CN106914454A - A kind of device and sweep-out method for removing reticle surface particulate pollutant - Google Patents
A kind of device and sweep-out method for removing reticle surface particulate pollutant Download PDFInfo
- Publication number
- CN106914454A CN106914454A CN201710146462.8A CN201710146462A CN106914454A CN 106914454 A CN106914454 A CN 106914454A CN 201710146462 A CN201710146462 A CN 201710146462A CN 106914454 A CN106914454 A CN 106914454A
- Authority
- CN
- China
- Prior art keywords
- air gun
- light shield
- air
- particulate pollutant
- flow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B5/00—Cleaning by methods involving the use of air flow or gas flow
- B08B5/02—Cleaning by the force of jets, e.g. blowing-out cavities
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
- B08B15/04—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area from a small area, e.g. a tool
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67028—Apparatus for fluid treatment for cleaning followed by drying, rinsing, stripping, blasting or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2221/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof covered by H01L21/00
- H01L2221/67—Apparatus for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components; Apparatus not specifically provided for elsewhere
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- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
The invention discloses a kind of device for removing reticle surface particulate pollutant, including air gun, it is characterised in that also including wind unit and exhaust unit, the wind unit is located at the top of the air gun, for producing ambient windstream straight down；The light shield is located at the centre of the wind unit and air gun, and horizontally rotates；The air gun includes air gun main body and air gun head, the air gun is head-up and aligned mask lower surface persistently blows out upward cleaning air-flow, for removing light shield lower surface particulate pollutant, the exhaust unit is located at the lower section of the air gun, particulate pollutant after removing is subject to acting on for gravity and downward ambient windstream, is siphoned away by the exhaust unit.The device and sweep-out method of a kind of removing reticle surface particulate pollutant that the present invention is provided, can effectively remove reticle surface particulate pollutant, and not have particulate pollutant marking residual, prevent light shield secondary pollution.
Description
Technical field
The present invention relates to technical field of semiconductors, and in particular to the device of a kind of removing reticle surface particulate pollutant and clear
Except method.
Background technology
Light shield also known as photomask board, mask plate, be by quartz glass as substrate, plate in the above layer of metal chromium and
Photoresists, as a kind of photosensitive material, are exposed on the circuit diagram for having designed on photoresists by electronic laser equipment, are exposed
The region of light developed out can form circuitous pattern on crome metal, the photomask board as the egative film after similar exposure, so
After be applied to carry out projective iteration to integrated circuit, photoengraving is carried out to the circuit for being projected by IC etching machine.
In semiconductor fabrication, be frequently encountered reticle surface be exceeded specification Particulate Pollution situation, it is necessary to and
When treatment production can just be normally carried out, current industry commonly use blower mechanism remove reticle surface particulate pollutant.It is existing
When having blower mechanism in technology in working order, air gun is located above light shield and is purged, to remove reticle surface particle
Thing pollutes, and this blower mechanism has following defect：(1) light covers in mechanism overall situation, environment in local environment as factory
Itself there are a large amount of ultra-specification pollutants, light is covered with the risk for being polluted again；(2) because light shield is in air gun lower section, air-flow
Light shield is blowed to, pollution particle removal effect is not good, and pollution particle can leave scratch or the marking in reticle surface, can cause light shield
Secondary pollution, it more difficult to remove, this kind of situation can only send producer back to and carry out cleaning reparation, and period production cannot be carried out, factory's loss
It is huge.
With the fast development of semiconductor industry, if the pollution particle of reticle surface effectively can not be removed quickly, will
The production efficiency and the output value of semicon industry and related industry can be influenceed.
The content of the invention
The technical problems to be solved by the invention are to provide a kind of device for removing reticle surface particulate pollutant and removing
Method, can effectively remove reticle surface particulate pollutant, and not have particulate pollutant marking residual, prevent light shield secondary
Pollution.
