CN107473434A - Fluid treating device and preparation method thereof - Google Patents
Fluid treating device and preparation method thereof Download PDFInfo
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- CN107473434A CN107473434A CN201610399542.XA CN201610399542A CN107473434A CN 107473434 A CN107473434 A CN 107473434A CN 201610399542 A CN201610399542 A CN 201610399542A CN 107473434 A CN107473434 A CN 107473434A
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F9/00—Multistage treatment of water, waste water or sewage
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/001—Processes for the treatment of water whereby the filtration technique is of importance
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F1/00—Treatment of water, waste water, or sewage
- C02F1/30—Treatment of water, waste water, or sewage by irradiation
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2201/00—Apparatus for treatment of water, waste water or sewage
- C02F2201/002—Construction details of the apparatus
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2301/00—General aspects of water treatment
- C02F2301/08—Multistage treatments, e.g. repetition of the same process step under different conditions
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2303/00—Specific treatment goals
- C02F2303/04—Disinfection
-
- C—CHEMISTRY; METALLURGY
- C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
- C02F2305/00—Use of specific compounds during water treatment
- C02F2305/10—Photocatalysts
Landscapes
- Life Sciences & Earth Sciences (AREA)
- Hydrology & Water Resources (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Water Supply & Treatment (AREA)
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Abstract
A kind of fluid treating device and preparation method thereof.The fluid treating device includes：Matrix with first fluid passage, in the first area for the first surface that the fluid intake of the first fluid passage is distributed in described matrix；Flow impedance portion, there is the second surface being oppositely arranged with the first surface；Multiple nanometers of thread like bodies, described nanometer thread like body one end is fixedly arranged in the second area of the first surface, the other end is fixedly connected with the second surface, it is spaced apart between adjacent nano wire body, the second area of the first surface abuts with first area, so that second fluid passage is cooperatively formed between the multiple nanometer thread like body, flow impedance portion and matrix, and pending fluid is only capable of entering first fluid passage by the second fluid passage.The fluid treating device of the application has the characteristics that flux is big, flow resistance is small, energy high-efficient cleaning removes micro-/ nano grade particles in fluid, reusable, service life length, and produces in enormous quantities suitable for scale.
Description
Technical field
The application is more particularly to a kind of device that purified treatment is carried out to the fluid containing particulate matter and preparation method thereof.
Background technology
Daily life, work in, people for remove fluid in particle and make fluid be purified have extensively
Demand.For example, be directed to low-quality air, dust therein, molecule etc. need to be removed, to ensure the health of human body.Again
For example, for water, oil (edible oil, gasoline, diesel oil etc.), particulate matter therein need to be removed, to realize the purifying of water, oil.Example again
Such as, for fields such as biological medicines, it need to remove or screen cell in blood and body fluid, virus, bacterium etc..
Traditional fluid treating device (such as mouth mask, air purifier etc.) has that flux is low, volume is big, using the longevity mostly
Order the defects of short, and it is low for the elimination effect of fine particle in fluid.
In recent years, with the development of micro-nano process technology, researcher has also been proposed some streams based on porous membrane
Body processing equipment, i.e. go out micron or nano level numerous holes by etching (corrosion) on film, make it can apply to clearly
Except the particle in fluid, especially molecule, its size can be precisely controlled.But there is flux and mechanical strength in this device
Between contradiction, flux is big, often mechanical structure is fragile, and mechanical strength is big, flux again very little.This is due to that it processes skill
The limitation of art, if hole is smaller, film thickness just needs thinner, and this also make it that the mechanical support performance of porous membrane is further
Deterioration, can not adapt to adverse circumstances, and service life is also very limited, so so far can't be practical.
Currently there is researcher to utilize sacrificial layer technology, realize the fluid treating device comprising transverse flow channels and (refer to
Shown in Fig. 1), the aperture of these transverse flow channels can be controlled in several nanometers, therefore be beneficial to remove the fine particle in fluid,
But its flux is too small.
The content of the invention
The main purpose of the application is to provide a kind of fluid treating device of improvement and preparation method thereof, existing to overcome
Deficiency in technology.
To realize aforementioned invention purpose, the technical scheme that the application uses includes：
The embodiment of the present application provides a kind of fluid treating device, and it includes：
Matrix with first fluid passage, the first fluid passage have a fluid intake and fluid issuing, and described
The fluid intake of one fluid passage is distributed in the first area of the first surface of described matrix；
Flow impedance portion, the second surface that there is the first surface with described matrix to be oppositely arranged are pending for preventing
Fluid is directly entered the fluid intake of the first fluid passage；
It is distributed in the vertical nanometer wire of complex root that is in the second area of the first surface of described matrix and being spaced
Body, the second area of the first surface of described matrix are set around the first area, the both ends difference of the nanometer thread like body
It is fixedly connected with the first surface of described matrix and the second surface in the flow impedance portion, wherein between adjacent nano wire body
Distance be more than 0 but less than mixing in the particle diameter of the selected particle in pending fluid so that the complex root nano wire
Second fluid passage is cooperatively formed between shape body, flow impedance portion and matrix, and pending fluid is only capable of by described second
Fluid passage enters first fluid passage.
