CN206880966U - Nasal obstruction type respirator - Google Patents

Abstract

The utility model discloses a kind of nasal obstruction type respirator, and it includes：Nasal obstruction and filtrating chip, the one end of at least described nasal obstruction is inserted into the nasal cavity of user, and the nasal obstruction includes the gas passage connected with the nasal cavity, the filtrating chip mixes the particle for being more than setting value in pending air-flow, particle diameter to filter out, and pending gas enters the gas passage in the nasal obstruction after flowing through the filtrating chip；And filtrating chip safeguard structure, to protect the filtrating chip.The utility model has the advantages that filterability is good, breathing is convenient, comfort is good, is widely used.

Description

Nasal obstruction type respirator

Technical field

It the utility model is related to a kind of respirator, and in particular to a kind of nasal obstruction type respirator of improvement.

Background technology

In general, the particulate pollutants such as dust in air generally be present, if human body suction for a long time air containing as, It is impaired to frequently can lead to human respiratory etc..Come particularly with some special populations, such as the crowd of the allergy such as pollen Say, if air of the suction containing these anaphylactogens, will cause these personnel that the symptoms such as asthma, expiratory dyspnea occur.To ensure people The health and safety of body, people have been practised in the mouth mask made using materials such as cotton, gauzes to filter out the dirt of the particle in air Contaminate thing.But this quasi-tradition mouth mask is only effective to larger-size particulate pollutant, and through the short time using i.e. may be contaminated.

Postscript, it is contemplated that the serious haze weather at home and abroad occurred more in recent years, it is existing a large amount of in atmosphere PM2.5 (particle of the equivalent grain size below 2.5 μm in air) will have a strong impact on health, and common mouth mask for PM2.5 has no the problem of filtration result.Industry has also been proposed the mouth mask comprising particular filters such as electrostatic filters, respirator (such as N95 mouth masks etc.), it is good for the filterability of common pollution particle in air, but vapour lock is big, expiratory dyspnea, and for mist For haze weather, equally it can not also play a protective role substantially.

Utility model content

Main purpose of the present utility model is to provide a kind of nasal obstruction type respirator, to overcome deficiency of the prior art.

To achieve these goals, the technical solution of the utility model is as follows：

The utility model embodiment provides a kind of nasal obstruction type respirator, and it includes：

Nasal obstruction and filtrating chip, the one end of at least described nasal obstruction are inserted into the nasal cavity of user, and the nasal obstruction bag Containing the gas passage connected with the nasal cavity, the filtrating chip to filter out mix in it is in pending air-flow, particle diameter is big In the particle of setting value, pending gas enters the gas passage in the nasal obstruction after flowing through the filtrating chip；And

Filtrating chip safeguard structure, to protect the filtrating chip.

In some embodiments, the filtrating chip safeguard structure includes the first fixed hard filter screen and the second fixation Formula hard filter screen, the filtrating chip are arranged between the first fixed hard filter screen and the second fixed hard filter screen.

In some embodiments, the nasal obstruction type respirator also includes the first filtration fabrics and/or the second filtration fabrics, First filtration fabrics be distributed in it is described nasal obstruction filtrating chip between, the filtrating chip be distributed in the second filtration fabrics with Between nasal obstruction.

In some embodiments, the nasal obstruction type respirator also includes the first detachable hard filter screen and/or second Removable hard filter screen, the first detachable hard filter screen are fixedly connected with the first filtration fabrics, and described second is detachable Formula hard filter screen is fixedly connected with the second filtration fabrics.

In some embodiments, the nasal obstruction is had a stuffy nose using waist-drum-shaped；And/or the nasal obstruction type respirator also includes The housing of one both ends open, the nasal obstruction are mounted at the shell one end, and the filtrating chip is placed in the shell In vivo.

In more specific first embodiment of the present utility model, the filtrating chip includes：

Matrix with first fluid passage, the first fluid passage have an air intake and air outlet slit, and described The air intake of one fluid passage is distributed in the first surface of described matrix；

The a plurality of lug bosses being intervally installed, the lug boss are transversely continuous on the first surface of described matrix Extension, bottom are fixedly installed on the first surface of described matrix, and top is provided with the hat-shaped structure transversely continuously extended, the cap The phase of shape structure back to both sides along epitaxial lateral overgrowth, and formed with the opening for being available for air to pass through between adjacent hat-shaped structure Portion, the bore of the opening portion are more than 0 but less than mixing in the particle diameter of the selected particle in pending air, and wherein at least two Individual described lug boss respectively with the phase of the air intake of the first fluid passage back to both sides be disposed adjacent, and at least Lug boss described in one directly from the air intake of the first fluid passage by so that a plurality of hat-shaped structures, The second fluid passage connected with the first fluid passage is cooperatively formed between a plurality of lug bosses and matrix, and it is pending Air is only capable of entering first fluid passage by the second fluid passage.

In first embodiment, the lug boss described at least two directly enters from the air of the first fluid passage Pass through on mouthful；And/or a plurality of lug bosses are parallel is distributed on the first surface of described matrix.

More preferable, the hat-shaped structure is wholely set with lug boss.

In first embodiment, the hat-shaped structure can have inverted trapezoidal cross section structure.

More preferable, the bore for the opening portion being formed between adjacent hat-shaped structure is 1nm~50 μm.

More preferable, the height of the hat-shaped structure is 50nm~200 μm.

More preferable, the distance between adjacent projections are 0.1 μm~100 μm.

More preferable, the height of the lug boss is 0.1 μm~400 μm, and width is 0.1 μm~100 μm.

More preferable, the aperture of the first fluid passage is 1 μm~1mm.

More preferable, the thickness of described matrix is more than 1 μm.

It is more preferable, it is additionally provided with light to the surface less than any one of the lug boss, hat-shaped structure and matrix Cati material and/or anti-biotic material layer.

More preferable, at least local of at least one of the lug boss, hat-shaped structure and matrix is transparent configuration.

In more specific second embodiment of the present utility model, the filtrating chip includes：

Matrix with first fluid passage, the first fluid passage have an air intake and air outlet slit, and described The air intake of one fluid passage is distributed in the first surface of described matrix；

Intersected the loose structure formed by complex root nemutogen, is cooperatively formed to the first surface with described matrix Second fluid passage, described complex root nemutogen one end are fixedly connected with described matrix, the loose structure Hole it is straight Footpath is more than 0 but is less than and mixes in the particle diameter of the selected particle in pending air, and pending air is only capable of by described Second fluid passage enters first fluid passage.

Further, one end of the complex root nemutogen is fixedly connected with the first surface of described matrix, and is surround It is distributed in around the air intake of the first fluid passage.

More preferable, described air filter chip also includes a plurality of lug bosses being intervally installed, described convex The portion of rising is fixedly installed on the first surface of described matrix, and is transversely continuously extended on the first surface of described matrix, its In at least two lug bosses respectively with the phase of the air intake of the first fluid passage back to both sides be disposed adjacent, at least one Individual lug boss is directly by being fixedly connected with more than two from the air intake of the first fluid passage on the lug boss Described nemutogen.

It is more preferable, the complex root nemutogen that is connected on a lug boss and it is connected to adjacent with the lug boss another Complex root nemutogen on lug boss intersects.

More preferable, a plurality of lug bosses are parallel to be distributed on the first surface of described matrix.

Further, the shape of the lug boss includes strip or sheet, and not limited to this.

Further, described a plurality of lug bosses be uniformly distributed or non-uniform Distribution described matrix first surface On.

More preferable, the width of the lug boss is 0.1 μm~100 μm, is highly 0.1 μm~400 μm.

More preferable, the distance between adjacent projections are 0.1 μm~100 μm.

More preferable, the lug boss surface is additionally provided with layers of photo-catalytic material and/or anti-biotic material layer.

More preferable, at least one of described matrix, the complex root nemutogen, described a plurality of lug bosses are extremely Few part is transparent configuration.

It is more preferable, a diameter of 1nm~50 μm of the nemutogen.

It is more preferable, between one end of one end of any of which nemutogen and another nemutogen adjacent with the nemutogen Distance be 1nm~50 μm.

More preferable, the length of the nemutogen is 50nm~200 μm.

It is more preferable, catalysis material or anti-biotic material is also extremely distributed with less than the nemutogen surface.

More preferable, at least local of at least one of described matrix and described complex root nemutogen is transparent knot Structure.

More preferable, the nemutogen is linear.

Further, the air intake of the first fluid passage has rule or irregular shape, the regular shape Including polygon, circle or ellipse.

More preferable, the aperture of the first fluid passage is 1 μm~1mm.

More preferable, the thickness of described matrix is more than 1 μm.

More preferable, the filtrating chip also complex root including the parallel first surface for being distributed in described matrix is horizontal Beam, the crossbeam transversely continuously extend in the first surface of described matrix, and wherein at least two crossbeams are respectively with described first The phase of the air intake of fluid passage back to both sides be disposed adjacent, an at least crossbeam is directly from the first fluid passage Pass through on air intake；And complex root nemutogen is distributed with any crossbeam, at least part in the complex root nemutogen The beam surface is fixed in one end of nemutogen, the other end extended obliquely out along the direction for being gradually distance from any crossbeam and/or Continuously extend on the face parallel to described matrix first surface, and with being distributed on another crossbeam adjacent to any crossbeam Complex root nemutogen intersect, so as to form the loose structure.

More preferable, at least two crossbeams directly pass through from the air intake of the first fluid passage.

More preferable, the nemutogen includes carbon nanocoils, CNT, ZnO nano-wire, GaN nano wire, TiO₂Receive Any of rice noodles, Ag nano wires, Au nano wires or two or more combinations, but not limited to this.

In more specific 3rd embodiment of the present utility model, the filtrating chip includes：

Matrix with first fluid passage, the first fluid passage have an air intake and air outlet slit, and described The air intake of one fluid passage is distributed in the first area of the first surface of described matrix；

Gas barrier portion, the second surface that there is the first surface with described matrix to be oppositely arranged are pending for preventing Air is directly entered the air intake of the first fluid passage；

The a plurality of lug bosses being intervally installed, described lug boss one end are fixedly installed on the first surface of described matrix Second area in, the other end is fixedly connected with the second surface in the gas barrier portion, wherein between adjacent projections away from From more than 0 but less than mixing in the particle diameter of the selected particle in pending air, the secondth area of the first surface of described matrix Domain abuts with first area, so that cooperatively forming second fluid between a plurality of lug bosses, gas barrier portion and matrix Passage, and pending air is only capable of entering first fluid passage by the second fluid passage.

Further, a plurality of lug bosses are set around the air intake of the first fluid passage.

Further, a plurality of lug bosses are also arranged at intervals with the 3rd region of the first surface of described matrix, it is described Second area is located between the 3rd region and first area.

More preferable, the aperture of the first fluid passage is 1 μm~1mm.

More preferable, the thickness of described matrix is more than 1 μm.

More preferable, the thickness in the gas barrier portion is 0.5 μm~200 μm.

More preferable, the lug boss surface is additionally provided with function material layer, and the material of the function material layer includes Catalysis material or anti-biotic material.

More preferable, at least local of at least part component in the air filter chip is transparent configuration.

Further, the 3rd region of the first surface of described matrix is set around the second area.

Further, the first area of the first surface of described matrix and second area be distributed in the gas barrier portion in In orthographic projection on the first surface of described matrix.

More preferable, the air filter chip also includes at least one supporter, described supporter one end with it is described Matrix is fixedly connected, and the other end is fixedly connected with the gas barrier portion.

More preferable, a plurality of lug bosses for being distributed in the 3rd region of the first surface of described matrix arrange to form tool There are the micron order or nanoscale arrays structure of super-hydrophobic or superoleophobic performance.

More preferable, the air filter chip includes the supporter described in two or more, and the two or more institute The supporter stated is symmetrically distributed in around the air intake of the first fluid passage.

More preferable, the air intake restocking of the first fluid passage is provided with a beam supported above, the support Beam is fixedly connected with the gas barrier portion.

Further, the lug boss is in the stand wire set, column, sheet, tubulose, taper, frustum structure Any one, and not limited to this.

Further, the lateral cross section of the lug boss has rule or irregular shape, and the regular shape includes more Side shape, circle or ellipse, but not limited to this.

Further, described a plurality of lug bosses be uniformly distributed or non-uniform Distribution described matrix first surface On.

Further, the air intake of the first fluid passage has rule or irregular shape, the regular shape Including polygon, circle or ellipse, but not limited to this.

More preferable, the lug boss is that wire is raised, and its draw ratio is 4：1~200000：1.

More preferable, the ratio of the distance between adjacent projections and the length of the lug boss is 1：4~1： 200000。

Micro wire or nano wire more preferable, that the lug boss is set for setting, its a diameter of 1nm~50 μm are long It is 1nm~50 μm to spend for the distance between 50nm~200 μm, adjacent projections.

In more specific 4th embodiment of the present utility model, the filtrating chip includes：

Matrix with first fluid passage, the first fluid passage have an air intake and air outlet slit, and described The air intake of one fluid passage is distributed in the first area of the first surface of described matrix；

Gas barrier portion, the second surface that there is the first surface with described matrix to be oppositely arranged are pending for preventing Air is directly entered the air intake of the first fluid passage；

A plurality of lug bosses, the lug boss transversely continuously extend in the second area of the first surface of described matrix, It is more than 0 formed with the groove for being available for air to pass through, the bore of the opening portion of the groove wherein between adjacent projections but is less than Mix in the particle diameter of the selected particle in pending air, and the first surface of the upper end of the lug boss and described matrix It is tightly connected, the regional area of lower end and the second surface in the gas barrier portion are tightly connected, so that described a plurality of convex More than one groove, gas barrier portion and base mate between the portion of rising form second fluid passage, and pending air is only First fluid passage can be entered by the second fluid passage.

Further, the second area of the first surface of described matrix is set around first area.

Further, the air intake of the regional area at the second end of the lug boss and the first fluid passage is divided equally In the orthographic projection that cloth is formed on first surface of the gas barrier portion in described matrix.