To achieve these goals, including air gun, wherein, also including wind unit and exhaust unit, the wind unit
Positioned at the top of the air gun, for producing ambient windstream straight down, ambient windstream to ensure straight down in device all the time
In the ambient windstream；The light shield is located at the centre of the wind unit and air gun, and horizontally rotates；The air gun bag
Air gun main body and air gun head are included, the air gun sends cleaning air-flow, the air gun head and the air gun master relative to light shield movement
Body phase presss from both sides an obtuse angle, and the air gun head aligned mask lower surface persistently blows out upward cleaning air-flow, for removing under light shield
Surface particulate contamination thing, the cleaning air-flow blows out obliquely, prevents particulate pollutant from falling into the air gun head, causes air gun
Damage；The exhaust unit is located at the lower section of the air gun, and the particulate pollutant after removing is subject to gravity and downward environment
The effect of air-flow, is siphoned away by the exhaust unit, and the upward cleaning air-flow of the air gun blowout is after reticle surface is touched
Change direction as ambient windstream is discharged by the exhaust unit.
Further, the air gun includes air gun main body and air gun head, and the pressure of the cleaning air-flow is more than the environment
The pressure of air-flow, the ambient windstream is that, in order to maintain the environment in described device, the cleaning air-flow is described in order to remove
The particulate pollutant of light shield lower surface.
Further, the distance between the light shield and the air gun be more than the radius that the light shield overturns, when the light
Cover lower surface is removed after finishing, and the upper surface before the light shield upset 180 degree is allowed to is changed into lower surface.
Further, the ambient windstream and/or the cleaning air-flow are High Purity Nitrogen air-flow.
Further, when cleaning beginning, the air gun moves into light shield center, and with a predetermined speed from the light shield
The heart does to the smooth shroud rim and at the uniform velocity moves back and forth, and continues to blow out the cleaning air-flow of certain pressure.
Further, the air gun is outwards at the uniform velocity moved from light shield center, and light shield rotates a circle, the air gun from
The center of light shield moves to edge.
Further, with the same center of circle, the rotating speed of 0-50r/min at the uniform velocity rotates the light shield.
Further, the cleaning air-flow that the pressure of the ambient windstream that the wind unit is produced, the air gun persistently blow out
Pressure, be decided by the size of the particulate pollutant of the reticle surface and the light shield treatment after surface cleanliness will
Ask.
Further, described device also includes control unit, the pressure of the ambient windstream that the wind unit is produced, described
The pressure for cleaning air-flow, the light shield rotary speed and the air gun translational speed that air gun persistently blows out pass through control unit
Regulation.
To achieve these goals, present invention also offers a kind of method for removing reticle surface particulate pollutant, wherein,
Including：
S1 opens the wind unit and exhaust unit, and the wind unit produces ambient windstream straight down, environment
Air-flow ensures to be in the ambient windstream all the time in device straight down, and is discharged by the exhaust unit；
Be positioned over light shield between the wind unit and air gun by S2, and the light shield horizontally rotates in the same plane；
S3 opens the air gun, and the air gun is head-up and aligned mask lower surface persistently blows out upward cleaning gas
Stream, for removing light shield lower surface particulate pollutant, the particulate pollutant after removing is subject to gravity and downward high-purity air-flow
Effect, siphoned away by the exhaust unit；
After light shield lower surface is disposed described in S4, the upper surface before the light shield upset 180 degree is allowed to is changed into lower surface,
Carry out S3 operations.
The present invention having the beneficial effect that compared to existing technology：Wind unit discharges environment gas straight down directly over of the invention
There is exhaust unit stream, lower section, and two systems work simultaneously so that light shield local environment exists without particulate pollutant；The present invention is adopted
With air gun under, the structure that light is covered on, the cleaning air-flow of air gun blowout is used to remove the particulate pollutant of light shield lower surface, clearly
The particulate pollutant for removing is siphoned away in time in the presence of gravity and downdraught by exhaust unit, prevents particulate pollutant in light
The movement of cover surface produces cut, and marking residue problem when particulate pollutant is removed is solved well；Air gun head and air gun main body
An obtuse angle is folded, air gun head aligned mask lower surface persistently blows out cleaning air-flow obliquely, cleans air-flow and blow out obliquely,
Both can guarantee that particulate pollutant dropped in time, and prevented particulate pollutant from falling into air gun head again, and caused air gun to damage.
