CN206628499U - Gas uniform flow component and sheet surface processing unit - Google Patents
Gas uniform flow component and sheet surface processing unit Download PDFInfo
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- CN206628499U CN206628499U CN201720257218.4U CN201720257218U CN206628499U CN 206628499 U CN206628499 U CN 206628499U CN 201720257218 U CN201720257218 U CN 201720257218U CN 206628499 U CN206628499 U CN 206628499U
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- 239000000463 material Substances 0.000 claims abstract description 5
- 238000002161 passivation Methods 0.000 claims description 8
- 235000019994 cava Nutrition 0.000 claims description 3
- 238000005086 pumping Methods 0.000 claims 1
- 239000007789 gas Substances 0.000 abstract description 118
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 abstract description 40
- 229910052710 silicon Inorganic materials 0.000 abstract description 40
- 239000010703 silicon Substances 0.000 abstract description 40
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 abstract description 29
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 abstract description 20
- 238000004140 cleaning Methods 0.000 abstract description 11
- 229910052757 nitrogen Inorganic materials 0.000 abstract description 10
- 238000007254 oxidation reaction Methods 0.000 abstract description 9
- 230000003647 oxidation Effects 0.000 abstract description 6
- 230000035939 shock Effects 0.000 abstract description 4
- 239000012535 impurity Substances 0.000 abstract description 3
- 210000003437 trachea Anatomy 0.000 abstract description 3
- 230000007717 exclusion Effects 0.000 abstract 1
- 238000006243 chemical reaction Methods 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 238000009792 diffusion process Methods 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005516 engineering process Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 230000008859 change Effects 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 238000005457 optimization Methods 0.000 description 2
- 239000011148 porous material Substances 0.000 description 2
- 230000008569 process Effects 0.000 description 2
- 239000010453 quartz Substances 0.000 description 2
- 241000276425 Xiphophorus maculatus Species 0.000 description 1
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 1
- 230000008901 benefit Effects 0.000 description 1
- 230000003197 catalytic effect Effects 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000007812 deficiency Effects 0.000 description 1
- 238000007599 discharging Methods 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 239000004744 fabric Substances 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000008676 import Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910021421 monocrystalline silicon Inorganic materials 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- 239000001301 oxygen Substances 0.000 description 1
- 229910052760 oxygen Inorganic materials 0.000 description 1
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 1
- 229920005591 polysilicon Polymers 0.000 description 1
- 230000035484 reaction time Effects 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 239000002912 waste gas Substances 0.000 description 1
- 210000002268 wool Anatomy 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Landscapes
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
Abstract
Gas uniform flow component disclosed in the utility model, including interconnected the first uniform flow part and the second uniform flow part, the first uniform flow part has multiple points of gas paths by gas control valve connectivity trachea, the first uniform flow part, multiple stomatas are opened up on second uniform flow part, multiple stomatas communicate with multiple points of gas paths.Sheet surface processing unit disclosed in the utility model, sheet material is surface-treated using air-flow, it includes casing, in addition at least one gas uniform flow component, and gas uniform flow component is arranged in casing.Sheet surface processing unit of the present utility model in casing by installing gas uniform flow component additional, and passing in and out nitrogen, ozone, casing is dispersed, and air-flow is steady, flow velocity is slow, effectively avoids gas shock；Gas is uniformly filled in box house so that the exclusion of box house impurity is more thorough, and cleaning scope is without dead angle；Ozone contacts more thorough, the ozone concentration uniformity around every silicon chip with the silicon chip of box house laid out in parallel, ensures oxidation effectiveness.
Description
Technical field
The utility model belongs to photovoltaic solar cell silicon chip manufacturing technology field, and in particular to a kind of gas uniform flow group
Part, further relate to a kind of sheet surface processing unit for including above-mentioned gas uniform flow component.
Background technology
With the continuous development of World Economics, modernization construction constantly increases to high efficient energy sources demand.And photovoltaic generation is made
For green energy resource and one kind of the main energy sources of human kind sustainable development, it is increasingly subject to the attention of countries in the world and obtains energetically
Development.The basic material of monocrystalline silicon piece, polysilicon chip as the solar battery sheet of photovoltaic generation, possessing extensive market needs
Ask.
