CN203292158U - Substrate cleaning system - Google Patents
Substrate cleaning system Download PDFInfo
- Publication number
- CN203292158U CN203292158U CN201320313688XU CN201320313688U CN203292158U CN 203292158 U CN203292158 U CN 203292158U CN 201320313688X U CN201320313688X U CN 201320313688XU CN 201320313688 U CN201320313688 U CN 201320313688U CN 203292158 U CN203292158 U CN 203292158U
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- substrate
- cleaning system
- basal plate
- clamping limb
- conveyer belt
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Abstract
The utility model relates to the technical field of display device manufacture and discloses a substrate cleaning system. The substrate cleaning system comprises a conveyor used for conveying substrates and comprising a conveyor belt and supports arranged at the two sides of the conveyor belt, a cleaning device arranged above the conveyor belt and used for cleaning the substrates and an overturning device used for turning the cleaned substrates over and comprising two clamping pieces hinged to the supports at the two sides of the conveyor belt respectively, wherein the two clamping pieces clamp the two opposite sides of each substrate. The substrate cleaning system has the following advantages that the substrates are cleaned through the substrate cleaning system provided with the overturning device, so that the substrates are prevented from being polluted for a second time when being turned over, the phenomenon of substrate breakage in the overturning process is avoided, and therefore the cleaning efficiency of the substrates is improved.
Description
Technical field
The utility model relates to display unit manufacturing technology field, specially refers to a kind of basal plate cleaning system.
Background technology
In the manufacturing process of liquid crystal display, usually adopt substrate to make color membrane substrates as substrate, needed by basal plate cleaning system, substrate to be rinsed well before making color membrane substrates, make the surface of substrate keep higher cleannes.Present basal plate cleaning system adopts conveyer belt to transmit substrate, and substrate is cleaned by each cleaning device successively, adopts the one side that this mode can only cleaning base plate.And make to adopt ADS(ADvanced Super Dimension Switch, a senior super dimension switch technology, abbreviation ADS) and during the color membrane substrates of pattern, transparency electrode also need to be set on substrate, therefore, the two sides of substrate all needs to clean.At present,, in order to make the two sides that basal plate cleaning system can cleaning base plate, usually adopt the mode of artificial upset, the substrate that has cleaned one side is overturn, again again be sent to the substrate basal plate cleaning system and clean.
The defect of prior art is, adopt the mode of artificial upset easily substrate to be caused secondary pollution, and the efficiency of artificial upset is lower, the accident of substrate crushing easily occurs, thereby has influence on the efficiency of base-plate cleaning.
The utility model content
The utility model provides a kind of basal plate cleaning system, in order to improve the efficiency that substrate is cleaned.
The utility model provides a kind of basal plate cleaning system, comprising:
Transmit the conveyer of substrate, the support that described conveyer comprises conveyer belt and is arranged on the conveyer belt both sides;
Be arranged at described conveyer belt top and also be used for the cleaning device of cleaning base plate;
Be used for the turning device of the substrate after upset is cleaned, comprise: be hinged respectively and be connected to two holders of described conveyer belt two side stands; Described two holders are held on two relative sides of substrate.
Preferably, described holder comprises the clamping limb of clamping substrate side, and the mechanical arm that is fixedly connected with described clamping limb, and described mechanical arm is hinged and is connected to the support of described conveyer belt one side.
Preferably, described mechanical arm is expansion link.
Preferably, described holder comprises the clamping limb of clamping substrate side, and described clamping limb is hinged and is connected to the support of described conveyer belt one side.
Preferably, described turning device also comprises: drive the driving mechanism that two holders are held on two relative sides of substrate and drive substrate overturn.
Preferably, described clamping limb is the U-shaped frame, and when the clamping substrate, described clamping limb is held on the side of described substrate.
Preferably, described clamping limb is vacuum cup; Described turning device also comprises the air pump that is connected with described vacuum cup, the described air pump air in vacuum cup of finding time when clamping limb clamping substrate.
