CN208969429U - A kind of write-through exposure machine - Google Patents
A kind of write-through exposure machine Download PDFInfo
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- CN208969429U CN208969429U CN201821818338.8U CN201821818338U CN208969429U CN 208969429 U CN208969429 U CN 208969429U CN 201821818338 U CN201821818338 U CN 201821818338U CN 208969429 U CN208969429 U CN 208969429U
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- 239000000758 substrate Substances 0.000 claims abstract description 74
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 23
- 230000033001 locomotion Effects 0.000 claims abstract description 19
- 230000001815 facial effect Effects 0.000 claims description 3
- 239000004579 marble Substances 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 abstract description 3
- 238000000034 method Methods 0.000 description 4
- 238000010586 diagram Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 238000000018 DNA microarray Methods 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000001459 lithography Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Abstract
The utility model provides a kind of write-through exposure machine, the exposure position precision of substrate can be improved, exposure figure is high-quality on the substrate that production obtains, multiaxial motion platform including pedestal and setting on the base, substrate table top is installed on the multiaxial motion platform, substrate is arranged on the substrate table top, the multiaxial motion platform is able to drive substrate and moves in three dimensions, gantry mechanism is provided on the pedestal, exposure system, alignment system is arranged on the gantry mechanism, it is characterized by: substrate table top side is provided with to prospective component, described includes lower sucker camera to prospective component, the camera lens of the lower sucker camera is arranged upward, clear mark layer is provided with above the camera lens of the lower sucker camera, calibration basic point is provided on the clear mark layer, in the camera lens of the lower sucker camera The heart is overlapped with the center of the calibration basic point.
Description
Technical field
The utility model relates to technical field of lithography, specifically a kind of write-through exposure machine.
Background technique
Photoetching technique is for printing the composition with feature on the surface of a substrate.Such substrate may include for manufacturing
Semiconductor devices, a variety of integrated circuits, flat-panel screens (such as liquid crystal display), circuit board, biochip, micromechanics electronics
The substrate of chip, photoelectron circuit chip etc..Direct-write photoetching technology is to substitute the exposures such as traditional mask plate or film egative film
The direct transfer techniques of image have very important effect in semiconductor and PCB production field.Exposure position precision is that client needs
The important indicator asked, then improving positional relationship stated accuracy then becomes most important.
Utility model content
In view of the above-mentioned problems, the utility model provides a kind of write-through exposure machine, the exposure position of substrate can be improved
Precision, exposure figure is high-quality on the substrate produced.
Its technical solution is such that a kind of write-through exposure machine, the multiaxis including pedestal and setting on the base
Motion platform is equipped with substrate table top on the multiaxial motion platform, and substrate is arranged on the substrate table top, the multiaxis fortune
Moving platform is able to drive substrate and moves in three dimensions, and gantry mechanism, exposure system, alignment system are provided on the pedestal
It is arranged on the gantry mechanism, it is characterised in that: substrate table top side is provided with to prospective component, described to prospective component packet
Lower sucker camera is included, the camera lens of the lower sucker camera is arranged upward, is provided with above the camera lens of the lower sucker camera transparent
Mark layer is provided with calibration basic point, the center of the camera lens of the lower sucker camera and the calibration on the clear mark layer
The center of basic point is overlapped.
Further, the multiaxial motion platform includes y-axis moving parts, x-axis moving parts, z-axis moving parts and θ
Axis moving parts, the y-axis moving parts are set on the base, and the x-axis moving parts are arranged on y-axis moving parts, institute
It states z-axis moving parts and the θ axis moving parts is wholely set and is fixed on x-axis moving parts, the substrate table top setting exists
In in the z-axis and θ axis moving parts being wholely set, the X-axis moving parts and the cooperation of y-axis moving parts enable to the base
Pallet face is moved in the plane for being parallel to the pedestal, and the z-axis moving parts enable to the substrate of the substrate table top
The focal plane of exposure and contraposition is moved to, the θ axis moving parts can be realized the rotation of the substrate on the substrate table top.
Further, the exposure system includes exposure cameras, the alignment system include CCD camera, basic lens and
Lighting source.
Further, the clear mark layer is glassy layer.
