CN209292226U - Invisible film low emissivity glass - Google Patents
Invisible film low emissivity glass Download PDFInfo
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- CN209292226U CN209292226U CN201821698487.5U CN201821698487U CN209292226U CN 209292226 U CN209292226 U CN 209292226U CN 201821698487 U CN201821698487 U CN 201821698487U CN 209292226 U CN209292226 U CN 209292226U
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- dielectric layer
- low emissivity
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- glass
- invisible film
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Abstract
The utility model belongs to coated glass technical field, more particularly to a kind of invisible film low emissivity glass, including glass substrate and Low emissivity invisible film, the Low emissivity invisible film includes base's dielectric layer, the second dielectric layer of base, the second dielectric layer of function silver layer, upper layer dielectric layer and upper layer of sequentially lamination setting, and base's dielectric layer is Nian Jie with the surface of the glass substrate.The invisible film low emissivity glass of the utility model, by the setting of the Low emissivity invisible film of special construction, so that the transmitance on the surface of invisible film low emissivity glass reaches 88%, reflectivity reaches 6%, so that the performance of invisible film low emissivity glass is more excellent.
Description
Technical field
The utility model belongs to coated glass technical field more particularly to a kind of invisible film low emissivity glass.
Background technique
Low radiation coated glass, also known as Low-E glass, be glass surface be coated with multiple layer metal including silver layer or
The membrane system product of other compound compositions.Since silver layer has the characteristic of Low emissivity, low emissivity glass has visible light higher
Transmissivity has very high reflectivity to infrared ray, has good heat-proof quality.
Film layer structure using the Low-E glass of vacuum magnetic-control sputtering method production is usual are as follows: glass substrate/base's dielectric
Layer/base barrier layer/function silver layer/upper blocking layer/upper layer dielectric layer.
Dielectric layer is generally the oxide or nitride, nonmetallic oxide or nitride of metal, such as TiO2、
ZnSnOx、SnO2、ZnO、SiO2、Si3N4Deng.But in the exploitation and production of traditional single silver low radiation film, guarantee high light transmission
While rate, visual effect is often partially blue or partially green.And when selecting high LOW-E product thoroughly, general light transmittance be can only achieve
85% or reflection be higher than the performance of common white glass 8%, limit the use scope of high Low-E product thoroughly, be unfavorable for Low-E product
Popularization.
Utility model content
The purpose of this utility model is to provide a kind of invisible film low emissivity glasses, it is intended to solve low spoke in the prior art
The transmitance for penetrating coated glass is 85% or reflectivity was 8% the technical issues of leading to functional limitation.
A kind of in order to achieve the above purposes, the technical solution adopted by the utility model is: invisible film low emissivity glass, comprising:
Glass substrate；
Low emissivity invisible film, the Low emissivity invisible film include base's dielectric layer of sequentially lamination setting, base second
Dielectric layer, the second dielectric layer of function silver layer, upper layer dielectric layer and upper layer, base's dielectric layer and the glass base
The surface of plate is bonded.
Optionally, the Low emissivity invisible film is arranged by sequentially lamination base's dielectric layer, the base second
Dielectric layer, the function silver layer, the upper layer dielectric layer and the second dielectric layer of upper layer composition.
Optionally, base's dielectric layer be TZO layers, base's dielectric layer with a thickness of 35nm~40nm.
Optionally, second dielectric layer of base be AZO layers, second dielectric layer of base with a thickness of 120nm
~130nm.
Optionally, the function silver layer with a thickness of 8nm~10nm.
Optionally, the upper layer dielectric layer be AZO layers, the upper layer dielectric layer with a thickness of 15nm~20nm.
Optionally, second dielectric layer of upper layer is TiZrOxLayer, second dielectric layer of upper layer with a thickness of
15nm~20nm.
Optionally, the Low emissivity invisible film is deposited on the surface of the glass substrate by way of magnetron sputtering.
Optionally, the glass substrate is the white glass basis plate of float glass process or ultrawhite glass original plate base.
Optionally, the transmitance of the invisible film low emissivity glass is 88%, reflectivity 6%.