In the process of solar cell, in order to improve the conversion efficiency of solar cell, it is necessary to surface wool manufacturing
Silicon chip afterwards is effectively passivated, and forms silica membrane in silicon chip surface by oxidizing process, currently used technique is
Silicon chip passivation is carried out using ozone gas.Fig. 1 illustrates a kind of silicon chip ozone passivating device of the prior art.Silicon chip flower basket is inserted
After filling silicon chip, it is placed across in the casing 1 of silicon chip ozone passivating device；And feeder is connected by the way of single tube connection
Casing 1, nitrogen, ozone enter casing by the air inlet pipe 2 of casing top, after the completion of reaction, pass through the escape pipe of bottom half
3, extract casing out under the work of vavuum pump 5.
Above-mentioned silicon chip ozone passivating device can have following technical problem during gas passes in and out casing：
First, gas disengaging casing point is single, and flow velocity is very fast, easily causes silicon chip quality hidden danger：As shown in figure 1, casing
When air inlet, an air outlet passage are only designed in top and bottom, gas can be flowed into rapidly between intake channel and air outlet passage
Outflow, forms faster flow velocity, and so as to which the silicon chip placed to this section forms certain gas shock dynamics, and silicon chip is due to list
Thin, light, frangible product performance, anti-gas shock power is weak, and this gas disengaging mode easily causes silicon chip and rocked, and brings hidden
The quality hidden danger such as split.
Secondly, gas spreads uneven in casing, influences cleaning effect and product oxidation efficiency：Nitrogen passes through casing top
The intake channel in portion enters casing, and by the air outlet passage of bottom, is flowed down out casing in the work of vavuum pump, so as to complete case
The cleaning in internal portion.But it is this enter gas outlet mode can so that nitrogen enter casing after soon flow out casing, gas is not
Easily spread and flowing velocity is fast, be not easy the waste gas impurity in each corner of box house discharging casing, cleaning efficiency is low.
Furthermore after ozone is passed through casing, it need to consume a longer time that diffusion is uniform, and each several part ozone concentration differs in casing
Cause, the effect of equalization of concentration need to be reached by the long period, so as to cause silicon chip ozone concentration height and oxygen close to intake channel
The change time is longer, and the silicon chip ozone concentration away from air outlet passage is low and oxidization time is shorter.
It moreover, ozone exhaust efficiency is relatively low, need to take a long time, and be easily drained close to the ozone of air outlet passage, far
Ozone from air outlet passage is not easy to discharge.
Utility model content
The purpose of this utility model is to provide a kind of gas uniform flow component, solve existing silicon chip ozone passivating device by
In gas flow rate is fast, diffusion it is uneven cause silicon chip it is easily hidden split, oxidation efficiency and casing cleaning efficiency are low the problem of.
The purpose of this utility model, which also resides in, provides a kind of sheet surface processing unit for including above-mentioned gas uniform flow component,
It can prepare the oxide passivated film of high quality in silicon chip surface, and then improve the conversion efficiency of solar battery sheet.
A kind of technical scheme is used by the utility model：Gas uniform flow component, including gas control valve and connection
The tracheae of gas control valve, in addition to interconnected the first uniform flow part and the second uniform flow part, the first uniform flow part pass through gas
Control valve connectivity trachea, the first uniform flow part have multiple points of gas paths, multiple stomatas, multiple stomatas are opened up on the second uniform flow part
Communicated with multiple points of gas paths.
The characteristics of the utility model, also resides in,
The side wall of first uniform flow part is outwardly to form multiple points of gas paths, the inner hollow of the first uniform flow part formed with it is more
Individual to divide what gas path communicated to divide air cavity, multiple points of gas paths are oppositely arranged with tracheae, and multiple points of gas paths are successively through dividing air cavity, gas
Connectivity trachea after body control valve.
The surface that second uniform flow part connects multiple points of gas paths is caved inward to form hollow branch chamber, and branch chamber is communicated in
Between multiple points of gas paths and multiple stomatas, and multiple stomatas and multiple points of gas paths are oppositely arranged.
Multiple stomatas are evenly spaced on the second uniform flow part relative with branch chamber.
Multiple points of gas paths are evenly distributed in the side wall of the first uniform flow part.
Sheet surface processing unit, it is surface-treated using air-flow to sheet material, and sheet surface processing unit includes case
Body, in addition at least one gas uniform flow component as described above, gas uniform flow component are arranged in casing.
The characteristics of the utility model, also resides in,
Gas uniform flow component is installed in the side wall in casing, and the side wall of tracheae through the casing of gas uniform flow component connects
Supply or air extractor, housing interior volume form sheet surface processing region.
