CN107807001A

CN107807001A - Strainability test system and method

Info

Publication number: CN107807001A
Application number: CN201711001184.3A
Authority: CN
Inventors: 史文琪; 蔡勇; 吴庆; 王林军
Original assignee: Suzhou Institute of Nano Tech and Nano Bionics of CAS; University of Shanghai for Science and Technology
Current assignee: Suzhou Institute of Nano Tech and Nano Bionics of CAS; University of Shanghai for Science and Technology
Priority date: 2017-10-24
Filing date: 2017-10-24
Publication date: 2018-03-16
Anticipated expiration: 2037-10-24
Also published as: CN107807001B

Abstract

The invention discloses a kind of strainability test system and method.The test system includes：Source chamber, to carry source gas；Cushion chamber, to make the source gas and carrier gas be thoroughly mixed to form the test gas containing pollutant；Carrier gas source, to provide carrier gas to cushion chamber；Steam generation cavity, to provide the clean test gas of moisture content；Gas detection module, to detect the pollutant concentration tested in gas from the gas suction side of filter to be tested, gas exhalation end input/output；The gas access of the cushion chamber connects with the gas vent of the gas vent of source chamber, carrier gas source, and the gas exhalation end of the filter to be tested connects with the moisture outlet of steam generation cavity, and its gas suction side connects with the gas vent of cushion chamber.The test system and method for the present invention has multiple-working mode, high can emulate the real working condition of simulation filter, so that the actual performance of filter can accurately be tested, have wide application prospect.

Description

Strainability test system and method

Technical field

Present invention relates particularly to one kind to be used for convection body filter plant, such as the strainability of gas filtration chip is surveyed The method and device of examination.

Background technology

As the theory of health, environmental protection is rooted in the hearts of the people, filtering product in recent years on the market is also very popular, such as activity Charcoal respirator, PM2.5 filter face masks etc., these filtering products are mainly by physical barriers, suction-operated, by impurity, especially It is that particulate pollutant etc. filters out.

To test the strainability of these filtering products, currently used method is to make to include finite concentration pollutant (example Such as PM2.5 particles) test gas from these filtering products by, and detect and record test gas before filtered, The concentration of contained pollutant afterwards.But such test mode can not reflect that these filtering products are true in actual application Performance.

The content of the invention

In view of the shortcomings of the prior art, it is a primary object of the present invention to provide a kind of strainability test system and side Method.

To realize aforementioned invention purpose, the technical solution adopted by the present invention includes：

The embodiments of the invention provide a kind of strainability test system, it includes：

Source chamber, its at least to provide include setting concentration pollutant source gas；

Cushion chamber, it is at least making the source gas and carrier gas be thoroughly mixed to form the test gas containing pollutant；

Carrier gas source, it is at least providing described carrier gas to the cushion chamber；

Steam generation cavity, it at least tests gas to provide the clean of moisture content；

Gas detection module, it is at least detecting the survey from the input of the gas suction side of filter to be tested or output The concentration of pollutant and and from pollutant in the test gas of the gas of filter to be tested exhalation end output in gas testing body Concentration；

The gas access of the cushion chamber connects with the gas vent of the source chamber, the gas vent of carrier gas source, described slow Rush and the pipeline connection with the first air valve is passed through between the gas vent of chamber and the gas suction side of filter to be tested, it is described to treat Test between the gas exhalation end of filter and the moisture outlet of steam generation cavity and pass through the pipeline connection with the 3rd air valve.

In some preferred embodiments, the gas suction side of the filter to be tested is respectively through carrying the first air valve The first pipeline, the gas vent of the 4th pipeline with the 4th air valve and the cushion chamber, external environment condition connect, it is described to be measured The gas exhalation end of filter is tried respectively through the 3rd pipeline, the second pipeline and water with the second air valve with the 3rd air valve The moisture outlet of vapour generation cavity, exhaust gas processing device connection.

The embodiment of the present invention additionally provides a kind of strainability method of testing, and the method for testing is to be based on the filterability Energy test system is implemented, and the method for testing includes step：

(1) at least open the first air valve and close the 3rd air valve, strainability test system is entered air-breathing working condition, The test gas containing pollutant for exporting cushion chamber inputs from the gas suction side of filter to be tested, then from mistake to be tested The gas exhalation end output of device is filtered, and detects and record the test gas containing pollutant through filter mistake to be tested Filter the concentration of forward and backward contained pollutant；

(2) at least open the 3rd air valve and close the first air valve, strainability test system is entered expiration working condition, Make the clean test gas for the moisture content that steam generation cavity exports from the gas exhalation end input of filter to be tested, then from treating Test the gas suction side output of filter；

(3) at least it is again turned on the first air valve and closes the 3rd air valve, strainability test system is again introduced into air-breathing Working condition, the test gas containing pollutant that cushion chamber exports is set to be inputted from the gas suction side of filter to be tested, then From the gas exhalation end output of filter to be tested, and the test gas containing pollutant is detected and recorded through to be tested The concentration of the forward and backward contained pollutant of filter filtering.

Compared with prior art, strainability test system and method provided by the invention can simulate filter well Real work situation, so as to which the real work performance of filter, while filterability provided by the invention can accurately be tested Energy test system and method can also be tested a variety of filters in different modes, have a wide range of applications adaptability.

Brief description of the drawings

In order to illustrate more clearly about the embodiment of the present invention or technical scheme of the prior art, below will be to embodiment or existing There is the required accompanying drawing used in technology description to be briefly described, it should be apparent that, drawings in the following description are only this Some embodiments described in invention, for those of ordinary skill in the art, on the premise of not paying creative work, Other accompanying drawings can also be obtained according to these accompanying drawings.

Fig. 1 is a kind of structural representation of strainability test system in an exemplary embodiments of the invention；

Fig. 2 is the sectional view of the first filtrating chip in the embodiment of the present invention；

Fig. 3 a- Fig. 3 e are a kind of view in transverse section in filtrating chip protrusions portion in some typical embodiments of the invention；

Fig. 4 a- Fig. 4 c are a kind of arrangement schematic diagram in filtrating chip protrusions portion in some typical embodiments of the invention；

Fig. 5 a- Fig. 5 c are the top view of a variety of filtrating chips in the embodiment of the present invention；

Fig. 6 is the sectional view of second of filtrating chip in the embodiment of the present invention；

Fig. 7 is the sectional view of the third filtrating chip in the embodiment of the present invention；

Fig. 8 is the sectional view of the 4th kind of filtrating chip in the embodiment of the present invention；

Fig. 9 is the sectional view of the 5th kind of filtrating chip in the embodiment of the present invention；

Figure 10 is a kind of preparation technology flow chart of filtrating chip in an exemplary embodiments of the invention；

Figure 11 is a kind of strainability test result of filtrating chip in a concrete application example of the invention.

