CN107469478B - Fluid treatment device and preparation method thereof - Google Patents

Fluid treatment device and preparation method thereof Download PDF

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Publication number
CN107469478B
CN107469478B CN201610398960.7A CN201610398960A CN107469478B CN 107469478 B CN107469478 B CN 107469478B CN 201610398960 A CN201610398960 A CN 201610398960A CN 107469478 B CN107469478 B CN 107469478B
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fluid
substrate
area
treatment device
protruding parts
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CN107469478A (en
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杨国勇
史建伟
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Suzhou Suro Film Nano Tech Co ltd
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Suzhou Suro Film Nano Tech Co ltd
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Priority to CN201610398960.7A priority Critical patent/CN107469478B/en
Priority to PCT/CN2017/086780 priority patent/WO2017211215A1/en
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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0001—Making filtering elements
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D46/00—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours
    • B01D46/0027—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions
    • B01D46/0028—Filters or filtering processes specially modified for separating dispersed particles from gases or vapours with additional separating or treating functions provided with antibacterial or antifungal means
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
    • B01D53/34—Chemical or biological purification of waste gases
    • B01D53/74—General processes for purification of waste gases; Apparatus or devices specially adapted therefor
    • B01D53/86—Catalytic processes
    • B01D53/8678—Removing components of undefined structure
    • B01D53/8687—Organic components
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/30—Treatment of water, waste water, or sewage by irradiation
    • C02F1/32—Treatment of water, waste water, or sewage by irradiation with ultraviolet light
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F1/00—Treatment of water, waste water, or sewage
    • C02F1/50—Treatment of water, waste water, or sewage by addition or application of a germicide or by oligodynamic treatment
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01D—SEPARATION
    • B01D2255/00—Catalysts
    • B01D2255/80—Type of catalytic reaction
    • B01D2255/802—Photocatalytic
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2201/00—Apparatus for treatment of water, waste water or sewage
    • C02F2201/002—Construction details of the apparatus
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2303/00—Specific treatment goals
    • C02F2303/04—Disinfection
    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2305/00—Use of specific compounds during water treatment
    • C02F2305/10—Photocatalysts

Abstract

A fluid treatment device and a method of making the same. The fluid treatment device includes: a substrate having a first fluid channel with fluid inlets distributed in a first region of a first surface of the substrate; a fluid barrier having a second surface disposed opposite the first surface; the first surface is provided with a first area, the second area is adjacent to the first area, the first surface is provided with a plurality of convex parts, one ends of the convex parts are fixedly arranged in the second area of the first surface, the other ends of the convex parts are fixedly connected with the second surface, a certain distance is reserved between the adjacent convex parts, the second area of the first surface is adjacent to the first area, so that the convex parts, the fluid blocking parts and the matrix are matched to form a second fluid channel, and fluid to be treated can only enter the first fluid channel through the second fluid channel. The fluid treatment device has the characteristics of large flux, small flow resistance, capability of efficiently removing micro/nano particles in fluid, reusability, long service life and the like, and is suitable for large-scale mass production.

Description

Fluid treatment device and preparation method thereof
Technical Field
The application relates to a device for purifying fluid containing particulate matters and a preparation method thereof.
Background
In daily life and work, there is a wide need for removing particles from fluids to clean the fluids. For example, dust, fine particles, etc. in low quality air should be removed to ensure health of human body. For example, for water and oil (edible oil, gasoline, diesel oil, etc.), particulate matters in the water and oil should be removed to realize purification of the water and the oil. For example, in the field of biological medicine, it is necessary to remove or screen cells, viruses, bacteria, and the like in blood and body fluids.
Most of the conventional fluid treatment devices (such as masks, air purifiers and the like) have the defects of low flux, large volume, short service life and the like, and have low effect of removing fine particles in the fluid.
In recent years, with the development of micro-nano processing technology, researchers have proposed some fluid processing apparatuses based on porous films, that is, by etching (corroding) numerous holes on the scale of micro-or nano-scale on the film, so that the apparatus can be applied to removing particles, especially micro-particles, in the fluid, and the size of the fluid can be precisely controlled. However, the device has contradiction between flux and mechanical strength, and has large flux, and often has fragile mechanical structure, large mechanical strength and small flux. This is because the processing technology is limited, and the smaller the hole is, the thinner the film thickness is required, which further deteriorates the mechanical support performance of the porous film, and the porous film cannot be adapted to a severe environment, and has a very limited service life, so that the porous film has not been put into practical use until now.
Still other researchers have now implemented fluid handling devices (see fig. 1) that include lateral flow channels with apertures controlled to a few nanometers using sacrificial layer technology, thus facilitating removal of fine particles from the fluid, but with too little flux.
Disclosure of Invention
The primary object of the present application is to provide an improved fluid treatment device and a method for preparing the same, which overcome the shortcomings of the prior art.