Two gas uniform flow components are symmetrical arranged in casing：One gas uniform flow component is installed on box house upper wall, its
The tracheae of connection is air inlet pipe, and air inlet pipe connects feeder；Another gas uniform flow component is installed on box house bottom, its
The tracheae of connection is escape pipe, and escape pipe connects air extractor.
Housing interior volume between two gas uniform flow components forms the region of sheet surface Passivation Treatment, is installed on case
Positioning load carrier for placing the gaily decorated basket is installed on the second uniform flow part of the gas uniform flow component of body interior bottom portion.
Also include support body, casing is positioned on support body, and support body bottom is provided with movable pulley.
The box house of sheet surface processing unit of the present utility model is provided with two gas uniform flow components.This gas
The main composition part of uniform flow component is the first uniform flow part, the second uniform flow part.The upper wall connection feeder of first uniform flow part, the
The lower wall of one uniform flow part is evenly arranged multiple points of gas paths.Divide the upper wall of gas path access branch chamber, the lower wall of branch chamber and row
Stomata of the cloth on the second uniform flow part communicates.Two gas uniform flow components are symmetrical arranged in box house, are so fixed in casing
The gas uniform flow component of upper wall connects feeder by air inlet pipe, and is fixed in the gas uniform flow component of casing lower wall by going out
Tracheae connects air extractor.It is so designed that, the gas from feeder sequentially enters the of casing upper wall gas uniform flow component
One uniform flow part, divide air cavity, divide gas path, branch chamber and the second uniform flow part, the gas of box house is through casing lower wall gas uniform flow
The second uniform flow part, branch chamber and the first uniform flow part discharge casing of component.
Therefore, compared with prior art, gas uniform flow component of the present utility model and sheet surface processing unit at least have
Have the advantage that：
For the utility model by the structure optimization of box house, nitrogen, the admission of ozone disengaging casing and outlet point are equal
Even scattered, air-flow is steady, flow velocity is slow, effectively prevent and stronger gas shock power is caused in air flow collection, ensure that silicon chip matter
Amount；Furthermore gas is uniformly filled in box house so that box house impurity excludes more thorough, and cleaning scope does not have dead angle；
Further, ozone contacts more thorough with the silicon chip of box house laid out in parallel, the ozone concentration uniformity around every silicon chip, and
Time of contact is equal, ensure that good oxidation effectiveness.
Sheet surface processing unit of the present utility model optimizes to structure, does not increase the volume of device, does not have to
Increase extra component, assembling difficulty of processing is low, is easy to promote.
Brief description of the drawings
Fig. 1 is the gas flow schematic diagram of existing silicon chip ozone passivating device；
Fig. 2 is the gas flow schematic diagram of the present embodiment sheet surface processing unit；
Fig. 3 is the assembling schematic diagram of the present embodiment gas uniform flow component one；
Fig. 4 is the structural representation of the second uniform flow part of the present embodiment gas uniform flow component one；
Fig. 5 is Fig. 4 profile；
Fig. 6 is the assembling schematic diagram of the present embodiment gas uniform flow component two；
Fig. 7 is the position relationship side view of the present embodiment positioning load carrier and the gaily decorated basket；
Fig. 8 is the position relationship stereogram of the present embodiment positioning load carrier and the gaily decorated basket；
Fig. 9 is the overall top view of the present embodiment sheet surface processing unit；
Figure 10 is the overall upward view of the present embodiment sheet surface processing unit.
In figure, 1. casings；2. air inlet pipe；3. escape pipe；First uniform flow part on 4.；5. air extractor；Branch chamber on 6.；7.
Upper second uniform flow part；8. lower second uniform flow part；9. lower branch chamber；10. lower first uniform flow part；11. point gas path；12. stomata；
13. the gaily decorated basket；14. position load carrier；15. support body；16. movable pulley；17. leg；18. locating groove.
Embodiment
The utility model is described in detail with reference to the accompanying drawings and detailed description.
The present embodiment enters for the technological deficiency of the silicon chip ozone passivating device shown in Fig. 1 to the internal structure of its casing 1
Innovative design is gone, by installing gas uniform flow component of the present utility model additional so that sheet surface of the present utility model after improvement
The structure of processing unit is shown in Fig. 2 to Figure 10.