Embodiment

In view of deficiency of the prior art, this case utility model people is able to propose this hair through studying for a long period of time and largely putting into practice Bright technical scheme.The technical scheme, its implementation process and principle etc. will be made as follows into one with reference to accompanying drawing and exemplary embodiments The explanation of step.A kind of strainability test system that the one side of the embodiment of the present invention provides includes：

Further, described strainability test system, it is characterised in that described to be measured also including exhaust gas processing device Try to pass through the pipeline connection with the second air valve between the gas exhalation end of filter and exhaust gas processing device.

Further, the gas suction side of the filter to be tested is also through the pipeline with the 4th air valve and extraneous ring Border connects.

Further, the gas suction side of the filter to be tested respectively through with the first air valve the first pipeline, The gas vent of the 4th pipeline with the 4th air valve and the cushion chamber, external environment condition connect, the filter to be tested Gas exhalation end respectively through with the 3rd pipeline of the 3rd air valve, the second pipeline with the second air valve and steam generation cavity Moisture outlet, exhaust gas processing device connection.

Further, the strainability test system also includes pressure test device, and the pressure test device is at least For detecting the draught head between the gas suction side of the filter to be tested and gas exhalation end.

Further, the gas access of the cushion chamber includes carrier gas inlet and source gas access, the carrier gas source difference Through the carrier gas inlet of the 5th pipeline with the 5th air valve, the 7th pipeline with the 7th air valve with the cushion chamber, the source The carrier gas inlet connection of chamber, the source gas access of the cushion chamber pass through the gas of the 8th pipeline and the source chamber with the 8th air valve Body outlet.

Further, the carrier gas inlet of the steam generation cavity passes through the 6th pipeline with the 6th air valve and connected with carrier gas source Logical, while water is also loaded with the steam generation cavity, described water can be with flowing through the carrier gas of steam generation cavity.

It is obvious, the regulating valve and flow of air-flow air pressure, flow velocity etc. can be also set on the pipeline of the first pipeline~the 8th Meter etc..

A kind of strainability method of testing that the other side of the embodiment of the present invention provides is to be based on the strainability What test system was implemented, and the method for testing includes step：

Further, described strainability method of testing also includes：Under air-breathing working condition, if the survey containing pollutant The concentration of pollutant then opens the 7th air valve and the 8th air valve, into the cushion chamber less than the lower limit of setting in gas testing body Supplementary source gas and carrier gas, until the concentration of pollutant reaches the higher limit of setting in the test gas containing pollutant.

Further, described strainability method of testing also includes：Repeat step (1)~step (3) more than twice, directly Tested to completion.

Further, described strainability method of testing also includes：At least under air-breathing working condition, detection and record Draught head between the gas suction side of the filter to be tested and gas exhalation end.

Further, refer to Fig. 1 and show a kind of strainability test system in an exemplary embodiments of the invention, its At source chamber 1, cushion chamber 2, sample clamp 3, gas detecting instrument 4, tail gas including the source gas that stores the thing containing high density pollution Manage device 5, steam generation device 6, feeder 7, pressure difference detector 8 etc..Filter 9 to be tested is installed on sample clamp 3 It is interior.

Wherein, the gas suction side of the filter to be tested is respectively through the first pipeline, band with the first air valve V1 There are the 4th air valve V4 the 4th pipeline and the gas vent of the cushion chamber, external environment condition to connect, the filter to be tested Gas exhalation end respectively through with the 3rd air valve V3 the 3rd pipeline, the second pipeline with the second air valve V2 and steam generation The moisture outlet of chamber, exhaust gas processing device connection.

One of feeder 7 is carrier gas source, and it is respectively through the 5th pipeline with the 5th air valve V5, with the 7th gas Valve V7 the 7th pipeline connects with the carrier gas inlet of the cushion chamber, the carrier gas inlet of the source chamber, the source gas of the cushion chamber Body entrance passes through the 8th pipeline with the 8th air valve V8 and connected with the gas vent of the source chamber.

Wherein steam generation device 6 includes steam generation cavity, and the carrier gas inlet of the steam generation cavity is through carrying the 6th gas Valve V6 the 6th pipeline is connected with another feeder 7, while water, described water are also loaded with the steam generation cavity Can be with flowing through the carrier gas of steam generation cavity, so that carrier gas carries vapor and forms the clean test gas of moisture content.

Wherein gas detecting instrument 4 includes gas detection module, and it is sucked to the gas detected from filter to be tested The concentration of pollutant and and the survey from the gas of filter to be tested exhalation end output in the test gas of end input or output The concentration of pollutant in gas testing body.

Wherein pressure test device 8 be used for detect the filter to be tested gas suction side and gas exhalation end it Between draught head.Mode of operation based on a kind of strainability test system shown in Fig. 1 can include：

Air-breathing mode of operation：Under this mode of operation, air valve V5, V1, V2 are opened, and air valve V4, V3, V6 are closed, and make buffering The test gas (be free of steam) containing pollutant of chamber output is from the input of the gas suction side of filter to be tested, then to be measured The gas exhalation end output of filter is tried, and detects and records the test gas containing pollutant with gas detecting instrument 4 and exist Concentration through the forward and backward contained pollutant of filter to be tested filtering.

Expiration mode of operation：Under this mode of operation, air valve V4, V3, V6 are opened, and air valve V5, V1, V2 are closed, and make steam The clean test gas of the moisture content of generation cavity output is from the gas exhalation end input of filter to be tested, then from mistake to be tested Filter the gas suction side output of device.

Breath cycle mode of operation：The progress time of air-breathing mode of operation is set as T1, during the progress of expiration mode of operation Between be T2, total testing time T, then whole test system is followed by suction condition-expiration state-suction condition-expiration state The time of ring work is T.

Gas adds：When the pollutant concentration in cushion chamber is less than the lower limit Min of setting, air valve V7, V8 are opened, and are added During adding until pollutant concentration be more than setting upper limit value M ax when, air valve V7, V8 close.