The utility model has the beneficial effects that the invisible film low emissivity glass of the utility model, base's dielectric layer play company
The effect of glass substrate and base's second layer dielectric layer is connect, so as to ensure between Low emissivity invisible film and glass substrate
Adhesive property is good, and alleviates the internal stress of entire Low emissivity invisible film.The second dielectric layer of base is played to function silver layer
Protective effect makes glass present colorless and transparent and reduce reflecting effect simultaneously, and enhances and connecting with the effective of base dielectric layer
It connects.Function silver layer can make the performance of glass more superior, and radiance is lower, and heat insulation effect is more preferable.Upper layer dielectric layer rises
Make glass present colorless and transparent and reduce reflecting effect simultaneously to the protective effect to function silver layer, and enhances and upper layer second
Effective connection of dielectric layer.The second dielectric layer of upper layer is used to improve the scratch resistance of glass, and wear-resisting and corrosion resistance is realized
It can tempering and strange land machining function.
Detailed description of the invention
It, below will be to embodiment or the prior art in order to illustrate more clearly of the technical scheme in the embodiment of the utility model
Attached drawing needed in description is briefly described, it should be apparent that, the accompanying drawings in the following description is only that this is practical new
Some embodiments of type for those of ordinary skill in the art without any creative labor, can be with
It obtains other drawings based on these drawings.
Fig. 1 is the Section View of invisible film low emissivity glass provided by the embodiment of the utility model.
Wherein, each appended drawing reference in figure:
10-21-base of glass substrate 20-Low emissivity invisible film dielectric layers
22-24-upper layer of base's the second dielectric layer 23-function silver layer dielectric layers
25-the second dielectric layers of upper layer.
Specific embodiment
The embodiments of the present invention are described below in detail, examples of the embodiments are shown in the accompanying drawings, wherein from beginning
Same or similar element or element with the same or similar functions are indicated to same or similar label eventually.Below by ginseng
The embodiment for examining attached drawing description is exemplary, it is intended to for explaining the utility model, and should not be understood as to the utility model
Limitation.
In the description of the present invention, it should be understood that term " length ", " width ", "upper", "lower", " preceding ",
The orientation or positional relationship of the instructions such as " rear ", "left", "right", "vertical", "horizontal", "top", "bottom" "inner", "outside" is based on attached
Orientation or positional relationship shown in figure, is merely for convenience of describing the present invention and simplifying the description, rather than indication or suggestion
Signified device or element must have a particular orientation, be constructed and operated in a specific orientation, therefore should not be understood as to this
The limitation of utility model.
In addition, term " first ", " second " are used for descriptive purposes only and cannot be understood as indicating or suggesting relative importance
Or implicitly indicate the quantity of indicated technical characteristic.Define " first " as a result, the feature of " second " can be expressed or
Implicitly include one or more of the features.The meaning of " plurality " is two or two in the description of the present invention,
More than, unless otherwise specifically defined.
In the present invention unless specifically defined or limited otherwise, term " installation ", " connected ", " connection ", " Gu
It is fixed " etc. terms shall be understood in a broad sense, for example, it may be being fixedly connected, may be a detachable connection, or integral；It can be
Mechanical connection, is also possible to be electrically connected；It can be directly connected, two can also be can be indirectly connected through an intermediary
The interaction relationship of connection or two elements inside element.It for the ordinary skill in the art, can basis
Concrete condition understands the concrete meaning of above-mentioned term in the present invention.
As shown in Figure 1, a kind of invisible film low emissivity glass provided by the embodiment of the utility model, including 10 He of glass substrate
Low emissivity invisible film 20.The Low emissivity invisible film 20 includes base's dielectric layer 21 of sequentially lamination setting, the second electricity of base
Dielectric layer 22, function silver layer 23, upper layer dielectric layer 24 and the second dielectric layer of upper layer 25, base's dielectric layer 21 and institute
State the surface bonding of glass substrate 10.
The invisible film low emissivity glass of the utility model embodiment, base's dielectric layer 21 play connection 10 He of glass substrate
The effect of base's second layer dielectric layer, so as to ensure the adhesive property between Low emissivity invisible film 20 and glass substrate 10
It is good, and alleviate the internal stress of entire Low emissivity invisible film 20.The second dielectric layer of base 22 plays the guarantor to function silver layer 23
Shield effect makes glass present colorless and transparent and reduce reflecting effect simultaneously, and enhances and connect with the effective of base dielectric layer 21
It connects.Function silver layer 23 can make the performance of glass more superior, and radiance is lower, and heat insulation effect is more preferable.Upper layer dielectric layer
24 play the protective effect to function silver layer 23 and meanwhile make glass present it is colorless and transparent and reduce reflecting effect, and enhance with it is upper
Effective connection of the second dielectric layer 25 of layer.The second dielectric layer of upper layer 25 is used to improve the scratch resistance of glass, wear-resisting and anti-corruption
Corrosion energy, realization can tempering and strange land machining functions.
