CN212735564U

CN212735564U - Polishing pad center calibration jig

Info

Publication number: CN212735564U
Application number: CN202021581370.6U
Authority: CN
Inventors: 张乐; 杨帛霖
Original assignee: Nexchip Semiconductor Corp
Current assignee: Nexchip Semiconductor Corp
Priority date: 2020-08-03
Filing date: 2020-08-03
Publication date: 2021-03-19
Anticipated expiration: 2030-08-03

Abstract

The utility model provides a grinding pad center calibration tool, including main support and clamping jaw, the main support has support center and from a plurality of support sections of support center outside extension, detachably is provided with a clamping jaw on the extension line of every support section, every clamping jaw all includes the curb plate of keeping away from the tip setting of main support and is located the first dog and the second dog of curb plate inboard, the inboard summit of first dog and second dog is located two circumference respectively, the circumference plane that each first dog corresponds is less than the support center and is higher than the circumference plane that each second dog corresponds, the center pin coincidence of two circumferences. In the process of pasting the grinding pad, whether the side face of the grinding pad is in contact with each first stop block or not is detected, and whether the side face of the grinding disc is in contact with each second stop block or not is detected, so that center calibration is carried out, manual alignment errors can be reduced, the center position of the grinding pad is accurate, and the pasting efficiency is improved.

Description

Polishing pad center calibration jig

Technical Field

The utility model relates to a semiconductor technology field especially relates to a grinding pad center calibration tool.

Background

Currently, in the manufacture of semiconductor devices based on wafers, the wafers are required to be finely polished to obtain a flat surface, and Chemical Mechanical Polishing (CMP) is a common global planarization process. In general, a CMP apparatus includes a polishing disk, a polishing pad (pad) adhered to the polishing disk, and a polishing head (polish head), wherein during polishing, the polishing pad and the polishing disk rotate together, a wafer is adsorbed by the polishing head and then pressed against the upper surface of the polishing pad, and a polishing liquid containing a chemical assistant and polishing particles is supplied onto the polishing pad, and the surface of the wafer chemically reacts with the chemical assistant and simultaneously rubs against the polishing particles, thereby abrading the surface of the wafer and gradually flattening the surface of the wafer.

Generally, when the polishing pad is worn to a certain extent, the polishing pad is a worn member because the ability of controlling the polishing thickness of the polishing pad is deteriorated and the polishing quality is deteriorated, and the polishing pad needs to be replaced.

At present, the work of replacing the grinding pad is mainly manually completed, in the process, the operation of manually pasting the grinding pad on the grinding disc easily causes the center point of the grinding pad to deviate from the center point of the grinding disc due to manual alignment error, so that, on one hand, the circle center of a concentric circular groove on the grinding pad is also eccentric with the grinding disc, the distribution of grinding fluid on the grinding pad is influenced, thereby the grinding efficiency and the grinding uniformity are influenced, the abnormal probability of the CMP result is increased, on the other hand, although the grinding pad can be torn down and pasted again for correction when the eccentricity is found, bubbles are easily formed between the grinding disc and the grinding pad after pasting again, fragments can be caused during grinding, the output of a machine table is influenced, on the other hand, the commonly used grinding pad is designed to be used by pasting once, if the times of pasting failure are many, not only the labor hour is consumed, but also the grinding, resulting in higher maintenance costs.

SUMMERY OF THE UTILITY MODEL

Reduce artifical alignment error for the pasting quality and the pasting efficiency of improvement grinding pad, the utility model provides a grinding pad center calibration tool.