Further, an application scenarios of the strainability test system can be the filtering for testing the products such as mouth mask Performance, by controlling the keying of foregoing each air valve, the test gas containing pollutant of no steam is set to be filled from the filtering of required test The front (i.e. its gas suction side) for putting sample flows into, and similar to the suction condition of human body, during expiration state, then makes with steam Clean gas flows into from the back side of required test sample (i.e. its gas exhalation end).User can select individual calling gas as needed (i.e. Foregoing expiration mode of operation), single suction gas (i.e. foregoing air-breathing mode of operation) and breath cycle (i.e. foregoing breath cycle work Any of operation mode), conventional one-way ventilating filter efficiency can not only be so tested, and test loop can be selected to breathe Filter efficiency, more realistically simulate human body respiration state, meet test sample people actually use in state so that test Result be more nearly actual conditions.

, can be by reading and recording data and the pressure difference that two gas detecting instruments are detected in foregoing test process The detection data of meter, find out under air-breathing mode of operation, the test gas containing pollutant before filtration, after pollutant concentration become Change situation, and then obtain the filter efficiency of test sample.

" particulate matter " foregoing in the present invention can be polluted in atmosphere with all kinds of solid-states, liquid existing for suspended form Thing, such as PM2.5 particles, organic or inorganic microlayer model, all kinds of fiber fines etc., and not limited to this, such as can also be some Gaseous contaminant, include but is not limited to some volatile organic gas etc..

" carrier gas " foregoing in the present invention can be common all kinds of gases, such as air.

" carrier gas source " foregoing in the present invention can be all kinds of suitable sources of the gas, preferably compressed air etc., but not limited to this.

" filter to be tested " foregoing in the present invention can be various types of filtration device known to those skilled in the art, particularly Gas-filtering device, such as activated carbon respirator, PM2.5 filter face masks etc., and not limited to this.

For example, a kind of filtrating chip that the embodiment of the present invention proposes can include：

Matrix with first gas passage, the first gas passage have a gas access and gas vent, and described The gas access of one gas passage is distributed in the first area of the first surface of described matrix；

Gas barrier portion, the second surface that there is the first surface with described matrix to be oppositely arranged are pending for preventing Gas is directly entered the gas access of the first gas passage；

The a plurality of lug bosses being intervally installed, described lug boss one end are fixedly installed on the first surface of described matrix Second area in, the other end is fixedly connected with the second surface in the gas barrier portion, wherein between adjacent projections away from From more than 0 but less than mixing in the particle diameter of the selected particle in pending gas, the secondth area of the first surface of described matrix Domain abuts with first area, so that cooperatively forming second gas between a plurality of lug bosses, gas barrier portion and matrix Passage, and pending gas is only capable of entering first gas passage by the second gas passage.

Wherein, described matrix can be various forms, such as cuboid shape, sheet, polyhedral, hemispherical, spherical Or other irregular forms.Therefore, described " first surface " can be any one unspecific conjunction in described matrix Suitable plane or curved surface.

Wherein, the first gas passage can be the through hole of any form, and its gas access is distributed in described matrix On first surface, and its gas vent can be both distributed on another surfaces different from the first surface of described matrix (for example, another surface can it is adjacent with the first surface, mutually back to), can also be distributed on described first surface (when So in this case, described first surface Shang Yingyou gas barriers mechanism, make pending gas will not be described first The gas outlet is flowed to directly on a surface.In some cases, the gas vent of the first gas passage be also can To be distributed in inside described matrix, for example, when existing in described matrix to receive the cavity of the gas after processing.

Wherein, the gas barrier portion can also be variform, for example, can be sheet, shell shape, cuboid shape, Polyhedral etc., as long as it can make pending gas will not be from by a plurality of lug bosses, gas barrier portion and matrix Between gas passage outside the second gas passage that cooperatively forms enter the gas access of described first gas passage. And the setting form in the gas barrier portion can also be various, for example, it integrally can be arranged at intervals with described matrix, also It can locally be connected with described matrix, or even in some cases, to be formed also but with described matrix by being integrally machined.

Wherein, the distributional pattern of the first area of the first surface of described matrix and second area can be various, example As the first area with second area can be it is adjacent, can also spaced apart or second area surround First area is set or first area locally embedding second area.The distributional pattern of the rwo can be according to the gas Stop part, the structure of matrix and position relationship each other etc. and adjust.

Wherein, described a plurality of lug bosses refer to two or more lug bosses.Wherein described lug boss be relative to For the flat or recessed part of the first surface of described matrix, its form can be various, for example, it can be to stand The wire of setting, column, sheet, tubulose, taper, frustum structure or Else Rule or irregular structure, and its lateral cross section Structure (transverse direction herein, being primarily referred to as the direction parallel with the first surface of described matrix) can also be rule or irregular shape Shape, such as can be that polygon (triangle, quadrangle or other), circle, ellipse, star etc. (are schemed refering to Fig. 3 a- 3e)。

Wherein, described a plurality of lug bosses can be regular or irregular, uniform or heterogeneous be distributed in described matrix First surface on (refer to Fig. 4 a- Fig. 4 c).

Wherein, the gas access of the first gas passage have rule or irregular shape, such as polygon (rectangle, Rhombus is other), circular or ellipse etc., it can simply be adjusted according to the demand of practical application.

Wherein, described pending gas can be gas phase or liquid phase, such as empty gas and water, oils, in some situations The lower or set in gasiform particulate matter, or molten state of Cucumber etc..

Wherein, described " particle " is primarily referred to as solid phase particles, but in some cases, can also be and the gas (particularly liquid-phase gas) incompatible drop etc..

In some more preferred embodiment, the second area of the first surface of described matrix is around firstth area Domain is set.Particularly, it is distributed in gas access of a plurality of lug bosses around the first gas passage of the second area Set.Such setting form, the gap that can make to be distributed between a plurality of lug bosses of the second area are used as second The part of gas passage, so as to obtain larger gas flux.

In some more preferred embodiment, also it is arranged at intervals with the 3rd region of the first surface of described matrix A plurality of lug bosses, the second area are located between the 3rd region and first area.Wherein, it is distributed in the 3rd area The top of a plurality of lug bosses in domain can be connected with the gas barrier portion, can not be also connected with the gas barrier portion, especially It is that when not being connected at the top of these lug bosses with the gas barrier portion, then the gap between these lug bosses top also can structure Into gas passage, so as to further increase the contact surface of the filtrating chip and gas, lift gas flux.