The invisible film low emissivity glass of the utility model embodiment obtains higher while guaranteeing low radiance
Colorless and transparent effect is presented in light rate and lower reflectivity, film layer, relative to common low radiation coated glass, optimizes
The film material and structure of 23 front and back of function silver layer save more costs, and the processing of batch strange land is more easy, in addition its quality
Stabilization, good visual effect, producing efficiency are high, easy to spread, can by change each film layer the different shading coefficients of thickness acquisition and
The coated glass of the multi items invisible film of radiance, effectively adapts to the different demands in market.
Further, base's dielectric layer 21, the base that the Low emissivity invisible film 20 is arranged by sequentially lamination
25 groups of the second dielectric layer 22 of layer, the function silver layer 23, the upper layer dielectric layer 24 and the second dielectric layer of the upper layer
At.
In the present embodiment, base's dielectric layer 21 is TZO layers, and TZO layers are the zinc-tin oxide under ceramic state.It is preferred that
Ground, base's dielectric layer 21 with a thickness of 35nm~40nm.I.e. the thickness of base's dielectric layer 21 can for 35nm,
36nm, 37nm, 38nm, 39nm or 40nm.
In the present embodiment, second dielectric layer of base 22 is AZO layers, and AZO layers are the zinc oxide aluminum under ceramic state.
Preferably, second dielectric layer of base 22 with a thickness of 120nm~130nm, the i.e. thickness of the second dielectric layer of base 22
It can be 120nm, 122nm, 124nm, 126nm, 128nm or 130nm.
In the present embodiment, the function silver layer 23 with a thickness of 8nm~10nm.The thickness of the i.e. described function silver layer 23 can be with
For 8nm, 9nm or 10nm.
In the present embodiment, the upper layer dielectric layer 24 is AZO layers, and AZO layers are the zinc oxide aluminum under ceramic state.It is preferred that
Ground, the upper layer dielectric layer 24 with a thickness of 15nm~20nm.I.e. the thickness of upper layer dielectric layer 24 can for 15nm,
16nm, 17nm, 18nm, 19nm or 20nm.
In the present embodiment, second dielectric layer of upper layer 25 is TiZrOxLayer, it is preferable that second dielectric of upper layer
Layer 25 with a thickness of 15nm~20nm.I.e. the thickness of the second dielectric layer of upper layer 25 can for 15nm, 16nm, 17nm, 18nm,
19nm or 20nm.
In the present embodiment, the Low emissivity invisible film 20 is deposited on the glass substrate 10 by way of magnetron sputtering
Surface.
In the present embodiment, the glass substrate 10 is the white glass basis plate of float glass process or ultrawhite glass original plate base.
In the present embodiment, the transmitance of the invisible film low emissivity glass is 88%, reflectivity 6%.
Wherein, 20 processing technology of Low emissivity invisible film are as follows:
Base's dielectric layer 21 adds rotating cathode sputtering sedimentation, the power in argon oxygen atmosphere to be using intermediate frequency power supply
20kw~30kw, intermediate frequency power supply frequency are 40kHz~50kHz.
Second dielectric layer of base 22 adds rotating cathode sputtering sedimentation, power in argon oxygen atmosphere using intermediate frequency power supply
For 60kw~80kw, intermediate frequency power supply frequency is 40kHz~50kHz.
The function silver layer 23 adds planar cathode sputtering sedimentation in argon atmosphere, function using direct current or direct current pulse power source
Rate is 5Kw~15kw.
The upper layer dielectric layer 24 adds rotating cathode sputtering sedimentation, the power in argon oxygen atmosphere to be using intermediate frequency power supply
10kw~20kw, intermediate frequency power supply frequency are 40kHz~50kHz.