Preferably, turning device also comprises: a plurality of sensors and the control module that is connected with described a plurality of sensors, and described sensor detects the position of substrate; Described control module receives the substrate position signal and basis signal control driving mechanism makes two holders be held on two relative sides of substrate and drive substrate overturn.
Preferably, described cleaning device comprises: the hairbrush cleaning device, high-pressure jet clearing apparatus, spray equipment, flusher and the air-dry apparatus that set gradually along the substrate direction of transfer.
The utility model beneficial effect is as follows: by adopting the basal plate cleaning system with turning device, carry out cleaning base plate, avoided substrate to be subject to secondary pollution when upset, and in switching process the phenomenon of substrate crushing, thereby improved the efficiency of substrate when cleaning.
Description of drawings
The schematic diagram of the basal plate cleaning system that Fig. 1 provides for the utility model embodiment;
The structural representation of the turning device that Fig. 2 provides for the utility model embodiment;
The work schematic diagram of the turning device that Fig. 3 provides for the utility model embodiment.
Reference numeral:
10-conveyer 20-hairbrush cleaning device 30-high-pressure jet clearing apparatus
40-spray equipment 50-flusher 60-air-dry apparatus.
70-turning device 71-control module 72-holder
73-mechanical arm 74-clamping limb 80-substrate
The specific embodiment
In order to improve the efficiency of base-plate cleaning, the utility model provides a kind of basal plate cleaning system.In the technical solution of the utility model, by adopting turning device, substrate is overturn, avoided substrate to occur when upset broken, also avoided simultaneously substrate to be subject to secondary pollution, improved the efficiency of base-plate cleaning., for making the purpose of this utility model, technical scheme and advantage clearer, by the following examples the utility model is described in further detail.
As depicted in figs. 1 and 2, the schematic diagram of the basal plate cleaning system that provides for the utility model embodiment of Fig. 1; The structural representation of the turning device that Fig. 2 provides for the utility model embodiment.
A kind of basal plate cleaning system that the utility model embodiment provides comprises:
Transmit the conveyer 10 of substrate 80, the support (not shown) that described conveyer 10 comprises the conveyer belt (not shown) and is arranged on the conveyer belt both sides;
Be arranged at described conveyer belt top and also be used for the cleaning device (not shown) of cleaning base plate 80;
Be used for the turning device 70 of the substrate 80 after upset is cleaned, comprise: be hinged respectively and be connected to two holders 72 of described conveyer belt two side stands; Described two holders 72 are held on two relative sides of substrate 80.
while adopting substrate 80 to make the color membrane substrates of ADS pattern, need the two sides of substrate 80 is all cleaned, in the above-described embodiments, basal plate cleaning system transmits substrate 80 by conveyer 10, and substrate 80 is cleaned in transport process through the cleaning device that is arranged on above conveyer 10, the cleaning of completing substrate 80, as shown in Figures 2 and 3, by the relative dual-side zone of two holders, 72 chucking substrates 80 that is arranged on last turning device 70, and by holder 72, rotate, thereby drive substrate 80 upsets, substrate 80 is again sent in basal plate cleaning system and cleaned by Handling device or by conveyer 10 by operating personnel again, in whole process, all do not need operating personnel directly with substrate 80, to contact, avoided substrate 80 secondary pollution to occur after having cleaned, adopt turning device 70 to improve the speed of substrate 80 upsets, also avoided substrate 80 broken situation to occur in the process of upset, improved the efficiency that substrate 80 cleans.
In the above-described embodiments, holder 72 can adopt different structures to carry out clamping substrate 80, preferably, holder 72 comprises the clamping limb 74 of clamping substrate 80 sides, and the mechanical arm 73 that is fixedly connected with described clamping limb 74, described mechanical arm 73 is hinged and is connected to the support of described conveyer belt one side, or described holder 72 comprises the clamping limb 74 of clamping substrate 80 sides, and described clamping limb 74 is hinged and is connected to the support of described conveyer belt one side.described two holders 72 can be the holder 72 with mechanical arm 73 simultaneously, also can be simultaneously for only comprising the holder 72 of clamping limb 74, or one of them is with mechanical arm 73, another one does not have the holder 72 with mechanical arm 73, the producer can select different holders 72 according to the actual conditions of oneself, be positioned at the middle part of conveyer belt while due to substrate 80, transmitting on conveyer belt, better, two holders 72 all adopt the structure with mechanical arm 73, make substrate 80 also be positioned at the middle part of conveyer belt after upset, improve the security performance of substrate 80 when upset.