The embodiment of the present application additionally provides a kind of method for preparing fluid treating device, and it includes：
There is provided with first surface and with the first surface mutually back to the 3rd surface substrate；
Growth forms the vertical nanometer thread like body of complex root being spaced on the first surface of the substrate, wherein adjacent
The distance between nanometer thread like body is more than 0 but is less than and mixes in the particle diameter of the selected particle in pending fluid；
The second surface being oppositely arranged with the first surface with the substrate is set on the first surface of the substrate
Flow impedance portion, and at least make the complex root nanometer thread like body that is distributed in the second area of the first surface of the substrate with
The second surface in the flow impedance portion is fixedly connected；
3rd surface of the substrate is processed, formed through the substrate first fluid passage, described first
The fluid intake of fluid passage is distributed in the first area of the first surface of the substrate, and the of the first surface of the substrate
Two regions are set around the first area, make the complex root nanometer being distributed in the second area of the first surface of the substrate
Second fluid passage is cooperatively formed between thread like body, flow impedance portion and substrate, and pending fluid is only capable of by described
Two fluid passages enter first fluid passage.
Than prior art, the fluid treating device that the application provides is at least with flux is big, flow resistance is small, energy high-efficient cleaning removes
In fluid the features such as micro-/ nano grade particles, thicker matrix can be also used, high mechanical strength, can clean and be used for multiple times, make
With long lifespan, and preparation technology is simply controllable, is prepared on a large scale suitable for scale.
Brief description of the drawings
, below will be to embodiment or existing in order to illustrate more clearly of the embodiment of the present application or technical scheme of the prior art
There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this
Some embodiments described in application, for those of ordinary skill in the art, on the premise of not paying creative work,
Other accompanying drawings can also be obtained according to these accompanying drawings.
Fig. 1 is a kind of sectional view of the fluid treating device comprising transverse flow channels in the prior art；
Fig. 2 is a kind of sectional view of fluid treating device in the application first embodiment；
Fig. 3 a- Fig. 3 e are a kind of transverse direction of nanometer thread like body in fluid treating device in the application some typical embodiments
Sectional view；
Fig. 4 a- Fig. 4 c are a kind of arrangement of nanometer thread like body in fluid treating device in the application some typical embodiments
Schematic diagram；
Fig. 5 a- Fig. 5 c are the top view of multiple fluid processing unit in the application first embodiment；
Fig. 6 is a kind of sectional view of fluid treating device in the application second embodiment；
Fig. 7 is a kind of sectional view of fluid treating device in the application 3rd embodiment；
Fig. 8 is a kind of sectional view of fluid treating device in the application fourth embodiment；
Fig. 9 is a kind of sectional view of fluid treating device in the embodiment of the application the 5th；
Figure 10 is a kind of preparation technology flow chart of fluid treating device in the exemplary embodiments of the application one.
Embodiment
In view of deficiency of the prior art, inventor is able to propose the application's through studying for a long period of time and largely putting into practice
Technical scheme.The technical scheme, its implementation process and principle etc. will be further explained as follows.
A kind of fluid treating device that the one side of the embodiment of the present application proposes includes：
Matrix with first fluid passage, the first fluid passage have a fluid intake and fluid issuing, and described
The fluid intake of one fluid passage is distributed in the first area of the first surface of described matrix；
Flow impedance portion, the second surface that there is the first surface with described matrix to be oppositely arranged are pending for preventing
Fluid is directly entered the fluid intake of the first fluid passage；
It is distributed in the vertical nanometer wire of complex root that is in the second area of the first surface of described matrix and being spaced
Body, the second area of the first surface of described matrix are set around the first area, the both ends difference of the nanometer thread like body
It is fixedly connected with the first surface of described matrix and the second surface in the flow impedance portion, wherein between adjacent nano wire body
Distance be more than 0 but less than mixing in the particle diameter of the selected particle in pending fluid so that the complex root nano wire
Second fluid passage is cooperatively formed between shape body, flow impedance portion and matrix, and pending fluid is only capable of by described second
Fluid passage enters first fluid passage.
Wherein, described matrix can be various forms, such as cuboid shape, sheet, polyhedral, hemispherical, spherical
Or other irregular forms.Therefore, described " first surface " can be any one unspecific conjunction in described matrix
Suitable plane or curved surface.
Wherein, the first fluid passage can be the through hole of any form, and its fluid intake is distributed in described matrix
On first surface, and its fluid issuing can be both distributed on another surfaces different from the first surface of described matrix
(for example, another surface can it is adjacent with the first surface, mutually back to), can also be distributed on described first surface (when
So in this case, described first surface Shang Yingyou fluid barriers mechanism, make pending fluid will not be described first
The fluid outlet is flowed to directly on a surface.In some cases, the fluid issuing of the first fluid passage be also can
To be distributed in inside described matrix, for example, when existing in described matrix to receive the cavity of the fluid after processing.
Wherein, the flow impedance portion can also be variform, for example, can be sheet, shell shape, cuboid shape,
Polyhedral etc., if its can make pending fluid will not from by the complex root nanometer thread like body, flow impedance portion with
Fluid passage outside the second fluid passage cooperatively formed between matrix enters the fluid intake of described first fluid passage
.And the setting form in the flow impedance portion can also be various, for example, it integrally can set with described matrix interval
Put, locally can be also connected with described matrix, or even in some cases, to be formed also but with described matrix by being integrally machined.
Wherein, described complex root nanometer thread like body refers to two or more nanometer of thread like body.Wherein described nano wire
The form of shape body can be various, for example, it can be to be vertically arranged that (herein vertical is primarily referred to as and described matrix
The perpendicular or generally perpendicular direction of first surface) wire, column, tubulose, the rule such as taper or irregular structure, and its transverse direction
Cross section structure (transverse direction herein, being primarily referred to as the direction parallel with the first surface of described matrix) can also be rule or not advise
Then shape, such as can be polygon (triangle, quadrangle or other), circle, ellipse, star etc. (refer to Fig. 3 a-
Fig. 3 e).