Second dielectric layer of upper layer 25 adds rotating cathode sputtering sedimentation, power in argon oxygen atmosphere using intermediate frequency power supply
For 50kw~70kw, intermediate frequency power supply frequency is 40kHz~50kHz；
The advantages of invisible film low emissivity glass provided by the utility model, is:
1. base's dielectric layer 21 plays a part of connecting glass and the second dielectric layer of base 22, Low emissivity invisible film 20
Adhesive property is good between glass, and alleviates the internal stress of entire low-radiation film.The second dielectric layer of base 22 and upper layer electricity
Dielectric layer 24 plays the protective effect to silver layer, while making glass that colorless and transparent and reduction reflecting effect, upper layer second be presented
Dielectric layer 25 has good hardness and toughness, the scratch resistance of glass can be improved, wear-resisting and corrosion resistance, realization can steel
Change and strange land machining function.
2. 23 protection of function silver layer processing on, be it is different from other membrane systems, by being replaced with the dielectric layer of metal oxide
The processing of defencive function silver layer 23 is carried out on barrier layer, broken the 85% of common single silver-layer low-radiation glass light transmittance or reflection 8%
Functional limitation, further increase single silver-layer low-radiation glass performance range, the marketing of single silver-layer low-radiation glass played
Bigger progradation, keeps the selection face in market more extensive.
The above is only the preferred embodiment of the utility model only, is not intended to limit the utility model, all at this
Made any modifications, equivalent replacements, and improvements etc., should be included in the utility model within the spirit and principle of utility model
Protection scope within.
Claims (10)
1. a kind of invisible film low emissivity glass, it is characterised in that: include:
Glass substrate；
Low emissivity invisible film, the Low emissivity invisible film include base's dielectric layer of sequentially lamination setting, base the second electricity Jie
Matter layer, the second dielectric layer of function silver layer, upper layer dielectric layer and upper layer, base's dielectric layer and the glass substrate
Surface bonding.
2. invisible film low emissivity glass according to claim 1, it is characterised in that: the Low emissivity invisible film is by sequentially folding
Layer setting base's dielectric layer, the second dielectric layer of the base, the function silver layer, the upper layer dielectric layer and
The second dielectric layer of upper layer composition.
3. invisible film low emissivity glass according to claim 1, it is characterised in that: base's dielectric layer is TZO layers,
Base's dielectric layer with a thickness of 35nm~40nm.
4. invisible film low emissivity glass according to claim 1, it is characterised in that: second dielectric layer of base is
AZO layers, second dielectric layer of base with a thickness of 120nm~130nm.
5. invisible film low emissivity glass according to claim 1, it is characterised in that: the function silver layer with a thickness of 8nm
~10nm.
6. invisible film low emissivity glass according to claim 1, it is characterised in that: the upper layer dielectric layer is AZO layers,
The upper layer dielectric layer with a thickness of 15nm~20nm.
7. invisible film low emissivity glass according to claim 1, it is characterised in that: second dielectric layer of upper layer is
TiZrOxLayer, second dielectric layer of upper layer with a thickness of 15nm~20nm.
8. invisible film low emissivity glass according to claim 1, it is characterised in that: the Low emissivity invisible film passes through magnetic control
The mode of sputtering is deposited on the surface of the glass substrate.
9. described in any item invisible film low emissivity glasses according to claim 1~8, it is characterised in that: the glass substrate is
The white glass basis plate of float glass process or ultrawhite glass original plate base.
10. described in any item invisible film low emissivity glasses according to claim 1~8, it is characterised in that: the low spoke of the invisible film
The transmitance for penetrating glass is 88%, reflectivity 6%.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821698487.5U CN209292226U (en) | 2018-10-18 | 2018-10-18 | Invisible film low emissivity glass |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821698487.5U CN209292226U (en) | 2018-10-18 | 2018-10-18 | Invisible film low emissivity glass |
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| Publication Number | Publication Date |
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| CN209292226U true CN209292226U (en) | 2019-08-23 |
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ID=67646294
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| Application Number | Title | Priority Date | Filing Date |
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| CN201821698487.5U Active CN209292226U (en) | 2018-10-18 | 2018-10-18 | Invisible film low emissivity glass |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113912302A (en) * | 2021-10-18 | 2022-01-11 | 信义玻璃(天津)有限公司 | Coated glass and preparation method thereof |
-
2018
- 2018-10-18 CN CN201821698487.5U patent/CN209292226U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN113912302A (en) * | 2021-10-18 | 2022-01-11 | 信义玻璃(天津)有限公司 | Coated glass and preparation method thereof |
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