Further, the shape of the lug boss includes strip or sheet, but not limited to this.

Further, described a plurality of lug bosses be uniformly distributed or non-uniform Distribution described matrix first surface On.

Further, the air intake of the first fluid passage has rule or irregular shape, the regular shape Including polygon, circle or ellipse, but not limited to this.

More preferable, the width of the lug boss is 1nm~50 μm, is highly 50nm~200 μm.

More preferable, the size in the groove opening portion being formed between adjacent projections is 1nm~50 μm.

More preferable, the aperture of the first fluid passage is 1 μm~1mm.

More preferable, the thickness of described matrix is more than 1 μm.

More preferable, the thickness in the gas barrier portion is 0.5 μm~200 μm.

More preferable, the lug boss surface is additionally provided with function material layer, and the material of the function material layer includes Catalysis material or anti-biotic material.

More preferable, at least local of at least one of described matrix, gas barrier portion, lug boss is transparent knot Structure.

In more specific 5th embodiment of the present utility model, the filtrating chip includes：

Matrix with first fluid passage, the first fluid passage have an air intake and air outlet slit, and described The air intake of one fluid passage is distributed in the first surface of described matrix；

The a plurality of lug bosses being intervally installed, the lug boss are fixedly installed on the first surface of described matrix, And transversely continuously extend on the first surface of described matrix, formed with being available for what air passed through wherein between adjacent projections Groove, the bore of the opening portion of the groove, which is more than 0 but is less than, to be mixed in the particle diameter of the selected particle in pending air, with And wherein at least two lug boss respectively with the phase of the air intake of the first fluid passage back to both sides be disposed adjacent, At least one lug boss directly from the air intake of the first fluid passage by so that a plurality of lug bosses with The second fluid passage connected with the first fluid passage is cooperatively formed between matrix, and pending air is only capable of passing through institute State second fluid passage and enter first fluid passage.

More preferable, the filtrating chip also includes：Gas barrier portion, have relative with the first surface of described matrix The second surface of setting, the air intake of the first fluid passage are distributed in the gas barrier portion in the first of described matrix In the orthographic projection formed on surface, a plurality of lug bosses have mutually back to first end and the second end, the first end with The first surface of described matrix is tightly connected, and the second surface of the regional area at the second end and the occlusion part is tightly connected.

More preferable, a plurality of lug bosses are parallel to be distributed on the first surface of described matrix.

More preferable, the size of the opening portion for the groove being formed between adjacent projections is 1nm~50 μm.

More preferable, the aperture of the first fluid passage is 1 μm~1mm.

More preferable, the thickness of described matrix is more than 1 μm.

More preferable, the lug boss surface is additionally provided with function material layer, and the material of the function material layer includes Catalysis material or anti-biotic material.

More preferable, the thickness in the gas barrier portion is 0.5 μm~200 μm.

More preferable, at least local of at least one of described matrix, gas barrier portion, lug boss is transparent knot Structure.

In more specific 6th embodiment of the present utility model, the filtrating chip includes：

Matrix with fluid passage, and

The aggregation of complex root nemutogen, to flow through the fluid passage, be contaminated with the air of selected particle and enter Row processing；

The aggregation is distributed in the fluid passage, and has loose structure, the loose structure inside aperture it is straight Footpath is more than 0 but less than the particle diameter of the selected particle.

Further, inwall of the described nemutogen one end with the fluid passage is fixedly connected, and the other end is along the stream Body passage radially extends.

Further, the complex root nemutogen intersects or is interlaced with one another to form the loose structure.

Further, the complex root nemutogen is intervally installed and parallel arrangement forms the loose structure.

Further, described matrix have mutually back to first surface and second surface, the air of the fluid passage enters Mouth is distributed in the first surface of described matrix.

Further, the first surface of described matrix is also distributed with the complex root being intervally installed and erects nemutogen, institute State complex root and erect nemutogen around fluid passage setting.

Further, the filtrating chip also includes gas barrier portion, and the gas barrier portion has and described matrix The 3rd surface that first surface is oppositely arranged, and the complex root erect that nemutogen one end is fixedly installed on described matrix the One surface, the other end are fixedly connected with the 3rd surface in the gas barrier portion, wherein the distance between adjacent setting nemutogen More than 0 but less than the particle diameter of the selected particle.

More preferable, the first surface of described matrix is additionally provided with function material layer, the material of the function material layer Including catalysis material or anti-biotic material.

More preferable, at least part component in the air filter chip has transparent configuration.

Further, there is the air intake of the fluid passage rule or irregular shape, the regular shape to include Polygon, circle or ellipse, but not limited to this.

More preferable, the aperture of the fluid passage is 1 μm~1mm.

More preferable, the thickness of described matrix is more than 1 μm.

Further, the air intake of the fluid passage and complex root erect nemutogen and are distributed in the gas barrier portion In in the orthographic projection of the first surface of described matrix.

More preferable, the draw ratio for erectting nemutogen is 4：1~200000：1.

More preferable, adjacent the distance between nemutogen and the ratio of the length of the setting nemutogen erect is 1：4 ~1： 200000.

It is more preferable, a diameter of 1nm~500 μm of the nemutogen.

More preferable, the nemutogen is selected from nano wire or nanotube.

It is more preferable, catalysis material or anti-biotic material is also extremely distributed with less than the nemutogen surface.

More preferable, the nemutogen includes carbon nanocoils, CNT, ZnO nano-wire, GaN nano wire, TiO₂Receive Any of rice noodles, Ag nano wires, Au nano wires or two or more combinations, but not limited to this.

Than prior art, the advantages of the utility model at least that：

1) nasal obstruction type respirator filterability provided by the utility model is good, breathing is convenient, comfort is good, can be used for multiple times, Service life is grown；

2) filtrating chip in the utility model is at least with flux is big, flow resistance is small, energy high-efficient cleaning removes micro-/ nano in air It the features such as grade particles, can also use thicker matrix, high mechanical strength, (ultrasound) cleaning and can be used for multiple times, service life It is long, and preferably there is self-cleaning function, while its preparation technology is simply controllable, is prepared on a large scale suitable for scale.

Brief description of the drawings

In order to illustrate more clearly of the utility model architectural feature and technical essential, below in conjunction with the accompanying drawings and specific embodiment party The utility model is described in detail formula.

Fig. 1 is a kind of structural representation of nasal obstruction type respirator in the exemplary embodiments of the utility model one；

Fig. 2 is a kind of top view of filtrating chip in the embodiment of the utility model the 1st；

Fig. 3 is a kind of partial sectional view of filtrating chip in the utility model first embodiment (A-A to)；

Fig. 4 is a kind of preparation technology flow chart of filtrating chip in the utility model first embodiment；

Fig. 5 is a kind of top view of filtrating chip in the utility model second embodiment；

Fig. 6 is a kind of partial sectional view of filtrating chip in the utility model second embodiment；

Fig. 7 is a kind of preparation technology flow chart of filtrating chip in the utility model second embodiment；

Fig. 8 is a kind of sectional view of filtrating chip in the utility model 3rd embodiment；

Fig. 9 a- Fig. 9 e are the view in transverse section of some lug bosses in the utility model 3rd embodiment；

Figure 10 a- Figure 10 c are the arrangement schematic diagram of some lug bosses in the utility model 3rd embodiment；

Figure 11 a- Figure 11 c are the top view of a variety of filtrating chips in the utility model 3rd embodiment；

Figure 12 is a kind of sectional view of filtrating chip in the utility model fourth embodiment；

Figure 13 is a kind of sectional view of filtrating chip in the embodiment of the utility model the 5th；

Figure 14 is a kind of sectional view of filtrating chip in the utility model sixth embodiment；

Figure 15 is a kind of sectional view of filtrating chip in the embodiment of the utility model the 7th；

Figure 16 is a kind of preparation technology flow chart of filtrating chip in the embodiment of the utility model the 8th；

Figure 17 is a kind of preparation technology flow chart of filtrating chip in the embodiment of the utility model the 9th；

Figure 18 is a kind of top view of filtrating chip in the embodiment of the utility model the tenth；

Figure 19 is a kind of partial sectional view of filtrating chip in the embodiment of the utility model the tenth；

Figure 20 is a kind of top view of filtrating chip in the embodiment of the utility model the 11st；

Figure 21 is a kind of partial sectional view of filtrating chip in the embodiment of the utility model the 12nd；

Figure 22 is a kind of partial sectional view of filtrating chip in the embodiment of the utility model the 13rd；

Figure 23 is a kind of top view of filtrating chip in the embodiment of the utility model 14；

Figure 24 is a kind of partial sectional view of filtrating chip in the embodiment of the utility model 15；

Figure 25 is a kind of preparation technology flow chart of filtrating chip in the embodiment of the utility model 16.

Embodiment

A kind of nasal obstruction type respirator that the utility model embodiment provides includes：

Nasal obstruction and filtrating chip, the one end of at least described nasal obstruction are inserted into the nasal cavity of user, and the nasal obstruction bag Containing the gas passage connected with the nasal cavity, the filtrating chip to filter out mix in it is in pending air-flow, particle diameter is big In the particle of setting value, pending gas enters the gas passage in the nasal obstruction after flowing through the filtrating chip；And

Filtrating chip safeguard structure, to protect the filtrating chip.

In some embodiments, the filtrating chip safeguard structure includes the first fixed hard filter screen and the second fixation Formula hard filter screen, the filtrating chip are arranged between the first fixed hard filter screen and the second fixed hard filter screen.

In some embodiments, the nasal obstruction type respirator also includes the first filtration fabrics and/or the second filtration fabrics, First filtration fabrics be distributed in it is described nasal obstruction filtrating chip between, the filtrating chip be distributed in the second filtration fabrics with Between nasal obstruction.

In some embodiments, the nasal obstruction type respirator also includes the first detachable hard filter screen and/or second Removable hard filter screen, the first detachable hard filter screen are fixedly connected with the first filtration fabrics, and described second is detachable Formula hard filter screen is fixedly connected with the second filtration fabrics.

More preferable, the nasal obstruction is had a stuffy nose using waist-drum-shaped, and it can partly or wholly insert human nasal intracavitary.

More preferable, the nasal obstruction type respirator also includes the housing of a both ends open, the dismountable peace of nasal obstruction Loaded on the shell one end, the filtrating chip is placed in the housing.On the one hand the housing can be realized to filtrating chip Further protection, on the other hand can also house foregoing various assemblies so that the respiratory organ structure it is compact firmly.The housing It is preferred that use hard shell.

It is a kind of nasal obstruction type respirator in the exemplary embodiments of the utility model one to refer to shown in Fig. 1, and it can include：

Hard shell 11,

Embedded hard silk screen component, including transverse direction, be positioned apart from the embedded hard silk screen of two panels in shell 11 12；

Filter wire piece of cloth component, including transverse direction, be positioned apart from the two panels filter wire piece of cloth 13 in shell 11, two Piece filter wire piece of cloth 13 is located between the embedded hard silk screen 12 of two panels, and is fixedly arranged on respectively on embedded hard silk screen 12；

Fixed hard silk screen component, including transverse direction, be positioned apart from the fixed hard silk screen of two panels in shell 11 14, fixed hard silk screen 14 is located between two panels filter wire piece of cloth 13；

Filtrating chip 16, it is horizontally set in shell 11, and between the fixed hard silk screen 14 of two panels；

Waist-drum-shaped nasal obstruction 15, including connection lamellar body 151 and two noses of the face convex stretching by connection lamellar body 151 Fill in main body 152, waist-drum-shaped nasal obstruction 15 through connect lamellar body 151 be embedded at shell 11 inner chambers one end, and have a stuffy nose main body 152 with The intracavity inter-connection of shell 11.

Preferably, internal chamber wall of the both ends of embedded hard silk screen 12 respectively removably with shell 11 is connected.Filter wire Internal chamber wall of the both ends of piece of cloth 13 respectively with shell 11 connects, and its one side is fixedly connected with embedded hard silk screen 12, and its is another Simultaneously it is erected on the boss protruded out by the internal chamber wall of shell 11.The both ends of fixed hard silk screen 14 are fixedly arranged on shell respectively On 11 internal chamber wall.The both ends of filtrating chip are fixedly arranged on the internal chamber wall of shell 11 respectively.

In the utility model, foregoing filtration chip can be prepared using MEMS (making technology of MEMS), Therefore MEMS filtrating chips can also be named as.

Refer to shown in Fig. 2-Fig. 3, in an embodiment (being named as first embodiment) of the present utility model, one kind filtering Chip includes matrix 101, described matrix 101 have mutually back to first surface 1011 and second surface 1012, and described matrix Some through holes 102 as fluid passage are distributed with 101, the first surface is provided with multiple crossbeams 103 and (can be named as convex The portion of rising) array that is formed of parallel arrangement, wherein have more crossbeams 103 directly from through hole 102 across and have a more crossbeams 103 The both sides of through hole 102 are distributed in, wherein, each top of crossbeam 103, which further averages, is furnished with hat-shaped structure 104 (abbreviation cap layers), and each cap layers are also Transversely continuously extend with each crossbeam, and form the array of hat-shaped structure, and pending air can not bypass foregoing hat knot The array of structure and be directly entered the through hole 102.

Wherein, by adjusting the spacing between foregoing each hat-shaped structure, you can forming the opening portion with selected size (can To be referred to as fluid channel), realize and processing is purged to the particle of different-grain diameter scope in air, particularly, when by these hats The spacing of structure is controlled in nanoscale, can remove the atomic small particle (nano level particle) in air.

Foregoing crossbeam can be strip, and have larger width and thickness so that these crossbeams can have higher machinery Intensity, it is set to form preferable support to hat layer, and the spacing of each crossbeam can be with larger, to provide larger air flux.

Foregoing cap layers can also have larger thickness, and its both sides reaches the spacing of adjacent cap layers along epitaxial lateral overgrowth To very little, such as can be with as little as 1nm, therefore can retain and mix in the minimum particle in pending air.