Further, the pedestal and the gantry mechanism are connected by screw to, and the y-axis moving parts are locked by screw
It is tightened on the pedestal, x-axis moving parts are locked on y-axis moving parts by screw, the z-axis moving parts and the θ
Axis moving parts are locked on x-axis moving parts by screw.
Further, the substrate table top can at least carry a plate base, and the quantity of the alignment system corresponds to institute
State the quantity setting of substrate.
Further, the Substrate table facial plane degree error is less than 100um.
Further, the pedestal is marble pedestal.
Further, the side of the substrate table top is additionally provided with Position Scale, and the substrate passes through the Position Scale
Positioning is placed on the substrate table top.
The write-through exposure machine of the utility model, to prospective component, demarcates basic point by being equipped with to prospective component by setting,
The relative position between the position and exposure cameras and basic lens of exposure cameras, basic lens is determined by demarcating basic point
Relationship, to obtain the positional relationship of the upper datum mark of exposure cameras and substrate, so as to height needed for obtaining exposure machine
The exposure starting point of precision is improved the exposure position precision of substrate, is exposed on the substrate produced by the exposure starting point
Figure it is high-quality.
Detailed description of the invention
Fig. 1 is the structural schematic diagram of the write-through exposure machine of the utility model；
Fig. 2 is the structural schematic diagram to prospective component of the write-through exposure machine of the utility model.
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe, it is clear that the described embodiments are only a part of the embodiments of the utility model, rather than whole
Embodiment.Based on the embodiments of the present invention, those of ordinary skill in the art are without making creative work
Every other embodiment obtained, fall within the protection scope of the utility model.
See Fig. 1, Fig. 2, a kind of write-through exposure machine of the utility model, including pedestal 1 and the multiaxis being set on the base
Motion platform, pedestal are marble pedestal, and multiaxial motion platform includes y-axis moving parts 2, x-axis moving parts 3, z-axis exercise group
Part and θ axis moving parts, y-axis moving parts 2 are arranged on pedestal 1 by screw, and x-axis moving parts 3 are arranged by screw
On y-axis moving parts 2, z-axis moving parts and θ axis moving parts are integrated setting and are fixed by screws in x-axis moving parts 3
On, substrate table top 5 is arranged in in the z-axis and θ axis moving parts 4 being wholely set, and the side of substrate table top 5 is additionally provided with positioning
Scale 10, substrate are placed on substrate table top 5 by the positioning of Position Scale 10, and X-axis moving parts 2 and y-axis moving parts 3 cooperate energy
Enough so that substrate table top 5 moves in the plane for being parallel to pedestal 1, the z-axis moving parts of z-axis and θ axis moving parts 4 can make
Substrate table top 5 substrate motion to exposure and the focal plane aligned, the θ axis moving parts of z-axis and θ axis moving parts 4 can be real
Show the rotation of the substrate on substrate table top 5, gantry mechanism 6, pedestal 1 and gantry mechanism 6 are provided on pedestal 1 and passes through screw company
It connects, exposure system 7, alignment system 8 are arranged on gantry mechanism 6, and exposure system includes exposure cameras, and alignment system includes CCD
Camera, basic lens and lighting source, CCD camera and basic lens are connected by hickey, and lighting source is locked by screw
It is tightened on basic lens, Barebone is locked on gantry by screw, 5 side of substrate table top is provided with to prospective component 9, alignment
Component includes lower sucker camera 91, and the camera lens 92 of lower sucker camera is arranged upward, is provided with above the camera lens 92 of lower sucker camera
Clear mark layer 93 is provided with calibration basic point, the center of the camera lens 92 of lower sucker camera and calibration base on clear mark layer 93
The center of plinth point is overlapped, and in the present embodiment, clear mark layer 93 uses glassy layer.
In the present embodiment, the width direction for the substrate of x-axis being oriented parallel on substrate table top, y-axis are oriented parallel to
The length direction of substrate on substrate table top, x-axis moving parts realize that stepping is mobile in the x-direction with substrate, guarantee camera lens
Exposed width covers the width of substrate, and y-axis is realized with exposure base y direction scanning motion, realizes exposure system exposure length
The length areas of degree covering substrate, z-axis realize that the focal plane that exposure and contraposition are moved to exposure base, θ axis realize exposure base
The rotation in pallet face is realized the corresponding position of graph exposure substrate quickly, in the present embodiment, y-axis moving parts, x-axis movement
Component, z-axis moving parts use straight line mould group, and θ axis moving parts are the turntable structure being driven by motor in straight line mould group.
