WO2017211215A1

WO2017211215A1 - Fluid processing device and preparation method therefor

Info

Publication number: WO2017211215A1
Application number: PCT/CN2017/086780
Authority: WO
Inventors: 杨国勇; 史建伟
Original assignee: 杨国勇; 蔡勇; 史建伟; 毛凌锋
Priority date: 2016-06-07
Filing date: 2017-06-01
Publication date: 2017-12-14

Abstract

Disclosed are a fluid processing device and a preparation method therefor. The fluid processing device comprises: a substrate (101) having a fluid channel, and a fluid processing mechanism for processing a fluid to be processed when the fluid to be processed in a mixture with selected particles flows through the fluid channel or prior to flowing through the fluid channel; the fluid processing mechanism is distributed on a first surface (1011) of the substrate (101) or inside the fluid channel and has a fluid processing microstructure, the diameter of the opening through which the fluid flows in the fluid processing microstructure is greater than 0 but less than the particle size of the selected particles. The fluid processing device has the characteristics of a large flux, a small flow resistance, and efficient removal of micro/nano scale particles in the fluid, and is reusable, has a long service life and is suitable for large-scale mass production. The present invention also relates to a method for preparing the fluid processing device.

Description

Fluid processing device and preparation method thereof

Technical field

The present invention specifically relates to an apparatus for purifying a fluid containing particulate matter and a preparation method thereof.

Background technique

In daily life and work, there is a wide demand for purifying fluids in the fluid to purify the fluid. For example, for low-quality air, it is necessary to remove dust, tiny particles, etc. to protect the health of the human body. For another example, for water, oil (edible oil, gasoline, diesel, etc.), the particulate matter needs to be removed to purify water and oil. For example, in the field of biomedicine and the like, it is necessary to remove or screen cells, viruses, bacteria, and the like in blood and body fluids. For example, in general, there are usually particulate pollutants such as dust in the air. If the human body inhales such air for a long time, it often causes damage to the human respiratory system. Especially for some special people, such as those who are allergic to pollen, if they inhale the air containing these allergens, they will cause asthma, exhalation and other symptoms.

Conventional fluid processing devices (such as masks, air purifiers, etc.) often have defects such as low flux, large volume, short service life, and the like, and the effect of removing fine particles in the fluid is low. For example, in order to protect the health and safety of the human body, people have used masks made of cotton, gauze and other materials to filter out particulate pollutants in the air. However, such conventional masks are only effective for larger particle contaminants and may be contaminated after a short period of use. In addition, considering the severe smog weather that has occurred in many places at home and abroad in recent years, a large amount of PM2.5 (particles with an equivalent particle size of 2.5 μm or less in the air) present in the air will seriously affect human health, while ordinary The mask has no filtering effect on PM2.5. The industry has also proposed masks and respirators (such as N95 masks) that contain special filters such as electrostatic filters, which have good filtering properties for common polluting particles in the air, but have large air resistance, difficulty in breathing, and smog weather. In other words, it is basically impossible to protect.

In recent years, with the development of micro-nano processing technology, researchers have proposed some fluid processing equipment based on porous film, which can be applied by etching (corroding) many holes in the micrometer or nanometer on the film. In the removal of particles in the fluid, especially tiny particles, the size can be precisely controlled, and the flux is large. However, such a device has a contradiction between flux and mechanical strength. When the flux is large, the mechanical structure is often fragile, and the mechanical strength is large, and the flux is small. This is due to the limitations of its processing technology. If the pores are smaller, the thinner the film thickness is, which further deteriorates the mechanical support properties of the porous film, cannot adapt to harsh environments, and has a very limited service life. Can not be put into practical use.

Researchers have also used sacrificial layer technology to implement fluid handling devices that include lateral flow paths (see Figure 1). Shown that the pore size of these lateral flow channels can be controlled to a few nanometers, thus facilitating the removal of fine particles in the fluid, but the flux is too small.

Summary of the invention

The primary object of the present application is to provide an improved fluid processing apparatus and method of making same that overcomes the deficiencies of the prior art.

To achieve the foregoing object, the technical solution adopted by the present application includes:

The embodiment of the present application provides a fluid processing apparatus, including:

a substrate having a fluid passage, and,

a fluid treatment mechanism for treating the fluid to be treated when the fluid to be treated mixed with the selected particles flows through the fluid passage or before flowing through the fluid passage;

The fluid processing mechanism is distributed on the first surface of the substrate or inside the fluid channel and has a fluid processing microstructure, wherein the diameter of the opening for fluid passage in the fluid processing microstructure is greater than 0 but less than the selected The particle size of the particles.

The embodiment of the present application further provides a fluid processing apparatus, including:

a base having a first fluid passage having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid passage being distributed on a first surface of the base;

a plurality of protrusions spaced apart from each other, the protrusions extending continuously on the first surface of the base body in a lateral direction, a lower portion fixedly disposed on the first surface of the base body, and an upper portion having a cap extending continuously in the lateral direction a shape-shaped structure, the opposite sides of the hat-shaped structure are laterally extended, and an opening portion through which the fluid can pass is formed between the adjacent hat-shaped structures, and the diameter of the opening portion is greater than 0 but less than the mixed a particle size of the selected particles in the fluid to be treated, wherein at least two of the raised portions are respectively disposed adjacent to opposite sides of the fluid inlet of the first fluid passage, and at least one The raised portion passes directly from the fluid inlet of the first fluid passage, thereby engaging a plurality of hat-shaped structures, a plurality of projections and the base body to form a second fluid in communication with the first fluid passage The passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

a porous structure formed by intersecting a plurality of linear bodies to form a second fluid passage with the first surface of the base body, wherein the plurality of linear bodies are fixedly connected to the base body at one end, and the porous structure has a hole a diameter greater than 0 but less than the particle size of the selected particles mixed in the fluid to be treated, and the fluid to be treated can only pass through the second fluid The road enters the first fluid passage.

a substrate having a first fluid passage having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid passage being distributed in a first region of the first surface of the substrate;

a fluid blocking portion having a second surface disposed opposite the first surface of the base body for preventing a fluid inlet of the fluid to be treated from directly entering the first fluid passage;

a plurality of raised portions spaced apart from each other, the convex portion is fixedly disposed at one end in a second region of the first surface of the base body, and the other end is fixedly connected to the second surface of the fluid blocking portion, wherein adjacent The distance between the raised portions is greater than zero but less than the particle size of the selected particles that are intermingled with the fluid to be treated, the second region of the first surface of the substrate being contiguous with the first region, such that the plurality of convexities The starting portion, the fluid blocking portion and the base body cooperate to form a second fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

Embodiments of the present invention also provide a fluid processing apparatus, including:

a plurality of vertical nano-linear bodies distributed in a second region of the first surface of the substrate and spaced apart from each other, a second region of the first surface of the substrate being disposed around the first region, Two ends of the nano-linear body are respectively fixedly connected to the first surface of the base body and the second surface of the fluid blocking portion, wherein a distance between adjacent nano-linear bodies is greater than 0 but less than mixed with the fluid to be treated a particle size of the selected particles, such that the plurality of nanowires, the fluid barrier and the substrate cooperate to form a second fluid channel, and the fluid to be treated can only enter through the second fluid channel A fluid passage.

The embodiment of the present application further provides a fluid processing apparatus comprising:

a plurality of protrusions extending continuously in a second region of the first surface of the substrate in a lateral direction, wherein a groove through which a fluid can pass is formed between adjacent protrusions, the groove The opening of the opening has a diameter greater than 0 but less than the particle size of the selected particles mixed in the fluid to be treated, and the upper end of the raised portion is sealingly connected to the first surface of the base, a partial region of the lower end is sealingly coupled to the second surface of the fluid blocking portion such that more than one groove, fluid barrier between the plurality of projections cooperates with the base to form a second fluid passage, and the to-be-processed Fluid can only enter the first fluid passage through the second fluid passage.

Another embodiment of the present application provides another fluid processing apparatus comprising:

a plurality of protrusions spaced apart from each other, the protrusions being fixedly disposed on the first surface of the base body and extending continuously on the first surface of the base body in a lateral direction, wherein between the adjacent protrusions Forming a groove through which the fluid can pass, the opening of the groove having a diameter greater than 0 but smaller than the particle size of the selected particles mixed in the fluid to be treated, and wherein at least two of the raised portions are respectively Two opposite sides of the opposite sides of the fluid inlet of the first fluid passage are disposed adjacent to each other, and at least one convex portion directly passes through the fluid inlet of the first fluid passage, so that the plurality of convex portions and the base body The interfitting forms a second fluid passage in communication with the first fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

The embodiment of the present application further provides another fluid processing apparatus, including:

a substrate having a fluid passage, and

An aggregate of a plurality of linear bodies for treating a fluid mixed with the selected particles flowing through the fluid passage;

The aggregates are distributed within the fluid channel and have a porous structure, the pores within the porous structure having a diameter greater than zero but less than the particle size of the selected particles.

The embodiment of the present application further provides a nasal plug respirator, including:

a nasal plug and a filter chip, at least one end of the nasal plug can be inserted into a nasal cavity of a user, and the nasal plug includes a gas passage communicating with the nasal cavity, and the filter chip is used to filter out the mixed airflow to be treated, a particle having a particle diameter larger than a set value, wherein the gas to be treated flows into the gas passage in the nasal plug after flowing through the filter chip;

A filter chip protection structure is used to protect the filter chip.

Advantages of the present application compared to the prior art include:

1) The fluid processing device provided by the present application has at least a large flux, a small flow resistance, and can effectively remove micro/nano-sized particles in a fluid, and can also adopt a thick substrate, has high mechanical strength, and can be (ultrasonic) cleaned and It has many times of use, long service life, and preferably has self-cleaning function, and the preparation process is simple and controllable, and is suitable for large-scale preparation in large scale.

2) The nasal plug type respirator provided by the present application has good filterability, convenient breathing, good comfort, can be used multiple times, and has a long service life;

3) The filter chip in the present application has at least a large flux, a small flow resistance, and can efficiently remove micro/nano particles in the air, etc. Features, can also use thicker substrate, high mechanical strength, can be (ultrasonic) cleaning and multiple use, long service life, and preferably has a self-cleaning function, while its preparation process is simple and controllable, suitable for large-scale large-scale preparation .

DRAWINGS

In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings to be used in the embodiments or the prior art description will be briefly described below. Obviously, the drawings in the following description are only It is a few embodiments described in the present application, and other drawings can be obtained from those skilled in the art without any creative work.

1 is a cross-sectional view of a fluid processing apparatus including a lateral flow path in the prior art;

Figure 2 is a plan view of a fluid processing apparatus in a first embodiment of the present application;

Figure 3 is a partial cross-sectional view (A-A direction) of a fluid processing apparatus in a first embodiment of the present application;

4 is a flow chart of a preparation process of a fluid processing apparatus according to a first embodiment of the present application;

Figure 5 is a plan view of a fluid processing apparatus in a second embodiment of the present application;

Figure 6 is a partial cross-sectional view showing a fluid processing apparatus in a second embodiment of the present application;

7 is a flow chart showing a preparation process of a fluid processing apparatus according to a second embodiment of the present application;

Figure 8 is a cross-sectional view showing a fluid processing apparatus in a third embodiment of the present application;

9a-9e are transverse cross-sectional views of a raised portion of a fluid processing apparatus in some exemplary embodiments of the present application;

10a-10c are schematic views showing the arrangement of the bosses in a fluid processing apparatus according to some exemplary embodiments of the present application;

11a-11c are top views of various fluid processing devices in a third embodiment of the present application;

Figure 12 is a plan view of a fluid processing apparatus in a fourth embodiment of the present application;

Figure 13 is a plan view of a fluid processing apparatus in a fifth embodiment of the present application;

Figure 14 is a cross-sectional view showing a fluid processing apparatus in a sixth embodiment of the present application;

Figure 15 is a cross-sectional view showing a fluid processing apparatus in a seventh embodiment of the present application;

16 is a flow chart showing a preparation process of a fluid processing apparatus according to an eighth embodiment of the present application;

17 is a flow chart showing a preparation process of a fluid processing apparatus according to a ninth embodiment of the present application;

Figure 18 is a plan view of a fluid processing apparatus in a tenth embodiment of the present application;

Figure 19 is a partial cross-sectional view showing a fluid processing apparatus in a tenth embodiment of the present application;

Figure 20 is a plan view showing a fluid processing apparatus in an eleventh embodiment of the present application;

Figure 21 is a partial cross-sectional view showing a fluid processing apparatus in a twelfth embodiment of the present application;

Figure 22 is a partial cross-sectional view showing a fluid processing apparatus in a thirteenth embodiment of the present application;

Figure 23 is a plan view showing a fluid processing apparatus in a fourteenth embodiment of the present application;

Figure 24 is a partial cross-sectional view showing a fluid processing apparatus in a fifteenth embodiment of the present application;

Figure 25 is a flow chart showing the preparation process of a fluid processing apparatus in a sixteenth embodiment of the present application;

Figure 26 is a schematic view showing the structure of a nasal stopper type respirator according to a seventeenth embodiment of the present application.

detailed description

The specific embodiments of the present application are described in detail below with reference to the accompanying drawings. Examples of these preferred embodiments are illustrated in the drawings. The embodiments of the present application shown in the drawings and described in the drawings are merely exemplary, and the application is not limited to the embodiments.

It should also be noted that, in order to avoid obscuring the present application by unnecessary detail, only the structures and/or processing steps closely related to the solution according to the present application are shown in the drawings, and the Other details of this application are not relevant.

A fluid processing apparatus according to an aspect of the embodiments of the present application includes:

a substrate having a fluid passage, and,

A fluid processing apparatus according to another aspect of the embodiments of the present application includes:

The foregoing "lateral direction" can be understood to mean any direction that is parallel or substantially parallel to the first surface of the substrate. And the foregoing "Side" can be understood as any direction that is not perpendicular to the first surface but intersects the "lateral". Preferably, if the first surface is a horizontal plane, the “lateral direction” may be a direction extending horizontally outward or obliquely upward from a side of the protrusion.

Wherein, the substrate may be in various forms, such as a rectangular shape, a sheet shape, a polyhedral shape, a hemispherical shape, a spherical shape or other irregular forms. Thus, the "first surface" may be any non-specific suitable plane or curved surface on the substrate.

Wherein, the first fluid passage may be a through hole of any shape, the fluid inlet thereof is distributed on the first surface of the base body, and the fluid outlet thereof may be distributed on the base body different from the first surface On the other surface (for example, the other surface may be adjacent to, opposite to the first surface), may also be distributed on the first surface (of course, in this case, the first There should be a fluid blocking mechanism on the surface such that the fluid to be treated does not flow directly onto the first surface to the fluid outlet. In some cases, the fluid outlet of the first fluid channel can also be distributed Inside the substrate, for example, when there is a cavity in the substrate to receive the treated fluid.

Wherein, the plurality of raised portions refers to two or more raised portions. Where the raised portion is a flat or concave portion with respect to the first surface of the base body, the shape thereof may be various, for example, as viewed from a plan view, it may have a straight or curved contour Strips, sheets or other regular or irregular forms, etc., and are not limited thereto.

Wherein, the plurality of protrusions may be regularly or irregularly distributed uniformly or non-uniformly on the first surface of the substrate.

In some preferred embodiments, at least two of said projections pass directly over the fluid inlet of said first fluid passage.

In some preferred embodiments, the plurality of raised portions are distributed in parallel on the first surface of the substrate.

Preferably, the protrusions are strip-shaped, the width thereof may be larger, and the pitch of each protrusion portion may be larger, so that the protrusion portion has greater mechanical strength and the hat-shaped structure is formed better. The support, while also imparting a greater fluid flux to the fluid treatment device.

Particularly preferably, the raised portion has a height of 0.1 μm to 400 μm, a width of 0.1 μm to 100 μm, and a distance between adjacent convex portions of 0.1 μm to 100 μm.

In addition, it is also possible to impart superhydrophobic properties, self-cleaning properties, and the like by providing a coating or a specific nanostructure formed of a suitable low surface energy substance known in the art on a part or all of the surface of the convex portion.

Wherein, the hat-shaped structure may have various regular or irregular cross-sectional structures, for example, preferably not limited to an inverted trapezoidal cross-sectional structure, but an opening formed between adjacent hat-shaped structures should have a diameter greater than 0 but less than mixed The particle size of the selected particles in the fluid to be treated is used to treat particles having a particle size as small as nanometers in the fluid.

Preferably, the opening formed between the adjacent hat-shaped structures has a diameter of 1 nm to 50 μm.

Preferably, the hat-shaped structure has a height of 50 nm to 200 μm.

Wherein, the hat-shaped structure is integrally provided with the convex portion, and may be directly formed on the upper portion of the convex portion by, for example, evaporation, deposition, growth, etc., and the hat-shaped structure may also follow the convex portion along the lateral direction. Continuously extending so as to form an opening portion extending continuously in the lateral direction between adjacent hat-shaped structures, so that the treatment of selected particles mixed in the fluid to be treated can be ensured, and a high flux is also maintained, and The processing difficulty is reduced (the spacing of adjacent protrusions is limited by the processing capability, and it is generally difficult to reach a distance of about 1 nm), which saves cost.

Wherein, the material of the hat-shaped structure may be selected from an insulating dielectric material such as silicon oxide, silicon nitride oxide, borophosphosilicate glass, or the like, or a semiconductor material such as Si, ZnO, GaN, TiO ₂ , InN, or the like, or a metal material. For example, Ag, Au, Al, Ni, Cr, Ti, etc. may of course be selected from other inorganic and/or organic materials and the like.

Wherein, the fluid inlet of the first fluid channel has a regular or irregular shape, such as a polygon (rectangular, diamond or other), a circle or an ellipse, etc., which can be easily adjusted according to the needs of practical applications.

The opening portion formed between the adjacent convex portions may have various forms of cross-sectional shapes, and may be, for example, a regular or irregular shape such as a rectangle, a trapezoid, an inverted trapezoid, a triangle, or a semicircle.

Wherein, the fluid to be treated may be in a gas phase or a liquid phase, such as air, water, oil, and in some cases, may be a collection of fluid substances in a fluid state, or a molten state of certain substances, etc. .

Herein, the "particles" mainly refer to solid phase particles, but in some cases, may also be droplets or the like which are incompatible with the fluid (especially a liquid phase fluid).

In some more specific embodiments, the first fluid channel may have a pore size of from 1 μm to 1 mm.

In some more specific embodiments, the substrate has a thickness of 1 μm or more to provide a better mechanical strength of the substrate to provide stronger support for the raised portion and the hat-shaped structure.

The material of the substrate may be selected from a metal, a non-metal, an organic material, an inorganic material, or the like, such as a silicon wafer, a polymer, a ceramic, or the like, and is not limited thereto.

In some preferred embodiments, the surface of at least one of the convex portion, the hat-shaped structure and the base body is further provided with a functional material layer, and the material of the functional material layer comprises a photocatalytic material, an antibacterial material and the like. It is not limited to this. For example, a typical photocatalytic material may be titanium dioxide or the like. When the fluid is processed by a fluid processing device containing such a functional material, some organic pollutants in the fluid may be photocatalyzed by ultraviolet light or the like. Degradation, achieving multiple purification of fluids. For another example, a more typical antibacterial material may be a noble metal such as Au or Ag, which can synchronously kill bacteria, viruses and the like in the fluid during the processing of the fluid.

Of course, the above-mentioned photocatalytic material, antibacterial material, or the like can also be directly formed into the convex portion, the hat-shaped structure, and the base body. At least one of them.

Further, in order to facilitate light penetration, part or all of the hat-shaped structure, the base body, and the convex portion may be made of a transparent material.

Another aspect of the present application provides a method of preparing a fluid processing apparatus comprising:

Providing a substrate having a first surface and a second surface opposite the first surface;

Forming, on a first surface of the substrate, a plurality of protrusions spaced apart from each other, the protrusions extending continuously on a first surface of the substrate in a lateral direction, and a lower portion of the substrate being fixedly disposed on the substrate a surface

Processing a second surface of the substrate to form a first fluid passage through the substrate, and distributing a fluid inlet of the first fluid passage to a first surface of the substrate, and causing at least two The raised portions are respectively disposed adjacent to opposite sides of the fluid inlet of the first fluid passage and the at least one of the raised portions directly passes through the fluid inlet of the first fluid passage;

Forming a hat-shaped structure continuously extending in a lateral direction at an upper portion of the convex portion, and laterally extending opposite sides of the opposite side of the hat-shaped structure, and forming an adjacent between the adjacent hat-shaped structures An opening through which the fluid passes, the opening having a diameter greater than 0 but smaller than the particle size of the selected particles mixed in the fluid to be treated, thereby cooperating between the plurality of cap structures, the plurality of projections and the substrate A second fluid passage is formed and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

In some more specific embodiments, the method of preparation comprises:

Forming a patterned first mask on the first surface of the substrate, and etching the first surface of the substrate to form a plurality of spaced apart ones on the first surface of the substrate a raised portion, after which the first mask is removed;

Forming a second mask on the second surface of the substrate, and etching the second surface of the substrate until a first fluid passage is formed through the substrate, and then removing the Second mask;

Forming a hat-shaped structure on each of the plurality of protrusions at least one of evaporating, depositing, and growing, and laterally extending the opposite sides of the hat-shaped structure, and The opening portion is formed between adjacent hat-shaped structures.

Another aspect of the embodiments of the present application provides a fluid processing apparatus comprising:

a porous structure formed by intersecting a plurality of linear bodies to form a second fluid passage with the first surface of the base body, wherein the plurality of linear bodies are fixedly connected to the base body at one end, and the porous structure has a hole The diameter is greater than zero but less than the particle size of the selected particles that are intermixed within the fluid to be treated, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

Wherein, the linear body may be linear, curved, preferably linear, which is advantageous for preparation, and can make the size of the hole in the formed porous structure more controllable. And, the linear body may be solid or hollow, such as a nano- or micro-scale wire, tube, etc., but is not limited thereto.

The diameter of the linear body is preferably from 1 nm to 50 μm.

The distance between one end of any linear body and one end of another linear body adjacent to the linear body is preferably from 1 nm to 50 μm.

The length of the linear body is preferably 50 nm to 200 μm.

Preferably, the linear body can adopt nanowires, which are small in diameter and can be densely distributed to form pores having a small pore diameter, thereby maintaining a high fluid flux and achieving a smaller particle size ( The fluid of the particles of micron or even nanometers is processed.

Preferably, the linear body may adopt nanowires, and the array formed by the nanowires may have a superhydrophobic structure, thereby enabling the fluid processing apparatus to have a self-cleaning function.

The aforementioned nanowires may also be replaced by nanotubes or the like.

For example, the linear body may be preferably selected from carbon nanowires, carbon nanotubes, ZnO nanowires, GaN nanowires, TiO ₂ nanowires, Ag nanowires, Au nanowires, and the like, without being limited thereto.

Wherein, the linear body may be fixed to the surface of the substrate or to the substrate by external transfer, in-situ growth (for example, chemical growth, electrochemical growth) or deposition (for example, physical, chemical vapor deposition, electrodeposition) or the like. Surface growth Long formation.

In some preferred embodiments, one end of the plurality of linear bodies is fixedly coupled to the first surface of the base body and is distributed around the fluid inlet of the first fluid passage. Such an arrangement allows the porous structure formed between the plurality of linear bodies distributed around the fluid inlet to be part of the second fluid passage, thereby obtaining a larger fluid flux.

In some preferred embodiments, the fluid processing apparatus further includes:

a plurality of raised portions spaced apart from each other, the raised portion is fixedly disposed on the first surface of the base body, and extends continuously on the first surface of the base body in a lateral direction, wherein at least two raised portions are respectively respectively Adjacent to opposite sides of the fluid inlet of the first fluid passage, at least one projection directly passes through the fluid inlet of the first fluid passage, and the projection is fixedly connected with two The linear body described above.

Wherein, the plurality of raised portions refers to two or more raised portions. Where the raised portion is a flat or concave portion with respect to the first surface of the base body, the shape thereof may be various, for example, as viewed from a plan view, it may have a straight or curved contour Strips, sheets or other regular or irregular forms, etc., and are not limited thereto. Preferably, the raised portion may have a larger thickness and a larger width, so that the linear body may be better supported, and the distance between the convex portions may be larger.

In some preferred embodiments, the plurality of linear bodies attached to a raised portion and the plurality of linear bodies joined to the other raised portion adjacent the raised portion intersect each other.

In some preferred embodiments, the raised portion has a width of from 0.1 μm to 100 μm and a height of from 0.1 μm to 400 μm.

The foregoing "transverse" refers to any direction that is parallel or substantially parallel to the first surface of the substrate. Correspondingly, the aforementioned "longitudinal" means a direction that is perpendicular or substantially perpendicular to the transverse direction.

In some preferred embodiments, the distance between adjacent raised portions is from 0.1 μm to 100 μm.

