CN218351424U - Spin-drying device - Google Patents

Spin-drying device Download PDF

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Publication number
CN218351424U
CN218351424U CN202222820777.5U CN202222820777U CN218351424U CN 218351424 U CN218351424 U CN 218351424U CN 202222820777 U CN202222820777 U CN 202222820777U CN 218351424 U CN218351424 U CN 218351424U
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China
Prior art keywords
spin
box body
drying
wafer
rotating
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CN202222820777.5U
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Inventor
刘颖
刘剑荣
段良飞
董国庆
文国昇
金从龙
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Jiangxi Zhao Chi Semiconductor Co Ltd
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Jiangxi Zhao Chi Semiconductor Co Ltd
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Abstract

The utility model provides a device spin-dries, slewing mechanism in box body and locating the box body including the box body, the one side indent of box body forms and gets rid of the dry chamber, the intracavity that spin-dries is equipped with the spin-dry barrel of being connected with the slewing mechanism drive, be equipped with the mechanism that bears that is used for bearing the weight of the boat in the spin-dry barrel, the box body is connected with and is used for the lid to close the apron of getting rid of the dry chamber, the one side of apron dorsad box body sets up first filtering mechanism, set up the inlet port on the apron, first filtering mechanism gets rid of the dry chamber through the inlet port intercommunication, a filtering mechanism lateral wall intercommunication has the intake pipe that is used for sending into nitrogen gas to the spin-dry intracavity, first filtering mechanism is used for filtering the particulate matter in the nitrogen gas. When the rotating mechanism drives the spin dryer tube to spin-dry the wafer in the spin dryer tube in a centrifugal mode, nitrogen is introduced into the spin-drying cavity through the air inlet pipe, the residual water stain on the wafer is taken away by matching with centrifugal force due to the flowability of air and the concentration effect on liquid, and the wafer is guaranteed to be effectively dried under the condition that the stability of the wafer in a centrifugal state is guaranteed.