In order to achieve the above object, the present application adopts the technical scheme that:
embodiments of the present application provide a fluid treatment device, comprising:
a substrate having a first fluid channel, the first fluid channel having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid channel being distributed within a first region of a first surface of the substrate;
a fluid barrier having a second surface disposed opposite the first surface of the substrate for preventing fluid to be treated from directly entering the fluid inlet of the first fluid passage;
the first surface of the substrate is adjacent to the first area, so that the plurality of protruding parts, the fluid barrier and the substrate cooperate to form a second fluid channel, and the fluid to be treated can only enter the first fluid channel through the second fluid channel.
Preferably, the plurality of protrusions are disposed around the fluid inlet of the first fluid passage.
More preferably, the protruding parts are vertically arranged micro wires or nano wires, the diameter of the protruding parts is 1 nm-50 μm, the length of the protruding parts is 50 nm-200 μm, and the distance between the adjacent protruding parts is 1 nm-50 μm.
Embodiments of the present application also provide a method of making a fluid treatment device, comprising:
providing a substrate having a first surface and a third surface opposite the first surface;
processing the first surface of the substrate to form a plurality of protrusions spaced apart from each other on the first surface of the substrate, or growing a plurality of protrusions spaced apart from each other on the first surface of the substrate, wherein a distance between adjacent protrusions is greater than 0 but less than a particle size of selected particles intermixed within a fluid to be treated;
providing a fluid barrier on a first surface of the substrate having a second surface disposed opposite the first surface of the substrate, and fixedly connecting at least a plurality of protrusions distributed in a second region of the first surface of the substrate to the second surface of the fluid barrier;
and processing the third surface of the substrate to form a first fluid channel penetrating the substrate, wherein the fluid inlet of the first fluid channel is distributed in a first area of the first surface of the substrate, the second area of the first surface of the substrate is adjacent to the first area, a plurality of protruding parts distributed in the second area of the first surface of the substrate, the fluid blocking parts and the substrate are matched to form a second fluid channel, and the fluid to be processed can only enter the first fluid channel through the second fluid channel.
Compared with the prior art, the fluid treatment device provided by the application has the characteristics of large flux, small flow resistance, capability of efficiently removing micro/nano particles in fluid, capability of adopting a thicker substrate, high mechanical strength, capability of being cleaned and used repeatedly, long service life, simple and controllable preparation process and suitability for large-scale mass preparation.
Drawings
In order to more clearly illustrate the embodiments of the present application or the technical solutions in the prior art, the drawings that are required to be used in the embodiments or the description of the prior art will be briefly described below, and it is obvious that the drawings in the following description are only some embodiments described in the present application, and other drawings may be obtained according to these drawings without inventive effort for a person skilled in the art.
FIG. 1 is a cross-sectional view of a prior art fluid treatment device including a transverse flow channel;
FIG. 2 is a cross-sectional view of a fluid treatment device according to a first embodiment of the present application;
FIGS. 3 a-3 e are transverse cross-sectional views of a boss in a fluid treatment device in accordance with some exemplary embodiments of the present application;
FIGS. 4 a-4 c are schematic illustrations of an arrangement of bosses in a fluid handling device according to some exemplary embodiments of the present application;
FIGS. 5 a-5 c are top views of various fluid treatment devices according to a first embodiment of the present application;
FIG. 6 is a cross-sectional view of a fluid treatment device according to a second embodiment of the present application;
FIG. 7 is a cross-sectional view of a fluid treatment device according to a third embodiment of the present application;
FIG. 8 is a cross-sectional view of a fluid treatment device according to a fourth embodiment of the present application;
FIG. 9 is a cross-sectional view of a fluid treatment device according to a fifth embodiment of the present application;
FIG. 10 is a process flow diagram of a fluid treatment device according to an exemplary embodiment of the present application.
Detailed Description
In view of the shortcomings in the prior art, the inventor of the present application has long studied and put forward a great deal of practice. The technical scheme, the implementation process, the principle and the like are further explained as follows.
One aspect of an embodiment of the present application provides a fluid treatment device including:
a substrate having a first fluid channel, the first fluid channel having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid channel being distributed within a first region of a first surface of the substrate;
a fluid barrier having a second surface disposed opposite the first surface of the substrate for preventing fluid to be treated from directly entering the fluid inlet of the first fluid passage;
the first surface of the substrate is adjacent to the first area, so that the plurality of protruding parts, the fluid barrier and the substrate cooperate to form a second fluid channel, and the fluid to be treated can only enter the first fluid channel through the second fluid channel.
Wherein the substrate may be of various forms, such as rectangular, lamellar, polyhedral, hemispherical, spherical or other irregular forms. Thus, the "first surface" may be any non-specifically suitable planar or curved surface on the substrate.
The first fluid passage may be any form of through-hole, the fluid inlet of which is distributed over a first surface of the substrate, and the fluid outlet of which may be distributed over another surface of the substrate than the first surface (e.g. the other surface may be adjacent to, opposite to, or in the first surface) (in which case, of course, the first surface should have a fluid barrier mechanism so that the fluid to be treated does not flow directly over the first surface to the fluid outlet).