Wherein, the material selection range of each part in the fluid processing device is various, and may be an inorganic material or an organic material. For example, it may be selected from metals, silicon wafers, ceramics, polymers, and the like, and is not limited thereto. When these portions are all selected to use inorganic materials, the fluid treatment device also has temperature-resistant characteristics that can handle high temperature and low temperature fluids.

In some preferred embodiments, the surface of the convex portion is further provided with a layer of a functional material, and the material of the functional material layer includes a photocatalytic material, an antibacterial material and the like, and is not limited thereto. For example, a typical photocatalytic material may be titanium dioxide or the like. When the fluid is processed by a fluid processing device containing such a functional material, some organic pollutants in the fluid may be photocatalyzed by ultraviolet light or the like. Degradation, achieving multiple purification of fluids. For another example, a more typical antibacterial material may be a noble metal such as Au or Ag, which can synchronously kill bacteria, viruses and the like in the fluid during the processing of the fluid.

Further, in order to facilitate light penetration, part or all of the substrate, the linear body, and the convex portion may be made of a transparent material.

In some preferred embodiments, the fluid processing apparatus includes a plurality of beams (ie, the raised portions) that are distributed in parallel on a first surface of the substrate, the beams being first in a lateral direction at the base The surface extends continuously, wherein at least two of the beams are respectively disposed adjacent to opposite sides of the fluid inlet of the first fluid passage, and at least one of the beams passes directly from the fluid inlet of the first fluid passage; a plurality of linear bodies are disposed on any of the beams, and at least a portion of the linear bodies of the plurality of linear bodies are fixed to the surface of the beam, and the other end extends obliquely away from the direction of the beam and/or The porous structure is formed by continuously extending on a plane parallel to the first surface of the substrate and intersecting a plurality of linear bodies distributed on another beam adjacent to the one of the beams.

In some embodiments, at least two beams pass directly over the fluid inlet of the first fluid passage.

A method of preparing the fluid processing apparatus according to another aspect of the embodiments of the present application includes:

Providing a substrate having opposite first and second surfaces;

Processing the substrate to form a first fluid channel on the substrate, the first fluid channel having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid channel being distributed over the substrate First surface

Forming a plurality of linear bodies on the substrate, and intersecting the plurality of linear bodies to form a porous structure, the porous structure cooperating with the first surface of the substrate to form a second fluid channel, the hole in the porous structure The diameter is greater than zero but less than the particle size of the selected particles that are intermixed within the fluid to be treated, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

In some more specific embodiments, the method of preparation comprises:

Processing the first surface of the substrate to form a plurality of protrusions spaced apart from each other on the first surface of the substrate, or growing on the first surface of the substrate to form a space spaced apart from each other a plurality of raised portions extending continuously in a lateral direction on the first surface of the base body, wherein at least two raised portions are respectively opposite to opposite sides of the fluid inlet of the first fluid passage Adjacently disposed, at least one raised portion directly passes over the fluid inlet of the first fluid passage;

Forming a plurality of linear bodies on the convex portion, and causing a plurality of linear bodies on any convex portion and a plurality of linear bodies on another convex portion adjacent to the convex portion to mutually The intersection forms a porous structure that cooperates with the first surface of the substrate to form a second fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

In some more specific embodiments, the method of preparation comprises:

Providing a seed layer for growth of nanowires (ie, the linear bodies) on a first surface of the substrate;

Forming a patterned first photoresist mask on the seed layer, and etching the first surface of the substrate to form a plurality of protrusions spaced apart from each other on the first surface of the substrate Starting, then removing the first photoresist mask;

Forming a second photoresist mask on the second surface of the substrate, and etching the second surface of the substrate to form a through surface at the second surface of the substrate a slot of the first surface of the substrate for use as a first fluid passage, after which the fourth photoresist mask is removed;

A plurality of nanowires are grown on the seed layer remaining on the top of the raised portion, and the plurality of nanowires are crossed to form a porous structure.

As one of the preferred embodiments, a fluid processing apparatus according to another aspect of the embodiments of the present application includes:

a plurality of vertical nano-linear bodies distributed in a second region of the first surface of the substrate and spaced apart from each other, a second region of the first surface of the substrate being disposed around the first region, Both ends of the nanowire body and the base The first surface of the body and the second surface of the fluid barrier are fixedly connected, wherein the distance between adjacent nano-linear bodies is greater than 0 but less than the particle size of the selected particles mixed in the fluid to be treated, thereby The plurality of nano-linear bodies, the fluid blocking portion and the base body cooperate to form a second fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

The fluid blocking portion may be in various forms, for example, a sheet shape, a thin shell shape, a rectangular shape, a polyhedral shape, or the like, as long as it can prevent the fluid to be processed from being subjected to the plurality of convexities. The fluid passage other than the second fluid passage formed by the cooperation between the starting portion (or the nano-linear body) and the fluid blocking portion and the base body may enter the fluid inlet of the first fluid passage. The arrangement of the fluid blocking portion may also be various. For example, it may be disposed integrally with the base body, or may be partially connected to the base body, or even in some cases, may be Integrated processing.

The distribution of the first region and the second region of the first surface of the substrate may be various. For example, the first region and the second region may be adjacent to each other, or may be separated by a certain distance, or may be The two regions are disposed around the first region, and the first region may be partially embedded in the second region. The distribution pattern of the two can be adjusted depending on the fluid blocking portion, the structure of the substrate, the positional relationship between each other, and the like.

Wherein, the plurality of raised portions refers to two or more raised portions. Wherein the convex portion is a flat or concave portion with respect to the first surface of the base body, and the shape thereof may be various, for example, it may be a line, a column, a sheet, or a tubular, tapered, frustum-like structure or other regular or irregular structure, preferably a nano-linear body, and a transverse cross-sectional structure thereof (the lateral direction herein mainly refers to a direction parallel to the first surface of the substrate) It may also be of a regular or irregular shape, such as a polygon (triangle, quadrilateral or other), a circle, an ellipse, a star, etc. (see Figures 9a-9e).

Wherein, the plurality of protrusions may be regularly or irregularly distributed uniformly or non-uniformly on the first surface of the substrate (see FIGS. 10a-10c).

Preferably, the vertical nanowire body is grown in situ on the first surface of the substrate.

In some preferred embodiments, the second region of the first surface of the substrate is disposed about the first region. In particular, a plurality of raised portions distributed in the second region are disposed around the fluid inlet of the first fluid passage. Such an arrangement allows the gaps between the plurality of raised portions distributed in the second region to be part of the second fluid passage, thereby obtaining a larger fluid flux.

In some preferred embodiments, the third surface of the first surface of the substrate is also spaced apart from the plurality of protrusions, and the second region is disposed between the third region and the first region. Wherein the tops of the plurality of protrusions distributed in the third region may or may not be connected to the fluid blocking portion, in particular, when the tops of the protrusions are not associated with the fluid When the blocking portions are connected, the gap between the tops of the raised portions may also constitute a fluid passage, thereby further increasing the contact surface of the fluid processing device with the fluid and increasing the fluid flux.

Particularly preferably, a third region of the first surface of the substrate is disposed around the second region. Further, the convex portion distributed in the third region and the convex portion distributed in the second region may be the same or different. Particularly preferably, whether it is distributed in the third region or the second region, as long as the distance between adjacent convex portions distributed on the first surface of the substrate is greater than 0 but less than mixed The particle size of the selected particles within the fluid.

More preferably, the first region and the second region of the first surface of the substrate are distributed within an orthographic projection of the fluid blocking portion on the first surface of the substrate.

Preferably, the convex portion is a linear or columnar protrusion having an aspect ratio of 4:1 to 200000:1, and a ratio of a distance between adjacent convex portions to a length of the convex portion. It is 1:4～1:200000. By adopting the convex portion of such a structure and a distribution pattern, a plurality of convex portions can be densely arranged (the proportion of the convex portion itself in a unit area is small), which facilitates processing of minute particles in the fluid, and also The fluid handling device is given a greater fluid flux (the pores between the bosses are larger than the boss itself).

Particularly preferably, the convex portion is an upright microwire (tube) or a nanowire (tube) having a diameter of 1 nm to 50 μm, a length of 50 nm to 200 μm, and a distance between adjacent convex portions of 1 nm. 50 μm, this allows the fluid handling device to be constructed to handle particles of particle size as small as nanometers in the fluid while maintaining a high fluid handling flux.

Further, the plurality of protrusions distributed in the third region of the first surface of the substrate are arranged to form a micro- or nano-scale array structure having superhydrophobic or superoleophobic properties. In this way, the fluid processing device can also be provided with functions such as self-cleaning.

Of course, it is also possible to form the convex portion by forming a coating formed of a suitable low surface energy substance known in the art on a part or the whole surface of the convex portion, or directly forming the convex portion with a hydrophobic material, thereby making it superhydrophobic. Performance, self-cleaning performance, etc.

In some more specific embodiments, the substrate has a thickness of 1 μm or more.

In some preferred embodiments, the raised portion may be selected from nanowires, such as carbon nanowires, carbon nanotubes, ZnO nanowires, GaN nanowires, TiO ₂ nanowires, Ag nanowires, Au nanowires. Any one or a combination of two or more.

In some specific applications, the protrusion may be formed of a photocatalytic material or a material having an antibacterial or bactericidal function, or the protrusion may be covered with a photocatalytic material or have a bactericidal or antibacterial function. A coating formed by the material. For example, the protrusions may employ nanowires having photocatalytic properties such as ZnO nanowires, GaN nanowires, and TiO ₂ nanowires, and are capable of degrading organic substances in the fluid under light-assisted illumination. For example, the protrusions may employ Ag nanowires, Au nanowires, or the like to kill bacteria, viruses, and microorganisms in the fluid.

In some more specific embodiments, the fluid barrier has a thickness of from 0.5 μm to 200 μm.

In some preferred embodiments, the fluid treatment device may further include at least one support body, one end of the support body being fixedly coupled to the base body and the other end being fixedly coupled to the fluid blocking portion. By the support body, a more stable and stable fit between the fluid blocking portion and the base body can be achieved, and the convex portion distributed between the fluid blocking portion and the base body can be effectively protected from the fluid blocking portion and / or the problem that the base body is collapsed, damaged, etc. caused by the pressing of the convex portion after being subjected to an external force.

Wherein, the support body may be in various forms, such as a column shape (cylindrical, polygonal prism, etc.), a step shape, a frustum shape, or the like, and is not limited thereto, and the folding resistance should be greater than any of the raised portions. . And, the support body may be formed by machining between the fluid blocking portion and the base body, or may be integrally formed with the base body or the fluid blocking portion.

Further, the support body may be two or more, and the two or more support bodies are symmetrically distributed around the fluid inlet of the first fluid passage.

In some preferred embodiments, more than one branch may be disposed on the fluid inlet of the first fluid passage. The support beam is fixedly connected to the fluid blocking portion for forming a support for the fluid blocking portion to further enhance the structural strength of the fluid processing device.

Further, the support beam may be a plurality of wires, which may be arranged in parallel on the fluid inlet of the first fluid channel.

Further, at least a portion of the components of the fluid treatment device are at least partially transparent to facilitate light penetration. For example, part or all of the fluid blocking portion, the base body, and the boss portion may be made of a transparent material.

A method for preparing a fluid processing apparatus according to another aspect of the embodiments of the present application includes:

Providing a substrate having a first surface and a third surface opposite the first surface;

Processing the first surface of the substrate to form a plurality of protrusions spaced apart from each other on the first surface of the substrate, or growing on the first surface of the substrate to form a space spaced apart from each other a plurality of raised portions, wherein a distance between adjacent raised portions is greater than zero but less than a particle size of selected particles mixed in the fluid to be treated;

Providing a fluid barrier having a second surface disposed opposite the first surface of the substrate on a first surface of the substrate and at least distributed in a second region of the first surface of the substrate a plurality of protrusions fixedly connected to the second surface of the fluid blocking portion;

Processing a third surface of the substrate to form a first fluid passage through the substrate, the fluid inlet of the first fluid passage being distributed in a first region of the first surface of the substrate, a second region of the first surface of the substrate abuts the first region to form a plurality of protrusions, a fluid barrier, and a substrate disposed in a second region of the first surface of the substrate The second fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

In some more specific embodiments, the method of preparation comprises:

Forming a patterned first photoresist mask on the first surface of the substrate, and etching the first surface of the substrate to form a space on the first surface of the substrate a plurality of raised portions, after which the first photoresist mask is removed;

Coating a soluble or corrodible organic and/or inorganic substance on the first surface of the substrate, and filling the gap between the plurality of protrusions with an organic substance and/or an inorganic substance to form a sacrificial layer;

Providing a second photoresist mask on the sacrificial layer, and etching the sacrificial layer to expose at least a top of the plurality of protrusions distributed in the second region of the first surface of the substrate And then removing the second photoresist mask;

Providing a third mask on the first surface of the substrate, and exposing a region on the first surface of the substrate corresponding to the fluid blocking portion, and then depositing to form a fluid blocking portion, and then removing the a third mask;

Forming a fourth photoresist mask on the third surface of the substrate, and etching the third surface of the substrate until the sacrificial material filled between the adjacent protrusions is exposed Forming a slot in the third surface of the substrate, the slot being located corresponding to the first area of the first surface of the substrate, the second area of the first surface of the substrate surrounding The first area setting,

Removing the fourth photoresist mask and the sacrificial material filled between the plurality of protrusions to form the first fluid channel on the substrate.

More preferably, the plurality of raised portions are a plurality of vertical nano-pillars or vertical nanowires arranged in an array.

Growing on the first surface of the substrate to form a plurality of vertical nano-linear bodies spaced apart from each other, wherein a distance between adjacent nano-linear bodies is greater than 0 but less than selected particles mixed in the fluid to be treated Particle size

Providing a fluid barrier having a second surface disposed opposite the first surface of the substrate on a first surface of the substrate and at least distributed in a second region of the first surface of the substrate a plurality of nano-linear bodies fixedly connected to the second surface of the fluid blocking portion;

Processing a third surface of the substrate to form a first fluid passage through the substrate, the fluid inlet of the first fluid passage being distributed in a first region of the first surface of the substrate, a second region of the first surface of the substrate disposed around the first region such that a plurality of nanowires, fluid barriers, and substrates are distributed in a second region of the first surface of the substrate The interfitting forms a second fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

In some more specific embodiments, the preparation method is characterized by comprising:

Growing on the first surface of the substrate to form a plurality of nano-linear bodies spaced apart from each other;

Coating a soluble or corrodible organic and/or inorganic substance on the first surface of the substrate, and filling the gap between the plurality of nano-linear bodies with an organic substance and/or an inorganic substance to form a sacrificial layer;

Providing a first photoresist mask on the sacrificial layer, and etching the sacrificial layer to at least top a plurality of nano-linear bodies distributed in a second region of the first surface of the substrate Exposing, then removing the first photoresist mask;

Providing a second mask on the first surface of the substrate, and the first surface of the substrate and the fluid blocking portion Corresponding regions are exposed, and then deposited to form a fluid barrier, and then the second mask is removed;

Forming a patterned third photoresist mask on the third surface of the substrate, and etching the third surface of the substrate until the sacrifice between the adjacent nanowires is exposed a material to form a slot in a third surface of the substrate, the slot being located corresponding to a first region of the first surface of the substrate, the second region of the first surface of the substrate Surrounding the first area setting,

The third photoresist mask and the sacrificial material filled between the plurality of nanowires are removed, and the first fluid channel is formed on the substrate.

a plurality of protrusions extending continuously in a second region of the first surface of the substrate in a lateral direction, wherein a groove through which a fluid can pass is formed between adjacent protrusions, the groove The opening of the opening has a diameter greater than 0 but less than the particle size of the selected particles mixed in the fluid to be treated, and the upper end of the raised portion is sealingly connected to the first surface of the base, and the partial portion of the lower end is The second surface of the fluid blocking portion is sealingly connected such that more than one groove between the plurality of raised portions and the fluid blocking portion cooperate with the base body to form a second fluid passage, and the fluid to be treated can pass only the first The two fluid passages enter the first fluid passage.

The foregoing "lateral direction" can be understood to mean any direction that is parallel or substantially parallel to the first surface of the substrate. The term "longitudinal" as used hereinafter may be understood to mean a direction that is perpendicular or substantially perpendicular to the transverse direction.

The fluid blocking portion may also be in various forms, such as a sheet shape, a thin shell shape, a rectangular shape, and a plurality of a face shape or the like as long as it can prevent the fluid to be treated from entering the first fluid from a fluid passage other than the second fluid passage formed by the plurality of projections, the fluid blocking portion and the base body The fluid inlet of the channel is sufficient. The arrangement of the fluid blocking portion may also be various. For example, it may be disposed integrally with the base body, or may be partially connected to the base body, or even in some cases, may be Integrated processing.

Wherein, the grooves formed between the adjacent convex portions may have various forms of cross-sectional shapes, for example, regular or irregular shapes such as rectangular, trapezoidal, inverted trapezoidal, triangular, semi-circular, etc., but should be made to be open The size of the portion is less than the particle size of the selected particles that are mixed in the fluid to be treated.

More preferably, all or part of the first region and the second region of the first surface of the substrate are distributed within an orthographic projection of the fluid blocking portion on the first surface of the substrate.

Preferably, the convex portion is (as viewed from a plan view) a sheet shape, and the width thereof can be controlled to a micron order or a nanometer order, whereby a plurality of convex portions can be densely arranged (the convex portion itself is in the unit) Concentration in the area), conducive to convection The fine particles in the body are treated while also imparting a greater fluid flux to the fluid processing device (the cross-sectional area of the grooves formed between the raised portions can be larger).

Particularly preferably, the convex portion has a sheet shape having a linear outline (as viewed from a plan view), and has a width of 1 nm to 50 μm, and an opening portion of the groove formed between the adjacent convex portions has a size of 1 nm. 50 μm, this allows the fluid handling device to be constructed to handle particles of particle size as small as nanometers in the fluid while maintaining a high fluid handling flux.

In some preferred embodiments, one or more support beams may be disposed on the fluid inlet of the first fluid passage, and the support beam is fixedly coupled to the fluid blocking portion to form a support for the fluid blocking portion. The structural strength of the fluid treatment device is further increased.

In some preferred embodiments, the surface of the convex portion is further provided with a layer of a functional material, and the material of the functional material layer includes a photocatalytic material, an antibacterial material and the like, and is not limited thereto. For example, a typical photocatalytic material may be titanium dioxide or the like. When the fluid is processed by a fluid processing device containing such a functional material, some organic pollutants in the fluid may be photocatalyzed by ultraviolet light or the like. Degradation, achieving multiple purification of fluids. Another example is A typical antibacterial material may be a noble metal such as Au or Ag, which can simultaneously kill bacteria, viruses, and the like in the fluid during the processing of the fluid.

Further, in order to facilitate light penetration, part or all of the fluid blocking portion, the base body, and the convex portion may be made of a transparent material.

In some embodiments, the fluid treatment device further comprises:

a fluid blocking portion having a second surface disposed opposite the first surface of the substrate, the fluid inlet of the first fluid channel being distributed within an orthographic projection formed by the fluid blocking portion on the first surface of the substrate The plurality of raised portions have opposite first and second ends, the first end being sealingly coupled to the first surface of the base, the partial portion of the second end and the second portion of the shielding portion Surface sealed connection.

In this embodiment of the present application, the shape, material, structure, and the like of the base, the boss, the fluid barrier, and the first fluid passage may be the same as or similar to those described above.

Providing a substrate having opposite first and second surfaces;

Processing the first surface of the substrate to form a plurality of protrusions spaced apart from each other on the first surface of the substrate, or growing on the first surface of the substrate to form a space spaced apart from each other a plurality of protrusions extending continuously in a second region of the first surface of the substrate in a lateral direction, wherein a groove through which a fluid can pass is formed between adjacent protrusions, the groove The opening of the opening has a diameter greater than 0 but less than the particle size of the selected particles mixed in the fluid to be treated, and the upper end of the raised portion is sealingly connected to the first surface of the base;

Providing a fluid resistance having a second surface disposed opposite the first surface of the substrate on the first surface of the substrate a blocking portion and at least sealingly connecting the second surface of the fluid blocking portion with a partial region of the lower end of the convex portion;

Processing a second surface of the substrate to form a first fluid passage through the substrate, the fluid inlet of the first fluid passage being distributed in a first region of the first surface of the substrate, The second region of the first surface of the substrate is contiguous with the first region such that a plurality of trenches, fluid barriers are distributed between the plurality of raised portions in the second region of the first surface of the substrate A second fluid passage is formed in cooperation with the substrate, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.

In some more specific embodiments, the method of preparation comprises:

Forming a fourth photoresist mask on the second surface of the substrate, and etching the second surface of the substrate until the sacrificial material filled between the adjacent protrusions is exposed Forming a slot in the second surface of the substrate, the slot being located corresponding to the first area of the first surface of the substrate, the second area of the first surface of the substrate surrounding The first area setting,

More preferably, the plurality of raised portions are a plurality of nano-sheets or nano-bars arranged in parallel in the lateral direction on the first surface of the substrate.

a substrate having a fluid passage, and

Wherein, the fluid passage may be a through hole of any shape, and a fluid inlet thereof may be distributed on the surface of the base body, for example, a surface of the base body, which may be defined as a first surface, and a fluid outlet thereof may be distributed in the same The other surface of the substrate different from the first surface (for example, the other surface may be adjacent to the first surface, opposite to each other) may also be distributed on the first surface (of course In this case, the first surface should have a fluid blocking mechanism such that the fluid to be treated does not flow directly on the first surface to the fluid outlet. In some cases, the fluid The fluid outlet of the channel may also be distributed within the substrate, for example, when there is a cavity in the substrate to receive the treated fluid.

Here, the term "plural" means two or more.

Wherein, the cross-sectional structure of the linear body in the radial direction may be regular or irregular, and may be, for example, a polygon (triangle, quadrilateral or other), a circle, an ellipse, a star, or the like.

In some embodiments, the linear body is fixedly coupled at one end to an inner wall of the fluid passage and at the other end in a radial direction of the fluid passage.

In some embodiments, the plurality of linear bodies intersect each other or are interwoven to form the porous structure.

In some embodiments, the plurality of linear bodies are spaced apart from each other and arranged in parallel to form the porous structure.

More preferably, at least the surface of the linear body is further distributed with a photocatalytic material or an antibacterial material. In particular, the linear body may be composed entirely of a photocatalytic material or an antibacterial material.

The linear body has a diameter of 1 nm to 500 μm, preferably 1 nm to 50 μm.

Preferably, the aforementioned linear body may adopt nanowires, which are small in diameter and can be densely distributed to form pores having a small pore diameter, thereby further maintaining a relatively high fluid flux while achieving a smaller particle size (micron). The fluid of the particles, even at the nanometer level, is processed.

Preferably, the linear body may be a microwire (tube), a nanowire (tube), and particularly the latter, from these nanowires (tubes) The formed array can have a superhydrophobic or superoleophobic structure, thereby allowing the fluid handling device to have a self-cleaning function.

Preferably, the coating formed by a suitable low surface energy material known in the art may be provided on a part or the whole surface of the linear body and a part or the whole surface of the substrate, or the line may be directly formed by using a hydrophobic material. The body and the matrix are such that they have superhydrophobic properties, self-cleaning properties and the like.

Wherein, the linear body may be fixed to the surface of the substrate or to the substrate by external transfer, in-situ growth (for example, chemical growth, electrochemical growth) or deposition (for example, physical, chemical vapor deposition, electrodeposition) or the like. Surface growth is formed.

Wherein, the fluid inlet of the fluid channel has a regular or irregular shape, such as a polygon (rectangular, diamond or other), a circle or an ellipse, etc., which can be easily adjusted according to the needs of practical applications.

In some embodiments, the substrate has opposing first and second surfaces, the fluid inlet of the fluid channel being distributed over the first surface of the substrate.

In some embodiments, the first surface of the substrate is further distributed with a plurality of upright linear bodies spaced apart from each other, the plurality of upright linear bodies being disposed around the fluid channel.

In some embodiments, the fluid treatment device can further include a fluid barrier having a surface (which can be named as a third surface) disposed opposite the first surface of the substrate, and One end of the plurality of upright linear bodies is fixedly disposed on the first surface of the base body, and the other end is fixedly connected to the third surface of the fluid blocking portion, wherein a distance between adjacent upright linear bodies is greater than 0 but less than the selected The particle size of the particles.

The fluid blocking portion may have various forms, and may be, for example, a sheet shape, a thin shell shape, a rectangular shape, a polyhedral shape, or the like. Preferably, the plurality of upright linear bodies, the fluid blocking portion and the base body cooperate to form a fluid passage through which the fluid to be treated can only enter the fluid inlet of the fluid passage distributed on the first surface of the base body. The first treatment of the fluid is carried out, and then into the fluid channel distributed on the substrate, and the second treatment is performed by the aggregate of the linear body.