Wherein, described complex root nanometer thread like body can it is regular or irregular, uniform or it is heterogeneous be distributed in it is described
(Fig. 4 a- Fig. 4 c is referred on the first surface of matrix).
Wherein, the fluid intake of the first fluid passage have rule or irregular shape, such as polygon (rectangle,
Rhombus is other), circular or ellipse etc., it can simply be adjusted according to the demand of practical application.
Wherein, described pending fluid can be gas phase or liquid phase, such as empty gas and water, oils, in some situations
The set of particulate matter lower or in flow-like, or molten state of Cucumber etc..
Wherein, described " particle " is primarily referred to as solid phase particles, but in some cases, can also be and the fluid
(particularly liquid phase fluid) incompatible drop etc..
Wherein, the second area of the first surface of described matrix is set around the first area.Particularly, it is distributed in institute
The complex root nanometer thread like body for stating second area is set around the fluid intake of the first fluid passage.Such setting shape
Formula, composition of the gap that can make to be distributed between the complex root nanometer thread like body of the second area as second fluid passage
Part, so as to obtain larger fluid flux.
In some more preferred embodiment, also it is arranged at intervals with the 3rd region of the first surface of described matrix
Complex root nanometer thread like body, the 3rd region are set around the second area.Wherein, it is distributed in answering for the 3rd region
The top of several nanometers of thread like bodies can be connected with the flow impedance portion, can not be also connected with the flow impedance portion, particularly,
When be connected at the top of these nanometer of thread like body with the flow impedance portion, then the gap between these nanometer of thread like body top is also
Fluid passage is may make up, so as to further increase the contact surface of the fluid treating device and fluid, lifting fluid flux.
Further, it is distributed in the nanometer thread like body in the 3rd region and is distributed in the nanometer wire of the second area
Body can be identical or different.It is particularly preferred, the 3rd region or the second area no matter are distributed across, as long as
The distance between adjacent nano wire body of the first surface of described matrix is distributed across to be all higher than 0 but be less than to mix in pending
Fluid in selected particle particle diameter.
More preferable, the first area of the first surface of described matrix and second area are distributed in the flow impedance portion
In in the orthographic projection on the first surface of described matrix.
More preferable, the nanometer thread like body is wire or columnar projections, and its draw ratio is 4：1~200000：1, and
The distance between adjacent nano wire body and the ratio of the length of the nanometer thread like body are 1：4~1：200000.By using
The nanometer thread like body of this structure and distributional pattern, multiple nanometers of thread like bodies can be made intensive can to arrange (nanometer thread like body itself
Proportion is few in unit area), handled beneficial to the molecule in convection body, while also assign the fluid processing
The larger fluid flux of device (hole between nanometer thread like body is bigger than nanometer thread like body own vol).
Especially preferred, a diameter of 1nm~50 μm of the nanometer thread like body, length is 50nm~200 μm, adjacent nano
The distance between thread like body is 1nm~50 μm, can so enable particle diameter in the fluid treating device treatment fluid of structure formation
As low as nano level particle, and keep higher fluid processing flux.
Further, it is distributed in the complex root nanometer thread like body arrangement shape in the 3rd region of the first surface of described matrix
Into the array structure with super-hydrophobic or superoleophobic performance.In this way, it can also assign the functions such as the fluid treating device automatically cleaning.
It is it is of course also possible to suitable low as known to industry by being set on the partially or fully surface of the nanometer thread like body
The coating that surface energy substance is formed, or the nanometer thread like body directly is formed using hydrophobic material, it is super-hydrophobic so as to make it have
Performance, self-cleaning performance etc..
In some more specific embodiment, the aperture of the first fluid passage can be 1 μm~1mm.
In some more specific embodiment, the thickness of described matrix is more than 1 μm.
Wherein, the material of described matrix can be selected from metal, nonmetallic, organic material, inorganic material etc., such as silicon chip,
Polymer, ceramics etc., and not limited to this.
In some more preferred embodiment, the nanometer thread like body may be selected from CNT, silicon nanowires, Yin Na
Any of rice noodles, nanowires of gold, zinc oxide nanowire, gallium nitride nano-wire etc. or two or more combinations, but be not limited to
This.
In some concrete application schemes, the nanometer thread like body can be by catalysis material or with antibacterial, sterilization work(
The material of energy is formed, or, the nanometer thread like body can also be surface covered with catalysis material or with sterilization, antibacterial work(
The coating that the material of energy is formed.For example, the nanometer thread like body can use zinc oxide nanowire, gallium nitride nano-wire etc. to have light
The nano wire of the property of catalysis, under light auxiliary irradiation, the organic matter in the fluid that can degrade.For example, the nanometer thread like body
Ag nano wires, Au nano wires etc. can be used, to kill the bacterium in fluid, virus, microorganism.
In some more specific embodiment, the thickness in the flow impedance portion is 0.5 μm~200 μm.
In some more preferred embodiment, the fluid treating device may also include at least one supporter, institute
State supporter one end to be fixedly connected with described matrix, the other end is fixedly connected with the flow impedance portion.By the supporter,
The more cooperation of firm stable between flow impedance portion and matrix can be achieved, and can be effectively to being distributed in flow impedance portion and base
Nanometer wire body between body forms protection, avoids, because flow impedance portion and/or matrix by external force after being acted on, receiving to described
The extruding of rice thread like body and caused by nanometer thread like body the problems such as caving in, damaging.