The utility model provides a grinding pad center calibration jig, including main support and clamping jaw, the main support has support center and respectively from the support center outwards extends and is located a plurality of support sections of coplanar, detachably be provided with one on the extension line of each support section the clamping jaw, each clamping jaw all includes in the curb plate of the tip setting of keeping away from the main support, be located first foot rest and the second foot rest of curb plate inboard; the bottom end of the first foot rest is connected with the side plate, the top end of the first foot rest is provided with first stop blocks, and the inner side vertexes of the first stop blocks are positioned on the same circumferential line and marked as a first circumferential line; the bottom end of the second foot rest is connected with the side plate, the top end of the second foot rest is provided with a second stop block, and the inner side vertexes of the second stop blocks are positioned on the same circumferential line and marked as a second circumferential line; the plane of the first circumferential line is lower than the center of the support and higher than the plane of the second circumferential line, and the central axes of the first circumferential line and the second circumferential line are coincident.

Optionally, the main support is in an X-shaped structure, and the four support sections respectively form four extension lines of the X-shaped structure.

Optionally, the central axes of the first circumferential line and the second circumferential line pass through the center of the bracket.

Optionally, the included angle between two adjacent stent segments is adjusted by rotating around the center of the stent.

Optionally, each of the bracket sections is a hollow tube structure with an outward opening, and the clamping jaw is inserted into the bracket section from the opening and is fixedly connected to the bracket section through a screw.

Optionally, each clamping jaw is provided with a scale divided by length units.

Optionally, the main support and/or the lower surface of the clamping jaw are provided with supporting legs, and the lower surfaces of the supporting legs are not higher than the upper surface of the first stop block.

Optionally, the side plate on the clamping jaw is perpendicular to the extension line direction of the connected bracket section, and the inner side surfaces of the first stop block and the second stop block are parallel.

Optionally, the inner side surface of the first block and the inner side surface of the second block are both planar and tangent to the first circumferential line and the second circumferential line, respectively.

Optionally, the first leg frame includes a first pillar, a bottom end of the first pillar is connected to the side plate, and a top end of the first pillar is connected to the first stopper; the second foot rest comprises a second support column, the bottom end of the second support column is connected with the side plate, and the top end of the second support column is connected with the second stop block.

Optionally, the first strut and the second strut are parallel.

Can utilize the utility model provides a grinding pad center calibration tool carries out center calibration pasting the grinding pad in-process, places the grinding pad on the abrasive disc after, can put the main tributary frame that has three clamping jaw on the abrasive disc, makes the edge of the circular grinding disc of each second stop block contact, then installs remaining clamping jaw, confirms the center of grinding pad and the center of abrasive disc in order to be located same axis, then the position of fixed grinding pad, will the clamping jaw with the support frame is taken away, progressively tears the gum of grinding pad and makes it paste on the abrasive disc. Utilize grinding pad center calibration tool can reduce artifical alignment error, improves the quality of pasting of grinding pad to help reducing CMP technology abnormity, promote the efficiency of pasting of grinding pad, thereby help improving the output of CMP board.

Drawings

Fig. 1 is a schematic view of an abrasive disc and an abrasive pad affixed thereto.

Fig. 2 is a schematic view of an abrasive disk and an eccentric abrasive pad attached thereto.

Fig. 3 is a schematic view of a polishing pad center calibration fixture according to an embodiment of the present invention.

Fig. 4 is a schematic view of a main support of the polishing pad center calibration jig shown in fig. 3.

Fig. 5 is a schematic view of a clamping jaw of the polishing pad center calibration jig shown in fig. 3.

FIG. 6 is a schematic diagram of the alignment jig for center of polishing pad and the polishing disk shown in FIG. 3.

FIG. 7 is a schematic view illustrating a process of attaching a polishing pad using the polishing pad center alignment jig shown in FIG. 3.

Description of reference numerals:

100-a grinding disc; 200-a polishing pad; 300-polishing pad center calibration jig; 10-a main support; 10a, 10b, 10c, 10 d-scaffold segments; 11-a screw; 12-supporting feet; 20-a clamping jaw; 21-side plate; 22-a first foot rest; 22 a-a first stop; 22 b-a first strut; 23-a second foot rest; 23 a-a second stop; 23 b-second strut.

