CN209984951U

CN209984951U - Drying equipment for preparing quantum dot film

Info

Publication number: CN209984951U
Application number: CN201920300083.4U
Authority: CN
Inventors: 程方亮; 葛婕; 史横舟; 王允军
Original assignee: Suzhou Xingshuo Nanotech Co Ltd
Current assignee: Suzhou Xingshuo Nanotech Co Ltd
Priority date: 2019-03-11
Filing date: 2019-03-11
Publication date: 2020-01-24
Anticipated expiration: 2029-03-11

Abstract

The application discloses drying equipment for preparing quantum dot membrane includes: the box body is at least provided with a box door and an air suction hole; the object stage is arranged in the box body and used for supporting the pre-drying substrate; a heating unit which is provided directly below the stage and heats the pre-dried substrate so that a central position of the pre-dried substrate has a temperature higher than a peripheral position. This application is effectual slows down because of when the evacuation, and the air current is inhomogeneous leads to the slower problem of central point department quantum dot solution drying rate on the base plate.

Description

Drying equipment for preparing quantum dot film

Technical Field

The application relates to the field of light-emitting devices, in particular to drying equipment for preparing a quantum dot film.

Background

The quantum dot is a nano material having three-dimensional dimensions within 100 nm, and has excellent electroluminescent properties such as high stability, narrow half-peak width, and the like, and thus is used as a luminescent material of an electroluminescent device.

In the preparation of the quantum dot light film in the substrate, the quantum dot film is generally obtained by depositing a quantum dot solution in a pixel tank and then removing the solvent by vacuum pumping in a drying apparatus. In the existing common equipment for drying the quantum dot solution, due to the influence of air flow during vacuum pumping, the drying speed of the quantum dot solution at the central position of the substrate is slower than that at the peripheral position, and the drying consistency of the substrate is not facilitated.

SUMMERY OF THE UTILITY MODEL

The application aims to provide a drying device for preparing a quantum dot film, so as to solve the problem that when a substrate is dried, the drying speed of a quantum dot solution at the central position of the substrate is slower than that at the periphery of the substrate.

According to an aspect of the present application, there is provided a drying apparatus for manufacturing a quantum dot film, including: the box body is at least provided with a box door and an air suction hole; the object stage is arranged in the box body and used for supporting the pre-drying substrate; a heating unit which is provided directly below the stage and heats the pre-dried substrate so that a central position of the pre-dried substrate has a temperature higher than a peripheral position.

Optionally, the air exhaust holes are arranged on the side wall of the box body, and the air exhaust holes are arranged substantially symmetrically.

Optionally, the number of the suction holes is 3 to 6.

Optionally, the suction hole is arranged at the bottom or the top of the box body.

Optionally, the heating part is in direct contact with the stage, and the contact area is smaller than the area of the pre-dried substrate.

Alternatively, the heating portion is constituted by a plurality of independent heating members whose heating temperatures can be independently controlled.

Optionally, a temperature control device is further disposed in the drying apparatus.

Optionally, the heating part is an infrared radiation heater or a hot air flow heater.

Optionally, the height of the stage may be adjustable up and down.

Has the advantages that: this application is through setting up heating portion under the objective table for the temperature of base plate central point department is higher than peripheral position department, thereby makes the temperature of the quantum dot solution of base plate center department higher, and the effectual problem that slows down because of when the evacuation, the air current is inhomogeneous to lead to the slower problem of central point department quantum dot solution drying rate on the base plate.

Drawings

FIG. 1 is a schematic view showing the construction of a drying apparatus in an exemplary embodiment;

FIG. 2 is a schematic view showing the construction of a drying apparatus in another exemplary embodiment;

fig. 3 is a schematic view of the structure of a drying apparatus in another exemplary embodiment.

Detailed Description

The technical solutions in the examples of the present application will be described in detail below with reference to the embodiments of the present application. It should be noted that the described embodiments are only some embodiments of the present application, and not all embodiments.

According to some exemplary embodiments of the present application, as shown in fig. 1, there is provided a drying apparatus 100 for preparing a quantum dot film, the drying apparatus 100 including a cabinet 11, the cabinet 11 being provided with at least a cabinet door 12 and a pumping hole 13; a stage 14 provided in the case 11 for supporting the pre-drying substrate 16; a heating part 15, the heating part 15 being disposed directly below the stage 14, and heating the substrate 16 so that a central position thereof has a higher temperature than peripheral positions.

When the heating unit 15 operates, heat is transferred to the substrate 16 through the stage 14. In this application, through with heating portion 15 setting under objective table 14, it is higher to ensure its temperature that is exactly the center department of base plate 16 directly over, and the temperature at base plate 16 edge is lower, then can effectively increase the volatilization velocity of solvent in the quantum dot solution of base plate 16 center department, reduce with base plate 16 edge all around the difference of solvent volatilization velocity.

