CN207165529U - A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread - Google Patents
A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread Download PDFInfo
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- CN207165529U CN207165529U CN201720902507.5U CN201720902507U CN207165529U CN 207165529 U CN207165529 U CN 207165529U CN 201720902507 U CN201720902507 U CN 201720902507U CN 207165529 U CN207165529 U CN 207165529U
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- diffusion furnace
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- quartz
- quartzy diffusion
- furnace
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread,Quartz boat is used to carry photovoltaic silicon wafer,Quartz furnace door is arranged on the head of quartzy diffusion furnace,Sealing function is played for quartzy diffusion furnace,Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side,Play heat-blocking action,Shower is located at quartzy diffusion furnace internal upper part,For being passed through spray protective gas POCl3,Baffle plate is arranged between shower and heat-preserving container with the mode of hook,For stopping quartzy diffusion furnace internal gas flow,The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace,For being passed through oxygen,Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace,Waste pipe is used to discharge waste liquid,TC is managed for placing thermocouple,Quartzy diffusion furnace also includes even flow plate,Even flow plate is positioned close to the air inlet of quartzy diffusion furnace afterbody,Even flow plate is provided with multiple vias.
Description
Technical field
The utility model belongs to field of semiconductor fabrication processes, and more particularly to a kind of photovoltaic silicon wafer quartz uniformly spread expands
Dissipate stove.
Background technology
Application No. CN201521039652.2 patent document, mention " in crystal silicon solar energy battery manufacturing process,
Silicon chip diffusion technique is that silicon chip is put into high temperature dispersing furnace, passes to the gases such as nitrogen, oxygen and POCl3, sends out at high temperature
It is biochemical to react and form PN junction in silicon chip surface after spreading.Specifically, first silicon chip is inserted on quartz boat, then by quartz
Boat is put into high temperature dispersing furnace (being typically exactly diffusion quartz tube), is passed through the gas containing diffusion source, is spread under the high temperature conditions
Source reacts with silicon chip, realizes diffusion process so as to form PN junction.”
This document disclose " a kind of solar silicon wafers disperser, including quartz boat, between quartz boat and air inlet
Air-flow aggregating apparatus, multiple quartzy bar construction supporting constructions of the quartz boat by two supporting plates and between supporting plate, and
Multiple cuttings for being used to place silicon chip are provided with quartz pushrod, it is characterised in that：Quartz pushrod uses hollow type structure, is opened in supporting plate
There are multiple through holes communicated with each quartz pushrod；Air dispelling hole, and air dispelling hole and stone are also provided with quartz pushrod between adjacent cutting
English rod penetrates；Air-flow aggregating apparatus is a baffle-type structure with hole of confluxing, and hole exits end of confluxing supports towards quartz boat
The projection of through hole is respectively positioned in the port of export in hole of confluxing on plate ".
The purpose of above-mentioned technical proposal is " first, the air-flow aggregating apparatus air-flow in hole of being confluxed by band, makes air-flow fast
In the quartz pushrod that speed is flowed on quartz boat and silicon chip is blowed at air dispelling hole, effectively increases the utilization rate in diffusion source, can also
Further increase transmission range, so as to improve the yield of single stove diffusion, reduce production cost；Second, by hollow quartz pushrod and open
The air dispelling hole being located on quartz pushrod, the area of space that diffusion source is abundant and is evenly distributed between silicon chip can be carried significantly
High silicon chip diffusion uniformity, so as to improve conversion efficiency of solar cell, while the utilization in diffusion source is also substantially increased, saved
About production cost；Third, can be distributed by position of opening of the air dispelling hole on quartz pushrod, to control the direction of air-flow, make expansion
Dissipate source air-flow to be more evenly distributed in the range of silicon chip place, flexibly set according to production requirement, practical ".It is however, real
In trampling, when this quartzy diffusion furnace works, the problem of confluxing except considering air-flow, it is also contemplated that other factors, such as quartz expand
The problem of dissipating diffusion uniformity in stove.
Utility model content
The utility model provides a kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread, to solve to expand in quartzy diffusion furnace
Dissipate the problem of uneven.
A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread, the quartzy diffusion furnace include shower, quartz boat, baffle plate,
Heat-preserving container, Quartz furnace door, waste pipe and TC pipes,
Quartz boat is used to carry photovoltaic silicon wafer,
Quartz furnace door is arranged on the head of quartzy diffusion furnace, and sealing function is played for quartzy diffusion furnace,
Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action,
Shower is located at quartzy diffusion furnace internal upper part, for being passed through spray protective gas POCl3,
Baffle plate is arranged between shower and heat-preserving container with the mode of hook, for stopping quartzy diffusion furnace internal gas flow,
The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace, for being passed through oxygen,
Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC is managed for placing
Thermocouple,
Quartzy diffusion furnace also includes even flow plate, and even flow plate is positioned close to the air inlet of quartzy diffusion furnace afterbody, even flow plate
It is provided with multiple vias.