Detailed Description

The following describes the polishing pad center calibration jig of the present invention in further detail with reference to the accompanying drawings and specific embodiments. The advantages and features of the present invention will become more apparent from the following description. It should be noted that the drawings are in simplified form and are not to precise scale, and are provided for convenience and clarity in describing the embodiments of the present invention.

The grinding device for executing the CMP process comprises a grinding disc (or working table) and a grinding pad adhered on the grinding disc, wherein the front surface of the conventionally adopted grinding pad is provided with an abrasive layer, the abrasive layer comprises a plurality of small protrusions formed by solidifying abrasive, and the front surface of the grinding pad is also provided with concentric circular or spiral grooves, so that grinding products and grinding pad debris generated in the grinding process are removed in time. The back surface of the grinding pad is provided with a back glue layer used for adhering on the grinding disc. Fig. 1 is a schematic view of an abrasive disc and an abrasive pad affixed thereto. Referring to fig. 1, the conventional polishing disk 100 and polishing pad 200 are both circular, and the polishing pad 200 is slightly larger than the polishing disk 100. For example, in one specification polishing apparatus, the polishing pad has a diameter of, for example, 30.5 inches and the polishing disk has a diameter of, for example, 29.5 inches, with a 0.5 inch radius difference. In the process of adhering the polishing pad to the polishing disc with corresponding specification, the center points, i.e. the centers of circles, of the polishing pad and the polishing disc are generally required to be basically coincident.

Fig. 2 is a schematic view of an abrasive disk and an eccentric abrasive pad attached thereto. Referring to fig. 2, in practice, the operation of peeling off the used polishing pad and attaching a new polishing pad to the polishing disc 100 is performed by an operator with the aid of an existing polishing pad maintenance tool (which may assist in pressing, leveling, etc.), the calibration of the center points of the polishing disc 100 and the polishing pad 200 is determined by human eyes, and there is a large error, the attached polishing pad 200 is often eccentric, that is, the center point is deviated from the center point of the polishing disc 100 by a certain distance, which cannot meet the requirement of the attachment quality, because if the CMP process is performed directly in an eccentric state, the distribution of the polishing solution on the polishing pad is affected, thereby affecting the polishing efficiency and uniformity, and increasing the probability of abnormal CMP process, if the attachment position is torn off and adjusted again or the polishing pad is replaced, bubbles are easily generated, and the attachment efficiency is low and the cost is increased due to repeated attachment.

Reduce artifical alignment error for the pasting quality and the efficiency of pasting of improvement grinding pad, the utility model provides a grinding pad center calibration tool, it is following right the utility model discloses grinding pad center calibration tool carries out detailed description.

Fig. 3 is a schematic view of a polishing pad center calibration fixture according to an embodiment of the present invention. Fig. 4 is a schematic view of a main support of the polishing pad center calibration jig shown in fig. 3. Fig. 5 is a schematic view of a clamping jaw of the polishing pad center calibration jig shown in fig. 3. Referring to fig. 3 to 5, a polishing pad center calibration jig 300 according to an embodiment of the present invention includes a main support 10 and a clamping jaw 20, where the main support 10 has a support center O and a plurality of support sections (respectively denoted by 10a, 10b, 10c, and 10d) extending outward from the support center O and located on a same plane, and one clamping jaw 20 is detachably disposed on an extension line of each of the support sections, where each clamping jaw 20 includes a side plate 21 disposed at an end portion far away from the main support 10, and a first foot rest 22 and a second foot rest 23 located inside the side plate 21.

Specifically, the bottom end of the first leg 22 is connected to the side plate 21, and the top end of the first leg is provided with a first stopper 22a, and the inside vertexes of the first stoppers 22a are all located on the same circumferential line, which is denoted as a first circumferential line for convenience of description. The bottom end of the second leg 23 is connected to the side plate 21, and the top end thereof is provided with a second stopper 23a, and the inward vertexes of the second stoppers 23a are located on the same circumferential line, which is referred to as a second circumferential line for convenience of description. The plane of the first circumferential line is lower than the support center O and higher than the plane of the second circumferential line, and the central axes of the first circumferential line and the second circumferential line are coincident. Here, "inside" refers to a direction toward the center surrounded by the plurality of jaws.

