CN205539926U - Perpendicular two -sided exposure system is directly write to laser of perpendicular linear array of DMD projection optical path - Google Patents
Perpendicular two -sided exposure system is directly write to laser of perpendicular linear array of DMD projection optical path Download PDFInfo
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- CN205539926U CN205539926U CN201620060017.0U CN201620060017U CN205539926U CN 205539926 U CN205539926 U CN 205539926U CN 201620060017 U CN201620060017 U CN 201620060017U CN 205539926 U CN205539926 U CN 205539926U
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- linear array
- exposure system
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Abstract
The utility model discloses a perpendicular two -sided exposure system is directly write to laser of perpendicular linear array of DMD projection optical path, include: arrange DMD integrated component (2) and PCB plate (3) of base (4) upper surface perpendicularly in, DMD integrated component (2) are two sets, perpendicular symmetric distribution in PCB plate (3) both sides, wherein, vertical light exposure is carried out to A, the B face of PCB plate (3) simultaneously in cross -distribution a plurality of DMD device projection optical path (1) in the Z axle direction of DMD integrated component (2), the utility model discloses an it can expose by exposure workpiece's tow sides simultaneously to set up two sets of DMD device projection optical path perpendicularly on PCB plate both sides for the efficiency of work promotes the one time, better improvement the productivity, guaranteed the quality of product simultaneously.
Description
Technical field
This utility model relates to a kind of exposure system, the laser direct-writing vertical double-sided exposure system of a kind of DMD projecting light path vertical linear array, belongs to direct-write type lithography machine quick scan exposure technical field.
Background technology
Write-through photoetching technique be development in recent years faster, to substitute the direct transfer techniques of image of the board-like photoetching technique of traditional mask, in quasiconductor and PCB production field, have increasingly consequence；Utilize this technology with shortened process, and production cost can be reduced.
The direct-write type lithography machine of main flow is scanned exposure in single work stage mode mostly in the market: after the most first having been exposed in the A face being exposed workpiece, then carries out reprint, is then exposed B face；In single workpiece table system, for exposure substrate upper plate, be directed at, expose, lower plate is carried out successively.
According to current structural system, each operating process has reached the time-consuming upper limit, is difficult to shorten the operating time of certain operating procedure again, and the direct-write type lithography machine of i.e. single work stage, due to the serial nature of each operating process, has been difficult to improve production capacity more.
Summary of the invention
The problem existed for above-mentioned prior art, this utility model provides the laser direct-writing vertical double-sided exposure system of a kind of DMD projecting light path vertical linear array, this system can expose the tow sides being exposed workpiece simultaneously, improves work efficiency further, thus improves production capacity.
To achieve these goals, the technical solution adopted in the utility model is: 1. the laser direct-writing vertical double-sided exposure system of a DMD projecting light path vertical linear array, including:
It is vertically arranged in DMD integrated package and the pcb board part of base upper surface；
Described DMD integrated package is that two sets, vertical symmetry are distributed in pcb board part both sides；Wherein, in the Z-direction of DMD integrated package, cross-distribution multiple DMD device projecting light path carries out vertical exposure to A, B face of pcb board part simultaneously.
Described DMD integrated package top and bottom the most all the time with on pcb board part, bottom concordant.
The detachable base upper surface that is fixed on bottom described DMD integrated package, pcb board part moving exposure in the Y-axis direction.
With slot or click on fashion or be fixed on base bottom described DMD integrated package.
It is additionally provided with gathering sill so that pcb board part accurate rectilinear translation in Y-axis at described pcb board part and base contacts.
Compared with existing single work stage scan exposure form, this utility model can expose simultaneously be exposed the tow sides of workpiece by being vertically arranged Liang Tao DMD device projecting light path on pcb board part both sides, make the improved efficiency one times of work, preferably improve production capacity, ensure that the quality of product simultaneously.
Accompanying drawing explanation
Fig. 1 is this utility model system schematic.
In figure: 1, DMD device projecting light path, 2, DMD integrated package, 3, pcb board part, 4, base.
Detailed description of the invention
The utility model is described in further detail below in conjunction with the accompanying drawings.
Wherein, this utility model is on the basis of accompanying drawing 1, and left and right, upper and lower, the bottom of accompanying drawing 1, center, end are left and right, upper and lower, bottom of the present utility model, center, end.It should be noted that: unless specifically stated otherwise, positioned opposite, the numerical value etc. of the parts otherwise illustrated in the present embodiment is not limited to scope of the present utility model.
It is illustrated in figure 1 the laser direct-writing vertical double-sided exposure system of a kind of DMD projecting light path vertical linear array, including:
It is vertically arranged in DMD integrated package 2 and the pcb board part 3 of base 4 upper surface；
Described DMD integrated package 2 is that two sets, vertical symmetry are distributed in pcb board part 3 both sides；Wherein, in the Z-direction of DMD integrated package 2, cross-distribution multiple DMD device projecting light path 1 carries out vertical exposure to A, B face of pcb board part 3 simultaneously.
