CN209433438U - A kind of caliberating device of the exposure cameras for direct-write type lithography machine - Google Patents
A kind of caliberating device of the exposure cameras for direct-write type lithography machine Download PDFInfo
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- CN209433438U CN209433438U CN201822228968.6U CN201822228968U CN209433438U CN 209433438 U CN209433438 U CN 209433438U CN 201822228968 U CN201822228968 U CN 201822228968U CN 209433438 U CN209433438 U CN 209433438U
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- 238000001459 lithography Methods 0.000 title claims abstract description 21
- NJPPVKZQTLUDBO-UHFFFAOYSA-N novaluron Chemical compound C1=C(Cl)C(OC(F)(F)C(OC(F)(F)F)F)=CC=C1NC(=O)NC(=O)C1=C(F)C=CC=C1F NJPPVKZQTLUDBO-UHFFFAOYSA-N 0.000 claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 29
- 239000004579 marble Substances 0.000 claims description 3
- 230000000737 periodic effect Effects 0.000 abstract description 2
- 238000000034 method Methods 0.000 description 3
- 230000000153 supplemental effect Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 238000001259 photo etching Methods 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- FGUUSXIOTUKUDN-IBGZPJMESA-N C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 Chemical compound C1(=CC=CC=C1)N1C2=C(NC([C@H](C1)NC=1OC(=NN=1)C1=CC=CC=C1)=O)C=CC=C2 FGUUSXIOTUKUDN-IBGZPJMESA-N 0.000 description 1
- 238000000018 DNA microarray Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
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Abstract
The utility model provides a kind of caliberating device of exposure cameras for direct-write type lithography machine, it can be calibrated quickly the parameter of each exposure cameras, facilitate the periodic calibrating of lens parameters, including pedestal and triaxial movement platform, substrate table top is installed on triaxial movement platform, it is additionally provided with above substrate table top to Barebone and exposure system, exposure system includes several exposure cameras being intervally arranged being arranged along the x-axis direction, the side that substrate table top is parallel to x-axis is provided with straight line mould group, straight line mould group is parallel to x-axis setting, straight line mould group is connected with driving motor, sliding block is provided in straight line mould group, calibration for cameras is installed on sliding block, the camera lens of calibration for cameras is arranged towards exposure cameras upward, for being demarcated to exposure cameras, y-axis moving parts, the cooperation of straight line mould group enables to calibration for cameras being parallel to pedestal It is moved in plane, z-axis moving parts enable to calibration for cameras to be moved to calibration desired position.
Description
Technical field
The utility model relates to technical field of lithography, and in particular to a kind of mark of the exposure cameras for direct-write type lithography machine
Determine device.
Background technique
Photoetching technique is for printing the composition with feature on the surface of a substrate.Such substrate may include for manufacturing
Semiconductor devices, a variety of integrated circuits, flat-panel screens (such as liquid crystal display), circuit board, biochip, micromechanics electronics
The substrate of chip, photoelectron circuit chip etc..Direct-write photoetching technology is to substitute the exposures such as traditional mask plate or film egative film
The direct transfer techniques of image have very important effect in semiconductor and PCB production field.
Camera lens precision is to influence an important indicator of exposure quality, so guaranteeing the reliability of camera lens precision to Guan Chong
It wants, after litho machine needs periodically to carry out parameter calibration to exposure cameras, it is ensured that the precision of camera lens, lacking in the prior art can be right
The device of exposure cameras progress Fast Calibration.
Utility model content
In view of the above-mentioned problems, the utility model provides a kind of calibration dress of exposure cameras for direct-write type lithography machine
It sets, can be calibrated quickly the parameter of each exposure cameras, facilitate the periodic calibrating of lens parameters, guarantee the steady of base plate exposure precision
It is qualitative, effectively improve exposure quality.
Its technical solution is such that a kind of caliberating device of exposure cameras for direct-write type lithography machine, including pedestal
With setting triaxial movement platform on the base, the triaxial movement platform include y-axis moving parts, x-axis moving parts,
Z-axis moving parts are equipped with substrate table top on the triaxial movement platform, and pcb board is arranged on the substrate table top, the base
Be additionally provided with above pallet face to Barebone and exposure system, the exposure system include it is several be arranged along the x-axis direction between
Every the exposure cameras of arrangement, it is characterised in that: the side that the substrate table top is parallel to x-axis is provided with straight line mould group, it is described
Straight line mould group is parallel to x-axis setting, and the straight line mould group is connected with driving motor, and setting can be along described in the straight line mould group
Straight line mould group mobile sliding block is equipped with calibration for cameras on the sliding block, and the camera lens of the calibration for cameras is upward towards the exposure
The setting of light microscopic head, for demarcating to the exposure cameras, the y-axis moving parts, straight line mould group cooperation can make
It obtains the calibration for cameras to move in the plane for being parallel to the pedestal, the z-axis moving parts enable to the calibration phase
Machine is moved to calibration desired position.