Casing 1 is the place for realizing silicon chip passivation, and inside has the space for accommodating silicon chip.As shown in Figure 9, Figure 10, casing 1
Profile can be designed as cuboid, its have open, close casing 1 door, door form casing 1 a part, as door
Open-close ways and the connected mode with casing 1, the present embodiment are not specifically limited, but should be preferably to set in order to pick and place silicon chip
Meter.Moreover it is preferred that in order to realize silicon chip passivation technology, the inside of casing 1 is using resistance to ozone oxidation, resistance to 400 celsius temperature material
Matter.
Two gas uniform flow components are installed in the internal symmetry of casing 1, as shown in Fig. 2 one of gas uniform flow component is pacified
On the upper wall of casing 1, another gas uniform flow component on the other side is arranged on the lower wall of casing 1.It is even according to gas
Installation site of the component inside casing 1 is flowed, the present embodiment will be referred to as gas installed in the gas uniform flow component of the inner upper wall of casing 1
Body uniform flow component one, the gas uniform flow component on the inside lower wall of casing 1 is referred to as gas uniform flow component two.Need to illustrate
, gas uniform flow component one, the component of gas uniform flow component two are formed and function realizes it is identical.
Fig. 3 to Fig. 6 gives the concrete structure composition of gas uniform flow component, and gas uniform flow component constitutes the air inlet of casing 1
Circulation.As shown in Figure 3-Figure 5, gas uniform flow component one mainly includes the upper first uniform flow part 4 that sets gradually and upper the
Two uniform flow parts 7.The upper surface of upper second uniform flow part 7 caves inward to form branch chamber 6.Upper first uniform flow part 4, upper branch chamber 6
It is hollow cavity body structure.The first exuberant air cavity that divides in upper first uniform flow part 4 of gas from air inlet pipe 2, and it is indirect enter
Enter inside casing 1.In order to which the gas in upper first uniform flow part 4 is imported inside casing 1, on the lower wall of upper first uniform flow part 4
At least one point of gas path 11 of outwardly setting.On dividing the setting number of gas path 11, the present embodiment does not have special limit
It is fixed, as shown in Figures 2 and 3, it is evenly arranged 4 points of gas paths 11 on the lower wall of upper first uniform flow part 4, you can meet that gas is equal
The even needs imported inside casing 1.
Divide the access of gas path 11 upper branch chamber 6, the gas in upper first uniform flow part 4 is imported into upper branch chamber 6, upper branch chamber
6 play a part of gas terminal.For shape, upper branch chamber 6 is the cavity of flat, as shown in Figures 2 and 3, upper point
Stream chamber 6 is as being embedded in the inside of upper second uniform flow part 7, or says it is that the upper surface of upper second uniform flow part 7 caves inward to be formed
Branch chamber 6, surface and the upper surface of upper second uniform flow part 7 where the upper wall of upper branch chamber 6 are in same plane.
As shown in Figure 4 and Figure 5, upper second uniform flow part 7 is the platy structure of flat.In order to by the gas of upper branch chamber 6
Import inside casing 1, several stomatas 12 communicated with upper branch chamber 6 are offered in upper second uniform flow part 7.Exist for stomata 12
The arrangement mode of upper second uniform flow part 7, the concrete shape of stomata 12, and stomata 12 open up number, and the present embodiment is without spy
Different restriction, as shown in figure 4, stomata 12 is provided only on the region corresponding to the lower wall of branch chamber 6, and stomata 12 is upper second
Uniformly arranged on uniform flow part 7.The gas being contained in branch chamber 6 is equably flowed to inside casing 1 by stomata 12.In stomata
The periphery of 12 regions, i.e., the edge of upper second uniform flow part 7 offer bolt hole, and upper second uniform flow part 7 passes through bolt
It is connected on the upper wall of casing 1.
The structure for the gas uniform flow component two that the present embodiment refers to is as shown in fig. 6, mainly include lower second set gradually
Uniform flow part 8, lower branch chamber 9, lower first uniform flow part 10, its concrete structure are not made herein with reference to described gas uniform flow component one
Repeat, unlike, what gas uniform flow component two connected is escape pipe 3, and escape pipe 3 accesses air extractor 5.
