CN107469478A - Fluid treating device and preparation method thereof - Google Patents
Fluid treating device and preparation method thereof Download PDFInfo
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- CN107469478A CN107469478A CN201610398960.7A CN201610398960A CN107469478A CN 107469478 A CN107469478 A CN 107469478A CN 201610398960 A CN201610398960 A CN 201610398960A CN 107469478 A CN107469478 A CN 107469478A
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0001—Making filtering elements
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
- B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
- B01D46/0028—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions provided with antibacterial or antifungal means
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/34—Chemical or biological purification of waste gases
- B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
- B01D53/86—Catalytic processes
- B01D53/8678—Removing components of undefined structure
- B01D53/8687—Organic components
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
- C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/50—Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D2255/00—Catalysts
- B01D2255/80—Type of catalytic reaction
- B01D2255/802—Photocatalytic
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/002—Construction details of the apparatus
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2305/00—Use of specific compounds during water treatment
- C02F2305/10—Photocatalysts
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Organic Chemistry (AREA)
- Water Supply & Treatment (AREA)
- Hydrology & Water Resources (AREA)
- Health & Medical Sciences (AREA)
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Abstract
A kind of fluid treating device and preparation method thereof.The fluid treating device includes：Matrix with first fluid passage, in the first area for the first surface that the fluid intake of the first fluid passage is distributed in described matrix；Flow impedance portion, there is the second surface being oppositely arranged with the first surface；Multiple lug bosses, described lug boss one end is fixedly installed in the second area of the first surface, the other end is fixedly connected with the second surface, it is spaced apart between adjacent projections, the second area of the first surface abuts with first area, so that second fluid passage is cooperatively formed between the multiple lug boss, flow impedance portion and matrix, and pending fluid is only capable of entering first fluid passage by the second fluid passage.The fluid treating device of the application has the characteristics that flux is big, flow resistance is small, energy high-efficient cleaning removes micro-/ nano grade particles in fluid, reusable, service life length, and produces in enormous quantities suitable for scale.
Description
Technical field
The application is more particularly to a kind of device that purified treatment is carried out to the fluid containing particulate matter and preparation method thereof.
Background technology
Daily life, work in, people for remove fluid in particle and make fluid be purified have extensively
Demand.For example, be directed to low-quality air, dust therein, molecule etc. need to be removed, to ensure the health of human body.Again
For example, for water, oil (edible oil, gasoline, diesel oil etc.), particulate matter therein need to be removed, to realize the purifying of water, oil.Example again
Such as, for fields such as biological medicines, it need to remove or screen cell in blood and body fluid, virus, bacterium etc..
Traditional fluid treating device (such as mouth mask, air purifier etc.) has that flux is low, volume is big, using the longevity mostly
Order the defects of short, and it is low for the elimination effect of fine particle in fluid.
In recent years, with the development of micro-nano process technology, researcher has also been proposed some streams based on porous membrane
Body processing equipment, i.e. go out micron or nano level numerous holes by etching (corrosion) on film, make it can apply to clearly
Except the particle in fluid, especially molecule, its size can be precisely controlled.But there is flux and mechanical strength in this device
Between contradiction, flux is big, often mechanical structure is fragile, and mechanical strength is big, flux again very little.This is due to that it processes skill
The limitation of art, if hole is smaller, film thickness just needs thinner, and this also make it that the mechanical support performance of porous membrane is further
Deterioration, can not adapt to adverse circumstances, and service life is also very limited, so so far can't be practical.
Currently there is researcher to utilize sacrificial layer technology, realize the fluid treating device comprising transverse flow channels and (refer to
Shown in Fig. 1), the aperture of these transverse flow channels can be controlled in several nanometers, therefore be beneficial to remove the fine particle in fluid,
But its flux is too small.
The content of the invention
The main purpose of the application is to provide a kind of fluid treating device of improvement and preparation method thereof, existing to overcome
Deficiency in technology.
To realize aforementioned invention purpose, the technical scheme that the application uses includes：
The embodiment of the present application provides a kind of fluid treating device, and it includes：
Matrix with first fluid passage, the first fluid passage have a fluid intake and fluid issuing, and described
The fluid intake of one fluid passage is distributed in the first area of the first surface of described matrix；
Flow impedance portion, the second surface that there is the first surface with described matrix to be oppositely arranged are pending for preventing
Fluid is directly entered the fluid intake of the first fluid passage；
The a plurality of lug bosses being intervally installed, described lug boss one end are fixedly installed on the first surface of described matrix
Second area in, the other end is fixedly connected with the second surface in the flow impedance portion, wherein between adjacent projections away from
From more than 0 but less than mixing in the particle diameter of the selected particle in pending fluid, the secondth area of the first surface of described matrix
Domain abuts with first area, so that cooperatively forming second fluid between a plurality of lug bosses, flow impedance portion and matrix
Passage, and pending fluid is only capable of entering first fluid passage by the second fluid passage.
More preferable, a plurality of lug bosses are set around the fluid intake of the first fluid passage.
Micro wire or nano wire more preferable, that the lug boss is set for setting, its a diameter of 1nm~50 μm are long
It is 1nm~50 μm to spend for the distance between 50nm~200 μm, adjacent projections.