Further, the y-axis moving parts are set on the base, and the x-axis moving parts are arranged in y-axis moving parts
On, the z-axis moving parts are fixed on x-axis moving parts, and the substrate table top is arranged on the z-axis moving parts, institute
It states X-axis moving parts and the cooperation of y-axis moving parts enables to the substrate table top to move in the plane for being parallel to the pedestal
Dynamic, the z-axis moving parts enable to the substrate motion of the substrate table top to the focal plane of exposure and contraposition.
Further, the pedestal is marble pedestal.
Further, described includes CCD camera, basic lens and lighting source to Barebone.
Further, described that Barebone and exposure system are arranged on the gantry for being mounted on the pedestal.
Further, the straight line mould group includes ball screw and is parallel to ball screw setting guide rail, the cunning
Block and the guide rail, which are slidably matched and are equipped with, cooperates feed screw nut with the ball screw.
Further, the width direction setting for being oriented parallel to the pedestal of the x-axis, the y-axis are oriented parallel to
The length direction of the pedestal is arranged, and the z-axis direction is arranged perpendicular to plane where the pedestal.
Further, in the sliding block mounting hole of the calibration for cameras setting on the slide block.
The caliberating device of the exposure cameras for direct-write type lithography machine of the utility model, by designing independent straight line mould
Group, cooperates y-axis moving parts and z-axis moving parts in triaxial movement platform, and straight line mould group is equipped with moveable calibration phase
Machine, y-axis moving parts, the cooperation of straight line mould group enable to calibration for cameras to move in the plane for being parallel to pedestal, z-axis exercise group
Part enables to calibration for cameras to be moved to calibration desired position, specifies below each camera lens hereby it is achieved that camera can reach
Position, realize each camera lens of camera calibration demand, open camera receive camera lens sending different graphic, obtain camera lens focal plane,
The supplemental characteristics such as angle, multiplying power;The caliberating device of the exposure cameras for direct-write type lithography machine of the utility model uses straight line
The mode of mould group one camera calibration a plurality of lenses of driving, comparison and other products in the market, one camera of each camera lens collocation,
Increase the utilization rate of camera.Single camera calibration a plurality of lenses, also eliminate the error of different cameral itself, improve camera lens
The accuracy of parameter calibration.
Detailed description of the invention
Fig. 1 is the schematic diagram of the caliberating device of the exposure cameras for direct-write type lithography machine of the utility model;
Fig. 2 is the schematic diagram of the straight line mould group of the utility model;
Specific embodiment
The following will be combined with the drawings in the embodiments of the present invention, carries out the technical scheme in the embodiment of the utility model
Clearly and completely describe.
See figure, Fig. 2, a kind of caliberating device of the exposure cameras for direct-write type lithography machine, including pedestal 1 and is arranged the bottom of at
Triaxial movement platform on seat 1, pedestal 1 are marble pedestal, and triaxial movement platform includes y-axis moving parts 2, x-axis exercise group
Part 3, z-axis moving parts 4 are equipped with substrate table top 5 on triaxial movement platform, and pcb board is arranged on substrate table top 5, Substrate table
The top in face 5 is additionally provided with to Barebone and exposure system, is included CCD camera, basic lens and lighting source to Barebone, is exposed
Photosystem includes several exposure cameras being intervally arranged being arranged along the x-axis direction, and in the present embodiment, x-axis is oriented parallel to
The width direction of pedestal 1 is arranged, and y-axis is oriented parallel to the length direction setting of pedestal 1, and z-axis direction is put down perpendicular to where pedestal 1
Face setting;Y-axis moving parts 2 are arranged on pedestal 1, and x-axis moving parts 3 are arranged on y-axis moving parts 2, z-axis moving parts
4 are fixed on x-axis moving parts 3, and substrate table top 5 is arranged on z-axis moving parts 4, X-axis moving parts 4 and y-axis moving parts
2 cooperations enable to substrate table top 5 to move in the plane for being parallel to pedestal 1, and z-axis moving parts 4 enable to substrate table top 5
Substrate motion to exposure and contraposition focal plane;
The side that substrate table top 5 is parallel to x-axis is provided with straight line mould group 6, straight line mould group 6 is parallel to x-axis setting, straight line
Mould group 6 is connected with driving motor 7, and driving motor 7 is servo motor, and setting can be moved along straight line mould group 6 in straight line mould group 6
Sliding block 8, straight line mould group 6 include ball screw and are parallel to ball screw setting guide rail, and sliding block 8 is slidably matched and is equipped with guide rail
Cooperate feed screw nut with ball screw, calibration for cameras is arranged in the sliding block mounting hole 9 on sliding block 8, and calibration is equipped on sliding block 8
Camera, the camera lens of calibration for cameras is arranged towards exposure cameras upward, for being demarcated to exposure cameras, y-axis moving parts 2,
The cooperation of straight line mould group 6 enables to calibration for cameras to move in the plane for being parallel to pedestal 1, and z-axis moving parts 4 enable to mark
Determine camera and is moved to calibration desired position.