The arrangement of the fluid blocking portion may also be various, for example, it may be integrally spaced from the substrate, or may be partially connected to the substrate, and in some cases, may be associated with the substrate. It is formed by integral processing.

In some embodiments, the fluid inlet of the fluid channel and the plurality of upright linear bodies are distributed within an orthographic projection of the fluid barrier portion of the first surface of the substrate.

More preferably, the erected linear body has an aspect ratio of 4:1 to 200000:1.

More preferably, the ratio of the distance between adjacent upright linear bodies to the length of the upright linear body is 1:4 to 1: 200000.

More preferably, the upright linear body may have the same material, structure, and the like as the linear body described above.

In some preferred embodiments, the surface of the substrate, particularly the first surface of the substrate, is further provided with a layer of functional material, and the material of the functional material layer includes a photocatalytic material, an antibacterial material, etc., and is not limited thereto. this. For example, a typical photocatalytic material may be titanium dioxide or the like. When the fluid is processed by a fluid processing device containing such a functional material, some organic pollutants in the fluid may be photocatalyzed by ultraviolet light or the like. Degradation, achieving multiple purification of fluids. For another example, a more typical antibacterial material may be a noble metal such as Au or Ag, which can synchronously kill bacteria, viruses and the like in the fluid during the processing of the fluid.

Further, to facilitate light penetration, some or all of the components of the fluid treatment device may be made of a transparent material.

Providing a substrate having opposite first and second surfaces;

Processing the substrate to form more than one fluid channel on the substrate, the fluid channel having a fluid inlet and a fluid outlet, the fluid inlet of the fluid channel being distributed over the first surface of the substrate;

Depositing a seed layer for growing the linear body on at least an inner wall of the fluid passage;

Forming a plurality of linear bodies in the fluid channel based on the seed layer, the aggregate of the plurality of linear bodies having a porous structure for treating a fluid mixed with the selected particles flowing through the fluid channel, And the diameter of the pores in the porous structure is greater than 0 but smaller than the particle size of the selected particles.

In some more specific embodiments, the method of preparation may further comprise:

Depositing a seed layer for growing the linear body on a first surface of the substrate and an inner wall of the fluid passage;

A plurality of linear bodies are formed on the first surface of the substrate and the inner wall of the fluid channel based on the seed layer.

Preferably, the preparation method comprises: forming a plurality of linearly extending linear bodies on the inner wall of the fluid passage based on the seed layer, the plurality of linear bodies intersecting each other to form the porous structure.

Preferably, the preparation method comprises: forming a plurality of upright linear bodies on the first surface of the substrate based on the seed layer, the plurality of vertical linear bodies being spaced apart from each other, and between adjacent vertical linear bodies The distance is greater than zero but less than the particle size of the selected particles.

More preferably, the linear body and the upright linear body may have the same material, structure, and the like as the linear body.

Embodiments of the present invention provide a nasal plug type respirator, including:

A filter chip protection structure is used to protect the filter chip.

In some embodiments, the filter chip protection structure comprises a first fixed hard filter and a second fixed hard filter, the filter chip being disposed on the first fixed hard filter and the second fixed Between hard filters.

In some embodiments, the nasal plug respirator further includes a first filter fabric and/or a second filter fabric, the first filter fabric being distributed between the nasal plug and the filter chip, the filter chip being distributed Second between the filter fabric and the nasal plug.

In some embodiments, the nasal plug respirator further includes a first detachable hard screen and/or a second detachable hard screen, the first detachable hard screen and the first The filter fabric is fixedly attached, and the second detachable hard screen is fixedly coupled to the second filter fabric.

More preferably, the nasal plug is a lumbar drum type nasal plug which can be partially or wholly inserted into the nasal cavity of the human body.

More preferably, the nasal plug respirator further includes a housing that is open at both ends, the nasal plug is detachably mounted at one end of the housing, and the filter chip is received in the housing. On the one hand, the housing can further protect the filter chip, and on the other hand, it can accommodate the various components described above, so that the respirator is compact and firm. The housing preferably uses a rigid housing.

In a more specific first embodiment of the present invention, the filter chip comprises:

a base having a first fluid passage, the first fluid passage having an air inlet and an air outlet, the air inlet of the first fluid passage being distributed on the first surface of the base;

a plurality of protrusions spaced apart from each other, the protrusions extending continuously on the first surface of the base body in a lateral direction, a lower portion fixedly disposed on the first surface of the base body, and an upper portion having a cap extending continuously in the lateral direction a shape-shaped structure, the opposite sides of the hat-shaped structure are laterally extended, and an opening portion through which air can pass is formed between adjacent hat-shaped structures, and the diameter of the opening portion is greater than 0 but less than mixed a particle size of the selected particles in the air to be treated, wherein at least two of the raised portions are respectively disposed adjacent to opposite sides of the air inlet of the first fluid passage, and at least one The raised portion directly passes through the air inlet of the first fluid passage, thereby engaging a plurality of hat-shaped structures, a plurality of protrusions and the base body to form a second fluid communicating with the first fluid passage The passage, and the air to be treated, can only enter the first fluid passage through the second fluid passage.

In the first embodiment, at least two of the raised portions pass directly over the air inlet of the first fluid passage; and/or the plurality of raised portions are distributed in parallel at the base of the base On the surface.

More preferably, the hat-shaped structure is integrally provided with the boss.

In this first embodiment, the hat-shaped structure may have an inverted trapezoidal cross-sectional structure.

More preferably, the opening formed between the adjacent hat-shaped structures has a diameter of 1 nm to 50 μm.

More preferably, the hat-shaped structure has a height of 50 nm to 200 μm.

More preferably, the distance between adjacent convex portions is from 0.1 μm to 100 μm.

More preferably, the raised portion has a height of 0.1 μm to 400 μm and a width of 0.1 μm to 100 μm.

More preferably, the first fluid passage has a pore diameter of 1 μm to 1 mm.

More preferably, the thickness of the substrate is 1 μm or more.

More preferably, at least the surface of any of the raised portion, the cap-shaped structure and the substrate is provided with a layer of a photocatalytic functional material and/or a layer of an antimicrobial functional material.

More preferably, at least a portion of at least one of the raised portion, the cap-shaped structure and the base is a transparent structure.

In a more specific second embodiment of the present invention, the filter chip comprises:

a porous structure formed by intersecting a plurality of linear bodies to form a second fluid passage with the first surface of the base body, wherein the plurality of linear bodies are fixedly connected to the base body at one end, and the porous structure has a hole The diameter is greater than zero but less than the particle size of the selected particles that are intermixed with the air to be treated, and the air to be treated can only enter the first fluid passage through the second fluid passage.

Further, one end of the plurality of linear bodies is fixedly connected to the first surface of the base body and is distributed around the air inlet of the first fluid passage.

Preferably, the air filter chip further includes a plurality of protrusions spaced apart from each other, the protrusions being fixedly disposed on the first surface of the base body and laterally on the first surface of the base body Continuously extending upwardly, wherein at least two protrusions are respectively disposed adjacent to opposite sides of the air inlet of the first fluid passage, and at least one protrusion is directly from the air inlet of the first fluid passage Two or more linear bodies are fixedly connected to the convex portion.

More preferably, the plurality of linear bodies connected to one of the bosses and the plurality of linear bodies connected to the other of the bosses adjacent to the bosses intersect each other.

More preferably, the plurality of protrusions are distributed in parallel on the first surface of the substrate.

Further, the shape of the convex portion includes an elongated shape or a sheet shape, and is not limited thereto.

Further, the plurality of protrusions are uniformly distributed or non-uniformly distributed on the first surface of the substrate.

More preferably, the raised portion has a width of 0.1 μm to 100 μm and a height of 0.1 μm to 400 μm.

More preferably, the surface of the protrusion is further provided with a layer of photocatalytic functional material and/or a layer of antibacterial functional material.

More preferably, at least a part of the base body, the plurality of linear bodies, and the plurality of raised portions are transparent structures.

More preferably, the linear body has a diameter of from 1 nm to 50 μm.

More preferably, the distance between one end of any one of the linear bodies and one end of the other linear body adjacent to the linear body is from 1 nm to 50 μm.

More preferably, the linear body has a length of 50 nm to 200 μm.

More preferably, at least the surface of the linear body is further distributed with a photocatalytic material or an antibacterial material.

More preferably, at least a part of at least one of the base body and the plurality of linear bodies is a transparent structure.

More preferably, the linear body is linear.

Further, the air inlet of the first fluid passage has a regular or irregular shape, and the regular shape includes a polygon, a circle or an ellipse.

More preferably, the first fluid passage has a pore diameter of 1 μm to 1 mm.

More preferably, the thickness of the substrate is 1 μm or more.

Preferably, the filter chip further includes a plurality of beams distributed in parallel on the first surface of the substrate, the beams extending continuously in a lateral direction on the first surface of the substrate, wherein at least two beams are respectively associated with the The air inlets of the first fluid passage are disposed adjacent to opposite sides of the air inlet, at least one beam directly passes through the air inlet of the first fluid passage; and any of the beams is distributed with a plurality of linear bodies. One end of at least a portion of the plurality of linear bodies is fixed to the surface of the beam, and the other end extends obliquely away from the direction of the beam and/or continuously on a plane parallel to the first surface of the substrate The porous structure is formed by extending and intersecting a plurality of linear bodies distributed on another beam adjacent to the one of the beams.

More preferably, at least two beams pass directly over the air inlet of the first fluid passage.

More preferably, the linear body includes any one or a combination of two or more of carbon nanowires, carbon nanotubes, ZnO nanowires, GaN nanowires, TiO ₂ nanowires, Ag nanowires, and Au nanowires, but Not limited to this.

In a more specific third embodiment of the present invention, the filter chip comprises:

a base having a first fluid passage having an air inlet and an air outlet, the air inlet of the first fluid passage being distributed in a first region of the first surface of the base;

An air blocking portion having a second surface disposed opposite the first surface of the base body for blocking an air inlet of the air to be treated directly entering the first fluid passage;

a plurality of raised portions spaced apart from each other, the convex portion is fixedly disposed at one end in a second region of the first surface of the base body, and the other end is fixedly connected to the second surface of the air blocking portion, wherein adjacent The distance between the raised portions is greater than zero but less than the particle size of the selected particles that are intermingled with the air to be treated, the second region of the first surface of the substrate being contiguous with the first region, such that the plurality of convexities The starting portion, the air blocking portion and the base body cooperate to form a second fluid passage, and the air to be treated can only enter the first fluid passage through the second fluid passage.

Further, the plurality of protrusions are disposed around the air inlet of the first fluid passage.

Further, a plurality of protrusions are also disposed in the third region of the first surface of the base body, and the second region is disposed between the third region and the first region.

More preferably, the first fluid passage has a pore diameter of 1 μm to 1 mm.

More preferably, the thickness of the substrate is 1 μm or more.

More preferably, the air blocking portion has a thickness of 0.5 μm to 200 μm.

Preferably, the surface of the convex portion is further provided with a layer of functional material, and the material of the functional material layer comprises a photocatalytic material or an antibacterial material.

Preferably, at least part of the components of the air filter chip are at least partially transparent.

Further, a third area of the first surface of the substrate is disposed around the second area.

Further, the first region and the second region of the first surface of the substrate are distributed in an orthographic projection of the air blocking portion on the first surface of the substrate.

Preferably, the air filter chip further includes at least one support body, one end of the support body is fixedly connected to the base body, and the other end is fixedly connected to the air blocking portion.

More preferably, the plurality of raised portions of the third region distributed over the first surface of the substrate are arranged to form a micron or nanoscale array structure having superhydrophobic or superoleophobic properties.

More preferably, the air filter chip includes two or more of the support bodies, and the two or more support bodies are symmetrically distributed around the air inlet of the first fluid passage.

Preferably, the air inlet of the first fluid passage is provided with more than one supporting beam, and the supporting beam is fixedly connected with the air blocking portion.

Further, the raised portion is any one of a linear, columnar, sheet-like, tubular, tapered, and frustum-like structure that is standing, and is not limited thereto.

Further, the lateral section of the convex portion has a regular or irregular shape, and the regular shape includes a polygon, a circle, or an ellipse, but is not limited thereto.

Further, the air inlet of the first fluid passage has a regular or irregular shape, and the regular shape includes a polygon, a circle or an ellipse, but is not limited thereto.

More preferably, the raised portion is a linear protrusion having an aspect ratio of 4:1 to 200000:1.

More preferably, the ratio of the distance between adjacent convex portions to the length of the convex portion is 1:4 to 1:200,000.

More preferably, the raised portion is an upright microwire or a nanowire having a diameter of 1 nm to 50 μm, a length of 50 nm to 200 μm, and a distance between adjacent convex portions of 1 nm to 50 μm.

In a more specific fourth embodiment of the present invention, the filter chip comprises:

a plurality of protrusions extending continuously in a second region of the first surface of the substrate in a lateral direction, wherein a groove through which air can pass is formed between adjacent protrusions, the groove The opening of the opening has a diameter greater than 0 but less than the particle size of the selected particles mixed in the air to be treated, and the upper end of the raised portion is sealingly connected to the first surface of the base, and the partial portion of the lower end is The second surface of the air blocking portion is sealingly connected such that more than one groove between the plurality of convex portions and the air blocking portion cooperate with the base body to form a second fluid passage, and the air to be treated can pass only the first The two fluid passages enter the first fluid passage.

Further, the second region of the first surface of the substrate is disposed around the first region.

Further, a partial region of the second end of the convex portion and an air inlet of the first fluid channel are distributed in an orthographic projection formed on the first surface of the substrate by the air blocking portion.

Further, the shape of the convex portion includes an elongated shape or a sheet shape, but is not limited thereto.

More preferably, the raised portion has a width of 1 nm to 50 μm and a height of 50 nm to 200 μm.

More preferably, the size of the opening of the groove formed between the adjacent convex portions is 1 nm to 50 μm.

More preferably, the first fluid passage has a pore diameter of 1 μm to 1 mm.

More preferably, the thickness of the substrate is 1 μm or more.

Preferably, the surface of the convex portion is further provided with a layer of functional material, and the material of the functional material layer comprises photocatalysis. Material or antibacterial material.

More preferably, at least a part of at least one of the base body, the air blocking portion, and the convex portion is a transparent structure.

In a more specific fifth embodiment of the present invention, the filter chip comprises:

a plurality of protrusions spaced apart from each other, the protrusions being fixedly disposed on the first surface of the base body and extending continuously on the first surface of the base body in a lateral direction, wherein between the adjacent protrusions Forming a groove through which air can pass, the opening of the groove having a diameter greater than 0 but smaller than the particle size of the selected particles mixed in the air to be treated, and wherein at least two of the raised portions are respectively Two opposite sides of the opposite sides of the air inlet of the first fluid passage are disposed adjacent to each other, and at least one convex portion directly passes through the air inlet of the first fluid passage, so that the plurality of convex portions and the base body The interfitting forms a second fluid passage in communication with the first fluid passage, and the air to be treated can only enter the first fluid passage through the second fluid passage.

More preferably, the filter chip further includes: an air blocking portion having a second surface disposed opposite to the first surface of the base body, wherein an air inlet of the first fluid passage is distributed in the air blocking portion An orthographic projection formed on the first surface of the substrate, the plurality of protrusions having opposite first and second ends, the first end being sealingly coupled to the first surface of the substrate, second A partial region of the end is sealingly coupled to the second surface of the shield.

More preferably, the first fluid passage has a pore diameter of 1 μm to 1 mm.

More preferably, the thickness of the substrate is 1 μm or more.

In a more specific sixth embodiment of the present invention, the filter chip comprises:

a substrate having a fluid passage, and

An aggregate of a plurality of linear bodies for treating air flowing through the fluid passage mixed with selected particles;

Further, one end of the linear body is fixedly connected to the inner wall of the fluid passage, and the other end is along the fluid passage Radial extension.

Further, the plurality of linear bodies are crossed or interwoven to form the porous structure.

Further, the plurality of linear bodies are spaced apart from each other and arranged in parallel to form the porous structure.

Further, the base body has a first surface and a second surface opposite to each other, and an air inlet of the fluid passage is distributed on the first surface of the base body.

Further, the first surface of the base body is further distributed with a plurality of vertical linear bodies spaced apart from each other, and the plurality of vertical linear bodies are disposed around the fluid passage.

Further, the filter chip further includes an air blocking portion having a third surface disposed opposite to the first surface of the base body, and one end of the plurality of upright linear bodies is fixedly disposed on the base body The first surface, the other end is fixedly coupled to the third surface of the air barrier, wherein the distance between adjacent upright linear bodies is greater than zero but less than the particle size of the selected particles.

Preferably, the first surface of the base body is further provided with a layer of functional material, and the material of the functional material layer comprises a photocatalytic material or an antibacterial material.

More preferably, at least some of the components of the air filter chip have a transparent structure.

Further, the air inlet of the fluid passage has a regular or irregular shape, and the regular shape includes a polygon, a circle, or an ellipse, but is not limited thereto.

More preferably, the fluid passage has a pore diameter of from 1 μm to 1 mm.

More preferably, the thickness of the substrate is 1 μm or more.

Further, the air inlet of the fluid passage and the plurality of upright linear bodies are distributed in an orthographic projection of the air blocking portion on the first surface of the base body.

More preferably, the ratio of the distance between adjacent upright linear bodies to the length of the upright linear bodies is 1:4 to 1:200,000.

More preferably, the linear body has a diameter of from 1 nm to 500 μm.

More preferably, the linear body is selected from the group consisting of nanowires or nanotubes.

The technical solutions of the present application will be further described below in conjunction with the accompanying drawings and several embodiments.

Referring to Figures 2 - 3, in an embodiment of the present application (named as the first embodiment), a fluid processing device The base body 101 has a first surface 1011 and a second surface 1012 opposite to each other, and a plurality of through holes 102 as fluid passages are disposed in the base body 101, and the first surface is provided with a plurality of An array of beams 103 (named as raised portions) arranged in parallel, wherein a plurality of beams 103 are directly traversed from the through holes 102 and a plurality of beams 103 are distributed on both sides of the through holes 102, wherein the beams 103 The top is also distributed with a hat-shaped structure 104 (abbreviated as a cap layer), and each cap layer also continuously extends along the transverse direction in the transverse direction, and forms an array of hat-shaped structures, and the fluid to be treated cannot bypass the array of the above-mentioned hat-shaped structures. Directly enter the through hole 102.

Wherein, by adjusting the spacing between the foregoing hat-shaped structures, an opening portion (which may be referred to as a micro-flow channel) having a selected size can be formed, and the particles of different particle size ranges in the fluid can be removed, in particular, When the pitch of these cap structures is controlled at the nanometer level, very minute particles (nanoscale particles) in the fluid can be removed.

The foregoing beams may be strip-shaped and have a large width and thickness, so that the beams can have higher mechanical strength, so that they can form better support for the hat-shaped layer, and the spacing of the beams can be larger to provide a comparison. Large fluid flux.

The cap layer may also have a large thickness, and both sides are laterally extended so that the spacing of adjacent cap layers can be made small, for example, as low as 1 nm, so that the trapping of the fluid to be treated is minimal. particle.

The cap layer may be integrally provided with the convex portion, for example, may be directly formed on the upper portion of the convex portion by evaporation, deposition, growth, or the like (typically, such as metal sputtering, MOCVD, PECVD, electrochemical deposition, etc.), and The hat-shaped structure may also continuously extend in the lateral direction with the convex portion, so that an opening portion extending continuously in the lateral direction is formed between the adjacent hat-shaped structures, so that on the one hand, the selection of the fluid mixed in the fluid to be treated can be ensured. The treatment of the fixed particles also maintains a high throughput, which reduces the processing difficulty and saves costs.

The material of the cap layer may be selected from an insulating dielectric material such as silicon oxide, silicon nitride oxide, borophosphosilicate glass, or the like, or a semiconductor material such as Si, ZnO, GaN, TiO ₂ , InN, or the like, or a metal material such as Ag or Au. , Al, Ni, Cr, Ti, etc., but are not limited thereto.

Wherein, the base body 101 can have a large thickness, so that it can form a good support for the aforementioned micro/nano-array array, and can further enhance the mechanical strength of the fluid processing device, and make the fluid processing device withstand voltage. It is resistant to bending, impact and impact, so that it can be applied in a variety of environments without damage. For example, it can be applied to the treatment of high-pressure, high-speed fluids, which is unmatched by existing porous membranes. .

Wherein, the material selection range of each part (101, 102, 103, 104) of the fluid processing device is diverse, and may be an inorganic material or an organic material, such as a metal, a non-metallic inorganic material, a plastic, a ceramic, or a semiconductor. , glass, polymer, etc. When these portions are all selected to use inorganic materials, the fluid treatment device also has temperature-resistant characteristics that can handle high temperature and low temperature fluids.

The fluid treatment device of the aforementioned design can be (ultrasonic) cleaned, used multiple times, and still maintain a good fluid Ability.

When the fluid is treated by the fluid processing device, the fluid containing the impurity particles (the fluid flow is indicated by the arrow with a broken line in FIG. 3) enters the array of the aforementioned hat-shaped structure, wherein the particle diameter is larger than a certain value. The particles (or some droplets that are incompatible with the fluid, such as water droplets in the air or water droplets in the oil) are blocked outside the array of the aforementioned hat-shaped structures, after which the fluid reaches through the opening between the respective hat-shaped structures The entrance of the through hole 102 is then re-entered into the through hole 102 to effect purification of the fluid and/or enrichment recovery of the desired particles (droplets).

In some specific applications of the embodiment, the gap of each of the cap layers may be 1 nm to 50 μm, and the height of the cap layer may be 50 nm to 200 μm.

In some specific applications of the embodiment, the through hole may have a diameter of 1 μm to 1 mm, and the substrate may have a thickness of >1 μm.

In some specific applications of the embodiment, the height of the beam may be 0.1 μm to 400 μm, the width may be 0.1 μm to 100 μm, and the distance between the beams may be 0.1 μm to 100 μm.

The longitudinal section of the opening formed before the adjacent hat-shaped layer and the adjacent beam may be regular or irregular, and may be, for example, trapezoidal, polygonal (triangle, quadrilateral or other), circular, elliptical, star, etc. Wait.

The aforementioned beam and cap layer may be distributed regularly or irregularly, uniformly or non-uniformly on the first surface of the substrate.

In addition, in the first embodiment, the shape of the through hole 102 may be various, and may be, for example, a circle, a square, a rectangle, or the like.

In some other embodiments of the present application, a fluid processing apparatus may have a structure similar to any of the foregoing embodiments, except that a photocatalytic material may be disposed on the beam, the cap layer, and the surface of the substrate. Floor. When the fluid is treated by a fluid processing device including a photocatalytic material layer, if it is supplemented with ultraviolet light or the like, photocatalytic degradation of some organic pollutants in the fluid may be performed to achieve multiple purification of the fluid.

Wherein, in order to facilitate light penetration, part or all of the hat layer, the beam and the base may be made of a transparent material. In some embodiments of the embodiment, the hat layer and the beam may be made entirely of a transparent material, such as light.

Among them, a typical photocatalytic material may be titanium dioxide or the like, but is not limited thereto.

Wherein, in order to form the photocatalytic material layer, those skilled in the art can adopt various methods known in the art, such as coating (spin coating, spraying, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, atom). Layer deposition, etc.), sputtering, etc., and are not limited thereto.

Wherein, the thickness of the photocatalytic material layer can be controlled at the nanometer level to minimize its influence on the fluid flux of the fluid processing device.

The structures, arrangement forms, materials, and the like of the base, the cap layer, the beam, the through hole, and the like used in the embodiment may be the same as or similar to those described above, and thus will not be described herein.

In some other embodiments of the present application, a fluid treatment device may have a structure similar to any of the previous embodiments, except that an antibacterial material layer may be disposed on the beam, the cap layer, and the surface of the substrate. . When the fluid is treated with a fluid processing device comprising a layer of antimicrobial material, bacteria, viruses, etc. in the fluid can be simultaneously killed during the processing of the fluid to achieve multiple purification of the fluid.

Among them, the more typical antibacterial material may be a noble metal such as Au or Ag, but is not limited thereto.

Wherein, in order to form the antibacterial material layer, those skilled in the art can adopt various methods known in the art, such as coating (spin coating, spraying, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, atomic layer). Deposition, etc.), sputtering, etc., and are not limited thereto.

Wherein, the thickness of the antimicrobial material layer can be controlled at the nanometer level to minimize its effect on the fluid flux of the fluid treatment device.

The fluid processing apparatus of the present application can be prepared by physical or chemical methods, and may be, for example, a chemical growth method, a physical processing method, or the like, particularly a MEMS (Micro Electromechanical Systems) method.