The embodiment of the present application additionally provides a kind of method for preparing fluid treating device, and it includes：
There is provided with first surface and with first surface mutually back to the 3rd surface substrate；
The first surface of the substrate is processed, is intervally installed so as to be formed in the first surface of the substrate
A plurality of lug bosses, or, a plurality of lug bosses to be formed and be intervally installed are grown in the first surface of the substrate, its
The distance between middle adjacent projections are more than 0 but are less than and mix in the particle diameter of the selected particle in pending fluid；
The second surface being oppositely arranged with the first surface with the substrate is set on the first surface of the substrate
Flow impedance portion, and at least make to be distributed in a plurality of lug bosses in the second area of the first surface of the substrate with it is described
The second surface in flow impedance portion is fixedly connected；
3rd surface of the substrate is processed, formed through the substrate first fluid passage, described first
The fluid intake of fluid passage is distributed in the first area of the first surface of the substrate, and the of the first surface of the substrate
Two regions abut with first area, make to be distributed in a plurality of lug bosses, the stream in the second area of the first surface of the substrate
Second fluid passage is cooperatively formed between body stop part and substrate, and pending fluid is only capable of by the second fluid passage
Into first fluid passage.
Than prior art, the fluid treating device that the application provides is at least with flux is big, flow resistance is small, energy high-efficient cleaning removes
In fluid the features such as micro-/ nano grade particles, thicker matrix can be also used, high mechanical strength, can clean and be used for multiple times, make
With long lifespan, and preparation technology is simply controllable, is prepared on a large scale suitable for scale.
Brief description of the drawings
, below will be to embodiment or existing in order to illustrate more clearly of the embodiment of the present application or technical scheme of the prior art
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments described in application, for those of ordinary skill in the art, on the premise of not paying creative work,
Other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1 is a kind of sectional view of the fluid treating device comprising transverse flow channels in the prior art；
Fig. 2 is a kind of sectional view of fluid treating device in the application first embodiment；
Fig. 3 a- Fig. 3 e are a kind of lateral cross section in fluid treating device protrusions portion in the application some typical embodiments
Figure；
Fig. 4 a- Fig. 4 c are a kind of arrangement signal in fluid treating device protrusions portion in the application some typical embodiments
Figure；
Fig. 5 a- Fig. 5 c are the top view of multiple fluid processing unit in the application first embodiment；
Fig. 6 is a kind of sectional view of fluid treating device in the application second embodiment；
Fig. 7 is a kind of sectional view of fluid treating device in the application 3rd embodiment；
Fig. 8 is a kind of sectional view of fluid treating device in the application fourth embodiment；
Fig. 9 is a kind of sectional view of fluid treating device in the embodiment of the application the 5th；
Figure 10 is a kind of preparation technology flow chart of fluid treating device in the exemplary embodiments of the application one.
Embodiment
In view of deficiency of the prior art, inventor is able to propose the application's through studying for a long period of time and largely putting into practice
Technical scheme.The technical scheme, its implementation process and principle etc. will be further explained as follows.
A kind of fluid treating device that the one side of the embodiment of the present application proposes includes：
Matrix with first fluid passage, the first fluid passage have a fluid intake and fluid issuing, and described
The fluid intake of one fluid passage is distributed in the first area of the first surface of described matrix；
Flow impedance portion, the second surface that there is the first surface with described matrix to be oppositely arranged are pending for preventing
Fluid is directly entered the fluid intake of the first fluid passage；
The a plurality of lug bosses being intervally installed, described lug boss one end are fixedly installed on the first surface of described matrix
Second area in, the other end is fixedly connected with the second surface in the flow impedance portion, wherein between adjacent projections away from
From more than 0 but less than mixing in the particle diameter of the selected particle in pending fluid, the secondth area of the first surface of described matrix
Domain abuts with first area, so that cooperatively forming second fluid between a plurality of lug bosses, flow impedance portion and matrix
Passage, and pending fluid is only capable of entering first fluid passage by the second fluid passage.
Wherein, described matrix can be various forms, such as cuboid shape, sheet, polyhedral, hemispherical, spherical
Or other irregular forms.Therefore, described " first surface " can be any one unspecific conjunction in described matrix
Suitable plane or curved surface.
Wherein, the first fluid passage can be the through hole of any form, and its fluid intake is distributed in described matrix
On first surface, and its fluid issuing can be both distributed on another surfaces different from the first surface of described matrix
(for example, another surface can it is adjacent with the first surface, mutually back to), can also be distributed on described first surface (when
So in this case, described first surface Shang Yingyou fluid barriers mechanism, make pending fluid will not be described first
The fluid outlet is flowed to directly on a surface.In some cases, the fluid issuing of the first fluid passage be also can
To be distributed in inside described matrix, for example, when existing in described matrix to receive the cavity of the fluid after processing.
Wherein, the flow impedance portion can also be variform, for example, can be sheet, shell shape, cuboid shape,
Polyhedral etc., as long as it can make pending fluid will not be from by a plurality of lug bosses, flow impedance portion and matrix
Between fluid passage outside the second fluid passage that cooperatively forms enter the fluid intake of described first fluid passage.
And the setting form in the flow impedance portion can also be various, for example, it integrally can be arranged at intervals with described matrix, also
It can locally be connected with described matrix, or even in some cases, to be formed also but with described matrix by being integrally machined.
Wherein, the distributional pattern of the first area of the first surface of described matrix and second area can be various, example
As the first area with second area can be it is adjacent, can also spaced apart or second area surround
First area is set or first area locally embedding second area.The distributional pattern of the rwo can be according to the fluid
Stop part, the structure of matrix and position relationship each other etc. and adjust.