In addition, the Substrate table facial plane degree error of the write-through exposure machine of the utility model is less than 100um, can at least hold
Carry a plate base, the quantity setting of the quantity counterpart substrate of alignment system.
Using the write-through exposure machine in the above embodiments to carry out the step of demarcating specific as follows:
Step a: by X-axis moving parts and y-axis moving parts cooperative movement the calibration basic point to prospective component is moved
The underface for moving the exposure cameras of exposure system obtains the position of exposure cameras；
Step b: by X-axis moving parts and y-axis moving parts cooperative movement the calibration basic point to prospective component is moved
The underface for moving the basic lens of alignment system obtains the position of basic lens；
Step c: comparing the position of exposure cameras and the position of basic lens, show that exposure cameras is opposite with basic lens
Positional relationship；
Step d: it by X-axis moving parts and y-axis moving parts cooperative movement, is demarcated using the basic lens of alignment system
The datum mark of substrate table top upper substrate, the exposure cameras obtained according to step c the positional relationship opposite with basic lens, thus
The positional relationship of exposure cameras and datum mark out, to obtain exposure starting point needed for exposure system.
Specifically, calibration basic point is the indexing that six mark points on clear mark layer are constituted in the scaling method
The round center of circle, 6 precision can be higher, and 6 lines just constitute equilateral regular hexagon, and the center of circle is exactly in this hexagon
The heart.
Exposure machine first will catch substrate loci with the center of the basic lens of alignment system, move again under photohead and make
For starting point exposure.In the prior art, in Automatic manual transmission error, temperature humidity, under the influence of expanding with heat and contract with cold, to the mark of prospective component
Determine the positional relationship of basic point and the camera lens of lower sucker camera and be not fixed, will affect photohead center and basic lens center
Position precision, thus influence expose starting point position precision；
The write-through exposure machine of the utility model, to prospective component, demarcates basic point by being equipped with to prospective component by setting,
The center of the camera lens of lower sucker camera is overlapped with the center of calibration basic point, determines exposure cameras, benchmark by demarcating basic point
Relative positional relationship between the position and exposure cameras and basic lens of camera lens, to obtain the upper of exposure cameras and substrate
The positional relationship of datum mark demarcate center and the base of basic point after first determining that the position of exposure cameras, lower sucker camera are mobile
Quasi- optical center is overlapped, using the position of the exposure cameras and lower sucker image center known, to obtain basic lens
It is risen so as to obtain high-precision exposure starting point needed for exposure machine by the exposure with the positional relationship of exposure cameras
The exposure position precision of substrate can be improved in initial point, and which reduce position conversions, immediately arrives in exposure cameras and basic lens
The positional relationship of the heart, precision is higher, and the utility model effectively improves exposure on being not apparent from the cost basis for increasing litho machine
Position precision, exposure figure is high-quality on the substrate produced.
It is obvious to a person skilled in the art that the present invention is not limited to the details of the above exemplary embodiments, and
And without departing substantially from the spirit or essential attributes of the utility model, it can realize that this is practical new in other specific forms
Type.Therefore, in all respects, the present embodiments are to be considered as illustrative and not restrictive, this is practical new
The range of type is indicated by the appended claims rather than the foregoing description, it is intended that containing for the equivalent requirements of the claims will be fallen in
All changes in justice and range are embraced therein.It should not treat any reference in the claims as limiting
Related claim.
In addition, it should be understood that although this specification is described in terms of embodiments, but not each embodiment is only wrapped
Containing an independent technical solution, this description of the specification is merely for the sake of clarity, and those skilled in the art should
It considers the specification as a whole, the technical solutions in the various embodiments may also be suitably combined, forms those skilled in the art
The other embodiments being understood that.
