CN205816330U - A kind of mask cleaning device - Google Patents
A kind of mask cleaning device Download PDFInfo
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- CN205816330U CN205816330U CN201620684504.4U CN201620684504U CN205816330U CN 205816330 U CN205816330 U CN 205816330U CN 201620684504 U CN201620684504 U CN 201620684504U CN 205816330 U CN205816330 U CN 205816330U
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- mask
- nitrogen
- cleaning device
- control valve
- gun
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Abstract
This utility model provides a kind of mask cleaning device, including nitrogen gun and nitrogen tube, described nitrogen tube one end is connected with extraneous nitrogen gas container, the other end is connected with nitrogen gun, described nitrogen gun is placed on above described mask and inflatable mouth is facing to mask surface, also include that getter device, described getter device are positioned over above mask, and position is relative with described nitrogen gun outgassing direction.The suction that described getter device produces, can alleviate the powerful pressure that thin film is formed by stream of nitrogen gas, avoids the granule secondary pollution produced during cleaning simultaneously, improves cleaning efficiency.
Description
Technical field
This utility model relates to mask clean technologies field, particularly to a kind of mask cleaning device.
Background technology
Photoetching process is one of of paramount importance processing step in semiconductor manufacturing, and Main Function is exactly by the figure on mask
Shape copies on silicon chip, performs etching for next step or ion injecting process is ready, and a usual product needed uses ten
Several even five, 60 pieces of masks can complete.The production line of a multi-product often has hundreds of the most thousands of pieces of masks,
These masks often have small organic or inorganic granule during storing, transporting and use and fall above, shadow during exposure
Ring the light transmission capacity even formation of figure, so before upper litho machine uses certain mask exposure, this mask being checked and removed
These granules are the necessary flow processs on production line.
As depicted in figs. 1 and 2, mask is made up of glass plate 1 and thin film 2, and a surface of glass plate 1 does not has figure, another
Surface configuration has the figure that chromium metal is formed, for preventing glass plate 1 picture surface from being polluted by dust granule, at glass plate 1 picture surface
Be provided with machine frame, by tight for thin film 2 on this organic frame to cover figure.As shown in Figure 3 and Figure 4, detect when mask
When equipment or operator find there is molecule 6 on glass plate 1 or thin film 2 under high light, generally by opening automatic or manual
Nitrogen gun 3, nitrogen is entered nitrogen gun 3 formed stream of nitrogen gas 5 by nitrogen tube 4, blows away granule 6, if it find that granule 6 blows not
Get off, the swab stick with clean solution will be used to carry out wiping.But there is a lot of problem in such cleaning mode, such as thin film
2 can be blown brokenly；Can again fall mask surface after granule 6 is blown afloat elsewhere or side, continue impact exposed
Journey or pollution litho machine.
Utility model content
This utility model provides a kind of mask cleaning device, to reduce the infringement during cleaning of clean solution and nitrogen gun
The risk of mask surface layer film；Avoid the granule secondary pollution produced during cleaning simultaneously, improve cleaning efficiency.
For achieving the above object, the technical solution of the utility model is as follows:
A kind of mask cleaning device, including nitrogen gun, nitrogen tube, described nitrogen tube one end is connected with extraneous nitrogen gas container,
The other end is connected with nitrogen gun, and described nitrogen gun is placed on above described mask and inflatable mouth is facing to mask surface, also includes
Getter device, described getter device is positioned over above mask, and position is relative with described nitrogen gun outgassing direction.This getter device
The mask granule that nitrogen gun can be blown afloat directly siphons away, and prevents granule secondary pollution mask or enters litho machine internal contamination photoetching
Machine；It addition, the suction that described getter device produces, the powerful pressure that thin film is formed by stream of nitrogen gas can be alleviated, reduce thin film
The probability blown brokenly by nitrogen gun.
Alternatively, described getter device includes control valve, suction nozzle, asepwirator pump, and asepwirator pump is connected with suction nozzle, and control valve sets
Put on asepwirator pump, in order to adjust the size of suction.
Alternatively, equipped with control valve in described nitrogen tube, the size of tolerance can be adjusted according to actual demand.
Alternatively, equipped with movable axis on described suction nozzle, it is used for regulating inspiratory direction.
Alternatively, the air-breathing area of described suction nozzle is given vent to anger area less than or equal to described nitrogen gun, prevents inspiratory airflow shadow
Ring direction and the dynamics of stream of nitrogen gas, affect cleaning effect.
Alternatively, described mask cleaning device also includes a cleaning liquid line, described cleaning liquid line and nitrogen gun phase
Connecting, cleaning liquid forms liquid stream by described nitrogen gun, plays dissolution to containing sticking organic particle, the most again
Avoid the damaged risk of thin film.