The heating unit 15 may be fixedly or detachably connected to the stage 14, or may be directly fixed to the bottom of the housing 11.

In one embodiment, continuing with FIG. 1, the extraction holes 13 are preferably disposed on a sidewall of the tank 11, and the extraction holes 13 are disposed substantially symmetrically. The effect of extraction hole 13 is the evacuation hole promptly, when the evacuation, because the extraction hole 13 symmetry sets up, then can increase the homogeneity of air current in the box 1, also can be better the assurance base plate 16 all around position department quantum dot solution solvent volatilize more easily simultaneously. In principle, the more the suction holes 13 are, the more the uniformity of the air flow in the case 11 can be increased, but too many suction holes 13 are disadvantageous for industrial manufacturing, and therefore the number of the suction holes 13 is preferably 3 to 6.

In one embodiment, continuing to refer to fig. 2, the drying apparatus 200 includes a cabinet 21, the cabinet 21 having at least a door 22 and a suction hole 23; a stage 24 provided in the case 21 and supporting the pre-drying substrate 26; the heating unit 25 is provided directly below the stage 24, and the heating unit 25 is provided. The suction hole 23 is preferably provided directly below the tank 21. Of course, the suction hole 23 may be provided above the case 21. Regardless of whether the suction holes 23 are provided above or below the cabinet 21, the solvent evaporation rate at the center of the substrate 24 is slower than that at the periphery.

Continuing with fig. 1, in order to make the temperature higher at the central position of the substrate 16, the heating part 15 is in direct contact with the stage 14, and the contact area is smaller than the area of the substrate 16, so that the defect that the temperature is substantially the same at the central position and the peripheral position of the substrate 16 when the area of the heating part 15 is too large can be effectively avoided.

In another embodiment, see fig. 3, the drying apparatus 300 includes a cabinet 31, and the cabinet 31 is provided with at least a door 32 and a suction hole 33; a stage 34 provided in the case 31 for supporting a pre-drying substrate 36; the heating unit 35 is provided directly below the stage 34, and the heating unit 35 is provided. The heating part 35 is formed of a plurality of independent heating members, as indicated by the heating members 351, 352, and 353 in the drawing, and heating temperatures of the heating members 351, 352, and 353 can be independently controlled. For example, when the substrate 36 is heated, the heating member 352 facing the center of the substrate 36 is heated at a higher temperature than the heating members 351 and 353 located off-center, so that the temperature at the center position on the substrate 36 can be made higher. In order to reach the accuse temperature to different heating members, still contain the temperature regulating device in the drying equipment of this application to carry out temperature rise and cooling according to the dry demand of base plate 36.

In this application, the heating portion 15 may be an infrared radiation heater or a hot air flow heater.

To further optimize the airflow in the enclosure 11, the height of the stage 14 may be adjusted.

Although the present disclosure has been described and illustrated in greater detail by the inventors, it should be understood that modifications and/or alterations to the above-described embodiments, or equivalent substitutions, will be apparent to those skilled in the art without departing from the spirit of the disclosure, and that no limitations to the present disclosure are intended or should be inferred therefrom.

Claims

1. A drying apparatus for preparing a quantum dot film, comprising:

the box body is at least provided with a box door and an air suction hole;

the object stage is arranged in the box body and used for supporting the pre-drying substrate;

a heating unit which is provided directly below the stage and heats the pre-dried substrate so that a central position of the pre-dried substrate has a temperature higher than a peripheral position.

2. The drying apparatus for manufacturing a quantum dot film according to claim 1, wherein the pumping holes are provided on a side wall of the chamber, and the pumping holes are substantially symmetrically provided.

3. The drying apparatus for manufacturing a quantum dot film according to claim 2, wherein the number of the pumping holes is 3 to 6.

4. The drying apparatus for manufacturing a quantum dot film according to claim 1, wherein the pumping hole is provided at a bottom or a top of the case.

5. The drying apparatus for manufacturing a quantum dot film according to claim 1, wherein the heating part is in direct contact with the stage, and the contact area is smaller than the area of the pre-dried substrate.

6. The drying apparatus for manufacturing a quantum dot film according to claim 1, wherein the heating part is composed of a plurality of independent heating members whose heating temperatures can be independently controlled.

7. The drying apparatus for preparing quantum dot film according to claim 1, wherein a temperature control device is further disposed in the drying apparatus.

8. The drying apparatus for manufacturing a quantum dot film according to claim 1, wherein the heating part is an infrared radiation heater or a hot air flow heater.

9. The drying apparatus for manufacturing a quantum dot film according to claim 1, wherein the height of the stage is adjustable up and down.