As shown in FIG. 4, the preparation process of the fluid processing apparatus in this embodiment may include the following steps:

S1: providing a substrate (such as a silicon wafer);

S2: lithographically patterning micro-nano-scale lines on one side surface of the substrate (designated as the first surface), ie forming a patterned photoresist mask;

S3: etching, on the first surface of the substrate (RIE, ICP, wet etching, electrochemical etching, etc.) a plurality of beams on the micro-nano scale, and then removing the photoresist mask;

S4: providing a photoresist etching mask on another side surface (named second surface) of the substrate opposite to the first surface;

S5: etching the other side surface of the substrate until a through hole as a fluid passage is formed on the other side surface of the substrate;

S6: removing the photoresist etch mask, and then evaporating or depositing or growing the cap layer structure on the surface of the substrate having the beam side. There is a lateral extension during the evaporation or deposition or growth process, which enables the cap gap to decrease with increasing thickness, up to a few nanometers.

S7: dicing, encapsulation, and preparation of a fluid treatment device (this step is not shown in the drawings).

The etching method used in the foregoing steps may also be photolithography, mechanical etching, dry etching, wet etching, or the like.

For example, in the foregoing steps, the method of forming the patterned photoresist mask includes a photolithography technique, a nanosphere mask technique, a nano (metal) particle mask technique, and the like, and is not limited thereto.

Obviously, the preparation process of the fluid processing device of the present application is simple and controllable, and is suitable for mass production in large quantities, and the obtained fluid processing device has at least the following advantages: (1) large flux and small flow resistance; (2) physical filtration It can effectively remove particles larger than nano-slit; (3) straddle beam and large substrate thickness can ensure high mechanical strength; (5) can be (ultrasonic) cleaning, multiple use.

Referring to FIG. 5, in a second embodiment of the present application, a fluid processing apparatus includes a base 201 having a first surface 2011 and a second surface 2012 opposite to each other, and the base 201 A plurality of through holes 204 are provided as fluid passages. The first surface 2011 is provided with a plurality of cross beams 203 arranged in parallel, the cross beams 203 continuously extending in a lateral direction on the first surface, and a plurality of cross beams 203 are continuously traversed from the through holes 204, It can therefore also be regarded as a spanning beam 203. Each of the beams 203 is distributed with a plurality of nanowires 202. One end of the plurality of nanowires 202 is fixed to the surface of the beam 203, and the other end is obliquely extended away from the beam 203. It can be considered to be laterally extended and intersects with a plurality of nanowires 202 distributed on another beam adjacent to either of the beams 203 to form the porous structure 205. Referring again to FIG. 5, the porous structure 205 is viewed in a plan view to cover the mesh structure of the through holes 204. The diameter of the pores in the porous structure 205 is greater than zero but less than the particle size of selected particles that are intermixed within the fluid to be treated. Referring to FIG. 6 , it can be seen that the porous structure 205 formed by the intersection of the plurality of nanowires 202 cooperates with the first surface 2011 of the base 201 to form another fluid passage, so that the fluid to be treated 206 can pass only the other A fluid passage enters the through hole 204.

Wherein, because the nanowires have a large aspect ratio (or aspect ratio), the nanowires can be densely arranged on the first surface of the substrate, by adjusting the spacing between the beams and the nanowires. Density, length, direction of extension, etc., can be used to remove particles of different particle size ranges in the fluid. In particular, when nanowires are used, the pore size formed by the intersection of these nanowires is controlled at the nanometer level. Not only can the tiny particles in the fluid be removed, but also because the nanowire itself has a very small diameter, it can also control the resistance to the fluid to a very low level and form a large fluid flux, which is far superior to the present. Some porous membranes, fluid processing devices based on lateral flow channels, and the like.

Wherein, according to the solution known in the industry, the arrangement of the aforementioned nanowires is designed to be super-hydrophobic structure and super-oleophobic structure, which can not only remove particles in the fluid, but also pass The self-cleaning action prevents the blocked particles from accumulating in the functional areas of the fluid handling device (the nanowire array surface), preventing the fluid handling device from failing after prolonged use.

Wherein, the beam 203 may be distributed at a suitable density on the first surface 2011 of the base 201 to The fluid handling device has as high a fluid handling flux as possible. Also, the beam 203 can have a suitable width such that the beam 203, while having sufficient mechanical strength, can also avoid excessive effects on the flux of the fluid treatment device. For example, the beam may have a height of 0.1 μm to 100 μm, a width of 0.1 μm to 400 μm, and a pitch between the beams of 0.1 μm to 100 μm.

Wherein, the base 201 can have a larger thickness and the beam 203 can have a larger height, so that it can form a better support for the nanowire array, and can further enhance the mechanical strength of the fluid processing device. The fluid processing device is resistant to pressure, bending, impact, and impact, so that it can be applied in various environments without damage, for example, it can be applied to high-pressure, high-speed fluid processing. Existing porous membranes and the like are unattainable.

The material selection range of each part (201, 202, 203) of the fluid processing device is various, and may be an inorganic material or an organic material. When these portions are all selected to use inorganic materials, the fluid treatment device also has temperature-resistant characteristics that can handle high temperature and low temperature fluids.

The fluid treatment device of the aforementioned design can be (ultrasonic) cleaned, used multiple times, and still maintain good fluid handling capabilities.

When the fluid is treated with the fluid processing device, the fluid containing the foreign particles enters the porous structure 205, wherein the particles having a particle size larger than a certain value (or some liquid incompatible with the fluid, such as air) The water droplets or the water droplets in the oil are blocked outside the porous structure 205, after which the fluid reaches the entrance of the through hole 204 via the gap between the nanowires and then enters the through hole 204, thereby purifying the fluid and/or Enrichment recovery of the desired particles (droplets).

Referring to FIG. 6 again, in some specific applications of the embodiment, the nanowires 202 may have a diameter and a pitch of 1 nm to 50 μm and a length (height) of 50 nm to 200 μm. The through hole 204 may have a diameter of 1 μm to 1 mm. The thickness of the substrate may be 1 μm or more.

The transverse cross-sectional structure of the aforementioned nanowires may be regular or irregular, and may be, for example, a polygon (triangle, quadrilateral or other), a circle, an ellipse, a star, or the like.

The aforementioned nanowires 202 may be distributed regularly or irregularly, uniformly or non-uniformly on the first surface of the substrate 201.

The array formed by these nanowires 202 can have a superhydrophobic structure, thereby allowing the fluid handling device to have a self-cleaning function.

The aforementioned nanowires 202 may preferably be selected from carbon nanowires, carbon nanotubes, ZnO nanowires, GaN nanowires, TiO ₂ nanowires, Ag nanowires, Au nanowires, and the like, without being limited thereto.

The foregoing nanowires 202 may be fixed to the surface of the substrate or grown on the surface of the substrate by external transfer, in-situ growth (eg, chemical growth, electrochemical growth) or deposition (eg, physical, chemical vapor deposition, electrodeposition). .

The shape of the aforementioned through holes 204 (especially the shape of the transverse cross section) may be various, and may be, for example, a circle, a square, a rectangle, a diamond, a polygon, or other regular or irregular shapes.

In some specific applications of the embodiment, the nanowires 202 may be formed of a photocatalytic material or a material having an antibacterial or bactericidal function, or the nanowires 202 may be surface covered with a photocatalytic material or have sterilization. a coating formed of an antibacterial material.

For example, the nanowires 202 may adopt nanowires having photocatalytic properties such as ZnO nanowires, GaN nanowires, and TiO2 nanowires, and are capable of degrading organic substances in the fluid under light-assisted illumination.

For example, the nanowires 202 may employ Ag nanowires, Au nanowires, or the like to kill bacteria, viruses, and microorganisms in the fluid.

In some specific applications of the embodiment, the first surface 2011 of the base 201 is further provided with a photocatalytic material layer or an antibacterial material layer or the like.

When the fluid is treated by a fluid processing device including a photocatalytic material layer, if it is supplemented with ultraviolet light or the like, photocatalytic degradation of some organic pollutants in the fluid may be performed to achieve multiple purification of the fluid.

Wherein, in order to facilitate light penetration, part or all of the substrate, the protrusion, and the nanowire may be made of a transparent material.

When the fluid is treated by the fluid processing device including the antibacterial material layer, bacteria, viruses, and the like in the fluid can be synchronously killed during the processing of the fluid to achieve multiple purification of the fluid.

The fluid processing device of the present application may be prepared by physical or chemical methods, for example, may be a chemical growth method, Processing methods, etc., in particular, MEMS (Microelectromechanical Systems) method.

For example, referring to FIG. 7, in this embodiment, a preparation process of a fluid processing apparatus may include the following steps:

S1: depositing a seed layer for nanowire growth on a first surface of a substrate such as a silicon wafer.

S2: A patterned photoresist mask is disposed on the seed layer, which comprises lithographic lines on the micro-nano scale.

S3: etching the first surface of the substrate by using the photoresist mask to form a plurality of micro-nano-scale beam structures spaced apart from each other on the first surface of the substrate, and then removing the A photoresist mask is described.

S4: providing a patterned etch mask formed by photoresist on the second surface of the substrate.

S5: etching a second surface of the substrate and etching to the bottom of the beam to form a hole serving as a fluid passage on the second surface of the substrate, and removing the photoresist.

S6: growing nanowires on the seed layer, controlling the growth conditions of the nanowires, making the nanowires have a certain lateral growth ratio, and forming a cross-grid of micro-nano scale.

S7: dicing, encapsulating, and preparing a fluid processing device.

The etching method used in the foregoing steps may be photolithography, mechanical etching, dry etching, wet etching, or the like.

For example, in the foregoing steps, the method of forming the patterned (nano-pattern) photoresist mask includes a photolithography technique, a nano-spherical mask technique, a nano (metal) particle mask technique, and the like, and is not limited thereto.

For example, in the foregoing steps, the beam 203, the via 204, and the like may be etched by means known in the art, such as RIE, ICP, wet etching, electrochemical etching, or the like.

Obviously, the preparation process of the fluid processing apparatus of the present embodiment is simple and controllable, and is suitable for mass production in large quantities.

Referring to FIG. 8 and FIG. 11a - FIG. 11b, in a third embodiment of the present application, a fluid processing apparatus includes a base 301 having a first surface 301a and a first of the base 301 The region 3011 (the region enclosed by the broken line in the figure) is distributed with a plurality of through holes 304 as fluid passages, and the first surface is provided with a plurality of vertical micro/nano wires/tubes 303 (ie, micron-sized wires, micrometers) An array formed by a combination of any one or more of the tubes, nanowires, and nanotubes, distributed over the plurality of micro/nano distributed in the through holes 304 in the second region 3012 surrounding the first region 3011 The top of the wire/tube 303 is also connected with a fluid blocking portion 302 disposed above the fluid inlet of the through hole 304 so that the fluid to be treated cannot bypass the aforementioned micro/nano wire/tube array. Directly entering the through hole 304, the fluid blocking portion 302 has a second surface 302b disposed opposite the first surface 3011. A plurality of vertical micro/nano wires/tubes 303 may also be densely distributed in the remaining area 3013 of the first surface 3011 (which may be named as the third area). In Figure 8, arrows with dashed lines show the direction of travel of the fluid.

Wherein, the micro/nano wires/tubes have a large aspect ratio (or aspect ratio), so that the micro/nano wires/tubes are dense. The arrangement is arranged on the first surface of the substrate, and by adjusting the spacing of the micro/nano wires/tubes, the particles of different particle size ranges in the fluid can be removed, in particular, when the nanowires are used/ By controlling the spacing between these nanowires/tubes at the nanometer level, not only can the tiny particles in the fluid be removed, but also because the nanowire/tube itself has a very small diameter, it can also be made resistant to fluids. It is controlled at a very low level and forms a large fluid flux, which is far superior to existing porous membranes, fluid flow devices based on lateral flow channels, and the like.

Wherein, if the micro/nanowire/tube array is designed according to a scheme known in the art, the super-hydrophobic structure and the super-oleophobic structure can be formed, which can not only remove particles in the fluid, but also By self-cleaning action, the blocked particles cannot accumulate in the functional areas of the fluid treatment device (micro/nanowire/tube array surface), avoiding failure of the fluid treatment device after prolonged use.

Wherein, the base 301 may have a larger thickness to form a better support for the micro/nano wire/tube array, and further enhance the mechanical strength of the fluid processing device, so that the fluid processing device It is resistant to pressure, bending, impact and impact, which makes it suitable for use in a variety of environments without damage. For example, it can be applied to high-pressure, high-speed fluids. This function is impossible for existing porous membranes. Enterprise.

Wherein, the fluid blocking portion may be in the form of a sheet, and the thickness and the like may be adjusted according to actual application requirements.

Wherein, the material selection range of each part (301, 302, 303, 304) of the fluid processing device is diverse, and may be an inorganic material or an organic material, such as a metal, a non-metallic inorganic material, a plastic, a ceramic, or a semiconductor. , glass, polymer, etc. When these portions are all selected to use inorganic materials, the fluid treatment device also has temperature-resistant characteristics that can handle high temperature and low temperature fluids.

When the fluid is treated by the fluid treatment device, the fluid containing the impurity particles enters the array of the micro/nano wires 103, wherein the particles having a particle diameter larger than a certain value (or some fluids incompatible with the fluid) Drops, such as water droplets in the air or water droplets in the oil, are blocked outside of the aforementioned micro/nanowire/tube array, after which the fluid reaches the entrance of the via 304 via the gap between each micro/nano wire/tube. Access to the through holes 304 allows for purification of the fluid and/or enrichment recovery of the desired particles (droplets).

Referring to FIG. 8 again, in some specific applications of the third embodiment, the micro/nano wires may have a diameter of 1 nm to 50 μm, and the length (height) h ₁ may be 50 nm to 200 μm, adjacent to each other. The distance between the nanowires may be from 1 nm to 50 μm. The through hole 104 may have a diameter w of 1 μm to 1 mm. The thickness h _{2 of} the substrate may be 1 μm or more. The thickness h _{3 of} the fluid blocking portion may be from 0.5 μm to 200 μm.

Referring again to FIGS. 9a-9e, the transverse cross-sectional structure of the aforementioned micro/nano wires may be regular or irregular. Such as a polygon (triangle, quadrilateral or other), a circle, an ellipse, a star, and the like.

Referring again to Figures 10a-10c, the aforementioned micro/nanowires may be distributed regularly or irregularly, uniformly or non-uniformly on the first surface of the substrate. In some specific applications, the average pitch of adjacent micro/nano wires is between 1 nm and 50 μm.

In addition, referring to FIG. 11a - FIG. 11c, in the first embodiment, the shape of the through hole 304 and the fluid blocking portion 302 (especially the shape of the transverse cross section) may be various, for example, may be circular, square, Rectangular or other shape.

Referring to FIG. 12, preferably, in a fourth embodiment of the present application, a fluid processing apparatus includes a base 401 having a first surface and a first surface opposite to the first surface a three-surface, and the substrate 401 is provided with a plurality of through holes 404 as fluid passages, and the first surface is provided with an array of a plurality of vertical micro/nano wires/tubes 403 distributed around the through holes 404 The top of the plurality of micro/nano wires/tubes 403 is also connected with a fluid blocking portion 402 disposed above the fluid inlet of the through hole 404, so that the fluid to be treated cannot bypass the aforementioned micro/ The nanowire/tube array directly enters the via 404. Moreover, more than one, for example, four support bodies 405 are distributed symmetrically or asymmetrically around the through hole 404, and the support body 405 can also increase the support of the fluid blocking portion 402 to realize the fluid. The sealing portion and the base body are more firmly and stably matched, and the micro/nano wire/tube array distributed between the fluid blocking portion and the base body can be effectively protected from external forces due to the fluid blocking portion and/or the base body. After the action, the micro/nanowire/tube 403 is collapsed and damaged due to the extrusion of the aforementioned micro/nanowire/tube array.

Wherein, the support body may be in various forms, for example, may have a rectangular, trapezoidal, stepped longitudinal section (the longitudinal direction herein may be understood as a direction perpendicular to the first surface of the base body), and the like, and is not limited thereto. . In some embodiments of the fourth embodiment, the support body may be a boss or the like that protrudes upward from an edge portion of the through hole 204, and an upper end thereof is connected to the fluid blocking portion 402.

Wherein, the number, diameter, distribution density and the like of the support body can be adjusted according to actual needs, but the space of the first surface of the base body should be occupied as little as possible to avoid the fluid flux to the micro/nano wires. Great impact.

The structure, arrangement form, material, and the like of the substrate, the micro/nano wire/tube array, the fluid blocking portion, the through hole, and the like used in the fourth embodiment may be the same as or similar to those described above, and thus will not be described herein. .

Referring to FIG. 13, it is preferable that in a fifth embodiment of the present application, a fluid processing apparatus includes a base 501 having a first surface and a first surface opposite to the first surface a three-surface, and the substrate 501 is distributed with a plurality of through holes 504 as fluid passages, and the first surface is provided with an array of a plurality of vertical micro/nano wires/tubes 503 distributed around the through holes 504 The top of the plurality of micro/nano wires/tubes 503 is also connected with a fluid blocking portion 502 disposed above the fluid inlet of the through hole 504, so that the fluid to be treated cannot bypass the aforementioned micro/ The nanowire/tube array directly enters the via 504. Moreover, more than one is placed on the through hole 504, for example A plurality of support beams 505 arranged symmetrically or asymmetrically, the support beam 505 can also increase the support of the fluid blocking portion 502, thereby achieving a more stable and stable cooperation between the fluid blocking portion and the base body, and Effectively protecting the micro/nanowire/tube array distributed between the fluid barrier and the substrate, avoiding the extrusion of the micro/nanowire/tube array by the fluid barrier and/or the substrate after being subjected to an external force The resulting micro/nano wire/tube 503 collapses, is damaged, and the like.

The support beam may be in various forms, such as an arch bridge shape, etc., and is not limited thereto. Further, the support beam may also cooperate with other support bodies, such as the support body described in the fourth embodiment.

Wherein, the number, size, distribution density and the like of the support beam can be adjusted according to actual needs, but the fluid inlet of the through hole should be blocked as little as possible to avoid causing a large fluid flow to the fluid processing device. influences.

The structure, arrangement form, material, and the like of the substrate, the micro/nano wire/tube array, the fluid blocking portion, the through hole, and the like used in the fifth embodiment may be the same as or similar to those described above, and thus will not be described herein. .

Referring to FIG. 14, it is preferable that in a sixth embodiment of the present application, a fluid processing apparatus includes a base 601 having a first surface 6011 and a first surface opposite to the first surface. a three-surface 6012, and the base 601 is provided with a plurality of through holes 604 as fluid passages, and the first surface is provided with an array of a plurality of vertical nano-pillars 603, and a plurality of distributed around the through-holes 604 The top of the nano-pillar 603 is also connected with a fluid blocking portion 602 disposed above the fluid inlet of the through-hole 604, so that the fluid to be treated cannot directly bypass the aforementioned array of nano-pillars and directly enter the through-hole. Hole 604. Further, a photocatalytic material layer 605 is further disposed on the surface of the nano-pillar 603 and the first surface of the base 601. When the fluid is treated by the fluid processing device including the photocatalytic material layer 605, if it is supplemented by ultraviolet light or the like, some organic pollutants in the fluid may be photocatalyzed to achieve multiple purification of the fluid.

Wherein, in order to facilitate light penetration, part or all of the fluid blocking portion, the base body, and the convex portion may be made of a transparent material. In some embodiments of this embodiment, the fluid barrier may be made entirely of a transparent material, such as light.

In order to form the photocatalytic material layer 605, those skilled in the art can adopt various methods known in the art, such as coating (spin coating, spraying, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, Atomic layer deposition, etc.), sputtering, etc., and are not limited thereto.

Wherein, the thickness of the photocatalytic material layer 605 can be controlled at the nanometer level to minimize its influence on the fluid flux of the fluid processing device.

The structure, arrangement form, material, and the like of the substrate, the micro/nano wire/tube array, the fluid blocking portion, the through hole, and the like used in the sixth embodiment may be the same as or similar to those described above, and thus will not be described herein. .

Referring to FIG. 15, it is preferable that in a seventh embodiment of the present application, a fluid processing apparatus includes a base 701 having a first surface 7011 and a first surface opposite to the first surface. a three-surface 7012 face, and the base body 701 is provided with a plurality of through holes 704 as fluid passages, and the first surface is provided with an array of a plurality of vertical nano-pillars 703, which are distributed around the through-holes 704 The top of the root nano-pillar 703 is also connected with a fluid blocking portion 702 disposed above the fluid inlet of the through-hole 704, so that the fluid to be treated cannot directly bypass the aforementioned array of nano-pillars and directly enter the Through hole 704. Further, an antibacterial material layer 705 is further disposed on the surface of the nano-pillar 703 and the first surface of the base 701. When the fluid is treated by the fluid processing device including the antimicrobial material layer 705, bacteria, viruses, and the like in the fluid can be synchronously killed during the processing of the fluid to achieve multiple purification of the fluid.

Wherein, in order to form the antibacterial material layer 705, those skilled in the art can adopt various methods known in the art, such as coating (spin coating, spraying, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, atom). Layer deposition, etc.), sputtering, etc., and are not limited thereto.

Wherein, the thickness of the antimicrobial material layer 705 can be controlled at the nanometer level to minimize its effect on the fluid flux of the fluid treatment device.

The structure, arrangement form, material, and the like of the substrate, the micro/nano wire/tube array, the fluid blocking portion, the through hole, and the like used in the seventh embodiment may be the same as or similar to those described above, and thus will not be described herein. .

For example, referring to FIG. 16, in the eighth embodiment of the present application, a preparation process of a fluid processing apparatus may include the following steps:

S1: providing a patterned photoresist mask on one side surface (defined as the first surface a) of the substrate (for example, a silicon wafer);

S2: etching a first surface of the substrate to form a plurality of vertical nanowires spaced apart from each other on a first surface of the substrate, and then removing the first photoresist mask;

S3: coating a soluble or corrodible organic and/or inorganic substance on the first surface of the substrate, and filling the gap between the vertical nanowires with an organic substance and/or an inorganic substance to form a sacrificial layer;

S4: disposing a photoresist on the sacrificial layer and performing photolithography;

S5: etching the sacrificial layer to expose a plurality of vertical nanowires distributed in a second region of the first surface of the substrate, and then removing the photoresist;

S6: providing a photoresist mask on the first surface of the substrate, and exposing a region on the first surface of the substrate corresponding to the fluid blocking portion;

S7: depositing a fluid blocking portion in an exposed region corresponding to the fluid blocking portion;

S8: stripping and removing the photoresist;

S9: providing a patterned etch mask on the second surface of the substrate;

S10: etching another side surface (defined as the third surface b) of the substrate opposite to the first surface until the sacrificial material filled between the adjacent vertical nanowires is exposed, thereby a third surface of the substrate forming a slot, the slot being located corresponding to a first area of the first surface of the substrate, the second area of the first surface of the substrate surrounding the first regional settings;

S11: removing the etching mask and the sacrificial material filled between the vertical nanowires to prepare a fluid processing device.

For example, in the foregoing step S1, the method of forming the patterned (nano-pattern) photoresist mask includes: photolithography technology, nano-spherical mask technology, nano (metal) particle mask technology, etc., and is not limited thereto. .

For example, in the aforementioned step S2, the vertical nanowire array can be etched by means known in the art, such as RIE, ICP, wet etching, electrochemical etching, or the like.

For example, in the foregoing step S3, the filled soluble organic matter may be a photoresist or the like or a corrodible inorganic substance such as metal, SiO ₂ , silicon nitride or the like.

For example, in the foregoing step S10, the slots may be etched by means known in the art, such as RIE, ICP, wet etching, electrochemical etching, or the like.

For example, referring to FIG. 17, in the ninth embodiment of the present application, a preparation process of a fluid processing apparatus may include the following steps:

S1: growing on a first surface of a substrate (eg, a silicon wafer) to form a plurality of vertical nanowires/tubes spaced apart from each other;

S2: coating a soluble or corrodible organic and/or inorganic substance on the first surface of the substrate, and filling the gap between each vertical nanowire/tube with an organic substance and/or an inorganic substance to form a sacrificial layer;

S3: disposing a photoresist on the sacrificial layer and performing photolithography;

S4: etching the sacrificial layer to expose a plurality of vertical nanowires distributed in a second region of the first surface of the substrate, and then removing the photoresist;

S5: providing a photoresist mask on the first surface of the substrate, and exposing a region on the first surface of the substrate corresponding to the fluid blocking portion;

S6: depositing a fluid blocking portion in an exposed region corresponding to the fluid blocking portion;

S7: stripping and removing the photoresist;

S8: providing a patterned etch mask on the third surface of the substrate opposite to the first surface;

S9: etching a third surface of the substrate until a sacrificial material filled between adjacent vertical nanowires is exposed, thereby forming a slot on a third surface of the substrate, where the slot is located Corresponding to the first region of the first surface of the substrate, the second region of the first surface of the substrate is disposed around the first region;

S10: removing the etching mask and the sacrificial material filled between the vertical nanowires to prepare a fluid processing device.