Description

Spin-drying device
Technical Field
The utility model relates to a semiconductor processing technology field, in particular to device spin-dries.
Background
The manufacturing process of the wafer is complex, the wafer has many processes, different chemical materials are used in different processes, impurities such as chemical agents, particles, metals and the like usually remain on the surface of the wafer, and if the wafer is not cleaned in time, the impurities are gradually accumulated along with the production and the manufacturing, and the final quality is influenced.
The wafer cleaning method is generally based on wet cleaning, and is realized by a single-chip cleaning machine or a tank type cleaning machine, after the wafer cleaning operation is completed, in order to prevent residues such as water stains on the wafer from affecting subsequent production processes, the wafer needs to be dried, and in general, a wafer drying machine is adopted to dry the wafer in a rotating manner.
However, in the existing wafer spin dryer, generally, a rotating mechanism is arranged in a spin drying cavity to drive a wafer box to rotate centrifugally so as to spin water stains on wafers in the wafer box, but spin drying is performed only through centrifugal force, so that the wafers are easily separated from the wafer box and collide with the inner wall of the spin dryer to be damaged under the condition of too high rotating speed, and if the rotating speed is controlled, the wafers cannot be completely dried.
SUMMERY OF THE UTILITY MODEL
To prior art not enough, the utility model aims to provide a device spin-dries, aims at solving among the prior art and carries out the wafer drying through the mode that only spins, under the too fast condition of rotational speed, damages the wafer easily, and under the not enough condition of rotational speed, the technical problem of the unable complete drying wafer again.
In order to achieve the above purpose, the present invention is realized by the following technical solution:
the utility model provides a spin-drying device, includes the box body and locates slewing mechanism in the box body, the one side indent of box body forms and gets rid of the dry chamber, the spin-dry intracavity be equipped with the spin-dry barrel that the slewing mechanism drive is connected, be equipped with the bearing mechanism who is used for bearing the weight of the boat in the spin-dry barrel, the box body is connected with and is used for the lid to close get rid of the apron in dry chamber, the apron dorsad the one side of box body sets up first filtering mechanism, set up the inlet port on the apron, first filtering mechanism passes through the inlet port intercommunication get rid of the dry chamber, a filtering mechanism lateral wall intercommunication have be used for to nitrogen gas's intake pipe is sent into in the spin-dry intracavity, first filtering mechanism is used for filtering the particulate matter in the nitrogen gas.
Compared with the prior art, the beneficial effects of the utility model reside in that: through the apron lid closes it makes to get rid of the dry chamber the chamber of spin-drying forms sealed environment, can avoid receiving external pollution at the in-process wafer that spin-dries the slewing mechanism drive when the spin-dryer tube carries out centrifugation spin-drying to its interior wafer, through the intake pipe to nitrogen gas is let in to the intracavity of spin-drying to the mobility of gas and to the concentrated action of liquid, remaining water stain on the wafer is taken away to cooperation centrifugal force, is guaranteeing that the wafer obtains effectual drying under the condition of the stability of wafer in centrifugal state, through setting up first filtering mechanism can avoid the large granule pollutant in the nitrogen gas to get into along with nitrogen gas the intracavity of spin-drying, and then damage the wafer.
Further, the spin-drying device also comprises a second filtering mechanism, and the second filtering mechanism is connected in the first filtering mechanism and used for eliminating static in the nitrogen.
Furthermore, the spin-drying device also comprises a vacuum mechanism for forming a negative pressure environment in the spin-drying cavity.
Furthermore, the vacuum mechanism comprises a vacuum pump and a vacuum tube, one end of the vacuum tube is connected to the vacuum pump, and the other end of the vacuum tube penetrates through the box body and is communicated with the spin-drying cavity.
Furthermore, a vibration detector is arranged in the box body and electrically connected with the rotating mechanism.
Furthermore, the rotating mechanism comprises a rotating shaft and a rotating motor in driving connection with the rotating shaft, the rotating motor is arranged at the bottom of the box body, and one end, far away from the rotating motor, of the rotating shaft is connected to the bottom of the spin dryer tube.
Furthermore, the bearing mechanism comprises a plurality of clamping and plugging brackets which are uniformly distributed around the axis of the spin dryer tube.
Furthermore, the blocking support comprises a bearing box and a supporting rod, a first baffle and a second baffle are formed on the inner side wall of the spin dryer tube in a protruding mode, a connecting rod is arranged between the first baffle and the second baffle, one end of the supporting rod is sleeved outside the connecting rod, and the other end of the supporting rod is connected with the bearing box.
Furthermore, the relative lateral wall of box body connects the swivel mount respectively, and is relative connect the dwang between the swivel mount, the apron rotate connect in on the dwang.
Still further, the box body dorsad the one side of apron sets up fixed establishment, fixed establishment includes a plurality of sucking disc foot, a plurality of sucking disc foot uniform array distributes.
Drawings
Fig. 1 is a schematic structural view of a spin-drying device in an embodiment of the present invention at a first viewing angle;
fig. 2 is a schematic structural view of the spin-drying device in the embodiment of the present invention at a second viewing angle;
fig. 3 is a schematic structural view of the spin-drying device in the embodiment of the present invention at a third viewing angle;
FIG. 4 is a schematic structural view of a spin dryer tube in the spin dryer apparatus of the embodiment of the present invention;
description of the main element symbols:
box body 10 Drying cavity 110
Vacuum tube 120 Spin dryer tube 20