Especially preferred, the 3rd region of the first surface of described matrix is set around the second area.Further, The lug boss for being distributed in the 3rd region and the lug boss for being distributed in the second area can be identical or different.Especially Preferably, the 3rd region or the second area no matter are distributed across, as long as being distributed across the first table of described matrix The distance between the adjacent projections in face are all higher than 0 but are less than to mix in the particle diameter of the selected particle in pending gas.

More preferable, the first area of the first surface of described matrix and second area are distributed in the gas barrier portion In in the orthographic projection on the first surface of described matrix.

More preferable, the lug boss is wire or columnar projections, and its draw ratio is 4：1~200000：1, and it is adjacent The distance between lug boss and the ratio of the length of the lug boss are 1：4~1：200000.By using this structure and divide The lug boss of cloth form, multiple lug bosses can be made intensive can to arrange (proportion is few certainly in unit area for lug boss), Handled beneficial to the molecule in gas, at the same also assign the larger gas flux of the filtrating chip (lug boss it Between hole it is bigger than lug boss own vol).

Micro wire (pipe) or nano wire (pipe) especially preferred, that the lug boss is set for setting, its a diameter of 1nm~ 50 μm, length is that the distance between 50nm~200 μm, adjacent projections are 1nm~50 μm, the mistake that structure can so formed The as low as nano level particle of particle diameter in filter element slice energy processing gas, and keep higher gas treatment flux.

Further, a plurality of lug bosses for being distributed in the 3rd region of the first surface of described matrix arrange to form tool There are the micron order or nanoscale arrays structure of super-hydrophobic or superoleophobic performance.In this way, it can also assign the filtrating chip automatically cleaning Etc. function.

It is of course also possible to by setting the suitable low surface as known to industry on the partially or fully surface of the lug boss The coating that energy material is formed, or the lug boss directly is formed using hydrophobic material, so as to make it have ultra-hydrophobicity, from clearly Clean performance etc..

In some more specific embodiment, the aperture of the first gas passage can be 1 μm~1mm.

In some more specific embodiment, the thickness of described matrix is more than 1 μm.

Wherein, the material of described matrix can be selected from metal, nonmetallic, organic material, inorganic material etc., such as silicon chip, Polymer, ceramics etc., and not limited to this.

In some more preferred embodiment, the lug boss may be selected from nano wire, such as carbon nanocoils, carbon nanometer Pipe, ZnO nano-wire, GaN nano wire, TiO₂Any of nano wire, Ag nano wires, Au nano wires or two or more groups Close.

In some concrete application schemes, the lug boss can be by catalysis material or with antibacterial, sterilizing function Material is formed, or, the lug boss can also be material of the surface covered with catalysis material or with sterilization, antibacterial functions The coating of formation.For example, the lug boss can use ZnO nano-wire, GaN nano wire, TiO₂Nano wire etc. has light-catalysed The nano wire of property, under light auxiliary irradiation, the organic matter in the gas that can degrade.For example, the lug boss can be received using Ag Rice noodles, Au nano wires etc., to kill the bacterium in gas, virus, microorganism.

In some more specific embodiment, the thickness in the gas barrier portion is 0.5 μm~200 μm.

In some more preferred embodiment, the filtrating chip may also include at least one supporter, the branch Support body one end is fixedly connected with described matrix, and the other end is fixedly connected with the gas barrier portion., can be real by the supporter The existing more cooperation of firm stable between gas barrier portion and matrix, and can effectively to be distributed in gas barrier portion and matrix it Between lug boss formed protection, avoid because gas barrier portion and/or matrix by external force after being acted on, to the lug boss extrude The problems such as lug boss caused by and caves in, damaged.

Wherein, the supporter can be variform, such as column (cylinder, polygon prism etc.), step-like, frustum Deng, and not limited to this, its flexural capacity should be greater than any described lug boss.And the supporter can be hindered in gas Processing forms or is integrally machined and to be formed with matrix or gas barrier portion between stopper and matrix.

Further, described supporter can be two or more, and the two or more supporter is symmetrically distributed in institute State around the gas access of first gas passage.

In some more preferred embodiment, one can have also been set up on the gas access of the first gas passage Beam supported above, the support beam are fixedly connected with the gas barrier portion, are supported to be formed to gas barrier portion, further Lift the structural strength of the filtrating chip.

Further, the support beam can be more, its can with parallel arrangement the first gas passage gas On entrance.

In some more preferred embodiment, the lug boss surface is additionally provided with function material layer, the function The material of material layer includes catalysis material, anti-biotic material etc., and not limited to this.For example, more typical catalysis material Can be titanium dioxide etc., when the filtrating chip comprising this kind of function material is handled gas, if being aided with ultraviolet lighting Deng, can also to organic pollution of some in gas etc. carry out photocatalytic degradation, realize the multiple purifying to gas.In another example More typical anti-biotic material can be the noble metals such as Au, Ag, can synchronously be killed in the processing procedure of gas by it Bacterium, virus in gas etc..

Further, for the benefit of light penetrates, and at least local of at least part component in the filtrating chip is transparent Structure.For example, can partly or entirely be made of clear material in the gas barrier portion, matrix, lug boss.

A kind of method for preparing the filtrating chip that the embodiment of the present invention proposes includes：

There is provided with first surface and with first surface mutually back to the 3rd surface substrate；

The first surface of the substrate is processed, is intervally installed so as to be formed in the first surface of the substrate A plurality of lug bosses, or, a plurality of lug bosses to be formed and be intervally installed are grown in the first surface of the substrate, its The distance between middle adjacent projections are more than 0 but are less than and mix in the particle diameter of the selected particle in pending gas；

The second surface being oppositely arranged with the first surface with the substrate is set on the first surface of the substrate Gas barrier portion, and at least make to be distributed in a plurality of lug bosses in the second area of the first surface of the substrate with it is described The second surface in gas barrier portion is fixedly connected；

3rd surface of the substrate is processed, formed through the substrate first gas passage, described first The gas access of gas passage is distributed in the first area of the first surface of the substrate, and the of the first surface of the substrate Two regions abut with first area, make to be distributed in a plurality of lug bosses, the gas in the second area of the first surface of the substrate Second gas passage is cooperatively formed between body stop part and substrate, and pending gas is only capable of by the second gas passage Into first gas passage.