The following specifically describes the worked of the caliberating device of the exposure cameras for direct-write type lithography machine of the utility model
Journey:
Step a: specified coordinate is moved in x-axis direction by linear module drive calibration for cameras;
Step b: drive calibration for cameras to specified coordinate by the y-axis moving parts of triaxial movement platform;
Step c: comparing the position of exposure cameras and the position of basic lens, show that exposure cameras is opposite with basic lens
Positional relationship;
Step d: drive calibration for cameras to specified coordinate by the z-axis moving parts of triaxial movement platform;
Step e: open calibration for cameras receive exposure cameras sending different graphic, obtain exposure cameras focal plane, angle, times
The supplemental characteristics such as rate;
Step f: repeating the above steps, and demarcates the parameter of other exposure cameras.
The caliberating device of the exposure cameras for direct-write type lithography machine of the utility model, by designing independent straight line mould
Group, cooperates y-axis moving parts and z-axis moving parts in triaxial movement platform, and straight line mould group is equipped with moveable calibration phase
Machine, y-axis moving parts, the cooperation of straight line mould group enable to calibration for cameras to move in the plane for being parallel to pedestal, z-axis exercise group
Part enables to calibration for cameras to be moved to calibration desired position, specifies below each camera lens hereby it is achieved that camera can reach
Position, realize each camera lens of camera calibration demand, open camera receive camera lens sending different graphic, obtain camera lens focal plane,
The supplemental characteristics such as angle, multiplying power;The caliberating device of the exposure cameras for direct-write type lithography machine of the utility model uses straight line
The mode of mould group one camera calibration a plurality of lenses of driving, comparison and other products in the market, one camera of each camera lens collocation,
Increase the utilization rate of camera.Single camera calibration a plurality of lenses, also eliminate the error of different cameral itself, improve camera lens
The accuracy of parameter calibration.
It is obvious to a person skilled in the art that the present invention is not limited to the details of the above exemplary embodiments, and
And without departing substantially from the spirit or essential attributes of the utility model, it can realize that this is practical new in other specific forms
Type.Therefore, in all respects, the present embodiments are to be considered as illustrative and not restrictive, this is practical new
The range of type is indicated by the appended claims rather than the foregoing description, it is intended that containing for the equivalent requirements of the claims will be fallen in
All changes in justice and range are embraced therein.It should not treat any reference in the claims as limiting
Related claim.
Claims (7)
1. a kind of caliberating device of the exposure cameras for direct-write type lithography machine, including pedestal and setting on the base three
Axis motion platform, the triaxial movement platform include y-axis moving parts, x-axis moving parts, z-axis moving parts, the three axis fortune
Substrate table top is installed, pcb board is arranged on the substrate table top, is additionally provided with above the substrate table top pair on moving platform
Barebone and exposure system, the exposure system include several exposure cameras being intervally arranged being arranged along the x-axis direction, feature
It is: the side that the substrate table top is parallel to x-axis is provided with straight line mould group, the straight line mould group is parallel to x-axis setting, institute
It states straight line mould group and is connected with driving motor, the sliding block that can be moved along the straight line mould group is set in the straight line mould group, it is described
Calibration for cameras is installed, the camera lens of the calibration for cameras is arranged towards the exposure cameras upward, for the exposure on sliding block
Light microscopic head is demarcated, and the y-axis moving parts, straight line mould group cooperation enable to the calibration for cameras being parallel to
It states in the plane of pedestal and moves, the z-axis exercise group enables to the calibration for cameras to be moved to calibration desired position.