The fluid blocking portion may be in various forms, for example, may be in a sheet shape, a thin shell shape, a rectangular body shape, a polyhedral shape, or the like, so long as it is capable of preventing the fluid to be treated from entering the fluid inlet of the first fluid channel from the fluid channel other than the second fluid channel formed by the cooperation between the plurality of protruding portions, the fluid blocking portion, and the base body. The fluid barrier may be provided in various forms, for example, it may be integrally spaced from the base, may be partially connected to the base, or may be integrally formed with the base in some cases.
The first area and the second area of the first surface of the substrate may be distributed in various forms, for example, the first area and the second area may be adjacent to each other, or may be spaced apart from each other, or the second area may be disposed around the first area, or may be partially embedded in the second area. The distribution pattern of the two can be adjusted according to the structures of the fluid barrier part and the matrix, the position relation among the two, and the like.
Wherein the plurality of protrusions means two or more protrusions. The shape of the protrusions may be varied with respect to the flat or concave portion of the first surface of the substrate, for example, it may be a standing wire, column, sheet, tube, cone, frustum or other regular or irregular structure, and the transverse cross-sectional structure (herein, transverse, mainly, parallel to the first surface of the substrate) may be a regular or irregular shape, for example, a polygon (triangle, quadrangle or other), a circle, an ellipse, a star or the like (see fig. 3 a-3 e).
Wherein the plurality of protrusions may be regularly or irregularly, uniformly or non-uniformly distributed on the first surface of the substrate (see fig. 4 a-4 c).
The fluid inlet of the first fluid channel has a regular or irregular shape, such as a polygon (rectangle, diamond or other), a circle or ellipse, etc., which can be simply adjusted according to the requirements of practical applications.
The fluid to be treated may be in a gaseous or liquid phase, such as air, water, oil, or in some cases, a collection of particulate matter in a fluid form, or a molten state of some matter, etc.
The term "particles" is used herein to refer mainly to solid phase particles, but in some cases may also be droplets or the like that are not compatible with the fluid (particularly liquid phase fluid).
In some preferred embodiments, the second region of the first surface of the substrate is disposed around the first region. In particular, a plurality of protrusions distributed in the second region are disposed around the fluid inlet of the first fluid channel. In this arrangement, the gaps between the plurality of projections distributed in the second region are all part of the second fluid passage, thereby achieving a greater fluid flux.
In some preferred embodiments, a plurality of protrusions are also disposed at intervals in a third region of the first surface of the substrate, and the second region is disposed between the third region and the first region. The top parts of the plurality of protruding parts distributed in the third area can be connected with the fluid blocking part or not connected with the fluid blocking part, and particularly when the top parts of the protruding parts are not connected with the fluid blocking part, gaps among the top parts of the protruding parts can also form fluid channels, so that the contact surface between the fluid treatment device and fluid is further increased, and the fluid flux is improved.
Particularly preferably, a third region of the first surface of the base body is arranged around the second region. Further, the protrusions distributed in the third region may be the same as or different from the protrusions distributed in the second region. It is particularly preferred that the distance between adjacent projections distributed on the first surface of the substrate, whether in the third region or the second region, is greater than 0 but less than the particle size of selected particles intermixed within the fluid to be treated.
Preferably, the first region and the second region of the first surface of the substrate are distributed in an orthographic projection of the fluid barrier on the first surface of the substrate.
More preferably, the protruding portion is a linear or columnar protruding portion, and the aspect ratio of the protruding portion is 4: 1-200000: 1, and the ratio of the distance between adjacent bosses to the length of the bosses is 1: 4-1: 200000. by adopting the protruding parts with the structure and the distribution form, a plurality of protruding parts can be densely arranged (the proportion of the protruding parts per se in the unit area is small), thereby being beneficial to treating tiny particles in fluid, and simultaneously, the fluid treatment device is endowed with larger fluid flux (the pores among the protruding parts are larger than the volume of the protruding parts per se).
Particularly preferably, the protruding parts are vertically arranged micro wires (tubes) or nano wires (tubes), the diameter of the protruding parts is 1 nm-50 μm, the length of the protruding parts is 50 nm-200 μm, and the distance between the adjacent protruding parts is 1 nm-50 μm, so that the fluid treatment device formed by the construction can treat particles with the particle size as small as nano-scale in the fluid, and the higher fluid treatment flux can be maintained.
Further, the plurality of protruding portions distributed in the third area of the first surface of the substrate are arranged to form a micro-scale or nano-scale array structure with super-hydrophobic or super-oleophobic performance. Thus, the fluid treatment device can be endowed with functions such as self-cleaning.
Of course, the raised portions may be formed by providing a coating layer formed of a suitable low surface energy substance known in the art on a part or the entire surface of the raised portions, or directly using a hydrophobic material, thereby providing super-hydrophobic properties, self-cleaning properties, and the like.
In some more specific embodiments, the first fluid passage may have a pore size of 1 μm to 1mm.
In some more specific embodiments, the substrate has a thickness of 1 μm or more.
