein the feeding device comprises a feeding roller and a feeding rotating portion, the feeding rotating portion can rotate in a horizontal direction and is respectively abutted with the feeding roller and the lower conveying device, and the feeding roller is arranged in a direction inclined to the lower conveying device; the discharging device comprises a discharging roller and a discharging rotating part, the discharging rotating part can rotate in the horizontal direction and is respectively butted with the discharging roller and the upper conveying device, and the discharging roller is obliquely arranged towards the upper conveying device.

4. The substrate cleaning system of claim 1, wherein the first water supply unit comprises a first water supply assembly, a first nozzle and roller brushes disposed at upper and lower sides of the lower conveyor, and the distance between the roller brushes at the upper and lower sides is adjustable.

5. The substrate cleaning system of claim 4, wherein the number of the roller brushes is 2, the rotation directions of the two sets of the roller brushes are opposite, the number of the first water supply assemblies and the first nozzles is 3, and the roller brushes are located between the adjacent two sets of the first nozzles.

6. The substrate cleaning system according to claim 1, further comprising a second water washing device disposed between the ultra-high pressure micro-jet cleaning device and the air drying device, wherein the second water washing device comprises a second water supply assembly and a second nozzle respectively disposed at upper and lower sides of the lower conveying device, and the second nozzle is a two-fluid nozzle.

7. The substrate cleaning system according to claim 1, further comprising a third water washing device disposed in front of the seasoning device, wherein the third water washing device comprises a third water supply unit and a third nozzle for supplying pure water, the third water supply unit and the third nozzle being disposed at upper and lower sides of the lower transfer device, respectively.

8. The substrate cleaning system according to claim 1, wherein the seasoning apparatus comprises air knives respectively disposed above and below the substrate, and a spraying direction of the air knives is arranged at an obtuse angle to a translation direction of the substrate.

9. The substrate cleaning system of claim 1, further comprising a fan filter mechanism positioned above the upper conveyor.

10. The substrate cleaning system of claim 1, wherein the upper conveying device comprises a plurality of upper rollers arranged side by side, the lower conveying device comprises a plurality of lower rollers arranged side by side, the lifting device comprises a guide post and a transplanting part lifting along the guide post, the transplanting part comprises a plurality of transplanting rollers arranged side by side, and the transplanting rollers are butted with the upper rollers or the lower rollers.