In some more specific embodiment, described preparation method includes：

Patterned first photoresist mask, then the first table to the substrate are set on the first surface of the substrate Face performs etching, and so as to form a plurality of lug bosses being intervally installed in the first surface of the substrate, removes institute afterwards State the first photoresist mask；

Soluble or corrodible organic matter and/or inorganic matter are coated with the first surface of the substrate, and makes organic matter And/or the gap between inorganics filled a plurality of lug bosses, form sacrifice layer；

Second photoresist mask is set on the sacrifice layer, then the sacrifice layer is performed etching, at least makes to be distributed in Exposed at the top of a plurality of lug bosses in the second area of the first surface of the substrate, remove second photoresist afterwards Mask；

The 3rd mask is set in the first surface of the substrate, and makes on the substrate first surface and gas The corresponding region of stop part exposes, and deposition forms gas barrier portion afterwards, then removes the 3rd mask；

Patterned 4th photoresist mask, then the 3rd table to the substrate are set on the 3rd surface of the substrate Face performs etching, until exposing the expendable material being filled between adjacent projections, so as in the 3rd surface shape of the substrate Into slotted eye, the slotted eye position is corresponding with the first area of the first surface of the substrate, the first table of the substrate The second area in face is set around the first area,

The 4th photoresist mask and the expendable material being filled between a plurality of lug bosses are removed, in the lining The first gas passage is formed on bottom.

More preferable, described a plurality of lug bosses are the vertical nano-pillar of complex root of array arrangement or vertical nanometer Line.

Technical scheme is further described below with reference to accompanying drawing and some embodiments.It should be noted It is that shown in accompanying drawing is only simply illustrative to the progress of the structure of filtrating chip of the present invention and related device, therefore not smart Really draw out size, size of wherein each component etc..

Refer to shown in Fig. 2 and Fig. 5 a- Fig. 5 b, the first filtrating chip in the embodiment of the present invention includes matrix 101, institute Stating matrix 101 has first surface 101a, and first area 1011 (region that dotted line encloses in the figure) distribution of described matrix 101 There are some through holes 104 as gas passage, it is (that is, micro- that more vertical micro-/ nano line/pipes 103 are provided with the first surface Any of the line of meter level, micron-sized pipe, nano wire, nanotube or a variety of combinations) formed array, be distributed in circular The top for more micro-/ nano line/pipes 103 that the through hole 104 in the second area 1012 of first area 1011 is distributed also connects Gas barrier portion 102 is connected to, the gas barrier portion 102 is arranged above the gas access of the through hole 104, made pending Gas can not bypass foregoing micro-/ nano line/pipe array and be directly entered the through hole 104, and the gas barrier portion 102 has The second surface 102b being oppositely arranged with the first surface 1011.And in remaining region 1013 of the first surface 1011 Also can the vertical micro-/ nano line/pipe 103 of more of dense distribution in (the 3rd region can be named as).In fig. 2, the arrow with dotted line Head shows the direct of travel of gas.Wherein, because foregoing micro-/ nano line/pipe has larger ratio of height to diameter (or draw ratio), make These micro-/ nano line/pipes can the densely arranged first surface in described matrix, by adjusting between these micro-/ nano line/pipes Away from, you can processing is purged to the particle of different-grain diameter scope in gas, particularly, when use be nano wire/pipe when, By the way that the spacing between these nano wire/pipes is controlled in nanoscale, the atomic small particle in gas can be not only removed, and And because nano wire/pipe diameter itself is minimum, it can be also set to be controlled in very low level for the resistance of gas, and formed very big Gas flux, far superior to existing perforated membrane, filtrating chip based on transverse flow channels etc..

Wherein, if with reference to known to industry scheme, foregoing micro-/ nano line/pipe array is carried out to certain design, may be used also Be allowed to form super-drainage structure, superoleophobic structure, can not only remove the particle in gas, and can also by automatic cleaning action, The particle for making to be blocked can not gather in the functional area (micro-/ nano line/pipe array surface) of the filtrating chip, avoid described Filtrating chip fails after long-term use.

Wherein, described matrix 101 can have larger thickness, it is formed preferably foregoing micro-/ nano line/pipe array Support, while the mechanical strength of the filtrating chip can be increased further, makes the filtrating chip pressure-resistant, resistant to bending, resistance to Collision, impact resistance, and then it is applied and will not be damaged in a variety of environment, such as can apply to high pressure, high speed Gas is handled, and this function is that existing perforated membrane etc. can not be reached.

Wherein, the gas barrier portion can be that sheet, its thickness etc. can adjust according to practical application request.

Wherein, the material selection range of the filtrating chip each several part (101,102,103,104) is various, Ke Yishi Inorganic material or organic material, such as metal, non-metal inorganic material, plastics, ceramics, semiconductor, glass, polymerization Thing etc..When these parts all select to use inorganic material, the filtrating chip also has the characteristic of resistance to temperature change, can locate Manage high temperature and cryogenic gas.

Using previous designs described filtrating chip can (ultrasound) cleaning, be used for multiple times, and remain on good Gas processing capability.

When being handled using described filtrating chip gas, the gas containing impurity particle state before entry it is micro-/ During the array that nano wire 103 forms, wherein particle diameter is more than particle (or some drops incompatible with gas) quilt of certain numerical value It is blocked in outside foregoing micro-/ nano line/pipe array, gap of the gas between each micro-/ nano line/pipe reaches through hole afterwards Through hole 104 is entered back into behind 104 porch, realizes the purification to gas and/or the enriching and recovering to required particle (drop).

Referring to shown in Fig. 2, in some concrete application schemes of the embodiment, the diameter of foregoing micro-/ nano line Can be 1nm~50 μm, length (height) h₁Can be that the distance between 50nm~200 μm, adjacent micro-/ nano line can be 1nm~50 μm.The aperture w of the through hole 104 can be 1 μm~1mm.The thickness h of described matrix₂Can be more than 1 μm.It is described The thickness h in gas barrier portion₃It can be 0.5 μm~200 μm.

Referring to Fig. 3 a- Fig. 3 e, the lateral cross section structure of foregoing micro-/ nano line can be rule or irregular shape , such as can be polygon (triangle, quadrangle or other), circle, ellipse, star etc..

Referring to Fig. 4 a- Fig. 4 c, foregoing micro-/ nano line can regular or irregular, uniform or distribution heterogeneous On the first surface of described matrix.In some more specific application schemes, the average headway of adjacent micro-/ nano line exists 1nm~50 μm.

In addition, referring to Fig. 5 a- Fig. 5 c, in this embodiment, the shape of aforementioned through-hole 104 and gas stop part 102 is (special It is not the shape of lateral cross section) can be various, such as can be circular, square, rectangle or other shapes.

