CN205539921U - Two -sided exposure device of slope is directly write to laser - Google Patents
Two -sided exposure device of slope is directly write to laser Download PDFInfo
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- CN205539921U CN205539921U CN201620059992.XU CN201620059992U CN205539921U CN 205539921 U CN205539921 U CN 205539921U CN 201620059992 U CN201620059992 U CN 201620059992U CN 205539921 U CN205539921 U CN 205539921U
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- exposure device
- polygon prism
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- exposure
- slope
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Abstract
The utility model discloses a two -sided exposure device of slope is directly write to laser, including base (4) and exposure device (2), exposure device (2) have two sets ofly, all the slope set up the upper surface in base (4), slide (5) in base (4) upper surface setting at the sandwich digit of two sets of exposure devices (2), exposure device (2) are polygon prism integrated component, last set up polygon prism projection optical path (1) of polygon prism integrated component. The beneficial effects are that: can expose simultaneously by exposure workpiece's tow sides for the efficiency of work promotes the one time, better improvement the productivity, increased the efficiency of work.
Description
Technical field
This utility model relates to a kind of exposure device, is specifically related to a kind of laser direct-writing and tilts double-side exposure device.
Background technology
Write-through photoetching technique be development in recent years faster, to substitute the direct transfer techniques of image of the board-like photoetching technique of traditional mask, in quasiconductor and PCB production field, have increasingly consequence.Utilize this technology with shortened process, and production cost can be reduced.The direct-write type lithography machine of main flow is scanned exposure in single work stage mode mostly in the market, after first having been exposed in the A face being exposed workpiece, then carries out reprint, is then exposed B face.In single workpiece table system, for exposure substrate upper plate, be directed at, expose, lower plate is carried out successively.According to current structural system, each operating process has reached the time-consuming upper limit, is difficult to shorten the operating time of certain operating procedure again, and the direct-write type lithography machine of i.e. single work stage, due to the serial nature of each operating process, has been difficult to improve production capacity more.
Summary of the invention
The problem existed for above-mentioned prior art, this utility model provides a kind of laser direct-writing to tilt double-side exposure device, promotes work efficiency, preferably improve production capacity.
To achieve these goals, the technical solution adopted in the utility model is: a kind of laser direct-writing tilts double-side exposure device, including base and exposure device, exposure device has two groups, all it is inclined at the upper surface of base, being positioned at base upper surface in the centre of two groups of exposure devices and arrange slip base, exposure device is polygon prism integrated package, and polygon prism integrated package arranges polygon prism projecting light path.
Further, there is a multiple row in the described polygon prism projecting light path on polygon prism integrated package, and adjacent Liang Lie polygon prism projecting light path arranged crosswise.
Further, two groups of described exposure devices be arranged in parallel.
The beneficial effects of the utility model are: can expose the tow sides being exposed workpiece simultaneously so that the improved efficiency of work one times, preferably improve production capacity, add the efficiency of work.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model;
Fig. 2 is front view of the present utility model;
In figure: 1, polygon prism projecting light path, 2, polygon prism integrated package, 3, pcb board part, 4, base, 5, slip base.
Detailed description of the invention
The utility model is described in further detail below in conjunction with the accompanying drawings.
As shown in Figure 1 to Figure 2, this laser direct-writing tilts double-side exposure device, including base 4 and exposure device 2, exposure device 2 has two groups, all it is inclined at the upper surface of base 4, it is positioned at base 4 upper surface in the centre of two groups of exposure devices 2 and slip base 5 is set, exposure device 2 is polygon prism integrated package, polygon prism projecting light path 1 is set on polygon prism integrated package, the pcb board part 3 needing exposure is placed on slip base 5, slip base 5 ensures that pcb board part 3 is parallel to two groups of exposure devices 2 and is placed on the upper of base 4 and moves in the horizontal direction, two groups of exposure devices 2 can expose the tow sides of pcb board part 3 simultaneously, make the improved efficiency one times of work, preferably improve production capacity.
In order to improve exposure quality further, there is a multiple row in the polygon prism projecting light path 1 on polygon prism integrated package, and adjacent Liang Lie polygon prism projecting light path 1 arranged crosswise, and two groups of described exposure devices 2 be arranged in parallel.
Claims (3)
1. a laser direct-writing tilts double-side exposure device, it is characterized in that, including base (4) and exposure device (2), exposure device (2) has two groups, all it is inclined at the upper surface of base (4), being positioned at base (4) upper surface in the centre of two groups of exposure devices (2) and arrange slip base (5), exposure device (2) is polygon prism integrated package, and polygon prism integrated package arranges polygon prism projecting light path (1).
A kind of laser direct-writing the most according to claim 1 tilts double-side exposure device, it is characterised in that there are multiple row, and adjacent Liang Lie polygon prism projecting light path (1) arranged crosswise in the polygon prism projecting light path (1) on described polygon prism integrated package.
A kind of laser direct-writing the most according to claim 2 tilts double-side exposure device, it is characterised in that two groups of described exposure devices (2) be arranged in parallel.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201620059992.XU CN205539921U (en) | 2016-01-22 | 2016-01-22 | Two -sided exposure device of slope is directly write to laser |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201620059992.XU CN205539921U (en) | 2016-01-22 | 2016-01-22 | Two -sided exposure device of slope is directly write to laser |
Publications (1)
Publication Number | Publication Date |
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CN205539921U true CN205539921U (en) | 2016-08-31 |
Family
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Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
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CN201620059992.XU Active CN205539921U (en) | 2016-01-22 | 2016-01-22 | Two -sided exposure device of slope is directly write to laser |
Country Status (1)
Country | Link |
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CN (1) | CN205539921U (en) |
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2016
- 2016-01-22 CN CN201620059992.XU patent/CN205539921U/en active Active
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
CP03 | Change of name, title or address |
Address after: 221000 west side of Hengshan Road, Pizhou City, Xuzhou City, Jiangsu Province Patentee after: Jiangsu Yingsu integrated circuit equipment Co., Ltd Address before: 221000 Huashan Road, Pizhou Economic Development Zone, Xuzhou, Jiangsu Patentee before: JIANGSU YINGSU PHOTOELECTRIC TECHNOLOGY Co.,Ltd. |
|
CP03 | Change of name, title or address |