Foregoing cap layers can be wholely set with lug boss, for example, can by evaporate, deposit, grow etc. it is (typical such as gold Category sputtering, MOCVD, PECVD, electrochemical deposition etc.) technology is formed directly into the lug boss top, and the hat knot Structure also transversely can continuously extend with the lug boss, so that forming opening of transversely continuously extending between adjacent hat-shaped structure Oral area, so on the one hand it can ensure, to mixing in the processing of the selected particle in pending air, also also to keep very high Flux, and difficulty of processing is reduced, save cost.

The material of foregoing cap layers can be selected from insulating dielectric materials such as silica, silicon nitride aluminum oxide, boron-phosphorosilicate glass etc., Or semi-conducting material such as Si, ZnO, GaN, TiO₂, InN etc., or metal material such as Ag, Au, Al, Ni, Cr, Ti etc., it is but unlimited In this.

Wherein, described matrix 101 can have larger thickness, it is formed preferably foregoing micro-/ nano chip arrays Support, while the mechanical strength of the filtrating chip can be increased further, make the filtrating chip is pressure-resistant, resistant to bending, resistance to touch Hit, impact resistance, and then it is applied and will not be damaged in a variety of environment, such as can apply to empty to high pressure, high speed Gas is handled, and this function is that existing perforated membrane etc. can not be reached.

Wherein, the material selection range of the filtrating chip each several part (101,102,103,104) is various, Ke Yishi Inorganic material or organic material, such as metal, non-metal inorganic material, plastics, ceramics, semiconductor, glass, polymerization Thing etc..When these parts all select to use inorganic material, the filtrating chip also has the characteristic of resistance to temperature change, can locate Manage high temperature and Cryogenic air.

Using previous designs filtrating chip can (ultrasound) cleaning, be used for multiple times, and remain at good air Reason ability.

When being handled using described filtrating chip air, air (air flow such as Fig. 3 containing impurity particle In with dotted line arrow shown in) state the array of hat-shaped structure before entry when, wherein particle diameter be more than certain numerical value particle (or Water droplet in some drops incompatible with air, such as water droplet or oil in air) it is blocked in the battle array of foregoing hat-shaped structure Outside row, opening portion of the air between each hat-shaped structure enters back into through hole 102 after reaching the porch of through hole 102 afterwards, Realize the purification to air and/or the enriching and recovering to required particle (drop).

In some concrete application schemes of the embodiment, the gap of foregoing each cap layers can be 1nm~50 μm, cap layers Height can be 50nm~200 μm.

In some concrete application schemes of the embodiment, the aperture of aforementioned through-hole can be 1 μm~1mm, aforementioned substrates Thickness can be with>1μm.

In some concrete application schemes of the embodiment, foregoing horizontal depth of beam can be 0.1 μm~400 μm, width Can be 0.1um~100 μm, the spacing of each crossbeam can be 0.1 μm~100 μm.

The longitudinal cross-section of opening portion before being formed at adjacent hat layer and adjacent beams can be rule or irregular shape Shape, such as can be trapezoidal, polygon (triangle, quadrangle or other), circle, ellipse, star etc..

Foregoing crossbeam and hat layer can regular or irregular, uniform or the first table heterogeneous for being distributed in described matrix On face.

In addition, in this first embodiment, the shape of aforementioned through-hole 102 can be various, such as can be circular, just Square, rectangle or other shapes.

In some other embodiment of the present utility model, a kind of filtrating chip can have with it is any in previous embodiment The similar structure of person, difference are：Layers of photo-catalytic material is also provided with crossbeam, hat layer and matrix surface.With , can also be to one in air if being aided with ultraviolet lighting etc. when filtrating chip comprising layers of photo-catalytic material is handled air A little organic pollutions etc. carry out photocatalytic degradation, realize the multiple purifying to air.

Wherein, for the benefit of light penetrates, in the hat layer, crossbeam and matrix partly or entirely can be by transparent material It is made.In some specific embodiments of the present embodiment, the hat layer, crossbeam can be integrally made of clear material, example As light is injected.

Wherein, more typical catalysis material can be titanium dioxide etc., but not limited to this.

Wherein, to form the layers of photo-catalytic material, those skilled in the art can use various ways known to industry, Such as (spin coating, spraying, printing etc.) is coated with, is physically or chemically vapor-deposited (such as MOCVD, PECVD, ald), splashes Penetrate etc., and not limited to this.

Wherein, the thickness of the layers of photo-catalytic material can be controlled in nanoscale, to reduce it to the filtering as far as possible The influence of the air flux of chip.

The structure of matrix, hat layer, crossbeam, through hole employed in the embodiment etc., set form, material etc. can with it is preceding Text is addressed same or similar, so here is omitted.

In some other embodiment of the present utility model, a kind of filtrating chip can have with it is any in previous embodiment The similar structure of person, difference are：Anti-biotic material layer is also provided with crossbeam, hat layer and matrix surface.In Yi Bao When the filtrating chip of the layer containing anti-biotic material is handled air, it can synchronously be killed in the processing procedure of air in air Bacterium, virus etc., realize the multiple purifying to air.

Wherein, more typical anti-biotic material can be noble metals such as Au, Ag etc., but not limited to this.

Wherein, to form the anti-biotic material layer, those skilled in the art can use various ways, example known to industry Such as it is coated with (spin coating, spraying, printing), is physically or chemically vapor-deposited (such as MOCVD, PECVD, ald), sputtering Etc., and not limited to this.

Wherein, the thickness of the anti-biotic material layer can be controlled in nanoscale, to reduce it to the filtration core as far as possible The influence of the air flux of piece.

The structure of matrix, hat layer, crossbeam, through hole employed in the embodiment etc., set form, material etc. can with it is preceding Text is addressed same or similar, so here is omitted.

The filtrating chip of the present utility model can prepare by physics, chemical method, such as can be chemically grown Method, Physical Processing method etc., particularly MEMS (MEMS, Microelectromechanical Systems) method etc..

In other embodiments of the present utility model, a kind of preparation technology of filtrating chip may include steps of：

S1：Substrate (such as silicon chip) is provided；

S2：Make the lines of micro-nano-scale by lithography on a side surface (being named as first surface) for substrate, that is, form figure The photoresist mask of shape；

S3：Go out micro-nano meter ruler in the first surface etching (RIE, ICP, wet etching, electrochemical corrosion etc.) of the substrate More crossbeams of degree, remove the photoresist mask afterwards；

S4：The substrate and first surface mutually back to another side surface (being named as second surface) on photoetching is set Glue etching mask；

S5：Another side surface of the substrate is performed etching, until being formed in another side surface of the substrate Through hole as fluid passage；

S6：Photoresist etching mask is removed, is deposited or deposits or grow on the surface for having crossbeam side for having substrate afterwards Cap layer structure.The phenomenon extended laterally be present during evaporation or deposition or growth technique, cap layers gap can be made with thickness Increase and reduce, minimum can reach several nanometers.

S7：Scribing, encapsulation, filtrating chip is made (step is not shown in figure).

The lithographic method used in These steps can also be photoetching, Mechanical lithography, dry etching, wet etching etc..

For example, in abovementioned steps, forming the method for patterned photoresist mask includes：Photoetching technique, nanometer bead Mask technique, nanometer (metal) particle mask technology etc., and not limited to this.

Obviously, the preparation technology of filtrating chip is simple controllable in the first embodiment, is adapted to mass to give birth on a large scale Production, and obtained filtrating chip at least has the following advantages that：(1) flux is big, and flow resistance is small；(2) physical filtering, it can effectively remove and be more than The particle in nanometer gap；(3) great-leap-forward crossbeam and larger substrate thickness, it is ensured that high mechanical properties；(5) can (ultrasound) Cleaning, is used for multiple times.

Refer to shown in Fig. 5, in second embodiment of the present utility model, a kind of filtrating chip includes matrix 201, described Matrix 201 have mutually back to first surface 2011 and second surface 2012, and some conducts are distributed with described matrix 201 The through hole 204 of fluid passage.More crossbeams 203 of parallel arrangement are provided with the first surface 2011, the crossbeam 203 exists Transversely continuous extension on the first surface, some crossbeams 203 therein from the through hole 204 continuously across, therefore Great-leap-forward crossbeam 203 can be considered as.More nano wires 202 are distributed with any of which crossbeam 203, the more nano wires 202 one end is both secured to any surface of crossbeam 203, and the other end prolongs along the direction for being gradually distance from any crossbeam 203 is oblique Stretch and (be also regarded as extending laterally), and the more nano wires with being distributed on another crossbeam adjacent to any crossbeam 203 202 intersect, so as to form the loose structure 205.Referring to Fig. 5, the loose structure 205 is with the visual angle of vertical view It is viewed as covering the network of the through hole 204.The diameter of the Hole of loose structure 205 be more than 0 but less than mix in The particle diameter of selected particle in pending fluid.And refer to Fig. 5-Fig. 6, it can be seen that the more X-shapes of nano wire 102 Into the first surface 2011 of loose structure 205 and described matrix 201 cooperatively form another fluid passage so that it is pending Fluid 206 is only capable of entering the through hole 204 by another fluid passage.

Wherein, because foregoing nano wire has larger ratio of height to diameter (or draw ratio) so that these nano wires can intensive row The first surface of described matrix is distributed in, by adjusting the density of spacing and these nano wires between foregoing crossbeam, length, prolonging Stretch direction etc., you can the particle of different-grain diameter scope is purged processing in convection body, and particularly, what it is when use is nano wire When, by the hole pore size control that forms these nanowire crossbars in nanoscale, can not only remove atomic small in fluid Particle, and because nano wire diameter itself is minimum, it is controlled in very low level, and shape for the resistance of fluid Into very big fluid flux, far superior to existing perforated membrane, filtrating chip based on transverse flow channels etc..

Wherein, if with reference to known to industry scheme, the arrangement mode of foregoing nano wire is carried out to certain design, may be used also Be allowed to form super-drainage structure, superoleophobic structure, can not only remove the particle in fluid, and can also by automatic cleaning action, The particle for making to be blocked can not gather in the functional area (nano-wire array surface) of the filtrating chip, avoid the filtration core Piece fails after long-term use.

Wherein, the crossbeam 203 can on the first surface 2011 of described matrix 201 with suitable Density Distribution, with Make the filtrating chip that there is fluid processing flux as high as possible.And the crossbeam 203 can have suitable width, with The crossbeam 203 is set also to avoid causing excessively the flux of the filtrating chip while with enough mechanical strengths Influence.For example, the horizontal depth of beam can be 0.1 μm~100 μm, width can be 0.1 μm~400 μm, between crossbeam Spacing can be 0.1 μm~100 μm.

Wherein, described matrix 201 can make with larger thickness and the crossbeam 203 with larger height It forms preferable support to foregoing nano-wire array, while the mechanical strength of the filtrating chip can be increased further, and makes The filtrating chip is pressure-resistant, resistant to bending, impact resistant, impact resistance, and then it is applied and will not be damaged in a variety of environment, Such as can apply to handle high pressure, high-velocity fluid, this function is that existing perforated membrane etc. can not be reached.

Wherein, the material selection range of the filtrating chip each several part (201,202,203) is various, can be inorganic Material or organic material.When these parts all select to use inorganic material, the filtrating chip also has resistance to temperature The characteristic of change, high temperature and cryogen can be handled.

Using previous designs described filtrating chip can (ultrasound) cleaning, be used for multiple times, and remain on good Fluid handling abilities.

When being handled using described filtrating chip convection body, the fluid containing impurity particle is stated porous before entry During structure 205, wherein particle diameter is more than particle (or some drops incompatible with fluid, such as the water in air of certain numerical value Water droplet in drop or oil) it is blocked in outside previous porous structure 205, gap of the fluid between each nano wire reaches afterwards Through hole 204 is entered back into behind the porch of through hole 204, realizes the purification of convection body and/or the enrichment to required particle (drop) Recovery.

Referring to shown in Fig. 5, in some concrete application schemes of the embodiment, the diameter of foregoing nano wire 202 Can be 1nm~50 μm with spacing, long 6 degree (height) can be 50nm~200 μm.The aperture of the through hole 104 can be 1 μm ~1mm.The thickness of described matrix can be more than 1 μm.

The lateral cross section structure of foregoing nano wire can be rule or irregular shape, such as can be polygon (three Angular, quadrangle is other), circular, ellipse, star etc..

Foregoing nano wire 202 can regular or irregular, uniform or the first table heterogeneous for being distributed in described matrix 201 On face.

The array formed by these nano wires 202 can have super-drainage structure, and then the filtrating chip is had certainly Cleaning function.

Foregoing nano wire 202 can preferably be selected from carbon nanocoils, CNT, ZnO nano-wire, GaN nano wire, TiO₂Receive Rice noodles, Ag nano wires, Au nano wires etc., and not limited to this.

Foregoing nano wire 202 can pass through external world's transfer, growth in situ (such as chemically grown, electrochemical growth) or deposition Modes such as (such as physics, chemical vapor depositions, electro-deposition) is fixed on described matrix surface or in described matrix superficial growth Formed.

The shape shape of lateral cross section (particularly) of aforementioned through-hole 204 can be various, such as can be circular, just Square, rectangle, rhombus, polygon or Else Rule or irregular shape.

In some concrete application schemes of the embodiment, the nano wire 202 can be by catalysis material or with anti- Bacterium, the material of sterilizing function are formed, or, the nano wire 202 can also be surface covered with catalysis material or with killing The coating that bacterium, the material of antibacterial functions are formed.

For example, the nano wire 202 can use ZnO nano-wire, GaN nano wire, TiO2 nano wires etc. with light-catalysed The nano wire of property, under light auxiliary irradiation, the organic matter in the fluid that can degrade.

For example, the nano wire 202 can use Ag nano wires, Au nano wires etc., with kill the bacterium in fluid, virus, Microorganism.

In some concrete application schemes of the embodiment, light is additionally provided with the first surface 2011 of described matrix 201 Cati material or anti-biotic material layer etc..