Refer to shown in Fig. 6, more preferably, second of filtrating chip of the embodiment of the present invention includes matrix 201, described Matrix 201 have first surface and with the first surface mutually back to and the 3rd surface, and be distributed with described matrix 201 some As the through hole 204 of gas passage, the array that more vertical micro-/ nano lines/pipe 203 is formed is provided with the first surface, Gas barrier portion 202, the gas are also associated with around the top of more micro-/ nano line/pipes 203 of the through hole 204 distribution Stop part 202 is arranged above the gas access of the through hole 204, pending gas can not be bypassed foregoing micro-/ nano Line/pipe array and be directly entered the through hole 204.Also, around the through hole 204 also symmetrically or non-symmetrically be distributed with one More than individual, such as four supporters 205, it can also increase the branch to the gas barrier portion 202 by the supporter 205 Support, realizes the more cooperation of firm stable between gas barrier portion and matrix, and can effectively to be distributed in gas barrier portion with Micro-/ nano line/pipe array between matrix forms protection, avoids because gas barrier portion and/or matrix by external force after being acted on, The problems such as micro-/ nano line/pipe 203 caused by foregoing micro-/ nano line/pipe array extruding caves in, damaged.

Wherein, the supporter can be variform, such as can have rectangle, trapezoidal, step longitudinal cross-section (longitudinal direction herein can be regarded as perpendicular to the direction of described matrix first surface) etc., and not limited to this.In the embodiment In some specific embodiments, the supporter can be to project upwards boss to be formed etc. from the edge part of through hole 204, its Upper end connects the gas barrier portion 202.

Wherein, the quantity of the supporter, diameter, distribution density etc. can adjust according to being actually needed, but it is few to try one's best Occupancy described matrix first surface space, avoid its gas flux to the micro-/ nano line from causing big influence.

The structure of matrix, micro-/ nano line/pipe array, gas barrier portion, through hole employed in the embodiment etc., set Form, material etc. can with address above it is same or similar, so here is omitted.

Refer to shown in Fig. 7, more preferably, the third filtrating chip of the embodiment of the present invention includes matrix 301, described Matrix 301 have first surface and with the first surface mutually back to and the 3rd surface, and be distributed with described matrix 301 some As the through hole 304 of gas passage, the array that more vertical micro-/ nano lines/pipe 303 is formed is provided with the first surface, Gas barrier portion 302, the gas are also associated with around the top of more micro-/ nano line/pipes 303 of the through hole 304 distribution Stop part 302 is arranged above the gas access of the through hole 304, pending gas can not be bypassed foregoing micro-/ nano Line/pipe array and be directly entered the through hole 304.Also, also being set up on the through hole 304 has more than one, such as right Title or more support beams 305 of asymmetric arrangement, can also increase to the gas barrier portion 302 by the support beam 305 Support, realizes the more cooperation of firm stable between gas barrier portion and matrix, and can be effectively to being distributed in gas barrier portion Micro-/ nano line/pipe array between matrix forms protection, avoids because gas barrier portion and/or matrix act on by external force Afterwards, to the extruding of foregoing micro-/ nano line/pipe array and caused by micro-/ nano line/pipe 303 the problems such as caving in, damaging.

Wherein, the support beam can be variform, such as can be with arch-shaped etc., and not limited to this.And further , the support beam can also coordinate with other supporters, such as the supporter addressed in previous embodiment coordinates.

Wherein, the quantity of the support beam, size, distribution density etc. can adjust according to being actually needed, but it is few to try one's best The gas access for blocking the through hole, avoid its gas flux to the filtrating chip from causing big influence.

The structure of matrix, micro-/ nano line/pipe array, gas barrier portion, through hole employed in the 3rd embodiment etc., Setting form, material etc. can with address above it is same or similar, so here is omitted.

Refer to shown in Fig. 8, more preferably, the 4th kind of filtrating chip of the embodiment of the present invention includes matrix 401, described Matrix 401 have first surface 4011 and with the first surface mutually back to the 3rd surface 4012, and be distributed in described matrix 401 There are some through holes 404 as gas passage, the array that more vertical nano-pillars 403 are formed be provided with the first surface, Gas barrier portion 402, the gas barrier portion are also associated with around the top of more nano-pillars 403 of the through hole 304 distribution 402 are arranged above the gas access of the through hole 404, make pending gas straight around foregoing nano column array Tap into the through hole 304.Also, it is additionally provided with light on the first surface of the surface of nano-pillar 403 and described matrix 401 Cati material 405.When being handled with the filtrating chip comprising layers of photo-catalytic material 405 gas, if being aided with ultraviolet light According to etc., can also photocatalytic degradation be carried out to organic pollution of some in gas etc., realize the multiple purifying to gas.

Wherein, for the benefit of light penetrates, in the gas barrier portion, matrix, lug boss partly or entirely can be by saturating Bright material is made.In some specific embodiments of the present embodiment, the gas barrier portion can be integrally by transparent material system Into, such as light injection.

Wherein, more typical catalysis material can be titanium dioxide etc., but not limited to this.

Wherein, to form the layers of photo-catalytic material 405, those skilled in the art can use a variety of sides known to industry Formula, for example, coating (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald), Sputtering etc., and not limited to this.

Wherein, the thickness of the layers of photo-catalytic material 405 can be controlled in nanoscale, to reduce it to the mistake as far as possible The influence of the gas flux of filter element slice.

The structure of matrix, micro-/ nano line/pipe array, gas barrier portion, through hole employed in the fourth embodiment etc., Setting form, material etc. can with address above it is same or similar, so here is omitted.

Refer to shown in Fig. 9, more preferably, the 5th kind of filtrating chip of the embodiment of the present invention includes matrix 501, described Matrix 501 have first surface 5011 and with the first surface mutually back to the face of the 3rd table 5012, and be distributed in described matrix 501 There are some through holes 504 as gas passage, the array that more vertical nano-pillars 503 are formed be provided with the first surface, Gas barrier portion 502, the gas barrier portion are also associated with around the top of more nano-pillars 503 of the through hole 504 distribution 502 are arranged above the gas access of the through hole 504, make pending gas straight around foregoing nano column array Tap into the through hole 504.Also, it is additionally provided with the first surface of the surface of nano-pillar 503 and described matrix 501 anti- Bacterium material layer 505., can be in the processing of gas when being handled with the filtrating chip comprising anti-biotic material layer 505 gas During, bacterium in gas, virus etc. are synchronously killed, realizes the multiple purifying to gas.