Brief description of the drawings
Fig. 1 is a kind of structural representation of the device for removing reticle surface particulate pollutant.
Fig. 2 is a kind of in running order schematic diagram of device for removing reticle surface particulate pollutant.
In figure, 1 wind unit, 2 light shields, 3 air guns, 31 air gun main bodys, 32 air gun heads, 4 exhaust units.
Specific embodiment
To make the object, technical solutions and advantages of the present invention clearer, below in conjunction with the accompanying drawings to specific reality of the invention
The mode of applying is described in further detail.
As shown in figure 1, a kind of device of removing reticle surface particulate pollutant that the present invention is provided, including wind unit 1,
Air gun 3 and exhaust unit 4, wind unit 1 are located at the top of air gun 3, for producing ambient windstream straight down；Air gun 3 is wrapped
Include air gun main body 31 and air gun head 32, air gun 3 sends cleaning air-flow relative to the movement of light shield 2, air gun head 32 upward and is aligned
The lower surface of light shield 2 persistently blows out upward cleaning air-flow, for removing the lower surface particulate pollutant of light shield 2；Exhaust unit 4 is located at
The lower section of air gun 3, nyctitropic cleaning air-flow, particulate pollutant and ambient windstream are changed for discharging.
The cleaning air-flow obliquely that air gun head 32 persistently blows out is used to remove the particulate pollutant of the lower surface of light shield 2, goes out
The ambient windstream straight down of wind unit 1 be in order in ensureing inside device the atmosphere in ambient windstream all the time, therefore, clean
During, the pressure of the pressure more than ambient windstream of air-flow is cleaned, and clean air-flow and change after reticle surface is touched
Direction, changes the particulate pollutant of the cleaning air-flow after direction and removing as ambient windstream is discharged by exhaust unit.
When cleaning beginning, light shield 2 is located at the centre of wind unit 1 and air gun 3, and the lower surface of light shield 2 is towards air gun
Simultaneously to be eliminated face, the cleaning air-flow obliquely of the blowout of air gun 3 is purged to the lower surface of light shield, and lower surface is removed
After finishing, the upper surface before light shield upset 180 degree is allowed to is changed into lower surface, proceeds to remove.
Air gun head 32 folds an obtuse angle with air gun main body 31, and the lower surface of 32 aligned mask of air gun head 2 persistently blows out upwards
Cleaning air-flow, cleaning air-flow obliquely both can guarantee that the particulate pollutant after removing drops rapidly, prevents particle contamination
Thing produces cut trace in reticle surface, in preventing particulate pollutant from falling into air gun head again, influences the normal work of air gun.
In reset procedure, ambient windstream and cleaning air-flow are all High Purity Nitrogen air-flow, it is ensured that without particulate pollutant in device,
If ambient windstream is High Purity Nitrogen air-flow, cleaning air-flow is high-purity compressed air stream, or it is High Purity Nitrogen air-flow, environment to clean air-flow
Air-flow is high-purity compressed air stream, it is also ensured that particulate pollutant is free of in device, reaches and effectively remove reticle surface pollution
The effect of thing.
In cleaning process, light shield 2 is at the uniform velocity rotated with the same center of circle, the rotating speed of 0-50r/min, and air gun 3 is moved into light shield
At the heart, and done to light shroud rim from light shield center at the uniform velocity move back and forth at a predetermined velocity, and continue to blow out the cleaning of certain pressure
Air-flow, and light shield rotate first week, air gun 3 moves to edge from the center of light shield 2, during 2 second rotation of light shield, gas
Rifle 3 moves to center from the edge of light shield 2, moves in circles.