When being handled with the filtrating chip convection body comprising layers of photo-catalytic material, if being aided with ultraviolet lighting etc., may be used also Some organic pollutions in convection body etc. carry out photocatalytic degradation, realize the multiple purifying of convection body.

Wherein, for the benefit of light penetrates, in described matrix, lug boss, nano wire partly or entirely can be by transparent material Material is made.

Wherein, more typical catalysis material can be titanium dioxide etc., but not limited to this.

Wherein, to form the layers of photo-catalytic material, those skilled in the art can use various ways known to industry, Such as (spin coating, spraying, printing etc.) is coated with, is physically or chemically vapor-deposited (such as MOCVD, PECVD, ald), splashes Penetrate etc., and not limited to this.

Wherein, the thickness of the layers of photo-catalytic material can be controlled in nanoscale, to reduce it to the filtering as far as possible The influence of the fluid flux of chip.

And when being handled with the filtrating chip convection body comprising anti-biotic material layer, can be in the processing procedure of fluid In, bacterium in fluid, virus etc. are synchronously killed, realizes the multiple purifying of convection body.

Wherein, more typical anti-biotic material can be noble metals such as Au, Ag etc., but not limited to this.

Wherein, to form the anti-biotic material layer, those skilled in the art can use various ways, example known to industry Such as it is coated with (spin coating, spraying, printing), is physically or chemically vapor-deposited (such as MOCVD, PECVD, ald), sputtering Etc., and not limited to this.

Wherein, the thickness of the anti-biotic material layer can be controlled in nanoscale, to reduce it to the filtration core as far as possible The influence of the fluid flux of piece.

The filtrating chip of the present utility model can prepare by physics, chemical method, such as can be chemically grown Method, Physical Processing method etc., particularly MEMS (MEMS, Microelectromechanical Systems) method etc..

For example, referring to shown in Fig. 7, in this embodiment, a kind of preparation technology of filtrating chip can include following step Suddenly：

S1：The Seed Layer for nanowire growth is deposited on the first surface of substrate (such as silicon chip).

S2：Patterned photoresist mask is set in the Seed Layer, and it includes the lines for making micro-nano-scale by lithography.

S3：The first surface of the substrate is performed etching using the photoresist mask, so as to the of the substrate One surface forms the beam structure for more micro-nano-scales being intervally installed, and removes the photoresist mask afterwards.

S4：The patterned etching mask for setting photoresist to be formed on the second surface of the substrate.

S5：The second surface of the substrate is performed etching, and is etched to the crossbeam bottom, so as in the substrate Second surface forms the slotted eye as fluid passage, and removes photoresist.

S6：Nano wire is grown on the seed layer, controls the growth conditions of nano wire, nano wire is had certain lateral growth Ratio, and form the intersection grid of micro-nano-scale.

S7：Scribing, encapsulation, filtrating chip is made.

The lithographic method used in These steps can be photoetching, Mechanical lithography, dry etching, wet etching etc..

For example, in abovementioned steps, forming the method for the photoresist mask of graphical (nano graph) includes：Photoetching skill Art, nanometer bead mask technique, nanometer (metal) particle mask technology etc., and not limited to this.

For example, in abovementioned steps, can be rotten by mode known to industry, such as RIE, ICP, wet etching, electrochemistry Erosion etc. etches crossbeam 203, through hole 204 etc..

Obviously, the preparation technology of the utility model filtrating chip is simple controllable, is adapted to mass large-scale production.

Refer to shown in Fig. 8 and Figure 11 a- Figure 11 b, in 3rd embodiment of the present utility model, a kind of filtrating chip bag Matrix 301 is included, described matrix 301 has first surface 301a, and (dotted line encloses in figure for the first area 3011 of described matrix 301 The region of conjunction) some through holes 304 as fluid passage are distributed with, it is provided with more vertical micro-/ nanos on the first surface What line/pipe 303 (that is, any of micron-sized line, micron-sized pipe, nano wire, nanotube or a variety of combinations) was formed Array, the more micro-/ nano lines that the through hole 304 being distributed in the second area 3012 of circular first area 3011 is distributed/ The top of pipe 303 is also associated with flow impedance portion 302, and the flow impedance portion 302 is arranged at the fluid intake of the through hole 304 Top, pending fluid can not be bypassed foregoing micro-/ nano line/pipe array and is directly entered the through hole 304, the stream Body stop part 302 has the second surface 302b being oppositely arranged with the first surface 3011.And in the first surface 3011 Remaining region 3013 (the 3rd region can be named as) in also can the vertical micro-/ nano line/pipe 303 of more of dense distribution.In Fig. 8 In, the arrow with dotted line shows the direct of travel of fluid.

Wherein, because foregoing micro-/ nano line/pipe has larger ratio of height to diameter (or draw ratio) so that these micro-/ nanos Line/pipe can the densely arranged first surface in described matrix, by the spacing for adjusting these micro-/ nano line/pipes, you can convection body The particle of middle different-grain diameter scope is purged processing, particularly, when use be nano wire/pipe when, by the way that these are received Spacing control between rice noodles/pipe can not only remove the atomic small particle in fluid in nanoscale, and because nano wire/ Pipe diameter itself is minimum, it is controlled in very low level for the resistance of fluid, and forms very big fluid flux, Far superior to existing perforated membrane, filtrating chip based on transverse flow channels etc..

Wherein, if with reference to known to industry scheme, foregoing micro-/ nano line/pipe array is carried out to certain design, may be used also Be allowed to form super-drainage structure, superoleophobic structure, can not only remove the particle in fluid, and can also by automatic cleaning action, The particle for making to be blocked can not gather in the functional area (micro-/ nano line/pipe array surface) of the filtrating chip, avoid described Filtrating chip fails after long-term use.

Wherein, described matrix 301 can have larger thickness, it is formed preferably foregoing micro-/ nano line/pipe array Support, while the mechanical strength of the filtrating chip can be increased further, makes the filtrating chip pressure-resistant, resistant to bending, resistance to Collision, impact resistance, and then it is applied and will not be damaged in a variety of environment, such as can apply to high pressure, high speed Fluid is handled, and this function is that existing perforated membrane etc. can not be reached.

Wherein, the flow impedance portion can be that sheet, its thickness etc. can adjust according to practical application request.

Wherein, the material selection range of the filtrating chip each several part (301,302,303,304) is various, Ke Yishi Inorganic material or organic material, such as metal, non-metal inorganic material, plastics, ceramics, semiconductor, glass, polymerization Thing etc..When these parts all select to use inorganic material, the filtrating chip also has the characteristic of resistance to temperature change, can locate Manage high temperature and cryogen.

Using previous designs described filtrating chip can (ultrasound) cleaning, be used for multiple times, and remain on good Fluid handling abilities.

When being handled using described filtrating chip convection body, the fluid containing impurity particle state before entry it is micro-/ During the array that nano wire 303 forms, wherein particle diameter is more than particle (or some drops incompatible with fluid, the example of certain numerical value Such as the water droplet in the water droplet or oil in air) be blocked in outside foregoing micro-/ nano line/pipe array, afterwards fluid via it is each it is micro-/ Gap between nano wire/pipe enters back into through hole 304 after reaching the porch of through hole 304, realize convection body purification and/or To the enriching and recovering of required particle (drop).

Referring to shown in Fig. 8, in some concrete application schemes of the fourth embodiment, foregoing micro-/ nano line Diameter can be 1nm~50 μm, length (height) h₁Can be that the distance between 50nm~200 μm, adjacent micro-/ nano line can be with For 1nm~50 μm.The aperture w of the through hole 304 can be 1 μm~1mm.The thickness h of described matrix₂Can be more than 1 μm.Institute State the thickness h in flow impedance portion₃It can be 0.5 μm~200 μm.

Referring to Fig. 9 a- Fig. 9 e, the lateral cross section structure of foregoing micro-/ nano line can be rule or irregular shape , such as can be polygon (triangle, quadrangle or other), circle, ellipse, star etc..

Referring to Figure 10 a- Figure 10 c, foregoing micro-/ nano line can be regular or irregular, uniform or heterogeneous point Cloth is on the first surface of described matrix.In some more specific application schemes, the average headway of adjacent micro-/ nano line exists 1nm~50 μm.

In addition, refer to Figure 11 a- Figure 11 c, in the fourth embodiment, aforementioned through-hole 304 and flow impedance portion 302 Shape (the particularly shape of lateral cross section) can be various, such as can be circular, square, rectangle or other shapes Shape.

Refer to shown in Figure 12, more preferably, in fourth embodiment of the present utility model, a kind of filtrating chip includes Matrix 401, described matrix 401 have first surface and with the first surface mutually back to and the 3rd surface, and described matrix 401 On some through holes 404 as fluid passage are distributed with, more vertical micro-/ nano line/pipes 403 are provided with the first surface The array of formation, flow impedance portion is also associated with around the top of more micro-/ nano line/pipes 403 of the through hole 404 distribution 402, the flow impedance portion 402 is arranged above the fluid intake of the through hole 404, pending fluid is not bypassed Foregoing micro-/ nano line/pipe array and be directly entered the through hole 404.Also, around the through hole 404 also symmetrically or not More than one, such as four supporters 405 are symmetrically distributed with, can also increase to the fluid by the supporter 405 The support of stop part 402, the more cooperation of firm stable between flow impedance portion and matrix is realized, and can be effectively to being distributed in Micro-/ nano line between flow impedance portion and matrix/pipe array forms protection, avoid because flow impedance portion and/or matrix by After being acted on to external force, micro-/ nano line/pipe 403 caused by the extruding of foregoing micro-/ nano line/pipe array, which caves in, damaged, etc. asks Topic.

Wherein, the supporter can be variform, such as can have rectangle, trapezoidal, step longitudinal cross-section (longitudinal direction herein can be regarded as perpendicular to the direction of described matrix first surface) etc., and not limited to this.In second implementation In some specific embodiments of example, the supporter can be to project upwards the boss to be formed from the edge part of through hole 404 Deng its upper end connection flow impedance portion 402.

Wherein, the quantity of the supporter, diameter, distribution density etc. can adjust according to being actually needed, but it is few to try one's best Occupancy described matrix first surface space, avoid its fluid flux to the micro-/ nano line from causing big influence.

The structure of matrix, micro-/ nano line/pipe array, flow impedance portion, through hole employed in the second embodiment etc., Setting form, material etc. can with address above it is same or similar, so here is omitted.

Refer to shown in Figure 13, more preferably, in the 5th embodiment of the present utility model, a kind of filtrating chip includes Matrix 501, described matrix 501 have first surface and with the first surface mutually back to and the 3rd surface, and described matrix 501 On some through holes 504 as fluid passage are distributed with, more vertical micro-/ nano line/pipes 503 are provided with the first surface The array of formation, flow impedance portion is also associated with around the top of more micro-/ nano line/pipes 503 of the through hole 504 distribution 502, the flow impedance portion 502 is arranged above the fluid intake of the through hole 504, pending fluid is not bypassed Foregoing micro-/ nano line/pipe array and be directly entered the through hole 504.Also, also being set up on the through hole 504 has one More than, such as the more support beams 505 symmetrically or non-symmetrically arranged, it can also increase to the stream by the support beam 505 The support of body stop part 502, the more cooperation of firm stable between flow impedance portion and matrix is realized, and can be effectively to distribution Micro-/ nano line/pipe array between flow impedance portion and matrix forms protection, avoids because flow impedance portion and/or matrix exist After being acted on by external force, micro-/ nano line/pipe 503 caused by the extruding of foregoing micro-/ nano line/pipe array, which caves in, damaged, etc. asks Topic.

Wherein, the support beam can be variform, such as can be with arch-shaped etc., and not limited to this.And further , the support beam can also coordinate with other supporters, such as the supporter addressed in the 5th embodiment coordinates.

Wherein, the quantity of the support beam, size, distribution density etc. can adjust according to being actually needed, but it is few to try one's best The fluid intake for blocking the through hole, avoid its fluid flux to the filtrating chip from causing big influence.

The structure of matrix, micro-/ nano line/pipe array, flow impedance portion, through hole employed in the sixth embodiment etc., Setting form, material etc. can with address above it is same or similar, so here is omitted.

Refer to shown in Figure 14, more preferably, in sixth embodiment of the present utility model, a kind of filtrating chip includes Matrix 601, described matrix 601 have first surface 6011 and with the first surface mutually back to the 3rd surface 6012, it is and described Some through holes 604 as fluid passage are distributed with matrix 601, more vertical nano-pillars are provided with the first surface 603 arrays formed, flow impedance portion 602 is also associated with around the top of more nano-pillars 603 of the through hole 604 distribution, The flow impedance portion 602 is arranged above the fluid intake of the through hole 604, pending fluid is not bypassed foregoing Nano column array and be directly entered the through hole 604.Also, the first of the surface of nano-pillar 603 and described matrix 601 Layers of photo-catalytic material 605 is additionally provided with surface.Handled with the filtrating chip convection body comprising layers of photo-catalytic material 605 When, if being aided with ultraviolet lighting etc., some organic pollutions that can also be in convection body etc. carry out photocatalytic degradation, realize convection body Multiple purifying.

Wherein, for the benefit of light penetrates, in the flow impedance portion, matrix, lug boss partly or entirely can be by saturating Bright material is made.In some specific embodiments of the present embodiment, the flow impedance portion can be integrally by transparent material system Into, such as light injection.

Wherein, more typical catalysis material can be titanium dioxide etc., but not limited to this.

Wherein, to form the layers of photo-catalytic material 605, those skilled in the art can use a variety of sides known to industry Formula, for example, coating (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald), Sputtering etc., and not limited to this.

Wherein, the thickness of the layers of photo-catalytic material 605 can be controlled in nanoscale, to reduce it to the mistake as far as possible The influence of the fluid flux of filter element slice.

The structure of matrix, micro-/ nano line/pipe array, flow impedance portion, through hole employed in the fourth embodiment etc., Setting form, material etc. can with address above it is same or similar, so here is omitted.

