CN209971825U - MWT solar cell mask suitable for Micro-Tec printing - Google Patents

MWT solar cell mask suitable for Micro-Tec printing Download PDF

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Publication number
CN209971825U
CN209971825U CN201822248110.6U CN201822248110U CN209971825U CN 209971825 U CN209971825 U CN 209971825U CN 201822248110 U CN201822248110 U CN 201822248110U CN 209971825 U CN209971825 U CN 209971825U
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China
Prior art keywords
mask
tec
micro
mwt
solar cell
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CN201822248110.6U
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Chinese (zh)
Inventor
黄智�
徐建华
李质磊
路忠林
吴仕梁
盛雯婷
张凤鸣
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Wuxi Ritong Photovoltaic Technology Co Ltd
Jiangsu Sunport Power Corp Ltd
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Wuxi Ritong Photovoltaic Technology Co Ltd
Jiangsu Sunport Power Corp Ltd
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    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02PCLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50Manufacturing or production processes characterised by the final manufactured product

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Abstract

The utility model discloses a be fit for MWT solar cell mask of Micro-Tec printing belongs to silicon solar cell technology technical field, can satisfy the location requirement of Micro-Tec printing machine. The utility model discloses the mask circle design of drawing 1 traditional mask circle size unanimity is four summit mask circles and all the other regional mask circle size inconsistent figures, four summit mask circles as the setpoint, the negative pole point that keeps the mask circle to be greater than the MWT battery is in order to satisfy the location requirement of Micro-Tec printing machine, all the other regional mask circle sizes reduce, be less than the negative pole point of MWT battery, reach the quantity that has reduced the mask thick liquids, the required chemical quantity of mask thick liquids has been got rid of to the etching process, whole processing procedure cost has been practiced thrift.