Alternatively, equipped with control valve on described liquid line, the size of liquid measure can be adjusted according to actual demand.
Alternatively, described cleaning liquid is volatility clean solution, and mask will not cause new pollution.
Alternatively, described volatility clean solution is IPA (isopropanol) solution.
Alternatively, described nitrogen tube, cleaning liquid line, and it is respectively configured control valve, liquids and gases can be controlled
Ratio, it is also possible to control cleaning liquid and nitrogen ejection sequencing: first clean liquid, rear nitrogen；First nitrogen, rear cleaning solution
Body；Cleaning liquid and nitrogen spray formation gas-liquid two fluid simultaneously.
Alternatively, described getter device, nitrogen tube and cleaning liquid line can independently control, and can select difference in functionality group
Close: getter device and nitrogen tube combination；Getter device and cleaning liquid line combination；Nitrogen tube and cleaning liquid line combination；Air-breathing
Device, nitrogen tube and cleaning liquid line three combination.
The mask cleaning device that this utility model provides sets up getter device on the basis of existing equipment, can be nitrogen gun
The mask granule blown afloat directly siphons away, and prevents granule secondary pollution mask or enters litho machine internal contamination litho machine；It addition, inhale
The suction that device of air produces, can alleviate the powerful pressure that thin film is formed by stream of nitrogen gas, reduces what thin film was blown brokenly by nitrogen gun
Probability；Increase a cleaning liquid line in nitrogen gun the most of the present utility model, form gas-liquid two fluid, to containing toughness
Organic particle play solution and dissolve and gas is removed and synchronized the effect that carries out, improve cleaning efficiency, protect simultaneously and cover
The thin film on mould top layer.
Accompanying drawing explanation
Fig. 1 is the side view of mask of the prior art；
Fig. 2 is the structural representation of mask of the prior art；
Fig. 3 is the structural representation cleaning mask glass-board surface in prior art；
Fig. 4 is the structural representation cleaning mask film face in prior art；
Fig. 5 is the mask cleaning device structural representation of this utility model embodiment one；
Fig. 6 is the mask cleaning device structural representation of this utility model embodiment two；
Fig. 7 is the mask cleaning device structural representation of this utility model embodiment three.
Detailed description of the invention
As it was previously stated, when with tradition nitrogen gun cleaning mask granule, granule falls mask table after being blown afloat again
Face elsewhere or side, continues affect exposure process or pollution litho machine；And when pollutant are viscosity Organic substance, by passing
System clean solution rod wiping easily causes secondary damage, and this utility model is for solving this problem, on the basis of tradition nitrogen gun
Upper addition getter device and cleaning liquid line, make device and method of the present utility model below in conjunction with the drawings and specific embodiments
Further describe.
Embodiment one:
As it is shown in figure 5, the mask cleaning device that the present embodiment provides includes: nitrogen gun 3 and nitrogen tube 4, described nitrogen tube 4
One end is connected with extraneous nitrogen gas container, and the other end is connected with nitrogen gun 3, after opening nitrogen gun 3, and the nitrogen in nitrogen gas container
Enter nitrogen gun 3 by nitrogen tube 4, under the effect of nitrogen gun, form stream of nitrogen gas 5, blow off on mask glass plate 1 or thin film 2
Pollution granule.
Described nitrogen gun 3 is placed on above described mask and the pollution granule 6 on inflatable mouth alignment mask surface, so can carry
The accuracy of high definition depollution granule 6.
It is also preferred that the left described mask cleaning device also includes getter device, described getter device is positioned over above mask, and position
Put relative with described nitrogen gun 3 outgassing direction, while nitrogen gun 3 blows off pollution granule 6, getter device can more efficient general
Pollute granule 6 to siphon away, it is to avoid pollute after granule 6 is blown afloat and fall mask surface again elsewhere or side, continuation
Affect exposure process or pollute litho machine.On the other hand, thin film 2 is the most fragile, and stream of nitrogen gas 5 easily causes the damage of thin film 2,
Therefore when pollute granule be on thin film 2, getter device can also alleviate the stream of nitrogen gas 5 infringement to thin film 2.
Described getter device includes suction nozzle the 9, first control valve 7 and asepwirator pump, and asepwirator pump is connected with suction nozzle 9, the first control
Valve 7 processed is arranged on asepwirator pump, and after opening getter device, the first control valve 7 can adjust the size of air-breathing dynamics, to be best suitable for
Air-breathing dynamics more effectively siphon away the pollution granule 6 blown afloat.