Refer to shown in Figure 15, more preferably, in the 7th embodiment of the present utility model, a kind of filtrating chip includes Matrix 701, described matrix 701 have first surface 7011 and with the first surface mutually back to the 3rd surface 7012, it is and described Some through holes 704 as fluid passage are distributed with matrix 701, more vertical nano-pillars are provided with the first surface 703 arrays formed, flow impedance portion 702 is also associated with around the top of more nano-pillars 703 of the through hole 704 distribution, The flow impedance portion 702 is arranged above the fluid intake of the through hole 704, pending fluid is not bypassed foregoing Nano column array and be directly entered the through hole 704.Also, the first of the surface of nano-pillar 703 and described matrix 701 Anti-biotic material layer 705 is additionally provided with surface.When being handled with the filtrating chip convection body comprising anti-biotic material layer 705, Bacterium in fluid, virus etc. can be synchronously killed in the processing procedure of fluid, realize the multiple purifying of convection body.

Wherein, more typical anti-biotic material can be noble metals such as Au, Ag etc., but not limited to this.

Wherein, to form the anti-biotic material layer 705, those skilled in the art can use a variety of sides known to industry Formula, for example, coating (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald), Sputtering etc., and not limited to this.

Wherein, the thickness of the anti-biotic material layer 705 can be controlled in nanoscale, to reduce it to the filtering as far as possible The influence of the fluid flux of chip.

The structure of matrix, micro-/ nano line/pipe array, flow impedance portion, through hole employed in 5th embodiment etc., Setting form, material etc. can with address above it is same or similar, so here is omitted.

The filtrating chip of the present utility model can prepare by physics, chemical method, such as can be chemically grown Method, Physical Processing method etc., particularly MEMS (MEMS, Microelectromechanical Systems) method etc..

For example, refer to shown in Figure 16, in the 8th embodiment of the present utility model, a kind of preparation technology of filtrating chip It may include steps of：

S1：(it is defined as setting patterned photoresist to cover on first surface a) in a side surface of substrate (such as silicon chip) Mould；

S2：The first surface of the substrate is performed etching, is spaced so as to be formed in the first surface of the substrate The more vertical nano-wires set, remove the first photoresist mask afterwards；

S3：Soluble or corrodible organic matter and/or inorganic matter are coated with the first surface of the substrate, and is made organic Gap between thing and/or inorganics filled each vertical nano-wire, form sacrifice layer；

S4：Photoresist is set on the sacrifice layer, and carries out photoetching；

S5：The sacrifice layer is performed etching, makes to be distributed in more in the second area of the first surface of the substrate Exposed at the top of vertical nano-wire, remove photoresist afterwards；

S6：The substrate first surface set photoresist mask, and make it is on the substrate first surface, with it is described The corresponding region in flow impedance portion exposes；

S7：Deposition forms flow impedance portion in region expose, corresponding with the flow impedance portion；

S8：Peel off and remove photoresist；

S9：Patterned etching mask is set on the second surface of the substrate；

S10：To the substrate and first surface mutually back to another side surface (be defined as the 3rd surface b) to carve Erosion, until exposing the expendable material being filled between neighboring vertical nano wire, so as to form groove on the 3rd surface of the substrate Hole, the slotted eye position is corresponding with the first area of the first surface of the substrate, the first surface of the substrate Second area is set around the first area；

S11：The etching mask and the expendable material being filled between each vertical nano-wire are removed, filtrating chip is made.

The lithographic method used in These steps can be photoetching, Mechanical lithography, dry etching, wet etching etc..

For example, in abovementioned steps S1, forming the method for the photoresist mask of graphical (nano graph) includes：Photoetching skill Art, nanometer bead mask technique, nanometer (metal) particle mask technology etc., and not limited to this.

For example, in abovementioned steps S2, mode known to industry, such as RIE, ICP, wet etching, electrochemistry can be passed through Corrosion etc. etches vertical nanowires linear array.

For example, in abovementioned steps S3, the dissolved organic matter of filling can be photoresist etc. or corrodible inorganic matter such as Metal, SiO₂, silicon nitride etc..

For example, in abovementioned steps S10, mode known to industry, such as RIE, ICP, wet etching, electrochemistry can be passed through Corrosion etc. etches the slotted eye.

Obviously, the preparation technology of the utility model filtrating chip is simple controllable, is adapted to mass large-scale production.

Refer to shown in Figure 17, in the 9th embodiment of the present utility model, a kind of preparation technology of filtrating chip can be with Comprise the following steps：

S1：The more vertical nano wire/pipes to be formed and be intervally installed are grown in the first surface of substrate (such as silicon chip)；

S2：Soluble or corrodible organic matter and/or inorganic matter are coated with the first surface of the substrate, and is made organic Gap between thing and/or inorganics filled each vertical nano wire/pipe, forms sacrifice layer；

S3：Photoresist is set on the sacrifice layer, and carries out photoetching；

S4：The sacrifice layer is performed etching, makes to be distributed in more in the second area of the first surface of the substrate Exposed at the top of vertical nano wire, remove photoresist afterwards；

S5：The substrate first surface set photoresist mask, and make it is on the substrate first surface, with it is described The corresponding region in flow impedance portion exposes；

S6：Deposition forms flow impedance portion in region expose, corresponding with the flow impedance portion；

S7：Peel off and remove photoresist；

S8：The substrate and first surface mutually back to the 3rd surface on patterned etching mask is set；

S9：3rd surface of the substrate is performed etching, until expose be filled in it is sacrificial between neighboring vertical nano wire Domestic animal material, so as to form slotted eye, the slotted eye position and the first surface of the substrate on the 3rd surface of the substrate First area it is corresponding, the second area of the first surface of the substrate is set around the first area；

S10：The etching mask and the expendable material being filled between each vertical nano-wire are removed, filtrating chip is made.

To form the mode of vertical nano wire/pipe to grow in abovementioned steps and can be selected from MOCVD, PECVD, electrochemistry and sink The various ways known to industry such as product.

The lithographic method used in These steps can be photoetching, Mechanical lithography, dry etching, wet etching etc..

For example, the method for the photoresist mask of graphical (nano graph) is formed in abovementioned steps to be included：Photoetching technique, receive Nano-sphere mask technique, nanometer (metal) particle mask technology etc., and not limited to this.

For example, mode known to industry, such as RIE, ICP, wet etching, electrochemical corrosion can be passed through in abovementioned steps Performed etching Deng to substrate.

For example, in abovementioned steps, the dissolved organic matter of filling can be photoresist etc. or corrodible inorganic matter such as gold Category, SiO₂, SiN etc..

Refer to shown in Figure 18, in the tenth embodiment of the present utility model, a kind of filtrating chip includes matrix 801, institute State matrix 801 have mutually back to first surface 18011 and second surface 8012, and the first area in described matrix 801 8013 are distributed with some through holes 804 as fluid passage, the second area 8014 of the first surface be provided with it is multiple it is micro-/receive The array that rice piece 803 (micron film and/or nanometer sheet) parallel arrangement is formed, around more micro-/ nanos of the through hole 804 distribution The regional area at the top of piece 803 is connected with flow impedance portion 802, and the flow impedance portion 802 is arranged at the through hole 804 Above fluid intake, pending fluid can not be bypassed foregoing micro-/ nano chip arrays and is directly entered the through hole 804.

Wherein, because foregoing micro-/ nano piece micro-/ nano piece has relatively thin thickness so that these micro-/ nano piece micro-/ nanos Piece can the densely arranged first surface in described matrix, by the spacing for adjusting these micro-/ nano pieces, you can formed have it is selected The groove (being properly termed as fluid channel) of the opening portion of size, realize that the particle of different-grain diameter scope in convection body is purged place Reason, particularly, when use be nanometer sheet when, by the way that the spacing control between these nanometer sheets in nanoscale, not only may be used To remove the atomic small particle in fluid, and because nanometer sheet its thickness is minimum, it can also make its resistance quilt for fluid Control forms very big fluid flux (when particularly nanometer sheet has higher height) in very low level, far superior to Existing perforated membrane, filtrating chip based on transverse flow channels etc..

Wherein, described matrix 801 can have larger thickness, it is formed preferably foregoing micro-/ nano chip arrays Support, while the mechanical strength of the filtrating chip can be increased further, make the filtrating chip is pressure-resistant, resistant to bending, resistance to touch Hit, impact resistance, and then it is applied and will not be damaged in a variety of environment, such as can apply to high pressure, high velocity stream Body is handled, and this function is that existing perforated membrane etc. can not be reached.

Wherein, the material selection range of the filtrating chip each several part (801,802,803,804) is various, Ke Yishi Inorganic material or organic material, such as metal, non-metal inorganic material, plastics, ceramics, semiconductor, glass, polymerization Thing etc..When these parts all select to use inorganic material, the filtrating chip also has the characteristic of resistance to temperature change, can locate Manage high temperature and cryogen.

Wherein, the flow impedance portion can be that sheet, its thickness etc. can adjust according to practical application request.

Further, in the present embodiment, the more than one support of setting that can also be symmetrically or non-symmetrically around through hole Body, it can also increase the support to the flow impedance portion by the supporter, realize between flow impedance portion and matrix more The cooperation of firm stable, and protection effectively can be formed to the micro-/ nano chip arrays being distributed between flow impedance portion and matrix, Avoid because flow impedance portion and/or matrix by external force after being acted on, micro- caused by the extruding of foregoing micro-/ nano chip arrays/ The problems such as nanometer sheet is caved in, damaged.

Wherein, the supporter can be variform, such as can have rectangle, trapezoidal, step tee section etc., And not limited to this.In some specific embodiments of the tenth embodiment, the supporter can be from the through hole edge Portion projects upwards boss to be formed etc., and the connection flow impedance portion is shored in its upper end.

Wherein, the quantity of the supporter, diameter, distribution density etc. can adjust according to being actually needed, but it is few to try one's best Occupancy described matrix first surface space, avoid its fluid flux to the micro-/ nano chip arrays from causing big influence.

Using previous designs filtrating chip can (ultrasound) cleaning, be used for multiple times, and remain at good fluid Reason ability.

When being handled using described filtrating chip convection body, the fluid containing impurity particle state before entry it is micro-/ During nano-chip arrays, wherein particle diameter is more than particle (or some drops incompatible with fluid, such as in air of certain numerical value Water droplet in water droplet or oil) it is blocked in outside foregoing micro-/ nano chip arrays, fluid is between each micro-/ nano piece afterwards Groove enters back into through hole 104 after reaching the porch of through hole 104, realizes the purification of convection body and/or to required particle (liquid Drop) enriching and recovering.

Referring to shown in Figure 18-Figure 19, in some concrete application schemes of the tenth embodiment, it is foregoing it is micro-/receive The thickness of rice piece can be 1nm~50 μm, highly can be 50nm~200 μm, and the groove width between adjacent micro-/ nano piece can Think 1nm~50 μm.The aperture of the through hole 804 can be 1 μm~1mm.The thickness of described matrix can be more than 1 μm.Institute The thickness for stating flow impedance portion can be 0.5 μm~200 μm.

The section of groove before being formed at adjacent micro-/ nano piece can be rule or irregular shape, such as can be with It is polygon (triangle, quadrangle or other), circle, ellipse, star etc..

Foregoing micro-/ nano piece can regular or irregular, the uniform or first surface heterogeneous for being distributed in described matrix On.

In addition, in the tenth embodiment, shape (the particularly longitudinal direction or horizontal in aforementioned through-hole 804 and flow impedance portion 802 To the shape in section) can be various, such as can be circular, square, rectangle or other shapes.

Refer to shown in Figure 20, more preferably, in the 11st embodiment of the present utility model, a kind of filtrating chip bag Include matrix 901, described matrix 901 have mutually back to first surface and second surface, and if being distributed with described matrix 901 The through hole 904 as fluid passage is done, the micro-/ nano piece 903 that multi-disc transversely continuously extends is provided with the first surface It is big formed with the groove for being available for fluid to pass through, the bore of the opening portion of the groove between the array of formation, wherein micro-/ nano piece In 0 but less than mixing in the particle diameter of the selected particle in pending fluid, wherein, there are multiple micro-/ nano pieces directly from described On through hole 904 by so that cooperatively form the fluid passage connected with through hole 904 between these micro-/ nano pieces and matrix, and Pending fluid is only capable of entering through hole 904 by the fluid passage.

Further, in this embodiment, can also be in connecting fluid stop part 902 on micro-/ nano chip arrays, the fluid Stop part 902 is arranged above the fluid intake of the through hole 904, pending fluid can not be bypassed foregoing micro-/ nano Chip arrays and be directly entered the through hole 904.

Further, one or several supporters are may also set up around through hole 904.

Matrix, micro-/ nano chip arrays, flow impedance portion, through hole, supporter employed in 11st embodiment etc. Structure, setting form, material etc. can with address above it is same or similar, so here is omitted.

In the 11st embodiment of the present utility model, the filtrating chip can have similar with first, second embodiment As structure, difference is, more than one can be also set up on through hole, such as more symmetrically or non-symmetrically to arrange Support beam, it can also increase the support to the flow impedance portion by the support beam, realize between flow impedance portion and matrix The more cooperation of firm stable, and effectively the micro-/ nano chip arrays being distributed between flow impedance portion and matrix can be formed Protection, is avoided because flow impedance portion and/or matrix by external force after being acted on, and foregoing micro-/ nano linear array is extruded and caused Micro-/ nano piece the problems such as caving in, damaging.

Wherein, the support beam can be variform, such as can be with arch-shaped etc., and not limited to this.And further , the support beam can also coordinate with other supporters, such as the supporter addressed in second embodiment coordinates.

Wherein, the quantity of the support beam, size, distribution density etc. can adjust according to being actually needed, but it is few to try one's best The fluid intake for blocking the through hole, avoid its fluid flux to the filtrating chip from causing big influence.