First baffle plate 210 Second baffle 220
Connecting rod 230 Bearing mechanism 30
Bearing box 310 Support rod 320
Cover plate 40 Air intake 410
First filtering mechanism 50 Air inlet pipe 60
Second filtering mechanism 70 Vibration detector 80
Rotating frame 90 Fixing mechanism 100
The following detailed description of the invention will be further described in conjunction with the above-identified drawings.
Detailed Description
In order to facilitate understanding of the present invention, the present invention will be described more fully hereinafter with reference to the accompanying drawings. Several embodiments of the invention are given in the accompanying drawings. The invention may, however, be embodied in many different forms and should not be construed as limited to the embodiments set forth herein. Rather, these embodiments are provided so that this disclosure will be thorough and complete.
It will be understood that when an element is referred to as being "secured to" another element, it can be directly on the other element or intervening elements may also be present. When an element is referred to as being "connected" to another element, it can be directly connected to the other element or intervening elements may also be present. The terms "vertical," "horizontal," "left," "right," and the like as used herein are for illustrative purposes only.
Unless defined otherwise, all technical and scientific terms used herein have the same meaning as commonly understood by one of ordinary skill in the art to which this invention belongs. The terminology used in the description of the invention herein is for the purpose of describing particular embodiments only and is not intended to be limiting of the invention. As used herein, the term "and/or" includes any and all combinations of one or more of the associated listed items.
Please refer to fig. 1 and fig. 2, the embodiment of the present invention provides a spin-drying device, including box body 10 and slewing mechanism, set up in the box body 10 slewing mechanism, the one side indent of box body 10 forms spin-drying chamber 110, be equipped with in the spin-drying chamber 110 with the spin-drying tub 20 that the slewing mechanism drive is connected, specifically, slewing mechanism includes rotation motor and rotation axis, the bottom of box body 10 sets up the rotation motor, the rotation motor drive is connected the rotation axis, in order to drive the rotation axis is along axial rotation. One end of the rotating shaft, which is far away from the rotating motor, is connected to the bottom of the spin-drying tub 20, that is, when the rotating motor drives the rotating shaft to rotate along the axial direction, the rotating shaft drives the spin-drying tub 20 to rotate in the spin-drying chamber 110. Preferably, the rotation shaft is located on the same axis line as the spin-drying tub 20. It can be understood that the bottom of the drying cavity 110 is provided with a rotating shaft groove, and the rotating shaft is located in the rotating shaft groove to complete the axial rotation function.
The spin dryer tube 20 is provided therein with a carrier mechanism 30 for carrying a boat, which is understandably used for carrying wafers. The bearing mechanism 30 includes a plurality of locking brackets, and the locking brackets are uniformly distributed around the axis of the spin dryer tube 20. Through setting up a plurality of jam support can select the quantity of using according to the operation needs to accelerate the dry efficiency of wafer. Preferably, the carrying mechanism 30 includes four card plug brackets, and the four card plug brackets are arranged opposite to each other in pairs. The plurality of blocking supports are uniformly arranged in an annular shape, so that the balance of the spin dryer tube 20 in a centrifugal state can be maintained in the spin drying process, and wafers in the centrifugal state can be better protected.
The blocking bracket comprises a bearing box 310 and a supporting rod 320, a first baffle 210 and a second baffle 220 are convexly formed on the inner side wall of the spin dryer tube 20, and it can be understood that a plurality of first baffles 210 and second baffles 220 are convexly formed on the inner side wall of the spin dryer tube 20, a baffle group is formed by the first baffles 210 and the second baffles 220, and the baffle group corresponds to the blocking bracket. A connecting rod 230 is disposed between the first baffle 210 and the second baffle 220, one end of the supporting rod 320 is sleeved outside the connecting rod 230, and the other end of the supporting rod 320 is connected to the carrying box 310. Preferably, the support rod 320 is rotatably connected to the connecting rod 230 toward one end of the connecting rod 230, and the support rod 320 is rotated downward along the axial direction of the connecting rod 230, so that the carrying box 310 can be close to the inner sidewall of the spin dryer tube 20, the carrying box 310 is prevented from being affected by the unused carrying box 310, and the space utilization rate in the spin dryer tube 20 is enhanced. Further, a clamping structure is arranged in the carrying box 310, and the clamping structure is used for clamping the wafer boat, so that the safety of the wafer in the centrifugal state is further ensured.
The box body 10 is connected with a cover plate 40 used for covering the spin-drying cavity 110, and the spin-drying cavity 110 is covered by the cover plate 40, so that the spin-drying cavity 110 forms a sealed environment, and the wafer can be prevented from being polluted from the outside in the spin-drying process. Specifically, the opposite side walls of the box body 10 are respectively connected with rotating frames 90, the rotating frames 90 are opposite to each other, a rotating rod is connected between the rotating frames 90, and the cover plate 40 is rotatably connected to the rotating rod. It can be understood that, the swivel mount 90 is located the box body 10 orientation the one end of apron 40, the swivel mount 90 includes straight portion and kink, the one end of straight portion connect in on the lateral wall of apron 40, the other end bending of straight portion upwards extends, and forms the kink, it is relative connect between the kink the dwang, the one end rotation of apron 40 connect in on the dwang, through around the axial rotation of dwang the apron 40 to open or close get rid of dry chamber 110, preferably, it is relative connect the dimension steady pole between the straight portion, the dimension steady pole is used for improving the structural stability of swivel mount 90 avoids because of apron 40 overweight leads to swivel mount 90 deforms. Through setting up straight portion and kink, can avoid the apron 40 when rotating and opening and shutting dry chamber 110, the apron 40 with bump takes place between the box body 10, and then obstruct the rotation of apron 40 and open and shut. Preferably, magnetic members are arranged in the cover plate 40 and the box body 10, and when the cover plate 40 rotates and covers the spin-drying cavity 110, the cover plate 40 and the box body 10 are magnetically adsorbed, so that the sealing property in the spin-drying cavity 110 is ensured.