A kind of device of removing reticle surface particulate pollutant that the present invention is provided also includes control unit, wind unit 1
Persistently the pressure of the cleaning air-flow of blowout, the rotary speed of light shield 2 and air gun 3 are moved pressure, the air gun 3 of the ambient windstream of generation
Speed is adjusted by control unit, while pressure, the cleaning gas of the lasting blowout of air gun 3 of the ambient windstream that wind unit 1 is produced
The pressure of stream, is decided by the surface cleanliness after the size of the particulate pollutant on the surface of the light shield 2 and light shield treatment
It is required that.
Sweep-out method of the invention is illustrated with reference to Fig. 2, wherein light shield is cuboid, is comprised the following steps：
S1 opens the wind unit 1 and exhaust unit 4, and it is 3Pa's that the wind unit 1 produces pressure straight down
High Purity Nitrogen air-flow, air is all discharged in device after 5 minutes；
Be positioned over light shield 2 between wind unit 1 and air gun 3 by S2, and light shield 2 horizontally rotates in the same plane；The He of light shield 2
Sufficiently large distance is kept between air gun 3；
S3 opens air gun 3, and angle of the air gun head 32 between air gun main body 31 is 120 °, and air gun head 32 upward and is aligned
The lower surface of light shield 2 persistently blows out the High Purity Nitrogen air-flow that upward pressure is 5Pa, for removing the lower surface particulate pollutant of light shield 2,
Particulate pollutant after removing is subject to acting on for gravity and downward High Purity Nitrogen air-flow, is siphoned away by the exhaust unit；
The lower surface of S4 light shields 2 is removed after finishing, and the upper surface before 180 ° of the upset of light shield 2 is allowed to is changed into lower surface, carries out S3
Operation.
The preferred embodiments of the present invention are the foregoing is only, the embodiment is not intended to limit patent protection of the invention
Scope, therefore every equivalent structure change made with specification of the invention and accompanying drawing content, similarly should be included in this
In the protection domain of invention appended claims.
Claims (10)
1. a kind of device for removing reticle surface particulate pollutant, including air gun, it is characterised in that also including wind unit and row
Gas unit, the wind unit is located at the top of the air gun, and for producing ambient windstream straight down, ambient windstream is vertical
Ensure downwards to be in the ambient windstream all the time in device；The light shield is located at the centre of the wind unit and air gun, and
Horizontally rotate；The air gun include air gun main body and air gun head, the air gun relative to light shield move, the air gun head with it is described
Air gun main body folds an obtuse angle, and the air gun head aligned mask lower surface persistently blows out cleaning air-flow obliquely, for clear
Except light shield lower surface particulate pollutant；The exhaust unit is located at the lower section of the air gun, and the particulate pollutant after removing is received
To the effect of gravity and downward ambient windstream, siphoned away by the exhaust unit, the upward cleaning air-flow of the air gun blowout exists
Change direction is as ambient windstream is discharged by the exhaust unit after touching reticle surface.
2. it is according to claim 1 remove reticle surface particulate pollutant device, it is characterised in that the cleaning air-flow
Pressure more than the ambient windstream pressure.
3. it is according to claim 1 remove reticle surface particulate pollutant device, it is characterised in that the light shield is gentle
More than the radius that the light shield overturns, after the light shield lower surface is removed to be finished, the light shield overturns the distance between rifle
180 ° be allowed to before upper surface be changed into lower surface.
4. it is according to claim 1 remove reticle surface particulate pollutant device, it is characterised in that the ambient windstream
And/or the cleaning air-flow is High Purity Nitrogen air-flow.
5. it is according to claim 1 remove reticle surface particulate pollutant device, it is characterised in that clean start when,
The air gun moves into light shield center, and does at the uniform velocity reciprocal shifting to the smooth shroud rim from the light shield center with a predetermined speed
It is dynamic, and continue to blow out the cleaning air-flow of certain pressure.