The structure of matrix, micro-/ nano linear array, flow impedance portion, through hole employed in 11st embodiment etc., set Put form, material etc. can with address above it is same or similar, so here is omitted.

Refer to shown in Figure 21, in the 12nd embodiment of the present utility model, a kind of filtrating chip can have and the Tenth, any one similar structure in the 11st embodiment, difference are：The of the surface of nanometer sheet 1103 and matrix 1101 Layers of photo-catalytic material 1105 is additionally provided with one surface.Carried out with the filtrating chip convection body comprising layers of photo-catalytic material 1105 During processing, if being aided with ultraviolet lighting etc., some organic pollutions that can also be in convection body etc. carry out photocatalytic degradation, realize convection current The multiple purifying of body.

Wherein, for the benefit of light penetrates, and part or all of in the flow impedance portion 1102, matrix, lug boss can be with It is made of clear material.In some specific embodiments of the present embodiment, the flow impedance portion can be integrally by transparent material Material is made, such as light is injected.

Wherein, more typical catalysis material can be titanium dioxide etc., but not limited to this.

Wherein, to form the layers of photo-catalytic material 1105, those skilled in the art can use a variety of known to industry Mode, such as it is coated with (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald Deng), sputtering etc., and not limited to this.

Wherein, the thickness of the layers of photo-catalytic material 1105 can be controlled in nanoscale, to reduce it to described as far as possible The influence of the fluid flux of filtrating chip.

The structure of matrix, micro-/ nano linear array, flow impedance portion, through hole employed in 12nd embodiment etc., set Put form, material etc. can with address above it is same or similar, so here is omitted.

Refer to shown in Figure 22, more preferably, in the 13rd embodiment of the present utility model, a kind of filtrating chip can With with being to any one similar structure in the ten, the 11st, the 12nd embodiment, difference：In nanometer sheet 1203 Anti-biotic material layer 1205 is additionally provided with the first surface of surface and matrix 1201.To include the filtering of anti-biotic material layer 1205 When chip convection body is handled, bacterium in fluid, virus etc. can be synchronously killed in the processing procedure of fluid, realized The multiple purifying of convection body.

Wherein, more typical anti-biotic material can be noble metals such as Au, Ag etc., but not limited to this.

Wherein, to form the anti-biotic material layer 1205, those skilled in the art can use a variety of sides known to industry Formula, for example, coating (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald), Sputtering etc., and not limited to this.

Wherein, the thickness of the anti-biotic material layer 1205 can be controlled in nanoscale, to reduce it to the mistake as far as possible The influence of the fluid flux of filter element slice.

The knot of matrix, micro-/ nano linear array, flow impedance portion 1202, through hole employed in 13rd embodiment etc. Structure, setting form, material etc. can with address above it is same or similar, so here is omitted.

The filtrating chip of the present utility model can prepare by physics, chemical method, such as can be chemically grown Method, Physical Processing method etc., particularly MEMS (MEMS, Microelectromechanical Systems) method etc..

In the 14th embodiment of the present utility model, a kind of preparation technology of filtrating chip may include steps of：

S1：Patterned photoresist is set to cover on a side surface (being named as first surface) for substrate (such as silicon chip) Mould；

S2：The first surface of the substrate is performed etching, is spaced so as to be formed in the first surface of the substrate The multiple vertical nanowires pieces extended transversely set, remove the first photoresist mask afterwards；

S3：Soluble or corrodible organic matter and/or inorganic matter are coated with the first surface of the substrate, and is made organic Groove between thing and/or inorganics filled each vertical nanowires piece, form sacrifice layer；

S4：Photoresist is set on the sacrifice layer, and carries out photoetching；

S5：The sacrifice layer is performed etching, makes to be distributed in more in the second area of the first surface of the substrate Exposed at the top of vertical nanowires piece, remove photoresist afterwards；

S6：The substrate first surface set photoresist mask, and make it is on the substrate first surface, with it is described The corresponding region in flow impedance portion exposes；

S7：Deposition forms flow impedance portion in region expose, corresponding with the flow impedance portion, then peels off Remove photoresist；

S8：The substrate and first surface mutually back to another side surface (being named as the 3rd surface) on figure is set The etching mask of change, then another side surface of the substrate is performed etching, it is filled in neighboring vertical nanometer sheet until exposing Between expendable material, so as to form slotted eye, the slotted eye position and the lining in another side surface of the substrate The first area of the first surface at bottom is corresponding, and the second area of the first surface of the substrate is set around the first area Put；

S9：The etching mask and the expendable material being filled between each vertical nanowires piece are removed, filtrating chip is made.

The lithographic method used in These steps can be photoetching, Mechanical lithography, dry etching, wet etching etc..

For example, in abovementioned steps S1, forming the method for the photoresist mask of graphical (nano graph) includes：Photoetching skill Art, nanometer bead mask technique, nanometer (metal) particle mask technology etc., and not limited to this.

For example, in abovementioned steps S2, mode known to industry, such as RIE, ICP, wet etching, electrochemistry can be passed through Corrosion etc. etches vertical nanowires chip arrays.

For example, in abovementioned steps S3, the dissolved organic matter of filling can be photoresist etc. or corrodible inorganic matter such as Metal, SiO₂, SiN etc..

For example, in abovementioned steps S8, mode known to industry, such as RIE, ICP, wet etching, electrochemistry can be passed through Corrosion etc. etches the slotted eye.

Refer to shown in Figure 23, in the 15th embodiment of the present utility model, a kind of filtrating chip is mainly to mixed The miscellaneous fluid for having selected particle is handled, and it includes matrix 1300, described matrix 1300 have mutually back to first surface 1301 and second surface 1302, and some through holes 1303 as fluid passage are distributed with described matrix 1300.Any logical Be distributed with hole 1303 some micro-/ nano line/pipes 1400 (i.e. any of micro wire, micron tube, nano wire, nanotube or It is a variety of), especially nano wire/pipe (nano wire and/or nanotube).The micro-/ nano line/one end of pipe 1400 is fixed on described logical On the hole wall in hole 1303, the other end radially extends along the through hole.These micro-/ nano line/pipes 2 are gathered in the form of cross one another It is integrated into loose structure.The diameter of the loose structure inside aperture is more than 0 but less than the particle diameter of the selected particle.

Refer to Figure 24 again, the loose structure is using the view overlooked as the grid that is distributed in the through hole 1303 Structure.

Wherein, because foregoing micro-/ nano line/pipe 1400 has larger ratio of height to diameter (or draw ratio) so that this slightly/receive Rice noodles/pipe 1400 can be densely arranged in the through hole, and by adjust these micro-/ nano line/pipes 1400 distribution density, Length etc., you can the particle of different-grain diameter scope is purged processing in convection body 1500, and particularly, what it is when use is nanometer During line/pipe, by the way that the hole pore size control that these nano wire/pipes intersect to form in nanoscale, can be not only removed in fluid Atomic small particle, and because nano wire/pipe diameter itself is minimum, it can also be controlled in for the resistance of fluid very low Level, and form very big fluid flux, far superior to existing perforated membrane, filtrating chip based on transverse flow channels etc..

Wherein, described matrix 1300 can have larger thickness, and nationality is to further enhance the machinery of the filtrating chip Intensity, make the pressure-resistant filtrating chip, resistant to bending, impact resistant, impact resistance, so allow its in a variety of environment apply without Damage is caused, such as can apply to handle high pressure, high-velocity fluid, this function is that existing perforated membrane etc. can not be reached 's.

Particularly, because described micro-/ nano line/pipe 1400 is distributed in the through hole 1303 so that these micro-/ nanos Line/pipe 1400 is substantially subjected to the protection of matrix 1300, and then, even if the filtrating chip is under pressure, it will not also make this Slightly/nano wire/pipe 1400 is damaged.

Wherein, the material selection range of the filtrating chip each several part (1301,1302,1303) is various, Ke Yishi Inorganic material or organic material, such as can be metal, ceramics, polymer, etc..When these parts all select to make During with inorganic material, the filtrating chip also has the characteristic of resistance to temperature change, can handle high temperature and cryogen.

Using previous designs filtrating chip can (ultrasound) cleaning, be used for multiple times, and remain at good fluid Reason ability.

When being handled using described filtrating chip convection body, the fluid containing impurity particle is stated porous before entry During structure, wherein particle diameter be more than certain numerical value particle (or some drops incompatible with fluid, for example, water droplet in air or Water droplet in oil) it is blocked in outside previous porous structure, fluid flows out from through hole 1303 afterwards, realizes the net of convection body Change and/or the enriching and recovering to required particle (drop).

In some concrete application schemes of the embodiment, the diameter of foregoing micro-/ nano line/pipe 1400 can be 1nm~ 500μm。

In some concrete application schemes of the embodiment, the aperture of aforementioned through-hole 1303 can be 1 μm~1mm.

In some concrete application schemes of the embodiment, the thickness of aforementioned substrates can be more than 1 μm.

The lateral cross section structure of foregoing nano wire can be rule or irregular shape, such as can be polygon (three Angular, quadrangle is other), circular, ellipse, star etc..

Foregoing micro-/ nano line/pipe 1400 can be regular or irregular, uniform or heterogeneous be distributed in the through hole 1303 It is interior.

Foregoing micro-/ nano line/pipe 1400 can preferably be selected from carbon nanocoils, CNT, ZnO nano-wire, GaN nanometers Line, TiO₂Nano wire, Ag nano wires, Au nano wires etc., and not limited to this.

Foregoing micro-/ nano line/pipe 1400 can pass through external world's transfer, growth in situ (such as chemically grown, electrochemical student It is long) or modes such as (such as physics, chemical vapor depositions, electro-deposition) is deposited in growth in situ shape on the inwall of through hole 1303 Into.

The shape shape of lateral cross section (particularly) of aforementioned through-hole 1303 can be various, for example, can be it is circular, Square, rectangle, rhombus, polygon or Else Rule or irregular shape.

In some concrete application schemes of the embodiment, foregoing micro-/ nano line/pipe 1400 can by catalysis material or Material with antibacterial, sterilizing function is formed, or, foregoing micro-/ nano line/pipe 1400 can also be surface covered with photocatalysis Material or the coating with sterilization, the material formation of antibacterial functions.

For example, foregoing micro-/ nano line/pipe 1400 can use ZnO nano-wire, GaN nano wire, TiO2 nano wires etc. to have light The nano wire of the property of catalysis, under light auxiliary irradiation, the organic matter in the fluid that can degrade.

For example, foregoing micro-/ nano line/pipe 1400 can use Ag nano wires, Au nano wires etc., it is thin in fluid to kill Bacterium, virus, microorganism.

In some concrete application schemes of the embodiment, the surface of described matrix 1300, particularly its first surface Layers of photo-catalytic material or anti-biotic material layer etc. are also provided with 1301.

When being handled with the filtrating chip convection body comprising layers of photo-catalytic material, if being aided with ultraviolet lighting etc., may be used also Some organic pollutions in convection body etc. carry out photocatalytic degradation, realize the multiple purifying of convection body.

Wherein, for the benefit of light penetrates, and the members or whole in the filtrating chip can be by transparent materials It is made.

Wherein, more typical catalysis material can be titanium dioxide etc., but not limited to this.

Wherein, to form the layers of photo-catalytic material, those skilled in the art can use various ways known to industry, Such as (spin coating, spraying, printing etc.) is coated with, is physically or chemically vapor-deposited (such as MOCVD, PECVD, ald), splashes Penetrate etc., and not limited to this.

Wherein, the thickness of the layers of photo-catalytic material can be controlled in nanoscale, to reduce it to the filtering as far as possible The influence of the fluid flux of chip.

And when being handled with the filtrating chip convection body comprising anti-biotic material layer, can be in the processing procedure of fluid In, bacterium in fluid, virus etc. are synchronously killed, realizes the multiple purifying of convection body.

Wherein, more typical anti-biotic material can be noble metals such as Au, Ag etc., but not limited to this.

Wherein, to form the anti-biotic material layer, those skilled in the art can use various ways, example known to industry Such as it is coated with (spin coating, spraying, printing), is physically or chemically vapor-deposited (such as MOCVD, PECVD, ald), sputtering Etc., and not limited to this.

Wherein, the thickness of the anti-biotic material layer can be controlled in nanoscale, to reduce it to the filtration core as far as possible The influence of the fluid flux of piece.

One of preferred embodiment as the embodiment, it can also set and be spaced in the first surface of described matrix More setting nano wires, these nano wires can surround as fluid passage aforementioned through-hole setting.

More preferable, these draw ratios for erectting nano wire are 4：1~200000：1, it is adjacent setting nano wire between The ratio of distance and the length of the setting nano wire is 1：4~1：200000.

By using this structure and the setting nano wire of distributional pattern, multiple setting nano wires can be made intensive can to arrange (proportion is few certainly in unit area for lug boss), is handled, while also assign beneficial to the molecule in convection body The larger fluid flux of the filtrating chip (hole erect between nano wire is bigger than nano wire own vol is erect).

It is more preferable, the setting nano wire can have with the foregoing identical material of micro-/ nano line/pipe 1400, size, Structure etc..

Particularly, if with reference to known to industry scheme, the carry out such as the arrangement density of foregoing setting nano wire is suitable Design, is allowed to form nano-wire array, can also be allowed to form super-drainage structure, superoleophobic structure, can not only remove in fluid Particle, and can also be by automatic cleaning action, the particle for making to be blocked can not gather on the filtrating chip surface.

Wherein, because described matrix can have larger thickness so that foregoing setting nano wire can obtain preferable support.

One of preferred embodiment as the embodiment, also on these foregoing setting nano wires fluid can be set to hinder Stopper, the flow impedance portion can (it be the 3rd table that can name it with the surface that the first surface with described matrix is oppositely arranged Face), and the complex root erects the first surface that nemutogen one end is fixedly installed on described matrix, the other end and the fluid 3rd surface of stop part is fixedly connected, wherein the distance between adjacent setting nemutogen is more than 0 but is less than the selected particle Particle diameter.

