CN205121156U - 直写式曝光系统中的扫描台 - Google Patents
直写式曝光系统中的扫描台 Download PDFInfo
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- CN205121156U CN205121156U CN201520474307.5U CN201520474307U CN205121156U CN 205121156 U CN205121156 U CN 205121156U CN 201520474307 U CN201520474307 U CN 201520474307U CN 205121156 U CN205121156 U CN 205121156U
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- floor beam
- laminate floor
- mount pad
- deck plate
- plate
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Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
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CN201520474307.5U CN205121156U (zh) | 2015-07-03 | 2015-07-03 | 直写式曝光系统中的扫描台 |
Applications Claiming Priority (1)
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CN201520474307.5U CN205121156U (zh) | 2015-07-03 | 2015-07-03 | 直写式曝光系统中的扫描台 |
Publications (1)
Publication Number | Publication Date |
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CN205121156U true CN205121156U (zh) | 2016-03-30 |
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CN201520474307.5U Withdrawn - After Issue CN205121156U (zh) | 2015-07-03 | 2015-07-03 | 直写式曝光系统中的扫描台 |
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Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104977815A (zh) * | 2015-07-03 | 2015-10-14 | 苏州微影光电科技有限公司 | 直写式曝光系统中的扫描台 |
CN106527056A (zh) * | 2016-12-20 | 2017-03-22 | 湖北凯昌光电科技有限公司 | 一种单台面直写式曝光机 |
-
2015
- 2015-07-03 CN CN201520474307.5U patent/CN205121156U/zh not_active Withdrawn - After Issue
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CN104977815A (zh) * | 2015-07-03 | 2015-10-14 | 苏州微影光电科技有限公司 | 直写式曝光系统中的扫描台 |
CN104977815B (zh) * | 2015-07-03 | 2018-02-23 | 苏州微影激光技术有限公司 | 直写式曝光系统中的扫描台 |
CN106527056A (zh) * | 2016-12-20 | 2017-03-22 | 湖北凯昌光电科技有限公司 | 一种单台面直写式曝光机 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
C14 | Grant of patent or utility model | ||
GR01 | Patent grant | ||
C41 | Transfer of patent application or patent right or utility model | ||
TR01 | Transfer of patent right |
Effective date of registration: 20160526 Address after: 518000 Guangdong, Shenzhen, Xixiang Xingye Road, No. 3012 veterans building, west block, floor, building, No. two, No. Patentee after: CAIZ OPTRONICS CORP. Address before: 215636 Zhangjiagang City, Jiangsu Province, the new town of the sea dam road, Suzhou, micro shadow Photoelectric Technology Co., Ltd. Patentee before: Advaced Microlitho Instrument, Inc. |
|
TR01 | Transfer of patent right | ||
TR01 | Transfer of patent right |
Effective date of registration: 20170315 Address after: 432000 Industrial Park, Xiaochang Economic Development Zone, Xiaogan, Hubei, China Patentee after: HUBEI KAICHANG PHOTOELECTRIC TECHNOLOGY CO., LTD. Address before: 518000 Guangdong, Shenzhen, Xixiang Xingye Road, No. 3012 veterans building, west block, floor, building, No. two, No. Patentee before: CAIZ OPTRONICS CORP. |
|
AV01 | Patent right actively abandoned | ||
AV01 | Patent right actively abandoned |
Granted publication date: 20160330 Effective date of abandoning: 20180223 |