Further, positioning load carrier 14 is additionally provided with inside casing 1, specifically, positioning load carrier 14 is in gas
Between body uniform flow component one, gas uniform flow component two, and position load carrier 14 and be fixed on down on the second uniform flow part 8.Such as Fig. 7
Shown in Fig. 8, positioning load carrier 14 is made up of two identical support members, and two support members are relatively fixed in lower second uniform flow
On part 8, and there is appropriate gap between two support members.The edge of positioning load carrier 14 has locating groove 18,
For placing the leg 17 for the gaily decorated basket 13 for holding silicon chip, the leg 17 is arranged in locating groove 18, realizes positioning mistake proofing, steady
Determine the function of silicon chip flower basket 13.
As shown in Figure 9 and Figure 10, generally speaking, sheet surface processing unit include casing 1, support body 15, feeder and
Air extractor 5.Casing 1 is arranged on support body 15, and casing 1 connects feeder (not indicated in figure) by air inlet pipe 2, by going out
Tracheae 3 connects air extractor.
Feeder be realize silicon chip passivation with gas source, can be to being filled with nitrogen and ozone inside casing 1.In order to full
The switching of sufficient nitrogen, ozone, and the needs of inflation/deflation, connect and be provided with gas control valve in the air inlet pipe 2 of casing 1, should
Gas control valve can also be arranged on casing 1.Preferably, gas control valve selects magnetic valve.Air extractor 5 is by going out
Tracheae 3 accesses casing 1, and the gas inside casing 1 is extracted out, the cleaning of the inner space of casing 1 is completed, after discharge silicon chip passivation
Gas, gas control valve can also be provided with escape pipe 3.In embodiment, air extractor 5 is vavuum pump, or other
Device with identical air extracting function.
Support body 15 is used for supporting box 1, and the lower wall screw locking of casing 1 is on support body 15 so that casing 1 and support body 15
As an entirety.Movable pulley 16 is installed in the bottom of support body 15, is easy to change the location of casing 1.Meanwhile it is evacuated dress
Putting 5 can be arranged on support body 15.
The present embodiment effectively overcomes the skill of the passivating device of silicon chip ozone shown in Fig. 1 through the structure optimization inside casing 1
Art defect.To during 1 inside air inlet of casing, nitrogen (or ozone) first passes through air inlet pipe 2 and is passed through first by solenoid valve control
Uniform flow part 4, gas are equably passed through branch chamber 6 in upper first uniform flow part 4 by 4 points of gas paths 11.Gas is at upper point
It is uniform to flow diffusion in chamber 6, after completely upper branch chamber 6 to be filled, then passes through the densely arranged multiple Minute pores of upper second uniform flow part 7
12 evenly into casing 1 inside, ensure enter casing 1 inside gas uniformly, steadily.Gas is full of inside casing 1, uniformly
The silicon chip catalytic oxidation on ground and laid out in parallel.Under the operation of air extractor 5, the gas stream inside casing 1 goes out inside casing 1
When, avoid extracting out as concentrating during original design from a venthole, but first equably from the lower dense distribution of second uniform flow part 8
Multiple Minute pores 12 are flow in lower branch chamber 9, then enter lower first uniform flow part 10 by 4 points of gas paths 11, finally by
Escape pipe 3 discharges casing 1.
The sheet surface processing unit of the present embodiment is mainly used in preparing the oxide passivated film of high quality in silicon chip surface,
Passivation effect is improved, reduction is compound, so as to improve the conversion efficiency of cell piece.Filled in the processing of the specifically used sheet surface
When putting, operations described below step can refer to：
1) employee opens casing chamber door, and it is even that the silicon chip flower basket (alternatively referred to as quartz boat) of fully loaded silicon chip is positioned over down into second
On the positioning load carrier 14 for flowing part 8, the chamber door of casing 1 is closed；Start button is pressed, vavuum pump is opened, and starts automatic nitrogen-charging gas,
Box house cleaning is completed, secondary cleaning repeatedly, removes foreign gas, dust etc.；Casing heating simultaneously, heat certain time
Afterwards, reach operating temperature, start thermostatic control；
2) after completing box house cleaning, automatic cut-off nitrogen enters casing 1；Switching ozone gas enters casing 1, and
Set under technological parameter (parameter for needing to control has gas pressure, ozone flow, reaction temperature, reaction time, number etc.), press
According to completing oxidation reaction in effective time；
3) after completing oxidation reaction, automatic cut-off ozone enters casing 1, and switching nitrogen enters casing 1,2 cleanings repeatedly
Behind the inside of casing 1 so that reach atmospheric pressure state inside casing 1；Employee opens chamber door, takes out the silicon chip that reaction is completed, is newly put into
The quartz boat cycle operation of fully loaded silicon chip.