The manner in which the vertical nanowires/tubes are grown to form in the foregoing steps may be selected from a variety of ways known in the art, such as MOCVD, PECVD, electrochemical deposition, and the like.

For example, the method of forming a patterned (nano-pattern) photoresist mask in the foregoing steps includes: a photolithography technique, a nano-spherical mask technique, a nano (metal) particle mask technique, and the like, and is not limited thereto.

For example, the substrate may be etched in the foregoing steps by methods known in the art, such as RIE, ICP, wet etching, electrochemical etching, and the like.

For example, in the foregoing steps, the filled soluble organic matter may be a photoresist or the like or a corrodible inorganic substance such as metal, SiO ₂ , SiN or the like.

Referring to FIG. 18, in a tenth embodiment of the present application, a fluid processing apparatus includes a base 801 having a first surface 8011 and a second surface 8012 opposite to each other, and the base 801 The upper first region 8013 is distributed with a plurality of through holes 804 as fluid passages, and the second region 8014 of the first surface is provided with a plurality of micro/nano sheets 803 (micro sheets and/or nano sheets) arranged in parallel. An array, a partial region of the top of the plurality of micro/nano sheets 803 distributed around the through holes 804 is connected to the fluid blocking portion 802, the fluid blocking portion 802 being disposed above the fluid inlet of the through hole 804 for processing The fluid cannot enter the via 804 directly bypassing the aforementioned array of micro/nanosheets.

Wherein, because the micro/nanosheet micro/nanosheet has a relatively thin thickness, the micro/nanosheet micro/nanosheets can be densely arranged on the first surface of the substrate by adjusting the spacing of the micro/nanosheets. , a groove having an opening of a selected size (which may be referred to as a micro flow channel) is formed, and the particles of different particle size ranges in the fluid are removed, in particular, when the nanosheets are used, Controlling the spacing between these nanosheets at the nanometer level not only removes very small particles in the fluid, but also minimizes the thickness of the nanosheet itself, allowing its resistance to fluids to be kept at a very low level, and The formation of a large fluid flux (especially when the nanosheets have a high height) is far superior to existing porous membranes, fluid flow devices based on lateral flow channels, and the like.

Wherein, the base body 801 can have a larger thickness to form a better support for the aforementioned micro/nano-array array, and at the same time further enhance the mechanical strength of the fluid processing apparatus to make the fluid processing apparatus withstand voltage It is resistant to bending, impact and impact, so that it can be applied in a variety of environments without damage. For example, it can be applied to the treatment of high-pressure, high-speed fluids, which is unmatched by existing porous membranes. .

The material selection range of each part (801, 802, 803, 804) of the fluid processing device is various, and may be an inorganic material or an organic material, such as a metal, a non-metallic inorganic material, a plastic, a ceramic, or a semiconductor. , glass, polymer, etc. When these portions are all selected to use inorganic materials, the fluid treatment device also has temperature-resistant characteristics that can handle high temperature and low temperature fluids.

Further, in this embodiment, more than one support body may be symmetrically or asymmetrically disposed around the through hole, and the support body may further increase the support of the fluid blocking portion to realize the fluid blocking portion and A more stable and stable fit between the substrates, and an effective protection of the micro/nano-array array distributed between the fluid blocking portion and the substrate, avoiding the aforementioned action of the fluid blocking portion and/or the substrate after being subjected to an external force Micro/nano-sheet collapse and damage caused by micro/nano-slice array extrusion.

Wherein, the support body may be in various forms, for example, may have a rectangular shape, a trapezoidal shape, a stepped cross section, or the like, and is not limited thereto. In some embodiments of the first embodiment, the support body may be a boss or the like that protrudes upward from an edge portion of the through hole, and an upper end of the support portion is connected to the fluid blocking portion.

Wherein, the number, diameter, distribution density and the like of the support body can be adjusted according to actual needs, but the space of the first surface of the base body should be occupied as little as possible, and the fluid flux to the micro/nano piece array should be avoided. Cause a big impact.

The fluid handling device of the foregoing design can be (ultrasonic) cleaned, used multiple times, and still maintain good fluid handling capabilities.

When the fluid is treated with the fluid processing device, the fluid containing the foreign particles enters the micro/nano-array array, wherein the particles having a particle size larger than a certain value (or some liquid-incompatible droplets, for example) Water droplets in the air or water droplets in the oil are blocked outside the array of micro/nanosheets, after which the fluid reaches the entrance of the via 804 via the trench between the micro/nanosheets and then enters the via 804. Purification of fluids and/or enrichment recovery of desired particles (droplets).

Referring to FIG. 18 to FIG. 19 again, in some specific applications of the tenth embodiment, the micro/nano piece may have a thickness of 1 nm to 50 μm, a height of 50 nm to 200 μm, and adjacent micro/nano pieces. The groove width between the electrodes may be from 1 nm to 50 μm. The through hole 104 may have a diameter of 1 μm to 1 mm. The thickness of the substrate may be 1 μm or more. The fluid blocking portion may have a thickness of 0.5 μm to 200 μm.

The cross section of the trench formed before the adjacent micro/nanosheets may be regular or irregular, such as polygonal (triangle, quadrilateral or other), circular, elliptical, star, and the like.

The aforementioned micro/nanosheets may be distributed regularly or irregularly, uniformly or non-uniformly on the first surface of the substrate.

Further, in the tenth embodiment, the shape of the aforementioned through hole 804 and the fluid blocking portion 802 (especially longitudinal or lateral) The shape of the cross section may be varied, for example, may be circular, square, rectangular or other shapes.

Referring to FIG. 20, more preferably, in an eleventh embodiment of the present application, a fluid processing apparatus includes a base 901 having opposite first and second surfaces, and The substrate 901 is provided with a plurality of through holes 904 as fluid passages, and the first surface is provided with a plurality of arrays of micro/nano sheets 903 extending continuously in the lateral direction, wherein micro/nano sheets are formed between a groove through which the fluid passes, the opening of the groove having a diameter greater than 0 but less than the particle size of the selected particles mixed in the fluid to be treated, wherein a plurality of micro/nano sheets are directly from the through hole 904 The upper passage is such that the micro/nanosheets cooperate with the substrate to form a fluid passage communicating with the through hole 904, and the fluid to be treated can only enter the through hole 904 through the fluid passage.

Further, in this embodiment, the fluid blocking portion 202 can also be connected to the micro/nano array, and the fluid blocking portion 902 is disposed above the fluid inlet of the through hole 904, so that the fluid to be processed cannot be bypassed. The aforementioned micro/nanochip array directly enters the through hole 904.

Further, one or several supports may also be disposed around the through holes 904.

The structure, arrangement form, material, and the like of the substrate, the micro/nano-sheet array, the fluid blocking portion, the through-hole, the support, and the like used in the second embodiment may be the same as or similar to those described above, and thus are no longer here. Narration.

In an eleventh embodiment of the present application, the fluid processing apparatus may have a structure similar to that of the tenth embodiment, except that more than one, for example, symmetrical or asymmetrical, may be placed on the through hole. The plurality of support beams arranged by the support beam can also increase the support of the fluid blocking portion, thereby achieving a firmer and stable cooperation between the fluid blocking portion and the base body, and effectively distributing the fluid barrier The micro/nano-sheet array between the portion and the substrate forms protection to avoid problems such as collapse/damage of the micro/nanosheet caused by the extrusion of the micro/nanowire array after the fluid blocking portion and/or the substrate are subjected to an external force. .

The support beam may be in various forms, such as an arch bridge shape, etc., and is not limited thereto. Further, the support beam may also cooperate with other support bodies, such as the support body described in the first embodiment.

The structures, arrangement forms, materials, and the like of the substrate, the micro/nanowire array, the fluid barrier, the through holes, and the like used in the eleventh embodiment may be the same as or similar to those described above, and thus will not be described herein.

Referring to FIG. 21, in a twelfth embodiment of the present application, a fluid processing apparatus may have a structure similar to any of the tenth and eleventh embodiments, except that: in the nanosheet A photocatalytic material layer 1105 is further disposed on the first surface of the 1103 surface and the substrate 1101. When the fluid is treated by the fluid processing device including the photocatalytic material layer 1105, if it is supplemented by ultraviolet light, etc., some organic pollutants in the fluid may be photocatalyzed and decomposed to achieve convection. Multiple purification of the body.

Wherein, in order to facilitate light penetration, part or all of the fluid blocking portion 1102, the base body, and the convex portion may be made of a transparent material. In some embodiments of this embodiment, the fluid barrier may be made entirely of a transparent material, such as light.

In order to form the photocatalytic material layer 1105, those skilled in the art can adopt various methods known in the art, such as coating (spin coating, spraying, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, Atomic layer deposition, etc.), sputtering, etc., and are not limited thereto.

Wherein, the thickness of the photocatalytic material layer 1105 can be controlled at the nanometer level to minimize its influence on the fluid flux of the fluid processing device.

The structures, arrangement forms, materials, and the like of the substrate, the micro/nanowire array, the fluid barrier, the through holes, and the like used in the third embodiment may be the same as or similar to those described above, and thus will not be described herein.

Referring to FIG. 22, it is preferable that in the thirteenth embodiment of the present application, a fluid processing apparatus may have a structure similar to any of the tenth, eleventh, and twelfth embodiments. The difference is that an antibacterial material layer 1205 is further disposed on the surface of the nanosheet 1203 and the first surface of the substrate 1201. When the fluid is treated by the fluid treatment device including the antimicrobial material layer 1205, bacteria, viruses, and the like in the fluid can be synchronously killed during the treatment of the fluid to achieve multiple purification of the fluid.

Wherein, in order to form the antibacterial material layer 1205, those skilled in the art can adopt various methods known in the art, such as coating (spin coating, spraying, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, atom). Layer deposition, etc.), sputtering, etc., and are not limited thereto.

Wherein, the thickness of the antimicrobial material layer 405 can be controlled at the nanometer level to minimize its effect on the fluid flux of the fluid treatment device.

The structures, arrangement forms, materials, and the like of the substrate, the micro/nanowire array, the fluid barrier, the through holes, and the like used in the thirteenth embodiment may be the same as or similar to those described above, and thus will not be described herein.

The preparation process of the fluid processing apparatus in a preferred embodiment of the present application may include the following steps:

S1: providing a patterned photoresist mask on one side surface (designated as the first surface) of the substrate (for example, a silicon wafer);

S2: etching the first surface of the substrate to form spaced apart from each other on the first surface of the substrate a plurality of vertical nanosheets extending in a lateral direction, after which the first photoresist mask is removed;

S3: coating a soluble or corrodible organic and/or inorganic substance on the first surface of the substrate, and filling the groove between the vertical nanosheets with an organic substance and/or an inorganic substance to form a sacrificial layer;

S5: etching the sacrificial layer to expose a plurality of vertical nanosheets distributed in a second region of the first surface of the substrate, and then removing the photoresist;

S7: depositing a fluid blocking portion in the exposed region corresponding to the fluid blocking portion, and stripping and removing the photoresist;

S8: providing a patterned etch mask on the other side surface of the substrate opposite to the first surface (designated as the third surface), and then performing the other side surface of the substrate Etching until a sacrificial material filled between adjacent vertical nanosheets is exposed, thereby forming a slot in the other side surface of the substrate, the slot being located at a position opposite to the first surface of the substrate Corresponding to the first region, a second region of the first surface of the substrate is disposed around the first region;

S9: removing the etching mask and the sacrificial material filled between the vertical nanosheets to prepare a fluid processing device.

For example, in the foregoing step S2, the vertical nanochip array can be etched by means known in the art, such as RIE, ICP, wet etching, electrochemical etching, or the like.

For example, in the foregoing step S3, the filled soluble organic matter may be a photoresist or the like or a corrosive inorganic substance such as metal, SiO ₂ , SiN or the like.

For example, in the foregoing step S8, the slots may be etched by means known in the art, such as RIE, ICP, wet etching, electrochemical etching, or the like.

Referring to FIG. 23, in a fourteenth embodiment of the present application, a fluid processing apparatus is mainly used for processing a fluid mixed with selected particles, and includes a base 1300 having opposite pairs. The first surface 1301 and the second surface 1302, and the base 1300 is distributed with a plurality of through holes 1303 as fluid passages. A plurality of micro/nano wires/tubes 1400 (ie, any one or more of microwires, microtubes, nanowires, nanotubes), in particular nanowires/tubes (nanowires and/or), are distributed within any of the vias 1303 nanotube). One end of the micro/nano wire/tube 1400 is fixed to the hole wall of the through hole 1303, and the other end extends in the radial direction of the through hole. These micro/nano wires/tubes 1400 are gathered in a mutual intersection to become more Hole structure. The pores within the porous structure have a diameter greater than zero but less than the particle size of the selected particles.

Referring to FIG. 24 again, in the fifteenth embodiment of the present application, the porous structure is a grid structure distributed in the through hole 1303 as viewed from a plan view.

Wherein, since the micro/nano wires/tubes 1400 have a large aspect ratio (or aspect ratio), the micro/nano wires/tubes 1400 can be densely arranged in the through holes, and by adjusting the micro The distribution density, length, etc. of the nanowire/tube 1400 can be used to remove particles of different particle size ranges in the fluid 1500, in particular, when the nanowires/tubes are used, by using these nanowires/tubes The pores formed by the cross-section are controlled at the nanometer level, which not only removes very small particles in the fluid, but also minimizes the diameter of the nanowire/tube itself, and also controls the resistance to fluid at a very low level. The large fluid flux is far superior to existing porous membranes, fluid handling devices based on lateral flow channels, and the like.

Wherein, the base body 1300 can have a relatively large thickness, thereby further enhancing the mechanical strength of the fluid processing device, so that the fluid processing device can withstand pressure, bend, impact, and impact, thereby enabling It can be applied in a variety of environments without damage, for example, it can be applied to the treatment of high-pressure, high-speed fluids, which is unmatched by existing porous membranes.

In particular, since the micro/nano wires/tubes 1400 are all distributed within the through holes 1303, the micro/nano wires/tubes 1400 are actually protected by the substrate 1300, and further, even if the fluid processing device is subjected to Pressure, etc., will not damage these micro/nano wires/tubes 1400.

Wherein, the material selection range of each part (1301, 1302, 1303) of the fluid processing device is various, and may be an inorganic material or an organic material, for example, a metal, a ceramic, a polymer, or the like. When these portions are all selected to use inorganic materials, the fluid treatment device also has temperature-resistant characteristics that can handle high temperature and low temperature fluids.

When the fluid is treated by the fluid processing device, the fluid containing the foreign particles enters the porous structure, wherein the particles having a particle diameter larger than a certain value (or some liquid incompatible with the fluid, such as in air) Water droplets or water droplets in the oil are blocked outside of the aforementioned porous structure, after which the fluid flows out of the through hole 1303 to effect purification of the fluid and/or enrichment recovery of the desired particles (droplets).

In some specific applications of this embodiment, the micro/nanowire/tube 1400 may have a diameter of 1 nm to 500 μm.

In some specific applications of the embodiment, the through hole 1303 may have a diameter of 1 μm to 1 mm.

In some specific applications of this embodiment, the thickness of the aforementioned substrate may be 1 μm or more.

The aforementioned micro/nano wires/tubes 1400 may be distributed within the through holes 1303 regularly or irregularly, uniformly or non-uniformly.

The aforementioned micro/nanowire/tube 1400 may preferably be selected from carbon nanowires, carbon nanotubes, ZnO nanowires, GaN nanowires, TiO ₂ nanowires, Ag nanowires, Au nanowires, and the like, without being limited thereto.

The aforementioned micro/nanowire/tube 1400 may be in situ on the inner wall of the through hole 1303 by external transfer, in-situ growth (for example, chemical growth, electrochemical growth) or deposition (for example, physical, chemical vapor deposition, electrodeposition) or the like. Growth formation.

The shape of the aforementioned through hole 1303 (particularly the shape of the transverse cross section) may be various, and may be, for example, a circle, a square, a rectangle, a diamond, a polygon, or other regular or irregular shape.

In some specific applications of the embodiment, the micro/nanowire/tube 1400 may be formed of a photocatalytic material or a material having an antibacterial or bactericidal function, or the micro/nanowire/tube 1400 may also be covered with a surface. A coating formed of a photocatalytic material or a material having a bactericidal or antibacterial function.

For example, the micro/nanowire/tube 1400 may employ nanowires having photocatalytic properties such as ZnO nanowires, GaN nanowires, and TiO2 nanowires, and can degrade organic substances in the fluid under light-assisted illumination.

For example, the aforementioned micro/nanowire/tube 1400 may employ Ag nanowires, Au nanowires, or the like to kill bacteria, viruses, and microorganisms in the fluid.

In some specific applications of the embodiment, the surface of the substrate 1300, particularly the first surface 1301 thereof, may also be provided with a layer of photocatalytic material or a layer of antibacterial material or the like.

Wherein, in order to facilitate light penetration, some or all of the components of the fluid processing apparatus may be made of a transparent material.

Wherein, in order to form the antibacterial material layer, those skilled in the art may adopt various methods known in the art, such as coating Cloth (spin coating, spray coating, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, atomic layer deposition, etc.), sputtering, and the like, and is not limited thereto.

As one of the preferred embodiments of this embodiment, a plurality of erected nanowires spaced apart from each other may be disposed on the first surface of the substrate, and the nanowires may be disposed around the aforementioned through holes as fluid passages.

More preferably, the aspect ratio of the upright nanowires is 4:1 to 200000:1, and the ratio of the distance between adjacent vertical nanowires to the length of the vertical nanowires is 1:4 to 1:200,000.

By adopting such a structure and a distributed shape of the erected nanowires, a plurality of erected nanowires can be densely arranged (the proportion of the bulge itself in a unit area is small), which facilitates processing of minute particles in the fluid while also The fluid handling device is given a greater fluid flux (the pores between the erected nanowires are larger than the erected nanowires themselves).

More preferably, the upright nanowires may have the same material, size, structure, etc. as the micro/nano wires/tubes 1400 described above.

In particular, if referring to a solution known in the art, the arrangement density of the above-mentioned erected nanowires and the like are appropriately designed to form a nanowire array, and a superhydrophobic structure and a super oleophobic structure can be formed. The particles in the fluid are removed and the blocked particles are also unable to accumulate on the surface of the fluid treatment device by self-cleaning.

Wherein, since the substrate can have a large thickness, the aforementioned erected nanowires can obtain better support.

As one of the preferred embodiments of the embodiment, a fluid blocking portion may be further disposed on the aforementioned upright nanowires, and the fluid blocking portion may have a surface disposed opposite to the first surface of the base body (may be named as the first a three-surface), and one end of the plurality of upright linear bodies is fixedly disposed on the first surface of the base body, and the other end is fixedly connected to the third surface of the fluid blocking portion, wherein a distance between adjacent vertical linear bodies is greater than 0 but less than the particle size of the selected particles.

The fluid blocking portion may have various forms, and may be, for example, a sheet shape, a thin shell shape, a rectangular shape, a polyhedral shape, or the like.

Preferably, the foregoing erected nanowires, the fluid blocking portion and the base body cooperate to form a fluid passage through which the fluid to be treated can only enter the fluid passage distributed on the first surface of the base body (through hole 1303). The fluid inlet, the first treatment of the fluid, and then into the fluid channel distributed on the substrate, and the second treatment of the agglomerates of the micro/nano wires/tubes 1400, so that the fluid can be realized Multiple processing.

Wherein, by spacing the spacing of the erected nanowires described above, the apertures formed by the intersection of the micro/nano wires/tubes 1400 are different, in particular, the spacing between the erected nanowires is greater than The pore size of the pores formed by the intersection of the micro/nanowire/tube 1400 can also achieve grading treatment of particles of different sizes in the fluid.

Wherein, the fluid inlet of the fluid channel (through hole 1303) and the plurality of upright nanowires may be distributed within an orthographic projection of the fluid blocking portion on the first surface of the substrate.

The shape of the aforementioned fluid blocking portion may be varied, and may be, for example, a circle, a square, a rectangle, or the like.

The material of the fluid blocking portion may be selected from a metal, a non-metal, an organic material, an inorganic material, or the like, such as a silicon wafer, a polymer, a ceramic, or the like, and is not limited thereto.

Preferably, the surface of the fluid blocking portion may be distributed with the photocatalytic material, the sterilizing material, or the like, or the surface of the fluid blocking portion may be entirely composed of the photocatalytic material, the sterilizing material, or the like.

More preferably, the fluid blocking portion may have a partially transparent structure or be transparent as a whole, for example, by light.

For example, referring to FIG. 25, in the sixteenth embodiment of the present application, a preparation process of a fluid processing apparatus may include the following steps:

S1: providing a patterned photoresist mask on the first surface of the substrate (for example, a silicon wafer), which comprises lithographically patterning micro-nano scale lines;

S2: etching a first surface of the substrate by using the photoresist mask to form a plurality of via holes penetrating the first surface of the substrate and the second surface opposite to the first surface Used as a fluid passage;

S3: depositing a seed layer for micro/nanowire/tube growth on an inner wall of the fluid channel and the first surface of the substrate;

S4: growing a plurality of micro/nano wires/tubes on the seed layer to control the growth conditions of the micro/nano wires/tubes, thereby growing on the first surface of the substrate to form a plurality of erect micro/spaces spaced apart from each other a nanowire/tube that grows within the fluid channel to form a plurality of micro/nano wires/tubes extending in a radial direction, a plurality of micro/nano wires/tubes within the fluid channel intersecting each other to form a micro-nano scale Cross grid

S5: removing micro/nano wires/tubes (also retained) distributed on the first surface of the substrate;

S6: dicing, encapsulating, and preparing a fluid processing device.

For example, in the foregoing steps, it may be in a manner known in the art, such as RIE, ICP, wet etching, electrochemical etching Etching out a fluid channel or the like.

Obviously, the preparation process of the fluid processing device of the present application is simple and controllable, and is suitable for batch mass production.

Referring to FIG. 26, in a seventeenth embodiment of the present application, a nasal plug respirator may include:

Hard outer casing 11,

The embedded hard wire mesh assembly comprises two embedded hard wire meshes 12 disposed laterally and spacedly in the outer casing 11;

The filter fabric sheet assembly comprises two sheets of filter fabric sheets 13 disposed laterally and spaced apart in the outer casing 11. The two sheets of filter fabric sheets 13 are located between the two embedded rigid screens 12 and are respectively fixed to Embedded on the hard screen 12;

The fixed hard wire mesh assembly comprises two fixed hard wire meshes 14 disposed laterally and spacedly in the outer casing 11 , and the fixed hard wire mesh 14 is located between the two pieces of filter wire fabric sheets 13 ;

The filter chip is disposed laterally in the outer casing 11 and located between the two fixed hard screens 14;

The waist drum type nasal plug 15 includes a connecting piece body 151 and two nasal plug bodies 152 protruding outward from one side of the connecting piece body 151. The waist drum type nasal plug 15 is embedded in one end of the inner cavity of the outer casing 11 via the connecting piece body 151. The nasal plug body 152 is in communication with the lumen of the outer casing 11.

Preferably, the two ends of the embedded rigid wire mesh 12 are detachably connected to the inner cavity wall of the outer casing 11 respectively. The two ends of the filter fabric sheet 13 are respectively connected to the inner cavity wall of the outer casing 11, one side of which is fixedly connected to the embedded hard wire mesh 12, and the other side of which is erected on the boss protruding from the inner cavity wall of the outer casing 11. on. Both ends of the fixed hard screen 14 are respectively fixed to the inner cavity wall of the outer casing 11. Both ends of the filter chip are respectively fixed on the inner cavity wall of the outer casing 11.

In the present invention, the foregoing filter chip may be prepared by using MEMS (Micro Electro Mechanical System Processing Technology), and thus may also be named as a MEMS filter chip.

Referring to FIGS. 2 to 3, in a preferred embodiment of the present application, a filter chip includes a base 101 having a first surface 1011 and a second surface 1012 opposite to each other, and A plurality of through holes 102 are formed in the base 101 as fluid passages. The first surface is provided with an array of a plurality of beams 103 (which may be named as protrusions) arranged in parallel, wherein a plurality of beams 103 are directly from the through holes. A plurality of beams 103 are disposed on the sides of the through holes 102, wherein the tops of the beams 103 are also distributed with a hat-shaped structure 104 (abbreviated as a cap layer), and the cap layers are continuously extended along the transverse direction of the beams. And forming an array of hat-shaped structures, and the air to be treated cannot directly enter the through-holes 102 by bypassing the array of the aforementioned hat-shaped structures.

Wherein, by adjusting the spacing between the above-mentioned hat-shaped structures, an opening portion (which may be referred to as a micro-flow channel) having a selected size can be formed, and the particles of different particle size ranges in the air can be removed, in particular, When the pitch of these cap structures is controlled at the nanometer level, extremely small particles (nanoscale particles) in the air can be removed.