Wherein, described a plurality of lug bosses refer to two or more lug bosses.Wherein described lug boss be relative to
For the flat or recessed part of the first surface of described matrix, its form can be various, for example, it can be to stand
The wire of setting, column, sheet, tubulose, taper, frustum structure or Else Rule or irregular structure, and its lateral cross section
Structure (transverse direction herein, being primarily referred to as the direction parallel with the first surface of described matrix) can also be rule or irregular shape
Shape, such as can be that polygon (triangle, quadrangle or other), circle, ellipse, star etc. (are schemed refering to Fig. 3 a-
3e)。
Wherein, described a plurality of lug bosses can be regular or irregular, uniform or heterogeneous be distributed in described matrix
First surface on (refer to Fig. 4 a- Fig. 4 c).
Wherein, the fluid intake of the first fluid passage have rule or irregular shape, such as polygon (rectangle,
Rhombus is other), circular or ellipse etc., it can simply be adjusted according to the demand of practical application.
Wherein, described pending fluid can be gas phase or liquid phase, such as empty gas and water, oils, in some situations
The set of particulate matter lower or in flow-like, or molten state of Cucumber etc..
Wherein, described " particle " is primarily referred to as solid phase particles, but in some cases, can also be and the fluid
(particularly liquid phase fluid) incompatible drop etc..
In some more preferred embodiment, the second area of the first surface of described matrix is around firstth area
Domain is set.Particularly, it is distributed in fluid intake of a plurality of lug bosses around the first fluid passage of the second area
Set.Such setting form, the gap that can make to be distributed between a plurality of lug bosses of the second area are used as second
The part of fluid passage, so as to obtain larger fluid flux.
In some more preferred embodiment, also it is arranged at intervals with the 3rd region of the first surface of described matrix
A plurality of lug bosses, the second area are located between the 3rd region and first area.Wherein, it is distributed in the 3rd area
The top of a plurality of lug bosses in domain can be connected with the flow impedance portion, can not be also connected with the flow impedance portion, especially
It is that when not being connected at the top of these lug bosses with the flow impedance portion, then the gap between these lug bosses top also can structure
Into fluid passage, so as to further increase the contact surface of the fluid treating device and fluid, lifting fluid flux.
Especially preferred, the 3rd region of the first surface of described matrix is set around the second area.Further,
The lug boss for being distributed in the 3rd region and the lug boss for being distributed in the second area can be identical or different.Especially
Preferably, the 3rd region or the second area no matter are distributed across, as long as being distributed across the first table of described matrix
The distance between the adjacent projections in face are all higher than 0 but are less than to mix in the particle diameter of the selected particle in pending fluid.
More preferable, the first area of the first surface of described matrix and second area are distributed in the flow impedance portion
In in the orthographic projection on the first surface of described matrix.
More preferable, the lug boss is wire or columnar projections, and its draw ratio is 4：1~200000：1, and it is adjacent
The distance between lug boss and the ratio of the length of the lug boss are 1：4~1：200000.By using this structure and divide
The lug boss of cloth form, multiple lug bosses can be made intensive can to arrange (proportion is few certainly in unit area for lug boss),
Handled beneficial to the molecule in convection body, while it is (raised also to assign the larger fluid flux of the fluid treating device
Hole between portion is bigger than lug boss own vol).
Micro wire (pipe) or nano wire (pipe) especially preferred, that the lug boss is set for setting, its a diameter of 1nm~
50 μm, length is that the distance between 50nm~200 μm, adjacent projections are 1nm~50 μm, the stream that structure can so formed
The as low as nano level particle of particle diameter in body processing unit energy treatment fluid, and keep higher fluid processing flux.
Further, a plurality of lug bosses for being distributed in the 3rd region of the first surface of described matrix arrange to form tool
There are the micron order or nanoscale arrays structure of super-hydrophobic or superoleophobic performance.In this way, it can also assign the fluid treating device certainly
The functions such as cleaning.
It is of course also possible to by setting the suitable low surface as known to industry on the partially or fully surface of the lug boss
The coating that energy material is formed, or the lug boss directly is formed using hydrophobic material, so as to make it have ultra-hydrophobicity, from clearly
Clean performance etc..
In some more specific embodiment, the aperture of the first fluid passage can be 1 μm~1mm.
In some more specific embodiment, the thickness of described matrix is more than 1 μm.
Wherein, the material of described matrix can be selected from metal, nonmetallic, organic material, inorganic material etc., such as silicon chip,
Polymer, ceramics etc., and not limited to this.
In some more preferred embodiment, the lug boss may be selected from nano wire, such as carbon nanocoils, carbon nanometer
Pipe, ZnO nano-wire, GaN nano wire, TiO2Any of nano wire, Ag nano wires, Au nano wires or two or more groups
Close.
In some concrete application schemes, the lug boss can be by catalysis material or with antibacterial, sterilizing function
Material is formed, or, the lug boss can also be material of the surface covered with catalysis material or with sterilization, antibacterial functions
The coating of formation.For example, the lug boss can use ZnO nano-wire, GaN nano wire, TiO2Nano wire etc. has light-catalysed
The nano wire of property, under light auxiliary irradiation, the organic matter in the fluid that can degrade.For example, the lug boss can be received using Ag
Rice noodles, Au nano wires etc., to kill the bacterium in fluid, virus, microorganism.
In some more specific embodiment, the thickness in the flow impedance portion is 0.5 μm~200 μm.