Claims (10)
1. gas uniform flow component, including gas control valve and the tracheae for connecting the gas control valve, it is characterised in that also
Including interconnected the first uniform flow part and the second uniform flow part, the first uniform flow part connects institute by the gas control valve
Tracheae is stated, the first uniform flow part has multiple points of gas paths, and multiple stomatas (12) are opened up on the second uniform flow part, described more
Individual stomata (12) communicates with the multiple point of gas path.
2. gas uniform flow component according to claim 1, it is characterised in that the side wall of the first uniform flow part is outwardly
Multiple points of gas paths are formed, the inner hollow of the first uniform flow part is formed divides air cavity with what the multiple point of gas path communicated,
The multiple point of gas path is oppositely arranged with the tracheae, the multiple point of gas path pass through successively described in divide air cavity, gas control
The tracheae is connected after valve.
3. gas uniform flow component according to claim 2, it is characterised in that the second uniform flow part connects the multiple point
The surface of gas path caves inward to form hollow branch chamber, and the branch chamber is communicated in the multiple point of gas path and multiple gas
Between hole (12), and the multiple stomata (12) and multiple points of gas paths are oppositely arranged.
4. gas uniform flow component according to claim 3, it is characterised in that the multiple stomata (12) be evenly spaced in
On the second relative uniform flow part of the branch chamber.
5. gas uniform flow component as claimed in claim 2, it is characterised in that the multiple point of gas path is evenly distributed on described
In the side wall of first uniform flow part.
6. sheet surface processing unit, it is surface-treated using air-flow to sheet material, and the sheet surface processing unit includes
Casing (1), it is characterised in that also including at least one gas uniform flow component as described in claim any one of 1-5, the gas
Body uniform flow component is arranged in the casing (1).
7. sheet surface processing unit as claimed in claim 6, it is characterised in that the gas uniform flow component is installed on described
In side wall in casing (1), the tracheae of the gas uniform flow component fills through the side wall connection supply of the casing (1) or pumping
Put, casing (1) inner space forms sheet surface processing region.
8. sheet surface processing unit as claimed in claim 7, it is characterised in that be symmetrical arranged two in the casing (1)
The gas uniform flow component：One gas uniform flow component is installed on the casing (1) inner upper wall, and its tracheae connected is
Air inlet pipe (2), the air inlet pipe connect feeder；It is internal that another described gas uniform flow component is installed on the casing (1)
Bottom, its tracheae connected is escape pipe (3), the escape pipe connection air extractor (5).
9. sheet surface processing unit as claimed in claim 8, it is characterised in that between two gas uniform flow components
Housing interior volume forms the region of sheet surface Passivation Treatment, is installed on the gas uniform flow group of the casing (1) interior bottom portion
Positioning load carrier (14) for placing the gaily decorated basket (13) is installed on the second uniform flow part of part.
10. sheet surface processing unit as claimed in claim 6, it is characterised in that also including support body (15), the casing
(1) it is positioned on the support body (15), support body (15) bottom is provided with movable pulley (16).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720257218.4U CN206628499U (en) | 2017-03-16 | 2017-03-16 | Gas uniform flow component and sheet surface processing unit |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201720257218.4U CN206628499U (en) | 2017-03-16 | 2017-03-16 | Gas uniform flow component and sheet surface processing unit |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN206628499U true CN206628499U (en) | 2017-11-10 |
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ID=60209516
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201720257218.4U Active CN206628499U (en) | 2017-03-16 | 2017-03-16 | Gas uniform flow component and sheet surface processing unit |
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| CN (1) | CN206628499U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020509596A (en) * | 2018-01-18 | 2020-03-26 | フレックス，リミテッド | Method of manufacturing shingle plate solar module |
| CN111118478A (en) * | 2019-12-31 | 2020-05-08 | 湖南红太阳光电科技有限公司 | PECVD equipment for preparing heterojunction battery thin film |
-
2017
- 2017-03-16 CN CN201720257218.4U patent/CN206628499U/en active Active
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020509596A (en) * | 2018-01-18 | 2020-03-26 | フレックス，リミテッド | Method of manufacturing shingle plate solar module |
| CN111118478A (en) * | 2019-12-31 | 2020-05-08 | 湖南红太阳光电科技有限公司 | PECVD equipment for preparing heterojunction battery thin film |
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