The aforementioned beams may be strip-shaped and have a large width and thickness so that the beams can have a high mechanical strength. It provides better support for the cap layer, and the spacing of the beams can be large to provide greater air flux.

The cap layer may also have a large thickness, and both sides are laterally extended so that the spacing of adjacent cap layers can be made small, for example, as low as 1 nm, so that the trapping of the air to be treated is minimal. particle.

The cap layer may be integrally provided with the convex portion, for example, may be directly formed on the upper portion of the convex portion by evaporation, deposition, growth, or the like (typically, such as metal sputtering, MOCVD, PECVD, electrochemical deposition, etc.), and The hat-shaped structure may also continuously extend in the lateral direction with the convex portion, so that an opening portion extending continuously in the lateral direction is formed between the adjacent hat-shaped structures, so that on the one hand, the selection of the air mixed in the air to be treated can be ensured. The treatment of the fixed particles also maintains a high throughput, which reduces the processing difficulty and saves costs.

Wherein, the base body 101 can have a relatively large thickness, so that it can form a good support for the aforementioned micro/nano-array array, and can further enhance the mechanical strength of the filter chip, so that the filter chip can withstand pressure and resistance. It can be bent, impact-resistant and impact-resistant, so that it can be applied in various environments without damage. For example, it can be applied to high-pressure, high-speed air treatment, which is unmatched by existing porous membranes.

The material selection range of each part (101, 102, 103, 104) of the filter chip is various, and may be an inorganic material or an organic material, such as a metal, a non-metallic inorganic material, a plastic, a ceramic, a semiconductor, or the like. Glass, polymer, etc. When these parts are all selected to use inorganic materials, the filter chip also has a temperature-resistant property and can handle high temperature and low temperature air.

Filter chips using the aforementioned design can be (ultrasonic) cleaned, used multiple times, and still maintain good air handling capabilities.

When the air is processed by the filter chip, the air containing the impurity particles (the air flow is indicated by the arrow with a broken line in FIG. 3) enters the array of the above-mentioned hat-shaped structure, wherein the particle diameter is larger than a certain value. The particles (or some air-incompatible droplets, such as water droplets in the air or water droplets in the oil) are blocked outside the array of the aforementioned hat-shaped structures, after which the air reaches the passage through the opening between the respective hat-shaped structures The entrance of the aperture 102 is then re-entered into the via 102 to effect purification of the air and/or enrichment recovery of the desired particles (droplets).

In addition, in this embodiment, the shape of the through hole 102 may be various, and may be, for example, a circle, a square, a rectangle, or the like.

In some other embodiments of the present application, a filter chip may have a structure similar to any of the foregoing embodiments, except that a photocatalytic material layer may be disposed on the beam, the cap layer, and the surface of the substrate. . When the air is treated by a filter chip containing a photocatalytic material layer, if it is supplemented with ultraviolet light, etc., some organic pollutants in the air may be photocatalyzed to achieve multiple purification of the air.

Wherein, the thickness of the photocatalytic material layer can be controlled at the nanometer level to minimize its influence on the air flux of the filter chip.

In some other embodiments of the present application, a filter chip may have a structure similar to any of the previous embodiments, except that an antibacterial material layer may be disposed on the beam, the cap layer, and the surface of the substrate. When the air is processed by the filter chip containing the antibacterial material layer, bacteria, viruses and the like in the air can be simultaneously killed during the air treatment to achieve multiple purification of the air.

Wherein, the thickness of the antibacterial material layer can be controlled at the nanometer level to minimize its influence on the air flux of the filter chip.

The filter chip of the present application can be prepared by physical or chemical methods, for example, a chemical growth method, a physical processing method, or the like, in particular, a MEMS (Micro Electromechanical Systems) method.

As shown in FIG. 4, in other embodiments of the present application, a process for preparing a filter chip may include the following steps:

S1: providing a substrate (such as a silicon wafer);

S7: dicing, encapsulating, and manufacturing a filter chip (this step is not shown in the figure).

Obviously, the preparation process of the filter chip in this embodiment is simple and controllable, and is suitable for mass production in large quantities, and the obtained filter chip has at least the following advantages: (1) large flux and small flow resistance; (2) physical filtration It can effectively remove particles larger than nano-slit; (3) straddle beam and large substrate thickness can ensure high mechanical strength; (5) can be (ultrasonic) cleaning, multiple use.

Referring to FIG. 5, in another preferred embodiment of the present application, a filter chip includes a base 201 having a first surface 2011 and a second surface 2012 opposite to each other, and the base 201 A plurality of through holes 204 are provided as fluid passages. The first surface 2011 is provided with a plurality of cross beams 203 arranged in parallel, and the beam 203 is at The first surface extends continuously in the lateral direction, and a plurality of beams 203 thereof traverse continuously from the through holes 204, and thus can also be regarded as a spanning beam 203. Each of the beams 203 is distributed with a plurality of nanowires 202. One end of the plurality of nanowires 202 is fixed to the surface of the beam 203, and the other end is obliquely extended away from the beam 203. It can be considered to be laterally extended and intersects with a plurality of nanowires 202 distributed on another beam adjacent to either of the beams 203 to form the porous structure 205. Referring again to FIG. 5, the porous structure 205 is viewed in a plan view to cover the mesh structure of the through holes 204. The diameter of the pores in the porous structure 205 is greater than zero but less than the particle size of selected particles that are intermixed within the fluid to be treated. 5-6, it can be seen that the porous structure 205 formed by the intersection of the plurality of nanowires 102 cooperates with the first surface 2011 of the substrate 201 to form another fluid passage, so that the fluid 206 to be treated can only pass. The other fluid passage enters the through hole 204.

Wherein, because the nanowires have a large aspect ratio (or aspect ratio), the nanowires can be densely arranged on the first surface of the substrate, by adjusting the spacing between the beams and the nanowires. Density, length, direction of extension, etc., can be used to remove particles of different particle size ranges in the fluid. In particular, when nanowires are used, the pore size formed by the intersection of these nanowires is controlled at the nanometer level. Not only can the tiny particles in the fluid be removed, but also because the nanowire itself has a very small diameter, it can also control the resistance to the fluid to a very low level and form a large fluid flux, which is far superior to the present. Some porous membranes, filter chips based on lateral flow channels, and the like.

Wherein, according to the solution known in the industry, the arrangement of the aforementioned nanowires is designed to be super-hydrophobic structure and super-oleophobic structure, which can not only remove particles in the fluid, but also pass The self-cleaning action prevents the blocked particles from accumulating in the functional area (the surface of the nanowire array) of the filter chip, thereby preventing the filter chip from failing after long-term use.

Wherein, the beam 203 can be distributed at a suitable density on the first surface 2011 of the substrate 201 to provide the filter chip with as high a fluid handling flux as possible. Also, the beam 203 may have a suitable width such that the beam 203, while having sufficient mechanical strength, may also avoid excessive effects on the flux of the filter chip. For example, the beam may have a height of 0.1 μm to 100 μm, a width of 0.1 μm to 400 μm, and a pitch between the beams of 0.1 μm to 100 μm.

Wherein, the base 201 can have a larger thickness and the beam 203 can have a larger height, so that it can form a better support for the nanowire array, and can further enhance the mechanical strength of the filter chip. The filter chip is resistant to pressure, bending, impact and impact, so that it can be applied in various environments without damage, for example, it can be applied to processing high pressure and high speed fluids. A porous membrane or the like cannot be achieved.

The material selection range of each part (201, 202, 203) of the filter chip is various, and may be an inorganic material or an organic material. When these parts are selected to use inorganic materials, the filter chip also has temperature resistance The ability to handle high temperature and low temperature fluids.

The filter chip of the aforementioned design can be (ultrasonic) cleaned, used multiple times, and still maintain good fluid handling capabilities.

When the fluid is treated with the filter chip, the fluid containing the foreign particles enters the porous structure 205, wherein the particles having a particle diameter larger than a certain value (or some liquid-incompatible droplets, such as air) Water droplets or water droplets in the oil are blocked outside the porous structure 205, after which the fluid reaches the entrance of the through hole 204 via the gap between the nanowires and then enters the through hole 204, thereby purifying the fluid and/or Enrichment recovery of the desired particles (droplets).

Referring to FIG. 5 again, in some specific applications of the embodiment, the diameter and spacing of the nanowires 202 may be 1 nm to 50 μm, and the length 6 degrees (height) may be 50 nm to 200 μm. The through hole 104 may have a diameter of 1 μm to 1 mm. The thickness of the substrate may be 1 μm or more.

The array formed by these nanowires 202 can have a superhydrophobic structure, thereby allowing the filter chip to have a self-cleaning function.

When the fluid is treated by a filter chip containing a photocatalytic material layer, if it is supplemented with ultraviolet light, etc., some organic pollutants in the fluid may be photocatalyzed to achieve multiple purification of the fluid.

Wherein, the thickness of the photocatalytic material layer can be controlled at the nanometer level to minimize its influence on the fluid flux of the filter chip.

When the fluid is processed by the filter chip containing the antibacterial material layer, bacteria, viruses and the like in the fluid can be synchronously killed during the processing of the fluid to achieve multiple purification of the fluid.

Wherein, the thickness of the antimicrobial material layer can be controlled at the nanometer level to minimize its influence on the fluid flux of the filter chip.

For example, referring to FIG. 7, in this embodiment, a process for preparing a filter chip may include the following steps:

S7: dicing, encapsulation, and making a filter chip.

Obviously, the preparation process of the filter chip of the present application is simple and controllable, and is suitable for batch mass production.

Referring to FIG. 8 and FIG. 11a - FIG. 11b, in a preferred embodiment of the present application, a filter chip includes a base 301 having a first surface 301a and a first area of the base 301 3011 (the area enclosed by the dotted line in the figure) is distributed with a plurality of through holes 304 as fluid passages, and the first surface is provided with a plurality of vertical micro/nano wires/tubes 303 (ie, micron-sized wires, micron-sized An array formed by a combination of any one or more of tubes, nanowires, nanotubes, distributed over the plurality of micro/nano wires distributed around the vias 304 in the second region 3012 of the first region 3011 The top of the tube 303 is also connected with a fluid blocking portion 302 disposed above the fluid inlet of the through hole 304 so that the fluid to be treated cannot directly bypass the aforementioned micro/nano wire/tube array. Entering the through hole 304, the fluid blocking portion 302 has a second surface 302b disposed opposite the first surface 3011. A plurality of vertical micro/nano wires/tubes 303 may also be densely distributed in the remaining area 3013 of the first surface 3011 (which may be named as the third area). In Figure 8, arrows with dashed lines show the direction of travel of the fluid.

Wherein, because the aforementioned micro/nano wires/tubes have a large aspect ratio (or aspect ratio), the micro/nano wires/tubes can be densely arranged on the first surface of the substrate, by adjusting these micro// Nanowire/tube spacing allows for the removal of particles of different particle sizes in the fluid, especially when nanowires/tubes are used, by controlling the spacing between these nanowires/tubes in the nanometer The grade not only removes very small particles in the fluid, but also because the nanowire/tube itself has a very small diameter, it can also control the resistance to fluids to a very low level and form a large fluid flux. It is far superior to existing porous membranes, filter chips based on lateral flow channels, and the like.

Wherein, if the micro/nanowire/tube array is designed according to a scheme known in the art, the super-hydrophobic structure and the super-oleophobic structure can be formed, which can not only remove particles in the fluid, but also By self-cleaning, the blocked particles cannot be accumulated in the functional area (micro/nanowire/tube array surface) of the filter chip, and the filter chip is prevented from failing after long-term use.

Wherein, the base 301 can have a large thickness to form a better support for the micro/nano wire/tube array, and further enhance the mechanical strength of the filter chip to make the filter chip withstand voltage. It is resistant to bending, impact and impact, which makes it suitable for use in a variety of environments without damage, for example, for high pressure, high speed fluids. Treatment, this function is unmatched by existing porous membranes.

Wherein, the material selection range of each part (301, 302, 303, 304) of the filter chip is various, and may be an inorganic material or an organic material, such as a metal, a non-metallic inorganic material, a plastic, a ceramic, a semiconductor, Glass, polymer, etc. When these parts are all selected to use inorganic materials, the filter chip also has temperature-resistant characteristics and can handle high temperature and low temperature fluids.

When the fluid is processed by the filter chip, the fluid containing the impurity particles enters the array of the aforementioned micro/nano wires 303, wherein the particles having a particle diameter larger than a certain value (or some liquid incompatible with the fluid) , for example, water droplets in the air or water droplets in the oil) are blocked outside the aforementioned micro/nanowire/tube array, after which the fluid reaches the entrance of the through hole 304 via the gap between the respective micro/nano wires/tubes and then enters The through holes 304 enable purification of the fluid and/or enrichment recovery of the desired particles (droplets).

Referring to FIG. 8 again, in some specific applications of the embodiment, the micro/nano wires may have a diameter of 1 nm to 50 μm, and the length (height) h ₁ may be 50 nm to 200 μm, and adjacent micro/nano lines. The distance between them may be from 1 nm to 50 μm. The through hole 304 may have a diameter w of 1 μm to 1 mm. The thickness h _{2 of} the substrate may be 1 μm or more. The thickness h _{3 of} the fluid blocking portion may be from 0.5 μm to 200 μm.

Referring again to FIGS. 9a-9e, the transverse cross-sectional structure of the aforementioned micro/nano wires may be regular or irregular, such as polygonal (triangle, quadrilateral or other), circular, elliptical, star, and the like.

In addition, referring to FIG. 11a - FIG. 11c, in this embodiment, the shape of the through hole 304 and the fluid blocking portion 302 (especially the shape of the transverse cross section) may be various, for example, may be circular, square, rectangular or Other shapes.

Referring to FIG. 12, preferably, in a preferred embodiment of the present application, a filter chip includes a base 401 having a first surface and opposite to the first surface and a third a surface, and the substrate 401 is provided with a plurality of through holes 404 as fluid passages, and the first surface is provided with an array of vertical micro/nano wires/tubes 403 distributed around the through holes 404. The top of the plurality of micro/nano wires/tubes 403 is also connected with a fluid blocking portion 402 disposed above the fluid inlet of the through hole 404, so that the fluid to be treated cannot bypass the aforementioned micro/nano. The line/tube array directly enters the through hole 404. Moreover, a symmetric or asymmetric distribution around the through hole 404 is also provided. One or more, for example, four support bodies 405 can also support the fluid blocking portion 402 by the support body 405, thereby achieving a more stable and stable cooperation between the fluid blocking portion and the base body, and can be effective. Protecting the micro/nanowire/tube array distributed between the fluid barrier and the substrate to avoid the extrusion of the micro/nanowire/tube array by the fluid barrier and/or the substrate after being subjected to an external force The micro/nano wire/tube 403 collapses, is damaged, and the like.

Wherein, the support body may be in various forms, for example, may have a rectangular, trapezoidal, stepped longitudinal section (the longitudinal direction herein may be understood as a direction perpendicular to the first surface of the base body), and the like, and is not limited thereto. . In some embodiments of the embodiment, the support body may be a boss or the like that protrudes upward from an edge portion of the through hole 404, and an upper end thereof is connected to the fluid blocking portion 402.

The structure, arrangement form, material, and the like of the substrate, the micro/nano wire/tube array, the fluid blocking portion, the through hole, and the like used in this embodiment may be the same as or similar to those described above, and thus will not be described herein.

Referring to FIG. 13, preferably, in a preferred embodiment of the present application, a filter chip includes a base 501 having a first surface and opposite to the first surface and a third a surface, and the substrate 501 is provided with a plurality of through holes 504 as fluid passages, and the first surface is provided with an array formed by a plurality of vertical micro/nano wires/tubes 503 distributed around the through holes 504. The top of the plurality of micro/nano wires/tubes 503 is also connected with a fluid blocking portion 502 disposed above the fluid inlet of the through hole 504, so that the fluid to be treated cannot bypass the aforementioned micro/nano. The line/tube array directly enters the via 504. Moreover, a plurality of support beams 505, such as symmetric or asymmetric arrangement, are further disposed on the through hole 504, and the support beam 505 can also increase the support of the fluid blocking portion 502. A more stable and stable fit between the fluid barrier and the substrate is achieved, and the micro/nanowire/tube array distributed between the fluid barrier and the substrate can be effectively protected from being blocked by the fluid barrier and/or the substrate. After the external force is applied, the micro/nanowire/tube 503 is collapsed and damaged due to the extrusion of the aforementioned micro/nanowire/tube array.

The support beam may be in various forms, such as an arch bridge shape, etc., and is not limited thereto. Further, the support beam can also cooperate with other support bodies, such as the support body described in the foregoing embodiments.

Wherein, the number, size, distribution density and the like of the support beam can be adjusted according to actual needs, but the fluid inlet of the through hole should be blocked as little as possible to avoid a large influence on the fluid flux of the filter chip. .

Referring to FIG. 14, it is preferable that in a preferred embodiment of the present application, a filter chip includes a base 601 having a first surface 6011 and a third opposite to the first surface. Surface 6012, and the substrate A plurality of through holes 604 as fluid passages are disposed on the 601, and the first surface is provided with an array formed by a plurality of vertical nano-pillars 603, and the tops of the plurality of nano-pillars 603 distributed around the through-holes 604 are also connected The fluid blocking portion 602 is disposed above the fluid inlet of the through hole 604, so that the fluid to be treated cannot directly enter the through hole 604 by bypassing the aforementioned array of nanopillars. Further, a photocatalytic material layer 605 is further disposed on the surface of the nano-pillar 603 and the first surface of the base 601. When the fluid is processed by the filter chip including the photocatalytic material layer 605, if it is supplemented with ultraviolet light or the like, some organic pollutants in the fluid may be photocatalyzed to achieve multiple purification of the fluid.

Wherein, the thickness of the photocatalytic material layer 605 can be controlled at the nanometer level to minimize its influence on the fluid flux of the filter chip.

Referring to FIG. 15, it is preferable that in a preferred embodiment of the present application, a filter chip includes a base 701 having a first surface 7011 and a third opposite to the first surface. The surface of the substrate 701 is distributed with a plurality of through holes 704 as fluid passages, and the first surface is provided with an array of a plurality of vertical nano-pillars 703, and a plurality of distributed around the through-holes 704 The top of the nano-pillar 703 is also connected with a fluid blocking portion 702 disposed above the fluid inlet of the through-hole 704, so that the fluid to be treated cannot directly bypass the aforementioned array of nano-pillars and directly enter the through-hole. Hole 704. Further, an antibacterial material layer 705 is further disposed on the surface of the nano-pillar 703 and the first surface of the base 701. When the fluid is treated with the filter chip including the antimicrobial material layer 705, bacteria, viruses, and the like in the fluid can be synchronously killed during the processing of the fluid to achieve multiple purification of the fluid.

Wherein, the thickness of the antimicrobial material layer 705 can be controlled at the nanometer level to minimize its influence on the fluid flux of the filter chip.

For example, referring to FIG. 16, in a preferred embodiment of the present application, a process for preparing a filter chip may include the following steps:

S8: stripping and removing the photoresist;

S9: providing a patterned etch mask on the second surface of the substrate;

S11: removing the etching mask and the sacrificial material filled between the vertical nanowires to obtain a filter chip.

For example, in the aforementioned step S2, it can be by a method known in the art, such as RIE, ICP, wet etching, electrochemistry A vertical nanowire array is etched by etching or the like.

Referring to FIG. 17, in a preferred embodiment of the present application, a process for preparing a filter chip may include the following steps:

S7: stripping and removing the photoresist;

S10: removing the etching mask and the sacrificial material filled between the vertical nanowires to prepare a filter chip.

Referring to FIG. 18, in a preferred embodiment of the present application, a filter chip includes a base 801 having a first surface 18011 and a second surface 8012 opposite to each other, and the base 801 is The first region 8013 is distributed with a plurality of through holes 804 as fluid passages, and the second region 8014 of the first surface is provided with an array of a plurality of micro/nano sheets 803 (micro sheets and/or nano sheets) arranged in parallel a partial area of the top of the plurality of micro/nano sheets 803 distributed around the through holes 804 is connected to the fluid blocking portion 802, which is disposed above the fluid inlet of the through holes 804, to be processed The fluid cannot enter the through hole 804 directly bypassing the aforementioned array of micro/nanosheets.

Wherein, because the micro/nanosheet micro/nanosheet has a relatively thin thickness, the micro/nanosheet micro/nanosheets can be densely arranged on the first surface of the substrate by adjusting the spacing of the micro/nanosheets. , a groove having an opening of a selected size (which may be referred to as a micro flow channel) is formed, and the particles of different particle size ranges in the fluid are removed, in particular, when the nanosheets are used, Controlling the spacing between these nanosheets at the nanometer level not only removes very small particles in the fluid, but also minimizes the thickness of the nanosheet itself, allowing its resistance to fluids to be kept at a very low level, and The formation of a large fluid flux (especially when the nanosheets have a high height) is far superior to existing porous membranes, lateral flow channel-based filter chips, and the like.

Wherein, the base body 801 can have a large thickness, so that it can form a good support for the micro/nano-array array, and can further enhance the mechanical strength of the filter chip, so that the filter chip can withstand pressure and resistance. Bending, impact resistance, impact resistance, and thus can be applied in a variety of environments without damage, for example, can be applied to the treatment of high pressure, high speed fluid, this function is unmatched by existing porous membranes.

The material selection range of each part (801, 802, 803, 804) of the filter chip is various, and may be an inorganic material or an organic material, such as a metal, a non-metallic inorganic material, a plastic, a ceramic, a semiconductor, or the like. Glass, polymer, etc. When these parts are all selected to use inorganic materials, the filter chip also has temperature-resistant characteristics and can handle high temperature and low temperature fluids.

Wherein, the support body may be in various forms, for example, may have a rectangular shape, a trapezoidal shape, a stepped cross section, or the like, and Not limited to this. In some embodiments of the embodiment, the support body may be a boss or the like formed to protrude upward from the edge portion of the through hole, and an upper end of the support is connected to the fluid blocking portion.

Filter chips using the aforementioned design can be (ultrasonic) cleaned, used multiple times, and still maintain good fluid handling capabilities.

When the fluid is processed by the filter chip, the fluid containing the impurity particles enters the micro/nano-array array, wherein particles having a particle diameter larger than a certain value (or some fluid-incompatible droplets such as air) The water droplets in the water or the water droplets in the oil are blocked outside the array of micro/nano-sheets, after which the fluid reaches the entrance of the through-hole 104 via the trench between the micro/nano-chips and then enters the through-hole 104, thereby achieving Purification of the fluid and/or enrichment recovery of the desired particles (droplets).

Referring to FIG. 18 to FIG. 19 again, in some specific applications of the embodiment, the micro/nano piece may have a thickness of 1 nm to 50 μm and a height of 50 nm to 200 μm between adjacent micro/nano sheets. The groove width may be from 1 nm to 50 μm. The through hole 804 may have a diameter of 1 μm to 1 mm. The thickness of the substrate may be 1 μm or more. The fluid blocking portion may have a thickness of 0.5 μm to 200 μm.

Further, in this embodiment, the shape of the aforementioned through hole 804 and the fluid blocking portion 802 (especially the shape of the longitudinal or lateral cross section) may be various, and may be, for example, a circle, a square, a rectangle, or the like.

Referring to FIG. 20, preferably, in a preferred embodiment of the present application, a filter chip includes a base 901 having opposite first and second surfaces, and the base A plurality of through holes 904 as fluid passages are disposed on the 901, and the first surface is provided with a plurality of arrays of micro/nano sheets 903 extending continuously in the lateral direction, wherein the micro/nano sheets are formed with fluids for passage therethrough. a groove having an opening having a diameter greater than 0 but smaller than a particle size of selected particles mixed in the fluid to be treated, wherein a plurality of micro/nano plates are directly passed through the through hole 904 Thus, the micro/nanosheets are mated with the substrate to form a fluid passage that communicates with the through holes 904, and the fluid to be treated can only enter the through holes 904 through the fluid passages.

Further, in this embodiment, the fluid blocking portion 902 can also be connected to the micro/nano-sheet array. The fluid blocking portion 902 is disposed above the fluid inlet of the through-hole 904, so that the fluid to be processed cannot be bypassed. The aforementioned micro/nanochip array directly enters the through hole 904.

The structures, arrangement forms, materials, and the like of the substrate, the micro/nano-sheet array, the fluid barrier, the through-hole, the support, and the like used in this embodiment may be the same as or similar to those described above, and thus will not be described herein.

