CN212967614U

CN212967614U - Drying device for wafer

Info

Publication number: CN212967614U
Application number: CN202021817732.7U
Authority: CN
Inventors: 姬煜; 赵通
Original assignee: Jiangsu Wuchong Semiconductor Technology Co ltd
Current assignee: Jiangsu Wuchong Semiconductor Technology Co ltd
Priority date: 2020-08-27
Filing date: 2020-08-27
Publication date: 2021-04-13
Anticipated expiration: 2030-08-27

Abstract

The utility model discloses a wafer drying device, which comprises a drying box, one side of the drying box is fixedly connected with a motor bottom plate, the upper surface of the motor bottom plate is fixedly connected with a motor ribbed plate, the upper end of the motor rib plate is fixedly connected with a motor box, one side of the motor box is provided with a motor shaft in an extending way, one end of the motor shaft, which is far away from the motor box, penetrates through the drying box, the outer side of one end of the motor shaft is fixedly connected with a locking ring, the two sides of the locking ring are fixedly connected with fixing plates, the upper surfaces of the fixing plates are fixedly connected with rotating plates, the lower surface of the fixed plate is fixedly connected with a positioning pin, the upper end of the positioning pin penetrates through the fixed plate and the rotating plate, the upper surface of the rotating plate is fixedly connected with a vacuum chuck, and a telescopic rod is fixedly connected to the upper portion inside the drying box. The utility model discloses in, be convenient for wash, do not destroy the semiconductor structure of wafer, improve the yield of wafer.

Description

Drying device for wafer

Technical Field

The utility model relates to a dry field especially relates to a drying device of wafer.

Background

The mainstream wafer dehydration drying equipment in the current market mainly adopts two modes of mechanical rotation dehydration and anhydrous chemical reagent dehydration. The first one is mechanical rotation dewatering, which is to set the dewatered wafer inside high speed rotating equipment, to spin the water out with the centrifugal force and to blow and dry the wafer surface with heated nitrogen. The second is anhydrous chemical reagent dehydration, and the principle mainly adopts the chemical reagent that high volatility and does not contain moisture impurity, through the mode of high temperature heating, makes chemical reagent volatilize into the gaseous state, puts the wafer of waiting to dewater and dry in all being the confined space of this chemical reagent steam, makes the moisture on wafer surface dissolve in gaseous state chemical reagent to reach dry purpose.

The first method generally used mainly includes vibration generated by rotation, which easily causes wafer damage, water marks left on the wafer surface after dehydration, wafer with patterns, water in the pattern groove is not easy to dry, dynamic process easily causes contamination of wafer surface particles, and processing time is long, so a device for rapidly drying the wafer is needed at present.

SUMMERY OF THE UTILITY MODEL

The utility model aims at solving the defects existing in the prior art and providing a wafer drying device.

In order to achieve the above purpose, the utility model adopts the following technical scheme: a drying device for wafers comprises a drying box, wherein a motor bottom plate is fixedly connected to one side of the drying box, a motor rib plate is fixedly connected to the upper surface of the motor bottom plate, a motor box is fixedly connected to the upper end of the motor rib plate, a motor shaft extends from one side of the motor box, one end, far away from the motor box, of the motor shaft penetrates through the drying box, a locking ring is fixedly connected to the outer side of one end of the motor shaft, fixing plates are fixedly connected to two sides of the locking ring, a rotating plate is fixedly connected to the upper surface of each fixing plate, a positioning pin is fixedly connected to the lower surface of each fixing plate, the upper end of each positioning pin penetrates through the fixing plates and the rotating plates, a vacuum chuck is fixedly connected to the upper surface of each rotating plate, a telescopic rod is, the inside fixedly connected with heating pipe of telescopic link, the one end fixedly connected with argon gas shower nozzle of keeping away from the drying cabinet of telescopic link, the inside top surface fixedly connected with lamp pole of drying cabinet, the lower fixedly connected with heating lamp of lamp pole.

As a further description of the above technical solution:

the outside fixedly connected with water tank of drying cabinet, the upper end fixedly connected with outlet pipe of water tank, the upper end of outlet pipe runs through the drying cabinet and at other end fixedly connected with liquid shower nozzle.

As a further description of the above technical solution:

the water tank is characterized in that a water inlet pipe is fixedly connected to one side of the upper portion of the water tank, and a water pump is fixedly connected to the lower end of the water inlet pipe.

As a further description of the above technical solution:

one side fixedly connected with pump plate of water pump, the one end fixedly connected with drying cabinet of keeping away from the water pump of pump plate.

As a further description of the above technical solution:

the lower extreme fixedly connected with back flow of water pump, the one end of keeping away from the water pump of back flow runs through the drying cabinet, one side fixedly connected with connecting plate of drying cabinet, the connecting plate is provided with two, be provided with the connecting axle between the connecting plate, the outside of connecting axle is rotated and is connected with the rotating sleeve.

As a further description of the above technical solution:

one side fixedly connected with of rotating the cover rotates the door, the higher authority of rotating the door is provided with the transparent glass board, the one end fixedly connected with handle of rotating the cover is kept away from to the rotating the door, the both ends fixedly connected with fixed pin of handle.