Wherein, the supporter can be variform, such as column (cylinder, polygon prism etc.), step-like, frustum
Deng, and not limited to this, its flexural capacity should be greater than any described nanometer thread like body.And the supporter can flowed
Processing forms or is integrally machined and to be formed with matrix or flow impedance portion between body stop part and matrix.
Further, described supporter can be two or more, and the two or more supporter is symmetrically distributed in institute
Around the fluid intake for stating first fluid passage.
In some more preferred embodiment, one can have also been set up on the fluid intake of the first fluid passage
Beam supported above, the support beam are fixedly connected with the flow impedance portion, are formed and supported to convection body stop part, further
Lift the structural strength of the fluid treating device.
Further, the support beam can be more, its can with parallel arrangement the first fluid passage fluid
On entrance.
In some more preferred embodiment, the nanometer wire body surface face is additionally provided with function material layer, described
The material of function material layer includes catalysis material, anti-biotic material etc., and not limited to this.For example, more typical photocatalysis
Material can be titanium dioxide etc., when the fluid treating device convection body comprising this kind of function material is handled, if being aided with
Ultraviolet lighting etc., some organic pollutions that can also be in convection body etc. carries out photocatalytic degradation, realizes the multiple purifying of convection body.
In another example more typical anti-biotic material can be the noble metals such as Au, Ag, by its can in the processing procedure of fluid,
Synchronously kill bacterium in fluid, virus etc..
Further, for the benefit of light penetrates, and at least local of at least part component in the fluid treating device is
Transparent configuration.For example, can partly or entirely be made of clear material in the flow impedance portion, matrix, nanometer thread like body.
A kind of preparation method for fluid treating device that the other side of the embodiment of the present application proposes includes：
There is provided with first surface and with the first surface mutually back to the 3rd surface substrate；
Growth forms the vertical nanometer thread like body of complex root being spaced on the first surface of the substrate, wherein adjacent
The distance between nanometer thread like body is more than 0 but is less than and mixes in the particle diameter of the selected particle in pending fluid；
The second surface being oppositely arranged with the first surface with the substrate is set on the first surface of the substrate
Flow impedance portion, and at least make the complex root nanometer thread like body that is distributed in the second area of the first surface of the substrate with
The second surface in the flow impedance portion is fixedly connected；
3rd surface of the substrate is processed, formed through the substrate first fluid passage, described first
The fluid intake of fluid passage is distributed in the first area of the first surface of the substrate, and the of the first surface of the substrate
Two regions are set around the first area, make the complex root nanometer being distributed in the second area of the first surface of the substrate
Second fluid passage is cooperatively formed between thread like body, flow impedance portion and substrate, and pending fluid is only capable of by described
Two fluid passages enter first fluid passage.
In some more specific embodiment, described preparation method, it is characterised in that including：
The complex root nanometer thread like body to be formed and be spaced is grown in the first surface of the substrate；
Soluble or corrodible organic matter and/or inorganic matter are coated with the first surface of the substrate, and makes organic matter
And/or the gap between the inorganics filled complex root nanometer thread like body, form sacrifice layer；
First photoresist mask is set on the sacrifice layer, then the sacrifice layer is performed etching, at least makes to be distributed in
Exposed at the top of complex root nanometer thread like body in the second area of the first surface of the substrate, remove first light afterwards
Resist mask；
The second mask is set in the first surface of the substrate, and makes on the substrate first surface and fluid
The corresponding region of stop part exposes, and deposition forms flow impedance portion afterwards, then removes second mask；
Patterned 3rd photoresist mask, then the 3rd table to the substrate are set on the 3rd surface of the substrate
Face performs etching, until exposing the expendable material being filled between adjacent nano wire body, so as in the 3rd table of the substrate
Face forms slotted eye, and the slotted eye position is corresponding with the first area of the first surface of the substrate, and the of the substrate
The second area on one surface is set around the first area,
The 3rd photoresist mask and the expendable material being filled between the complex root nanometer thread like body are removed, in institute
State and the first fluid passage is formed on substrate.
The technical scheme of the application is further described below with reference to accompanying drawing and some embodiments.It should be noted
It is that only being carried out to the structure of the application fluid treating device and related device shown in accompanying drawing is simply illustrative, therefore
Non- accurate Drawing goes out the size of wherein each component, size etc..
Refer to shown in Fig. 2 and Fig. 5 a- Fig. 5 b, in the first embodiment of the application, a kind of fluid treating device includes
Matrix 101, described matrix 101 has first surface 101a, and (dotted line encloses in figure for the first area 1011 of described matrix 101
Region) some through holes 104 as fluid passage are distributed with, be provided with the first surface more vertical nano wires and/
Or the array that nanotube (abbreviation nano wire/pipe) 103 is formed, it is distributed in the second area 1012 of first area 1011
The top for more nano wire/pipes 103 that the through hole 104 is distributed is also associated with flow impedance portion 102, the flow impedance portion
102 are arranged above the fluid intake of the through hole 104, pending fluid can not be bypassed foregoing nano wire/pipe array
And the through hole 104 is directly entered, the flow impedance portion 102 has the second table being oppositely arranged with the first surface 101a
Face 102b.And also can more of dense distribution in remaining region 1013 (the 3rd region can be named as) of the first surface 101a
Vertical nano wire/pipe 103.In fig. 2, the arrow with dotted line shows the direct of travel of fluid.