In the above-described embodiments, in order to improve the upset efficiency of substrate overturn 80, preferred, described turning device also comprises: drive the driving mechanism (not shown) that two holders 72 are held on two relative sides of substrate 80 and drive substrate 80 upsets.Realize the mechanization of turning device by driving mechanism.the type of drive of driving mechanism can be for multiple, the producer can select according to actual conditions, when mechanical arm 73 is support bar, servomotor or stepper motor that driving mechanism can rotate for only driving holder 72, also can select a kind of in the 72 two kinds of different type of drive of holder that only drive the holder 72 of a side or drive both sides when driving, because the Area comparison of substrate 80 is large, for fear of substrate 80 in switching process because discontinuity causes substrate 80 cracked, better, type of drive is for driving simultaneously the holder 72 of both sides, make the both sides of substrate 80 simultaneously stressed, improved the turning-over safety energy of substrate 80.When mechanical arm 73 is expansion link, driving mechanism comprises flexible hydraulic cylinder or the air pump of driving expansion link, and the servomotor or the stepper motor that drive holder 72 rotations, when substrate overturn 80, first drive expansion link flexible, make two clamping limbs 74 be held on two relative sides of substrate 80, then 73 rotations of driving device arm, make glass turning.When conveyer belt transmits substrate 80, be placed with a plurality of substrates 80 on conveyer belt, substrate 80 in 73 pairs of transmission of mechanical arm causes interference, adopt expansion link can stretch out when substrate 80 needs upset and clamp substrate 80 and drive upset, after substrate 80 has overturn, expansion link shrinks, thereby avoided next piece substrate 80 to be interfered the placement location of substrate 80 is changed by the clamping limb 74 on mechanical arm 73 and mechanical arm 73 tops when the transporting of conveyer belt, had influence on the effect of turning device 70 pairs of these substrates 80 upsets.
In the above-described embodiments, clamping limb 74 can adopt different clamp structures, as U-shaped frame or vacuum cup.Described clamping limb 74 is the U-shaped frame, and when clamping substrate 80, described U-shaped frame is sleeved on the side area of described substrate 80, and that the U-shaped support has advantages of is relatively simple for structure, be convenient to produce, cheap; Described clamping limb 74 is vacuum cup, when adopting vacuum cup, described turning device 70 also comprises the air pump (not shown) that is connected with described vacuum cup, find time when clamping substrate 80 air in vacuum cup, vacuum cup can firmly clamp substrate 80, improved the stability of substrate 80 when upset, but complicated with respect to the U-shaped bracket institution.In actual production process, the producer can adopt different clamp structures to carry out clamping substrate 80.
In the above-described embodiments, in order to improve the rollover effect of substrate 80, improve the automaticity of turning device 70, preferably, turning device 70 also comprises: a plurality of sensor (not shown)s and the control module 71 that is connected with described a plurality of sensors, and described sensor detects the placement location of substrate 80; Substrate 80 placement location signals and basis signal control driving mechanism that described control module 71 receives described a plurality of sensor transmissions make two holders 72 be held on two relative sides of substrate 80 and drive substrate 80 upsets.When substrate 80 upset, the position at substrate 80 places detected by a plurality of sensors, after control module 71 receives the signal that sensor sends, control driving mechanism according to the stroke of the expansion link of setting in signal and system, make mechanical arm 73 stretch out and by clamping limb 74, substrate 80 be clamped according to the stroke of setting, driving mechanical arm 73 by driving mechanism again rotates, make substrate 80 upsets, after completing upset, control module 71 is controlled mechanical arm 73 and is got back to initial position.The employing automation is controlled, automatically the upset of completing substrate 80, improved the upset efficiency of substrate 80, simultaneously, for the substrates 80 of different sizes, the stroke of the signal that control module 71 can be come according to sensor transmissions and the expansion link of control module 71 interior settings is completed whole process voluntarily.