FIG. 6 is a schematic diagram of the alignment jig for center of polishing pad and the polishing disk shown in FIG. 3. Referring to fig. 6, in the pad attaching operation, the main holder 10 is used to support each clamping jaw 20, and the holder center O of the main holder 10 is used to determine the position of the center of the polishing pad 200 so that it is concentric with the polishing disc 100. One end of each clamping jaw 20 is connected with the main support 10, and the other end is located at the edge of the grinding disc 100, so as to contact the side surface of the grinding pad 200 by using a first foot support 22 (specifically, the inner vertex of the first stop 22 a) arranged at the end part of the clamping jaw 20 far away from the main support 10, and simultaneously contact the side surface of the grinding disc 100 by using a second foot support 23 (specifically, the inner vertex of the second stop 23 a) arranged at the end part of the clamping jaw 20 far away from the main support 10, thereby realizing the concentricity of the grinding pad 200 and the grinding disc 100 when a first circumferential line where the first stop 22a on each first foot support 22 is located and a second circumferential line where the second stop 23a on each second foot support 23 is located are concentric, and at the moment, the position of the grinding pad 200 meets the fitting requirement.

Specifically, referring to fig. 3 to 6, in an embodiment, the main support 10 has an X-shaped structure, and the four

support sections

10a, 10b, 10c and 10d respectively form four extension lines of the X-shaped structure. In this embodiment, two adjacent stent segments on the primary stent 10 (e.g., between stent segment 10a and stent segment 10b, and between stent segment 10a and stent segment 10d) form an included angle, while two non-adjacent stent segments (e.g., stent segment 10a and stent segment 10c, or stent segment 10b and stent segment 10d) are in the same line. The angle between two adjacent carrier sections can be set to a fixed value, for example 60 and 120 degrees, respectively, as required. The included angle between two adjacent stent segments can also be set to be adjustable, and the included angle between two adjacent stent segments can be adjusted by rotating around the stent center O, for example, at least one stent segment can be rotated around a central axis passing through the stent center O to change the included angle. The lengths of the various stent segments of the primary stent 10 may be equal. The carrier center O may be located directly above the center of the polishing pad 200 and polishing disc 100 to be calibrated. The main holder 10 is not limited to the X-shaped structure shown in the drawings, and in another embodiment, the main holder 10 may have three holder segments or more than five holder segments, as long as the first circumferential line of each first stopper 22a and the second circumferential line of each second stopper 23a are adjusted to be concentric, and may be used for centering when attaching the polishing pad.

The radius of the first circumferential line, i.e., the position of the apex on the back side of each first stopper 22a, is related to the radius of the polishing pad 200, and the radius of the second circumferential line, i.e., the position of the apex on the back side of each second stopper 23a, is related to the radius of the polishing disk 100. Therefore, the positions of the first stopper 22a and the second stopper 23a can be designed according to the sizes of the polishing disc 100 and the polishing pad 200 to be pasted. In one embodiment, the radii of the first and second circumferential lines are adjustable, so that the distance between the first and

second stoppers

22a and 23a and the center of the corresponding circumferential line can be adjusted. And, the first circumferential line and the second circumferential line are provided as concentric circles in order to make the polishing pad contacted by each first stopper 22a concentric with the polishing pad contacted by each second stopper 23a, thereby improving the sticking effect of the polishing pad. Thus, in the present embodiment, for the first and second foot rests 22 and 23 provided on the same clamping jaw 20, the distance D (see fig. 5) between the inside apexes of the first stopper 22a for contacting the polishing pad 200 and the second stopper 23a for contacting the polishing disc 100 can be determined according to the difference in radius between the polishing disc 100 and the polishing pad 200, and the distances between the first and

second stoppers

22a and 23a provided for each clamping jaw 20 are all equal. Referring to fig. 4, as an example, the diameter of the polishing disc 100 is 29.5 inches, the diameter of the polishing pad 200 is 30.5 inches, and the radius difference between the two is 0.5 inches, so that after each clamping jaw 20 is mounted on the main bracket 10, it is necessary for the polishing pad center calibration jig to make the first stopper 22a on each clamping jaw 20 be more outward (away from the center of the circle) than the second stopper 23a, and the distance between the inside vertexes of the first stopper 22a and the second stopper 23a is set to be 0.5 inches.