In some more preferred embodiment, the fluid treating device may also include at least one supporter, institute
State supporter one end to be fixedly connected with described matrix, the other end is fixedly connected with the flow impedance portion.By the supporter,
The more cooperation of firm stable between flow impedance portion and matrix can be achieved, and can be effectively to being distributed in flow impedance portion and base
Lug boss between body forms protection, avoids because flow impedance portion and/or matrix by external force after being acted on, to the lug boss
Extruding and caused by lug boss the problems such as caving in, damaging.
Wherein, the supporter can be variform, such as column (cylinder, polygon prism etc.), step-like, frustum
Deng, and not limited to this, its flexural capacity should be greater than any described lug boss.And the supporter can be hindered in fluid
Processing forms or is integrally machined and to be formed with matrix or flow impedance portion between stopper and matrix.
Further, described supporter can be two or more, and the two or more supporter is symmetrically distributed in institute
Around the fluid intake for stating first fluid passage.
In some more preferred embodiment, one can have also been set up on the fluid intake of the first fluid passage
Beam supported above, the support beam are fixedly connected with the flow impedance portion, are formed and supported to convection body stop part, further
Lift the structural strength of the fluid treating device.
Further, the support beam can be more, its can with parallel arrangement the first fluid passage fluid
On entrance.
In some more preferred embodiment, the lug boss surface is additionally provided with function material layer, the function
The material of material layer includes catalysis material, anti-biotic material etc., and not limited to this.For example, more typical catalysis material
Can be titanium dioxide etc., when the fluid treating device convection body comprising this kind of function material is handled, if being aided with ultraviolet
Illumination etc., some organic pollutions that can also be in convection body etc. carries out photocatalytic degradation, realizes the multiple purifying of convection body.Example again
Such as, more typical anti-biotic material can be the noble metals such as Au, Ag, can be synchronous in the processing procedure of fluid by it
Kill bacterium in fluid, virus etc..
Further, for the benefit of light penetrates, and at least local of at least part component in the fluid treating device is
Transparent configuration.For example, can partly or entirely be made of clear material in the flow impedance portion, matrix, lug boss.
A kind of preparation method for fluid treating device that the other side of the embodiment of the present application proposes includes：
There is provided with first surface and with first surface mutually back to the 3rd surface substrate；
The first surface of the substrate is processed, is intervally installed so as to be formed in the first surface of the substrate
A plurality of lug bosses, or, a plurality of lug bosses to be formed and be intervally installed are grown in the first surface of the substrate, its
The distance between middle adjacent projections are more than 0 but are less than and mix in the particle diameter of the selected particle in pending fluid；
The second surface being oppositely arranged with the first surface with the substrate is set on the first surface of the substrate
Flow impedance portion, and at least make to be distributed in a plurality of lug bosses in the second area of the first surface of the substrate with it is described
The second surface in flow impedance portion is fixedly connected；
3rd surface of the substrate is processed, formed through the substrate first fluid passage, described first
The fluid intake of fluid passage is distributed in the first area of the first surface of the substrate, and the of the first surface of the substrate
Two regions abut with first area, make to be distributed in a plurality of lug bosses, the stream in the second area of the first surface of the substrate
Second fluid passage is cooperatively formed between body stop part and substrate, and pending fluid is only capable of by the second fluid passage
Into first fluid passage.
In some more specific embodiment, described preparation method includes：
Patterned first photoresist mask, then the first table to the substrate are set on the first surface of the substrate
Face performs etching, and so as to form a plurality of lug bosses being intervally installed in the first surface of the substrate, removes institute afterwards
State the first photoresist mask；
Soluble or corrodible organic matter and/or inorganic matter are coated with the first surface of the substrate, and makes organic matter
And/or the gap between inorganics filled a plurality of lug bosses, form sacrifice layer；
Second photoresist mask is set on the sacrifice layer, then the sacrifice layer is performed etching, at least makes to be distributed in
Exposed at the top of a plurality of lug bosses in the second area of the first surface of the substrate, remove second photoresist afterwards
Mask；
The 3rd mask is set in the first surface of the substrate, and makes on the substrate first surface and fluid
The corresponding region of stop part exposes, and deposition forms flow impedance portion afterwards, then removes the 3rd mask；
Patterned 4th photoresist mask, then the 3rd table to the substrate are set on the 3rd surface of the substrate
Face performs etching, until exposing the expendable material being filled between adjacent projections, so as in the 3rd surface shape of the substrate
Into slotted eye, the slotted eye position is corresponding with the first area of the first surface of the substrate, the first table of the substrate
The second area in face is set around the first area,
The 4th photoresist mask and the expendable material being filled between a plurality of lug bosses are removed, in the lining
The first fluid passage is formed on bottom.
More preferable, described a plurality of lug bosses are the vertical nano-pillar of complex root of array arrangement or vertical nanometer
Line.
The technical scheme of the application is further described below with reference to accompanying drawing and some embodiments.It should be noted
It is that only being carried out to the structure of the application fluid treating device and related device shown in accompanying drawing is simply illustrative, therefore
Non- accurate Drawing goes out the size of wherein each component, size etc..