As a further description of the above technical solution:

the bottom fixedly connected with bracing piece of drying cabinet, the bracing piece is provided with four, the bottom fixedly connected with base of bracing piece.

The utility model discloses following beneficial effect has:

1. the utility model discloses in, be provided with vacuum chuck, can be when wasing for the wafer firmly fixes on vacuum chuck, prevents to damage the wafer in the pivoted, makes the wafer guarantee integrality in the dry.

2. The utility model discloses in, be provided with heating pipe and argon gas shower nozzle, through the inside of telescopic link with inert gas argon gas blow to the inside of argon gas shower nozzle, the inside of telescopic link is provided with the heating pipe, can be so that the temperature of spun argon gas risees, can carry out the drying with the wafer fast.

Drawings

Fig. 1 is a front cross-sectional view of a wafer drying apparatus according to the present invention;

fig. 2 is a front view of a wafer drying apparatus according to the present invention;

fig. 3 is a side view of a wafer drying apparatus according to the present invention;

fig. 4 is an enlarged view of a point a in fig. 1.

Illustration of the drawings:

1. a base; 2. a support bar; 3. a drying oven; 4. locking a ring; 5. a motor shaft; 6. positioning pins; 7. a fixing plate; 8. a rotating plate; 9. a vacuum chuck; 10. a telescopic rod; 11. a heating lamp; 12. a lamp post; 13. an argon gas spray head; 14. a liquid ejection head; 15. a water outlet pipe; 16. a water tank; 17. a water inlet pipe; 18. a pump plate; 19. a water pump; 20. a return pipe; 21. a handle; 22. a fixing pin; 23. a rotating door; 24. a transparent glass plate; 25. a connecting shaft; 26. a connecting plate; 27. rotating the sleeve; 28. a motor case; 29. a motor rib plate; 30. a motor base plate; 31. a heating box; 32. heating the tube.

Detailed Description

The technical solutions in the embodiments of the present invention will be described clearly and completely with reference to the accompanying drawings in the embodiments of the present invention, and it is obvious that the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments in the present invention, all other embodiments obtained by a person skilled in the art without creative work belong to the protection scope of the present invention.

In the description of the present invention, it should be noted that the terms "center", "upper", "lower", "left", "right", "vertical", "horizontal", "inner", "outer", and the like indicate orientations or positional relationships based on the orientations or positional relationships shown in the drawings, and are only for convenience of description and simplification of description, but do not indicate or imply that the device or element referred to must have a specific orientation, be constructed and operated in a specific orientation, and thus, should not be construed as limiting the present invention; the terms "first," "second," and "third" are used for descriptive purposes only and are not to be construed as indicating or implying relative importance, and furthermore, unless otherwise explicitly stated or limited, the terms "mounted," "connected," and "connected" are to be construed broadly and may be, for example, fixedly connected, detachably connected, or integrally connected; can be mechanically or electrically connected; they may be connected directly or indirectly through intervening media, or they may be interconnected between two elements. The specific meaning of the above terms in the present invention can be understood according to specific situations by those skilled in the art.

Referring to fig. 1-4, the present invention provides an embodiment: a wafer drying device comprises a drying box 3, a motor bottom plate 30 is fixedly connected to one side of the drying box 3, a motor rib plate 29 is fixedly connected to the upper surface of the motor bottom plate 30, a motor box 28 is fixedly connected to the upper end of the motor rib plate 29, a motor shaft 5 extends from one side of the motor box 28, one end, far away from the motor box 28, of the motor shaft 5 penetrates through the drying box 3, a locking ring 4 is fixedly connected to the outer side of one end of the motor shaft 5, the locking ring 4 is convenient for fixing the motor shaft 5, fixing plates 7 are fixedly connected to two sides of the locking ring 4, a rotating plate 8 is fixedly connected to the upper surface of each fixing plate 7, a positioning pin 6 is fixedly connected to the lower surface of each fixing plate 7, the upper end of each positioning pin 6 penetrates through the fixing plates 7 and the rotating plate 8, a vacuum chuck 9 is fixedly connected to, the inside fixedly connected with heating pipe 32 of telescopic link 10, the one end fixedly connected with argon gas shower nozzle 13 of keeping away from drying cabinet 3 of telescopic link 10, the inside top surface fixedly connected with lamp pole 12 of drying cabinet 3, the lower fixedly connected with heating lamp 11 of lamp pole 12.