Wherein, because foregoing nano wire/pipe has larger ratio of height to diameter (or draw ratio) so that these nano wire/pipes can
The densely arranged first surface in described matrix, by the spacing for adjusting these nano wire/pipes, you can different-grain diameter in convection body
The particle of scope, it is special than being that atomic small particle is purged processing, while because nano wire/pipe diameter itself is minimum, can also make
It is controlled in very low level for the resistance of fluid, and forms very big fluid flux, far superior to existing perforated membrane,
Fluid treating device based on transverse flow channels etc..
Wherein, if with reference to known to industry scheme, foregoing nano wire/pipe array is carried out to certain design, can also be made
Formation super-drainage structure, superoleophobic structure, can not only remove the particle in fluid, and can also make by automatic cleaning action
The particle being blocked can not gather in the functional area (nano wire/pipe array surface) of the fluid treating device, avoid described
Fluid treating device fails after long-term use.
Wherein, described matrix 101 can have larger thickness, it is formed preferably foregoing nano wire/pipe array
Support, while can be increased further the mechanical strength of the fluid treating device, make that the fluid treating device is pressure-resistant, bending resistance
Folding, impact resistant, impact resistance, and then it is applied and will not be damaged in a variety of environment, for example, can apply to high pressure,
High-velocity fluid is handled, and this function is that existing perforated membrane etc. can not be reached.
Wherein, the flow impedance portion can be that sheet, its thickness etc. can adjust according to practical application request.
Wherein, the material selection range of the fluid treating device each several part (101,102,103,104) is various, can
To be inorganic material or organic material, for example, metal, non-metal inorganic material, plastics, ceramics, semiconductor, glass,
Polymer etc..When these parts all select to use inorganic material, the fluid treating device also has the spy of resistance to temperature change
Property, high temperature and cryogen can be handled.
Using previous designs described fluid treating device can (ultrasound) cleaning, be used for multiple times, and remain on good
Good fluid handling abilities.
When being handled using described fluid treating device convection body, the fluid containing impurity particle is stated before entry
During the array that nano wire/pipe 103 forms, wherein particle diameter be more than certain numerical value particle (or some drops incompatible with fluid,
Such as the water droplet in the water droplet or oil in air) be blocked in outside foregoing nano wire/pipe array, fluid is via each nanometer afterwards
Gap between line/pipe enters back into through hole 104 after reaching the porch of through hole 104, realizes the purification of convection body and/or to institute
Need the enriching and recovering of particle (drop).
Referring to shown in Fig. 2, in some concrete application schemes of the first embodiment, foregoing nano wire/pipe
Diameter can be 1nm~50 μm, length (height) h1Can be that the distance between 50nm~200 μm, adjacent nanowires/pipe can be with
For 1nm~50 μm.The aperture w of the through hole 104 can be 1 μm~1mm.The thickness h of described matrix2Can be more than 1 μm.Institute
State the thickness h in flow impedance portion3It can be 0.5 μm~200 μm.
Referring to Fig. 3 a- Fig. 3 e, the lateral cross section structure of foregoing nano wire/pipe can be rule or irregular shape
, such as can be polygon (triangle, quadrangle or other), circle, ellipse, star etc..
Referring to Fig. 4 a- Fig. 4 c, foregoing nano wire/pipe can regular or irregular, uniform or distribution heterogeneous
On the first surface of described matrix.In some more specific application schemes, the average headway of adjacent nanowires/pipe exists
1nm~50 μm.
In addition, refer to Fig. 5 a- Fig. 5 c, in this first embodiment, the shape in aforementioned through-hole 104 and flow impedance portion 102
Shape (the particularly shape of lateral cross section) can be various, such as can be circular, square, rectangle or other shapes.
Refer to shown in Fig. 6, more preferably, in the second embodiment of the application, a kind of fluid treating device includes
Matrix 201, described matrix 201 have first surface 2011 and with the first surface mutually back to the 3rd surface (do not show in figure
Go out), and some through holes 204 as fluid passage are distributed with described matrix 201, more are provided with the first surface and is erected
The array that straight nano wire/pipe 203 is formed, it is also associated with around the top of more nano wire/pipes 203 of the through hole 204 distribution
Flow impedance portion 202, the flow impedance portion 202 are arranged above the fluid intake of the through hole 204, make pending fluid
Foregoing nano wire/pipe array can not be bypassed and be directly entered the through hole 204.It is also, also symmetrical around the through hole 204
Or it is asymmetric more than one, such as four supporters 205 are distributed with, can also increase to described by the supporter 205
The support in flow impedance portion 202, the more cooperation of firm stable between flow impedance portion and matrix is realized, and can be effectively to dividing
Nano wire of the cloth between flow impedance portion and matrix/pipe array forms protection, avoid because flow impedance portion and/or matrix by
After being acted on to external force, the problems such as nano wire/pipe 203 caused by the extruding of foregoing nano wire/pipe array caves in, damaged.
Wherein, the supporter can be variform, such as can have rectangle, trapezoidal, step longitudinal cross-section
(longitudinal direction herein can be regarded as perpendicular to the direction of described matrix first surface) etc., and not limited to this.In second implementation
In some specific embodiments of example, the supporter can be to project upwards the boss to be formed from the edge part of through hole 204
Deng its upper end connection flow impedance portion 202.