Refer to shown in Fig. 2 and Fig. 5 a- Fig. 5 b, in the first embodiment of the application, a kind of fluid treating device includes
Matrix 101, described matrix 101 has first surface 101a, and (dotted line encloses in figure for the first area 1011 of described matrix 101
Region) some through holes 104 as fluid passage are distributed with, be provided with the first surface more vertical micro-/ nano lines/
The battle array that pipe 103 (that is, any of micron-sized line, micron-sized pipe, nano wire, nanotube or a variety of combinations) is formed
Row, it is distributed in more micro-/ nano line/pipes that the through hole 104 in the second area 1012 of first area 1011 is distributed
103 top is also associated with flow impedance portion 102, and the flow impedance portion 102 is arranged on the fluid intake of the through hole 104
Side, pending fluid can not be bypassed foregoing micro-/ nano line/pipe array and is directly entered the through hole 104, the fluid
Stop part 102 has the second surface 102b being oppositely arranged with the first surface 1011.And in the first surface 1011
Also can the vertical micro-/ nano line/pipe 103 of more of dense distribution in remaining region 1013 (the 3rd region can be named as).In fig. 2,
Arrow with dotted line shows the direct of travel of fluid.
Wherein, because foregoing micro-/ nano line/pipe has larger ratio of height to diameter (or draw ratio) so that these micro-/ nanos
Line/pipe can the densely arranged first surface in described matrix, by the spacing for adjusting these micro-/ nano line/pipes, you can convection body
The particle of middle different-grain diameter scope is purged processing, particularly, when use be nano wire/pipe when, by the way that these are received
Spacing control between rice noodles/pipe can not only remove the atomic small particle in fluid in nanoscale, and because nano wire/
Pipe diameter itself is minimum, it is controlled in very low level for the resistance of fluid, and forms very big fluid flux,
Far superior to existing perforated membrane, fluid treating device based on transverse flow channels etc..
Wherein, if with reference to known to industry scheme, foregoing micro-/ nano line/pipe array is carried out to certain design, may be used also
Be allowed to form super-drainage structure, superoleophobic structure, can not only remove the particle in fluid, and can also by automatic cleaning action,
The particle for making to be blocked can not gather in the functional area (micro-/ nano line/pipe array surface) of the fluid treating device, avoid
The fluid treating device fails after long-term use.
Wherein, described matrix 101 can have larger thickness, it is formed preferably foregoing micro-/ nano line/pipe array
Support, while the mechanical strength of the fluid treating device can be increased further, makes the fluid treating device pressure-resistant, resistance to
Bending, impact resistant, impact resistance, and then it is applied and will not be damaged in a variety of environment, such as can apply to height
Pressure, high-velocity fluid are handled, and this function is that existing perforated membrane etc. can not be reached.
Wherein, the flow impedance portion can be that sheet, its thickness etc. can adjust according to practical application request.
Wherein, the material selection range of the fluid treating device each several part (101,102,103,104) is various, can
To be inorganic material or organic material, for example, metal, non-metal inorganic material, plastics, ceramics, semiconductor, glass,
Polymer etc..When these parts all select to use inorganic material, the fluid treating device also has the spy of resistance to temperature change
Property, high temperature and cryogen can be handled.
Using previous designs described fluid treating device can (ultrasound) cleaning, be used for multiple times, and remain on good
Good fluid handling abilities.
When being handled using described fluid treating device convection body, the fluid containing impurity particle is stated before entry
During the array that micro-/ nano line 103 forms, wherein particle diameter be more than certain numerical value particle (or some drops incompatible with fluid,
Such as the water droplet in the water droplet or oil in air) be blocked in outside foregoing micro-/ nano line/pipe array, fluid is via each afterwards
Gap between micro-/ nano line/pipe enters back into through hole 104 after reaching the porch of through hole 104, realize convection body purification and/
Or the enriching and recovering to required particle (drop).
Referring to shown in Fig. 2, in some concrete application schemes of the first embodiment, foregoing micro-/ nano line
Diameter can be 1nm~50 μm, length (height) h1Can be that the distance between 50nm~200 μm, adjacent micro-/ nano line can be with
For 1nm~50 μm.The aperture w of the through hole 104 can be 1 μm~1mm.The thickness h of described matrix2Can be more than 1 μm.Institute
State the thickness h in flow impedance portion3It can be 0.5 μm~200 μm.
Referring to Fig. 3 a- Fig. 3 e, the lateral cross section structure of foregoing micro-/ nano line can be rule or irregular shape
, such as can be polygon (triangle, quadrangle or other), circle, ellipse, star etc..
Referring to Fig. 4 a- Fig. 4 c, foregoing micro-/ nano line can regular or irregular, uniform or distribution heterogeneous
On the first surface of described matrix.In some more specific application schemes, the average headway of adjacent micro-/ nano line exists
1nm~50 μm.
In addition, refer to Fig. 5 a- Fig. 5 c, in this first embodiment, the shape in aforementioned through-hole 104 and flow impedance portion 102
Shape (the particularly shape of lateral cross section) can be various, such as can be circular, square, rectangle or other shapes.
Refer to shown in Fig. 6, more preferably, in the second embodiment of the application, a kind of fluid treating device includes
Matrix 201, described matrix 201 have first surface and with the first surface mutually back to and the 3rd surface, and described matrix 201
On some through holes 204 as fluid passage are distributed with, more vertical micro-/ nano line/pipes 203 are provided with the first surface
The array of formation, flow impedance portion is also associated with around the top of more micro-/ nano line/pipes 203 of the through hole 204 distribution
202, the flow impedance portion 202 is arranged above the fluid intake of the through hole 204, before pending fluid is not bypassed
Micro-/ nano line/pipe array for stating and be directly entered the through hole 204.It is also, also symmetrical or not right around the through hole 204
Being distributed with for claiming is more than one, such as four supporters 205, can also increase by the supporter 205 and the fluid is hindered
The support of stopper 202, the more cooperation of firm stable between flow impedance portion and matrix is realized, and can be effectively to being distributed in stream
Micro-/ nano line between body stop part and matrix/pipe array forms protection, avoid because flow impedance portion and/or matrix by
After external force effect, the problems such as micro-/ nano line/pipe 203 caused by the extruding of foregoing micro-/ nano line/pipe array caves in, damaged.