Claims (8)
1. a kind of write-through exposure machine, the multiaxial motion platform including pedestal and setting on the base, the multiaxial motion
Substrate table top is installed, substrate is arranged on the substrate table top, and the multiaxial motion platform is able to drive substrate and exists on platform
It is moved in three-dimensional space, gantry mechanism is provided on the pedestal, exposure system, alignment system are arranged in the gantry mechanism
On, it is characterised in that: substrate table top side is provided with to prospective component, and described includes lower sucker camera to prospective component, described
The camera lens of lower sucker camera is arranged upward, is provided with clear mark layer, the transparent mark above the camera lens of the lower sucker camera
Calibration basic point is provided on note layer, the center of the camera lens of the lower sucker camera is overlapped with the center of the calibration basic point.
2. a kind of write-through exposure machine according to claim 1, it is characterised in that: the multiaxial motion platform includes y-axis
Moving parts, x-axis moving parts, z-axis moving parts and θ axis moving parts, the y-axis moving parts are set on the base,
The x-axis moving parts are arranged on y-axis moving parts, and the z-axis moving parts and the θ axis moving parts are wholely set admittedly
It is scheduled on x-axis moving parts, the substrate table top is arranged in in the z-axis and θ axis moving parts being wholely set, and the X-axis is transported
Dynamic component and the cooperation of y-axis moving parts enable to the substrate table top to move in the plane for being parallel to the pedestal, the z
Axis moving parts enable to the substrate motion of the substrate table top to the focal plane of exposure and contraposition, the θ axis moving parts energy
Enough realize the rotation of the substrate on the substrate table top.
3. a kind of write-through exposure machine according to claim 2, it is characterised in that: the exposure system includes exposure mirror
Head, the alignment system include CCD camera, basic lens and lighting source.
4. a kind of write-through exposure machine according to claim 1, it is characterised in that: the clear mark layer is glassy layer.
5. a kind of write-through exposure machine according to claim 3, it is characterised in that: the pedestal and the gantry mechanism are logical
Screw connection is crossed, the y-axis moving parts are locked on the pedestal by screw, and x-axis moving parts are locked to y by screw
On axis moving parts, the z-axis moving parts and the θ axis moving parts are locked on x-axis moving parts by screw, described
CCD camera is connected with the basic lens by hickey, and the lighting source is locked to the basic lens by screw
On, it is described that Barebone is locked on described gantry by screw.
6. a kind of write-through exposure machine according to claim 1, it is characterised in that: the Substrate table facial plane degree error is small
In 100um, the substrate table top can at least carry a plate base, and the quantity of the alignment system corresponds to the number of the substrate
Amount setting.
7. a kind of write-through exposure machine according to claim 1, it is characterised in that: the pedestal is marble pedestal.
8. a kind of write-through exposure machine according to claim 1, it is characterised in that: the side of the substrate table top is also set up
There is Position Scale, the substrate is placed on the substrate table top by Position Scale positioning.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821818338.8U CN208969429U (en) | 2018-11-06 | 2018-11-06 | A kind of write-through exposure machine |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201821818338.8U CN208969429U (en) | 2018-11-06 | 2018-11-06 | A kind of write-through exposure machine |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN208969429U true CN208969429U (en) | 2019-06-11 |
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| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201821818338.8U Active CN208969429U (en) | 2018-11-06 | 2018-11-06 | A kind of write-through exposure machine |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109240047A (en) * | 2018-11-06 | 2019-01-18 | 苏州源卓光电科技有限公司 | A kind of write-through exposure machine and its scaling method |
-
2018
- 2018-11-06 CN CN201821818338.8U patent/CN208969429U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109240047A (en) * | 2018-11-06 | 2019-01-18 | 苏州源卓光电科技有限公司 | A kind of write-through exposure machine and its scaling method |
| CN109240047B (en) * | 2018-11-06 | 2023-11-21 | 苏州源卓光电科技有限公司 | Direct-writing type exposure machine and calibration method thereof |
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| Date | Code | Title | Description |
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 215000 Room 102, building C5, Ting LAN lane, Suzhou Industrial Park, Jiangsu, China, 192 Patentee after: Yuanzhuo Micro Nano Technology (Suzhou) Co.,Ltd. Address before: 215000 Room 102, building C5, Ting LAN lane, Suzhou Industrial Park, Jiangsu, China, 192 Patentee before: ADVANCED MICRO OPTICS.INC |
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| CP01 | Change in the name or title of a patent holder |