Wherein, the flow impedance portion can be variform, such as can be sheet, shell shape, cuboid shape, more Face body shape etc..

Preferably, these foregoing are erect and cooperatively form a fluid passage between nano wire, flow impedance portion and matrix, treat The fluid of processing can only enter the fluid passage (through hole 1303) for the first surface for being distributed in described matrix via the fluid passage Fluid intake, realize the first time processing of convection body, enter back into afterwards in the fluid passage being distributed on matrix, and by foregoing The aggregation of micro-/ nano line/pipe 1400 carries out second and handled, and can so realize the multi task process of convection body.

Wherein, by carrying out certain design to these foregoing spacing for erectting nano wire, it is allowed to and foregoing micro-/ nano The aperture for the hole that line/pipe 1400 intersects to form is different, particularly makes to the spacing between the setting nano wire more than described The aperture for the hole that micro-/ nano line/pipe 1400 intersects to form, it can also realize the classification processing of different size particle in convection body.

Wherein, the setting form in the flow impedance portion can also be it is various, for example, it can entirety and described matrix But it is arranged at intervals, locally can be also connected with described matrix, or even in some cases, is also integrally machined shape with described matrix Into.

Wherein, the fluid intake of the fluid passage (through hole 1303) and more setting nano wires can be distributed in the fluid Stop part is in the orthographic projection of the first surface of described matrix.

The shape of aforesaid fluid stop part can be various, such as can be circular, square, rectangle or other shapes Shape.

The material of aforesaid fluid stop part can be selected from metal, nonmetallic, organic material, inorganic material etc., such as silicon chip, Polymer, ceramics etc., and not limited to this.

More preferable, foregoing catalysis material, sterilization material etc. can be also distributed with aforesaid fluid stop part surface, or Person, aforesaid fluid stop part surface integrally can be also made up of foregoing catalysis material, sterilization material etc..

More preferable, aforesaid fluid stop part can also have local transparent structure, or overall is transparent, with for example Light is injected.

The filtrating chip of the present utility model can prepare by physics, chemical method, such as can be chemically grown Method, Physical Processing method etc., particularly MEMS (MEMS, Microelectromechanical Systems) method etc..

For example, refer to shown in Figure 25, in the 16th embodiment of the present utility model, a kind of preparation work of filtrating chip Skill may include steps of：

S1：Patterned photoresist mask is set in the first surface of substrate (such as silicon chip), it includes and makes micro-nano by lithography The lines of metrical scale；

S2：The first surface of the substrate is performed etching using the photoresist mask, so as to be formed through the lining Bottom first surface and with the first surface mutually back to second surface some through holes, to as fluid passage；

S3：The kind for micro-/ nano line/pipe growth is deposited on the inwall of fluid passage and the first surface of the substrate Sublayer；

S4：Growth forms more micro-/ nano line/pipes in the Seed Layer, controls the growth conditions of micro-/ nano line/pipe, So as to grow to form more be spaced setting micro-/ nano line/pipes in the first surface of the substrate, and lead in the fluid Growth forms some micro-/ nano line/pipes radially extended in road, the more micro-/ nano lines in the fluid passage/manage that This intersects, and forms the intersection grid of micro-nano-scale；

S5：Remove the micro-/ nano line/pipe (can also retain) for the first surface for being distributed in the substrate；

S6：Scribing, encapsulation, filtrating chip is made.

The lithographic method used in These steps can be photoetching, Mechanical lithography, dry etching, wet etching etc..

For example, in abovementioned steps, forming the method for the photoresist mask of graphical (nano graph) includes：Photoetching skill Art, nanometer bead mask technique, nanometer (metal) particle mask technology etc., and not limited to this.

For example, in abovementioned steps, can be rotten by mode known to industry, such as RIE, ICP, wet etching, electrochemistry Erosion etc. etches fluid passage etc..

Above-mentioned embodiment, only illustrate technical concept and architectural feature of the present utility model, it is therefore intended that allow ripe Knowing the stakeholder of technique can implement according to this, but above said content is not intended to limit the scope of protection of the utility model, Every any equivalent change or modification made according to Spirit Essence of the present utility model, all should fall into protection of the present utility model Within the scope of.

Claims (103)

1. A kind of 1. nasal obstruction type respirator, it is characterised in that including：

   Nasal obstruction and filtrating chip, the one end of at least described nasal obstruction is inserted into the nasal cavity of user, and the nasal obstruction includes The gas passage connected with the nasal cavity, the filtrating chip set to filter out to mix to be more than in pending air-flow, particle diameter The particle of definite value, pending gas enter the gas passage in the nasal obstruction after flowing through the filtrating chip；And

   Filtrating chip safeguard structure, to protect the filtrating chip.
2. 2. nasal obstruction type respirator according to claim 1, it is characterised in that：The filtrating chip safeguard structure includes first Fixed hard filter screen and the second fixed hard filter screen, the filtrating chip are arranged at the first fixed hard filter screen and second Between fixed hard filter screen.
3. 3. nasal obstruction type respirator according to claim 1 or 2, it is characterised in that：The nasal obstruction type respirator also includes the One filtration fabrics and/or the second filtration fabrics, first filtration fabrics are distributed between the nasal obstruction and filtrating chip, described Filtrating chip is distributed between the second filtration fabrics and nasal obstruction.
4. 4. nasal obstruction type respirator according to claim 3, it is characterised in that：The nasal obstruction type respirator can also including first Detachable hard filter screen and/or the second removable hard filter screen, first detachable the hard filter screen and the first filtration fabrics It is fixedly connected, the second detachable hard filter screen is fixedly connected with the second filtration fabrics.
5. 5. nasal obstruction type respirator according to claim 1, it is characterised in that：The nasal obstruction is had a stuffy nose using waist-drum-shaped.
6. 6. nasal obstruction type respirator according to claim 1 or 5, it is characterised in that：The nasal obstruction type respirator also includes one The housing of both ends open, the nasal obstruction are mounted at the shell one end, and the filtrating chip is placed in the housing It is interior.
7. 7. nasal obstruction type respirator according to claim 1, it is characterised in that the filtrating chip includes：

   Matrix with first fluid passage, the first fluid passage has air intake and air outlet slit, described first-class The air intake of body passage is distributed in the first surface of described matrix；

   The a plurality of lug bosses being intervally installed, the lug boss transversely continuously prolong on the first surface of described matrix Stretch, bottom is fixedly installed on the first surface of described matrix, and top is provided with the hat-shaped structure transversely continuously extended, the hat The phase of structure back to both sides along epitaxial lateral overgrowth, and formed with the opening portion for being available for air to pass through between adjacent hat-shaped structure, The bore of the opening portion is more than 0 but is less than and mixes in the particle diameter of the selected particle in pending air, wherein at least two Described lug boss respectively with the phase of the air intake of the first fluid passage back to both sides be disposed adjacent, and at least one Individual described lug boss is directly from the air intake of the first fluid passage by so that a plurality of hat-shaped structures, multiple The second fluid passage connected with the first fluid passage, and pending sky are cooperatively formed between several lug bosses and matrix Gas is only capable of entering first fluid passage by the second fluid passage.
8. 8. nasal obstruction type respirator according to claim 7, it is characterised in that the lug boss described at least two is directly from institute State and pass through on the air intake of first fluid passage.
9. 9. nasal obstruction type respirator according to claim 7, it is characterised in that：A plurality of lug bosses are parallel to be distributed in institute State on the first surface of matrix.
10. 10. nasal obstruction type respirator according to claim 7, it is characterised in that：The hat-shaped structure is integrally set with lug boss Put.
11. 11. the nasal obstruction type respirator according to claim 7 or 10, it is characterised in that：The hat-shaped structure has inverted trapezoidal Cross section structure.
12. 12. the nasal obstruction type respirator according to claim 7 or 10, it is characterised in that：It is formed between adjacent hat-shaped structure The bore of opening portion be 1nm~50 μm.
13. 13. the nasal obstruction type respirator according to claim 7 or 10, it is characterised in that：The height of the hat-shaped structure is 50nm~200 μm.
14. 14. nasal obstruction type respirator according to claim 7, it is characterised in that：The distance between adjacent projections are 0.1 μm ~100 μm.
15. 15. nasal obstruction type respirator according to claim 7, it is characterised in that：The height of the lug boss be 0.1 μm~ 400 μm, width is 0.1 μm~100 μm.
16. 16. nasal obstruction type respirator according to claim 7, it is characterised in that：The aperture of the first fluid passage is 1 μm ~1mm.
17. 17. nasal obstruction type respirator according to claim 7, it is characterised in that：The thickness of described matrix is more than 1 μm.
18. 18. nasal obstruction type respirator according to claim 7, it is characterised in that：To less than the lug boss, hat-shaped structure and The surface of any one of matrix is additionally provided with layers of photo-catalytic material and/or anti-biotic material layer.
19. 19. nasal obstruction type respirator according to claim 7, it is characterised in that：In the lug boss, hat-shaped structure and matrix At least local of at least one be transparent configuration.
20. 20. nasal obstruction type respirator according to claim 1, it is characterised in that the filtrating chip includes：

    Matrix with first fluid passage, the first fluid passage has air intake and air outlet slit, described first-class The air intake of body passage is distributed in the first surface of described matrix；

    Intersected the loose structure formed by complex root nemutogen, and second is cooperatively formed to the first surface with described matrix Fluid passage, described complex root nemutogen one end are fixedly connected with described matrix, and the diameter of the loose structure Hole is big In 0 but less than mixing in the particle diameter of the selected particle in pending air, and pending air is only capable of by described second Fluid passage enters first fluid passage.
21. 21. nasal obstruction type respirator according to claim 20, it is characterised in that：One end of the complex root nemutogen with The first surface of described matrix is fixedly connected, and is surround and be distributed in around the air intake of the first fluid passage.
22. 22. the nasal obstruction type respirator according to claim 20 or 21, it is characterised in that：Described air filter chip also wraps The a plurality of lug bosses being intervally installed are included, the lug boss is fixedly installed on the first surface of described matrix, and along horizontal stroke Continuously extend on the first surface of described matrix, the wherein at least two lug boss sky with the first fluid passage respectively The phase of gas entrance back to both sides be disposed adjacent, at least one lug boss is directly from the air intake of the first fluid passage By being fixedly connected with two above-described nemutogens on the lug boss.
23. 23. nasal obstruction type respirator according to claim 22, it is characterised in that：The complex root line being connected on a lug boss Body and the complex root nemutogen being connected on another lug boss adjacent with the lug boss intersect.
24. 24. nasal obstruction type respirator according to claim 22, it is characterised in that：A plurality of lug bosses are parallel to be distributed in On the first surface of described matrix.
25. 25. nasal obstruction type respirator according to claim 22, it is characterised in that：The shape of the lug boss includes strip Or sheet.
26. 26. nasal obstruction type respirator according to claim 22, it is characterised in that：Described a plurality of lug bosses are uniformly distributed Or non-uniform Distribution is on the first surface of described matrix.
27. 27. nasal obstruction type respirator according to claim 22, it is characterised in that：The width of the lug boss be 0.1 μm~ 100 μm, be highly 0.1 μm~400 μm.
28. 28. nasal obstruction type respirator according to claim 22, it is characterised in that：The distance between adjacent projections are 0.1 μ M~100 μm.
29. 29. nasal obstruction type respirator according to claim 22, it is characterised in that：The lug boss surface is additionally provided with light and urged Change material layer and/or anti-biotic material layer.
30. 30. nasal obstruction type respirator according to claim 22, it is characterised in that：Described matrix, the complex root nemutogen, At least local of at least one of a plurality of lug bosses is transparent configuration.
31. 31. nasal obstruction type respirator according to claim 20, it is characterised in that：The μ of a diameter of 1nm of the nemutogen~50 m。
32. 32. nasal obstruction type respirator according to claim 20, it is characterised in that：One end of any of which nemutogen and with this The distance between adjacent one end of another nemutogen of nemutogen is 1nm~50 μm.
33. 33. nasal obstruction type respirator according to claim 20, it is characterised in that：The length of the nemutogen be 50nm~ 200μm。
34. 34. nasal obstruction type respirator according to claim 20, it is characterised in that：Extremely also it is distributed less than the nemutogen surface There are catalysis material or anti-biotic material.
35. 35. nasal obstruction type respirator according to claim 20, it is characterised in that：Described matrix and the complex root nemutogen At least one of it is at least local be transparent configuration.
36. 36. nasal obstruction type respirator according to claim 20, it is characterised in that：The nemutogen is linear.
37. 37. nasal obstruction type respirator according to claim 20, it is characterised in that：The air intake of the first fluid passage Include polygon, circle or ellipse with rule or irregular shape, the regular shape.
38. 38. nasal obstruction type respirator according to claim 20, it is characterised in that：The aperture of the first fluid passage is 1 μ M~1mm.
39. 39. nasal obstruction type respirator according to claim 20, it is characterised in that：The thickness of described matrix is more than 1 μm.
40. 40. nasal obstruction type respirator according to claim 20, it is characterised in that：The filtrating chip also includes parallel distribution In the complex root crossbeam of the first surface of described matrix, the crossbeam transversely continuously extends in the first surface of described matrix, Wherein at least two crossbeams respectively with the phase of the air intake of the first fluid passage back to both sides be disposed adjacent, at least one Root crossbeam directly passes through from the air intake of the first fluid passage；And complex root line is distributed with any crossbeam The beam surface is fixed in body, one end of at least part nemutogen in the complex root nemutogen, and the other end is along gradually remote Direction from any crossbeam extends obliquely out and/or continuously extended on the face parallel to described matrix first surface, and with dividing Complex root nemutogen of the cloth on another crossbeam adjacent to any crossbeam intersects, so as to form the loose structure.
41. 41. nasal obstruction type respirator according to claim 40, it is characterised in that：At least two crossbeams are directly from described first Pass through on the air intake of fluid passage.
42. 42. nasal obstruction type respirator according to claim 20, it is characterised in that：The nemutogen includes carbon nanocoils, carbon Nanotube, ZnO nano-wire, GaN nano wire, TiO₂Any of nano wire, Ag nano wires, Au nano wires are two or more Combination.
43. 43. nasal obstruction type respirator according to claim 1, it is characterised in that the filtrating chip includes：