Wherein, the supporter can be variform, such as can have rectangle, trapezoidal, step longitudinal cross-section
(longitudinal direction herein can be regarded as perpendicular to the direction of described matrix first surface) etc., and not limited to this.In second implementation
In some specific embodiments of example, the supporter can be to project upwards the boss to be formed from the edge part of through hole 204
Deng its upper end connection flow impedance portion 202.
Wherein, the quantity of the supporter, diameter, distribution density etc. can adjust according to being actually needed, but it is few to try one's best
Occupancy described matrix first surface space, avoid its fluid flux to the micro-/ nano line from causing big influence.
The structure of matrix, micro-/ nano line/pipe array, flow impedance portion, through hole employed in the second embodiment etc.,
Setting form, material etc. can with address above it is same or similar, so here is omitted.
Refer to shown in Fig. 7, more preferably, in the 3rd embodiment of the application, a kind of fluid treating device includes
Matrix 301, described matrix 301 have first surface and with the first surface mutually back to and the 3rd surface, and described matrix 301
On some through holes 304 as fluid passage are distributed with, more vertical micro-/ nano line/pipes 303 are provided with the first surface
The array of formation, flow impedance portion is also associated with around the top of more micro-/ nano line/pipes 303 of the through hole 304 distribution
302, the flow impedance portion 302 is arranged above the fluid intake of the through hole 304, before pending fluid is not bypassed
Micro-/ nano line/pipe array for stating and be directly entered the through hole 304.Also, on the through hole 304 also set up have one with
On, such as the more support beams 305 symmetrically or non-symmetrically arranged, it can also increase to the fluid by the support beam 305
The support of stop part 302, the more cooperation of firm stable between flow impedance portion and matrix is realized, and can be effectively to being distributed in
Micro-/ nano line between flow impedance portion and matrix/pipe array forms protection, avoid because flow impedance portion and/or matrix by
After being acted on to external force, micro-/ nano line/pipe 303 caused by the extruding of foregoing micro-/ nano line/pipe array, which caves in, damaged, etc. asks
Topic.
Wherein, the support beam can be variform, such as can be with arch-shaped etc., and not limited to this.And further
, the support beam can also coordinate with other supporters, such as the supporter addressed in second embodiment coordinates.
Wherein, the quantity of the support beam, size, distribution density etc. can adjust according to being actually needed, but it is few to try one's best
The fluid intake for blocking the through hole, avoid its fluid flux to the fluid treating device from causing big influence.
The structure of matrix, micro-/ nano line/pipe array, flow impedance portion, through hole employed in the 3rd embodiment etc.,
Setting form, material etc. can with address above it is same or similar, so here is omitted.
Refer to shown in Fig. 8, more preferably, in the fourth embodiment of the application, a kind of fluid treating device includes
Matrix 401, described matrix 401 have first surface 4011 and with the first surface mutually back to the 3rd surface 4012, it is and described
Some through holes 404 as fluid passage are distributed with matrix 401, more vertical nano-pillars are provided with the first surface
403 arrays formed, flow impedance portion 402 is also associated with around the top of more nano-pillars 403 of the through hole 304 distribution,
The flow impedance portion 402 is arranged above the fluid intake of the through hole 404, pending fluid is not bypassed foregoing
Nano column array and be directly entered the through hole 304.Also, in the surface of nano-pillar 403 and the first table of described matrix 401
Layers of photo-catalytic material 405 is additionally provided with face.At with the fluid treating device convection body comprising layers of photo-catalytic material 405
During reason, if being aided with ultraviolet lighting etc., some organic pollutions that can also be in convection body etc. carry out photocatalytic degradation, realize convection body
Multiple purifying.
Wherein, for the benefit of light penetrates, in the flow impedance portion, matrix, lug boss partly or entirely can be by saturating
Bright material is made.In some specific embodiments of the present embodiment, the flow impedance portion can be integrally by transparent material system
Into, such as light injection.
Wherein, more typical catalysis material can be titanium dioxide etc., but not limited to this.
Wherein, to form the layers of photo-catalytic material 405, those skilled in the art can use a variety of sides known to industry
Formula, for example, coating (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald),
Sputtering etc., and not limited to this.
Wherein, the thickness of the layers of photo-catalytic material 405 can be controlled in nanoscale, to reduce it to the stream as far as possible
The influence of the fluid flux of body processing unit.
The structure of matrix, micro-/ nano line/pipe array, flow impedance portion, through hole employed in the fourth embodiment etc.,
Setting form, material etc. can with address above it is same or similar, so here is omitted.
Refer to shown in Fig. 9, more preferably, in the 5th embodiment of the application, a kind of fluid treating device includes
Matrix 501, described matrix 501 have first surface 5011 and with the first surface mutually back to the face of the 3rd table 5012, it is and described
Some through holes 504 as fluid passage are distributed with matrix 501, more vertical nano-pillars are provided with the first surface
503 arrays formed, flow impedance portion 502 is also associated with around the top of more nano-pillars 503 of the through hole 504 distribution,
The flow impedance portion 502 is arranged above the fluid intake of the through hole 504, pending fluid is not bypassed foregoing
Nano column array and be directly entered the through hole 504.Also, in the surface of nano-pillar 503 and the first table of described matrix 501
Anti-biotic material layer 505 is additionally provided with face.Handled with the fluid treating device convection body comprising anti-biotic material layer 505
When, bacterium in fluid, virus etc. can be synchronously killed in the processing procedure of fluid, realize the multiple purifying of convection body.