Further, in order to ensure exposure rate, described DMD integrated package 2 top and bottom the most all the time with on pcb board part 3, bottom concordant.
Meanwhile, detachable base 4 upper surface that is fixed on, pcb board part 3 moving exposure in the Y-axis direction bottom DMD integrated package 2.
Above-mentioned detachable can be slot or click on fashion or be fixed on base 4, can select according to actual needs.
Simultaneously in order to ensure pcb board part 3 accurate rectilinear translation in the Y-axis direction, it is additionally provided with gathering sill at described pcb board part 3 with base 4 contact position.
In sum: compared with existing single work stage scan exposure form, this utility model can expose simultaneously be exposed the tow sides of workpiece by being vertically arranged Liang Tao DMD device projecting light path 1 on pcb board part 3 both sides, make the improved efficiency one times of work, preferably improve production capacity, ensure that the quality of product simultaneously.
It is obvious to a person skilled in the art that this utility model is not limited to the details of above-mentioned one exemplary embodiment, and in the case of without departing substantially from spirit or essential attributes of the present utility model, it is possible to realize this utility model in other specific forms.Therefore, no matter from the point of view of which point, embodiment all should be regarded as exemplary, and be nonrestrictive, scope of the present utility model is limited by claims rather than described above, it is intended that all changes fallen in the implication of equivalency and scope of claim included in this utility model.Should not be considered as limiting involved claim by any reference in claim.
The above; it is only preferred embodiment of the present utility model; not in order to limit this utility model, every any trickle amendment, equivalent and improvement made above example according to technical spirit of the present utility model, within should be included in the protection domain of technical solutions of the utility model.
Claims (5)
1. the laser direct-writing vertical double-sided exposure system of a DMD projecting light path vertical linear array, it is characterised in that including:
It is vertically arranged in DMD integrated package (2) and the pcb board part (3) of base (4) upper surface；
Described DMD integrated package (2) is that two sets, vertical symmetry are distributed in pcb board part (3) both sides；Wherein, in the Z-direction of DMD integrated package (2), cross-distribution multiple DMD device projecting light path (1) carries out vertical exposure to A, B face of pcb board part (3) simultaneously.
The laser direct-writing vertical double-sided exposure system of a kind of DMD projecting light path the most according to claim 1 vertical linear array, it is characterised in that described DMD integrated package (2) top is gone up with pcb board part (3) the most all the time with bottom, bottom is concordant.
The laser direct-writing vertical double-sided exposure system of a kind of DMD projecting light path the most according to claim 2 vertical linear array, it is characterized in that, described detachable base (4) upper surface that is fixed in DMD integrated package (2) bottom, pcb board part (3) moving exposure in the Y-axis direction.
The laser direct-writing vertical double-sided exposure system of a kind of DMD projecting light path the most according to claim 3 vertical linear array, it is characterised in that described DMD integrated package (2) bottom with slot or click on fashion or is fixed on base (4).
The laser direct-writing vertical double-sided exposure system of a kind of DMD projecting light path the most according to claim 3 vertical linear array, it is characterized in that, described pcb board part (3) and base (4) contact position are additionally provided with gathering sill so that pcb board part (3) accurate rectilinear translation in Y-axis.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620060017.0U CN205539926U (en) | 2016-01-22 | 2016-01-22 | Perpendicular two -sided exposure system is directly write to laser of perpendicular linear array of DMD projection optical path |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201620060017.0U CN205539926U (en) | 2016-01-22 | 2016-01-22 | Perpendicular two -sided exposure system is directly write to laser of perpendicular linear array of DMD projection optical path |
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| Publication Number | Publication Date |
|---|---|
| CN205539926U true CN205539926U (en) | 2016-08-31 |
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| CN201620060017.0U Active CN205539926U (en) | 2016-01-22 | 2016-01-22 | Perpendicular two -sided exposure system is directly write to laser of perpendicular linear array of DMD projection optical path |
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111176080A (en) * | 2020-02-26 | 2020-05-19 | 深圳市欣光辉科技有限公司 | CCD line automatic exposure machine |
-
2016
- 2016-01-22 CN CN201620060017.0U patent/CN205539926U/en active Active
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN111176080A (en) * | 2020-02-26 | 2020-05-19 | 深圳市欣光辉科技有限公司 | CCD line automatic exposure machine |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address |
Address after: 221000 west side of Hengshan Road, Pizhou City, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Yingsu integrated circuit equipment Co., Ltd Address before: 221600 Huashan Road, Pizhou Economic Development Zone, Xuzhou, Jiangsu Patentee before: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |
|
| CP03 | Change of name, title or address |