Each clamping jaw 20 is detachably arranged on the extension line of one bracket section, and when the grinding pad 200 is adhered, the grinding pad center calibration jig can be conveniently removed after center calibration due to the detachable design, and the position of the grinding pad 200 is slightly influenced. In addition, after the polishing pad 200 is placed on the polishing disc 100, the position of the polishing pad 200 may be adjusted by using a part of the clamping jaws 20, and then the rest of the clamping jaws 20 may be mounted, and it is checked whether the polishing pad 200 is in contact with the first stopper 22a and the polishing disc 100 is in contact with the second stopper 23a, thereby verifying the position of the polishing pad 200 and improving the center alignment accuracy.

It should be noted that, when actually manufacturing the polishing pad center calibration jig, the specific dimension thereof is affected by the processing precision and the processing error, and is not exactly the same as the set value. According to the polishing pad center calibration jig actually obtained by the scheme, the distances between the inside vertexes of the first stop 22a and the second stop 23a arranged on each clamping jaw can be not strictly equal, and certain processing errors are allowed to exist. In addition, in consideration of actual machining errors and mounting errors, the radius of the first circumferential line on which the inner vertex of each first stopper 22a is located may be set slightly larger than the radius of the polishing pad to be attached, and the radius of the second circumferential line on which the inner vertex of each second stopper 23a is located may be set slightly larger than the radius of the polishing pad.

Referring to fig. 3 and 4, in one embodiment, each of the stent segments may be provided as a hollow tube structure with an outward opening (away from the center O of the stent), so that the clamping jaws 20 correspondingly provided on each stent segment can be inserted into the corresponding stent segment from the outward opening for connection. Furthermore, when the clamping jaws 20 are inserted into the target position, they can be fixed by screws 11 through the housing of the carrier section and the clamping jaws 20 located inside the carrier section, so that the clamping jaws 20 are fixedly connected to the respective carrier section. The distance of the clamping jaws 20 inserted into the corresponding support sections is preferably adjustable, and the positions of the end portions far away from the main support 10 of the polishing pad 200 are adjusted according to the size of the polishing pad, so that the radii of the first circumferential line and the second circumferential line can be adjusted, and the polishing pads 200 with different specifications and sizes can be conveniently pasted on the polishing disc 100 by using the same polishing pad center calibration jig. In one embodiment, the end of the clamping jaw facing the center O of the bracket may have an external thread, and a matching internal thread may be provided in the bracket section, so that when the clamping jaw 20 is installed, the clamping jaw 20 and the bracket section may be connected by screw threads, and the depth of the clamping jaw 20 in the bracket section may be controlled according to the rotating distance.

Referring to fig. 3, preferably, a scale divided by a length unit may be provided on each of the jaws 20, so that the scale is used to help obtain a distance from the stent center O to a distal end (i.e., an end away from the stent center) of the jaw 20, particularly a distance from the stent center O to an inner side surface of the first stopper 22a of the jaw 20. In one embodiment, the closer the scale on the clamping jaw 20 is to the center O of the holder, the larger the value of the maximum scale exposed by the clamping jaw 20 when the clamping jaw 20 is mounted on the main holder 10, the larger the polishing pad 200 to be attached. In one embodiment, the scale value on the jaw 20 exposed from the boundary of the carrier section may represent the length of the exposed portion of the jaw 20, or the sum of the length of the exposed portion of the jaw 20 and the length of the carrier section. By way of example, if the polishing pad 200 has a radius of 15.25 inches, the clamping jaws 20 may have a scale of 15.25 inches at the point just exposed at the junction with the corresponding carrier section, or 15.25 inches minus the length of the carrier section, when the clamping jaws 20 are installed. The scale may be set to be smaller as the scale on the clamping jaw 20 is closer to the center O of the carrier, and in this case, the length of the carrier section may be subtracted from the radius of the polishing pad 200 to obtain the length of the clamping jaw 20 to be exposed, and the difference obtained by subtracting the scale value of the position where the clamping jaw 20 is just exposed at the connection with the corresponding carrier section from the scale value of the end of the clamping jaw 20 (the scale may be aligned with the inner vertex of the first stopper 22 a) may be adjusted to be equal to the length of the clamping jaw 20 to be exposed.