The material of the substrate may be selected from metal, nonmetal, organic material, inorganic material, etc., such as silicon wafer, polymer, ceramic, etc., but is not limited thereto.
In some more preferred embodiments, the protrusions may be selected from nanowires, such as carbon nanowires, carbon nanotubes, znO nanowires, gaN nanowires, tiO 2 Any one or a combination of two or more of nanowires, ag nanowires and Au nanowires.
In some embodiments, the protrusions may be formed of a photocatalytic material or a material having an antibacterial and bactericidal function, or the protrusions may be coated with a photocatalytic material or a material having an antibacterial and bactericidal function. For example, the protrusions may be ZnO nanowires, gaN nanowires, tiO 2 Nanowires having photocatalytic properties, such as nanowires, can degrade organic matter in a fluid under light-assisted irradiation. For example, the protrusions may employ Ag nanowires, au nanowires, etc., to kill bacteria, viruses, microorganisms in the fluid.
In some more specific embodiments, the fluid barrier has a thickness of 0.5 μm to 200 μm.
In some preferred embodiments, the fluid treatment device may further comprise at least one support body, one end of which is fixedly connected to the base body, and the other end of which is fixedly connected to the fluid barrier. By means of the supporting body, firm and stable matching between the fluid blocking part and the matrix can be achieved, the protruding part distributed between the fluid blocking part and the matrix can be effectively protected, and the problems that the protruding part is collapsed and damaged due to the fact that the fluid blocking part and/or the matrix is extruded by the protruding part after being subjected to external force are avoided.
The support body may be in various forms, such as a column (a cylinder, a polygon prism, etc.), a step, a frustum, etc., and is not limited thereto, and the bending resistance thereof should be greater than any of the protrusions. And the support body may be formed by processing between the fluid blocking portion and the base body, or may be formed by processing integrally with the base body or the fluid blocking portion.
Further, the number of the supporting bodies may be more than two, and the more than two supporting bodies are symmetrically distributed around the fluid inlet of the first fluid channel.
In some preferred embodiments, the fluid inlet of the first fluid channel may further be provided with one or more support beams, where the support beams are fixedly connected to the fluid blocking portion, so as to form a support for the fluid blocking portion, and further improve the structural strength of the fluid processing device.
Further, the support beam may be a plurality of support beams, which may be arranged in parallel on the fluid inlet of the first fluid passage.
In some preferred embodiments, the surface of the protruding portion is further provided with a functional material layer, and the material of the functional material layer includes, but is not limited to, a photocatalytic material, an antibacterial material, and the like. For example, the typical photocatalytic material may be titanium dioxide, etc., and when the fluid treatment device containing the functional material is used for treating the fluid, if ultraviolet irradiation is used for assisting, the photocatalytic degradation can be further carried out on some organic pollutants in the fluid, etc., so as to realize multiple purification of the fluid. For another example, a more typical antimicrobial material may be a noble metal such as Au, ag, etc., whereby bacteria, viruses, etc. in the fluid may be killed simultaneously during the treatment of the fluid.
Further, at least part of at least some of the components of the fluid treatment device are transparent structures to facilitate light penetration. For example, some or all of the fluid barrier, base, boss may be made of a transparent material.
Another aspect of the embodiments of the present application provides a method for manufacturing a fluid treatment device, including:
providing a substrate having a first surface and a third surface opposite the first surface;
processing the first surface of the substrate to form a plurality of protrusions spaced apart from each other on the first surface of the substrate, or growing a plurality of protrusions spaced apart from each other on the first surface of the substrate, wherein a distance between adjacent protrusions is greater than 0 but less than a particle size of selected particles intermixed within a fluid to be treated;
providing a fluid barrier on a first surface of the substrate having a second surface disposed opposite the first surface of the substrate, and fixedly connecting at least a plurality of protrusions distributed in a second region of the first surface of the substrate to the second surface of the fluid barrier;
and processing the third surface of the substrate to form a first fluid channel penetrating the substrate, wherein the fluid inlet of the first fluid channel is distributed in a first area of the first surface of the substrate, the second area of the first surface of the substrate is adjacent to the first area, a plurality of protruding parts distributed in the second area of the first surface of the substrate, the fluid blocking parts and the substrate are matched to form a second fluid channel, and the fluid to be processed can only enter the first fluid channel through the second fluid channel.
