CN207121657U - A kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace - Google Patents
A kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace Download PDFInfo
- Publication number
- CN207121657U CN207121657U CN201720902383.0U CN201720902383U CN207121657U CN 207121657 U CN207121657 U CN 207121657U CN 201720902383 U CN201720902383 U CN 201720902383U CN 207121657 U CN207121657 U CN 207121657U
- Authority
- CN
- China
- Prior art keywords
- diffusion furnace
- quartz
- quartzy
- quartzy diffusion
- furnace
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
A kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace,Quartz boat is used to carry photovoltaic silicon wafer,Quartz furnace door is arranged on the head of quartzy diffusion furnace,Sealing function is played for quartzy diffusion furnace,Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side,Play heat-blocking action,Shower is located at quartzy diffusion furnace internal upper part,For being passed through spray protective gas POCl3,Baffle plate is arranged between shower and heat-preserving container with the mode of hook,For stopping quartzy diffusion furnace internal gas flow,The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace,For being passed through oxygen,Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace,Waste pipe is used to discharge waste liquid,TC is managed for placing thermocouple,The SiC oars of the quartzy diffusion furnace are used to be loaded into or set out quartzy diffusion furnace by quartz boat,The section of the SiC oars is rendered as recessed circular arc,SiC oar rim surfaces positioned at circular arc both ends are semi-cylindrical forms.
Description
Technical field
The utility model belongs to field of semiconductor fabrication processes, more particularly to a kind of for photovoltaic silicon wafer quartz diffusion furnace
SiC oars.
Background technology
Application No. CN201521039652.2 patent document, mention " in crystal silicon solar energy battery manufacturing process,
Silicon chip diffusion technique is that silicon chip is put into high temperature dispersing furnace, passes to the gases such as nitrogen, oxygen and POCl3, sends out at high temperature
It is biochemical to react and form PN junction in silicon chip surface after spreading.Specifically, first silicon chip is inserted on quartz boat, then by quartz
Boat is put into high temperature dispersing furnace (being typically exactly diffusion quartz tube), is passed through the gas containing diffusion source, is spread under the high temperature conditions
Source reacts with silicon chip, realizes diffusion process so as to form PN junction.”
This document disclose " a kind of solar silicon wafers disperser, including quartz boat, between quartz boat and air inlet
Air-flow aggregating apparatus, multiple quartzy bar construction supporting constructions of the quartz boat by two supporting plates and between supporting plate, and
Multiple cuttings for being used to place silicon chip are provided with quartz pushrod, it is characterised in that：Quartz pushrod uses hollow type structure, is opened in supporting plate
There are multiple through holes communicated with each quartz pushrod；Air dispelling hole, and air dispelling hole and stone are also provided with quartz pushrod between adjacent cutting
English rod penetrates；Air-flow aggregating apparatus is a baffle-type structure with hole of confluxing, and hole exits end of confluxing supports towards quartz boat
The projection of through hole is respectively positioned in the port of export in hole of confluxing on plate ".
The purpose of above-mentioned technical proposal is " first, the air-flow aggregating apparatus air-flow in hole of being confluxed by band, makes air-flow fast
In the quartz pushrod that speed is flowed on quartz boat and silicon chip is blowed at air dispelling hole, effectively increases the utilization rate in diffusion source, can also
Further increase transmission range, so as to improve the yield of single stove diffusion, reduce production cost；Second, by hollow quartz pushrod and open
The air dispelling hole being located on quartz pushrod, the area of space that diffusion source is abundant and is evenly distributed between silicon chip can be carried significantly
High silicon chip diffusion uniformity, so as to improve conversion efficiency of solar cell, while the utilization in diffusion source is also substantially increased, saved
About production cost；Third, can be distributed by position of opening of the air dispelling hole on quartz pushrod, to control the direction of air-flow, make expansion
Dissipate source air-flow to be more evenly distributed in the range of silicon chip place, flexibly set according to production requirement, practical ".It is however, real
In trampling, when this quartzy diffusion furnace works, the problem of confluxing except considering air-flow, it is also contemplated that other factors, such as quartz expand
The problem of SiC oars of scattered stove easily crumble.