Referring to fig. 3 to 6, a side plate 21 provided on each of the clamping jaws 20 may be disposed to be perpendicular to an extending line of a frame section connected to the clamping jaw 20, a first foot rest 22 and a second foot rest 23 are located inside the side plate 21, preferably lower than the clamping jaw body (or lower than the main frame 10), the first foot rest 22 may contact with a side surface of the polishing pad 200 through a first stopper 22a, and the second foot rest 23 may contact with a side surface of the polishing disk 200 through a second stopper 23 a.

The first and second legs 22, 23 are, for example, T-shaped, wherein the first and

second stops

22a, 23a are located at the upper transverse line of the T-shape. Alternatively, each of the first foot rests 22 may include a first pillar 22b, a bottom end of the first pillar 22b being connected to the side plate 21 of the corresponding clamping jaw 20, and a top end thereof being connected to the first stopper 22a of the corresponding clamping jaw 20. Each of the second foot rests 23 may include a second pillar 23b, a bottom end of the second pillar 23b being connected to the side plate 21 of the corresponding clamping jaw 20, and a top end thereof being connected to the second stopper 23a of the corresponding clamping jaw 20. The first support column 22b and the second support column 23b may be arranged in parallel, and surfaces (i.e., inner surfaces) where the inner vertices of the first stopper 22a and the second stopper 23a are located may also be parallel. In addition, in order to accurately center the polishing pads 200 of different sizes, the inner surfaces of the first and

second stoppers

22a and 23a may be formed as flat surfaces (non-curved surfaces), and the inner surfaces of the first stoppers 22a may be formed to be tangent to the first circumferential line (the tangent point is the inner vertex of the first stopper 22 a), so that the first stoppers 22a may be brought into contact with the polishing pads 200 as tangent surfaces of the polishing pads 200. Further, the inner surface of each of the second stoppers 23a may be tangent to the second circumferential line (the tangent point is the inner vertex of the second stopper 23 a), so that the second stopper 23a is in contact with the polishing disc 100 as a tangent surface of the polishing disc 100.

In order to keep the main holder 10 and the clamping jaws 20 stable during the alignment process while trying to avoid the main holder 10 and the clamping jaws 20 from directly contacting the upper surface of the polishing pad 200, the plane of the main holder 10 and the clamping jaws 20 may be set to be a distance higher than the plane of the polishing pad 200 where the first stopper 22a is located. In an embodiment, referring to fig. 3 and 4, a supporting foot 12 may be provided on a lower surface of the main support 10, and the supporting foot 12 is supported by contacting the lower surface of the supporting foot 12 with the polishing pad 200, and the lower surface of the supporting foot 12 is preferably not higher than the upper surface of the first stopper 22a, so as to maintain a certain gap between the main support 10 and the clamping jaw 20 and the upper surface of the polishing pad 200 during the centering. The number of the supporting feet 12 may be more than one, and more than two supporting feet 12 may be symmetrically arranged below each bracket section respectively. In addition, referring to fig. 5, the supporting legs 12 may also be symmetrically disposed on the lower surface of each clamping jaw 20 to improve the stability of the calibration jig during the centering calibration process. In one embodiment, at least one support foot 12 may be provided on the lower surface of each carrier section and each jaw 20.