Description

MWT solar cell mask suitable for Micro-Tec printing
Technical Field
The invention belongs to the technical field of silicon solar cell processes, and particularly relates to an MWT solar cell mask suitable for Micro-Tec printing.
Background
Metal wrap through silicon solar cells (MWTs) are receiving increasing attention for their high efficiency, small shading area and better appearance. The MWT silicon solar cell transfers the energy collected from the front side to the back side of the cell through laser drilling so as to reduce the shading area and achieve the purpose of improving the conversion efficiency. Patent CN201410016190.6 provides a low-cost preparation method of MWT, which only adds two processes to the traditional manufacturing process of crystalline silicon battery, namely: a laser drilling process is added before the texturing process, and a hole insulation process is added after diffusion or film coating. The method has simple process and few added equipment, and becomes the only mass production process for producing the MWT battery in the industry at present.
The local contact back Passivation (PERC) solar cell is a high-efficiency solar cell technology newly developed in the last two years, and the core of the technology is that the back light surface of a silicon wafer is covered by an aluminum oxide or silicon oxide film, so that the surface is passivated, the long-wave response is improved, and the conversion efficiency of the cell is improved.
The MWT battery manufacturing process and the conventional battery manufacturing process have no other difference except the requirements of laser drilling and insulation isolation, so that the MWT battery can be compatible with the technologies of black silicon, PERC, HIT, IBC and the like. The patent CN201410016190.6 also provides a preparation process of MWT combined with PERC technology. Patent CN201510612566.4 provides a preparation process of a back passivation film to solve the problem of MWT hole leakage. At present, the black silicon + MWT and MWT + PERC technologies realize mass production.
At present, a Micro-Tec printer adopts an upper exposure positioning mode, and due to the fact that a back coating film of a PERC battery has a plating winding problem, color difference exists in the color of the edge of the back of a silicon wafer, and therefore when the Micro-Tec printer adopts edge alignment, printing offset is easily caused by the contrast difference of the edge. When the Micro-Tec printer is used for preparing the MWT + PERC battery, in order to solve the offset problem, a mask ring is positioned in a positioning mode, the scheme avoids designing and investing an expensive lower exposure table top, but the mask ring is required to be larger than the cathode point of the MWT battery, otherwise, the cathode point cannot be positioned after covering a mask area, and the popularization of a small mask ring technical route is limited.
Disclosure of Invention
The MWT solar cell mask suitable for Micro-Tec printing provided by the invention can meet the positioning requirement of a Micro-Tec printing machine.
In order to achieve the purpose, the invention adopts the following technical scheme:
the mask suitable for the Micro-Tec printed MWT solar cell comprises mask rings with different sizes, wherein the mask rings at four vertexes are different from those in the rest area in size, the mask rings at the four vertexes are used as positioning points, and the mask rings at the four vertexes are larger than negative electrode points of the MWT cell.
In the mask, the size of the mask ring at the four vertexes is 0.5mm-5 mm; the size of the mask ring in the rest area is smaller than the size of the cathode point of the MWT battery, and the size of the mask ring in the rest area is 0.1mm-3 mm.
Has the advantages that: the invention provides an MWT solar cell mask suitable for Micro-Tec printing, wherein a mask ring with the same size as that of a traditional mask ring in figure 1 is designed into a pattern with the sizes of four vertex mask rings and mask rings in other areas being different, the four vertex mask rings are used as positioning points, the mask rings are maintained to be larger than negative points of an MWT cell so as to meet the positioning requirement of a Micro-Tec printing machine, the sizes of the mask rings in the other areas are reduced and smaller than the negative points of the MWT cell, the mask slurry consumption is reduced, the chemical consumption required by removing the mask slurry in an etching process is reduced, and the whole process cost is saved.
Drawings
FIG. 1 is a conventional MWT mask pattern;
fig. 2 is a schematic size diagram of the mask circle of the present invention, in which 1 is the mask circle with four vertices and 2 is the mask circle with the rest area.
Detailed Description
The invention is described in detail below with reference to the following figures and specific examples:
example 1
As shown in fig. 2, the MWT solar cell mask suitable for Micro-Tec printing comprises mask rings with different sizes, the mask rings at four vertexes are different from those at the rest areas in size, the mask rings at four vertexes are used as positioning points, the mask rings at four vertexes are larger than the negative electrode points of the MWT cell, the sizes of the mask rings at four vertexes are changed along with the change of the sizes of the negative electrode points, the mask rings at the rest areas are smaller than the negative electrode points of the MWT cell, and the diameters of the mask rings at four vertexes are set to be 3 mm. The diameter of the mask ring in the rest area is set to be 0.1 mm.
Example 2
As shown in fig. 2, the MWT solar cell mask suitable for Micro-Tec printing comprises mask rings with different sizes, the mask rings at four vertexes are different from those at the rest areas in size, the mask rings at four vertexes are used as positioning points, the mask rings at four vertexes are larger than the negative electrode points of the MWT cell, the sizes of the mask rings at four vertexes are changed along with the change of the sizes of the negative electrode points, the mask rings at the rest areas are smaller than the negative electrode points of the MWT cell, and the diameters of the mask rings at four vertexes are set to be 5 mm. The diameter of the mask ring in the rest area is set to be 3 mm.
Example 3
As shown in fig. 2, the MWT solar cell mask suitable for Micro-Tec printing comprises mask rings with different sizes, the mask rings at four vertexes are different from those at the rest areas in size, the mask rings at four vertexes are used as positioning points, the mask rings at four vertexes are larger than the negative electrode points of the MWT cell, the sizes of the mask rings at four vertexes are changed along with the change of the sizes of the negative electrode points, the mask rings at the rest areas are smaller than the negative electrode points of the MWT cell, and the diameters of the mask rings at four vertexes are set to be 4 mm. The diameter of the mask ring in the rest area is set to be 1.5 mm.
The above embodiments are merely preferred embodiments of the present invention, and not intended to limit the present invention, and those skilled in the art may make various changes or modifications without departing from the spirit and scope of the present invention.

Claims (4)

1. The mask suitable for the Micro-Tec printed MWT solar cell is characterized by comprising mask rings with different sizes, wherein the mask rings at four vertexes are different from those in the rest areas in size, the mask rings at the four vertexes are used as positioning points, and the mask rings at the four vertexes are larger than the negative electrode point of the MWT cell.
2. The mask for Micro-Tec printed MWT solar cells according to claim 1, wherein the four vertices have a mask circle size of 0.5mm to 5 mm.
3. The mask for Micro-Tec printed MWT solar cells according to claim 1, wherein the remaining area mask circle size is smaller than the cathode dots of the MWT cells.
4. The mask for Micro-Tec printed MWT solar cell mask of claim 1 or 3, wherein the remaining area mask circle size is 0.1mm-3 mm.
CN201822248110.6U 2018-12-29 2018-12-29 MWT solar cell mask suitable for Micro-Tec printing Active CN209971825U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
CN201822248110.6U CN209971825U (en) 2018-12-29 2018-12-29 MWT solar cell mask suitable for Micro-Tec printing

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
CN201822248110.6U CN209971825U (en) 2018-12-29 2018-12-29 MWT solar cell mask suitable for Micro-Tec printing

Publications (1)

Publication Number Publication Date
CN209971825U true CN209971825U (en) 2020-01-21

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Family Applications (1)

Application Number Title Priority Date Filing Date
CN201822248110.6U Active CN209971825U (en) 2018-12-29 2018-12-29 MWT solar cell mask suitable for Micro-Tec printing

Country Status (1)

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CN (1) CN209971825U (en)

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