CN203559125U - Spraying structure of vortex-shaped line-type multi-gas independent channel - Google Patents
Spraying structure of vortex-shaped line-type multi-gas independent channel Download PDFInfo
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- CN203559125U CN203559125U CN201320684941.2U CN201320684941U CN203559125U CN 203559125 U CN203559125 U CN 203559125U CN 201320684941 U CN201320684941 U CN 201320684941U CN 203559125 U CN203559125 U CN 203559125U
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- gas
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- 238000005507 spraying Methods 0.000 title abstract 7
- 239000007789 gas Substances 0.000 claims abstract description 82
- 239000007921 spray Substances 0.000 claims description 10
- 230000008021 deposition Effects 0.000 abstract description 11
- 238000000638 solvent extraction Methods 0.000 abstract 1
- 238000000151 deposition Methods 0.000 description 10
- 239000000758 substrate Substances 0.000 description 4
- 239000010408 film Substances 0.000 description 2
- 239000004065 semiconductor Substances 0.000 description 2
- 230000009286 beneficial effect Effects 0.000 description 1
- 238000001816 cooling Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 238000000427 thin-film deposition Methods 0.000 description 1
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Abstract
The utility model discloses a spraying structure of a vortex-shaped line-type multi-gas independent channel, mainly solving the technical problems that because the design is not reasonable, a gas is in contact before entering a cavity, the deposition time is not easily controlled, and the special gas resource is wasted in an existing spraying structure. A gas channel A, a gas channel B and a gas channel C are arranged on a main body of the spraying structure. Each of the gas channel A, the gas channel B and the gas channel C is composed of three grooves which are distributed according to a spiral line and used for independently and uniformly distributing three kinds of gases on the circumference. The gas channel A, the gas channel B and the gas channel C are respectively provided with an inlet, a gas outlet A, a gas outlet B and a gas outlet C. The spraying structure is reasonable in structure; because a plane partitioning mode is adopted, different gas paths are isolated, and the spraying structure is a novel spraying structure which is capable of meeting the fact that three gases are simultaneously, independently and uniformly deposited.
Description
Technical field
The utility model relates to a kind of novel spray structure, by plane partitioned mode, realize the above gas of three kinds and three kinds independent, arrive substrate surface uniformly and carry out deposition reaction, belong to semiconductor film deposition applications and manufacturing technology field.
Background technology
Semiconductor coated film equipment is when carrying out deposition reaction, generally need a kind of gas or two kinds of gases, sometimes need three kinds of (or more than three kinds) gases to enter chamber simultaneously and carry out thin film deposition, require several gas paths separate, before entering cavity, can not meet, can evenly be diffused into substrate surface after entering chamber.And existing spray structure is mostly the path for independent gas design, or there are at most two kinds of gas paths, and structure is all to carry out separation in gas feed place mostly, at the first two gas that enters chamber, contacts, and deposition reaction is carried out in advance.So, be not easy to control time and the reaction conditions of deposition, also wasted valuable non-renewable special gas resource.When needs are more than three kinds or three kinds during gas, spray structure before can not meet the demands.Multiple for requiring (more than three kinds and three kinds) gas while, independent, uniform harsh requirement, the utility model arises at the historic moment.
Summary of the invention
The utility model is that to address the above problem be object, mainly solve existing spray structure because design is reasonable not, gas contacted before entering chamber, be not easy to control the time of deposition and the technical problem of the special gas wasting of resources, and a kind of spray novel texture that can meet multiple (more than three kinds and three kinds) gas while, independence, uniform deposition is provided.
For achieving the above object, the utility model adopts following technical proposals: the spray structure of a kind of vortex-like many gas of line formula autonomous channel, is shaped with gas A channel (1), gas B passage (3) and gas C-channel (5) in the main body of this structure.Above-mentioned A, B, C triple channel are to consist of three grooves that distribute by vortex-like line, respectively three kinds of gases are independently evenly distributed on circumference.On described gas A channel (1), gas B passage (3) and gas C-channel (5), be shaped with respectively entrance and gas A outlet (2), gas B outlet (4) and gas C outlet (6).