Utility model content
The utility model provides a kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace, to solve quartzy diffusion furnace SiC
The problem of oar easily crumbles.
A kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace, quartzy diffusion furnace include shower, quartz boat, baffle plate, guarantor
Wen Tong, Quartz furnace door, waste pipe and TC pipes,
Quartz boat is used to carry photovoltaic silicon wafer,
Quartz furnace door is arranged on the head of quartzy diffusion furnace, and sealing function is played for quartzy diffusion furnace,
Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action,
Shower is located at quartzy diffusion furnace internal upper part, for being passed through spray protective gas POCl3,
Baffle plate is arranged between shower and heat-preserving container with the mode of hook, for stopping quartzy diffusion furnace internal gas flow,
The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace, for being passed through oxygen,
Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC is managed for placing
Thermocouple,
The SiC oars of the quartzy diffusion furnace are used to be loaded into or set out quartzy diffusion furnace, the section of the SiC oars by quartz boat
Recessed circular arc is rendered as, the SiC oar rim surfaces positioned at circular arc both ends are semi-cylindrical forms.
TC pipes are temperature tube, and TC is English thermocouple abbreviation.
The utility model is directed to existing photovoltaic silicon wafer quartz diffusion furnace, SiC oars and the quartz boat being placed on SiC oars,
Due to being to contact firmly, it is easy to cause chipping.Quartz boat may be contacted edge placement by original by the utility model with SiC oars
Right angle is changed to arc chord angle, greatly reduces the breakage of this contact position.
Brief description of the drawings
Detailed description below is read by reference to accompanying drawing, the utility model illustrative embodiments above-mentioned and other
Objects, features and advantages will become prone to understand.In the accompanying drawings, show that this practicality is new by way of example, and not by way of limitation
Some embodiments of type, wherein：
Fig. 1 is the utility model quartz diffusion-furnace structure schematic side view.
The SiC oar cross sectional shape schematic diagrames of the existing quartzy diffusion furnaces of Fig. 2.
Fig. 3 is the SiC oar cross sectional shape schematic diagrames of the utility model quartz diffusion furnace.
1 --- shower, 2 --- quartz boat, 3 --- baffle plate, 4 --- heat-preserving container, 5 --- Quartz furnace door, 6 --- air inlet
Mouthful, 7 --- waste pipe, 8 --- TC is managed, and 9 --- SiC oars.
Embodiment
As shown in figure 1, a kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace, quartzy diffusion furnace includes shower, quartz
Boat, baffle plate, heat-preserving container, Quartz furnace door, waste pipe and TC pipes.
Quartz boat is used to carry photovoltaic silicon wafer.Quartz furnace door is arranged on the head of quartzy diffusion furnace, for quartzy diffusion furnace
Play sealing function.Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action.Shower is located at stone
English diffusion furnace internal upper part, for being passed through spray protective gas POCl3.Baffle plate is arranged on shower and guarantor with the mode of hook
Between warm bucket, for stopping quartzy diffusion furnace internal gas flow.The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace,
For being passed through oxygen.Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC, which is managed, to be used for
Place thermocouple.
The SiC oars of the quartzy diffusion furnace are used to be loaded into or set out quartzy diffusion furnace, the section of the SiC oars by quartz boat
Recessed circular arc is rendered as, the SiC oar rim surfaces positioned at circular arc both ends are semi-cylindrical forms.
What deserves to be explained is created although foregoing teachings describe the utility model by reference to some embodiments
Spirit and principle, it should be appreciated that, the utility model is not limited to disclosed embodiment, and each side is drawn
Divide and also do not mean that the feature in these aspects can not combine, this division is merely to the convenience of statement.The utility model purport
Covering various modifications included in spirit and scope of the appended claims and equivalent arrangements.