Described suction nozzle 9 is provided with movable axis 8, can control the adjustment in suction nozzle 9 direction up and down, adjust to stream of nitrogen gas
5 direction positives, to position, improve and suck the efficiency polluting granule, and the air-breathing area of wherein said suction nozzle 9 is less than described nitrogen gun
Give vent to anger area, effectively prevent inspiratory airflow from affecting direction and the dynamics of stream of nitrogen gas 5, affect cleaning effect.
When pollutant 6 are bonded on the thin film 2 of mask, the step of cleaning is consistent with the above, and I will not elaborate.
Wherein said first control valve 7 does not limit installation method, as long as the air-breathing great efforts of getter device can be reached to regulate
Little.
Embodiment two
The present embodiment is unlike embodiment one, and the present embodiment is additionally arranged clearly on the mask cleaning device of embodiment one
Clean liquid line 10.
As shown in Figure 6, cleaning liquid line 10 one end connects exterior clean solution container, and the other end connects nitrogen gun 3, nitrogen
One end of pipe 4 is connected with outside nitrogen gas container, and the other end is connected with nitrogen gun 3, this device pollution granule to mask surface,
Play the effect that solution dissolves and gas is removed.Getter device can siphon away polluting granule simultaneously, it is to avoid after granule is blown afloat
Fall mask surface again elsewhere or side, continue affect exposure process or pollute litho machine, improve cleaning and imitate
Rate.
Nitrogen tube 4 is provided with the second control valve 12, and cleaning liquid line 10 is provided with the 3rd control valve 13.Open the second control
Valve 12 and the 3rd control valve 13, cleaning liquid and nitrogen are entered nitrogen gun 3 formed by cleaning liquid lines 10 and nitrogen tube 4 respectively
Gas-liquid two fluid 11, is placed on above described mask and the pollution granule 6 on inflatable mouth alignment mask surface by it by nitrogen gun 3
Blow off.
The ratio of nitrogen and cleaning liquid can be regulated by the second control valve 12 and the 3rd control valve 13, improves cleaning
Efficiency, described clean solution is volatility mask clean solution, and the present embodiment selects IPA solution, and liquids and gases are adjusted by 1:1
Joint.
Produce suction after opening getter device, adjust suction nozzle 9 direction by movable axis 8, to stream of nitrogen gas 5 direction just adjust
Position relatively, and adjust air-breathing dynamics by control valve 7.The mask contamination granule 6 nitrogen gun 3 blown afloat siphons away, wherein suction nozzle 9
Air-breathing area give vent to anger area less than described nitrogen gun 3, effectively prevent inspiratory airflow from affecting direction and the dynamics of stream of nitrogen gas 5,
Affect cleaning effect.
Owing to nitrogen tube, cleaning liquid line and getter device have independent control valve, the function combinations that this three is different
All in this utility model protection domain.
Wherein said second control valve 12 and the 3rd control valve 13 do not limit installation method, as long as can reach to adjust nitrogen amount
Effect with the cleaning solution scale of construction.
Embodiment three
The present embodiment is with the distinctive points of embodiment one and embodiment two: the present embodiment increases at existing mask cleaning device
If cleaning liquid line.
As it is shown in fig. 7, cleaning liquid line 10 one end connects exterior clean solution container, the other end connects nitrogen gun 3, nitrogen
One end of pipe 4 is connected with outside nitrogen gas container, and the other end is connected with nitrogen gun 3, and nitrogen tube 4 is provided with the second control valve 12,
Cleaning liquid line 10 is provided with the 3rd control valve 13.When polluting granule 6 and being sticking Organic substance, avoid the need for cleaning
The swab stick of solution carries out wiping, reduces the risk that thin film is destroyed.
Described nitrogen gun 3 is placed on above described mask and the pollution granule 6 on inflatable mouth alignment mask surface, so can carry
The accuracy of high definition depollution granule 6.Opening the second control valve 12 and the 3rd control valve 13, cleaning liquid and nitrogen pass through respectively
Cleaning liquid line 10 and nitrogen tube 4 enter nitrogen gun 3 and form gas-liquid two fluid 11, and the pollution granule 6 on alignment mask surface plays
The effect that solution dissolves and gas is removed, improves cleaning efficiency.
The ratio of nitrogen and cleaning liquid can be regulated by the second control valve 12 and the 3rd control valve 13, improves cleaning
Efficiency, described cleaning liquid is volatility mask clean solution, and the present embodiment selects IPA solution, and liquids and gases are adjusted by 1:1
Joint.
Owing to nitrogen tube 4 and cleaning liquid line 10 are each equipped with the second control valve 12 and the 3rd control valve 13, it is also possible to have with
Lower compound mode:
First open the second control valve 12, produce stream of nitrogen gas and spray to pollute granule 6 position, then open the 3rd control valve 13；
Or
After first opening the 3rd control valve 13, produce cleaning liquid stream and spray to pollute granule 6 position, turn off, and open second
Control valve 12 produces stream of nitrogen gas and sprays to mask contamination particles sites；Or
Only open the second pipe control valve 12, produce stream of nitrogen gas；Or
Only open the 3rd control valve 13, produce cleaning liquid stream.