Wherein, more typical anti-biotic material can be noble metals such as Au, Ag etc., but not limited to this.
Wherein, to form the anti-biotic material layer 505, those skilled in the art can use a variety of sides known to industry
Formula, for example, coating (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald),
Sputtering etc., and not limited to this.
Wherein, the thickness of the anti-biotic material layer 505 can be controlled in nanoscale, to reduce it to the fluid as far as possible
The influence of the fluid flux of processing unit.
The structure of matrix, micro-/ nano line/pipe array, flow impedance portion, through hole employed in 5th embodiment etc.,
Setting form, material etc. can with address above it is same or similar, so here is omitted.
The fluid treating device of the application can prepare by physics, chemical method, such as can be chemically grown
Method, Physical Processing method etc., particularly MEMS (MEMS, Microelectromechanical Systems) method etc..
For example, refer to shown in Figure 10, in the sixth embodiment of the application, a kind of preparation technology of fluid treating device
It may include steps of：
S1：(it is defined as setting patterned photoresist to cover on first surface a) in a side surface of substrate (such as silicon chip)
Mould；
S2：The first surface of the substrate is performed etching, is spaced so as to be formed in the first surface of the substrate
The more vertical nano-wires set, remove the first photoresist mask afterwards；
S3：Soluble or corrodible organic matter and/or inorganic matter are coated with the first surface of the substrate, and is made organic
Gap between thing and/or inorganics filled each vertical nano-wire, form sacrifice layer；
S4：Photoresist is set on the sacrifice layer, and carries out photoetching；
S5：The sacrifice layer is performed etching, makes to be distributed in more in the second area of the first surface of the substrate
Exposed at the top of vertical nano-wire, remove photoresist afterwards；
S6：The substrate first surface set photoresist mask, and make it is on the substrate first surface, with it is described
The corresponding region in flow impedance portion exposes；
S7：Deposition forms flow impedance portion in region expose, corresponding with the flow impedance portion；
S8：Peel off and remove photoresist；
S9：Patterned etching mask is set on the second surface of the substrate；
S10：To the substrate and first surface mutually back to another side surface (be defined as the 3rd surface b) to carve
Erosion, until exposing the expendable material being filled between neighboring vertical nano wire, so as to form groove on the 3rd surface of the substrate
Hole, the slotted eye position is corresponding with the first area of the first surface of the substrate, the first surface of the substrate
Second area is set around the first area；
S11：The etching mask and the expendable material being filled between each vertical nano-wire are removed, fluid processing dress is made
Put.
The lithographic method used in These steps can be photoetching, Mechanical lithography, dry etching, wet etching etc..
For example, in abovementioned steps S1, forming the method for the photoresist mask of graphical (nano graph) includes：Photoetching skill
Art, nanometer bead mask technique, nanometer (metal) particle mask technology etc., and not limited to this.
For example, in abovementioned steps S2, mode known to industry, such as RIE, ICP, wet etching, electrochemistry can be passed through
Corrosion etc. etches vertical nanowires linear array.
For example, in abovementioned steps S3, the dissolved organic matter of filling can be photoresist etc. or corrodible inorganic matter such as
Metal, SiO2, silicon nitride etc..
For example, in abovementioned steps S10, mode known to industry, such as RIE, ICP, wet etching, electrochemistry can be passed through
Corrosion etc. etches the slotted eye.
Obviously, the preparation technology of the application fluid treating device is simple controllable, is adapted to mass large-scale production.
It should be appreciated that above-described embodiment is only the technical concepts and features for illustrating the application, its object is to allow be familiar with this
The personage of item technology can understand present context and implement according to this, and the protection domain of the application can not be limited with this.It is all
The equivalent change or modification made according to the application Spirit Essence, it should all cover within the protection domain of the application.
Claims (11)
- A kind of 1. fluid treating device, it is characterised in that including：Matrix with first fluid passage, the first fluid passage has fluid intake and fluid issuing, described first-class The fluid intake of body passage is distributed in the first area of the first surface of described matrix；Flow impedance portion, the second surface that there is the first surface with described matrix to be oppositely arranged, for preventing pending fluid It is directly entered the fluid intake of the first fluid passage；The a plurality of lug bosses being intervally installed, described lug boss one end are fixedly installed on the of the first surface of described matrix In two regions, the other end is fixedly connected with the second surface in the flow impedance portion, and wherein the distance between adjacent projections are big In 0 but less than mixing in the particle diameter of the selected particle in pending fluid, the second area of the first surface of described matrix with First area abuts, so that second fluid passage is cooperatively formed between a plurality of lug bosses, flow impedance portion and matrix, And pending fluid is only capable of entering first fluid passage by the second fluid passage.
- 2. fluid treating device according to claim 1, it is characterised in that：A plurality of lug bosses are around described first The fluid intake of fluid passage is set；And/or also it is arranged at intervals with the 3rd region of the first surface of described matrix a plurality of Lug boss, the second area are located between the 3rd region and first area；And/or the first surface of described matrix First area and second area are distributed in the flow impedance portion in the orthographic projection on the first surface of described matrix；And/or The fluid treating device also includes at least one supporter, and described supporter one end is fixedly connected with described matrix, the other end It is fixedly connected with the flow impedance portion.