Wherein, the quantity of the supporter, diameter, distribution density etc. can adjust according to being actually needed, but it is few to try one's best
Occupancy described matrix first surface space, avoid its fluid flux to the nano wire/pipe from causing big influence.
The structure of matrix, nano wire/pipe array, flow impedance portion, through hole employed in the second embodiment etc., set
Form, material etc. can with address above it is same or similar, so here is omitted.
Refer to shown in Fig. 7, more preferably, in the 3rd embodiment of the application, a kind of fluid treating device includes
Matrix 301, described matrix 301 have first surface 3011 and with the first surface mutually back to the 3rd surface (do not show in figure
Go out), and some through holes 304 as fluid passage are distributed with described matrix 301, more are provided with the first surface and is erected
The array that straight nano wire/pipe 303 is formed, it is also associated with around the top of more nano wire/pipes 303 of the through hole 304 distribution
Flow impedance portion 302, the flow impedance portion 302 are arranged above the fluid intake of the through hole 304, make pending fluid
Foregoing nano wire/pipe array can not be bypassed and be directly entered the through hole 304.Also, also being set up on the through hole 304 has
More than one, such as the more support beams 305 symmetrically or non-symmetrically arranged, it can also increase to institute by the support beam 305
The support in flow impedance portion 302 is stated, realizes the more cooperation of firm stable between flow impedance portion and matrix, and can be effectively right
Nano wire/pipe the array being distributed between flow impedance portion and matrix forms protection, avoids because flow impedance portion and/or matrix exist
After being acted on by external force, the problems such as nano wire/pipe 303 caused by the extruding of foregoing nano wire/pipe array caves in, damaged.
Wherein, the support beam can be variform, such as can be with arch-shaped etc., and not limited to this.And further
, the support beam can also coordinate with other supporters, such as the supporter addressed in second embodiment coordinates.
Wherein, the quantity of the support beam, size, distribution density etc. can adjust according to being actually needed, but it is few to try one's best
The fluid intake for blocking the through hole, avoid its fluid flux to the fluid treating device from causing big influence.
The structure of matrix, nano wire/pipe array, flow impedance portion, through hole employed in the 3rd embodiment etc., set
Form, material etc. can with address above it is same or similar, so here is omitted.
Refer to shown in Fig. 8, more preferably, in the fourth embodiment of the application, a kind of fluid treating device includes
Matrix 401, described matrix 401 have first surface 4011 and with the first surface mutually back to the 3rd surface 4012, it is and described
Some through holes 404 as fluid passage are distributed with matrix 401, more vertical nano-pillars are provided with the first surface
403 arrays formed, flow impedance portion 402 is also associated with around the top of more nano-pillars 403 of the through hole 304 distribution,
The flow impedance portion 402 is arranged above the fluid intake of the through hole 404, pending fluid is not bypassed foregoing
Nano column array and be directly entered the through hole 304.Also, in the surface of nano-pillar 403 and the first table of described matrix 401
Layers of photo-catalytic material 405 is additionally provided with face.At with the fluid treating device convection body comprising layers of photo-catalytic material 405
During reason, if being aided with ultraviolet lighting etc., some organic pollutions that can also be in convection body etc. carry out photocatalytic degradation, realize convection body
Multiple purifying.
Wherein, for the benefit of light penetrates, and part or all of in the flow impedance portion, matrix, nanometer thread like body can be with
It is made of clear material.In some specific embodiments of the present embodiment, the flow impedance portion can be integrally by transparent material
Material is made, such as light is injected.
Wherein, more typical catalysis material can be titanium dioxide etc., but not limited to this.
Wherein, to form the layers of photo-catalytic material 405, those skilled in the art can use a variety of sides known to industry
Formula, for example, coating (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald),
Sputtering etc., and not limited to this.
Wherein, the thickness of the layers of photo-catalytic material 405 can be controlled in nanoscale, to reduce it to the stream as far as possible
The influence of the fluid flux of body processing unit.
The structure of matrix, nano wire/pipe array, flow impedance portion, through hole employed in the fourth embodiment etc., set
Form, material etc. can with address above it is same or similar, so here is omitted.
Refer to shown in Fig. 9, more preferably, in the 5th embodiment of the application, a kind of fluid treating device includes
Matrix 501, described matrix 501 have first surface 5011 and with the first surface mutually back to the 3rd surface 5012, it is and described
Some through holes 504 as fluid passage are distributed with matrix 501, more vertical nano-pillars are provided with the first surface
503 arrays formed, flow impedance portion 502 is also associated with around the top of more nano-pillars 503 of the through hole 504 distribution,
The flow impedance portion 502 is arranged above the fluid intake of the through hole 504, pending fluid is not bypassed foregoing
Nano column array and be directly entered the through hole 504.Also, in the surface of nano-pillar 503 and the first table of described matrix 501
Anti-biotic material layer 505 is additionally provided with face.Handled with the fluid treating device convection body comprising anti-biotic material layer 505
When, bacterium in fluid, virus etc. can be synchronously killed in the processing procedure of fluid, realize the multiple purifying of convection body.
Wherein, more typical anti-biotic material can be noble metals such as Au, Ag etc., but not limited to this.
Wherein, to form the anti-biotic material layer 505, those skilled in the art can use a variety of sides known to industry
Formula, for example, coating (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald),
Sputtering etc., and not limited to this.
Wherein, the thickness of the anti-biotic material layer 505 can be controlled in nanoscale, to reduce it to the fluid as far as possible
The influence of the fluid flux of processing unit.