FIG. 7 is a schematic view illustrating a process of attaching a polishing pad using the polishing pad center alignment jig shown in FIG. 3. The process of auxiliary attaching the polishing pad using the polishing pad center alignment jig will be described below with reference to fig. 7.

First, the main support 10 of the X-shape and the three clamping jaws 20 are assembled and combined together. In this step, the distances between the inside vertexes of the first stopper 22a and the second stopper 23a provided on each of the holding jaws 20 are equal, and the inside vertexes of the three first stoppers 22a are located on a first circumferential line having the same radius as that of the polishing pad 200 to be attached, and the inside vertexes of the three second stoppers 23a are located on a second circumferential line having the same radius as that of the polishing disk 100 to which the polishing pad 200 is to be attached. In practice, to avoid the influence of machining errors, the radius of the first circumferential line may be slightly larger than the radius of the polishing pad 200 to be attached, and the radius of the second circumferential line may be slightly larger than the radius of the polishing disc 100.

The adhesive backing of the polishing pad 200 is then torn open a short distance. The purpose is to hold the polishing pad 200 from this tear location and complete the remainder of the attachment after centering. Here, for example, a 30.5 inch diameter polishing pad, the backing adhesive may be torn by about 5cm (or 2 inches).

Next, the back of the polishing pad 200 is placed on the polishing disc 100, the center alignment jig of the polishing pad 200 with the three clamping jaws 20 mounted thereon is placed on the polishing pad 200, the positions of the first stoppers 22a are observed and adjusted, so that the inner vertices of the first stoppers 22a contact the side surface of the polishing pad 200, and the inner vertices of the second stoppers 23a contact the side surface of the polishing disc 100, after the adjustment, the polishing pad 200 and the polishing disc 100 substantially achieve the concentric requirement. The reason for this adjustment with only three jaws 20 is primarily that three jaws are more convenient for manually moving the polishing pad than four jaws.

Then, the fourth jaw 20 is mounted on the calibration jig at the same position as the other three jaws 20, and the inner side surface of the first stopper 22a thereon may be tangent to the first circumferential line and the inner side surface of the second stopper 23a may be tangent to the second circumferential line. After the polishing pad is installed, whether the inside vertexes of the first stopper 22a and the second stopper 23a on the fourth clamping jaw 20 are respectively contacted with the side surfaces of the polishing pad 200 and the polishing disc 100 is checked, if so, the requirement of center calibration is met, the polishing pad 200 and the polishing disc 100 meet the concentric requirement, if not, the requirement of center calibration is not met, the contact condition of the polishing pad 200 and the polishing disc 100 at the end part of each clamping jaw 20 needs to be adjusted, finally, the four first stoppers 22a are all contacted with the side surfaces of the polishing pad 200, the four second stoppers 23a are all contacted with the side surfaces of the polishing disc 100, and at this time, the center calibration of the polishing pad is completed.

Next, the back adhesive, which is torn and exposed on the front surface of the polishing pad 200, may be pressed against the polishing platen 100 using an existing polishing pad attachment tool to fix the position of the polishing pad 200.

Then, the respective jaws 20 of the main support 10 are sequentially removed, and the main support 10 is also removed, ready for further gluing operations.

Finally, the remaining adhesive-backed film on the polishing pad 200 is torn off step by using the existing polishing pad attachment tool, and the exposed adhesive-backed film is gradually pressed and attached to the polishing pad 100, thereby completing the attachment operation of the polishing pad 200.