In order to further prevent the wafer from being polluted by the external environment, the spin-drying device further comprises a vacuum mechanism for forming a negative pressure environment in the spin-drying chamber 110. The vacuum mechanism comprises a vacuum pump and a vacuum tube 120, one end of the vacuum tube 120 is connected to the vacuum pump, and the other end of the vacuum tube 120 penetrates through the box body 10 and then is communicated with the spin-drying cavity 110. The wafer is arranged in the spin-drying cavity 110, the cover plate 40 covers the spin-drying cavity 110, then the vacuum pump is started, the vacuum pump sucks air in the spin-drying cavity 110 through the vacuum tube 120, a negative pressure environment is formed in the spin-drying cavity 110, particles such as dust in the air can be effectively eliminated, pollution to the wafer is avoided, and the product reject ratio is effectively reduced.
The apron 40 dorsad the one side of box body 10 sets up first filter mechanism 50, set up inlet port 410 on the apron 40, first filter mechanism 50 passes through inlet port 410 intercommunication the chamber 110 of spin-drying, first filter mechanism 50 a lateral wall intercommunication have be used for to send into the intake pipe 60 of nitrogen gas in the chamber of spin-drying, understandably, intake pipe 60 keeps away from the nitrogen gas source is connected to the one end of first filter mechanism 50, first filter mechanism 50 is used for filtering the particulate matter in the nitrogen gas. Preferably, the first filter mechanism 50 is an FFU filter. Slewing mechanism drive spin dryer tube 20 when carrying out the centrifugation spin-dry to the wafer in it, through intake pipe 60 to let in nitrogen gas in spin-drying chamber 110 to the mobility of gas reaches the concentrated action to liquid, and the water stain of remaining on the wafer is taken away to the cooperation centrifugal force, is guaranteeing that the wafer obtains effectual drying under the condition of the stability of wafer in centrifugal state, through setting up first filter mechanism 50, the effectual improvement lets in nitrogen gas purity in the spin-drying chamber 110 can avoid the large granule pollutant in the nitrogen gas to get into along with nitrogen gas in the spin-drying chamber 110, and then damage the wafer.
The spin-drying device further includes a second filtering mechanism 70, and the second filtering mechanism 70 is connected to the inside of the first filtering mechanism 50 and is used for eliminating static electricity in the nitrogen gas. Preferably, the second filtering mechanism 70 is an electrostatic rod, a plug hole is formed in a side wall of the first filtering mechanism 50, the electrostatic rod is plugged into the first filtering mechanism 50 through the plug hole, when the air inlet pipe 60 sends nitrogen into the first filtering mechanism 50, the electrostatic rod adsorbs and eliminates static in the nitrogen, and then the nitrogen with static enters the spin drying chamber 110 to contact with the wafer, so that the electrode on the wafer is broken down, and the defect rate is increased.
Set up vibrations detector 80 in the box body 10, vibrations detector 80 electric connection slewing mechanism the slewing mechanism drives when spin-drying tub 20 carries out centrifugal rotation, box body 10 can form certain degree vibrations because of receiving the centrifugal force influence, vibrations detector 80 is used for detecting the vibration range of box body 10, understandably, set up in the vibrations detector 80 and mark the vibrations value, work as vibrations detector 80 detects actual vibrations value and surpasss when demarcating the vibrations value, judge promptly the spin-drying device is in abnormal centrifugal state, at this moment, vibrations detector 80 feedback stop signal extremely the motor rotates, the motor stop drive rotates the rotation axis along axial rotation. Through setting up shake detector 80, can effectively avoid the too big centrifugal amplitude, violent rocking takes place the condition that shakes garrulous with the wafer.
Box body 10 dorsad the one side of apron 40 sets up fixed establishment 100, fixed establishment 100 is used for stabilizing box body 10 avoids box body 10 takes place the displacement under the effect of centrifugal force vibrations, understandably, fixed establishment 100 be used for with box body 10 is fixed in on the outside workstation. Specifically, fixed establishment 100 includes a plurality of sucking disc foot, a plurality of sucking disc foot uniform array distributes, preferably, fixed establishment 100 includes four the sucking disc foot, four the sucking disc foot is located box body 10 dorsad the four corners department of the one side of apron 40, through the sucking disc foot, adsorb fixedly with outside workstation on.
In the description of the present specification, reference to the description of "one embodiment," "some embodiments," "an example," "a specific example," or "some examples" or the like means that a particular feature, structure, material, or characteristic described in connection with the embodiment or example is included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the terms used above do not necessarily refer to the same embodiment or example. Furthermore, the particular features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.
The above-mentioned embodiments only represent some embodiments of the present invention, and the description thereof is specific and detailed, but not to be construed as limiting the scope of the present invention. It should be noted that, for those skilled in the art, without departing from the spirit of the present invention, several variations and modifications can be made, which are within the scope of the present invention. Therefore, the protection scope of the present invention should be subject to the appended claims.