The structure of matrix, nano wire/pipe array, flow impedance portion, through hole employed in 5th embodiment etc., set
Form, material etc. can with address above it is same or similar, so here is omitted.
The fluid treating device of the application can prepare by physics, chemical method, such as can be chemically grown
Method, Physical Processing method etc., particularly MEMS (MEMS, Microelectromechanical Systems) method etc..
For example, refer to shown in Figure 10, in the sixth embodiment of the application, a kind of preparation technology of fluid treating device
It may include steps of：
S1：The more vertical nano wire/pipes to be formed and be intervally installed are grown in the first surface of substrate (such as silicon chip)；
S2：Soluble or corrodible organic matter and/or inorganic matter are coated with the first surface of the substrate, and is made organic
Gap between thing and/or inorganics filled each vertical nano wire/pipe, forms sacrifice layer；
S3：Photoresist is set on the sacrifice layer, and carries out photoetching；
S4：The sacrifice layer is performed etching, makes to be distributed in more in the second area of the first surface of the substrate
Exposed at the top of vertical nano wire, remove photoresist afterwards；
S5：The substrate first surface set photoresist mask, and make it is on the substrate first surface, with it is described
The corresponding region in flow impedance portion exposes；
S6：Deposition forms flow impedance portion in region expose, corresponding with the flow impedance portion；
S7：Peel off and remove photoresist；
S8：The substrate and first surface mutually back to the 3rd surface on patterned etching mask is set；
S9：3rd surface of the substrate is performed etching, until expose be filled in it is sacrificial between neighboring vertical nano wire
Domestic animal material, so as to form slotted eye, the slotted eye position and the first surface of the substrate on the 3rd surface of the substrate
First area it is corresponding, the second area of the first surface of the substrate is set around the first area；
S10：The etching mask and the expendable material being filled between each vertical nano-wire are removed, fluid processing dress is made
Put.
To form the mode of vertical nano wire/pipe to grow in abovementioned steps and can be selected from MOCVD, PECVD, electrochemistry and sink
The various ways known to industry such as product.
The lithographic method used in These steps can be photoetching, Mechanical lithography, dry etching, wet etching etc..
For example, the method for the photoresist mask of graphical (nano graph) is formed in abovementioned steps to be included：Photoetching technique, receive
Nano-sphere mask technique, nanometer (metal) particle mask technology etc., and not limited to this.
For example, mode known to industry, such as RIE, ICP, wet etching, electrochemical corrosion can be passed through in abovementioned steps
Performed etching Deng to substrate.
For example, in abovementioned steps, the dissolved organic matter of filling can be photoresist etc. or corrodible inorganic matter such as gold
Category, SiO2, SiN etc..
Obviously, the preparation technology of the application fluid treating device is simple controllable, is adapted to mass large-scale production.
It should be appreciated that above-described embodiment is only the technical concepts and features for illustrating the application, its object is to allow be familiar with this
The personage of item technology can understand present context and implement according to this, and the protection domain of the application can not be limited with this.It is all
The equivalent change or modification made according to the application Spirit Essence, it should all cover within the protection domain of the application.
Claims (11)
- A kind of 1. fluid treating device, it is characterised in that including：Matrix with first fluid passage, the first fluid passage has fluid intake and fluid issuing, described first-class The fluid intake of body passage is distributed in the first area of the first surface of described matrix；Flow impedance portion, the second surface that there is the first surface with described matrix to be oppositely arranged, for preventing pending fluid It is directly entered the fluid intake of the first fluid passage；The vertical nanometer thread like body of complex root that is in the second area of the first surface of described matrix and being spaced is distributed in, The second area of the first surface of described matrix is set around the first area, the both ends of the nanometer thread like body respectively with institute State the first surface of matrix and the second surface in the flow impedance portion be fixedly connected, wherein between adjacent nano wire body away from From more than 0 but less than mixing in the particle diameter of the selected particle in pending fluid, so that the complex root nanometer thread like body, Second fluid passage is cooperatively formed between flow impedance portion and matrix, and pending fluid is only capable of leading to by the second fluid Road enters first fluid passage.
- 2. fluid treating device according to claim 1, it is characterised in that：3rd region of the first surface of described matrix The complex root nanometer thread like body being intervally installed inside also is distributed with, the 3rd region of the first surface of described matrix is around described Second area is set.
- 3. fluid treating device according to claim 1 or 2, it is characterised in that：The vertical nanometer thread like body is in situ raw It is longer than the first surface of described matrix.
- 4. fluid treating device according to claim 1 or 2, it is characterised in that：The nanometer thread like body include nano wire, Any one in nano-pillar, nanotube；And/or described complex root nanometer thread like body is uniformly distributed or non-uniform Distribution exists On the first surface of described matrix；And/or the draw ratio of the nanometer thread like body is 4：1~200000：1；And/or adjacent receive The distance between rice thread like body and the ratio of the length of the nanometer thread like body are 1：4~1：200000；And/or described first There is the fluid intake of fluid passage rule or irregular shape, the regular shape to include polygon, circle or ellipse.
- 5. fluid treating device according to claim 4, it is characterised in that：A diameter of 1nm of the nanometer thread like body~ 50 μm, length is that the distance between 50nm~200 μm, adjacent nano wire body are 1nm~50 μm；And/or the nanometer wire Body includes any one in CNT, silicon nanowires, nano silver wire, nanowires of gold, zinc oxide nanowire, gallium nitride nano-wire Kind.