In some more specific embodiments, the preparation method comprises:
providing a patterned first photoresist mask on a first surface of the substrate, etching the first surface of the substrate to form a plurality of protruding portions on the first surface of the substrate, wherein the protruding portions are arranged at intervals, and removing the first photoresist mask;
coating a soluble or corrodible organic matter and/or inorganic matter on the first surface of the substrate, and filling gaps among the plurality of protruding parts with the organic matter and/or inorganic matter to form a sacrificial layer;
setting a second photoresist mask on the sacrificial layer, etching the sacrificial layer to expose at least the tops of the plurality of protruding parts distributed in a second area of the first surface of the substrate, and removing the second photoresist mask;
providing a third mask on the first surface of the substrate, exposing the region corresponding to the fluid barrier on the first surface of the substrate, depositing to form the fluid barrier, and removing the third mask;
a patterned fourth photoresist mask is arranged on the third surface of the substrate, the third surface of the substrate is etched until the sacrificial material filled between the adjacent protruding parts is exposed, thereby forming a slot on the third surface of the substrate, the position of the slot corresponds to the first area of the first surface of the substrate, the second area of the first surface of the substrate is arranged around the first area,
the fourth photoresist mask and the sacrificial material filled between the plurality of protrusions are removed to form the first fluid channel on the substrate.
Preferably, the plurality of protruding parts are a plurality of vertical nano columns or vertical nano wires which are arranged in an array.
The technical solution of the present application will be further described below with reference to the accompanying drawings and several embodiments. It should be noted that the structures of the fluid treatment device and the related devices are shown in the drawings simply and schematically, and thus the dimensions, size ratios, etc. of the components therein are not precisely drawn.
Referring to fig. 2 and 5 a-5 b, in a first embodiment of the present application, a fluid treatment device includes a substrate 101, where the substrate 101 has a first surface 101a, a first area 1011 (an area surrounded by a dotted line in the drawing) of the substrate 101 is distributed with a plurality of through holes 104 serving as fluid channels, an array of a plurality of vertical micro/nano wires/tubes 103 (i.e. any one or more of a micron-sized wire, a micron-sized tube, a nano wire, and a nano tube) is disposed on the first surface, a top portion of the plurality of micro/nano wires/tubes 103 distributed in a second area 1012 surrounding the first area 1011 is further connected with a fluid blocking portion 102, the fluid blocking portion 102 is disposed above a fluid inlet of the through holes 104, so that a fluid to be treated cannot bypass the micro/nano wire/tube array and directly enter the through holes 104, and the fluid blocking portion 102 has a second surface 102b disposed opposite to the first surface 1011. A plurality of vertical micro/nanowires/tubes 103 may also be densely distributed within the remaining region 1013 (which may be referred to as a third region) of the first surface 1011. In fig. 2, the arrows with broken lines show the direction of travel of the fluid.
The micro/nano wires/tubes can be densely arranged on the first surface of the matrix due to the fact that the micro/nano wires/tubes have larger height-diameter ratio (or length-diameter ratio), particles with different particle size ranges in the fluid can be removed through adjusting the distance between the micro/nano wires/tubes, and particularly when the nano wires/tubes are adopted, extremely small particles in the fluid can be removed through controlling the distance between the nano wires/tubes to be in a nano level, and the resistance of the nano wires/tubes to the fluid can be controlled to be at a very low level due to the extremely small diameter of the nano wires/tubes, so that very large fluid flux is formed, and the method is far superior to the existing porous membrane, a fluid treatment device based on a transverse flow channel and the like.
If the above-mentioned micro/nano wire/tube array is designed to a certain extent by referring to the known solutions in the industry, the micro/nano wire/tube array can also be formed into a super-hydrophobic structure and a super-oleophobic structure, so that not only particles in the fluid can be removed, but also the blocked particles can not be accumulated in the functional area (the surface of the micro/nano wire/tube array) of the fluid treatment device through self-cleaning action, thereby avoiding the failure of the fluid treatment device after long-term use.
The substrate 101 may have a larger thickness, so that it may well support the micro/nano wire/tube array, and may further enhance the mechanical strength of the fluid processing device, so that the fluid processing device may be pressure-resistant, bending-resistant, collision-resistant, impact-resistant, and further may be applied in various environments without damage, for example, may be applied in processing high-pressure and high-speed fluids, which is not possible with the existing porous membrane.
The fluid blocking part can be sheet-shaped, and the thickness and the like of the fluid blocking part can be adjusted according to practical application requirements.
The material selection ranges of the parts (101, 102, 103, 104) of the fluid treatment device are various, and the materials can be inorganic materials or organic materials, such as metals, nonmetallic inorganic materials, plastics, ceramics, semiconductors, glass, polymers and the like. When inorganic materials are selected for use in these parts, the fluid treatment device also has temperature change resistance and can treat high-temperature and low-temperature fluids.
The fluid treatment device adopting the design can be cleaned (ultrasonically) and used for multiple times, and still has good fluid treatment capability.
When the fluid is treated by the fluid treatment device, the fluid containing impurity particles enters the array formed by the micro/nano wires 103, wherein particles (or some droplets incompatible with the fluid, such as droplets in air or droplets in oil) with particle diameters larger than a certain value are blocked outside the micro/nano wire/tube array, and then the fluid reaches the inlet of the through hole 104 through gaps among the micro/nano wires/tubes and enters the through hole 104, so that the purification of the fluid and/or the enrichment recovery of the required particles (droplets) are realized.