The present embodiment opens the second control valve 12 and the 3rd control valve 13 the most simultaneously.
Foregoing description is only the description to this utility model preferred embodiment, not any limit to this utility model scope
Fixed, any change that the those of ordinary skill in this utility model field does according to the disclosure above content, modification, belong to right and want
Seek the protection domain of book.
Claims (9)
1. a mask cleaning device, including nitrogen gun and nitrogen tube, described nitrogen tube one end is connected, separately with extraneous nitrogen gas container
One end is connected with nitrogen gun, and described nitrogen gun is placed on above described mask and inflatable mouth is facing to mask surface, and its feature exists
In, also include that getter device, described getter device are positioned over above mask, and position is relative with described nitrogen gun outgassing direction.
2. mask cleaning device as claimed in claim 1, it is characterised in that described getter device include control valve, suction nozzle and
Asepwirator pump, wherein, described suction nozzle is connected with described asepwirator pump, and described control valve is arranged on described asepwirator pump.
3. mask cleaning device as claimed in claim 2, it is characterised in that installation activity axle on described suction nozzle.
4. mask cleaning device as claimed in claim 2, it is characterised in that the air-breathing area of described suction nozzle is less than or equal to institute
State the area of giving vent to anger of nitrogen gun.
5. mask cleaning device as claimed in claim 1, it is characterised in that equipped with control valve in described nitrogen tube.
6. mask cleaning device as claimed in claim 1, it is characterised in that described mask cleaning device also includes cleaning liquid
Pipe, one end of described cleaning liquid line connects exterior clean liquid container, and the other end is connected with nitrogen gun.
7. mask cleaning device as claimed in claim 6, it is characterised in that equipped with control valve on described cleaning liquid line.
8. mask cleaning device as claimed in claim 6, it is characterised in that described cleaning liquid uses volatility cleaning molten
Liquid.
9. mask cleaning device as claimed in claim 8, it is characterised in that described volatility clean solution aqueous isopropanol.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620684504.4U CN205816330U (en) | 2016-06-30 | 2016-06-30 | A kind of mask cleaning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620684504.4U CN205816330U (en) | 2016-06-30 | 2016-06-30 | A kind of mask cleaning device |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN205816330U true CN205816330U (en) | 2016-12-21 |
Family
ID=57567278
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201620684504.4U Active CN205816330U (en) | 2016-06-30 | 2016-06-30 | A kind of mask cleaning device |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN205816330U (en) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107020285A (en) * | 2017-04-19 | 2017-08-08 | 京东方科技集团股份有限公司 | A kind of ultrasonic cleaning equipment and base plate processing system |
| CN107797392A (en) * | 2017-11-13 | 2018-03-13 | 上海华力微电子有限公司 | A kind of device and method for reducing mask plate particle contamination in extreme ultraviolet carving technology |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| CN111128678A (en) * | 2019-12-17 | 2020-05-08 | 无锡中微掩模电子有限公司 | Method for removing particles on mask protective film |
-
2016
- 2016-06-30 CN CN201620684504.4U patent/CN205816330U/en active Active
Cited By (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN107020285A (en) * | 2017-04-19 | 2017-08-08 | 京东方科技集团股份有限公司 | A kind of ultrasonic cleaning equipment and base plate processing system |
| CN107020285B (en) * | 2017-04-19 | 2021-01-15 | 京东方科技集团股份有限公司 | Ultrasonic cleaning device and substrate processing system |
| CN107797392A (en) * | 2017-11-13 | 2018-03-13 | 上海华力微电子有限公司 | A kind of device and method for reducing mask plate particle contamination in extreme ultraviolet carving technology |
| CN107797392B (en) * | 2017-11-13 | 2020-08-04 | 上海华力微电子有限公司 | Device and method for reducing particle pollution of mask in extreme ultraviolet lithography process |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| CN111128678A (en) * | 2019-12-17 | 2020-05-08 | 无锡中微掩模电子有限公司 | Method for removing particles on mask protective film |
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| Date | Code | Title | Description |
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP01 | Change in the name or title of a patent holder | ||
| CP01 | Change in the name or title of a patent holder |
Address after: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee after: Shanghai microelectronics equipment (Group) Limited by Share Ltd Address before: 201203 Pudong New Area East Road, No. 1525, Shanghai Patentee before: Shanghai Micro Electronics Equipment Co., Ltd. |