In the above-described embodiments, control module 71 can be different control modules, as PLC(programmable logic controller, programmable logic controller (PLC), be called for short PLC), single-chip microcomputer, better, described control module 71 is single-chip microcomputer, and single-chip microcomputer is a kind of control module 71 relatively more commonly used, has good control performance, adopt single-chip microcomputer relatively to control substrate 80 upsets, improve the cleaning efficiency of substrate 80.
In the above-described embodiments, cleaning device can be different cleaning devices, operating personnel can adopt different cleaning devices according to actual conditions, better, described cleaning device comprises: the hairbrush cleaning device 20, high-pressure jet clearing apparatus 30, spray equipment 40, flusher 50 and the air-dry apparatus 60 that set gradually along substrate 80 direction of transfers.this basal plate cleaning system is when cleaning base plate 80, at first by hairbrush cleaning device 20, that the particle on substrate 80 is larger, the dust that easily drops cleans, afterwards again by the dust under being not easy to clean on the gas cleaning substrate 80 of high-pressure jet clearing apparatus 30 by high pressure, again by the spray equipment 40 with medicament by the spot under being difficult to clean on medicament cleaning base plate 80, by flusher 50 use clear water, medicament residual on substrate 80 is cleaned up again finally, pass through multi-step, the cleaning of the different modes surface clean of substrate 80 the most at last is clean.
Obviously, those skilled in the art can carry out various changes and modification and not break away from spirit and scope of the present utility model the utility model.Like this, if within of the present utility model these are revised and modification belongs to the scope of the utility model claim and equivalent technologies thereof, the utility model also is intended to comprise these changes and modification interior.
Claims (9)
1. a basal plate cleaning system, is characterized in that, comprising:
Transmit the conveyer of substrate, the support that described conveyer comprises conveyer belt and is arranged on the conveyer belt both sides;
Be arranged at described conveyer belt top and also be used for the cleaning device of cleaning base plate;
Be used for the turning device of the substrate after upset is cleaned, comprise: be hinged respectively and be connected to two holders of described conveyer belt two side stands; Described two holders are held on two relative sides of substrate.
2. basal plate cleaning system as claimed in claim 1, is characterized in that, described holder comprises the clamping limb of clamping substrate side, and the mechanical arm that is fixedly connected with described clamping limb, and described mechanical arm is hinged and is connected to the support of described conveyer belt one side.
3. basal plate cleaning system as claimed in claim 2, is characterized in that, described mechanical arm is expansion link.
4. basal plate cleaning system as claimed in claim 1, is characterized in that, described holder comprises the clamping limb of clamping substrate side, and described clamping limb is hinged and is connected to the support of described conveyer belt one side.
5. basal plate cleaning system as described in claim 2～4 any one, is characterized in that, described turning device also comprises: drive the driving mechanism that two holders are held on two relative sides of substrate and drive substrate overturn.
6. basal plate cleaning system as claimed in claim 5, is characterized in that, described clamping limb is the U-shaped frame, and when the clamping substrate, described clamping limb is held on the side of described substrate.
7. basal plate cleaning system as claimed in claim 5, is characterized in that, described clamping limb is vacuum cup; Described turning device also comprises the air pump that is connected with described vacuum cup, the described air pump air in vacuum cup of finding time when clamping limb clamping substrate.
8. basal plate cleaning system as claimed in claim 5, is characterized in that, turning device also comprises: a plurality of sensors and the control module that is connected with described a plurality of sensors, and described sensor detects the position of substrate; Described control module receives the substrate position signal and basis signal control driving mechanism makes two holders be held on two relative sides of substrate and drive substrate overturn.