Claims (10)

1. The utility model provides a spin-drying device, includes the box body and locates slewing mechanism in the box body, a serial communication port, the one side indent of box body forms and gets rid of the chamber of doing, the intracavity that spin-dries be equipped with the spin-drying barrel that the slewing mechanism drive is connected, be equipped with the bearing mechanism who is used for bearing the crystal boat in the spin-drying barrel, the box body is connected with and is used for the lid to close the apron in the chamber of doing, the apron dorsad the one side of box body sets up first filtering mechanism, set up the inlet port on the apron, first filtering mechanism passes through the inlet port intercommunication get rid of the chamber of doing, a filtering mechanism lateral wall intercommunication have be used for to nitrogen gas's intake pipe is sent into in the spin-drying chamber, first filtering mechanism is used for filtering the particulate matter in the nitrogen gas.
2. The spin-drying apparatus of claim 1 further comprising a second filter mechanism connected to the first filter mechanism for removing static electricity from the nitrogen gas.
3. The spin-drying apparatus of claim 1 further comprising a vacuum mechanism for creating a negative pressure environment within the spin-drying chamber.
4. The spin-drying device of claim 3, wherein the vacuum mechanism comprises a vacuum pump and a vacuum tube, one end of the vacuum tube is connected to the vacuum pump, and the other end of the vacuum tube passes through the box body and is communicated with the spin-drying cavity.
5. The spin-drying apparatus of claim 1 wherein a vibration detector is disposed within the casing and is electrically connected to the rotating mechanism.
6. The spin dryer apparatus of claim 1, wherein the rotating mechanism comprises a rotating shaft and a rotating motor drivingly connected to the rotating shaft, the rotating motor is disposed at the bottom of the casing, and an end of the rotating shaft remote from the rotating motor is connected to the bottom of the spin dryer tube.
7. The spin dryer apparatus of claim 1 wherein said carrier mechanism comprises a plurality of bayonet brackets evenly distributed about the axis of said spin dryer tub.
8. The spin-drying device of claim 7, wherein the plug bracket comprises a carrying box and a support rod, a first baffle and a second baffle are formed by the inner side wall of the spin-drying tub in a protruding manner, a connecting rod is arranged between the first baffle and the second baffle, one end of the support rod is sleeved outside the connecting rod, and the other end of the support rod is connected with the carrying box.
9. The spin-drying apparatus of claim 1 wherein the opposite side walls of the box body are respectively connected to a rotating frame, a rotating rod is connected between the opposite rotating frames, and the cover plate is rotatably connected to the rotating rod.
10. The spin-drying device of claim 1, wherein a fixing mechanism is disposed on a side of the box body facing away from the cover plate, the fixing mechanism comprises a plurality of suction cup feet, and the suction cup feet are uniformly distributed in an array.
CN202222820777.5U 2022-10-25 2022-10-25 Spin-drying device Active CN218351424U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
CN202222820777.5U CN218351424U (en) 2022-10-25 2022-10-25 Spin-drying device

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116123828A (en) * 2023-02-07 2023-05-16 上海至纯洁净系统科技股份有限公司 Dynamic balance rotary dryer
CN116336761A (en) * 2023-05-30 2023-06-27 苏州智程半导体科技股份有限公司 Electroplating machine drying mechanism based on wafer electroplating

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN116123828A (en) * 2023-02-07 2023-05-16 上海至纯洁净系统科技股份有限公司 Dynamic balance rotary dryer
CN116336761A (en) * 2023-05-30 2023-06-27 苏州智程半导体科技股份有限公司 Electroplating machine drying mechanism based on wafer electroplating
CN116336761B (en) * 2023-05-30 2023-08-22 苏州智程半导体科技股份有限公司 Electroplating machine drying mechanism based on wafer electroplating

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