Referring again to FIG. 2, in some embodiments of the first embodiment, the diameter of the micro/nanowires may be 1nm to 50 μm, and the length (height) h 1 May be 50nm to 200 μm, and the distance between adjacent micro/nanowires may be 1nm to 50 μm. The aperture w of the through hole 104 may be 1 μm to 1mm. Thickness h of the substrate 2 May be 1 μm or more. Thickness h of the fluid barrier 3 May be 0.5 μm to 200. Mu.m.
Referring again to fig. 3 a-3 e, the cross-sectional structure of the micro/nanowires may be regular or irregular, such as polygonal (triangular, quadrilateral or otherwise), circular, elliptical, star-shaped, etc.
Referring again to fig. 4 a-4 c, the foregoing micro/nanowires may be regularly or irregularly, uniformly or non-uniformly distributed on the first surface of the substrate. In some more specific applications, the average spacing between adjacent micro/nanowires is in the range of 1nm to 50 μm.
In addition, referring to fig. 5 a-5 c, in the first embodiment, the shapes (particularly the shapes of the transverse cross-sections) of the through holes 104 and the fluid barriers 102 may be varied, for example, circular, square, rectangular or other shapes.
Referring to fig. 6, preferably, in a second embodiment of the present application, a fluid treatment device includes a substrate 201, where the substrate 201 has a first surface and opposite and third surfaces, a plurality of through holes 204 serving as fluid channels are distributed on the substrate 201, an array formed by a plurality of vertical micro/nano wires/tubes 203 is disposed on the first surface, a fluid blocking portion 202 is further connected to the top of the plurality of micro/nano wires/tubes 203 distributed around the through holes 204, and the fluid blocking portion 202 is disposed above a fluid inlet of the through holes 204, so that a fluid to be treated cannot bypass the micro/nano wires/tubes array and directly enter the through holes 204. And, more than one supporting body 205, for example, four supporting bodies 205, are symmetrically or asymmetrically distributed around the through hole 204, and the supporting of the fluid blocking portion 202 can be further increased by the supporting bodies 205, so that a more firm and stable fit between the fluid blocking portion and the matrix is realized, and the micro/nano wire/tube array distributed between the fluid blocking portion and the matrix can be effectively protected, so that the problems of collapse, damage and the like of the micro/nano wire/tube 203 caused by the extrusion of the micro/nano wire/tube array after the fluid blocking portion and/or the matrix are subjected to external force are avoided.
The support body may be in various forms, for example, may have a rectangular, trapezoidal, stepped longitudinal section (the longitudinal direction herein may be understood as a direction perpendicular to the first surface of the base body), etc., and is not limited thereto. In some embodiments of this second embodiment, the support may be a boss or the like protruding upward from an edge portion of the through hole 204, and an upper end thereof is connected to the fluid blocking portion 202.
The number, diameter, distribution density and the like of the supporting bodies can be adjusted according to actual needs, but the space occupying the first surface of the matrix is as small as possible, so that the large influence on the fluid flux of the micro/nano wires is avoided.
The structures, arrangement forms, materials, etc. of the substrate, the micro/nano wire/tube array, the fluid barrier, the through holes, etc. used in the second embodiment may be the same as or similar to those described above, and thus will not be repeated here.
Referring to fig. 7, preferably, in a third embodiment of the present application, a fluid treatment device includes a substrate 301, where the substrate 301 has a first surface and opposite and third surfaces, a plurality of through holes 304 serving as fluid channels are distributed on the substrate 301, an array formed by a plurality of vertical micro/nano wires/tubes 303 is disposed on the first surface, a fluid blocking portion 302 is further connected to the top of the plurality of micro/nano wires/tubes 303 distributed around the through holes 304, and the fluid blocking portion 302 is disposed above a fluid inlet of the through holes 304, so that a fluid to be treated cannot bypass the micro/nano wires/tubes array and directly enter the through holes 304. And more than one supporting beam 305, for example, symmetrically or asymmetrically arranged, is further erected on the through hole 304, and the supporting beam 305 can further increase the support to the fluid blocking portion 302, so as to realize a more firm and stable fit between the fluid blocking portion and the matrix, and can effectively form protection for the micro/nano wire/tube array distributed between the fluid blocking portion and the matrix, thereby avoiding the problems of collapse, damage and the like of the micro/nano wire/tube 303 caused by the extrusion of the micro/nano wire/tube array after the fluid blocking portion and/or the matrix are subjected to external force.
The support beam may be in various forms, for example, may be in an arch shape, etc., and is not limited thereto. And further the support beam may also be fitted with other supports, such as those described in the second embodiment.
The number, the size, the distribution density and the like of the supporting beams can be adjusted according to actual needs, but the fluid inlets of the through holes are shielded as little as possible, so that the large influence on the fluid flux of the fluid treatment device is avoided.
The structures, arrangement forms, materials, etc. of the substrate, the micro/nano wire/tube array, the fluid barrier, the through holes, etc. used in the third embodiment may be the same as or similar to those described above, and thus will not be repeated here.