The beneficial effects of the utility model and feature: rational in infrastructure, owing to adopting plane partitioned mode, isolate different gas paths, can meet the spray novel texture of three kinds of gas whiles, independence, uniform deposition.During work, gas respectively from separately independently gas feed enter, by passage independently separately, arrive subregion separately, and arrive chamber from subregion separately.Structure independent of one another makes gas with various can not meet in advance or react.By planning different zonal structures and zoned format, can meet the distribution of multiple gases, make gas can be evenly, be diffused in chamber fast, and carry out deposition reaction on substrate.And heating or cooling component can be installed thereon, to meet more harsh processing condition requirement
Accompanying drawing explanation
Fig. 1 is structural representation of the present utility model.
In figure, piece mark represents respectively:
1, gas A channel; 2, gas A outlet; 3, gas B passage; 4, gas B outlet;
5, gas C-channel; 6, gas C outlet.
Below in conjunction with drawings and Examples, the utility model is further illustrated.
Embodiment
Embodiment
A spray structure for vortex-like many gas of line formula autonomous channel, is shaped with gas A channel 1, gas B passage 3 and gas C-channel 5 in the main body of this structure.Above-mentioned A, B, C triple channel are to consist of three grooves that distribute by vortex-like line, respectively three kinds of gases are independently evenly distributed on circumference.On described gas A channel 1, gas B passage 3 and gas C-channel 5, be shaped with respectively entrance and gas A outlet 2, gas B outlet 4 and gas C outlet 6.
During work, A, B, tri-kinds of gases of the C respectively outlet from passage separately enter chamber, make gas can be evenly, be diffused in chamber fast, and carry out deposition reaction on substrate.
Claims (1)
1. the spray structure of vortex-like many gas of line formula autonomous channel, it is characterized in that: in the main body of this structure, be shaped with gas A channel (1), gas B passage (3) and gas C-channel (5), above-mentioned A, B, C triple channel are to consist of three grooves that distribute by vortex-like line, respectively three kinds of gases are independently evenly distributed on circumference; On above-mentioned gas A channel (1), gas B passage (3) and gas C-channel (5), be shaped with respectively entrance and gas A outlet (2), gas B outlet (4) and gas C outlet (6).
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320684941.2U CN203559125U (en) | 2013-10-31 | 2013-10-31 | Spraying structure of vortex-shaped line-type multi-gas independent channel |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320684941.2U CN203559125U (en) | 2013-10-31 | 2013-10-31 | Spraying structure of vortex-shaped line-type multi-gas independent channel |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203559125U true CN203559125U (en) | 2014-04-23 |
Family
ID=50508856
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201320684941.2U Expired - Lifetime CN203559125U (en) | 2013-10-31 | 2013-10-31 | Spraying structure of vortex-shaped line-type multi-gas independent channel |
Country Status (1)
| Country | Link |
|---|---|
| CN (1) | CN203559125U (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104178749A (en) * | 2014-07-30 | 2014-12-03 | 沈阳拓荆科技有限公司 | Two-gas isolate type central uniform gas dividing and spraying device |
| CN105132889A (en) * | 2015-09-14 | 2015-12-09 | 沈阳拓荆科技有限公司 | Double gas circuit center gas intake structure applied to spray head of thin film deposition device |
-
2013
- 2013-10-31 CN CN201320684941.2U patent/CN203559125U/en not_active Expired - Lifetime
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN104178749A (en) * | 2014-07-30 | 2014-12-03 | 沈阳拓荆科技有限公司 | Two-gas isolate type central uniform gas dividing and spraying device |
| CN104178749B (en) * | 2014-07-30 | 2016-09-28 | 沈阳拓荆科技有限公司 | Gas blowout shower device is uniformly divided in the middle part of two kinds of gas barrier formulas |
| CN105132889A (en) * | 2015-09-14 | 2015-12-09 | 沈阳拓荆科技有限公司 | Double gas circuit center gas intake structure applied to spray head of thin film deposition device |
| CN105132889B (en) * | 2015-09-14 | 2017-11-21 | 沈阳拓荆科技有限公司 | Applied to double gas circuit air feeding in center structures in film deposition apparatus spray head |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CP03 | Change of name, title or address | ||
| CP03 | Change of name, title or address |
Address after: No.900 Shuijia, Hunnan District, Shenyang City, Liaoning Province Patentee after: Tuojing Technology Co.,Ltd. Address before: 110179 3rd floor, No.1-1 Xinyuan street, Hunnan New District, Shenyang City, Liaoning Province Patentee before: SHENYANG PIOTECH Co.,Ltd. |
|
| CX01 | Expiry of patent term | ||
| CX01 | Expiry of patent term |
Granted publication date: 20140423 |