    Matrix with first fluid passage, the first fluid passage has air intake and air outlet slit, described first-class The air intake of body passage is distributed in the first area of the first surface of described matrix；

    Gas barrier portion, the second surface that there is the first surface with described matrix to be oppositely arranged, for preventing pending air It is directly entered the air intake of the first fluid passage；

    The a plurality of lug bosses being intervally installed, described lug boss one end are fixedly installed on the of the first surface of described matrix In two regions, the other end is fixedly connected with the second surface in the gas barrier portion, and wherein the distance between adjacent projections are big In 0 but less than mixing in the particle diameter of the selected particle in pending air, the second area of the first surface of described matrix with First area abuts, so that second fluid passage is cooperatively formed between a plurality of lug bosses, gas barrier portion and matrix, And pending air is only capable of entering first fluid passage by the second fluid passage.
44. 44. nasal obstruction type respirator according to claim 43, it is characterised in that：A plurality of lug bosses are around described the The air intake of one fluid passage is set.
45. 45. nasal obstruction type respirator according to claim 43, it is characterised in that：3rd area of the first surface of described matrix Also a plurality of lug bosses are arranged at intervals with domain, the second area is located between the 3rd region and first area.
46. 46. nasal obstruction type respirator according to claim 43, it is characterised in that：The aperture of the first fluid passage is 1 μ M~1mm.
47. 47. nasal obstruction type respirator according to claim 43, it is characterised in that：The thickness of described matrix is more than 1 μm.
48. 48. nasal obstruction type respirator according to claim 43, it is characterised in that：The thickness in the gas barrier portion is 0.5 μ M~200 μm.
49. 49. nasal obstruction type respirator according to claim 43, it is characterised in that：The lug boss surface is additionally provided with light and urged Change material layer and/or anti-biotic material layer.
50. 50. nasal obstruction type respirator according to claim 43, it is characterised in that：At least portion in the air filter chip At least local of subassembly is transparent configuration.
51. 51. nasal obstruction type respirator according to claim 43, it is characterised in that：3rd area of the first surface of described matrix Domain is set around the second area.
52. 52. the nasal obstruction type respirator according to claim 43 or 51, it is characterised in that：The of the first surface of described matrix One region and second area are distributed in the gas barrier portion in the orthographic projection on the first surface of described matrix.
53. 53. nasal obstruction type respirator according to claim 43, it is characterised in that：The air filter chip is also included at least One supporter, described supporter one end are fixedly connected with described matrix, and the other end is fixedly connected with the gas barrier portion.
54. 54. according to the nasal obstruction type respirator described in claim 43,45 or 51, it is characterised in that：It is distributed in the of described matrix A plurality of lug bosses in the 3rd region on one surface arrange to form micron order or nanoscale with super-hydrophobic or superoleophobic performance Array structure.
55. 55. nasal obstruction type respirator according to claim 53, it is characterised in that：The air filter chip include two with Upper described supporter, and the supporter described in the two or more is symmetrically distributed in the air intake of the first fluid passage Around.
56. 56. nasal obstruction type respirator according to claim 43, it is characterised in that：The air intake of the first fluid passage Restocking is provided with a beam supported above, and the support beam is fixedly connected with the gas barrier portion.
57. 57. nasal obstruction type respirator according to claim 43, it is characterised in that：The line that the lug boss is set for standing Any one in shape, column, sheet, tubulose, taper, frustum structure.
58. 58. nasal obstruction type respirator according to claim 43, it is characterised in that：The lateral cross section of the lug boss has rule Then or irregular shape, the regular shape include polygon, circle or ellipse.
59. 59. nasal obstruction type respirator according to claim 43, it is characterised in that：Described a plurality of lug bosses are uniformly distributed Or non-uniform Distribution is on the first surface of described matrix.
60. 60. nasal obstruction type respirator according to claim 43, it is characterised in that：The air intake of the first fluid passage Include polygon, circle or ellipse with rule or irregular shape, the regular shape.
61. 61. nasal obstruction type respirator according to claim 43, it is characterised in that：The lug boss is that wire is raised, and it is grown Footpath ratio is 4：1~200000：1.
62. 62. nasal obstruction type respirator according to claim 43, it is characterised in that：The distance between adjacent projections with it is described The ratio of the length of lug boss is 1：4~1：200000.
63. 63. nasal obstruction type respirator according to claim 43, it is characterised in that：The micron that the lug boss is set for setting Line or nano wire, its a diameter of 1nm~50 μm, length are that the distance between 50nm~200 μm, adjacent projections are the μ of 1nm~50 m。
64. 64. nasal obstruction type respirator according to claim 1, it is characterised in that the filtrating chip includes：

    Matrix with first fluid passage, the first fluid passage has air intake and air outlet slit, described first-class The air intake of body passage is distributed in the first area of the first surface of described matrix；

    Gas barrier portion, the second surface that there is the first surface with described matrix to be oppositely arranged, for preventing pending air It is directly entered the air intake of the first fluid passage；

    A plurality of lug bosses, the lug boss transversely continuously extend in the second area of the first surface of described matrix, wherein Formed with the groove for being available for air to pass through between adjacent projections, the bore of the opening portion of the groove, which is more than 0 but is less than, to be mixed In the particle diameter of the selected particle in pending air, and the first surface of the upper end of the lug boss and described matrix seals Connection, the regional area of lower end and the second surface in the gas barrier portion are tightly connected, so that a plurality of lug bosses Between more than one groove, gas barrier portion and base mate form second fluid passage, and pending air is only capable of leading to Cross the second fluid passage and enter first fluid passage.
65. 65. nasal obstruction type respirator according to claim 64, it is characterised in that：Secondth area of the first surface of described matrix Domain is set around first area.
66. 66. nasal obstruction type respirator according to claim 64, it is characterised in that：The partial zones at the second end of the lug boss The air intake of domain and the first fluid passage is distributed in the gas barrier portion in shape on the first surface of described matrix Into orthographic projection in.
67. 67. nasal obstruction type respirator according to claim 64, it is characterised in that：The shape of the lug boss includes strip Or sheet.
68. 68. nasal obstruction type respirator according to claim 64, it is characterised in that：Described a plurality of lug bosses are uniformly distributed Or non-uniform Distribution is on the first surface of described matrix.
69. 69. nasal obstruction type respirator according to claim 64, it is characterised in that：The air intake of the first fluid passage Include polygon, circle or ellipse with rule or irregular shape, the regular shape.
70. 70. nasal obstruction type respirator according to claim 64, it is characterised in that：The width of the lug boss is the μ of 1nm~50 M, it is highly 50nm~200 μm.
71. 71. nasal obstruction type respirator according to claim 64, it is characterised in that：The groove being formed between adjacent projections The size of opening portion is 1nm~50 μm.
72. 72. nasal obstruction type respirator according to claim 64, it is characterised in that：The aperture of the first fluid passage is 1 μ M~1mm.
73. 73. nasal obstruction type respirator according to claim 64, it is characterised in that：The thickness of described matrix is more than 1 μm.
74. 74. nasal obstruction type respirator according to claim 64, it is characterised in that：The thickness in the gas barrier portion is 0.5 μ M~200 μm.
75. 75. nasal obstruction type respirator according to claim 64, it is characterised in that：The lug boss surface is additionally provided with light and urged Change material layer and/or anti-biotic material layer.
76. 76. nasal obstruction type respirator according to claim 64, it is characterised in that：Described matrix, gas barrier portion, lug boss At least one of it is at least local be transparent configuration.
77. 77. nasal obstruction type respirator according to claim 1, it is characterised in that the filtrating chip includes：

    Matrix with first fluid passage, the first fluid passage has air intake and air outlet slit, described first-class The air intake of body passage is distributed in the first surface of described matrix；

    The a plurality of lug bosses being intervally installed, the lug boss is fixedly installed on the first surface of described matrix, and edge Laterally continuously extend on the first surface of described matrix, wherein formed with the ditch for being available for air to pass through between adjacent projections Groove, the bore of the opening portion of the groove, which is more than 0 but is less than, to be mixed in the particle diameter of the selected particle in pending air, with And wherein at least two lug boss respectively with the phase of the air intake of the first fluid passage back to both sides be disposed adjacent, At least one lug boss directly from the air intake of the first fluid passage by so that a plurality of lug bosses with The second fluid passage connected with the first fluid passage is cooperatively formed between matrix, and pending air is only capable of passing through institute State second fluid passage and enter first fluid passage.
78. 78. the nasal obstruction type respirator according to claim 77, it is characterised in that：The filtrating chip also includes gas barrier Portion, the gas barrier portion have the second surface that the first surface with described matrix is oppositely arranged, the first fluid passage Air intake be distributed in the gas barrier portion in the orthographic projection formed on the first surface of described matrix, it is described a plurality of Lug boss have mutually back to first end and the second end, the first surface of the first end and described matrix be tightly connected, second The regional area at end and the second surface of occlusion part are tightly connected.
79. 79. the nasal obstruction type respirator according to claim 77, it is characterised in that：A plurality of lug bosses are parallel to be distributed in On the first surface of described matrix.
80. 80. the nasal obstruction type respirator according to claim 77, it is characterised in that：The groove being formed between adjacent projections The size of opening portion be 1nm~50 μm.
81. 81. the nasal obstruction type respirator according to claim 77, it is characterised in that：The aperture of the first fluid passage is 1 μ M~1mm.
82. 82. the nasal obstruction type respirator according to claim 77, it is characterised in that：The thickness of described matrix is more than 1 μm.
83. 83. the nasal obstruction type respirator according to claim 77, it is characterised in that：The lug boss surface is additionally provided with light and urged Change material layer and/or anti-biotic material layer.
84. 84. the nasal obstruction type respirator according to claim 78, it is characterised in that：The thickness in the gas barrier portion is 0.5 μ M~200 μm.
85. 85. the nasal obstruction type respirator according to claim 78 or 84, it is characterised in that：It is described matrix, gas barrier portion, convex At least local of at least one of the portion of rising is transparent configuration.
86. 86. nasal obstruction type respirator according to claim 1, it is characterised in that the filtrating chip includes：

    Matrix with fluid passage, and

    The aggregation of complex root nemutogen, to flow through the fluid passage, be contaminated with the air of selected particle Reason；

    The aggregation is distributed in the fluid passage, and has loose structure, and the diameter of the loose structure inside aperture is big In 0 but less than the selected particle particle diameter.
87. 87. the nasal obstruction type respirator according to claim 86, it is characterised in that：Described nemutogen one end with the fluid The inwall of passage is fixedly connected, and the other end radially extends along the fluid passage.
88. 88. the nasal obstruction type respirator according to claim 86, it is characterised in that：The complex root nemutogen intersect or It is interlaced with one another to form the loose structure；Or the complex root nemutogen be intervally installed and parallel arrangement formed it is described Loose structure.
89. 89. the nasal obstruction type respirator according to claim 86, it is characterised in that：Described matrix have mutually back to the first table Face and second surface, the air intake of the fluid passage are distributed in the first surface of described matrix.
90. 90. the nasal obstruction type respirator according to claim 86, it is characterised in that：The first surface of described matrix is also distributed with The complex root being intervally installed erects nemutogen, and the complex root is erect nemutogen and set around the fluid passage.
91. 91. the nasal obstruction type respirator according to claim 90, it is characterised in that：The filtrating chip also includes gas barrier Portion, the gas barrier portion has the 3rd surface that the first surface with described matrix is oppositely arranged, and the complex root erects Vertical nemutogen one end is fixedly installed on the first surface of described matrix, and the other end and the 3rd surface in the gas barrier portion are fixed Connection, wherein adjacent the distance between nemutogen of erectting is more than 0 but less than the particle diameter of the selected particle.
92. 92. the nasal obstruction type respirator according to claim 86, it is characterised in that：The first surface of described matrix is additionally provided with Layers of photo-catalytic material and/or anti-biotic material layer.
93. 93. the nasal obstruction type respirator according to claim 86, it is characterised in that：At least portion in the air filter chip Subassembly has transparent configuration.
94. 94. the nasal obstruction type respirator according to claim 86, it is characterised in that：The air intake of the fluid passage has Rule or irregular shape, the regular shape include polygon, circle or ellipse.
95. 95. the nasal obstruction type respirator according to claim 86, it is characterised in that：The aperture of the fluid passage be 1 μm~ 1mm。
96. 96. the nasal obstruction type respirator according to claim 86, it is characterised in that：The thickness of described matrix is more than 1 μm.
97. 97. the nasal obstruction type respirator according to claim 86, it is characterised in that：The air intake of the fluid passage and multiple Several setting nemutogens are distributed in the gas barrier portion in the orthographic projection of the first surface of described matrix.
98. 98. the nasal obstruction type respirator according to claim 90 or 97, it is characterised in that：The draw ratio for erectting nemutogen For 4：1~200000：1.
99. 99. the nasal obstruction type respirator according to claim 90 or 97, it is characterised in that：Between adjacent setting nemutogen away from Ratio from the length with the setting nemutogen is 1：4~1：200000.
100. 100. the nasal obstruction type respirator according to claim 86, it is characterised in that：A diameter of 1nm of the nemutogen~ 500μm。
101. 101. the nasal obstruction type respirator according to claim 86, it is characterised in that：The nemutogen is selected from nano wire or received Mitron.
102. 102. the nasal obstruction type respirator according to claim 86, it is characterised in that：Extremely also divide less than the nemutogen surface It is furnished with catalysis material or anti-biotic material.
103. 103. the nasal obstruction type respirator according to claim 86, it is characterised in that：The nemutogen includes carbon nanocoils, carbon Nanotube, ZnO nano-wire, GaN nano wire, TiO₂Any of nano wire, Ag nano wires, Au nano wires are two or more Combination.