Multiple vias on even flow plate are rendered as a meter word distribution.
TC pipes are temperature tube, and TC is English thermocouple abbreviation.
The utility model is directed to existing photovoltaic silicon wafer quartz diffusion furnace, and quartzy stove air inlet pipe is passed directly into diffusion furnace,
Control can not be realized to gas stream in the stove, the utility model air inlet inside Quartz stove tube increases even flow plate so that air-flow can
It is evenly distributed in boiler tube, increases the uniformity of diffusion.
Brief description of the drawings
Detailed description below is read by reference to accompanying drawing, the utility model illustrative embodiments above-mentioned and other
Objects, features and advantages will become prone to understand.In the accompanying drawings, show that this practicality is new by way of example, and not by way of limitation
Some embodiments of type, wherein：
Fig. 1 is the utility model quartz diffusion-furnace structure schematic side view.
Fig. 2 is the front view of the even flow plate of the utility model quartz diffusion furnace.
1 --- shower, 2 --- quartz boat, 3 --- baffle plate, 4 --- heat-preserving container, 5 --- Quartz furnace door, 6 --- air inlet
Mouthful, 7 --- waste pipe, 8 --- TC is managed, and 9 --- even flow plate.
Embodiment
As illustrated in fig. 1 and 2, a kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread, the quartzy diffusion furnace include shower,
Quartz boat, baffle plate, heat-preserving container, Quartz furnace door, waste pipe and TC pipes.
Quartz boat is used to carry photovoltaic silicon wafer.Quartz furnace door is arranged on the head of quartzy diffusion furnace, for quartzy diffusion furnace
Play sealing function.Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action.Shower is located at stone
English diffusion furnace internal upper part, for being passed through spray protective gas POCl3.Baffle plate is arranged on shower and guarantor with the mode of hook
Between warm bucket, for stopping quartzy diffusion furnace internal gas flow.The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace,
For being passed through oxygen.Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC, which is managed, to be used for
Place thermocouple.
Quartzy diffusion furnace also includes even flow plate, and even flow plate is positioned close to the air inlet of quartzy diffusion furnace afterbody, even flow plate
It is provided with multiple vias.Multiple vias on even flow plate are rendered as a meter word distribution.
What deserves to be explained is created although foregoing teachings describe the utility model by reference to some embodiments
Spirit and principle, it should be appreciated that, the utility model is not limited to disclosed embodiment, and each side is drawn
Divide and also do not mean that the feature in these aspects can not combine, this division is merely to the convenience of statement.The utility model purport
Covering various modifications included in spirit and scope of the appended claims and equivalent arrangements.
Claims (2)
1. a kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread, it is characterised in that the quartzy diffusion furnace includes shower, quartz
Boat, baffle plate, heat-preserving container, Quartz furnace door, waste pipe and TC pipes,
Quartz boat is used to carry photovoltaic silicon wafer,
Quartz furnace door is arranged on the head of quartzy diffusion furnace, and sealing function is played for quartzy diffusion furnace,
Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action,
Shower is located at quartzy diffusion furnace internal upper part, for being passed through spray protective gas POCl3,
Baffle plate is arranged between shower and heat-preserving container with the mode of hook, for stopping quartzy diffusion furnace internal gas flow,
The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace, for being passed through oxygen,
Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC is managed for placing thermoelectricity
It is even,
Quartzy diffusion furnace also includes even flow plate, and even flow plate is positioned close to the air inlet of quartzy diffusion furnace afterbody, set on even flow plate
There are multiple vias.
2. the photovoltaic silicon wafer quartz diffusion furnace as claimed in claim 1 uniformly spread, it is characterised in that multiple on even flow plate
Via is rendered as a meter word distribution.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720902507.5U CN207165529U (en) | 2017-07-24 | 2017-07-24 | A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720902507.5U CN207165529U (en) | 2017-07-24 | 2017-07-24 | A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread |
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| CN207165529U true CN207165529U (en) | 2018-03-30 |
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| CN201720902507.5U Active CN207165529U (en) | 2017-07-24 | 2017-07-24 | A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly spread |
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Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110931339A (en) * | 2019-10-23 | 2020-03-27 | 深圳市拉普拉斯能源技术有限公司 | Processing device for semiconductor or photovoltaic material |
| CN111270219A (en) * | 2020-03-24 | 2020-06-12 | 无锡市正罡自动化设备有限公司 | ALD heating furnace |
-
2017
- 2017-07-24 CN CN201720902507.5U patent/CN207165529U/en active Active
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN110931339A (en) * | 2019-10-23 | 2020-03-27 | 深圳市拉普拉斯能源技术有限公司 | Processing device for semiconductor or photovoltaic material |
| CN110931339B (en) * | 2019-10-23 | 2022-04-22 | 深圳市拉普拉斯能源技术有限公司 | Processing device for semiconductor or photovoltaic material |
| CN111270219A (en) * | 2020-03-24 | 2020-06-12 | 无锡市正罡自动化设备有限公司 | ALD heating furnace |
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