Claims (1)
1. a kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace, it is characterised in that quartzy diffusion furnace includes shower, quartz
Boat, baffle plate, heat-preserving container, Quartz furnace door, waste pipe and TC pipes,
Quartz boat is used to carry photovoltaic silicon wafer,
Quartz furnace door is arranged on the head of quartzy diffusion furnace, and sealing function is played for quartzy diffusion furnace,
Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action,
Shower is located at quartzy diffusion furnace internal upper part, for being passed through spray protective gas POCl3,
Baffle plate is arranged between shower and heat-preserving container with the mode of hook, for stopping quartzy diffusion furnace internal gas flow,
The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace, for being passed through oxygen,
Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC is managed for placing thermoelectricity
It is even,
The SiC oars of the quartzy diffusion furnace are used to be loaded into or set out quartzy diffusion furnace by quartz boat, and the section of the SiC oars is presented
For recessed circular arc, the SiC oar rim surfaces positioned at circular arc both ends are semi-cylindrical forms.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720902383.0U CN207121657U (en) | 2017-07-24 | 2017-07-24 | A kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720902383.0U CN207121657U (en) | 2017-07-24 | 2017-07-24 | A kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207121657U true CN207121657U (en) | 2018-03-20 |
Family
ID=61612857
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720902383.0U Active CN207121657U (en) | 2017-07-24 | 2017-07-24 | A kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207121657U (en) |
-
2017
- 2017-07-24 CN CN201720902383.0U patent/CN207121657U/en active Active
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN207097785U (en) | It is a kind of to seal the uniform spray photovoltaic silicon wafer quartz diffusion furnace strengthened | |
| CN102427971B (en) | High efficiency epitaxial chemical vapor deposition (cvd) reactor | |
| CN207165529U (en) | A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread | |
| CN102953767A (en) | High-temperature turbine blade-cooling system | |
| CN207121657U (en) | A kind of SiC oars for photovoltaic silicon wafer quartz diffusion furnace | |
| CN203871351U (en) | Structure capable of diffusing reaction gas of boron diffusion furnace uniformly | |
| CN207091559U (en) | A kind of photovoltaic silicon wafer quartz diffusion furnace of heat-insulated reinforcement | |
| CN207091560U (en) | A kind of photovoltaic silicon wafer quartz diffusion furnace with more temperature measuring areas | |
| CN207091552U (en) | A kind of more temperature measuring areas are heat-insulated to strengthen photovoltaic silicon wafer quartz diffusion furnace | |
| CN203049077U (en) | Circumference radial-type heat exchange platform for polycrystalline silicon ingot furnace | |
| CN207134329U (en) | A kind of photovoltaic silicon wafer quartz diffusion furnace system | |
| CN207109152U (en) | It is a kind of to seal the photovoltaic silicon wafer quartz diffusion furnace strengthened | |
| CN207091558U (en) | A kind of photovoltaic silicon wafer quartz diffusion furnace | |
| CN207091561U (en) | A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed | |
| CN203866406U (en) | Boron diffusion furnace baffle structure capable of achieving uniform diffusion of reaction gas | |
| CN206477055U (en) | Modified polycrystalline silicon ingot or purifying furnace | |
| CN203683725U (en) | Carbon fiber heat preserving carrier plate with exhausting device for polycrystalline silicon ingot furnace | |
| CN211734532U (en) | High-yield crystalline silicon solar cell diffusion furnace | |
| CN203096168U (en) | Metal organic chemical vapor deposition (MOCVD) equipment | |
| CN209584420U (en) | A kind of polycrystalline furnace contains gas guiding device | |
| CN207610519U (en) | Drying oven bellows structure | |
| CN208023108U (en) | A kind of polycrystalline silicon ingot or purifying furnace | |
| CN109321972A (en) | A kind of polycrystalline furnace contains gas guiding device | |
| CN204589368U (en) | A kind of bottom holding plates of single crystal growing furnace | |
| CN204407309U (en) | Solar silicon wafers bogey |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201507, No. 3312, Ting Wei Road, Cao Jing Town, Shanghai, Jinshan District Patentee after: Shanghai Qiang Hua Industrial Limited by Share Ltd Address before: 201507, No. 3312, Ting Wei Road, Cao Jing Town, Shanghai, Jinshan District Patentee before: Shanghai strong China Industrial Co., Ltd. |
|
| CP01 | Change in the name or title of a patent holder |