In this embodiment of the present application, the filter chip may have a structure similar to that of the foregoing embodiment, except that more than one, for example, symmetric or asymmetric arrangement may be disposed on the through hole. The support beam can also increase the support of the fluid blocking portion by the support beam, thereby achieving a more stable and stable cooperation between the fluid blocking portion and the base body, and can be effectively distributed to the fluid blocking portion and the base body. The inter-micro/nano-sheet array is protected from problems such as collapse/damage of the micro/nano-sheet due to extrusion of the micro/nanowire array by the fluid barrier and/or the substrate after being subjected to an external force.

The structures, arrangement forms, materials, and the like of the substrate, the micro/nanowire array, the fluid barrier, the through holes, and the like used in this embodiment may be the same as or similar to those described above, and thus will not be described herein.

Referring to FIG. 21, in a preferred embodiment of the present application, a filter chip may have a structure similar to any of the foregoing embodiments, except that the surface of the nanosheet 1103 and the substrate 1101 are A photocatalytic material layer 1105 is also disposed on a surface. When the fluid is treated by the filter chip including the photocatalytic material layer 1105, if it is supplemented with ultraviolet light or the like, some organic pollutants in the fluid may be photocatalyzed to achieve multiple purification of the fluid.

Wherein, the thickness of the photocatalytic material layer 1105 can be controlled at the nanometer level to minimize its influence on the fluid flux of the filter chip.

Referring to FIG. 22, preferably, in a preferred embodiment of the present application, a filter chip may have a structure similar to any of the foregoing embodiments, except that the surface of the nanosheet 1203 and First table of the base 1201 An antibacterial material layer 1205 is also disposed on the surface. When the fluid is treated with the filter chip including the antimicrobial material layer 1205, bacteria, viruses, and the like in the fluid can be synchronously killed during the processing of the fluid to achieve multiple purification of the fluid.

Wherein, the thickness of the antibacterial material layer 1205 can be controlled at the nanometer level to minimize its influence on the fluid flux of the filter chip.

In a preferred embodiment of the present application, a preparation process of a filter chip may include the following steps:

S2: etching a first surface of the substrate to form a plurality of laterally extending vertical nanosheets spaced apart from each other on the first surface of the substrate, and then removing the first photoresist mask mold;

S9: removing the etching mask and the sacrificial material filled between the vertical nanosheets to prepare a filter chip.

Referring to FIG. 23, in a preferred embodiment of the present application, a filter chip is mainly used for processing a fluid mixed with selected particles, and includes a base 1300 having opposite phases. A surface 1301 and a second surface 1302, and a plurality of through holes 1303 as fluid passages are distributed on the base 1300. A plurality of micro/nano wires/tubes 1400 (ie, any one or more of microwires, microtubes, nanowires, nanotubes), in particular nanowires/tubes (nanowires and/or), are distributed within any of the vias 1303 nanotube). One end of the micro/nano wire/tube 1400 is fixed to the hole wall of the through hole 1303, and the other end extends in the radial direction of the through hole. These micro/nano wires/tubes 2 are aggregated into a porous structure in a mutually intersecting form. The pores within the porous structure have a diameter greater than zero but less than the particle size of the selected particles.

Referring to FIG. 24 again, the porous structure is a grid structure distributed in the through hole 1303 as viewed from a plan view.

Wherein, since the micro/nano wires/tubes 1400 have a large aspect ratio (or aspect ratio), the micro/nano wires/tubes 1400 can be densely arranged in the through holes, and by adjusting the micro The distribution density, length, etc. of the nanowire/tube 1400 can be used to remove particles of different particle size ranges in the fluid 1500, in particular, when the nanowires/tubes are used, by using these nanowires/tubes The pores formed by the cross-section are controlled at the nanometer level, which not only removes very small particles in the fluid, but also minimizes the diameter of the nanowire/tube itself, and also controls the resistance to fluid at a very low level. The large fluid flux is far superior to existing porous membranes, lateral flow channel based filter chips, and the like.

Wherein, the base body 1300 can have a large thickness, thereby further enhancing the mechanical strength of the filter chip, so that the filter chip can withstand pressure, bending, collision, impact resistance, and thus can be used in various It can be applied to the environment without damage, for example, it can be applied to the treatment of high-pressure, high-speed fluids, which is unmatched by existing porous membranes.

In particular, since the micro/nano wires/tubes 1400 are all distributed in the through holes 1303, the micro/nano wires/tubes 1400 are actually protected by the substrate 1300, and further, even if the filter chip is under pressure Etc., these micro/nano wires/tubes 1400 are not damaged.

Wherein, the material selection range of each part (1301, 1302, 1303) of the filter chip is diverse, and may be none The machine material may also be an organic material such as a metal, a ceramic, a polymer, or the like. When these parts are all selected to use inorganic materials, the filter chip also has temperature-resistant characteristics and can handle high temperature and low temperature fluids.

When the fluid is processed by the filter chip, the fluid containing the impurity particles enters the porous structure, wherein the particles having a particle diameter larger than a certain value (or some droplets incompatible with the fluid, such as water droplets in the air) The water droplets in the oil are blocked outside the aforementioned porous structure, after which the fluid flows out of the through holes 1303 to effect purification of the fluid and/or enrichment recovery of the desired particles (droplets).

When the fluid is treated with a filter chip containing a layer of a photocatalytic material, if it is supplemented with ultraviolet light or the like, the fluid may be Some organic pollutants in the process are photocatalyticly degraded to achieve multiple purification of the fluid.

Wherein, in order to facilitate light penetration, some or all of the components in the filter chip may be made of a transparent material.

By adopting such a structure and a distributed shape of the erected nanowires, a plurality of erected nanowires can be densely arranged (the proportion of the bulge itself in a unit area is small), which facilitates processing of minute particles in the fluid while also The filter chip is given a larger fluid flux (the pores between the erected nanowires are larger than the erected nanowires themselves).

In particular, if referring to a solution known in the art, the arrangement density of the above-mentioned erected nanowires and the like are appropriately designed to form a nanowire array, and a superhydrophobic structure and a super oleophobic structure can be formed. The particles in the fluid are removed and the blocked particles are also unable to accumulate on the surface of the filter chip by self-cleaning.

As one of the preferred embodiments of this embodiment, a fluid blocking portion may also be disposed on the aforementioned upright nanowires, The fluid blocking portion may have a surface (which may be named as a third surface) disposed opposite to the first surface of the base body, and one end of the plurality of upright linear bodies is fixedly disposed on the first surface of the base body, and the other end Attached to the third surface of the fluid barrier, wherein the distance between adjacent upright linear bodies is greater than zero but less than the particle size of the selected particles.

For example, as shown in FIG. 25, in a preferred embodiment of the present application, a process for preparing a filter chip may include the following steps:

S2: etching a first surface of the substrate by using the photoresist mask to form a first through the substrate a plurality of through holes having a surface and a second surface opposite the first surface for acting as a fluid passage;

S6: dicing, encapsulating, and manufacturing a filter chip.

For example, in the foregoing steps, the fluid passage or the like can be etched by means known in the art, such as RIE, ICP, wet etching, electrochemical etching, or the like.

It should be understood that the above embodiments are merely illustrative of the technical concept and the features of the present application, and the purpose of the present invention is to enable those skilled in the art to understand the contents of the present application and to implement it, and the scope of the present application is not limited thereto. Equivalent changes or modifications made in accordance with the spirit of the present application are intended to be included within the scope of the present application.

Claims

A fluid treatment device characterized by comprising:

a substrate having a fluid passage, and,

a fluid treatment mechanism for treating the fluid to be treated when the fluid to be treated mixed with the selected particles flows through the fluid passage or before flowing through the fluid passage;

The fluid processing mechanism is distributed on the first surface of the substrate or inside the fluid channel and has a fluid processing microstructure, wherein the diameter of the opening for fluid passage in the fluid processing microstructure is greater than 0 but less than the selected The particle size of the particles.
A fluid treatment device characterized by comprising:

a base having a first fluid passage having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid passage being distributed on a first surface of the base;

a plurality of protrusions spaced apart from each other, the protrusions extending continuously on the first surface of the base body in a lateral direction, a lower portion fixedly disposed on the first surface of the base body, and an upper portion having a cap extending continuously in the lateral direction a shape-shaped structure, the opposite sides of the hat-shaped structure are laterally extended, and an opening portion through which the fluid can pass is formed between the adjacent hat-shaped structures, and the diameter of the opening portion is greater than 0 but less than the mixed a particle size of the selected particles in the fluid to be treated, wherein at least two of the raised portions are respectively disposed adjacent to opposite sides of the fluid inlet of the first fluid passage, and at least one The raised portion passes directly from the fluid inlet of the first fluid passage, thereby engaging a plurality of hat-shaped structures, a plurality of projections and the base body to form a second fluid in communication with the first fluid passage The passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.
A fluid treatment device according to claim 2 wherein at least two of said projections pass directly through the fluid inlet of said first fluid passage.
The fluid processing apparatus according to claim 2, wherein said plurality of projections are distributed in parallel on the first surface of said base.
The fluid treatment device according to claim 2, wherein said cap-shaped structure is integrally provided with the boss portion; and/or said cap-shaped structure has an inverted trapezoidal cross-sectional structure.
The fluid processing apparatus according to any one of claims 2 to 5, wherein the opening formed between the adjacent hat-shaped structures has a diameter of 1 nm to 50 μm; and/or the hat-shaped structure The height is 50 nm to 200 μm.
The fluid processing apparatus according to any one of claims 2 to 5, wherein a distance between adjacent convex portions is 0.1 μm to 100 μm; and/or the height of the convex portion is 0.1 μm ～400 μm and a width of 0.1 μm to 100 μm.
A fluid treatment device according to any one of claims 2 to 5, wherein said first fluid passage The pore diameter is 1 μm to 1 mm; and/or the thickness of the substrate is 1 μm or more.
The fluid processing apparatus according to any one of claims 2 to 5, wherein a surface of at least one of the convex portion, the hat-shaped structure and the base body is further provided with a functional material layer, The material of the functional material layer comprises a photocatalytic material or an antimicrobial material; and/or at least a portion of at least one of the raised portion, the hat-shaped structure and the substrate is a transparent structure.
A method of preparing a fluid processing apparatus according to any one of claims 2-9, comprising:

Providing a substrate having a first surface and a second surface opposite the first surface;

Forming, on a first surface of the substrate, a plurality of protrusions spaced apart from each other, the protrusions extending continuously on a first surface of the substrate in a lateral direction, and a lower portion of the substrate being fixedly disposed on the substrate a surface

Processing a second surface of the substrate to form a first fluid passage through the substrate, and distributing a fluid inlet of the first fluid passage to a first surface of the substrate, and causing at least two The raised portions are respectively disposed adjacent to opposite sides of the fluid inlet of the first fluid passage and the at least one of the raised portions directly passes through the fluid inlet of the first fluid passage;

Forming a hat-shaped structure continuously extending in a lateral direction at an upper portion of the convex portion, and laterally extending opposite sides of the opposite side of the hat-shaped structure, and forming an adjacent between the adjacent hat-shaped structures An opening through which the fluid passes, the opening having a diameter greater than 0 but smaller than the particle size of the selected particles mixed in the fluid to be treated, thereby cooperating between the plurality of cap structures, the plurality of projections and the substrate A second fluid passage is formed and the fluid to be treated can only enter the first fluid passage through the second fluid passage.
The preparation method according to claim 10, comprising:

Forming a patterned first mask on the first surface of the substrate, and etching the first surface of the substrate to form a plurality of spaced apart ones on the first surface of the substrate a raised portion, after which the first mask is removed;

Forming a second mask on the second surface of the substrate, and etching the second surface of the substrate until a first fluid passage is formed through the substrate, and then removing the Second mask;

Forming a hat-shaped structure on each of the plurality of protrusions at least one of evaporating, depositing, and growing, and laterally extending the opposite sides of the hat-shaped structure, and The opening portion is formed between adjacent hat-shaped structures.
A fluid treatment device characterized by comprising:

a base having a first fluid passage having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid passage being distributed on a first surface of the base;

a porous structure formed by intersecting a plurality of linear bodies to form a second fluid passage with the first surface of the base body, wherein the plurality of linear bodies are fixedly connected to the base body at one end, and the porous structure has a hole a diameter greater than 0 but less than the particle size of the selected particles mixed in the fluid to be treated, and the fluid to be treated can only pass through the second fluid The road enters the first fluid passage.
The fluid processing apparatus according to claim 12, wherein one end of said plurality of linear bodies is fixedly coupled to said first surface of said base body and distributed around said fluid inlet of said first fluid passage; And/or, the fluid processing apparatus further includes a plurality of protrusions spaced apart from each other, the protrusions being fixedly disposed on the first surface of the base body and laterally on the first surface of the base body Continuously extending upwardly, wherein at least two convex portions are respectively disposed adjacent to opposite sides of the fluid inlet of the first fluid passage, and at least one convex portion is directly from the fluid inlet of the first fluid passage Two or more linear bodies are fixedly connected to the convex portion.
A fluid processing apparatus according to claim 13, wherein a plurality of linear bodies connected to a convex portion and a plurality of linear bodies connected to the other convex portion adjacent to said convex portion are mutually And/or, the plurality of raised portions are distributed in parallel on the first surface of the base; and/or the shape of the raised portion includes an elongated strip or a sheet; and/or The plurality of protrusions are evenly distributed or non-uniformly distributed on the first surface of the substrate; and/or the protrusions have a width of 0.1 μm to 100 μm and a height of 0.1 μm to 400 μm; and/or The distance between adjacent convex portions is from 0.1 μm to 100 μm.
The fluid processing apparatus according to any one of claims 13 to 14, wherein the surface of the convex portion is further provided with a functional material layer, and the material of the functional material layer comprises a photocatalytic material or an antibacterial material; Or at least a portion of the substrate, the plurality of linear bodies, and the plurality of raised portions are transparent structures.
The fluid processing apparatus according to any one of claims 12 to 14, wherein the linear body has a diameter of 1 nm to 50 μm; and/or one end of any linear body and adjacent to the linear body The distance between one end of the other linear body is 1 nm to 50 μm; and/or the length of the linear body is 50 nm to 200 μm; and/or at least the photocatalytic material or the antibacterial material is further distributed on the surface of the linear body; And/or at least a portion of at least one of the substrate and the plurality of linear bodies is a transparent structure.
A fluid processing apparatus according to any one of claims 12 to 14, wherein the linear body is linear.
A fluid treatment device according to claim 17, comprising a plurality of beams distributed in parallel on a first surface of said substrate, said beams extending continuously in a lateral direction on a first surface of said substrate, wherein at least two The beams are respectively disposed adjacent to opposite sides of the fluid inlet of the first fluid passage, at least one of the beams directly passing through the fluid inlet of the first fluid passage; and any of the beams are distributed a plurality of linear bodies, one end of at least a portion of the plurality of linear bodies being fixed to the surface of the beam, the other end extending obliquely away from the direction of the beam and/or first parallel to the substrate The surface of the surface extends continuously and intersects a plurality of linear bodies distributed on another beam adjacent to either of the beams to form the porous structure.
The fluid treatment device of claim 18 wherein at least two beams pass directly over the fluid inlet of said first fluid passage.
The fluid processing apparatus according to claim 17, wherein the linear body comprises carbon nanowires, carbon nanotubes, ZnO nanowires, GaN nanowires, TiO 2 nanowires, Ag nanowires, and Au nanowires. Any one or a combination of two or more.
The fluid treatment device according to claim 12, wherein said fluid inlet of said first fluid passage has a regular or irregular shape, said regular shape comprising a polygon, a circle or an ellipse; and/or said The first fluid passage has a pore diameter of 1 μm to 1 mm; and/or the base has a thickness of 1 μm or more.
A fluid treatment device characterized by comprising:

a substrate having a first fluid passage having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid passage being distributed in a first region of the first surface of the substrate;

a fluid blocking portion having a second surface disposed opposite the first surface of the base body for preventing a fluid inlet of the fluid to be treated from directly entering the first fluid passage;

a plurality of raised portions spaced apart from each other, the convex portion is fixedly disposed at one end in a second region of the first surface of the base body, and the other end is fixedly connected to the second surface of the fluid blocking portion, wherein adjacent The distance between the raised portions is greater than zero but less than the particle size of the selected particles that are intermingled with the fluid to be treated, the second region of the first surface of the substrate being contiguous with the first region, such that the plurality of convexities The starting portion, the fluid blocking portion and the base body cooperate to form a second fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.
A fluid treatment device according to claim 22, wherein said plurality of projections are disposed around a fluid inlet of said first fluid passage; and/or, in a third region of said first surface of said base Also disposed at intervals are a plurality of raised portions, the second region being disposed between the third region and the first region; and/or the first region and the second region of the first surface of the substrate are distributed The fluid blocking portion is within an orthographic projection on the first surface of the substrate; and/or the fluid processing device further includes at least one support body, the support body having one end fixedly connected to the base body and the other end being The fluid blocking portion is fixedly coupled.
A fluid treatment device according to claim 23, wherein a third region of the first surface of the substrate is disposed around the second region; and/or the fluid treatment device comprises two or more a support body, and the two or more support bodies are symmetrically distributed around the fluid inlet of the first fluid passage.
The fluid processing apparatus according to claim 22, wherein: the fluid inlet of the first fluid passage is provided with one or more support beams, and the support beam is fixedly connected to the fluid blocking portion; and/or The raised portion is any one of a linear, columnar, sheet, tubular, tapered, and frustum-like structure that is standing upright; and/or the raised portion The transverse section has a regular or irregular shape, the regular shape includes a polygon, a circle or an ellipse; and/or the plurality of protrusions are evenly distributed or non-uniformly distributed on the first surface of the substrate; And/or, the fluid inlet of the first fluid channel has a regular or irregular shape, the regular shape comprising a polygon, a circle or an ellipse.
The fluid processing apparatus according to claim 25, wherein said convex portion is a linear protrusion having an aspect ratio of 4:1 to 200000:1; and/or between adjacent convex portions The ratio of the distance to the length of the raised portion is 1:4 to 1:200,000.
The fluid processing apparatus according to claim 26, wherein said convex portion is an upright microwire or nanowire having a diameter of 1 nm to 50 μm and a length of 50 nm to 200 μm between adjacent convex portions. The distance is 1 nm to 50 μm.
A fluid processing apparatus according to claim 22 or 27, wherein the plurality of projections distributed in the third region of the first surface of the substrate are arranged to form a micron-scale having superhydrophobic or superoleophobic properties. Or nanoscale array structure.
The fluid processing apparatus according to claim 22, wherein said first fluid passage has a pore diameter of from 1 μm to 1 mm; and/or said base has a thickness of 1 μm or more; and/or said fluid blocking portion a thickness of 0.5 μm to 200 μm; and/or the surface of the raised portion is further provided with a layer of functional material, the material of the functional material layer comprising a photocatalytic material or an antibacterial material; and/or, in the fluid processing device At least a portion of at least some of the components are transparent structures.
A method of preparing a fluid processing apparatus according to any one of claims 22 to 29, comprising:

Providing a substrate having a first surface and a third surface opposite the first surface;

Processing the first surface of the substrate to form a plurality of protrusions spaced apart from each other on the first surface of the substrate, or growing on the first surface of the substrate to form a space spaced apart from each other a plurality of raised portions, wherein a distance between adjacent raised portions is greater than zero but less than a particle size of selected particles mixed in the fluid to be treated;

Providing a fluid barrier having a second surface disposed opposite the first surface of the substrate on a first surface of the substrate and at least distributed in a second region of the first surface of the substrate a plurality of protrusions fixedly connected to the second surface of the fluid blocking portion;

Processing a third surface of the substrate to form a first fluid passage through the substrate, the fluid inlet of the first fluid passage being distributed in a first region of the first surface of the substrate, a second region of the first surface of the substrate abuts the first region to form a plurality of protrusions, a fluid barrier, and a substrate disposed in a second region of the first surface of the substrate The second fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.
The preparation method according to claim 30, comprising:

Forming a patterned first photoresist mask on the first surface of the substrate, and etching the first surface of the substrate to form a space on the first surface of the substrate a plurality of raised portions, after which the first photoresist mask is removed;

Coating a soluble or corrodible organic and/or inorganic substance on the first surface of the substrate, and filling the gap between the plurality of protrusions with an organic substance and/or an inorganic substance to form a sacrificial layer;

Providing a second photoresist mask on the sacrificial layer, and etching the sacrificial layer to expose at least a top of the plurality of protrusions distributed in the second region of the first surface of the substrate And then removing the second photoresist mask;

Providing a third mask on the first surface of the substrate, and exposing a region on the first surface of the substrate corresponding to the fluid blocking portion, and then depositing to form a fluid blocking portion, and then removing the a third mask;

Forming a fourth photoresist mask on the third surface of the substrate, and etching the third surface of the substrate until the sacrificial material filled between the adjacent protrusions is exposed Forming a slot in the third surface of the substrate, the slot being located corresponding to the first area of the first surface of the substrate, the second area of the first surface of the substrate surrounding The first area setting,

Removing the fourth photoresist mask and the sacrificial material filled between the plurality of protrusions to form the first fluid channel on the substrate.
The preparation method according to claim 30 or 31, wherein the plurality of protrusions are a plurality of vertical nano-pillars or vertical nanowires arranged in an array.
A fluid treatment device characterized by comprising:

a substrate having a first fluid passage having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid passage being distributed in a first region of the first surface of the substrate;

a fluid blocking portion having a second surface disposed opposite the first surface of the base body for preventing a fluid inlet of the fluid to be treated from directly entering the first fluid passage;

a plurality of vertical nano-linear bodies distributed in a second region of the first surface of the substrate and spaced apart from each other, a second region of the first surface of the substrate being disposed around the first region, Two ends of the nano-linear body are respectively fixedly connected to the first surface of the base body and the second surface of the fluid blocking portion, wherein a distance between adjacent nano-linear bodies is greater than 0 but less than mixed with the fluid to be treated a particle size of the selected particles, such that the plurality of nanowires, the fluid barrier and the substrate cooperate to form a second fluid channel, and the fluid to be treated can only enter through the second fluid channel A fluid passage.
The fluid processing apparatus according to claim 33, wherein a plurality of nano-linear bodies spaced apart from each other are disposed in the third region of the first surface of the substrate, and the first surface of the substrate is Three areas surround the said The second area is set.
A fluid treatment device according to claim 33 or 34, wherein said vertical nanowire body is grown in situ on the first surface of said substrate.
The fluid processing apparatus according to claim 33 or 34, wherein the nano-linear body comprises any one of a nanowire, a nanocolumn, and a nanotube; and/or the plurality of nanowires The body is uniformly or non-uniformly distributed on the first surface of the substrate; and/or the nano-linear body has an aspect ratio of 4:1 to 200000:1; and/or adjacent nano-linear bodies The ratio of the distance between the distance to the length of the nano-linear body is 1:4 to 1:200,000; and/or the fluid inlet of the first fluid channel has a regular or irregular shape, the regular shape including a polygon , round or oval.
The fluid processing apparatus according to claim 36, wherein said nano-linear body has a diameter of 1 nm to 50 μm, a length of 50 nm to 200 μm, and a distance between adjacent nano-linear bodies of 1 nm to 50 μm; Or, the nano-linear body includes any one of carbon nanotubes, silicon nanowires, silver nanowires, gold nanowires, zinc oxide nanowires, and gallium nitride nanowires.
The fluid processing apparatus according to claim 34, wherein the plurality of nanowire-like bodies distributed in the third region of the first surface of the substrate form an array structure having superhydrophobic or superoleophobic properties.
A fluid treatment device according to claim 33, wherein said fluid treatment device further comprises at least one support body, one end of said support body being fixedly coupled to said base body and the other end being fixedly coupled to said fluid blocking portion.
A fluid treatment device according to claim 39, wherein said fluid treatment device comprises two or more said support bodies, and said two or more said support bodies are symmetrically distributed over said first fluid passageway Around the fluid inlet.
The fluid treatment device according to claim 33, wherein: the fluid inlet of the first fluid passage is provided with one or more support beams, and the support beam is fixedly connected to the fluid blocking portion; and/or The first fluid channel has a pore diameter of 1 μm to 1 mm; and/or the substrate has a thickness of 1 μm or more; and/or the fluid barrier portion has a thickness of 0.5 μm to 200 μm; and/or the nanowire The surface of the body is further provided with a layer of functional material, the material of which comprises a photocatalytic material or an antimicrobial material; and/or at least part of the assembly of the fluid treatment device is at least partially transparent.
The method of preparing a fluid processing apparatus according to any one of claims 33 to 41, characterized by comprising:

Providing a substrate having a first surface and a third surface opposite the first surface;

Growing on the first surface of the substrate to form a plurality of vertical nano-linear bodies spaced apart from each other, wherein a distance between adjacent nano-linear bodies is greater than 0 but less than selected particles mixed in the fluid to be treated Particle size

Providing a fluid barrier having a second surface disposed opposite the first surface of the substrate on a first surface of the substrate and at least distributed in a second region of the first surface of the substrate a plurality of nano-linear bodies fixedly connected to the second surface of the fluid blocking portion;