Referring to fig. 8, in a fourth embodiment of the present application, a fluid treatment device preferably includes a substrate 401, where the substrate 401 has a first surface 4011 and a third surface 4012 opposite to the first surface, a plurality of through holes 404 serving as fluid channels are distributed on the substrate 401, an array formed by a plurality of vertical nano-pillars 403 is disposed on the first surface, top portions of the plurality of nano-pillars 403 distributed around the through holes 304 are further connected to a fluid blocking portion 402, and the fluid blocking portion 402 is disposed above a fluid inlet of the through holes 404, so that a fluid to be treated cannot bypass the aforementioned nano-pillar array and directly enter the through holes 304. A photocatalytic material layer 405 is further provided on the surface of the nano-pillars 403 and the first surface of the substrate 401. When the fluid is treated by the fluid treatment device comprising the photocatalytic material layer 405, if ultraviolet irradiation is used, some organic pollutants in the fluid can be subjected to photocatalytic degradation, so that multiple purification of the fluid can be realized.
Wherein, in order to facilitate the penetration of light, part or all of the fluid barrier, the matrix and the bulge can be made of transparent materials. In some embodiments of the present example, the fluid barrier may be integrally formed of a transparent material, such as light injection.
Among them, the photocatalytic material may be titanium dioxide or the like, but is not limited thereto.
Wherein, to form the photocatalytic material layer 405, a person skilled in the art may use various ways known in the art, such as coating (spin coating, spray coating, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, atomic layer deposition, etc.), sputtering, etc., and is not limited thereto.
Wherein the thickness of the photocatalytic material layer 405 may be controlled to be on the order of nanometers to minimize its effect on the fluid flux of the fluid treatment device.
The structures, arrangement forms, materials, etc. of the substrate, the micro/nano wire/tube array, the fluid barrier, the through holes, etc. used in the fourth embodiment may be the same as or similar to those described above, and thus will not be repeated here.
Referring to fig. 9, preferably, in a fifth embodiment of the present application, a fluid treatment device includes a substrate 501, where the substrate 501 has a first surface 5011 and a third surface 5012 opposite to the first surface, a plurality of through holes 504 serving as fluid channels are distributed on the substrate 501, an array of a plurality of vertical nano pillars 503 is disposed on the first surface, top portions of the plurality of nano pillars 503 distributed around the through holes 504 are further connected to a fluid blocking portion 502, and the fluid blocking portion 502 is disposed above a fluid inlet of the through holes 504, so that a fluid to be treated cannot bypass the aforementioned nano pillar array and directly enter the through holes 504. An antibacterial material layer 505 is further provided on the surface of the nano-pillars 503 and the first surface of the substrate 501. When the fluid is treated by the fluid treatment device comprising the antibacterial material layer 505, bacteria, viruses and the like in the fluid can be killed synchronously in the treatment process of the fluid, so that multiple purification of the fluid can be realized.
Among them, a more typical antibacterial material may be a noble metal such as Au, ag, etc., but is not limited thereto.
Wherein, to form the antibacterial material layer 505, those skilled in the art can use various methods known in the art, such as coating (spin coating, spray coating, printing, etc.), physical or chemical vapor deposition (such as MOCVD, PECVD, atomic layer deposition, etc.), sputtering, etc., and are not limited thereto.
Wherein the thickness of the antimicrobial material layer 505 may be controlled at the nanometer level to minimize its effect on the fluid flux of the fluid treatment device.
The structures, arrangement forms, materials, etc. of the substrate, the micro/nano wire/tube array, the fluid barrier, the through holes, etc. used in the fifth embodiment may be the same as or similar to those described above, and thus will not be repeated here.
The fluid treatment device of the present application may be prepared by physical and chemical methods, for example, chemical growth methods, physical processing methods, and the like, and in particular, MEMS (micro electro mechanical system, microelectromechanical Systems) methods, and the like.
For example, referring to fig. 10, in a sixth embodiment of the present application, a process for preparing a fluid treatment device may include the steps of:
s1: providing a patterned photoresist mask on one side surface (defined as a first surface a) of a substrate (e.g., a silicon wafer);
s2: etching the first surface of the substrate to form a plurality of vertical nanowires disposed at intervals from each other on the first surface of the substrate, and then removing the first photoresist mask;
s3: coating soluble or corrodible organic matters and/or inorganic matters on the first surface of the substrate, and filling gaps among the vertical nanowires with the organic matters and/or inorganic matters to form a sacrificial layer;
s4: setting photoresist on the sacrificial layer and performing photoetching;
s5: etching the sacrificial layer to expose the tops of the plurality of vertical nanowires distributed in the second area of the first surface of the substrate, and then removing the photoresist;
s6: providing a photoresist mask on a first surface of the substrate, and exposing a region on the first surface of the substrate corresponding to the fluid barrier;
s7: depositing a fluid barrier in the exposed region corresponding to the fluid barrier;
s8: stripping to remove the photoresist;
s9: providing a patterned etch mask on a second surface of the substrate;
s10: etching the other side surface (defined as a third surface b) of the substrate opposite to the first surface until the sacrificial material filled between the adjacent vertical nanowires is exposed, so as to form a slot on the third surface of the substrate, wherein the position of the slot corresponds to a first area of the first surface of the substrate, and a second area of the first surface of the substrate is arranged around the first area;
s11: and removing the etching mask and the sacrificial material filled between the vertical nanowires to obtain the fluid treatment device.
