CN207091561U - A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed - Google Patents
A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed Download PDFInfo
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- CN207091561U CN207091561U CN201720902445.8U CN201720902445U CN207091561U CN 207091561 U CN207091561 U CN 207091561U CN 201720902445 U CN201720902445 U CN 201720902445U CN 207091561 U CN207091561 U CN 207091561U
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- diffusion furnace
- quartz
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- furnace
- shower
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Abstract
A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed,Quartz boat is used to carry photovoltaic silicon wafer,Quartz furnace door is arranged on the head of quartzy diffusion furnace,Sealing function is played for quartzy diffusion furnace,Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side,Play heat-blocking action,Shower is located at quartzy diffusion furnace internal upper part,For being passed through spray protective gas POCl3,Baffle plate is arranged between shower and heat-preserving container with the mode of hook,For stopping quartzy diffusion furnace internal gas flow,The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace,For being passed through oxygen,Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace,Waste pipe is used to discharge waste liquid,TC is managed for placing thermocouple,The tube wall of shower is provided with multiple spray apertures,The diameter of the nearer spray apertures of distance quartz diffusion furnace head is more than the diameter of the spray apertures nearer apart from quartzy diffusion furnace afterbody.
Description
Technical field
The utility model belongs to field of semiconductor fabrication processes, and more particularly to a kind of photovoltaic silicon wafer quartz uniformly sprayed expands
Dissipate stove.
Background technology
Application No. CN201521039652.2 patent document, mention " in crystal silicon solar energy battery manufacturing process,
Silicon chip diffusion technique is that silicon chip is put into high temperature dispersing furnace, passes to the gases such as nitrogen, oxygen and POCl3, sends out at high temperature
It is biochemical to react and form PN junction in silicon chip surface after spreading.Specifically, first silicon chip is inserted on quartz boat, then by quartz
Boat is put into high temperature dispersing furnace (being typically exactly diffusion quartz tube), is passed through the gas containing diffusion source, is spread under the high temperature conditions
Source reacts with silicon chip, realizes diffusion process so as to form PN junction.”
This document disclose " a kind of solar silicon wafers disperser, including quartz boat, between quartz boat and air inlet
Air-flow aggregating apparatus, multiple quartzy bar construction supporting constructions of the quartz boat by two supporting plates and between supporting plate, and
Multiple cuttings for being used to place silicon chip are provided with quartz pushrod, it is characterised in that：Quartz pushrod uses hollow type structure, is opened in supporting plate
There are multiple through holes communicated with each quartz pushrod；Air dispelling hole, and air dispelling hole and stone are also provided with quartz pushrod between adjacent cutting
English rod penetrates；Air-flow aggregating apparatus is a baffle-type structure with hole of confluxing, and hole exits end of confluxing supports towards quartz boat
The projection of through hole is respectively positioned in the port of export in hole of confluxing on plate ".
The purpose of above-mentioned technical proposal is " first, the air-flow aggregating apparatus air-flow in hole of being confluxed by band, makes air-flow fast
In the quartz pushrod that speed is flowed on quartz boat and silicon chip is blowed at air dispelling hole, effectively increases the utilization rate in diffusion source, can also
Further increase transmission range, so as to improve the yield of single stove diffusion, reduce production cost；Second, by hollow quartz pushrod and open
The air dispelling hole being located on quartz pushrod, the area of space that diffusion source is abundant and is evenly distributed between silicon chip can be carried significantly
High silicon chip diffusion uniformity, so as to improve conversion efficiency of solar cell, while the utilization in diffusion source is also substantially increased, saved
About production cost；Third, can be distributed by position of opening of the air dispelling hole on quartz pushrod, to control the direction of air-flow, make expansion
Dissipate source air-flow to be more evenly distributed in the range of silicon chip place, flexibly set according to production requirement, practical ".It is however, real
In trampling, when this quartzy diffusion furnace works, the problem of confluxing except considering air-flow, it is also contemplated that other factors, such as quartz expand
The problem of dissipating stove internal sparger pipe non-uniform spraying.
Utility model content
The utility model provides a kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed, to solve to spray in quartzy diffusion furnace
The problem of shower pipe non-uniform spraying.
A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed, the quartzy diffusion furnace include shower, quartz boat, baffle plate,
Heat-preserving container, Quartz furnace door, waste pipe and TC pipes,
Quartz boat is used to carry photovoltaic silicon wafer,
Quartz furnace door is arranged on the head of quartzy diffusion furnace, and sealing function is played for quartzy diffusion furnace,
Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action,
Shower is located at quartzy diffusion furnace internal upper part, for being passed through spray protective gas POCl3,
Baffle plate is arranged between shower and heat-preserving container with the mode of hook, for stopping quartzy diffusion furnace internal gas flow,
The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace, for being passed through oxygen,
Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC is managed for placing
Thermocouple,
The tube wall of shower is provided with multiple spray apertures, the diameters of the nearer spray apertures of distance quartz diffusion furnace head be more than away from
The diameter of the spray apertures nearer from quartzy diffusion furnace afterbody.
The change of multiple spray bore dias of shower, from quartz diffusion furnace head to afterbody, when gradual change.
The spray apertures of shower are arranged as 2 rows up and down.