9. basal plate cleaning system as claimed in claim 1, is characterized in that, described cleaning device comprises: the hairbrush cleaning device, high-pressure jet clearing apparatus, spray equipment, flusher and the air-dry apparatus that set gradually along the substrate direction of transfer.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320313688XU CN203292158U (en) | 2013-05-31 | 2013-05-31 | Substrate cleaning system |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| CN201320313688XU CN203292158U (en) | 2013-05-31 | 2013-05-31 | Substrate cleaning system |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN203292158U true CN203292158U (en) | 2013-11-20 |
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| Application Number | Title | Priority Date | Filing Date |
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| CN201320313688XU Expired - Lifetime CN203292158U (en) | 2013-05-31 | 2013-05-31 | Substrate cleaning system |
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| CN (1) | CN203292158U (en) |
Cited By (8)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103658088A (en) * | 2013-12-12 | 2014-03-26 | 中国水产科学研究院淡水渔业研究中心 | Automatic cleaning device for crab-type aquatic products |
| CN104369920A (en) * | 2014-10-30 | 2015-02-25 | 芜湖莫森泰克汽车科技有限公司 | Skylight packaging and cleaning working platform |
| CN105541096A (en) * | 2014-10-24 | 2016-05-04 | 三星钻石工业股份有限公司 | Substrate machining apparatus |
| KR20160048631A (en) * | 2014-10-24 | 2016-05-04 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | Substrate machining apparatus |
| CN108742364A (en) * | 2018-05-28 | 2018-11-06 | 毛文龙 | A kind of Multifunctional inverted V-shaped sweeping robot that can avoid frequently tipping rubbish |
| CN109226010A (en) * | 2018-09-28 | 2019-01-18 | 昆山市和博电子科技有限公司 | A kind of substrate cleaning machine and basal plate cleaning system |
| CN112871835A (en) * | 2021-01-11 | 2021-06-01 | 山东得知科技发展有限公司 | Hemostatic forceps cleaning equipment |
| CN114131445A (en) * | 2021-12-09 | 2022-03-04 | 衢州学院 | Grinding and cleaning device for silicon wafer |
-
2013
- 2013-05-31 CN CN201320313688XU patent/CN203292158U/en not_active Expired - Lifetime
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN103658088A (en) * | 2013-12-12 | 2014-03-26 | 中国水产科学研究院淡水渔业研究中心 | Automatic cleaning device for crab-type aquatic products |
| CN105541096A (en) * | 2014-10-24 | 2016-05-04 | 三星钻石工业股份有限公司 | Substrate machining apparatus |
| KR20160048632A (en) * | 2014-10-24 | 2016-05-04 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | Substrate machining apparatus |
| KR20160048631A (en) * | 2014-10-24 | 2016-05-04 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | Substrate machining apparatus |
| CN105541093A (en) * | 2014-10-24 | 2016-05-04 | 三星钻石工业股份有限公司 | Substrate machining apparatus |
| KR102365097B1 (en) | 2014-10-24 | 2022-02-18 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | Substrate machining apparatus |
| KR102365098B1 (en) | 2014-10-24 | 2022-02-18 | 미쓰보시 다이야몬도 고교 가부시키가이샤 | Substrate machining apparatus |
| CN104369920A (en) * | 2014-10-30 | 2015-02-25 | 芜湖莫森泰克汽车科技有限公司 | Skylight packaging and cleaning working platform |
| CN108742364A (en) * | 2018-05-28 | 2018-11-06 | 毛文龙 | A kind of Multifunctional inverted V-shaped sweeping robot that can avoid frequently tipping rubbish |
| CN109226010A (en) * | 2018-09-28 | 2019-01-18 | 昆山市和博电子科技有限公司 | A kind of substrate cleaning machine and basal plate cleaning system |
| CN112871835A (en) * | 2021-01-11 | 2021-06-01 | 山东得知科技发展有限公司 | Hemostatic forceps cleaning equipment |
| CN114131445A (en) * | 2021-12-09 | 2022-03-04 | 衢州学院 | Grinding and cleaning device for silicon wafer |
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Legal Events
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| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| CX01 | Expiry of patent term | ||
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Granted publication date: 20131120 |