- 6. fluid treating device according to claim 2, it is characterised in that：It is distributed in the of the first surface of described matrix The complex root nanometer thread like body in three regions arranges to form the array structure with super-hydrophobic or superoleophobic performance.
- 7. fluid treating device according to claim 1, it is characterised in that：The fluid treating device also includes at least one Individual supporter, described supporter one end are fixedly connected with described matrix, and the other end is fixedly connected with the flow impedance portion.
- 8. fluid treating device according to claim 7, it is characterised in that：The fluid treating device includes two or more Described supporter, and the supporter described in the two or more is symmetrically distributed in the fluid intake week of the first fluid passage Enclose.
- 9. fluid treating device according to claim 1, it is characterised in that：On the fluid intake of the first fluid passage Erection has a beam supported above, and the support beam is fixedly connected with the flow impedance portion；And/or the first fluid leads to The aperture in road is 1 μm~1mm；And/or the thickness of described matrix is more than 1 μm；And/or the thickness in the flow impedance portion is 0.5 μm~200 μm；And/or the nanometer wire body surface face is additionally provided with function material layer, the material of the function material layer Including catalysis material or anti-biotic material；And/or at least local of at least part component in the fluid treating device is Bright structure.
- 10. the preparation method of fluid treating device any one of claim 1-9, it is characterised in that including：There is provided with first surface and with the first surface mutually back to the 3rd surface substrate；Growth forms the vertical nanometer thread like body of complex root being spaced, wherein adjacent nano on the first surface of the substrate The distance between thread like body is more than 0 but is less than and mixes in the particle diameter of the selected particle in pending fluid；The stream for the second surface being oppositely arranged with the first surface with the substrate is set on the first surface of the substrate Body stop part, and at least make the complex root nanometer thread like body that is distributed in the second area of the first surface of the substrate with it is described The second surface in flow impedance portion is fixedly connected；3rd surface of the substrate is processed, forms the first fluid passage through the substrate, the first fluid The fluid intake of passage is distributed in the first area of the first surface of the substrate, the secondth area of the first surface of the substrate Domain is set around the first area, makes the complex root nanometer wire being distributed in the second area of the first surface of the substrate Second fluid passage is cooperatively formed between body, flow impedance portion and substrate, and pending fluid is only capable of by the second Body passage enters first fluid passage.
- 11. preparation method according to claim 10, it is characterised in that including：The complex root nanometer thread like body to be formed and be spaced is grown in the first surface of the substrate；The first surface coating of the substrate is soluble or corrodible organic matter and/or inorganic matter, and make organic matter and/or Gap between the inorganics filled complex root nanometer thread like body, form sacrifice layer；First photoresist mask is set on the sacrifice layer, then the sacrifice layer is performed etching, at least makes to be distributed in described Exposed at the top of complex root nanometer thread like body in the second area of the first surface of substrate, remove first photoresist afterwards Mask；The second mask is set in the first surface of the substrate, and makes on the substrate first surface and flow impedance The corresponding region in portion exposes, and deposition forms flow impedance portion afterwards, then removes second mask；Patterned 3rd photoresist mask is set on the 3rd surface of the substrate, then the 3rd surface of the substrate is entered Row etching, until exposing the expendable material being filled between adjacent nano wire body, so as in the 3rd surface shape of the substrate Into slotted eye, the slotted eye position is corresponding with the first area of the first surface of the substrate, the first table of the substrate The second area in face is set around the first area,The 3rd photoresist mask and the expendable material being filled between the complex root nanometer thread like body are removed, in the lining The first fluid passage is formed on bottom.
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610399542.XA CN107473434B (en) | 2016-06-07 | 2016-06-07 | Fluid treatment device and preparation method thereof |
| PCT/CN2017/086780 WO2017211215A1 (en) | 2016-06-07 | 2017-06-01 | Fluid processing device and preparation method therefor |
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201610399542.XA CN107473434B (en) | 2016-06-07 | 2016-06-07 | Fluid treatment device and preparation method thereof |
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| US20040262636A1 (en) * | 2002-12-09 | 2004-12-30 | The Regents Of The University Of California | Fluidic nanotubes and devices |
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| US20060159916A1 (en) * | 2003-05-05 | 2006-07-20 | Nanosys, Inc. | Nanofiber surfaces for use in enhanced surface area applications |
| US20070190880A1 (en) * | 2004-02-02 | 2007-08-16 | Nanosys, Inc. | Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production |
| US20100173070A1 (en) * | 2004-02-02 | 2010-07-08 | Nanosys, Inc. | Porous Substrates, Articles, Systems and Compositions Comprising Nanofibers and Methods of Their Use and Production |
| CN104505335A (en) * | 2014-12-16 | 2015-04-08 | 东南大学 | Manufacture method of controllable silicon nanowire array within two-dimensional plane |
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| CN1658972A (en) * | 2002-06-07 | 2005-08-24 | 阿米克股份公司 | Micro fluidic structures |
| US20040262636A1 (en) * | 2002-12-09 | 2004-12-30 | The Regents Of The University Of California | Fluidic nanotubes and devices |
| US20060159916A1 (en) * | 2003-05-05 | 2006-07-20 | Nanosys, Inc. | Nanofiber surfaces for use in enhanced surface area applications |
| US20070190880A1 (en) * | 2004-02-02 | 2007-08-16 | Nanosys, Inc. | Porous substrates, articles, systems and compositions comprising nanofibers and methods of their use and production |
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