CN203559127U - Concentric-ring multiple-gas-independent-channel spray structure - Google Patents
Concentric-ring multiple-gas-independent-channel spray structure Download PDFInfo
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- CN203559127U CN203559127U CN201320686908.3U CN201320686908U CN203559127U CN 203559127 U CN203559127 U CN 203559127U CN 201320686908 U CN201320686908 U CN 201320686908U CN 203559127 U CN203559127 U CN 203559127U
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- gas
- spray structure
- gases
- concentric
- channel
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- 239000007921 spray Substances 0.000 title claims abstract description 11
- 239000007789 gas Substances 0.000 abstract description 51
- 230000008021 deposition Effects 0.000 abstract description 12
- 239000000758 substrate Substances 0.000 abstract description 5
- 238000001816 cooling Methods 0.000 abstract description 2
- 238000010438 heat treatment Methods 0.000 abstract description 2
- 239000002699 waste material Substances 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 10
- 238000005516 engineering process Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
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Abstract
The utility model relates to a concentric-ring multiple-gas-independent-channel spray structure. The main body is uniformly provided with two regions in a concentric ring mode, which are respectively and independently used as a gas A region and a gas B region; after being dispersed in the regions, the gases A and B enters a chamber via gas outlets of the respective regions; and the middle of the main body concentric ring is provided with a gas C channel, and the gas C directly enters the reaction chamber via two channels. The structure adopts the planar region division mode to isolate different gas paths, so that the three gases independently and uniformly reach the substrate surface to perform deposition reaction; and thus, the structure well solves the technical problems of difficulty in controlling deposition time and waste of special gas resources when the gases have contacted each other before entering the chamber. A heating or cooling component can be installed on the spray structure to satisfy more strict technological condition requirements. The spray structure has the characteristic of reasonable structure and is easy to popularize.
Description
Technical field
The utility model relates to a kind of novel spray structure, by plane partitioned mode, realize the above gas of three kinds and three kinds independent, arrive substrate surface uniformly and carry out deposition reaction, belong to semiconductor film deposition applications and manufacturing technology field.
Background technology
Semiconductor coated film equipment is when carrying out deposition reaction, generally need a kind of gas or two kinds of gases, sometimes need three kinds of (or more than three kinds) gases to enter chamber simultaneously and carry out thin film deposition, require several gas paths separate, before entering cavity, can not meet, can evenly be diffused into substrate surface after entering chamber.And existing spray structure is mostly the path for independent gas design, or there are at most two kinds of gas paths, and structure is all to carry out separation in gas feed place mostly, at the first two gas that enters chamber, contacts, and deposition reaction is carried out in advance.So, be not easy to control time and the reaction conditions of deposition, also wasted valuable non-renewable special gas resource.When needs are more than three kinds or three kinds during gas, spraying method before can not meet the demands.Multiple for requiring (more than three kinds and three kinds) gas while, independent, uniform harsh requirement, the utility model arises at the historic moment.
Summary of the invention
The utility model is that to address the above problem be object, mainly solve existing spray structure because design is reasonable not, gas contacted before entering chamber, be not easy to control the time of deposition and the technical problem of the special gas wasting of resources, and a kind of spray novel texture that can meet three kinds of gas whiles, independence, uniform deposition is provided.
For achieving the above object, the utility model adopts following technical proposals: adopt plane partitioned mode, isolate different gas paths.Gas respectively from separately independently gas feed enter, by passage independently separately, arrive subregion separately, and arrive chamber from subregion separately.Structure independent of one another makes gas with various can not meet in advance or react.By planning different zonal structures and zoned format, can meet the distribution of multiple gases, make gas can be evenly, be diffused in chamber fast, and carry out deposition reaction on substrate.Concrete structure is: main body is evenly arranged two subregions with concentric ring form, and respectively as gas A subregion and gas B subregion subregion alone, above-mentioned gas A, the B pneumatic outlet from subregion separately after zoned diffustion enters chamber.The mid-way of aforementioned body concentric ring is provided with gas C-channel, and gas C directly enters reaction chamber from two passages.
The beneficial effects of the utility model and feature: because this structure adopts plane partitioned mode, isolate different gas paths, realize three kinds of gases independent, arrive substrate surface uniformly and carry out deposition reaction, solve preferably gas and contacted before entering chamber, be not easy to control the time of deposition and the technical problem of the special gas wasting of resources.And heating or cooling component can be installed thereon, to meet more harsh processing condition requirement.There is feature rational in infrastructure and that be easy to promote.
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
In figure, piece mark represents respectively:
1, gas A subregion; 2, gas B subregion; 3, gas C-channel.
Below in conjunction with drawings and Examples, the utility model is further described.
Embodiment
Embodiment
As shown in Figure 1, the spray structure of a kind of many gas of concentric ring type autonomous channel, the main body of this structure is to be evenly arranged two subregions with concentric ring form, respectively as gas A subregion 1 and gas B subregion 2 subregion alone.Above-mentioned gas A, the B pneumatic outlet from subregion separately after zoned diffustion enters chamber.The mid-way of aforementioned body concentric ring is provided with gas C-channel 3, and gas C directly enters reaction chamber from two passages.
Claims (1)
1. the spray structure of many gas of concentric ring type autonomous channel, it is characterized in that: main body is evenly arranged two subregions with concentric ring form, respectively as gas A subregion and gas B subregion subregion alone, above-mentioned gas A, the B pneumatic outlet from subregion separately after zoned diffustion enters chamber, the mid-way of aforementioned body concentric ring is provided with gas C-channel, and gas C directly enters reaction chamber from two passages.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320686908.3U CN203559127U (en) | 2013-10-31 | 2013-10-31 | Concentric-ring multiple-gas-independent-channel spray structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320686908.3U CN203559127U (en) | 2013-10-31 | 2013-10-31 | Concentric-ring multiple-gas-independent-channel spray structure |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203559127U true CN203559127U (en) | 2014-04-23 |
Family
ID=50508858
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320686908.3U Expired - Lifetime CN203559127U (en) | 2013-10-31 | 2013-10-31 | Concentric-ring multiple-gas-independent-channel spray structure |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203559127U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104178749A (en) * | 2014-07-30 | 2014-12-03 | 沈阳拓荆科技有限公司 | Two-gas isolate type central uniform gas dividing and spraying device |
-
2013
- 2013-10-31 CN CN201320686908.3U patent/CN203559127U/en not_active Expired - Lifetime
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104178749A (en) * | 2014-07-30 | 2014-12-03 | 沈阳拓荆科技有限公司 | Two-gas isolate type central uniform gas dividing and spraying device |
| CN104178749B (en) * | 2014-07-30 | 2016-09-28 | 沈阳拓荆科技有限公司 | Gas blowout shower device is uniformly divided in the middle part of two kinds of gas barrier formulas |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: No.900 Shuijia, Hunnan District, Shenyang City, Liaoning Province Patentee after: Tuojing Technology Co.,Ltd. Address before: 110179 3rd floor, No.1-1 Xinyuan street, Hunnan New District, Shenyang City, Liaoning Province Patentee before: SHENYANG PIOTECH Co.,Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140423 |