It is visible, utilize the utility model provides a grinding pad center calibration tool carries out center calibration operation, and whether the position of grinding pad and abrasive disc no longer rely on the naked eye to observe with one heart, but whether the side through detecting the grinding pad contacts with each first dog to and whether the side that detects the abrasive disc confirms with each second dog contact, can reduce artifical alignment error, make the central point of grinding pad put the accuracy, improve the quality of pasting of grinding pad, and still have following advantage:

(1) the grinding pad can be quickly and accurately aligned to the center of the grinding disc, so that the sticking efficiency of the grinding pad is improved, the maintenance time is reduced, and the maintenance efficiency is improved;

(2) the extra loss of the grinding pad caused by the eccentricity of the grinding pad and the grinding disc is avoided;

(3) bubbles generated when the grinding pad is pasted are reduced, and the fragment rate is reduced;

(4) the polishing pad is beneficial to reducing abnormal polishing rate and uniformity, the maintenance time for replacing the polishing pad by the CMP machine is reduced, the maintenance efficiency is improved, and the output of the CMP machine is improved;

(5) when the grinding pad center calibration jig is used for carrying out grinding pad center calibration, the grinding pad center calibration jig is convenient to install and remove, and can be suitable for grinding pad pasting processes of different specifications.

The above description is only for the preferred embodiment of the present invention and is not intended to limit the scope of the claims of the present invention, and any person skilled in the art can use the above disclosed method and technical contents to make possible changes and modifications to the technical solution of the present invention without departing from the spirit and scope of the present invention, and therefore, any simple modification, equivalent change and modification made to the above embodiments by the technical substance of the present invention all belong to the protection scope of the technical solution of the present invention.

Claims

1. The grinding pad center calibration jig is characterized by comprising a main support and clamping jaws, wherein the main support is provided with a support center and a plurality of support sections which respectively extend outwards from the support center and are positioned on the same plane, one clamping jaw is detachably arranged on an extension line of each support section, and each clamping jaw comprises a side plate arranged at the end part far away from the main support, a first foot rest and a second foot rest which are positioned on the inner side of the side plate;

the bottom end of the first foot rest is connected with the side plate, the top end of the first foot rest is provided with first stop blocks, and the inner side vertexes of the first stop blocks are positioned on the same circumferential line and marked as a first circumferential line; the bottom end of the second foot rest is connected with the side plate, the top end of the second foot rest is provided with a second stop block, and the inner side vertexes of the second stop blocks are positioned on the same circumferential line and marked as a second circumferential line; the plane of the first circumferential line is lower than the center of the support and higher than the plane of the second circumferential line, and the central axes of the first circumferential line and the second circumferential line are coincident.

2. The polishing pad center calibration jig of claim 1, wherein the main support is an X-shaped structure, and four support sections respectively form four extension lines of the X-shaped structure.

3. The polishing pad center calibration jig of claim 1, wherein the central axes of the first circumferential line and the second circumferential line pass through the center of the holder.

4. The polishing pad center calibration jig of claim 1, wherein the included angle between two adjacent holder segments is adjusted by rotating around the holder center.

5. The pad center calibration jig of claim 1 wherein each of the carrier sections is a hollow tube structure with an outward opening, and the clamping jaws are inserted into the carrier sections from the openings and are fixedly attached to the carrier sections by screws.

6. The pad center calibration jig of claim 1, wherein each of the clamping jaws is provided with a scale divided by a length unit.

7. The polishing pad center calibration jig of claim 1, wherein the main bracket and/or the lower surface of the clamping jaw are provided with supporting legs, and the lower surfaces of the supporting legs are not higher than the upper surface of the first stop block.

8. The tool of any one of claims 1 to 7, wherein the side plates of the clamping jaws are perpendicular to the extension line direction of the connected bracket sections, and the inner side surfaces of the first stop and the second stop are parallel.

9. The polishing pad center calibration jig of claim 8, wherein the inner side surface of the first stopper and the inner side surface of the second stopper are both planar and tangent to the first circumferential line and the second circumferential line, respectively.

10. The polishing pad center calibration jig of claim 8, wherein the first pedestal comprises a first pillar, a bottom end of the first pillar is connected to the side plate, and a top end of the first pillar is connected to the first stopper; the second foot rest comprises a second support column, the bottom end of the second support column is connected with the side plate, and the top end of the second support column is connected with the second stop block.

11. The polishing pad center calibration jig of claim 10, wherein the first support and the second support are parallel.