2. a kind of caliberating device of exposure cameras for direct-write type lithography machine according to claim 1, it is characterised in that:
The y-axis moving parts are set on the base, and the x-axis moving parts are arranged on y-axis moving parts, the z-axis exercise group
Part is fixed on x-axis moving parts, and the substrate table top is arranged on the z-axis moving parts, the X-axis moving parts and y
The cooperation of axis moving parts enables to the substrate table top to move in the plane for being parallel to the pedestal, the z-axis exercise group
Part enables to the substrate motion of the substrate table top to the focal plane of exposure and contraposition.
3. a kind of caliberating device of exposure cameras for direct-write type lithography machine according to claim 1, it is characterised in that:
The pedestal is marble pedestal.
4. a kind of caliberating device of exposure cameras for direct-write type lithography machine according to claim 1, it is characterised in that:
Described includes CCD camera, basic lens and lighting source to Barebone.
5. a kind of caliberating device of exposure cameras for direct-write type lithography machine according to claim 1, it is characterised in that:
It is described that Barebone and exposure system are arranged on the gantry for being mounted on the pedestal.
6. a kind of caliberating device of exposure cameras for direct-write type lithography machine according to claim 1, it is characterised in that:
The straight line mould group includes ball screw and is parallel to the ball screw setting guide rail, and the sliding block is matched with guide rail sliding
It closes and is equipped with and cooperate feed screw nut with the ball screw.
7. a kind of caliberating device of exposure cameras for direct-write type lithography machine according to claim 1, it is characterised in that:
The width direction setting for being oriented parallel to the pedestal of the x-axis, the y-axis are oriented parallel to the length direction of the pedestal
Setting, the z-axis direction are arranged perpendicular to plane where the pedestal.
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CN201822228968.6U CN209433438U (en) | 2018-12-28 | 2018-12-28 | A kind of caliberating device of the exposure cameras for direct-write type lithography machine |
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CN201822228968.6U CN209433438U (en) | 2018-12-28 | 2018-12-28 | A kind of caliberating device of the exposure cameras for direct-write type lithography machine |
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Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111223151A (en) * | 2020-03-06 | 2020-06-02 | 泉州华中科技大学智能制造研究院 | Calibration device and calibration method for structured light three-dimensional scanning camera |
CN111399166A (en) * | 2020-06-05 | 2020-07-10 | 苏州微影激光技术有限公司 | Pre-adjustment apparatus, pre-adjustment method, and exposure apparatus assembly method |
CN112198769A (en) * | 2020-10-27 | 2021-01-08 | 广东莱宝智能装备股份有限公司 | Parallel light source non-contact single-side automatic photoetching machine |
-
2018
- 2018-12-28 CN CN201822228968.6U patent/CN209433438U/en active Active
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN111223151A (en) * | 2020-03-06 | 2020-06-02 | 泉州华中科技大学智能制造研究院 | Calibration device and calibration method for structured light three-dimensional scanning camera |
CN111223151B (en) * | 2020-03-06 | 2024-04-12 | 泉州华中科技大学智能制造研究院 | Calibrating device and calibrating method for structured light three-dimensional scanning camera |
CN111399166A (en) * | 2020-06-05 | 2020-07-10 | 苏州微影激光技术有限公司 | Pre-adjustment apparatus, pre-adjustment method, and exposure apparatus assembly method |
CN111399166B (en) * | 2020-06-05 | 2020-09-08 | 苏州微影激光技术有限公司 | Pre-adjustment apparatus, pre-adjustment method, and exposure apparatus assembly method |
CN112198769A (en) * | 2020-10-27 | 2021-01-08 | 广东莱宝智能装备股份有限公司 | Parallel light source non-contact single-side automatic photoetching machine |
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Address after: 215000 Room 102, building C5, Ting LAN lane, Suzhou Industrial Park, Jiangsu, China, 192 Patentee after: Yuanzhuo Micro Nano Technology (Suzhou) Co.,Ltd. Address before: 215000 Room 102, building C5, Ting LAN lane, Suzhou Industrial Park, Jiangsu, China, 192 Patentee before: ADVANCED MICRO OPTICS.INC |
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