The etching method adopted in the foregoing steps may be photolithography, mechanical etching, dry etching, wet etching, or the like.
For example, in the aforementioned step S1, the method of forming a patterned (nanopatterned) photoresist mask includes: photolithography, nanosphere masking, nano (metal) particle masking, and the like, and are not limited thereto.
For example, in the foregoing step S2, the vertical nanowire array may be etched by means known in the art, such as RIE, ICP, wet etching, electrochemical etching, etc.
For example, in the aforementioned step S3, the filled soluble organic matter may be a photoresist or the like or a corrodible inorganic matter such as metal, siO 2 Silicon nitride, and the like.
For example, in the foregoing step S10, the slots may be etched by means known in the art, such as RIE, ICP, wet etching, electrochemical etching, and the like.
Obviously, the preparation process of the fluid treatment device is simple and controllable, and is suitable for mass production.
It should be understood that the above embodiments are merely for illustrating the technical concept and features of the present application, and are intended to enable those skilled in the art to understand the content of the present application and implement the same according to the content of the present application, not to limit the protection scope of the present application. All equivalent changes or modifications made in accordance with the spirit of the present application are intended to be included within the scope of the present application.

Claims (5)

1. A fluid treatment device, comprising:
a substrate having a first fluid channel, the first fluid channel having a fluid inlet and a fluid outlet, the fluid inlet of the first fluid channel being distributed within a first region of a first surface of the substrate;
a fluid barrier having a second surface disposed opposite the first surface of the substrate for preventing fluid to be treated from directly entering the fluid inlet of the first fluid passage;
a plurality of protruding parts arranged at intervals, one ends of the protruding parts are fixedly arranged in a second area of the first surface of the matrix, the other ends of the protruding parts are fixedly connected with the second surface of the fluid blocking part, the distance between the adjacent protruding parts is larger than 0 and smaller than the particle size of selected particles mixed in the fluid to be treated, the second area of the first surface of the matrix is adjacent to the first area, so that a second fluid channel is formed by matching the plurality of protruding parts, the fluid blocking part and the matrix, and the fluid to be treated can only enter the first fluid channel through the second fluid channel;
the plurality of bosses are disposed around the fluid inlet of the first fluid channel; a plurality of protruding parts are also arranged in a third area of the first surface of the matrix at intervals, and the second area is arranged between the third area and the first area; the first area and the second area of the first surface of the matrix are distributed in orthographic projection on the first surface of the matrix and the fluid barrier; the fluid treatment device further comprises at least one supporting body, wherein more than two supporting bodies are arranged, one end of each supporting body is fixedly connected with the base body, the other end of each supporting body is fixedly connected with the fluid blocking part, and the two or more supporting bodies are symmetrically distributed around the fluid inlet of the first fluid channel;
a third region of the first surface of the substrate disposed around the second region;
more than one supporting beam is erected on the fluid inlet of the first fluid channel, and the supporting beam is fixedly connected with the fluid blocking part;
the convex part is any one of a linear, columnar, flaky, tubular, conical and frustum-shaped structure which is arranged in a standing way;
the transverse section of the convex part has a regular or irregular shape, and the regular shape comprises a polygon, a circle or an ellipse;
the plurality of protruding parts are uniformly distributed or non-uniformly distributed on the first surface of the matrix;
the fluid inlet of the first fluid channel has a regular or irregular shape, the regular shape comprising a polygon, a circle or an ellipse.
2. The fluid treatment device of claim 1, wherein: the convex part is a linear convex part, and the length-diameter ratio of the convex part is 4: 1-200000: 1, a step of; and/or the ratio of the distance between adjacent bosses to the length of the bosses is 1: 4-1: 200000.
3. the fluid treatment device of claim 2, wherein: the protruding parts are vertically arranged micro wires or nano wires, the diameter of the protruding parts is 1 nm-50 mu m, the length of the protruding parts is 50 nm-200 mu m, and the distance between the adjacent protruding parts is 1 nm-50 mu m.
4. A fluid treatment device according to claim 1 or 3, wherein: the plurality of protruding parts distributed in the third area of the first surface of the matrix are distributed to form a micro-scale or nano-scale array structure with super-hydrophobic or super-oleophobic performance.
5. The fluid treatment device of claim 1, wherein: the aperture of the first fluid channel is 1 mu m-1 mm; and/or the thickness of the matrix is more than 1 mu m; and/or the thickness of the fluid barrier is 0.5-200 μm; and/or the surface of the bulge part is also provided with a functional material layer, and the material of the functional material layer comprises a photocatalytic material or an antibacterial material; and/or at least part of at least some of the components in the fluid treatment device are transparent structures.
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