Wherein, more typical anti-biotic material can be noble metals such as Au, Ag etc., but not limited to this.

Wherein, to form the anti-biotic material layer 505, those skilled in the art can use a variety of sides known to industry Formula, for example, coating (spin coating, spraying, printing etc.), physically or chemically vapour deposition (such as MOCVD, PECVD, ald), Sputtering etc., and not limited to this.

Wherein, the thickness of the anti-biotic material layer 505 can be controlled in nanoscale, to reduce it to the filtering as far as possible The influence of the gas flux of chip.

The structure of matrix, micro-/ nano line/pipe array, gas barrier portion, through hole employed in 5th embodiment etc., Setting form, material etc. can with address above it is same or similar, so here is omitted.

The filtrating chip of the present invention can prepare by physics, chemical method, such as can be chemically grown method, thing Manage processing method etc., particularly MEMS (MEMS, Microelectromechanical Systems) method etc..

For example, referring to shown in Figure 10, a kind of preparation technology of filtrating chip can include as follows in the embodiment of the present invention Step：

S1：(it is defined as setting patterned photoresist to cover on first surface a) in a side surface of substrate (such as silicon chip) Mould；

S2：The first surface of the substrate is performed etching, is spaced so as to be formed in the first surface of the substrate The more vertical nano-wires set, remove the first photoresist mask afterwards；

S3：Soluble or corrodible organic matter and/or inorganic matter are coated with the first surface of the substrate, and is made organic Gap between thing and/or inorganics filled each vertical nano-wire, form sacrifice layer；

S4：Photoresist is set on the sacrifice layer, and carries out photoetching；

S5：The sacrifice layer is performed etching, makes to be distributed in more in the second area of the first surface of the substrate Exposed at the top of vertical nano-wire, remove photoresist afterwards；

S6：The substrate first surface set photoresist mask, and make it is on the substrate first surface, with it is described The corresponding region in gas barrier portion exposes；

S7：Deposition forms gas barrier portion in region expose, corresponding with the gas barrier portion；

S8：Peel off and remove photoresist；

S9：Patterned etching mask is set on the second surface of the substrate；

S10：To the substrate and first surface mutually back to another side surface (be defined as the 3rd surface b) to carve Erosion, until exposing the expendable material being filled between neighboring vertical nano wire, so as to form groove on the 3rd surface of the substrate Hole, the slotted eye position is corresponding with the first area of the first surface of the substrate, the first surface of the substrate Second area is set around the first area；

S11：The etching mask and the expendable material being filled between each vertical nano-wire are removed, filtrating chip is made.

The lithographic method used in These steps can be photoetching, Mechanical lithography, dry etching, wet etching etc..

For example, in abovementioned steps S1, forming the method for the photoresist mask of graphical (nano graph) includes：Photoetching skill Art, nanometer bead mask technique, nanometer (metal) particle mask technology etc., and not limited to this.

For example, in abovementioned steps S2, mode known to industry, such as RIE, ICP, wet etching, electrochemistry can be passed through Corrosion etc. etches vertical nanowires linear array.

For example, in abovementioned steps S3, the dissolved organic matter of filling can be photoresist etc. or corrodible inorganic matter such as Metal, SiO₂, silicon nitride etc..

For example, in abovementioned steps S10, mode known to industry, such as RIE, ICP, wet etching, electrochemistry can be passed through Corrosion etc. etches the slotted eye.

It is to Fig. 2 institutes with a kind of strainability test system shown in Fig. 1 in the concrete application case of the present invention A kind of strainability of the filtrating chip shown is tested, and the filtrating chip can be applied in mouth mask.

In test, the filtrating chip can be fixed in sample clamp, and using the compressed air of cleaning as carrier gas, PM2.5 particles are surveyed as pollutant, and using expiration mode of operation, air-breathing mode of operation and breath cycle mode of operation Examination, wherein single air-breathing, single exhale duration and exhale, inhales switching frequency with ordinary person normally exhale, inhale the time and exhale, It is identical to inhale switching frequency, wherein the test gas containing pollutant used is a series of sky containing various concentrations PM2.5 particles Gas, the clean water content tested in gas of moisture content and the water content in ordinary person's exhaled gas are basically identical.

By repeatedly testing, it is found that the strainability of the filtrating chip is being entered only with air-breathing mode of operation Row test in the case of, the filtrating chip for containing pollutant test gas in pollutant filter efficiency average out to 30%, And in the case where being tested the strainability of the filtrating chip using breath cycle mode of operation, the filtrating chip for The filter efficiency average out to 70% of pollutant, its test result can refer to Figure 11 in test gas containing pollutant.

This is probably that air-breathing mode of operation have ignored influence of the exhalation process steam for filtrating chip, and by using exhaling The process for the simulation human body respiration that circulating working mode high can emulate is inhaled, test result is closer to actual conditions, thus energy is real Now to the more accurate test of filtrating chip performance.

It should be appreciated that the technical concepts and features of above-described embodiment only to illustrate the invention, its object is to allow be familiar with this The personage of item technology can understand present disclosure and implement according to this, and it is not intended to limit the scope of the present invention.It is all The equivalent change or modification made according to spirit of the invention, it should all be included within the scope of the present invention.

Claims

A kind of 1. strainability test system, it is characterised in that including：

Source chamber, its at least to provide include setting concentration pollutant source gas；

Cushion chamber, it is at least making the source gas and carrier gas be thoroughly mixed to form the test gas containing pollutant；

Carrier gas source, it is at least providing described carrier gas to the cushion chamber；

Steam generation cavity, it at least tests gas to provide the clean of moisture content；

Gas detection module, it is at least detecting the test gas from the input of the gas suction side of filter to be tested or output The concentration of pollutant and and the concentration from pollutant in the test gas of the gas exhalation end output of filter to be tested in body；