- 3. fluid treating device according to claim 2, it is characterised in that：3rd region of the first surface of described matrix Set around the second area；And/or the fluid treating device include two or more described in supporter, and this two Individual above-described supporter is symmetrically distributed in around the fluid intake of the first fluid passage.
- 4. fluid treating device according to claim 1, it is characterised in that：On the fluid intake of the first fluid passage Erection has a beam supported above, and the support beam is fixedly connected with the flow impedance portion；And/or the lug boss is station Erect any one in the wire put, column, sheet, tubulose, taper, frustum structure；And/or the horizontal stroke of the lug boss To section there is rule or irregular shape, the regular shape to include polygon, circle or ellipse；And/or described answer Several lug bosses are uniformly distributed or non-uniform Distribution is on the first surface of described matrix；And/or the first fluid passage There is fluid intake rule or irregular shape, the regular shape to include polygon, circle or ellipse.
- 5. fluid treating device according to claim 4, it is characterised in that：The lug boss is that wire is raised, its major diameter Than for 4：1~200000：1；And/or the distance between adjacent projections and the ratio of the length of the lug boss are 1：4~1： 200000。
- 6. fluid treating device according to claim 5, it is characterised in that：The micro wire that the lug boss is set for setting Or nano wire, its a diameter of 1nm~50 μm, length are that the distance between 50nm~200 μm, adjacent projections are 1nm~50 μm.
- 7. the fluid treating device according to claim 1 or 6, it is characterised in that：It is distributed in the first surface of described matrix A plurality of lug bosses in the 3rd region arrange the micron order or nanoscale arrays knot to be formed with super-hydrophobic or superoleophobic performance Structure.
- 8. fluid treating device according to claim 1, it is characterised in that：The aperture of the first fluid passage is 1 μm ~1mm；And/or the thickness of described matrix is more than 1 μm；And/or the thickness in the flow impedance portion is 0.5 μm~200 μm； And/or the lug boss surface is additionally provided with function material layer, the material of the function material layer includes catalysis material or anti- Bacterium material；And/or at least local of at least part component in the fluid treating device is transparent configuration.
- A kind of 9. preparation method of fluid treating device, it is characterised in that including：There is provided with first surface and with first surface mutually back to the 3rd surface substrate；The first surface of the substrate is processed, so as to which what is be intervally installed in the formation of the first surface of the substrate answers Several lug bosses, or, a plurality of lug bosses to be formed and be intervally installed, wherein phase are grown in the first surface of the substrate The distance between adjacent lug boss is more than 0 but is less than and mixes in the particle diameter of the selected particle in pending fluid；The stream for the second surface being oppositely arranged with the first surface with the substrate is set on the first surface of the substrate Body stop part, and at least make to be distributed in a plurality of lug bosses in the second area of the first surface of the substrate and the fluid The second surface of stop part is fixedly connected；3rd surface of the substrate is processed, forms the first fluid passage through the substrate, the first fluid The fluid intake of passage is distributed in the first area of the first surface of the substrate, the secondth area of the first surface of the substrate Domain abuts with first area, makes to be distributed in a plurality of lug bosses in the second area of the first surface of the substrate, fluid hinders Second fluid passage is cooperatively formed between stopper and substrate, and pending fluid is only capable of entering by the second fluid passage First fluid passage.
- 10. preparation method according to claim 9, it is characterised in that including：Patterned first photoresist mask is set on the first surface of the substrate, then the first surface of the substrate is entered Row etching, so as to form a plurality of lug bosses for being intervally installed in the first surface of the substrate, described the is removed afterwards One photoresist mask；The first surface coating of the substrate is soluble or corrodible organic matter and/or inorganic matter, and make organic matter and/or Gap between inorganics filled a plurality of lug bosses, form sacrifice layer；Second photoresist mask is set on the sacrifice layer, then the sacrifice layer is performed etching, at least makes to be distributed in described Exposed at the top of a plurality of lug bosses in the second area of the first surface of substrate, remove second photoresist afterwards and cover Mould；The 3rd mask is set in the first surface of the substrate, and makes on the substrate first surface and flow impedance The corresponding region in portion exposes, and deposition forms flow impedance portion afterwards, then removes the 3rd mask；Patterned 4th photoresist mask is set on the 3rd surface of the substrate, then the 3rd surface of the substrate is entered Row etching, until exposing the expendable material being filled between adjacent projections, so as to form groove on the 3rd surface of the substrate Hole, the slotted eye position is corresponding with the first area of the first surface of the substrate, the first surface of the substrate Second area is set around the first area,The 4th photoresist mask and the expendable material being filled between a plurality of lug bosses are removed, on the substrate Form the first fluid passage.
- 11. the preparation method according to claim 9 or 10, it is characterised in that：Described a plurality of lug bosses are arranged for array The vertical nano-pillar of complex root of cloth or vertical nano wire.
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| CN201610398960.7A CN107469478B (en) | 2016-06-07 | 2016-06-07 | Fluid treatment device and preparation method thereof |
| PCT/CN2017/086780 WO2017211215A1 (en) | 2016-06-07 | 2017-06-01 | Fluid processing device and preparation method therefor |
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|---|---|---|---|
| CN201610398960.7A CN107469478B (en) | 2016-06-07 | 2016-06-07 | Fluid treatment device and preparation method thereof |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| CN110966879A (en) * | 2018-10-01 | 2020-04-07 | 通用汽车环球科技运作有限责任公司 | Assembly with enhanced heat transfer through vascular access and method of making same |
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