TC pipes are temperature tube, and TC is English thermocouple abbreviation.
The utility model is directed to existing photovoltaic silicon wafer quartz diffusion furnace, the shower in quartz ampoule, more to distal end air-flow
Weaker, the utility model gradually increases the bore dia of shower so that the near-end of shower and the air-flow of end approach so that
Diffusion uniformity is more preferable.
Brief description of the drawings
Detailed description below is read by reference to accompanying drawing, the utility model illustrative embodiments above-mentioned and other
Objects, features and advantages will become prone to understand.In the accompanying drawings, show that this practicality is new by way of example, and not by way of limitation
Some embodiments of type, wherein：
Fig. 1 is the utility model quartz diffusion-furnace structure schematic side view.
Fig. 2 is shower schematic side view in the utility model quartz diffusion-furnace structure
1 --- shower, 2 --- quartz boat, 3 --- baffle plate, 4 --- heat-preserving container, 5 --- Quartz furnace door, 6 --- air inlet
Mouthful, 7 --- waste pipe, 8 --- TC is managed.
Embodiment
As illustrated in fig. 1 and 2, a kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed, the quartzy diffusion furnace include shower,
Quartz boat, baffle plate, heat-preserving container, Quartz furnace door, waste pipe and TC pipes.
Quartz boat is used to carry photovoltaic silicon wafer.Quartz furnace door is arranged on the head of quartzy diffusion furnace, for quartzy diffusion furnace
Play sealing function.Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action.Shower is located at stone
English diffusion furnace internal upper part, for being passed through spray protective gas POCl3.Baffle plate is arranged on shower and guarantor with the mode of hook
Between warm bucket, for stopping quartzy diffusion furnace internal gas flow.The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace,
For being passed through oxygen.Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC, which is managed, to be used for
Place thermocouple.
The tube wall of shower is provided with multiple spray apertures, the diameters of the nearer spray apertures of distance quartz diffusion furnace head be more than away from
The diameter of the spray apertures nearer from quartzy diffusion furnace afterbody.The change of multiple spray bore dias of shower, from quartzy diffusion furnace
Head to afterbody, when gradual change.The spray apertures of shower are arranged as 2 rows up and down.
What deserves to be explained is created although foregoing teachings describe the utility model by reference to some embodiments
Spirit and principle, it should be appreciated that, the utility model is not limited to disclosed embodiment, and each side is drawn
Divide and also do not mean that the feature in these aspects can not combine, this division is merely to the convenience of statement.The utility model purport
Covering various modifications included in spirit and scope of the appended claims and equivalent arrangements.
Claims (3)
1. a kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed, it is characterised in that the quartzy diffusion furnace includes shower, quartz
Boat, baffle plate, heat-preserving container, Quartz furnace door, waste pipe and TC pipes, quartz boat are used to carry photovoltaic silicon wafer,
Quartz furnace door is arranged on the head of quartzy diffusion furnace, and sealing function is played for quartzy diffusion furnace,
Heat-preserving container is located in quartzy diffusion furnace close to Quartz furnace door side, plays heat-blocking action,
Shower is located at quartzy diffusion furnace internal upper part, for being passed through spray protective gas POCl3,
Baffle plate is arranged between shower and heat-preserving container with the mode of hook, for stopping quartzy diffusion furnace internal gas flow,
The air inlet of quartzy diffusion furnace is arranged on the afterbody of quartzy diffusion furnace, for being passed through oxygen,
Waste pipe and TC pipes are arranged on the bottom in quartzy diffusion furnace, and waste pipe is used to discharge waste liquid, and TC is managed for placing thermoelectricity
It is even,
The tube wall of shower is provided with multiple spray apertures, and the diameter of the nearer spray apertures of distance quartz diffusion furnace head is more than apart from stone
The diameter of the nearer spray apertures of English diffusion furnace afterbody.
2. the photovoltaic silicon wafer quartz diffusion furnace as claimed in claim 1 uniformly sprayed, it is characterised in that multiple sprays of shower
Drench the change of bore dia, from quartz diffusion furnace head to afterbody, when gradual change.
3. the photovoltaic silicon wafer quartz diffusion furnace as claimed in claim 2 uniformly sprayed, it is characterised in that the spray apertures of shower
It is arranged as 2 rows up and down.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720902445.8U CN207091561U (en) | 2017-07-24 | 2017-07-24 | A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720902445.8U CN207091561U (en) | 2017-07-24 | 2017-07-24 | A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN207091561U true CN207091561U (en) | 2018-03-13 |
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Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720902445.8U Active CN207091561U (en) | 2017-07-24 | 2017-07-24 | A kind of photovoltaic silicon wafer quartz diffusion furnace uniformly sprayed |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN207091561U (en) |
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2017
- 2017-07-24 CN CN201720902445.8U patent/CN207091561U/en active Active
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| GR01 | Patent grant | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201507, No. 3312, Ting Wei Road, Cao Jing Town, Shanghai, Jinshan District Patentee after: Shanghai Qiang Hua Industrial Limited by Share Ltd Address before: 201507, No. 3312, Ting Wei Road, Cao Jing Town, Shanghai, Jinshan District Patentee before: Shanghai strong China Industrial Co., Ltd. |
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| CP01 | Change in the name or title of a patent holder |