The gas access of the cushion chamber connects with the gas vent of the source chamber, the gas vent of carrier gas source, the cushion chamber Gas vent and filter to be tested gas suction side between pass through with the first air valve pipeline connection, it is described to be tested The pipeline connection with the 3rd air valve is passed through between the gas exhalation end of filter and the moisture outlet of steam generation cavity.
2. strainability test system according to claim 1, it is characterised in that described to treat also including exhaust gas processing device Test between the gas exhalation end of filter and exhaust gas processing device and pass through the pipeline connection with the second air valve.
3. strainability test system according to claim 1, it is characterised in that：The gas of the filter to be tested Suction side also connects through the pipeline with the 4th air valve with external environment.
4. strainability test system according to claim 1, it is characterised in that：The gas of the filter to be tested Gas of the suction side respectively through the first pipeline with the first air valve, the 4th pipeline and the cushion chamber with the 4th air valve goes out Mouth, external environment condition connection, the gas exhalation end of the filter to be tested is respectively through the 3rd pipeline, band with the 3rd air valve There is the second pipeline of the second air valve to be connected with moisture outlet, the exhaust gas processing device of steam generation cavity.
5. strainability test system according to claim 1, it is characterised in that also including pressure test device, the pressure The draught head that device for detecting difference is at least used between the gas suction side for detecting the filter to be tested and gas exhalation end.
6. strainability test system according to claim 1, it is characterised in that：The gas access of the cushion chamber includes Carrier gas inlet and source gas access, the carrier gas source is respectively through the 5th pipeline with the 5th air valve, the with the 7th air valve Seven pipelines connect with the carrier gas inlet of the cushion chamber, the carrier gas inlet of the source chamber, the source gas access warp of the cushion chamber The 8th pipeline with the 8th air valve connects with the gas vent of the source chamber.
7. strainability test system according to claim 1, it is characterised in that：The carrier gas inlet of the steam generation cavity Connected through the 6th pipeline with the 6th air valve with carrier gas source, while water is also loaded with the steam generation cavity, it is described Water can be with flowing through the carrier gas of steam generation cavity.
8. the strainability test system according to any one of claim 1-7, it is characterised in that the filtering to be tested Device includes filtrating chip, and the filtrating chip includes：

Matrix with first gas passage, the first gas passage have gas access and gas vent, first gas The gas access of body passage is distributed in the first area of the first surface of described matrix,

Gas barrier portion, the second surface that there is the first surface with described matrix to be oppositely arranged, for preventing pending gas The gas access of the first gas passage is directly entered,

The a plurality of lug bosses being intervally installed, described lug boss one end are fixedly installed on the of the first surface of described matrix In two regions, the other end is fixedly connected with the second surface in the gas barrier portion, and wherein the distance between adjacent projections are big In 0 but less than mixing in the particle diameter of the selected particle in pending gas, the second area of the first surface of described matrix with First area abuts, so that second gas passage is cooperatively formed between a plurality of lug bosses, gas barrier portion and matrix, And pending gas is only capable of entering first gas passage by the second gas passage；

Preferably, a plurality of lug bosses are set around the gas access of the first gas passage；And/or described matrix First surface the 3rd region in be also arranged at intervals with a plurality of lug bosses, the second area located at the 3rd region and Between first area；And/or the first area of the first surface of described matrix and second area are distributed in the gas barrier portion In in the orthographic projection on the first surface of described matrix；And/or the gas treatment equipment also includes at least one supporter, Described supporter one end is fixedly connected with described matrix, and the other end is fixedly connected with the gas barrier portion；

It is furthermore preferred that the 3rd region of the first surface of described matrix is set around the second area；And/or the gas Processing unit includes the supporter described in two or more, and the supporter described in the two or more is symmetrically distributed in described first Around the gas access of gas passage；

Preferably, the gas access restocking of the first gas passage is provided with a beam supported above, the support beam with it is described Gas barrier portion is fixedly connected；And/or the lug boss is the wire set, column, sheet, tubulose, taper, the frustum of standing Any one in shape structure；And/or the lateral cross section of the lug boss has rule or irregular shape, the regular shape Shape includes polygon, circle or ellipse；And/or described a plurality of lug bosses are uniformly distributed or non-uniform Distribution is described On the first surface of matrix；And/or the gas access of the first gas passage has rule or irregular shape, the rule Then shape includes polygon, circle or ellipse；

It is furthermore preferred that the lug boss is that wire is raised, its draw ratio is 4：1~200000：1；And/or adjacent projections it Between the ratio of length of distance and the lug boss be 1：4~1：200000；

It is furthermore preferred that the lug boss is erects the micro wire or nano wire that set, its a diameter of 1nm~50 μm, length is The distance between 50nm~200 μm, adjacent projections are 1nm~50 μm；

It is furthermore preferred that a plurality of lug bosses for being distributed in the 3rd region of the first surface of described matrix arrange to be formed with super thin The micron order or nanoscale arrays structure of water or superoleophobic performance；

Preferably, the aperture of the first gas passage is 1 μm~1mm；And/or the thickness of described matrix is more than 1 μm；With/ Or, the thickness in the gas barrier portion is 0.5 μm~200 μm；And/or the lug boss surface is additionally provided with function material layer, The material of the function material layer includes catalysis material or anti-biotic material；And/or at least portion in the gas treatment equipment At least local of subassembly is transparent configuration.
9. a kind of strainability method of testing, it is characterised in that the method for testing is based on any one of claim 1-8 institute What the strainability test system stated was implemented, and the method for testing includes step：

(1) at least open the first air valve and close the 3rd air valve, strainability test system is entered air-breathing working condition, make to delay The test gas containing pollutant for rushing chamber output inputs from the gas suction side of filter to be tested, then is filled from filtering to be tested The gas exhalation end output put, and detect and record the test gas containing pollutant and filtered through filter to be tested The concentration of forward and backward contained pollutant；

(2) at least open the 3rd air valve and close the first air valve, strainability test system is entered expiration working condition, make water The clean test gas of the moisture content of vapour generation cavity output is from the gas exhalation end input of filter to be tested, then to be tested The gas suction side output of filter；

(3) at least it is again turned on the first air valve and closes the 3rd air valve, strainability test system is again introduced into air-breathing work State, the test gas containing pollutant that cushion chamber exports is set to be inputted from the gas suction side of filter to be tested, then from treating The gas exhalation end output of filter is tested, and detects and record the test gas containing pollutant through filtering to be tested The concentration of the forward and backward contained pollutant of device filtering.
10. strainability method of testing according to claim 9, it is characterised in that also include：Under air-breathing working condition, If the concentration of pollutant is less than the lower limit of setting in the test gas containing pollutant, the 7th air valve and the 8th air valve are opened, Supplementary source gas and carrier gas into the cushion chamber, until the concentration of pollutant reaches setting in the test gas containing pollutant Higher limit.
11. strainability method of testing according to claim 9, it is characterised in that also include：Repeat step (1)~step (3) more than twice, until completing test.
12. strainability method of testing according to claim 9, it is characterised in that also include：At least in air-breathing work shape Under state, the draught head between the gas suction side of the filter to be tested and gas exhalation end is detected and recorded.