Processing a third surface of the substrate to form a first fluid passage through the substrate, the fluid inlet of the first fluid passage being distributed in a first region of the first surface of the substrate, a second region of the first surface of the substrate disposed around the first region such that a plurality of nanowires, fluid barriers, and substrates are distributed in a second region of the first surface of the substrate The interfitting forms a second fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.
The preparation method according to claim 42, comprising:

Growing on the first surface of the substrate to form a plurality of nano-linear bodies spaced apart from each other;

Coating a soluble or corrodible organic and/or inorganic substance on the first surface of the substrate, and filling the gap between the plurality of nano-linear bodies with an organic substance and/or an inorganic substance to form a sacrificial layer;

Providing a first photoresist mask on the sacrificial layer, and etching the sacrificial layer to at least top a plurality of nano-linear bodies distributed in a second region of the first surface of the substrate Exposing, then removing the first photoresist mask;

Providing a second mask on the first surface of the substrate, and exposing a region on the first surface of the substrate corresponding to the fluid blocking portion, and then depositing to form a fluid blocking portion, and then removing the Said second mask;

Forming a patterned third photoresist mask on the third surface of the substrate, and etching the third surface of the substrate until the sacrifice between the adjacent nanowires is exposed a material to form a slot in a third surface of the substrate, the slot being located corresponding to a first region of the first surface of the substrate, the second region of the first surface of the substrate Surrounding the first area setting,

The third photoresist mask and the sacrificial material filled between the plurality of nanowires are removed, and the first fluid channel is formed on the substrate.
A fluid treatment device characterized by comprising:

a substrate having a first fluid passage having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid passage being distributed in a first region of the first surface of the substrate;

a fluid blocking portion having a second surface disposed opposite the first surface of the base body for preventing a fluid inlet of the fluid to be treated from directly entering the first fluid passage;

a plurality of protrusions extending continuously in a second region of the first surface of the substrate in a lateral direction, wherein a groove through which a fluid can pass is formed between adjacent protrusions, the groove The opening of the opening has a diameter greater than 0 but less than the particle size of the selected particles mixed in the fluid to be treated, and the upper end of the raised portion is sealingly connected to the first surface of the base, a partial region of the lower end is sealingly coupled to the second surface of the fluid blocking portion such that more than one groove, fluid barrier between the plurality of projections cooperates with the base to form a second fluid passage, and the to-be-processed Fluid can only enter the first fluid passage through the second fluid passage.
A fluid treatment device according to claim 44, wherein a second region of the first surface of the base is disposed around the first region; and/or a partial region of the second end of the projection and the The fluid inlets of the first fluid passage are both distributed in the orthographic projection formed by the fluid blocking portion on the first surface of the substrate.
A fluid processing apparatus according to claim 44, wherein said convex portion has a shape including an elongated strip or a sheet; and/or said plurality of convex portions are uniformly distributed or non-uniformly distributed On the first surface of the substrate; and/or, the fluid inlet of the first fluid channel has a regular or irregular shape, the regular shape comprising a polygon, a circle or an ellipse.
The fluid processing apparatus according to claim 44, wherein said convex portion has a width of 1 nm to 50 μm and a height of 50 nm to 200 μm; and/or a groove opening formed between adjacent convex portions The size of the portion is 1 nm to 50 μm; and/or the pore diameter of the first fluid passage is 1 μm to 1 mm; and/or the thickness of the substrate is 1 μm or more; and/or the thickness of the fluid barrier portion is 0.5 μm～200 μm; and/or, the surface of the convex portion is further provided with a functional material layer, the material of the functional material layer comprises a photocatalytic material or an antibacterial material; and/or the substrate, the fluid blocking portion and the convex portion At least a portion of at least one of the risers is a transparent structure.
A fluid treatment device characterized by comprising:

a base having a first fluid passage having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid passage being distributed on a first surface of the base;

a plurality of protrusions spaced apart from each other, the protrusions being fixedly disposed on the first surface of the base body and extending continuously on the first surface of the base body in a lateral direction, wherein between the adjacent protrusions Forming a groove through which the fluid can pass, the opening of the groove having a diameter greater than 0 but smaller than the particle size of the selected particles mixed in the fluid to be treated, and wherein at least two of the raised portions are respectively Two opposite sides of the opposite sides of the fluid inlet of the first fluid passage are disposed adjacent to each other, and at least one convex portion directly passes through the fluid inlet of the first fluid passage, so that the plurality of convex portions and the base body The interfitting forms a second fluid passage in communication with the first fluid passage, and the fluid to be treated can only enter the first fluid passage through the second fluid passage.
The fluid treatment device of claim 48, wherein the fluid treatment device further comprises:

a fluid blocking portion having a second surface disposed opposite the first surface of the substrate, the fluid inlet of the first fluid channel being distributed within an orthographic projection formed by the fluid blocking portion on the first surface of the substrate The plurality of raised portions have opposite first and second ends, the first end being sealingly coupled to the first surface of the base, and the second end being partially The region is sealingly coupled to the second surface of the obscuring portion.
A fluid treatment device according to claim 48, wherein said plurality of projections are distributed in parallel on the first surface of said base.
The fluid processing apparatus according to any one of claims 48 to 50, wherein an opening of the groove formed between the adjacent convex portions has a size of 1 nm to 50 μm; and/or said A fluid passage has a pore diameter of 1 μm to 1 mm; and/or the base body has a thickness of 1 μm or more; and/or the fluid barrier portion has a thickness of 0.5 μm to 200 μm.
The fluid processing apparatus according to any one of claims 48 to 50, wherein the surface of the convex portion is further provided with a layer of a functional material, and the material of the functional material layer comprises a photocatalytic material or an antibacterial material.
The fluid treatment device according to claim 49, wherein at least a part of at least one of the base body, the fluid blocking portion, and the convex portion is a transparent structure.
A fluid treatment device characterized by comprising:

a substrate having a fluid passage, and

An aggregate of a plurality of linear bodies for treating a fluid mixed with the selected particles flowing through the fluid passage;

The aggregates are distributed within the fluid channel and have a porous structure, the pores within the porous structure having a diameter greater than zero but less than the particle size of the selected particles.
A fluid processing apparatus according to claim 54, wherein one end of said linear body is fixedly coupled to an inner wall of said fluid passage, and the other end extends in a radial direction of said fluid passage; and/or said plural The root linear bodies cross each other or are interwoven with each other to form the porous structure; or, the plurality of linear bodies are spaced apart from each other and arranged in parallel to form the porous structure.
A fluid treatment device according to claim 54, wherein said base body has opposite first and second surfaces, and a fluid inlet of said fluid passage is distributed over said first surface of said base.
A fluid processing apparatus according to claim 56, wherein said first surface of said base body is further distributed with a plurality of upright linear bodies spaced apart from each other, said plurality of upright linear bodies being disposed around said fluid passage.
A fluid treatment device according to claim 57, further comprising a fluid blocking portion having a third surface disposed opposite to the first surface of said base body, and said plurality of erected linear body ends The first surface is fixedly disposed on the first surface of the substrate, and the other end is fixedly connected to the third surface of the fluid blocking portion, wherein a distance between adjacent vertical linear bodies is greater than 0 but smaller than a particle diameter of the selected particles.
40. The fluid treatment device of claim 58 wherein the fluid inlet of the fluid passageway and the plurality of upright linear bodies are distributed within an orthographic projection of the fluid barrier portion on a first surface of the substrate.
A fluid treatment device according to claim 57, wherein said upright linear body has an aspect ratio of 4: 1 to 200000:1; and/or, the ratio of the distance between adjacent upright linear bodies to the length of the upright linear body is 1:4 to 1:200,000; and/or the diameter of the linear body is 1 nm ~500μm.
A fluid treatment device according to claim 54, wherein said linear body is selected from the group consisting of nanowires or nanotubes.
The fluid processing apparatus according to any one of claims 54 to 61, wherein at least a photocatalytic material or an antibacterial material is further distributed on a surface of the linear body; and/or the linear body comprises carbon nanowires Any one or a combination of two or more of carbon nanotubes, ZnO nanowires, GaN nanowires, TiO 2 nanowires, Ag nanowires, and Au nanowires.
The fluid processing apparatus according to any one of claims 54 to 61, wherein the first surface of the substrate is further provided with a functional material layer, and the material of the functional material layer comprises a photocatalytic material or an antibacterial material; And/or at least a portion of the fluid treatment device has a transparent structure; and/or the fluid inlet of the fluid passage has a regular or irregular shape, the regular shape comprising a polygon, a circle or an ellipse; Or, the fluid passage has a pore diameter of 1 μm to 1 mm; and/or the base has a thickness of 1 μm or more.
A nasal plug respirator characterized by comprising:

a nasal plug and a filter chip, at least one end of the nasal plug can be inserted into a nasal cavity of a user, and the nasal plug includes a gas passage communicating with the nasal cavity, and the filter chip is used to filter out the mixed airflow to be treated, a particle having a particle diameter larger than a set value, wherein the gas to be treated flows into the gas passage in the nasal plug after flowing through the filter chip;

A filter chip protection structure is used to protect the filter chip.
The nasal plug respirator according to claim 64, wherein the filter chip protection structure comprises a first fixed hard filter and a second fixed hard filter, and the filter chip is disposed at the first fixed Between the hard filter and the second fixed hard filter;

And/or the nasal plug respirator further includes a first filter fabric and/or a second filter fabric, the first filter fabric being distributed between the nasal plug and the filter chip, the filter chip being distributed in the second filter Between the fabric and the stuffy nose;

Preferably, the nasal plug respirator further comprises a first detachable hard filter and/or a second detachable hard filter, and the first detachable hard filter is fixed to the first filter fabric. Connecting, the second detachable hard filter mesh is fixedly connected to the second filter fabric;

And/or, the nasal plug adopts a waist drum type nasal plug; and/or the nasal plug type respirator further includes a housing having an open end, the nasal plug is detachably mounted at one end of the housing, and the filter chip It is housed in the housing.
A nasal plug respirator according to claim 64, wherein said filter chip comprises:

a base having a first fluid passage, the first fluid passage having an air inlet and an air outlet, the air inlet of the first fluid passage being distributed on the first surface of the base;

a plurality of protrusions spaced apart from each other, the protrusions extending continuously on the first surface of the base body in a lateral direction, a lower portion fixedly disposed on the first surface of the base body, and an upper portion having a cap extending continuously in the lateral direction a shape-shaped structure, the opposite sides of the hat-shaped structure are laterally extended, and an opening portion through which air can pass is formed between adjacent hat-shaped structures, and the diameter of the opening portion is greater than 0 but less than mixed a particle size of the selected particles in the air to be treated, wherein at least two of the raised portions are respectively disposed adjacent to opposite sides of the air inlet of the first fluid passage, and at least one The raised portion directly passes through the air inlet of the first fluid passage, thereby engaging a plurality of hat-shaped structures, a plurality of protrusions and the base body to form a second fluid communicating with the first fluid passage a passage, and the air to be treated can only enter the first fluid passage through the second fluid passage;

Preferably, at least two of said raised portions pass directly over the air inlet of said first fluid passage; and/or said plurality of raised portions are distributed in parallel on said first surface of said base body; Or, the cap-shaped structure is integrally provided with the boss; and/or the cap-shaped structure has an inverted trapezoidal cross-sectional structure; and/or the opening formed between the adjacent cap-shaped structures has a diameter of 1 nm. ～50 μm; and/or, the height of the hat-shaped structure is 50 nm to 200 μm; and/or the distance between adjacent convex portions is 0.1 μm to 100 μm; and/or the height of the convex portion is 0.1 μm to 400 μm, width 0.1 μm to 100 μm; and/or, the first fluid channel has a pore diameter of 1 μm to 1 mm; and/or the substrate has a thickness of 1 μm or more; and/or at least The surface of any of the raised portion, the cap-shaped structure and the substrate is further provided with a layer of photocatalytic functional material and/or a layer of antimicrobial functional material; and/or at least one of the raised portion, the hat-shaped structure and the substrate At least part of one is a transparent structure.
A nasal plug respirator according to claim 64, wherein said filter chip comprises:

a base having a first fluid passage, the first fluid passage having an air inlet and an air outlet, the air inlet of the first fluid passage being distributed on the first surface of the base;

a porous structure formed by intersecting a plurality of linear bodies to form a second fluid passage with the first surface of the base body, wherein the plurality of linear bodies are fixedly connected to the base body at one end, and the porous structure has a hole a diameter greater than 0 but less than the particle size of the selected particles mixed in the air to be treated, and the air to be treated can only enter the first fluid passage through the second fluid passage;

Preferably, one end of the plurality of linear bodies is fixedly connected to the first surface of the base body and is distributed around the air inlet of the first fluid passage; and/or the air filter chip further includes a plurality of raised portions spaced apart from each other, the raised portion is fixedly disposed on the first surface of the base body, and extends continuously on the first surface of the base body in a lateral direction, wherein at least two raised portions are respectively respectively Arranging adjacent to opposite sides of the air inlet of the first fluid passage, at least one convex portion directly passes through the air inlet of the first fluid passage, and the convex portion is fixedly connected with two a linear body as described above; and/or a plurality of linear bodies connected to a convex portion and a plurality of linear bodies connected to the other convex portion adjacent to the convex portion; and Or, the plurality of protrusions are distributed in parallel on the substrate And/or, the shape of the raised portion includes an elongated strip or a sheet; and/or the plurality of raised portions are evenly distributed or non-uniformly distributed on the first surface of the base And/or, the raised portion has a width of 0.1 μm to 100 μm, a height of 0.1 μm to 400 μm; and/or a distance between adjacent convex portions of 0.1 μm to 100 μm; and/or The surface of the protrusion is further provided with a layer of photocatalytic functional material and/or a layer of antibacterial functional material; and/or at least at least one of the substrate, the plurality of linear bodies, and the plurality of protrusions The portion is a transparent structure; and/or the linear body has a diameter of 1 nm to 50 μm; and/or a distance between one end of one of the linear bodies and one end of another linear body adjacent to the linear body is 1 nm. 50 μm; and/or, the linear body has a length of 50 nm to 200 μm; and/or at least a photocatalytic material or an antibacterial material is further distributed on the surface of the linear body; and/or the substrate and the plurality of roots At least a portion of at least one of the linear bodies is a transparent structure; and/or the linear body is linear And/or, the air inlet of the first fluid passage has a regular or irregular shape, the regular shape includes a polygon, a circle or an ellipse; and/or the first fluid passage has a diameter of 1 μm to 1 mm; And/or, the substrate has a thickness of 1 μm or more;

Preferably, the filter chip further includes a plurality of cross beams arranged in parallel on the first surface of the base body, the cross beams continuously extending in a lateral direction on a first surface of the base body, wherein at least two cross beams respectively respectively An air inlet of a fluid passage is disposed adjacent to opposite sides of the air inlet, at least one beam directly passes through the air inlet of the first fluid passage; and any of the beams is distributed with a plurality of linear bodies, One end of at least a portion of the linear body of the plurality of linear bodies is fixed to the surface of the beam, and the other end extends obliquely away from the direction of the one of the beams and/or continuously extends on a surface parallel to the first surface of the substrate. And intersecting a plurality of linear bodies distributed on another beam adjacent to the one of the beams to form the porous structure;

Preferably, at least two beams pass directly through the air inlet of the first fluid passage;

Preferably, the linear body includes any one or a combination of two or more of carbon nanowires, carbon nanotubes, ZnO nanowires, GaN nanowires, TiO 2 nanowires, Ag nanowires, and Au nanowires.
A nasal plug respirator according to claim 64, wherein said filter chip comprises:

a base having a first fluid passage having an air inlet and an air outlet, the air inlet of the first fluid passage being distributed in a first region of the first surface of the base;

An air blocking portion having a second surface disposed opposite the first surface of the base body for blocking an air inlet of the air to be treated directly entering the first fluid passage;

a plurality of raised portions spaced apart from each other, the convex portion is fixedly disposed at one end in a second region of the first surface of the base body, and the other end is fixedly connected to the second surface of the air blocking portion, wherein adjacent The distance between the raised portions is greater than zero but less than the particle size of the selected particles that are intermingled with the air to be treated, the second region of the first surface of the substrate being contiguous with the first region, such that the plurality of convexities The second fluid passage is formed between the upper portion, the air blocking portion and the base body, and is to be treated The conditioned air can only enter the first fluid passage through the second fluid passage;

Preferably, the plurality of protrusions are disposed around the air inlet of the first fluid passage; and/or the third area of the first surface of the base body is also spaced apart from the plurality of protrusions. a second region is disposed between the third region and the first region; and/or, the first fluid channel has a pore size of 1 μm to 1 mm; and/or the substrate has a thickness of 1 μm or more; and/or The air blocking portion has a thickness of 0.5 μm to 200 μm; and/or the surface of the convex portion is further provided with a functional material layer, and the material of the functional material layer comprises a photocatalytic material or an antibacterial material; and/or At least a portion of at least a portion of the components of the air filter chip are transparent structures;

Preferably, a third area of the first surface of the base body is disposed around the second area; and/or a first area and a second area of the first surface of the base body are distributed in the air blocking portion The orthographic projection on the first surface of the substrate; and/or the air filter chip further includes at least one support body, one end of the support body is fixedly connected to the base body, and the other end is fixedly connected to the air blocking portion And/or a plurality of raised portions distributed in a third region of the first surface of the substrate are arranged to form a micro- or nano-scale array structure having superhydrophobic or superoleophobic properties;

Preferably, the air filter chip includes two or more of the support bodies, and the two or more support bodies are symmetrically distributed around the air inlet of the first fluid passage;

Preferably, the air inlet of the first fluid passage is provided with more than one support beam, the support beam is fixedly connected with the air blocking portion; and/or the convex portion is a linear or columnar column. Any one of a sheet-like, tubular, tapered, and frustum-like structure; and/or the transverse section of the raised portion has a regular or irregular shape including a polygonal shape, a circular shape, or an elliptical shape And/or, the plurality of raised portions are evenly distributed or non-uniformly distributed on the first surface of the base; and/or the air inlet of the first fluid passage has a regular or irregular shape. The regular shape includes a polygon, a circle or an ellipse; and/or the raised portion is a linear protrusion having an aspect ratio of 4:1 to 200000:1; and/or adjacent convex portions The ratio of the distance between the distance to the length of the raised portion is 1:4 to 1:20000;

Preferably, the raised portion is an upright micro-wire or nanowire having a diameter of 1 nm to 50 μm, a length of 50 nm to 200 μm, and a distance between adjacent convex portions of 1 nm to 50 μm.
A nasal plug respirator according to claim 64, wherein said filter chip comprises:

a base having a first fluid passage having an air inlet and an air outlet, the air inlet of the first fluid passage being distributed in a first region of the first surface of the base;

An air blocking portion having a second surface disposed opposite the first surface of the base body for blocking an air inlet of the air to be treated directly entering the first fluid passage;

a plurality of protrusions extending continuously in a second region of the first surface of the substrate in a lateral direction, wherein a groove through which air can pass is formed between adjacent protrusions, the groove The diameter of the opening is greater than 0 but less than mixed a particle size of the selected particles in the treated air, and an upper end of the raised portion is sealingly coupled to the first surface of the base body, and a partial portion of the lower end is sealingly coupled to the second surface of the air blocking portion, thereby The one or more grooves between the plurality of protrusions and the air blocking portion cooperate with the base body to form a second fluid passage, and the air to be treated can only enter the first fluid passage through the second fluid passage; preferably, a second region of the first surface of the base body is disposed around the first region; and/or a partial region of the second end of the raised portion and an air inlet of the first fluid passage are both distributed in the air blocking portion And within an orthographic projection formed on the first surface of the substrate; and/or, the shape of the raised portion includes an elongated strip or a sheet; and/or the plurality of raised portions are evenly distributed or non- Uniformly distributed on the first surface of the substrate; and/or the air inlet of the first fluid channel has a regular or irregular shape, the regular shape comprising a polygon, a circle or an ellipse; and/or The width of the raised portion a size of 1 nm to 50 μm and a height of 50 nm to 200 μm; and/or a size of a groove opening formed between adjacent convex portions of 1 nm to 50 μm; and/or a pore diameter of the first fluid channel of 1 μm ～1 mm; and/or, the thickness of the substrate is 1 μm or more; and/or the thickness of the air blocking portion is 0.5 μm to 200 μm; and/or the surface of the convex portion is further provided with a functional material layer. The material of the functional material layer comprises a photocatalytic material or an antibacterial material; and/or at least a part of at least one of the substrate, the air blocking portion and the convex portion is a transparent structure.
A nasal plug respirator according to claim 64, wherein said filter chip comprises:

a base having a first fluid passage, the first fluid passage having an air inlet and an air outlet, the air inlet of the first fluid passage being distributed on the first surface of the base;

a plurality of protrusions spaced apart from each other, the protrusions being fixedly disposed on the first surface of the base body and extending continuously on the first surface of the base body in a lateral direction, wherein between the adjacent protrusions Forming a groove through which air can pass, the opening of the groove having a diameter greater than 0 but smaller than the particle size of the selected particles mixed in the air to be treated, and wherein at least two of the raised portions are respectively Two opposite sides of the opposite sides of the air inlet of the first fluid passage are disposed adjacent to each other, and at least one convex portion directly passes through the air inlet of the first fluid passage, so that the plurality of convex portions and the base body Interworking forms a second fluid passage in communication with the first fluid passage, and air to be treated can only enter the first fluid passage through the second fluid passage;

Preferably, the filter chip further includes: an air blocking portion having a second surface disposed opposite to the first surface of the base body, wherein an air inlet of the first fluid passage is distributed in the air blocking portion on the base body In the orthographic projection formed on the first surface, the plurality of protrusions have opposite first and second ends, the first end being sealingly connected to the first surface of the base, and the second end a partial region is sealingly coupled to the second surface of the shield; and/or the plurality of projections are distributed in parallel on the first surface of the substrate; and/or formed between adjacent projections The opening of the trench has a size of 1 nm to 50 μm; and/or the first fluid channel has a pore diameter of 1 μm to 1 mm; and/or the substrate has a thickness of 1 μm or more; and/or the convex The surface of the starting portion is further provided with a layer of functional material, and the material of the functional material layer includes light reminder Material or antibacterial material;

Preferably, the air blocking portion has a thickness of 0.5 μm to 200 μm; and/or at least a part of at least one of the base body, the air blocking portion, and the convex portion is a transparent structure.
A nasal plug respirator according to claim 64, wherein said filter chip comprises:

a substrate having a fluid passage, and

An aggregate of a plurality of linear bodies for treating air flowing through the fluid passage mixed with selected particles;

The aggregate is distributed in the fluid channel and has a porous structure, and a diameter of the pore in the porous structure is greater than 0 but smaller than a particle diameter of the selected particle;

Preferably, one end of the linear body is fixedly connected to an inner wall of the fluid passage, and the other end extends in a radial direction of the fluid passage; and/or the plurality of linear bodies cross each other or interweave with each other to form the porous body. a structure; or, the plurality of linear bodies are spaced apart from each other and arranged in parallel to form the porous structure; and/or the substrate has opposite first and second surfaces, the air inlet of the fluid passage Distributed on the first surface of the substrate; and/or the first surface of the substrate is further distributed with a plurality of erected linear bodies spaced apart from each other, the plurality of erected linear bodies being disposed around the fluid passage;

Preferably, the filter chip further includes an air blocking portion having a third surface disposed opposite to the first surface of the base body, and one end of the plurality of upright linear bodies is fixedly disposed on the base body a first surface, the other end being fixedly coupled to the third surface of the air barrier, wherein a distance between adjacent upright linear bodies is greater than zero but less than a particle size of the selected particles; and/or The first surface is further provided with a layer of functional material, the material of the layer of functional material comprising a photocatalytic material or an antimicrobial material; and/or at least some of the components of the air filter chip have a transparent structure; and/or the fluid The air inlet of the passage has a regular or irregular shape including a polygonal shape, a circular shape or an elliptical shape; and/or the fluid passage has a pore diameter of 1 μm to 1 mm; and/or the base body has a thickness of 1 μm the above;

Preferably, the air inlet of the fluid passage and the plurality of upright linear bodies are distributed in an orthographic projection of the air blocking portion on the first surface of the base body; and/or the aspect ratio of the upright linear body is 4:1 to 200000:1; and/or, the ratio of the distance between adjacent upright linear bodies to the length of the upright linear body is 1:4 to 1:200,000; and/or the diameter of the linear body Is from 1 nm to 500 μm; and/or, the linear body is selected from nanowires or nanotubes;

Preferably, at least the surface of the linear body is further distributed with a photocatalytic material or an antibacterial material; and/or the linear body comprises carbon nanowires, carbon nanotubes, ZnO nanowires, GaN nanowires, TiO 2 nanowires, Any one or a combination of two or more of Ag nanowires and Au nanowires.