6. the device for removing reticle surface particulate pollutant according to claim 5, it is characterised in that the air gun is from light
Cover center is outwards at the uniform velocity moved, and light shield rotates a circle, and the air gun moves to edge from the center of light shield.
7. it is according to claim 1 remove reticle surface particulate pollutant device, it is characterised in that the light shield is with same
One center of circle, the rotating speed of 0-50r/min at the uniform velocity rotates.
8. it is according to claim 1 remove reticle surface particulate pollutant device, it is characterised in that the wind unit
The pressure of the ambient windstream of generation, the air gun persistently blow out cleaning air-flow pressure, be decided by the reticle surface
Surface cleanliness requirement after the size of grain pollutant and light shield treatment.
9. the device for removing reticle surface particulate pollutant according to claim 1, it is characterised in that also single including control
Unit, pressure, the light shield of the cleaning air-flow that the pressure of the ambient windstream that the wind unit is produced, the air gun persistently blow out
Rotary speed and the air gun translational speed are adjusted by control unit.
10. the sweep-out method of the device described in a kind of use claim 1, it is characterised in that including：
S1 opens the wind unit and exhaust unit, and the wind unit produces ambient windstream straight down, ambient windstream
Ensure to be in the ambient windstream all the time in device straight down, and discharged by the exhaust unit；
Be positioned over light shield between the wind unit and air gun by S2, and the light shield horizontally rotates in the same plane；
S3 opens the air gun, and the air gun head folds an obtuse angle with the air gun main body, under the air gun head aligned mask
Continuous surface blowout cleaning air-flow obliquely, for removing light shield lower surface particulate pollutant, the particle contamination after removing
Thing is subject to acting on for gravity and downward high-purity air-flow, is siphoned away by the exhaust unit；
After light shield lower surface is disposed described in S4, the upper surface before the light shield upset 180 degree is allowed to is changed into lower surface, carries out
S3 is operated.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710146462.8A CN106914454A (en) | 2017-03-13 | 2017-03-13 | A kind of device and sweep-out method for removing reticle surface particulate pollutant |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201710146462.8A CN106914454A (en) | 2017-03-13 | 2017-03-13 | A kind of device and sweep-out method for removing reticle surface particulate pollutant |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN106914454A true CN106914454A (en) | 2017-07-04 |
Family
ID=59461335
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201710146462.8A Pending CN106914454A (en) | 2017-03-13 | 2017-03-13 | A kind of device and sweep-out method for removing reticle surface particulate pollutant |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN106914454A (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109772811A (en) * | 2017-11-10 | 2019-05-21 | 中芯国际集成电路制造(上海)有限公司 | Clearing apparatus and purging system |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| CN112845372A (en) * | 2020-12-31 | 2021-05-28 | 中国工程物理研究院激光聚变研究中心 | Apparatus and method for suppressing optical element defect |
Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1983035A (en) * | 2005-03-14 | 2007-06-20 | 台湾积体电路制造股份有限公司 | Method for reducing mask precipitation defects |
| CN103995434A (en) * | 2014-06-12 | 2014-08-20 | 上海华力微电子有限公司 | Mask dust collection device |
-
2017
- 2017-03-13 CN CN201710146462.8A patent/CN106914454A/en active Pending
Patent Citations (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1983035A (en) * | 2005-03-14 | 2007-06-20 | 台湾积体电路制造股份有限公司 | Method for reducing mask precipitation defects |
| CN103995434A (en) * | 2014-06-12 | 2014-08-20 | 上海华力微电子有限公司 | Mask dust collection device |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN109772811A (en) * | 2017-11-10 | 2019-05-21 | 中芯国际集成电路制造(上海)有限公司 | Clearing apparatus and purging system |
| CN110127375A (en) * | 2019-04-28 | 2019-08-16 | 武汉华星光电技术有限公司 | Photomask picking and placing device |
| CN112845372A (en) * | 2020-12-31 | 2021-05-28 | 中国工程物理研究院激光聚变研究中心 | Apparatus and method for suppressing optical element defect |
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Application publication date: 20170704 |