A water tank 16 is fixedly connected to the outer side of the drying box 3, a water outlet pipe 15 is fixedly connected to the upper end of the water tank 16, the upper end of the water outlet pipe 15 penetrates through the drying box 3, and a liquid spray head 14 is fixedly connected to the other end of the water outlet pipe 15, a water inlet pipe 17 is fixedly connected to one side above the water tank 16, a water pump 19 is fixedly connected to the lower end of the water inlet pipe 17, a pump plate 18 is fixedly connected to one side of the water pump 19, the drying box 3 is fixedly connected to one end, away from the water pump 19, of the pump plate 18, a return pipe 20 is fixedly connected to the lower end of the water pump 19, one end, away from the water pump 19, of the return pipe 20 penetrates through the drying box 3, a connecting plate 26 is fixedly connected to one side of the drying box 3, two connecting plates 26 are arranged, a, the one end fixedly connected with handle 21 of rotating the cover 27 is kept away from to rotating door 23, the both ends fixedly connected with fixed pin 22 of handle 21, the bottom fixedly connected with bracing piece 2 of drying cabinet 3, bracing piece 2 are provided with four, the bottom fixedly connected with base 1 of bracing piece 2.

The working principle is as follows: drive motor shaft 5 through motor case 28 and rotate, the one end outside fixedly connected with locking ring 4 of motor shaft 5, through locking ring 4 and rotor plate 8 fixed connection, just can drive rotor plate 8 and rotate, the last fixed surface of rotor plate 8 has vacuum chuck 9, adsorb the wafer through vacuum chuck 9, be provided with vacuum chuck 9, can be in the washing, make the wafer firmly fix on vacuum chuck 9, prevent to damage the wafer in the pivoted, make the wafer guarantee the integrality in dry, be provided with heating pipe 32 and argon gas shower nozzle 13, blow the inside of argon gas shower nozzle 13 with inert gas through the inside of telescopic link 10, the inside of telescopic link 10 is provided with heating pipe 32, can make the temperature of spun argon gas rise, can dry the wafer fast.

Finally, it should be noted that: although the present invention has been described in detail with reference to the foregoing embodiments, it will be apparent to those skilled in the art that modifications, equivalents, improvements and the like can be made in the technical solutions of the foregoing embodiments or in some technical features of the foregoing embodiments.

Claims

1. The utility model provides a drying device of wafer, includes drying cabinet (3), its characterized in that: a motor bottom plate (30) is fixedly connected to one side of the drying box (3), a motor rib plate (29) is fixedly connected to the upper surface of the motor bottom plate (30), a motor box (28) is fixedly connected to the upper end of the motor rib plate (29), a motor shaft (5) extends from one side of the motor box (28), one end, far away from the motor box (28), of the motor shaft (5) penetrates through the drying box (3), a locking ring (4) is fixedly connected to the outer side of one end of the motor shaft (5), fixing plates (7) are fixedly connected to the two sides of the locking ring (4), a rotating plate (8) is fixedly connected to the upper surface of each fixing plate (7), a positioning pin (6) is fixedly connected to the lower surface of each fixing plate (7), the upper end of each positioning pin (6) penetrates through the fixing plates (7) and the rotating plates (8), and a vacuum, inside top fixedly connected with telescopic link (10) of drying cabinet (3), fixed surface is connected with heating cabinet (31) on one side of telescopic link (10), inside fixedly connected with heating pipe (32) of telescopic link (10), the one end fixedly connected with argon gas shower nozzle (13) of keeping away from drying cabinet (3) of telescopic link (10), inside top surface fixedly connected with lamp pole (12) of drying cabinet (3), lower fixedly connected with heating lamp (11) of lamp pole (12).

2. A drying apparatus for a wafer as claimed in claim 1, wherein: the drying cabinet is characterized in that a water tank (16) is fixedly connected to the outer side of the drying cabinet (3), a water outlet pipe (15) is fixedly connected to the upper end of the water tank (16), the upper end of the water outlet pipe (15) penetrates through the drying cabinet (3) and a liquid spray head (14) is fixedly connected to the other end of the water outlet pipe.

3. A drying apparatus for a wafer as claimed in claim 2, wherein: the water tank is characterized in that a water inlet pipe (17) is fixedly connected to one side of the upper portion of the water tank (16), and a water pump (19) is fixedly connected to the lower end of the water inlet pipe (17).

4. A drying apparatus for a wafer as claimed in claim 3, wherein: one side fixedly connected with pump board (18) of water pump (19), the one end fixedly connected with drying cabinet (3) of keeping away from water pump (19) of pump board (18).

5. A drying apparatus for a wafer as claimed in claim 3, wherein: the lower extreme fixedly connected with back flow (20) of water pump (19), the one end of keeping away from water pump (19) of back flow (20) runs through drying cabinet (3), one side fixedly connected with connecting plate (26) of drying cabinet (3), connecting plate (26) are provided with two, be provided with connecting axle (25) between connecting plate (26), the outside of connecting axle (25) is rotated and is connected with and is rotated cover (27).

6. A drying apparatus for wafer as claimed in claim 5, wherein: rotate one side fixedly connected with rotation door (23) of cover (27), the higher authority of rotation door (23) is provided with transparent glass board (24), the one end fixedly connected with handle (21) of rotating cover (27) is kept away from of rotation door (23), the both ends fixedly connected with fixed pin (22) of handle (21).

7. A drying apparatus for a wafer as claimed in claim 1, wherein: the bottom fixedly connected with bracing piece (2) of drying cabinet (3), bracing piece (2) are provided with four, the bottom fixedly connected with base (1) of bracing piece (2).